CN212454830U - Dynamic pressure accurate control system for continuous charging of working gas into low-vacuum system - Google Patents
Dynamic pressure accurate control system for continuous charging of working gas into low-vacuum system Download PDFInfo
- Publication number
- CN212454830U CN212454830U CN202020798672.2U CN202020798672U CN212454830U CN 212454830 U CN212454830 U CN 212454830U CN 202020798672 U CN202020798672 U CN 202020798672U CN 212454830 U CN212454830 U CN 212454830U
- Authority
- CN
- China
- Prior art keywords
- vacuum
- working gas
- pumping
- pipeline
- vacuum chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Control Of Fluid Pressure (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
Abstract
The utility model discloses a dynamic pressure accurate control system when low vacuum system continuously fills working gas, including real empty room, vacuum pump package, vacuum pumping pipeline valve member, working gas input unit, adjusting gas input unit, pressure measurement unit and electrical control unit, the vacuum pump package passes through vacuum pumping pipeline and extracts the vacuum to real empty room. The working gas input unit comprises an electromagnetic valve I, a mass flow controller I and a working gas pipeline, and working gas is filled into the vacuum chamber. And the adjusting gas input unit comprises an electromagnetic valve II, a mass flow controller II and an adjusting gas pipeline and is used for filling air into the pumping hole of the vacuum pump set. The electric control unit controls the on/off of the vacuum pump set and the electromagnetic valve by adopting a PLC, sets the inflation flow of working gas, sets a target pressure value of the vacuum chamber, and performs PID adjustment on the inflation flow of the conditioning gas according to the dynamic pressure value of the vacuum chamber fed back by the pressure measurement unit to realize the accurate control on the dynamic pressure of the vacuum chamber.
Description
Technical Field
The utility model belongs to the technical field of the vacuum, a dynamic pressure accurate control system when low vacuum pumping system continuously fills into working gas is related to, when concretely relates to continuously fills into working gas when bleeding low vacuum system of 1Pa ~ 5000Pa magnitude of force, carries out accurate control's system to the dynamic pressure of system.
Background
In the research field of near space and plasma, a vacuum environment required by an experiment needs to be established, which is different from the vacuum environment in a conventional vacuum system, the vacuum environment needs to be filled with working gas (such as argon, hydrogen, helium and the like) while the system is vacuumized, the filling flow of the working gas needs to be controllable and adjustable, and in this state, the vacuum degree index of the system needs to meet a set target, the vacuum degree is generally 1 Pa-1000 Pa magnitude, and accurate control needs to be realized. Because the working gas is any value in the required charging flow range, the vacuum degree target value needs to meet any pressure set value in a certain range, the effective pumping speed of the vacuum pumping system needs to be adjusted at will in a certain range, the vacuum pump of the pumping system does not have the capability of adjusting the pumping speed at will, the valve is adopted for vacuum conductance adjustment, and the adjustment reliability is poor because the opening degree of the valve and the conductance are in a nonlinear relationship, and the valve plate of the valve moves frequently. Therefore, it is necessary to design a system for accurately controlling the dynamic pressure of the low vacuum pumping system during the continuous charging of the working gas.
The dynamic pressure accurate control system adopts a new technical approach when the low vacuum pumping system continuously fills working gas, does not need to adjust the pumping speed of the vacuum pump, does not need to adjust the opening of a valve at the pump opening of the vacuum pump, and can realize the adjustment of the pumping load of the vacuum pump set by filling adjusting gas into the pumping opening of the vacuum pump, thereby realizing the accurate control of the dynamic pressure of the system.
