CN210481206U - Ultralow-reflection low-transmittance double-silver low-emissivity coated glass - Google Patents
Ultralow-reflection low-transmittance double-silver low-emissivity coated glass Download PDFInfo
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Abstract
The utility model relates to a coated glass technical field specifically provides a but two silver low radiation coated glass of ultralow anti-low transmittance. The coated glass comprises a glass substrate, and a first dielectric film layer, an optical refraction film layer, a second dielectric film layer, a first function protection film layer, a third dielectric film layer, a second function protection film layer and a fourth dielectric film layer which are sequentially stacked outwards from the surface of the glass substrate. The utility model discloses the reflectivity of coated glass monolithic that obtains is less than 7% between 4 ~ 5%, makes cavity glass back reflectivity, and realizes the effect of low seeing through, is fit for as the two silver low-emissivity coated glass of building.
Description
Technical Field
The utility model belongs to the technical field of coated glass, concretely relates to two silver low-emissivity coated glass of ultralow reflection low transmittance.
Background
The coated glass is a glass which is coated with one or more layers of metal, alloy or metal compound films on the surface of the glass so as to change the optical performance of the glass and meet specific requirements. Coated glass can be divided into two categories according to different functions: solar control coated glass and low emissivity coated glass.
The sunlight control coated glass is a product which achieves a sun-shading effect through simple full-wave-band undifferentiated reflection of sunlight and does not have a low-radiation effect; the low-radiation coated glass is a product which can achieve the sun-shading effect by selectively reflecting the near-infrared wave band of sunlight, and has the low-radiation effect.
With the development of the coating technology, the market has higher and higher requirements on products, and the outer wall of a building is required not to influence the surrounding environment while pursuing performance, so that the building glass is required to have extremely low reflectivity, the interference to the sight of people is reduced through low reflectivity, the light pollution is reduced or even stopped, and the heat island effect is reduced, and the low transparency can meet the requirement of people on privacy. In addition, buildings are also required to have rich exterior colors.
However, the silver technology level of the mainstream double-silver product in the market at present is limited, the reflectivity of the product after being hollow is mainly more than 10%, and few products with the reflectivity within 7% are available, particularly, the product which can be tempered is more difficult to achieve the reflectivity less than 7%, and the products which simultaneously meet the requirements of the reflectivity less than 7% and the transmittance less than 40% are few. This makes the designer have little space to choose when designing the building, often the building can't meet the designer's requirement, or has reached the designer's design requirement but can't reach the city's requirement for the building.
Disclosure of Invention
To the problem that the unable reflectivity that realizes of present ordinary two silver low emissivity coated glass is less than 7% and causes easily, the utility model provides a two silver low emissivity coated glass of super low reflection and low transmittance.
In order to realize the purpose of the utility model, the technical scheme of the utility model is as follows:
the ultralow-reflection low-transmittance double-silver low-radiation coated glass comprises a glass substrate, a first dielectric film layer laminated on the surface of the glass substrate, an optical refraction film layer laminated on the surface of the first dielectric film layer, a second dielectric film layer laminated on the surface of the optical refraction film layer, a first functional film layer laminated on the surface of the second dielectric film layer, a first functional protective film layer laminated on the surface of the first functional film layer, a third dielectric film layer laminated on the surface of the first functional protective film layer, a second functional film layer laminated on the surface of the third dielectric film layer, a second functional protective film layer laminated on the surface of the second functional film layer and a fourth dielectric film layer laminated on the surface of the second functional protective film layer.
Preferably, the first functional film layer is at least one of a silver film layer and an AgCu20 film layer, and the thickness is 5 nm-8 nm; the second functional film layer is at least one of a silver film layer and an AgCu20 film layer, and the thickness of the second functional film layer is 10 nm-15 nm. Note that, in the present invention, AgCu20 refers to a silver-copper alloy.
Preferably, the first dielectric film layer is TiOxFilm layer, SiOxFilm layer, SiAlOxFilm layer, SiAlNxFilm layer, SiNxOyFilm layer, SiAlNxOyAt least one layer of the film layer has a thickness of 50 nm-70 nm, and x and y represent incomplete oxidation or nitridation.
Preferably, the optical refraction film layer is NiCrNxFilm layer, NiCrOxFilm layer, NbNxFilm layer, NbOxAt least one layer of the film layer has a thickness of 2nm to 8nm, and x represents incomplete oxidation or nitridation.
