CN212713750U

CN212713750U - Atomizing structure in chemical vapor deposition device

Info

Publication number: CN212713750U
Application number: CN202021177952.8U
Authority: CN
Inventors: 杨毅敏; 李鹏; 周晴
Original assignee: Hangzhou Yingxijie Technology Co ltd
Current assignee: Hangzhou Yingxijie Technology Co ltd
Priority date: 2020-06-23
Filing date: 2020-06-23
Publication date: 2021-03-16
Anticipated expiration: 2030-06-23

Abstract

The utility model discloses an atomizing structure among chemical vapor deposition device, including workstation, small opening groove, pillar and servo motor, the main casing body of one side fixedly connected with on workstation top, and the inside of the main casing body both sides all is provided with the second fluting, the equal fixedly connected with auxiliary structure in both ends of the main casing body inboard, one side fixedly connected with controller on the outside top of the main casing body, the inside intermediate position department of main casing body bottom evenly is provided with the small opening groove, one side fixedly connected with atomizing mechanism of workstation bottom, the opposite side fixedly connected with drying mechanism on workstation top, the equal fixedly connected with pillar of four corners of workstation bottom. The utility model discloses a fixedly connected with atomizing mechanism in one side of workstation bottom, this kind of spraying mode has both made the two sides and evenly covers fog liquid, if the inside fog of the main casing body overweight also can flow in the water tank through the inside small opening in the main casing body bottom to supply its recycling, avoid extravagant.

Description

Atomizing structure in chemical vapor deposition device

Technical Field

The utility model relates to a chemical vapor deposition device technical field specifically is an atomizing structure among chemical vapor deposition device.

Background

The solid-liquid-gas can be used as raw materials for generating and processing new energy and new materials in the chemical field, wherein the chemical vapor deposition is to form a multi-state film by mixing and depositing a plurality of gaseous substances with film elements, and the chemical vapor deposition can be applied to the fields of biological research, medical treatment and the like.

In the process of implementing the present invention, the inventor finds that at least the following problems exist in the prior art and are not solved:

(1) the mist spraying mode of the atomizing structure in the traditional chemical vapor deposition device is too single-sided.

Only one side is sprayed to cause uneven film covering;

(2) an atomization structure in a traditional chemical vapor deposition device lacks a drying function, and a film coated with a film is heavy in moisture and difficult to roll immediately;

(3) the atomizing structure in the traditional chemical vapor deposition device is only conveyed by a conveyor belt, the position of the atomizing structure is easy to deviate, and the hidden trouble of film dislocation and winding exists.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide an atomizing structure among chemical vapor deposition device to propose the problem that the tectorial membrane is uneven, the time of drying is longer and the film easily misplaces in solving above-mentioned background art.

In order to achieve the above object, the utility model provides a following technical scheme: the utility model provides an atomizing structure in chemical vapor deposition device, includes workstation, small opening groove, pillar and servo motor, the main casing body of one side fixedly connected with on workstation top, and the inside of the main casing body both sides all is provided with the second fluting, the all fixedly connected with auxiliary structure in both ends of main casing body inboard, one side fixedly connected with controller on the outside top of the main casing body, the inside intermediate position department of main casing body bottom evenly is provided with the small opening groove, one side fixedly connected with atomizing mechanism of workstation bottom, the opposite side fixedly connected with stoving mechanism on workstation top, the all fixedly connected with pillars of four corners of workstation bottom, one side fixedly connected with servo motor on workstation top, and servo motor's output fixedly connected with reel.

Preferably, atomizer, water tank, distributing pipe, atomizer, three-way pipe and connecting pipe have set gradually to atomizing mechanism's inside, water tank fixed connection is in one side of workstation bottom, the bottom fixedly connected with atomizer of water tank, and the output end fixedly connected with connecting pipe of atomizer, fixedly connected with three-way pipe on the connecting pipe, and the both ends of three-way pipe all fixedly connected with distributing pipe.

Preferably, both sides of one end of the distribution pipe are fixedly connected with atomizing nozzles which are symmetrically distributed about a vertical middle dividing line of the main shell.

Preferably, the inside of stoving mechanism has set gradually first fluting, air-blower, electric heating resistance silk, cleaning brush and box, box fixed connection is in one side on workstation top, the inside of box both sides all is provided with first fluting, the inside fixedly connected with air-blower of box one end, and the inside one end fixedly connected with electric heating resistance silk of air-blower.

