CN212451624U

CN212451624U - Chemical vapor deposition furnace gas leakage treatment device

Info

Publication number: CN212451624U
Application number: CN202020859265.8U
Authority: CN
Inventors: 朱双林; 李春敏; 马国忠; 胡人文; 王恩强; 黄道平; 沈伟
Original assignee: Suzhou Socote New Material Technology Co Ltd
Current assignee: Suzhou Socote New Material Technology Co Ltd
Priority date: 2020-05-21
Filing date: 2020-05-21
Publication date: 2021-02-02
Anticipated expiration: 2030-05-21

Abstract

The utility model relates to the technical field of chemical vapor deposition equipment, in particular to a gas leakage treatment device of a chemical vapor deposition furnace, which solves the defects in the prior art and comprises a furnace body, wherein the outside of the furnace body is wrapped with a heat-insulating layer, the outside of the heat-insulating layer is wrapped with a gas leakage-proof wrapping layer, one side of the gas leakage-proof wrapping layer is fixedly connected with an exhaust pipe through a flange plate, and the gas leakage-proof wrapping layer is provided with a plurality of through holes, when gas leaks, because the space between the gas leakage-proof wrapping layer and the furnace body is in a vacuum state, when the gas leaks, the corresponding gas bag is inflated and expanded in a leakage area, a technician can conveniently find the gas leakage point of the furnace body, the gas bag is contained in the through holes when the deposition furnace normally works, the gas bag is inflated and expanded to the outside of the through holes when the gas leaks, an infrared, and then an alarm is sent to prompt staff.

Description

Chemical vapor deposition furnace gas leakage treatment device

Technical Field

The utility model relates to a chemical vapor deposition equipment technical field especially relates to a chemical vapor deposition stove gas leakage processing apparatus.

Background

Chemical vapor deposition is a chemical technology, which is a method for generating a film by performing a chemical reaction on the surface of a substrate by using one or more gas-phase compounds or simple substances containing film elements. Chemical vapor deposition is a new technique for preparing inorganic materials that has been developed in recent decades. Chemical vapor deposition has been widely used to purify substances, develop new crystals, and deposit various single-crystal, polycrystalline, or glassy inorganic thin film materials. These materials can be oxides, sulfides, nitrides, carbides, binary or multiple elemental compounds from groups III-V, II-IV, IV-VI and their physical functions can be precisely controlled by vapor phase doping deposition processes.

The prior art patents are as follows: an auxiliary device for gas leakage treatment of a chemical vapor deposition furnace, which has an authorization number: CN208604206U, in the utility model, a first elastic plastic protective sleeve is arranged on the outer side of the chemical vapor deposition furnace body, the upper end and the lower end of the first elastic plastic protective sleeve are respectively connected with a first communicating pipe and a second communicating pipe, the first communicating pipe is connected with the air inlet pipe in a threaded manner, the exhaust pipe is connected with the second communicating pipe in a threaded manner, the first communicating pipe is connected with a first valve, the second communicating pipe is connected with a second valve, the side wall of the first elastic plastic protective sleeve is fixedly connected with an exhaust pipe, the exhaust pipe is connected with an exhaust valve, can effectively realize the effect of finding the gas leakage of the chemical vapor deposition furnace in time and reduce the doping of external impurities in the deposition process, however, the auxiliary device can not accurately find the gas leakage point of the furnace body when in gas leakage, has certain limitation, and the protective sleeve needs to leak air for a long time before the trigger switch acts, and cannot give an alarm at the first time.

SUMMERY OF THE UTILITY MODEL

The utility model aims at solving the defects existing in the prior art and providing a gas leakage treatment device of a chemical vapor deposition furnace.

In order to achieve the above purpose, the utility model adopts the following technical scheme:

the utility model provides a chemical vapor deposition stove gas leakage processing apparatus, includes the furnace body, the outside parcel of furnace body has the insulating layer, the outside parcel of insulating layer has leak protection gas parcel layer, flange dish fixedly connected with exhaust tube is passed through to one side of leak protection gas parcel layer, and has seted up a plurality of through-hole on the leak protection gas parcel layer, the inside of through-hole bonds through the adhesive has the gasbag, the equal fixedly connected with furnace body pipeline in both sides of furnace body, furnace body pipeline fixedly connected with connecting tube.

Preferably, the four sides of the air leakage prevention wrapping layer are all provided with infrared sensors through screws.