Preferably, the second dielectric film layer is TiOxFilm layer, SiOx film layer, SiAlOx film layer, SiAlNx film layer, SiNxOyFilm layer, SiAlNxOyFilm layer, ZnOxFilm layer, ZnAlOxFilm layer, ZnSnOxFilm layer, SnOxAt least one layer of the film layer has a thickness of 60 nm-70 nm, and x and y represent incomplete oxidation or nitridation.
Preferably, the first functional protection film layer is a Cr film layer or a CrO film layerxFilm layer, CrNxFilm layer, NiCrOxFilm layer, NiCrNxFilm layer, Nb film layer, NbOxFilm layer, NbNxFilm layer, Ti film layer, TiNxFilm layer, TiOxFilm layer, ZnOxFilm layer, ZnAlOxAt least one layer of the film layer has the thickness of 0.5 nm-6 nm, and x represents incomplete oxidation or nitridation; the second functional protective film layer is a Cr film layer, a CrOx film layer, a CrNx film layer, a NiCrOx film layer and a NiCrN film layerxFilm layer, Nb film layer, NbOxFilm layer, NbNxFilm layer, Ti film layer, TiNxFilm layer, TiOxAt least one layer of the film layer has a thickness of 0.5nm to 6 nm.
Preferably, the third dielectric film layer is made of TiOxFilm layer, SiOxFilm layer, SiAlOxFilm layer, SiAlNxFilm layer, SiNxOyFilm layer, SiAlNxOyFilm layer, ZnOxFilm layer, ZnAlOxFilm layer, ZnSnOxFilm layer, SnOxAt least one layer of the film layer has a thickness of 50 nm-100 nm, and x and y represent incomplete oxidation or nitridation.
Preferably, the fourth dielectric film layer is TiOxFilm layer, SiOxFilm layer, SiAlOxFilm layer, SiAlNxFilm layer, SiNxOyFilm layer, SiAlNxOyFilm layer, ZnOxFilm layer, ZnAlOxFilm layer, ZnSnOxFilm layer, SnOxAt least one layer of the film layer has a thickness of 20nm to 50nm, and x and y represent incomplete oxidation or nitridation.
Preferably, the glass substrate is ordinary white glass.
The invention has the beneficial effects that:
compared with the prior art, the utility model discloses a regulation rete thickness and rete relation make monolithic glass's reflectivity between 4 ~ 5%, make cavity glass back reflectivity and be less than 7%, and the cavity back transmissivity is less than 40% simultaneously and realizes the effect of low seeing through, is fit for as the two silver low emissivity coated glass of building.
Drawings
The invention will be further explained with reference to the drawings and examples, wherein:
FIG. 1 is a schematic structural view of the ultra-low reflection low-transmittance double-silver low-emissivity coated glass of the present invention;
FIG. 2 is a glass surface color curve of the ultralow-reflectivity low-transmittance double-silver low-emissivity coated glass provided in example 1 of the present invention;
FIG. 3 is a film surface color curve of the ultralow-reflectivity low-transmittance double-silver low-emissivity coated glass provided in example 1 of the present invention;
FIG. 4 is a transmittance curve of the ultralow-reflectivity low-transmittance double-silver low-emissivity coated glass provided in example 1 of the present invention;
FIG. 5 is a glass surface color curve of the ultralow-reflectivity low-transmittance double-silver low-emissivity coated glass provided in example 2 of the present invention;
FIG. 6 is a film surface color curve of the ultralow-reflectivity low-transmittance double-silver low-emissivity coated glass provided in example 2 of the present invention;
FIG. 7 is a transmittance curve of the ultralow reflective low-transmittance double-silver low-emissivity coated glass provided in example 2 of the present invention;
FIG. 8 is a glass surface color curve of the ultralow-reflectivity low-transmittance double-silver low-emissivity coated glass provided in example 3 of the present invention;
FIG. 9 is a film surface color curve of the ultralow-reflectivity low-transmittance double-silver low-emissivity coated glass provided in example 3 of the present invention;
FIG. 10 is a transmittance curve of the ultralow reflective low-transmittance double-silver low-emissivity coated glass provided in example 3 of the present invention;
wherein, 1-glass substrate; 2-a first dielectric film layer; 3-an optical refraction film layer; 4-a second dielectric film layer; 5-a first functional film layer; 6-a first functional protective film layer; 7-a third dielectric film layer; 8-a second functional film layer; 9-a second functional protective film layer; 10-a fourth dielectric film layer;
rg represents the reflection value of the glass surface of the coated glass, a (Rg) and b (Rg) represent the color value of the film surface of the coated glass, the more positive the a (Rg) represents the redder the color, the more negative the color represents the greener the color; the more positive b (Rg) indicates the more yellow the color, and the more negative indicates the more blue the color; l (Rg) represents the brightness of the glass surface of the coated glass;
rf represents a reflectance of the film surface of the coated glass; a (Rf) and b (Rf) represent the color value of the film surface of the coated glass, the more positive the a (Rf) represents the more red the color, the more negative the a (Rf) represents the more green the color; more positive b (Rf) indicates more yellow, and more negative b (Rf) indicates more blue; l (Rf): the brightness of the film surface of the coated glass is shown;
tr represents the transmittance of the coated glass; a (Tr) and b (Tr) represent color values transmitted by the coated glass, the more positive the a (Tr) represents the more red the color, and the more negative the a (Tr) represents the more green the color; more positive b (Tr) indicates more yellow, and more negative b (Tr) indicates more blue; l (Tr): indicating the transmitted brightness of the coated glass.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more clearly understood, the present invention is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
It will be understood that when an element is referred to as being "secured to" or "disposed on" another element, it can be directly on the other element or be indirectly on the other element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or be indirectly connected to the other element.
It will be understood that the terms "length," "width," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like are used in an orientation or positional relationship indicated in the drawings for convenience in describing the invention and to simplify the description, and are not intended to indicate or imply that the device or element so referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus should not be construed as limiting the invention.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless specifically limited otherwise.
As shown in fig. 1, the utility model provides an ultralow reflective low-transmittance double-silver low-emissivity coated glass, which comprises a glass substrate 1, a first dielectric film layer 2, an optical refraction film layer 3, a second dielectric film layer 4, a first functional film layer 5, a first functional protective film layer 6, a third dielectric film layer 7, a second functional film layer 8, a second functional protective film layer 9 and a fourth dielectric film layer 10; the film structure of the ultralow-reflection low-transmittance double-silver low-emissivity coated glass is formed by laminating a first dielectric film layer 2 on the surface of a glass substrate 1, laminating an optical refraction film layer 3 on the surface of the first dielectric film layer 2, laminating a second dielectric film layer 4 on the surface of the optical refraction film layer 3, laminating a first functional film layer 5 on the surface of the second dielectric film layer 4, laminating a first functional protective film layer 6 on the surface of the first functional film layer 5, laminating a third dielectric film layer 7 on the surface of the first functional protective film layer 6, laminating a second functional film layer 8 on the surface of the third dielectric film layer 7, laminating a second functional protective film layer 9 on the surface of the second functional protective film layer 8, and laminating a fourth dielectric film layer 10 on the surface of the second functional protective film layer 9.
In a preferred embodiment, the glass substrate 1 is ordinary white float glass (ordinary white glass for short), which reduces the production cost, improves the production efficiency, and avoids the influence of the background color on the final color of the coated glass.
In a preferred embodiment, the thickness of the first dielectric film layer 2 is 50nm to 70 nm. Further preferably, the first dielectric film layer 2 is TiOxFilm layer, SiOxFilm layer, SiAlOxFilm layer, SiAlNxFilm layer, SiNxOyFilm layer, SiAlNxOyAt least one of the layers, x, y representing incomplete oxidation or nitridation. The first dielectric film layer 2 can be effectively combined with the glass substrate 1, the quality of the optical refraction film layer 3 is improved, and the effect of preventing Na in glass is achieved+The alkaline ions diffuse to the film layer and can adjust the glassThe color of (c).
Preferably, the thickness of the optical refraction layer 3 is 2nm to 8nm and NiCrNxFilm layer, NiCrOxFilm layer, NbNxFilm layer, NbOxAt least one of the film layers, which is formed of a material capable of increasing or decreasing the transmittance in the visible light band while improving the deposition quality of the second dielectric film layer 4.
In a preferred embodiment, the thickness of the second dielectric film layer 4 is 60nm to 70 nm. The second dielectric film layer 4 is TiOxFilm layer, SiOx film layer, SiAlOx film layer, SiAlNx film layer, SiNxOyFilm layer, SiAlNxOyFilm layer, ZnOxFilm layer, ZnAlOxFilm layer, ZnSnOxFilm layer, SnOxAt least one of the film layers. The second dielectric film layer 4 serves as a transition layer between the optical refraction film layer 3 and the first functional film layer 5, and can play a role in adjusting the color of the glass.