Preferably, cleaning brushes are uniformly arranged between two ends of the first open groove and are all positioned on the same horizontal plane.

Preferably, auxiliary structure's inside is provided with recess, centre gripping spring, gyro wheel, fixing bolt, fixed axle and spring groove in proper order, the both ends of the all fixed connection of recess in main casing body inboard, the both ends of the inside of recess all are provided with the spring groove, and the all fixedly connected with centre gripping spring of one end in spring groove, the all fixedly connected with fixed axles of one end of centre gripping spring, and the all swing joint in both ends of fixed axle has the gyro wheel, the all fixedly connected with fixing bolt of one end of recess inboard.

Compared with the prior art, the beneficial effects of the utility model are that: the atomization structure in the chemical vapor deposition device not only realizes uniform atomization and film covering, realizes instant drying, but also realizes auxiliary guiding to the film;

(1) the atomizing mechanism is fixedly connected to one side of the bottom end of the workbench, the atomizer, the water tank, the distribution pipe, the atomizing nozzle, the three-way pipe and the connecting pipe are sequentially arranged in the atomizing mechanism, the atomizer is started to atomize liquid materials in the water tank and respectively convey the liquid materials to the interior of the distribution pipe through the connecting pipe and the three-way pipe, and the liquid materials are uniformly sprayed on two surfaces of a thin film when the thin film is conveyed, so that the two surfaces of the thin film are uniformly covered with mist, and if the mist in the main shell is too heavy, the mist can also flow into the water tank through the leakage groove in the bottom end of the main shell to be recycled, and waste;

(2) the other side of the top end of the workbench is fixedly connected with a drying mechanism, a first open slot, an air blower, an electric heating resistance wire, a cleaning brush and a box body are sequentially arranged in the drying mechanism, the air blower is started, the drying temperature in the box body is adjusted through the electric heating resistance wire, so that the air drying speed of liquid on the surface of the thin film is accelerated, the cleaning brush is symmetrically distributed in the first open slot on the right side of the air blower, the air dried thin film can be cleaned when being discharged out of the box body, and therefore redundant residues and dust on the surface of the air dried thin film are removed;

(3) through the equal fixedly connected with auxiliary structure in the main casing inboard both ends, auxiliary structure's inside has set gradually the recess, the centre gripping spring, the gyro wheel, fixing bolt, fixed axle and spring groove, it comes from the conveying of second fluting department to work as fashioned film, when the recess of the even fixed connection in main casing inside both ends is inside, the gyro wheel is pressed to the film by the fixed axle under the elasticity that the centre gripping spring was exerted pressure, roll the direction to it, in order to prevent its dislocation winding, damage the machine, start servo motor, the accessible reel carries out the rolling to the film.

Drawings

Fig. 1 is a schematic front view of a cross-sectional structure of the present invention;

fig. 2 is a schematic top view of the cross-sectional structure of the atomizing mechanism of the present invention;

FIG. 3 is a schematic view of the front cross-section structure of the drying mechanism of the present invention;

fig. 4 is a schematic side view of the auxiliary structure of the present invention.

In the figure: 1. a work table; 2. a leak groove; 3. an atomization mechanism; 301. an atomizer; 302. a water tank; 303. a distribution pipe; 304. an atomizing spray head; 305. a three-way pipe; 306. a connecting pipe; 4. a drying mechanism; 401. a first slot; 402. a blower; 403. an electric heating resistance wire; 404. a cleaning brush; 405. a box body; 5. a pillar; 6. a servo motor; 7. a reel; 8. an auxiliary structure; 801. a groove; 802. a clamping spring; 803. a roller; 804. fixing the bolt; 805. a fixed shaft; 806. a spring slot; 9. a main housing; 10. a controller; 11. and a second slot.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.