SUMMERY OF THE UTILITY MODEL
To the defect that exists among the prior art, the utility model aims at solving when the system continuously fills into working gas in the time of bleeding 1Pa ~ 5000Pa magnitude of a magnitude low vacuum system, carries out the problem of accurate control to the dynamic pressure of system. The dynamic pressure (vacuum degree) of the system depends on the flow (inflation quantity) of the working gas of the system and the effective pumping speed of the vacuum pump to the system, for the system, the inflation quantity of the working gas is a variable to be regulated, the effective pumping speed of the vacuum pump to the system depends on the nominal pumping speed of the pump in different pressure intervals and the geometric structure size (including valve opening) of a vacuum pumping pipeline system, the nominal pumping speed of the pump is a nonlinear variable for the dynamic pressure value in the system, therefore, in order to meet the set dynamic pressure target value, the effective pumping speed of the vacuum pump to the system needs to be dynamically regulated according to the dynamic pressure feedback value of the system according to different inflation quantities of the working gas, the prior art generally regulates the valve opening or the frequency conversion of the vacuum pump group, thereby regulating the effective pumping speed of the system, the valve opening and the frequency conversion of the vacuum pump group are also in nonlinear relation with the effective pumping, and the opening of the valve is adjusted very frequently, and the excessive nonlinear variables and the frequent adjustment of the valve cause low pressure control precision, poor stability and short service life of the valve. The utility model discloses an adopt new technical approach, need not carry out the pump-out speed to the vacuum pump and adjust, need not adjust vacuum pump mouth valve aperture, through fill the mode of adjusting gas in the vacuum pump extraction opening, realize the regulation of the load of always bleeding of vacuum pump (for the working gas volume and the adjusting gas volume sum that fill), it is high to fill adjusting gas volume control accuracy, and dynamic reaction is fast, can realize the regulation to the load of always bleeding of vacuum pump to the realization is to the accurate control of real empty room dynamic pressure (working vacuum degree).
In order to achieve the purpose, the utility model discloses a new technical approach, need not carry out the pump-out speed to the vacuum pump and adjust, need not adjust vacuum pump mouth valve aperture, but through filling the mode of adjusting gas at the vacuum pump extraction opening, realize the regulation of vacuum pump air exhaust load to the realization is to the accurate control of the working vacuum degree of system. The utility model adopts the technical proposal that:
a system for accurately controlling dynamic pressure during continuous charging of a working gas in a low vacuum pumping system, comprising: the device comprises a vacuum chamber 1, a vacuum pump set 2, a vacuum pumping pipeline valve assembly 3, a working gas input unit 4, a regulating gas input unit 5, a pressure measuring unit 6 and an electric control unit 7;
the vacuum pump set 2 is connected with the vacuum chamber 1 through a vacuum air exhaust pipeline valve assembly 3, the vacuum pump set 2 is used for exhausting air to the vacuum chamber 1 through the vacuum air exhaust pipeline valve assembly 3, the vacuum pump set 2 is further connected with an adjusting gas input unit 5, the vacuum chamber 1 is connected with a pressure measuring unit 6, a working gas input unit 4 is connected with the vacuum chamber 1, and an electric control unit 7 is respectively connected with the working gas input unit 4, the adjusting gas input unit 5 and the pressure measuring unit 6.
Preferably, the vacuum suction line valve assembly 3 comprises: the vacuum pump comprises a vacuum pumping pipeline 3-1 and a valve 3-2, wherein one end of the vacuum pumping pipeline 3-1 is connected with a vacuum chamber 1, the other end of the vacuum pumping pipeline is connected with a pumping hole of a vacuum pump group 2, and the valve 3-2 is arranged on the vacuum pumping pipeline 3-1.
Preferably, the working gas input unit 4 is used for charging a working gas into the vacuum chamber 1, and comprises: the device comprises an electromagnetic valve I4-3, a mass flow controller I4-2 and a working gas pipeline 4-1; one end of a working gas pipeline 4-1 is connected with a working gas source, the other end of the working gas pipeline 4-1 is connected with the vacuum chamber 1, and an electromagnetic valve I4-3 and a mass flow controller I4-2 are arranged on the working gas pipeline 4-1.
Preferably, the regulating gas input unit 5 is used for filling regulating gas into the inlet position of the vacuum pump group 2, and comprises: the vacuum pump set comprises an electromagnetic valve II 5-3, a mass flow controller II 5-2 and an adjusting gas pipeline 5-1, wherein one end of the adjusting gas pipeline 5-1 is connected with the atmosphere, the other end of the adjusting gas pipeline 5-1 is connected with a pumping hole of the vacuum pump set 2, and the electromagnetic valve II 5-3 and the mass flow controller II 5-2 are arranged on the adjusting gas pipeline 5-1.
Preferably, the pressure measuring unit 6 is a thin film vacuum gauge using different ranges according to pressure ranges, and measures the pressure in the vacuum chamber 1 and feeds back pressure value data to the electric control unit 7.
