CN212713274U - High-transmittance high-reflection double-silver low-emissivity coated glass capable of being thermally processed - Google Patents
High-transmittance high-reflection double-silver low-emissivity coated glass capable of being thermally processed Download PDFInfo
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Abstract
The application provides high-transmittance high-reflection double-silver low-radiation coated glass capable of being thermally processed, which comprises a glass substrate, a substrate layer arranged on the glass substrate, a multifunctional composite layer and a medium protective layer, wherein the multifunctional composite layer and the medium protective layer are sequentially stacked on the substrate layer; and a dielectric layer is arranged between the glass substrate and the substrate layer, and the refractive index of the dielectric layer is 1.50-1.60. Compared with the prior art, the scheme provided by the application has high reflectivity while having high transmissivity, and simultaneously has better physical and chemical properties, thereby being convenient for large-scale production and popularization and application.
Description
Technical Field
The application belongs to the technical field of coated glass, and particularly relates to high-transmission high-reflection glass.
Background
Most of the current high-reflection double-silver coated glass has low transmittance, presents a mirror surface effect, is generally used for heat insulation in southern buildings, and has low transmittance in the conventional product design. Even when the transmittance is improved, the physicochemical properties of the film are drastically reduced, for example, the film is easily oxidized, the reflectance is reduced, and the mechanical properties are deteriorated. The high-transmittance low-reflection of the common double-silver coated glass is common, the product generally shows high-transmittance appearance, but sometimes some glasses are required to have high transmittance and high reflectivity, so that the appearance shows a crystal effect, and the double-silver coated glass has good physical and chemical properties, so that the double-silver coated glass is convenient for large-scale production, popularization and application.
In the existing production technology, in order to achieve the effect of high reflectivity and high transmittance, a metal protective layer material in a metal composite layer is generally required to be thinned, so that the absorption of light is reduced, and meanwhile, in order to achieve the purpose of high reflectivity, the thicknesses of a composite dielectric layer and a dielectric layer are generally required to be thinned, so that Na + in a glass base layer easily attacks a metal film material, so that the performance of the metal film material is reduced, which is particularly prominent when a coated glass product is subjected to hot processing, and the common similar products in the market at present cannot meet the requirements of hot processing, or the product is easily oxidized.
SUMMERY OF THE UTILITY MODEL
An object of the embodiment of the application is to provide a high-transmittance high-reflectance hot-processable double-silver low-emissivity coated glass, so as to solve the technical problems that the double-silver coated glass in the prior art is high in transmittance, low in reflectance and poor in physical and chemical properties.
In order to achieve the purpose, the technical scheme adopted by the application is as follows: the glass substrate, the substrate layer arranged on the glass substrate, the multifunctional composite layer and the medium protective layer are sequentially stacked on the substrate layer;
and a dielectric layer is arranged between the glass substrate and the substrate layer, and the refractive index of the dielectric layer is 1.50-1.60.
Optionally, the dielectric layer is made of: SiO 22Or is doped with Si3N4SiO of (2)2The thickness of the dielectric layer is 20-60 nm.
Optionally, the multifunctional composite layer comprises: the glass substrate comprises a glass substrate and a substrate layer, wherein the glass substrate is provided with a first medium composite layer, a first metal composite layer, a second medium composite layer, a second metal composite layer and a third medium composite layer which are sequentially stacked in the direction from the glass substrate to the substrate layer.
Optionally, the first metal composite layer and the second metal composite layer include: ag layer, Ag + Cu alloy layer, NiCr layer, Nb layer, Ti layer, TiO layer2In layers, and NiCrOx layersOne or more layers.
Optionally, the thicknesses of the first metal composite layer and the second metal composite layer are 10 to 25nm respectively.
Optionally, the first dielectric composite layer comprises: si3N4Layer, TiO2Layer, ZnO layer, SnO2Layer and SnZnOxOne or more of the layers, the first dielectric composite layer having a thickness of: 3-15 nm.