Referring to fig. 1-4, the present invention provides an embodiment: an atomization structure in a chemical vapor deposition device comprises a workbench 1, a leakage groove 2, a support column 5 and a servo motor 6, wherein one side of the top end of the workbench 1 is fixedly connected with a main shell 9, second open grooves 11 are formed in the inner parts of two sides of the main shell 9, and two ends of the inner side of the main shell 9 are fixedly connected with auxiliary structures 8;

a groove 801, a clamping spring 802, a roller 803, a fixing bolt 804, a fixing shaft 805 and a spring groove 806 are sequentially arranged in the auxiliary structure 8, the grooves 801 are all fixedly connected to two ends of the inner side of the main shell 9, the spring grooves 806 are arranged at two ends of the inner side of the groove 801, one end of each spring groove 806 is fixedly connected with the clamping spring 802, one end of each clamping spring 802 is fixedly connected with the fixing shaft 805, two ends of each fixing shaft 805 are movably connected with the roller 803, and one end of the inner side of the groove 801 is fixedly connected with the fixing bolt 804;

specifically, as shown in fig. 1 and 4, when the mechanism is used, first, when the formed film is conveyed from the second slot 11 and passes through the inside of the groove 801 uniformly and fixedly connected with the two ends inside the main housing 9, the roller 803 is pressed to the film by the fixed shaft 805 under the elastic force of the pressing force of the clamping spring 802 to roll and guide the film, so as to prevent the film from being wound in a staggered way and damaging the machine;

a controller 10 is fixedly connected to one side of the top end of the outer part of the main shell 9, a leakage groove 2 is uniformly arranged in the middle position of the inner part of the bottom end of the main shell 9, and an atomizing mechanism 3 is fixedly connected to one side of the bottom end of the workbench 1;

an atomizer 301, a water tank 302, a distribution pipe 303, an atomizing spray head 304, a three-way pipe 305 and a connecting pipe 306 are sequentially arranged in the atomizing mechanism 3, the water tank 302 is fixedly connected to one side of the bottom end of the workbench 1, the bottom end of the water tank 302 is fixedly connected with the atomizer 301, the type of the atomizer 301 can be ISW40-200, the output end of the atomizer 301 is fixedly connected with the connecting pipe 306, the three-way pipe 305 is fixedly connected to the connecting pipe 306, and the distribution pipe 303 is fixedly connected to both ends of the three-way pipe 305;

both sides of one end of the distribution pipe 303 are fixedly connected with atomizing nozzles 304, and the atomizing nozzles 304 are symmetrically distributed about the vertical median line of the main shell 9;

specifically, as shown in fig. 1 and 2, when the mechanism is used, firstly, the atomizer 301 is started to atomize the liquid material in the water tank 302, and the liquid material is respectively conveyed to the inside of the distribution pipe 303 through the connecting pipe 306 and the three-way pipe 305, and the liquid material is uniformly sprayed on the two sides of the film when the film is conveyed, so that the two sides of the film are uniformly covered with the mist liquid, and if the mist inside the main housing 9 is too heavy, the mist can also flow into the water tank 302 through the leakage groove 2 inside the bottom end of the main housing 9, so as to be recycled, and avoid waste;

the other side of the top end of the workbench 1 is fixedly connected with a drying mechanism 4;

the drying mechanism 4 is internally provided with a first slot 401, a blower 402, an electric heating resistance wire 403, a cleaning brush 404 and a box body 405 in sequence, the box body 405 is fixedly connected to one side of the top end of the workbench 1, the first slot 401 is arranged inside both sides of the box body 405, the blower 402 is fixedly connected inside one end of the box body 405, the type of the blower 402 can be RB-81D-2, and the electric heating resistance wire 403 is fixedly connected to one end inside the blower 402;

cleaning brushes 404 are uniformly arranged between two ends of the first slot 401, and the cleaning brushes 404 are all positioned on the same horizontal plane;

specifically, as shown in fig. 1 and 3, when the mechanism is used, firstly, the blower 402 is turned on, the drying temperature in the box 405 is adjusted through the electric heating resistance wire 403, so that the air drying speed of the liquid on the surface of the thin film is accelerated, and the cleaning brushes 404 are symmetrically distributed in the first slot 401 on the right side of the first slot, so that the air-dried thin film can be cleaned when being discharged out of the box 405, and the redundant residues and dust on the surface of the air-dried thin film can be removed;

all fixedly connected with pillar 5 in four corners of 1 bottom of workstation, one side fixedly connected with servo motor 6 on 1 top of workstation, servo motor 6's model can be KY60AS0201-30, servo motor 6's output fixedly connected with reel 7.

The working principle is as follows: the utility model discloses when using, at first, convey from second fluting 11 as fashioned film, when the recess 801 of the even fixed connection in the inside both ends of main casing body 9 is inside, gyro wheel 803 is pressed to the film by fixed axle 805 under the elasticity that centre gripping spring 802 was exerted pressure, rolls the direction to it to prevent its dislocation winding, damage the machine, then start servo motor 6, carry out the rolling with reel 7 to the film.