Preferably, the electric control unit 7 is respectively connected with an electromagnetic valve I4-3, a mass flow controller I4-2, an electromagnetic valve II 5-3 and a mass flow controller II 5-2;
the electric control unit 7 adopts a PLC to control the start/stop of the vacuum pump set 2, the on/off of the electromagnetic valves I4-3 and the electromagnetic valves II 5-3, collects pressure value data in the vacuum chamber 1, sets the inflation flow of working gas according to requirements, sets the target pressure value of the vacuum chamber 1,
the electric control unit 7 is used for controlling the mass flow controller II 5-2 to automatically adjust the PID (PID is proportional P, integral I and differential D control algorithm, and is a closed-loop control algorithm) of the aeration flow of the adjusting gas according to the dynamic pressure value data fed back by the vacuum chamber 1, thereby realizing the accurate control of the dynamic pressure in the vacuum chamber 1.
Preferably, the vacuum chamber 1 is a vacuum container with various structural shapes, the dynamic pressure in the vacuum chamber is a control target, and the vacuum chamber 1 provides a working environment meeting the pressure index requirement for a dynamic pressure precise control system.
As a preferred scheme, the vacuum pump group 2 adopts a mechanical pump or a screw pump, and the mechanical pump or the screw pump and a roots pump can be combined according to the pumping speed requirement.
Preferably, the pumping speed of the vacuum pump unit 2 should ensure that the pressure of the vacuum chamber 1 is less than the minimum pressure value 1Pa when the working gas is in the maximum filling amount, so that the vacuum pump unit 2 can be filled with a certain amount of adjusting gas to realize the function of adjusting the pumping load.
Preferably, the ultimate vacuum degree of the vacuum pump group 2 is an order of magnitude smaller than the lowest pressure required by the vacuum chamber 1, and for a system with the lowest pressure requirement of 1Pa, the ultimate vacuum degree of the vacuum pump group 2 should be smaller than 0.1 Pa.
As a preferred scheme, in order to avoid the influence of the atmosphere on the composition ratio of the working gas in the vacuum chamber 1, the inflation inlet of the adjusting gas input unit 5 is positioned near the pumping outlet of the vacuum pump set 2, and the vacuum pumping pipeline 3-1 is ensured to have a certain length.
Has the advantages that: the utility model provides a dynamic pressure accurate control system when low vacuum pumping system continuously fills into working gas compares with prior art and has following advantage:
the dynamic pressure (vacuum degree) of the system depends on the flow rate (inflation quantity) of working gas of the system and the effective pumping speed of the vacuum pump to the system, and for a dynamic pressure accurate control system when a low-vacuum pumping system continuously fills working gas, the prior art generally adjusts the valve opening or the frequency conversion of a vacuum pump set, so that the effective pumping speed of the system is adjusted, the valve opening and the frequency conversion of the vacuum pump set are in a nonlinear relation with the effective pumping speed, the valve opening adjusting action is very frequent, and the system pressure control accuracy is low, the stability is poor and the service life of the valve is short due to excessive nonlinear variables and frequent adjusting actions of the valve. Adopt the system need not carry out the pump-out speed to the vacuum pump and adjust, need not adjust vacuum pump mouth valve aperture, but through filling the mode of adjusting gas into at the vacuum pump extraction opening, realize the vacuum pump and always bleed the regulation of load (for the working gas volume and the adjusting gas volume sum that fill), it is high to fill adjusting gas volume control accuracy, dynamic reaction is fast, can realize always bleeding the regulation of load to the vacuum pump to the realization is to the accurate control of real empty room dynamic pressure (working vacuum degree).
Drawings
The utility model discloses there is following figure:
FIG. 1 is a schematic diagram of a dynamic pressure precise control system when a low vacuum pumping system continuously fills working gas.
In the figure: 1-vacuum chamber; 2-a vacuum pump group; 3-vacuum pumping pipeline valve assembly; 3-1-vacuum pumping pipeline; 3-2-valve; 4-a working gas input unit; 4-1 working gas pipeline; 4-2-mass flow controller I; 4-3-electromagnetic valve I; 5-a regulated gas input unit; 5-1-adjusting the gas pipeline; 5-2-mass flow controller II; 5-3-electromagnetic valve II; 6-a pressure measurement unit; 7-an electrical control unit.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings.