Optionally, the second dielectric composite layer comprises: si3N4Layer, TiO2Layer, ZnO layer, SnO2Layered, ZnO-doped SnO2One or more of the layers, the second dielectric layer is 60-100 nm thick.
Optionally, the third dielectric composite layer comprises: si3N4Layer, TiO2Layer, ZnO layer, SnO2Layered, ZnO-doped SnO2One or more layers of the layers, and the thickness of the third medium composite layer is 30-70 nm.
Optionally, the dielectric protective layer comprises: TiO 22Layer, ZrO2Layer, doped Si3N4ZrO of2Layer or doping of Si3N4Zr (b) of3N4One or more of the layers have a thickness of 3-10 nm.
The application provides a high transmission high reflection glass's beneficial effect lies in: compared with the prior art, the high-transmittance and high-reflection hot-working double-silver low-emissivity coated glass does not need to thin the thickness of the composite dielectric layer, has high transmittance and high reflectivity and good physical and chemical properties, and is convenient for large-scale production, popularization and application.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the embodiments or the prior art descriptions will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without inventive exercise.
FIG. 1 is a schematic structural diagram of a high-transmittance high-reflectance glass provided in an embodiment of the present application;
FIG. 2 is a schematic structural diagram of a high-transmittance and high-reflectance glass provided in an embodiment of the present application;
FIG. 3 is a schematic structural view of a high-transmittance and high-reflectance glass provided in example II of the present application;
FIG. 4 is a schematic structural view of a highly transmissive and highly reflective glass provided in example III of the present application;
wherein, in the figures, the respective reference numerals:
1-a glass substrate; 2-a dielectric layer; 3-a first dielectric composite layer; 4-a first metal composite layer; 5-a second dielectric composite layer; 6-a second metal composite layer; 7-a third dielectric composite layer; 8-a dielectric protective layer;
101-a glass substrate; 102-a dielectric layer; 103-a first dielectric composite layer; 104-a first silver ion metal composite layer; 104a-Ag layer; 104b-NiCrOxA layer; 105-a second dielectric composite layer; 105a-SnO2A layer; 105b-ZnO layer; 106-a second silver-ion metal composite layer; 106a-Ag layer; 106b-NiCrOxA layer; 107-third dielectric composite layer; 107a-ZnO layer; 107b-Si3N4A layer; 108-a dielectric protective layer;
201-a glass substrate; 202-a dielectric layer; 203-a first dielectric composite layer; 204-a first silver-ion metal composite layer; 204a-Ag layer; 204b-NiCrOxA layer; 205-a second dielectric composite layer; 205a-SnO2A layer; 205 b-a ZnO layer; 206-a second silver-ion metal composite layer; 206a-Ag layer; 206b-NiCrOxA layer; 207-a third media composite layer; 207a-ZnO layer; 207b-Si3N4A layer; 208-a dielectric protective layer;
301-a glass substrate; 302-a dielectric layer; 303-a first dielectric composite layer; 304-a first silver-ion metal composite layer; 304a-Ag layer; 304b-NiCr layer; 305-a second dielectric composite layer; 305a-SnO2A layer; 305 b-a ZnO layer; 306-a second silver-ion metal composite layer; 306a-Ag layer; 306 b-a NiCr layer; 307-a third media composite layer; 307a-ZnO layer; 307b-Si3N4A layer; 308-dielectric protective layer.
Detailed Description
In order to make the technical problems, technical solutions and advantageous effects to be solved by the present application clearer, the present application is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present application and are not intended to limit the present application.
It should be noted that the terms "first" and "second" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present application, "a plurality" means two or more unless specifically limited otherwise.
Referring to fig. 1, a thermally processable dual-silver low-emissivity coated glass with high transmittance and high reflectance provided by the embodiment of the present application will be described. The high-transmittance high-reflection double-silver low-radiation coated glass capable of being thermally processed comprises the following structures: the glass substrate comprises a glass substrate 1, a dielectric layer 2, a first dielectric composite layer 3, a first metal composite layer 4, a second dielectric composite layer 5, a second metal composite layer 6, a third dielectric composite layer 7 and a dielectric protective layer 8.