In a preferred embodiment, the first functional film layer 5 is at least one of a silver film layer and an AgCu20 film layer, and has a thickness of 5nm to 8 nm.
Preferably, the first functional protective film layer 6 is a Cr film layer or CrO film layerxFilm layer, CrNxFilm layer, NiCrOxFilm layer, NiCrNxFilm layer, Nb film layer, NbOxFilm layer, NbNxFilm layer, Ti film layer, TiNxFilm layer, TiOxFilm layer, ZnOxFilm layer, ZnAlOxAt least one of the film layers has a thickness of 0.5nm to 6nm, and x represents incomplete oxidation or nitridation.
In a preferred embodiment, the third dielectric film layer 7 is TiOxFilm layer, SiOxFilm layer, SiAlOxFilm layer, SiAlNxFilm layer, SiNxOyFilm layer, SiAlNxOyFilm layer, ZnOxFilm layer, ZnAlOxFilm layer, ZnSnOxFilm layer, SnOxAt least one layer of the film layer has a thickness of 50 nm-100 nm, and x and y represent incomplete oxidation or nitridation.
Preferably, the second functional film layer 8 is at least one of a silver film layer and an AgCu20 film layer, and the thickness is 10nm to 15nm
Preferably, the second functional protective film 9 is a Cr film, a CrOx film, a CrNx film, a NiCrOx film, a NiCrN filmxFilm layer, Nb film layer, NbOxFilm layer, NbNxFilm layer, Ti film layer, TiNxFilm layer, TiOxAt least one layer of the film layer has a thickness of 0.5nm to 6 nm.
Preferably, the fourth dielectric film layer 10 is TiOxFilm layer, SiOxFilm layer, SiAlOxFilm layer, SiAlNxFilm layer, SiNxOyFilm layer, SiAlNxOyFilm layer, ZnOxFilm layer, ZnAlOxFilm layer, ZnSnOxFilm layer, SnOxAt least one layer of the film layer has a thickness of 20nm to 50 nm.
The film layers are combined in sequence within the limited thickness range, so that the reflectivity of the obtained single glass is 4-5%, the reflectivity of the film layer of the single glass is less than 7% after the film layer of the single glass is directly made into hollow glass without heat treatment, and meanwhile, the low-transmittance effect is realized, and the double-silver low-emissivity coated glass is suitable for being used as double-silver low-emissivity coated glass for buildings.
Correspondingly, on the basis of the ultralow-reflection low-transmittance double-silver low-emissivity coated glass, the utility model also provides a preparation method of the ultralow-reflection low-transmittance double-silver low-emissivity coated glass.
As the preferred embodiment of the utility model, the preparation method of the ultralow reflective low-transmittance double-silver low-emissivity coated glass comprises the following steps:
(1) providing a glass substrate 1;
(2) plating a first dielectric film layer 2 on a glass substrate 1;
(3) plating an optically refractive film layer 3 on the first dielectric film layer 2;
(4) plating a second dielectric film layer 4 on the optical refraction film layer 3;
(5) plating a first functional film layer 5 on the second dielectric film layer 4;
(6) plating a first functional protective film layer 6 on the first functional film layer 5;
(7) plating a third dielectric film layer 7 on the first functional protection film layer 6;
(8) plating a second functional film layer 8 on the third dielectric film layer 7;
(9) plating a second functional protective film layer 9 on the second functional film layer 8;
(10) a fourth dielectric film layer 10 is plated on the second functional protection film layer 9.
Specifically, before the film layer is laminated on the surface of the glass substrate 1, a Bentler cleaning machine is used for cleaning the common white float glass to remove organic pollutants on the surface of the glass substrate 1.
The materials of the film layers can be specifically produced by the conventional coated glass process such as magnetron sputtering, and the like, and are not described herein again.
In order to better illustrate the ultra-low reflection low transmittance double-silver low emissivity coated glass of the present invention, several examples are provided below.