Preferably, the inner wall of the air leakage prevention wrapping layer is provided with a through groove, a rubber pad is bonded inside the through groove, the outer side of the connecting pipeline is provided with a sealing ring in an integrated structure, the rubber pad wraps the outer part of the sealing ring, and the connecting pipeline penetrates through the inside of the through groove.

Preferably, both sides of the inner wall of the through groove are provided with grooves, an extrusion block is connected inside the grooves in a sliding mode, and the end portion of the extrusion block is in pressing contact with the rubber pad.

Preferably, the inner wall of the groove is fixedly connected with a spring through a buckle, and the other end of the spring is fixedly connected with one side of the extrusion block through the buckle.

The utility model has the advantages that:

1. the utility model discloses in through the setting of through-hole, gasbag isotructure, because be vacuum state between leak protection gas parcel layer and the furnace body when leaking gas, when gas leakage, can make the gasbag that corresponds in revealing the region inflate and swell, the gas leakage point of the furnace body is look for to the technical staff of being convenient for has stronger practicality.

2. The utility model discloses in through the setting of gasbag, infrared sensor isotructure, the inside at the through-hole is accomodate to the sedimentation furnace normal during operation gasbag, and the outside of inflation to through-hole is aerifyd to the gasbag during gas leakage, and infrared sensor can detect gas leakage at the very first time, and then sends out the suggestion staff.

3. The utility model discloses in through the setting of sealing washer, rubber pad, extrusion piece and spring isotructure, set up a plurality of seal structure between connecting tube and leak protection gas parcel layer, help strengthening the leakproofness of connecting tube department to exert pressure to the rubber pad continuously under the effect of extrusion piece, keep sealed effect with this, can avoid reporting to the police the function malfunction when the part is not hard up.

Drawings

FIG. 1 is a schematic structural view of a chemical vapor deposition furnace leakage gas treatment device according to the present invention;

FIG. 2 is an enlarged view of the gas leakage treatment device of the chemical vapor deposition furnace, which is designated by the reference number A.

In the figure: 1 furnace body, 2 heat insulating layers, 3 air leakage prevention wrapping layers, 4 exhaust pipes, 5 furnace body pipelines, 6 connecting pipelines, 7 infrared sensors, 8 through holes, 9 air bags, 10 rubber pads, 11 sealing rings, 12 extrusion blocks, 13 grooves and 14 springs.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments.

Referring to fig. 1-2, a chemical vapor deposition furnace gas leakage processing apparatus, comprising a furnace body 1, the outside of the furnace body 1 is wrapped with a thermal insulation layer 2, the outside of the thermal insulation layer 2 is wrapped with a gas leakage prevention wrapping layer 3, one side of the gas leakage prevention wrapping layer 3 is fixedly connected with an exhaust tube 4 through a flange plate, and the gas leakage prevention wrapping layer 3 is provided with a plurality of through holes 8, the inside of the through holes 8 is bonded with an air bag 9 through an adhesive, the two sides of the furnace body 1 are both fixedly connected with furnace body pipelines 5, the furnace body pipelines 5 are fixedly connected with a connecting pipeline 6, through the arrangement of the structures of the through holes 8, the air bag 9 and the like, when gas leaks, because the gas leakage prevention wrapping layer 3 is in a vacuum state with the furnace body 1, when gas leaks, the corresponding air bag 9 can be inflated and expanded in a leakage area, so that technicians can conveniently find, The arrangement of structures such as an infrared sensor 7, the air bag 9 is contained in the through hole 8 when the deposition furnace normally works, the air bag 9 is inflated to expand to the outside of the through hole 8 when air leaks, the infrared sensor 7 can detect gas leakage at the first time and further send out an alarm to prompt a worker, a plurality of sealing structures are additionally arranged between the connecting pipeline 6 and the air leakage prevention wrapping layer 3 through the arrangement of structures such as a sealing ring 11, a rubber pad 10, an extrusion block 12 and a spring 14, the sealing structure is beneficial to enhancing the sealing performance of the connecting pipeline, and continuously applies pressure to the rubber pad 10 under the action of the extrusion block 12 so as to keep the sealing effect, the false operation of the alarm function when the component is loosened can be avoided, the infrared sensor 7 is arranged on four sides of the air leakage prevention wrapping layer 3 through screws, a through groove is formed in the inner wall of the air leakage prevention wrapping layer 3, and, the outside of connecting tube 6 is provided with sealing washer 11 of a body structure, and rubber pad 10 parcel is in the outside of sealing washer 11, and connecting tube 6 passes the inside that leads to the groove, and recess 13 has all been seted up to the inner wall both sides that lead to the groove, and the inside sliding connection of recess 13 has extrusion piece 12, and the tip and the rubber pad 10 pressure contact of extrusion piece 12, and buckle fixedly connected with spring 14 is passed through to the inner wall of recess 13, and one side fixed connection of buckle and extrusion piece 12 is passed through to spring 14's the other end.

In the embodiment, when the device is used, the connecting pipeline 6 is in threaded connection with the corresponding furnace body pipeline 5 on the furnace body 1, then the heat insulating layer 2 is sleeved on the outer side of the furnace body 1, the air leakage prevention wrapping layer 3 is sleeved on the outer side of the heat insulating layer 2, the air leakage prevention wrapping layer 3 is prevented from being deformed at high temperature by the heat insulating layer 2, the air leakage prevention wrapping layer 3 and the connecting pipeline 6 adopt a double-sealing structure of a sealing ring 11 and a rubber gasket 10 to enhance the sealing effect, meanwhile, the extrusion block 12 continuously extrudes two ends of the rubber gasket 10 by means of the elasticity of the spring 14, and when the component is loosened, the rubber gasket 10 can further cling to the sealing ring 11 by means of the extrusion force, so that the sealing effect at the connecting pipeline;

further, the user is connected exhaust tube 4 and negative pressure device afterwards, take out to the vacuum state through negative pressure device between with leak protection gas parcel layer 3 and furnace body 1, no gas is in the shrink state in the inside gasbag 9 during normal operating, when furnace body 1 leaks gas, the gas of gas leakage department can flow to inside gasbag 9 correspondingly, make gasbag 9 inflation ejecting, infrared sensor 7 then detects gasbag 9 ejection through-hole 8 this moment, with signal transmission to alarm (not shown in the figure), the alarm is prior art, no longer describe here, can remind the staff through the alarm, the staff's accessible is look for expanded gasbag 9 to find out the gas leakage position of furnace body 1 fast afterwards and is maintained.

The above, only be the concrete implementation of the preferred embodiment of the present invention, but the protection scope of the present invention is not limited thereto, and any person skilled in the art is in the technical scope of the present invention, according to the technical solution of the present invention and the utility model, the concept of which is equivalent to replace or change, should be covered within the protection scope of the present invention.

Claims

1. The utility model provides a chemical vapor deposition stove gas leakage processing apparatus, includes furnace body (1), its characterized in that, the outside parcel of furnace body (1) has insulating layer (2), the outside parcel of insulating layer (2) has leak protection gas parcel layer (3), flange dish fixedly connected with exhaust tube (4) is passed through to one side of leak protection gas parcel layer (3), and has seted up a plurality of through-hole (8) on leak protection gas parcel layer (3), the inside of through-hole (8) is bonded through the adhesive has gasbag (9), the equal fixedly connected with furnace body pipeline (5) in both sides of furnace body (1), furnace body pipeline (5) fixedly connected with connecting tube (6).

2. The chemical vapor deposition furnace gas leakage treatment device according to claim 1, wherein the infrared sensors (7) are mounted on four sides of the gas leakage prevention wrapping layer (3) through screws.

3. The gas leakage treatment device of the chemical vapor deposition furnace according to claim 1, wherein a through groove is formed in the inner wall of the gas leakage prevention wrapping layer (3), a rubber gasket (10) is bonded inside the through groove, a sealing ring (11) of an integrated structure is arranged on the outer side of the connecting pipeline (6), the rubber gasket (10) wraps the outer portion of the sealing ring (11), and the connecting pipeline (6) penetrates through the inside of the through groove.

4. The chemical vapor deposition furnace gas leakage treatment device according to claim 3, wherein grooves (13) are formed in two sides of the inner wall of each through groove, extrusion blocks (12) are slidably connected inside the grooves (13), and the ends of the extrusion blocks (12) are in pressing contact with the rubber pads (10).

5. The chemical vapor deposition furnace gas leakage treatment device according to claim 4, wherein the inner wall of the groove (13) is fixedly connected with a spring (14) through a buckle, and the other end of the spring (14) is fixedly connected with one side of the extrusion block (12) through the buckle.