Furthermore, in the glass substrate 1, the glass is common transparent float glass, and is rinsed by deionized water and dried; the dielectric layer 2 is arranged on the glass substrate 1 and is synthesized by 1 transparent dielectric layer, and the used film layer materials comprise: SiO 22Or SiO2And Si3N4The thickness of the mixture film is 20 nm-40 nm, and the layer plays a role in bonding the whole film layer with glass and has a certain protection effect on the whole film layer. The medium layer 2 has similar components to the glass substrate 1, has the same refractive index, and does not affect the transmittance and reflectivity of light.
The first composite medium layer 3 is arranged on the medium layer 2 and is synthesized by one or more layers of transparent medium layers, and the used film layer materials comprise: si3N4、SiO2、TiO2、ZnO、SnO2、SnO2One or more of ZnO and 3-15 nm thick, and the layer is used as metal silverThe function of the coating seed layer of the layer. The first metal composite layer 4 is arranged on the first composite medium layer 3, is synthesized by one or more metal layers, and can be made of the following film materials: ag. Cu, NiCr, Nb, Ti, TiO2，NiCrOxOne or more of (a). Wherein, Ni in NiCr: the mass ratio of Cr is 75: 25; NiCrOxAnd Ni: the mass ratio of Cr is 75: 25, X is 0.1-1. The thickness of the first metal composite layer 4 is 10 nm-25 nm, and the layer is a low-radiation metal layer and has the functions of improving the glass performance and adjusting the color.
The second medium composite layer 5 is arranged on the metal composite layer 4 and is synthesized by one or more layers of transparent medium layers, and the used film layer materials comprise: si3N4、SiO2、TiO2、ZnO、SnO2、Si3N4With SiO2Mixed, SnO2One or more of the ZnO and the dielectric layer between the two metals are mixed, the thickness is 60 nm-100 nm, and the dielectric layer between the two metals is used for interference and plays a role in adjusting color. The second metal composite layer 6 is disposed on the medium composite layer 5, and the second metal composite layer 6 has the same structure and function as the first metal composite layer 4, which is not described herein again.
The third medium composite layer 7 is arranged on the second metal composite layer 6 and is synthesized by one or more layers of transparent medium layers, and the used film layer materials comprise: si3N4、SiO2、TiO2、ZnO、SnO2、Si3N4With SiO2Mixed, SnO2One or more of the ZnO and the mixture are mixed, the thickness is 30 nm-70 nm, and the layer is an external interference layer and plays a role in adjusting color. The medium protective layer 8 is arranged on the medium composite layer 7 and is synthesized by 1 transparent medium layer, and the used film layer materials comprise: TiO 22、ZrO2、Si3N4And ZrO2Mixture, or Si3N4And Zr3N4One or more of the mixtures with the thickness of 3 nm-10 nm are hard compact materials and are used as protective layers.
The preparation process of the high-transmission high-reflection double-silver low-emissivity coated glass capable of being thermally processed comprises the following steps:
1. rinsing the glass substrate with pure water by a cleaning machine, and drying;
2. the glass is conveyed to enter vacuum chambers at all stages in sequence and enter a high vacuum area from the atmospheric environment;
3. conveying the glass into a sputtering area, sequentially plating by a magnetron sputtering cathode provided with the 2-8 layer materials: the device comprises a medium layer 2, a first medium composite layer 3, a first metal composite layer 4, a second medium composite layer 5, a second metal composite layer 6, a third medium composite layer 7 and a medium protective layer 8;
4. after the plating is finished, the glass is conveyed into vacuum chambers of all stages in sequence and enters the atmosphere environment from a high vacuum area;
5. entering the next process flow or packaging.
The high-transmittance high-reflection double-silver low-emissivity coated glass capable of being thermally processed in the embodiment of the application has the advantages that the reflectivity is improved, the physical thickness is increased, the physical and chemical properties are enhanced, and meanwhile, the optical properties of a coated product cannot be influenced. The dielectric layer of the utility model adopts the material close to the glass material, the refractive index is 1.5, and SiO is plated on the glass2The film can not generate any influence on the optical performance of the glass, which is equivalent to the fact that other film layers are directly plated on the glass, but the physical thickness of the film layer is increased, so that Na + of glass seeds can be well blocked, and the film layer can be well protected; at the same time, except for pure SiO2The material can also use SiO with large proportion in the occasion with low requirement and considering the stability of the process2Doping with small amounts of Si3N4The method is carried out. Therefore, the selection range of the material of the dielectric layer is enlarged, and the processability and the physical property are improved.
That is, the dielectric layer is arranged between the glass substrate and the dielectric composite layer, the dielectric composite layer and the metal composite layer can be used as a bedding, the thicknesses of the dielectric composite layer and the metal composite layer are reduced while high transmissivity and high reflectivity are kept, and the coating film layer can be prevented from being oxidized or being coated by Na in the glass substrate+And (5) attacking.
Example one
Referring to fig. 2, a thermally processable double-silver low-emissivity coated glass with high transmittance and high reflectance provided by the embodiment of the present application will be described. The high-transmittance high-reflectance thermally processable double-silver low-emissivity coated glass in the embodiment comprises: the glass substrate comprises a common white glass substrate 101, a dielectric layer 102, a first dielectric composite layer 103, a first silver ion metal composite layer 104, a second dielectric composite layer 105, a second silver ion metal composite layer 106, a third dielectric composite layer 107 and a dielectric protective layer 108 which are sequentially stacked.
Wherein the dielectric layer 102 is SiO2The dielectric layer 102 is provided on the glass substrate 101 and has a thickness of 30 nm. The first dielectric composite layer 103 is arranged on the dielectric layer 102, the first dielectric composite layer 103 is a ZnO layer, and the thickness of the ZnO layer is 5 nm.
The first silver ion metal composite layer 104 includes an Ag layer 104a provided on the first dielectric composite layer 103, and NiCrO provided on the Ag layer 104axLayer 104 b. Ag layer 104a having a thickness of 16.3nm and NiCrOxThe thickness of the layer 104b is 0.5nm, and the thickness of the first silver ion metal composite layer 104 having the protective function, which is composed of them together, is 16.8 nm.
The second dielectric composite layer 105 includes SnO provided on the first silver ion metal composite layer 1042 Layer 105a and SnO2A ZnO layer 105b on the layer 105 a. SnO2The layer 105a had a thickness of 59nm and the ZnO layer 105b had a layer thickness of 20nm, and the thickness of the layer that collectively formed the second dielectric composite layer 105 was 79 nm.
The second silver ion metal composite layer 106 includes an Ag layer 106a provided on the second dielectric composite layer 105, and NiCrO provided on the Ag layer 106axLayer 106 b. Ag layer 106a was 15.6nm thick and NiCrOxThe thickness of the layer 106b is 0.5nm, and the thickness of the second silver ion metal composite layer 106 having the protective function, which is composed of them together, is 16.1 nm.
The third dielectric composite layer 107 includes a ZnO layer 107a provided on the second silver ion metal composite layer 106, and Si provided on the ZnO layer 107a3N4Layer 107 b. The ZnO layer 107a had a thickness of 10nm and Si3N4The thickness of the layer 107b was 23nm, and the thickness of the layer that collectively formed the third dielectric composite layer 107 was 33 nm.
The dielectric protective layer 108 includesZrO formed on the third dielectric composite layer 1072Layer of ZrO2The thickness of the layer was 5 nm.