As shown in fig. 1, the system for accurately controlling dynamic pressure during continuous charging of working gas into a low vacuum pumping system comprises: the device comprises a vacuum chamber 1, a vacuum pump set 2, a vacuum pumping pipeline valve assembly 3, a working gas input unit 4, a regulating gas input unit 5, a pressure measuring unit 6 and an electric control unit 7.
The vacuum pump set 2 is connected with the vacuum chamber 1 through a vacuum air exhaust pipeline valve assembly 3, the vacuum pump set 2 is used for exhausting air to the vacuum chamber 1 through the vacuum air exhaust pipeline valve assembly 3, the vacuum pump set 2 is further connected with an adjusting gas input unit 5, the vacuum chamber 1 is connected with a pressure measuring unit 6, a working gas input unit 4 is connected with the vacuum chamber 1, and an electric control unit 7 is respectively connected with the working gas input unit 4, the adjusting gas input unit 5 and the pressure measuring unit 6.
Preferably, the vacuum suction line valve assembly 3 comprises: the vacuum pump comprises a vacuum pumping pipeline 3-1 and a valve 3-2, wherein one end of the vacuum pumping pipeline 3-1 is connected with a vacuum chamber 1, the other end of the vacuum pumping pipeline is connected with a pumping hole of a vacuum pump group 2, and the valve 3-2 is arranged on the vacuum pumping pipeline 3-1.
Preferably, the working gas input unit 4 is used for charging a working gas into the vacuum chamber 1, and comprises: the device comprises an electromagnetic valve I4-3, a mass flow controller I4-2 and a working gas pipeline 4-1; one end of a working gas pipeline 4-1 is connected with a working gas source, the other end of the working gas pipeline 4-1 is connected with the vacuum chamber 1, and an electromagnetic valve I4-3 and a mass flow controller I4-2 are arranged on the working gas pipeline 4-1.
Preferably, the regulating gas input unit 5 is used for filling regulating gas into the inlet position of the vacuum pump group 2, and comprises: the vacuum pump set comprises an electromagnetic valve II 5-3, a mass flow controller II 5-2 and an adjusting gas pipeline 5-1, wherein one end of the adjusting gas pipeline 5-1 is connected with the atmosphere, the other end of the adjusting gas pipeline 5-1 is connected with a pumping hole of the vacuum pump set 2, and the electromagnetic valve II 5-3 and the mass flow controller II 5-2 are arranged on the adjusting gas pipeline 5-1.
Preferably, the pressure measuring unit 6 is a thin film vacuum gauge using different ranges according to pressure ranges, and measures the pressure in the vacuum chamber 1 and feeds back pressure value data to the electric control unit 7.
Preferably, the electric control unit 7 is respectively connected with an electromagnetic valve I4-3, a mass flow controller I4-2, an electromagnetic valve II 5-3 and a mass flow controller II 5-2;
the electric control unit 7 adopts a PLC to control the start/stop of the vacuum pump set 2, the on/off of the electromagnetic valves I4-3 and the electromagnetic valves II 5-3, collects pressure value data in the vacuum chamber 1, sets the inflation flow of working gas according to requirements, sets the target pressure value of the vacuum chamber 1,
the electric control unit 7 is used for controlling the mass flow controller II 5-2 to automatically adjust the PID (PID is proportional P, integral I and differential D control algorithm, and is a closed-loop control algorithm) of the aeration flow of the adjusting gas according to the dynamic pressure value data fed back by the vacuum chamber 1, thereby realizing the accurate control of the dynamic pressure in the vacuum chamber 1.
Preferably, the vacuum chamber 1 is a vacuum container with various structural shapes, the dynamic pressure in the vacuum chamber is a control target, and the vacuum chamber 1 provides a working environment meeting the pressure index requirement for a dynamic pressure precise control system.
As a preferred scheme, the vacuum pump group 2 adopts a mechanical pump or a screw pump, and the mechanical pump or the screw pump and a roots pump can be combined according to the pumping speed requirement.
Preferably, the pumping speed of the vacuum pump unit 2 should ensure that the pressure of the vacuum chamber 1 is less than the minimum pressure value 1Pa when the working gas is in the maximum filling amount, so that the vacuum pump unit 2 can be filled with a certain amount of adjusting gas to realize the function of adjusting the pumping load.
Preferably, the ultimate vacuum degree of the vacuum pump group 2 is an order of magnitude smaller than the lowest pressure required by the vacuum chamber 1, and for a system with the lowest pressure requirement of 1Pa, the ultimate vacuum degree of the vacuum pump group 2 should be smaller than 0.1 Pa.