Example 1
A structure diagram of the ultralow-reflection low-transmittance double-silver low-radiation coated glass is shown in figure 1, and the ultralow-reflection low-transmittance double-silver low-radiation coated glass comprises white float glass 1 and TiO with the thickness of 50.2nmxFilm layer 2, NiCrNx film layer 3 with thickness of 7.8nm, SiAlN with thickness of 60.4nmx+ZnOx(wherein SiAlNxHas a thickness of 50.5nm and ZnOx9.9nm thick), a 7.8nm AgCu20 film layer 5, and a 1.2nm thick NiCrNxFilm layer 6, ZnO with thickness of 60.7nmxFilm layer 7, AgCu20 film layer 8 with thickness of 10.9nm, NiCrN with thickness of 1.4nmxFilm layer 9, ZnO with thickness of 27.4nmx+SiAlNx(ZnOxHas a thickness of 10.6nm, SiAlNxIs 16.8nm) of the film layer 10.
The glass appearance color and the spectrum curve of the embodiment are measured by an online detection photometer and a datacolor CHECKII, and are specifically shown in FIGS. 2 to 4.
As can be seen from fig. 2 to 4, y (Rg) -4.82, transmittance Tr-41.75%, reflection color a (Rg) -1.23, and b (Rg) -5.58.
Example 2
A schematic structural diagram of an ultralow-reflection low-transmittance double-silver low-emissivity coated glass is shown in figure 1 and comprises whiteColored float glass 1, SiAlN with a thickness of 64.9nmxOyFilm layer 2, NiCrO with thickness of 4.5nmxFilm layer 3, SiAlN with thickness of 68.9nmx+ZnOx(wherein SiAlNxHas a thickness of 50.5nm and ZnOx18.4nm thick), an Ag film 5 of 8.0nm thick, and a NiCrO of 2.4nm thickxFilm layer 6, SiAlN with thickness of 81.0nmx+ZnOx(wherein SiAlNxHas a thickness of 68.5nm and ZnOx12.5nm thick), an Ag film 8 of 11.3nm thick, and a NiCrN of 1.2nm thickxFilm layer 9, SiAlN with thickness of 34.7nmxOy A membrane layer 10.
The glass appearance color and the spectrum curve of the embodiment are measured by an online detection photometer and a datacolor CHECKII, and are specifically shown in FIGS. 5-7.
As can be seen from fig. 5 to 7, y (Rg) ═ 4.96, transmittance Tr ═ 42.41%, reflection color a (Rg) ═ 1.05, and b ═ Rg ═ 6.40.
Example 3
A structure schematic diagram of an ultralow-reflection low-transmittance double-silver low-radiation coated glass is shown in figure 1, and the ultralow-reflection low-transmittance double-silver low-radiation coated glass comprises white float glass 1 and SiAlN with the thickness of 56.4nmxFilm layer 2, NbO with thickness of 4.7nmxFilm layer 3, TiO with thickness of 60.5nmx+ZnOx(wherein the TiO isxThe thickness of the film layer is 53.8nm, ZnOxFilm thickness of 6.7nm) film layer 4, AgCu20 film layer 5 with thickness of 6.1nm, NbO with thickness of 1.6nmxFilm layer 6, ZnO with thickness of 70.5nmxFilm layer 7, AgCu20 film layer 8 with thickness of 10.7nm, NiCrN with thickness of 2.0nmxFilm layer 9, TiO with thickness of 25.6nmx+SiNxOy(wherein the TiO isxThe thickness of the film layer was 8.1nm, SiNxOyThickness of the film layer is 17.5nm) the film layer 10.
The glass appearance color and the spectrum curve of the embodiment are measured by adopting an online detection photometer and a Datacolar CHECKII, and are specifically shown in FIGS. 8-10.
As can be seen from fig. 8 to 10, y (Rg) -4.92, transmittance Tr-42.52%, reflection color a (Rg) -0.73, and b (Rg) -3.59.
The above description is only exemplary of the present invention and should not be taken as limiting the scope of the present invention, as any modifications, equivalents, improvements and the like made within the spirit and principles of the present invention should be included in the present invention.
Claims (9)
1. The ultralow-reflection and low-transmittance double-silver low-emissivity coated glass is characterized by comprising a glass substrate, a first dielectric film layer laminated on the surface of the glass substrate, an optical refraction film layer laminated on the surface of the first dielectric film layer, a second dielectric film layer laminated on the surface of the optical refraction film layer, a first functional film layer laminated on the surface of the second dielectric film layer, a first functional protective film layer laminated on the surface of the first functional film layer, a third dielectric film layer laminated on the surface of the first functional protective film layer, a second functional film layer laminated on the surface of the third dielectric film layer, a second functional protective film layer laminated on the surface of the second functional film layer and a fourth dielectric film layer laminated on the surface of the second functional protective film layer.
2. The ultra-low-reflection low-transmittance double-silver low-radiation coated glass as claimed in claim 1, wherein the first functional film layer is at least one of a silver film layer and an AgCu20 film layer, and the thickness is 5nm to 8 nm; the second functional film layer is at least one of a silver film layer and an AgCu20 film layer, and the thickness of the second functional film layer is 10 nm-15 nm.
3. The ultra-low reflection low transmittance double silver low emissivity coated glass of claim 1, wherein the first dielectric film layer is TiOxFilm layer, SiOxFilm layer, SiAlOxFilm layer, SiAlNxFilm layer, SiNxOyFilm layer, SiAlNxOyAt least one layer of the film layer has a thickness of 50 nm-70 nm, and x and y represent incomplete oxidation or nitridation.
4. The method according to any one of claims 1 to 2The ultralow-reflection low-transmittance double-silver low-radiation coated glass is characterized in that the optical refraction film layer is NiCrNxFilm layer, NiCrOxFilm layer, NbNxFilm layer, NbOxAt least one layer of the film layer has a thickness of 2nm to 8nm, and x represents incomplete oxidation or nitridation.
5. The ultra-low reflection low transmittance double-silver low-emissivity coated glass according to any one of claims 1 to 2, wherein the second dielectric film layer is TiOxFilm layer, SiOx film layer, SiAlOx film layer, SiAlNx film layer, SiNxOyFilm layer, SiAlNxOyFilm layer, ZnOxFilm layer, ZnAlOxFilm layer, ZnSnOxFilm layer, SnOxAt least one layer of the film layer has a thickness of 60 nm-70 nm, and x and y represent incomplete oxidation or nitridation.
6. The ultra-low-reflection low-transmittance double-silver low-emissivity coated glass according to claim 1, wherein the first functional protective film layer is a Cr film layer or a CrO film layerxFilm layer, CrNxFilm layer, NiCrOxFilm layer, NiCrNxFilm layer, Nb film layer, NbOxFilm layer, NbNxFilm layer, Ti film layer, TiNxFilm layer, TiOxFilm layer, ZnOxFilm layer, ZnAlOxAt least one layer of the film layer has the thickness of 0.5 nm-6 nm, and x represents incomplete oxidation or nitridation; the second functional protective film layer is a Cr film layer, a CrOx film layer, a CrNx film layer, a NiCrOx film layer and a NiCrN film layerxFilm layer, Nb film layer, NbOxFilm layer, NbNxFilm layer, Ti film layer, TiNxFilm layer, TiOxAt least one layer of the film layer has a thickness of 0.5nm to 6 nm.
7. The ultra-low reflection low transmittance double silver low emissivity coated glass of claim 1, wherein the third dielectric film layer is made of TiOxFilm layer, SiOxFilm layer, SiAlOxFilm layer, SiAlNxFilm layer, SiNxOyFilm layer, SiAlNxOyFilm layer, ZnOxA film layer,ZnAlOxFilm layer, ZnSnOxFilm layer, SnOxAt least one layer of the film layer has a thickness of 50 nm-100 nm, and x and y represent incomplete oxidation or nitridation.
8. The ultra-low reflection low transmittance double-silver low-emissivity coated glass according to any one of claims 1 to 3, wherein the fourth dielectric film layer is TiOxFilm layer, SiOxFilm layer, SiAlOxFilm layer, SiAlNxFilm layer, SiNxOyFilm layer, SiAlNxOyFilm layer, ZnOxFilm layer, ZnAlOxFilm layer, ZnSnOxFilm layer, SnOxAt least one layer of the film layer has a thickness of 20nm to 50nm, and x and y represent incomplete oxidation or nitridation.
9. The ultra-low reflection low transmittance double-silver low-emissivity coated glass according to claim 1, wherein the glass substrate is a common white glass.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112142340A (en) * | 2020-08-24 | 2020-12-29 | 信义玻璃(江苏)有限公司 | Colorless double-silver coated glass and preparation method thereof |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112142340A (en) * | 2020-08-24 | 2020-12-29 | 信义玻璃(江苏)有限公司 | Colorless double-silver coated glass and preparation method thereof |
| CN112142340B (en) * | 2020-08-24 | 2023-09-26 | 信义玻璃(江苏)有限公司 | Colorless double-silver coated glass and preparation method thereof |
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