In this embodiment, the preparation method of the high-transmittance high-reflectance thermally processable double-silver low-emissivity coated glass comprises the following steps: the method comprises the steps of utilizing a flat glass double-end continuous magnetron sputtering film plating machine, adopting the process parameters listed in the following table 1, using 18 alternating current rotating cathodes, 4 direct current planar cathodes and 22 cathodes for production, and preparing the low-radiation coated glass with high permeability, high reflectivity, high performance and low radiation effect according to the film layer sequence, wherein the specific cathodes and the process parameters are listed in the following table 1:
TABLE 1
Wherein the process running speed is 600cm/min, and the openings of the planar cathode are 260 mm; the ratio between the materials used and the process gas in parentheses is the mass ratio of the two elements.
After the double-silver low-emissivity coated glass with high transmittance, high reflectivity and high performance effect prepared according to the process parameters in the table 1 is subjected to heat treatment processing, optical performance test is carried out, and the test results are as follows:
visible light transmittance on the surface of the dielectric protective layer 108: 71%, transmission color: a ═ 3.5, b ═ 3.8;
visible light reflectance of the surface of the dielectric protective layer 108: 15%, reflection color: a ═ 7.5, b ═ 10.5;
visible light reflectance of the ordinary white glass substrate 1: 18%, reflection color: a is 0 and b is-10.5.
The radiance is 0.03, the transmittance is 64 percent after the hollow glass is synthesized, the reflectivity is 22 percent, the national standard shading coefficient is 0.41, the photo-thermal ratio reaches 1.71, and the performances of other products meet the requirements of GB/T18915.2-2013.
Example two
Referring to fig. 3, a thermally processable dual-silver low-emissivity coated glass with high transmittance and high reflectance provided by the embodiment of the present application will be described. The high-transmittance high-reflectance thermally processable double-silver low-emissivity coated glass in the embodiment comprises: the glass substrate comprises a common white glass substrate 201, a dielectric layer 202, a first dielectric composite layer 203, a first silver ion metal composite layer 204, a second dielectric composite layer 205, a second silver ion metal composite layer 206, a third dielectric composite layer 207 and a dielectric protective layer 208 which are sequentially stacked.
Wherein the dielectric layer 202 is SiO2The dielectric layer 202 is disposed on the glass substrate 201 and has a thickness of 30 nm. The first dielectric composite layer 203 is arranged on the dielectric layer 202, the first dielectric composite layer 203 is a ZnO layer, and the thickness of the ZnO layer is 3 nm.
The first silver ion metal composite layer 204 includes an Ag layer 204a provided on the first dielectric composite layer 203, and NiCrO provided on the Ag layer 204axLayer 204 b. The Ag layer 204a has a thickness of 16.0nm and a NiCrO layerxThe thickness of the layer 204b is 0.3nm, and the thickness of the first silver ion metal composite layer 204 with the protective function, which is composed of the layers, is 16.3 nm.
The second dielectric composite layer 205 includes SnO disposed on the first silver-ion metal composite layer 2042 Layer 205a and provided in SnO2A ZnO layer 205b on the layer 205 a. SnO2The layer 205a had a thickness of 60nm and the ZnO layer 205b had a layer thickness of 21nm, and they collectively formed the second dielectric composite layer 205 having a thickness of 81 nm.
The second silver ion metal composite layer 206 includes an Ag layer 206a provided on the second dielectric composite layer 205, and NiCrO provided on the Ag layer 206axLayer 206 b. Ag layer 206a was 15.0nm thick and NiCrOxThe thickness of the layer 206b is 0.3nm, and the thickness of the second silver ion metal composite layer 206 having the protective function, which is composed of the layers, is 15.3 nm.
The third dielectric composite layer 207 includes a ZnO layer 207a provided on the second silver ion metal composite layer 206, and Si provided on the ZnO layer 207a3N4Layer 207 b. The ZnO layer 207a has a thickness of 10nm and Si3N4The thickness of the layer 207b is 27nm, and the thickness of the layer that collectively forms the third dielectric composite layer 207 is 37 nm.
The dielectric protection layer 208 includes ZrO formed on the third dielectric composite layer 2072Layer of ZrO2The thickness of the layer was 3 nm.
In this embodiment, the preparation method of the high-transmittance high-reflectance glass includes: the method comprises the steps of utilizing a flat glass double-end continuous magnetron sputtering film plating machine, adopting the process parameters listed in the following table 2, using 18 alternating current rotating cathodes, 4 direct current planar cathodes and 22 cathodes for production, and preparing the low-radiation coated glass with high permeation, high reflection, high performance and low radiation effect according to the film layer sequence, wherein the specific cathodes and the process parameters are shown in the following table 2:
TABLE 2
Wherein the process running speed is 600cm/min, and the openings of the planar cathode are all 220 mm; the ratio in the column for the materials used, process gas, is the mass ratio of the two elements.
After the double-silver low-emissivity coated glass with high transmittance, high reflectivity and high performance effect prepared according to the process parameters in the table 1 is subjected to heat treatment processing, optical performance test is carried out, and the test results are as follows:
visible light transmittance on the surface of the dielectric protective layer 208: 67%, transmission color: a ═ 3, b ═ 2.5;
visible light reflectance on the surface of the dielectric protective layer 208: 15%, reflection color: a ═ -12, b ═ -7;
visible light reflectance of the ordinary white glass substrate 201: 18%, reflection color: a is-2, b is-9.
The radiance is 0.03, the transmittance is 61 percent after the hollow glass is synthesized, the reflectivity is 22 percent, the national standard shading coefficient is 0.40, the photo-thermal ratio reaches 1.75, and the performances of other products meet the requirements of GB/T18915.2-2013.
EXAMPLE III
Referring to fig. 4, a thermally processable dual-silver low-emissivity coated glass with high transmittance and high reflectance provided by the embodiment of the present application will be described. The high-transmittance high-reflectance thermally processable double-silver low-emissivity coated glass in the embodiment comprises: the glass substrate comprises a common white glass substrate 301, a dielectric layer 302, a first dielectric composite layer 303, a first silver ion metal composite layer 304, a second dielectric composite layer 305, a second silver ion metal composite layer 306, a third dielectric composite layer 307 and a dielectric protection layer 308 which are sequentially stacked.
Wherein the dielectric layer 302 is SiNxOyA dielectric layer 302 was formed on the glass substrate 301 to a thickness of 20 nm. The first dielectric composite layer 303 is disposed on the dielectric layer 302, the first dielectric composite layer 303 is a ZnO layer, and the thickness of the ZnO layer is 5 nm.
The first silver-ion metal composite layer 304 includes an Ag layer 304a provided on the first dielectric composite layer 303, and an NiCr layer 304b provided on the Ag layer 304 a. The thickness of the Ag layer 304a is 19.0nm, the thickness of the NiCr layer 304b is 0.3nm, and the thickness of the first silver ion metal composite layer 304 with the protection function which is jointly formed by the Ag layer 304a and the NiCr layer is 19.3 nm.
The second dielectric composite layer 305 includes SnO disposed on the first silver-ion metal composite layer 3042 Layer 305a and provided in SnO2A ZnO layer 305b on layer 305 a. SnO2The layer 305a had a thickness of 61nm and the ZnO layer 305b had a layer thickness of 22nm, and the thickness of the layer that collectively formed the second dielectric composite layer 305 was 83 nm.
The second silver-ion metal composite layer 306 includes an Ag layer 306a provided on the second dielectric composite layer 305, and an NiCr layer 306b provided on the Ag layer 306 a. The thickness of the Ag layer 306a is 17.0nm, the thickness of the NiCr layer 306b is 0.3nm, and the thickness of the second silver ion metal composite layer 306 with the protection function which is formed by the Ag layer and the NiCr layer is 17.3 nm.
The third dielectric composite layer 307 includes a ZnO layer 307a provided on the second silver ion metal composite layer 306, and Si provided on the ZnO layer 307a3N4Layer 307 b. The ZnO layer 307a was 10nm thick and Si was3N4The layer 307b has a thickness of 24nm and the thickness that collectively form the third dielectric composite layer 307 is 34 nm.
Dielectric protective layer308 comprises ZrO formed on the third dielectric composite layer 3072Layer of ZrO2The thickness of the layer was 5 nm.
In this embodiment, the preparation method of the high-transmittance high-reflectance glass includes: the method comprises the steps of utilizing a flat glass double-end continuous magnetron sputtering film plating machine, adopting the process parameters listed in the following table 2, using 18 alternating current rotating cathodes, 4 direct current planar cathodes and 22 cathodes for production, and preparing the low-radiation coated glass with high permeation, high reflection, high performance and low radiation effect according to the film layer sequence, wherein the specific cathodes and the process parameters are shown in the following table 3:
TABLE 3
Wherein the process running speed is 600cm/min, and the openings of the planar cathode are all 220 mm; the ratio in the column for the materials used, process gas, is the mass ratio of the two elements.
After the double-silver low-emissivity coated glass with high transmittance, high reflectivity and high performance effect prepared according to the process parameters in the table 1 is subjected to heat treatment processing, optical performance test is carried out, and the test results are as follows:
visible light transmittance on the surface of the dielectric protective layer 308: 60%, transmission color: a-4, b-3;
visible light reflectance on the surface of the dielectric protective layer 308: 21%, reflection color: a ═ -10, b ═ -7;
visible light reflectance of the ordinary white glass substrate 1: 26%, reflection color: a is 0 and b is-9.
The emissivity is 0.03, the transmittance is 55 percent after the hollow glass is synthesized, the reflectivity is 28 percent, the national standard shading coefficient is 0.35, the photo-thermal ratio reaches 1.79, and the performances of other products meet the requirements of GB/T18915.2-2013.
Through the technical scheme, the dielectric layer is arranged between the glass substrate and the dielectric composite layer, the dielectric composite layer and the metal composite layer can be used as a bedding, the thicknesses of the dielectric composite layer and the metal composite layer are reduced while high transmissivity and high reflectivity are kept, and the dielectric composite layer and the metal composite layer can be used for further improving the heat dissipation performance of the glass substratePrevent the coating film layer from being oxidized or being Na in the glass substrate+And (5) attacking. In conclusion, the high transmission high reflection glass that this application provided's beneficial effect lies in: compared with the prior art, the high-transmission high-reflection glass has high transmissivity and high reflectivity, also has better physical and chemical properties, processability and stability, and is convenient for large-scale production, popularization and application.
The above description is only exemplary of the present application and should not be taken as limiting the present application, as any modification, equivalent replacement, or improvement made within the spirit and principle of the present application should be included in the protection scope of the present application.
Claims (3)
1. The high-transmittance high-reflection double-silver low-emissivity coated glass capable of being thermally processed is characterized by comprising a glass substrate, a substrate layer arranged on the glass substrate, a multifunctional composite layer and a dielectric protective layer, wherein the multifunctional composite layer and the dielectric protective layer are sequentially stacked on the substrate layer; and a dielectric layer is further arranged between the glass substrate and the substrate layer, and the refractive index of the dielectric layer is 1.50-1.60.
2. The high transmission high reflection dual silver low emissivity coated glass of claim 1, wherein said multifunctional composite layer comprises: and the first medium composite layer, the first metal composite layer, the second medium composite layer, the second metal composite layer and the third medium composite layer are sequentially stacked in the direction from the glass substrate to the substrate layer.
3. The thermally processable double-silver low-emissivity coated glass with high transmittance and high reflectance according to claim 2, wherein the thickness of the first metal composite layer and the second metal composite layer is 10nm to 25 nm.
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| CN113173712A (en) * | 2021-05-25 | 2021-07-27 | 广东旗滨节能玻璃有限公司 | Low-emissivity coated glass and preparation method thereof |
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| CN113173712A (en) * | 2021-05-25 | 2021-07-27 | 广东旗滨节能玻璃有限公司 | Low-emissivity coated glass and preparation method thereof |
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