As a preferred scheme, in order to avoid the influence of the atmosphere on the composition ratio of the working gas in the vacuum chamber 1, the inflation inlet of the adjusting gas input unit 5 is positioned near the pumping outlet of the vacuum pump set 2, and the vacuum pumping pipeline 3-1 is ensured to have a certain length.
Those not described in detail in this specification are within the skill of the art.
Claims (10)
1. A system for accurately controlling dynamic pressure during continuous charging of a working gas into a low vacuum system, comprising: the device comprises a vacuum chamber (1), a vacuum pump set (2), a vacuum pumping pipeline valve assembly (3), a working gas input unit (4), a regulating gas input unit (5), a pressure measuring unit (6) and an electric control unit (7);
the vacuum pump set (2) is connected with the vacuum chamber (1) through a vacuum air pumping pipeline valve assembly (3), the vacuum pump set (2) is used for pumping air to the vacuum chamber (1) through the vacuum air pumping pipeline valve assembly (3), the vacuum pump set (2) is further connected with an adjusting gas input unit (5), the vacuum chamber (1) is connected with a pressure measuring unit (6), a working gas input unit (4) is connected with the vacuum chamber (1), and an electric control unit (7) is respectively connected with the working gas input unit (4), the adjusting gas input unit (5) and the pressure measuring unit (6).
2. The system for the dynamic accurate control of pressure during continuous charging of a working gas in a low vacuum system according to claim 1, wherein the vacuum pumping duct valve assembly (3) comprises: the vacuum pump comprises a vacuum pumping pipeline (3-1) and a valve (3-2), wherein one end of the vacuum pumping pipeline (3-1) is connected with a vacuum chamber (1), the other end of the vacuum pumping pipeline is connected with a pumping hole of a vacuum pump group (2), and the valve (3-2) is arranged on the vacuum pumping pipeline (3-1).
3. The system for precisely controlling the dynamic pressure during the continuous charging of the working gas in the low vacuum system according to claim 1, wherein the working gas input unit (4) for charging the working gas into the vacuum chamber (1) comprises: the device comprises an electromagnetic valve I (4-3), a mass flow controller I (4-2) and a working gas pipeline (4-1); one end of a working gas pipeline (4-1) is connected with a working gas source, the other end of the working gas pipeline (4-1) is connected with the vacuum chamber (1), and the electromagnetic valve I (4-3) and the mass flow controller I (4-2) are arranged on the working gas pipeline (4-1).
4. The system for precisely controlling the dynamic pressure during the continuous charging of the working gas in the low vacuum system according to claim 3, wherein the conditioning gas input unit (5) for charging the conditioning gas into the inlet portion of the vacuum pump group (2) comprises: the device comprises an electromagnetic valve II (5-3), a mass flow controller II (5-2) and an adjusting gas pipeline (5-1), wherein one end of the adjusting gas pipeline (5-1) is connected with the atmosphere, the other end of the adjusting gas pipeline (5-1) is connected with a pumping hole of a vacuum pump set (2), and the electromagnetic valve II (5-3) and the mass flow controller II (5-2) are arranged on the adjusting gas pipeline (5-1).
5. The system for the dynamic pressure fine control when the low vacuum system is continuously charged with the operation gas as set forth in claim 4, wherein the pressure measuring unit (6) uses a thin film vacuum gauge of different ranges according to the pressure range for measuring the pressure in the vacuum chamber (1) and feeding back the pressure value data to the electric control unit (7).
6. The system for accurately controlling the dynamic pressure during the continuous charging of the working gas in the low vacuum system according to claim 5, wherein the electrical control unit (7) is connected with an electromagnetic valve I (4-3), a mass flow controller I (4-2), an electromagnetic valve II (5-3) and a mass flow controller II (5-2) respectively;
the electric control unit (7) adopts a PLC to control the start/stop of the vacuum pump set (2), the on/off of the electromagnetic valves I (4-3) and II (5-3), collects pressure value data in the vacuum chamber (1), sets the inflation flow of working gas according to requirements, sets the target pressure value of the vacuum chamber (1),
the electric control unit (7) is used for controlling the mass flow controller II (5-2) to perform PID automatic adjustment on the aeration flow of the adjusting gas according to the dynamic pressure value data fed back by the vacuum chamber (1) so as to realize accurate control on the dynamic pressure in the vacuum chamber (1).