Then, the atomizer 301 is started to atomize the liquid material in the water tank 302 and respectively deliver the liquid material to the interior of the distribution pipe 303 through the connecting pipe 306 and the three-way pipe 305, and the liquid material is uniformly sprayed on the two sides of the film when the film is delivered, so that the two sides of the film are uniformly covered with the mist liquid, and if the mist in the main shell 9 is too heavy, the mist can also flow into the water tank 302 through the leakage groove 2 in the bottom end of the main shell 9, so that the mist can be recycled, and waste is avoided.

And finally, turning on the blower 402, adjusting the drying temperature in the box body 405 through the electric resistance wire 403, so as to accelerate the air drying speed of the liquid on the surface of the film, and cleaning brushes 404 are symmetrically distributed in the first groove 401 on the right side of the first groove, so that the air-dried film can be cleaned when being discharged out of the box body 405, and therefore, redundant residues and dust on the surface of the air-dried film can be removed.

It is obvious to a person skilled in the art that the invention is not restricted to details of the above-described exemplary embodiments, but that it can be implemented in other specific forms without departing from the spirit or essential characteristics of the invention. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.

Claims

1. The utility model provides an atomizing structure among chemical vapor deposition device, includes workstation (1), small opening (2), pillar (5) and servo motor (6), its characterized in that: one side of the top end of the workbench (1) is fixedly connected with a main shell (9), second slots (11) are arranged inside the two sides of the main shell (9), the two ends of the inner side of the main shell (9) are fixedly connected with auxiliary structures (8), one side of the top end of the outer part of the main shell (9) is fixedly connected with a controller (10), the middle position inside the bottom end of the main shell (9) is uniformly provided with a leakage groove (2), one side of the bottom end of the workbench (1) is fixedly connected with an atomizing mechanism (3), the other side of the top end of the workbench (1) is fixedly connected with a drying mechanism (4), four corners of the bottom end of the workbench (1) are fixedly connected with supporting columns (5), one side fixedly connected with servo motor (6) on workstation (1) top, and the output fixedly connected with reel (7) of servo motor (6).

2. The atomizing structure of a chemical vapor deposition apparatus according to claim 1, wherein: the inside of atomizing mechanism (3) has set gradually atomizer (301), water tank (302), distributing pipe (303), atomizer (304), three-way pipe (305) and connecting pipe (306), one side at workstation (1) bottom is connected to water tank (302) fixed connection, the bottom fixedly connected with atomizer (301) of water tank (302), and the output fixedly connected with connecting pipe (306) of atomizer (301), fixedly connected with three-way pipe (305) on connecting pipe (306), and all fixedly connected with distributing pipe (303) in the both ends of three-way pipe (305).

3. The atomizing structure of a chemical vapor deposition apparatus according to claim 2, wherein: both sides of one end of the distribution pipe (303) are fixedly connected with atomizing nozzles (304), and the atomizing nozzles (304) are symmetrically distributed around the vertical middle line of the main shell (9).

4. The atomizing structure of a chemical vapor deposition apparatus according to claim 1, wherein: the inside of stoving mechanism (4) has set gradually first fluting (401), air-blower (402), electric heat resistance silk (403), cleaning brush (404) and box (405), one side on workstation (1) top is connected to box (405) fixed connection, the inside of box (405) both sides all is provided with first fluting (401), the inside fixedly connected with air-blower (402) of box (405) one end, and the inside one end fixedly connected with electric heat resistance silk (403) of air-blower (402).

5. The atomization structure of a chemical vapor deposition apparatus according to claim 4, wherein: cleaning brushes (404) are uniformly arranged between two ends of the first open groove (401), and the cleaning brushes (404) are all positioned on the same horizontal plane.

6. The atomizing structure of a chemical vapor deposition apparatus according to claim 1, wherein: auxiliary structure (8)'s inside has set gradually recess (801), centre gripping spring (802), gyro wheel (803), fixing bolt (804), fixed axle (805) and spring groove (806), all fixed connection are at the inboard both ends of main casing body (9) for recess (801), the inside both ends of recess (801) all are provided with spring groove (806), and the one end of spring groove (806) all fixedly connected with centre gripping spring (802), the one end all fixedly connected with fixed axle (805) of centre gripping spring (802), and the both ends all swing joint of fixed axle (805) have gyro wheel (803), the inboard one end all fixedly connected with fixing bolt (804) of recess (801).