7. The system for precisely controlling the dynamic pressure during the continuous charging of the working gas in the low vacuum system as claimed in claim 1, wherein the vacuum pump set (2) adopts a mechanical pump or a screw pump, and the mechanical pump or the screw pump and a roots pump can be adopted according to the pumping speed requirement.
8. The system for accurately controlling the dynamic pressure during the continuous charging of the working gas in the low vacuum system according to claim 1, wherein the pumping speed of the vacuum pump set (2) is such that the pressure of the vacuum chamber (1) is less than the minimum pressure value of 1Pa when the working gas is in the maximum charging amount, so that the vacuum pump set (2) can be charged with a certain amount of adjusting gas to realize the function of adjusting the pumping load.
9. A system for the dynamic accurate control of pressure during the continuous charging of working gas in a low vacuum system according to claim 1, characterized in that the ultimate vacuum of the vacuum pump group (2) is an order of magnitude less than the minimum pressure required by the vacuum chamber (1).
10. The system for precisely controlling the dynamic pressure during the continuous charging of the working gas in the rough vacuum system according to claim 2, wherein the charging port of the adjusting gas input unit (5) is located near the pumping port of the vacuum pump set (2) and ensures a certain length of the vacuum pumping duct (3-1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020798672.2U CN212454830U (en) | 2020-05-14 | 2020-05-14 | Dynamic pressure accurate control system for continuous charging of working gas into low-vacuum system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020798672.2U CN212454830U (en) | 2020-05-14 | 2020-05-14 | Dynamic pressure accurate control system for continuous charging of working gas into low-vacuum system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN212454830U true CN212454830U (en) | 2021-02-02 |
Family
ID=74482712
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202020798672.2U Active CN212454830U (en) | 2020-05-14 | 2020-05-14 | Dynamic pressure accurate control system for continuous charging of working gas into low-vacuum system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN212454830U (en) |
-
2020
- 2020-05-14 CN CN202020798672.2U patent/CN212454830U/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN100487620C (en) | Device for controlling chamber inner pressure and inner pressure controlled-type chamber | |
| CN106681385B (en) | A kind of PLC vacuum tank low pressure automatic adjusting control device | |
| CA2653819A1 (en) | Compressor fill method and apparatus | |
| CN110543194B (en) | Pressure control device and semiconductor device | |
| TW201339355A (en) | Gas flow system, device and method | |
| CN212454830U (en) | Dynamic pressure accurate control system for continuous charging of working gas into low-vacuum system | |
| CN104635776A (en) | Wide-range pressure control system and method applied to vacuum equipment | |
| US7066352B2 (en) | Material supply system | |
| CN1256523C (en) | Super high pressure air-actuated proportional pressure-reducing valve | |
| CN111594446A (en) | Dynamic pressure accurate control system for continuous charging of working gas into low-vacuum system | |
| CN108547997B (en) | A kind of long-range pressure regulation gas pressure regulator, governor and its long-range pressure regulation method | |
| CN210345019U (en) | Automatic gas pressure regulating device | |
| CN115328226A (en) | Pressure regulating device and method applied to vapor deposition equipment | |
| CN217787666U (en) | System for pressure control is carried out through many proportional valve | |
| CN207527292U (en) | Remote controlled pressure regulator | |
| CN213676637U (en) | Pneumatic electric control valve and pneumatic line control brake system | |
| CN205064955U (en) | Balanced pneumatic adjusting device's in area voltage regulator | |
| CN112095091A (en) | Dynamic pressure balance control system in reaction cavity for CVD coating equipment | |
| CN112709291A (en) | Two-stage flow regulating and pressure stabilizing system and flow regulating method | |
| CN220735689U (en) | Pressure regulating system for micro-pressure oxygen cabin | |
| CN219978749U (en) | Gas flow regulating system and oxygenation regulating cabinet | |
| CN202545917U (en) | Ultrahigh pressure adjuster | |
| CN218644888U (en) | Double-valve pressure control device | |
| CN108223862B (en) | Adjustable corrosion-resistant constant-pressure and constant-current balancer and installation method | |
| CN108692074A (en) | High-precision full-automatic safety relief voltage stabilizing valve group |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |