CN212391384U

CN212391384U - Infrared optical glass stress photoelastic coefficient testing device

Info

Publication number: CN212391384U
Application number: CN202020778400.6U
Authority: CN
Inventors: 宫堂; 何蓉; 张庆; 杨东辉; 王尧宏
Original assignee: Hubei New Huaguang Information Materials Co Ltd
Current assignee: Hubei New Huaguang Information Materials Co Ltd
Priority date: 2020-05-12
Filing date: 2020-05-12
Publication date: 2021-01-22
Anticipated expiration: 2030-05-12

Abstract

The utility model discloses a test device for stress photoelastic coefficient of infrared optical glass belongs to infrared optical glass physicochemical property index test technical field. The method mainly tests the stress change coefficient of the infrared glass under different pressures. It is mainly characterized in that: the stress photoelastic coefficient testing device is composed of a light source, a polarizer, an elasticity instrument, an analyzer and a detector which are arranged on the same optical axis straight line, wherein the elasticity instrument comprises a sample clamping mechanism, an applying force mechanism and an applying force display mechanism; the tested object is arranged in the sample clamping mechanism, the force applying mechanism is adjusted, and force F is applied according to the requirement; according toAnd (3) obtaining a corresponding stress optical path difference delta by applying the force F, and calculating to obtain a stress photoelastic coefficient B of the measured object. The utility model discloses a to the accurate test of infrared optical glass stress photoelastic coefficient, stress photoelastic coefficient survey precision can reach 0.03 x 10^‑12/pa。

Description

Infrared optical glass stress photoelastic coefficient testing device

Technical Field

The utility model belongs to the technical field of infrared optics glass materialization performance index test, especially, relate to an infrared optics glass stress photoelastic coefficient testing arrangement.

Background

The infrared optical glass is the most basic optical material in an infrared night vision optical path system, the optical material parameters are the basis for optical design, and high-quality design work can be completed according to requirements only by accurately mastering reliable data of the optical material. Furthermore, the stress of the optical material is significantly changed during the assembly process, which is particularly important for the terminal optical processing and assembly manufacturers. The method has a decisive effect on whether a set of lens or optical system is imaged perfectly, is a technical basis for material evaluation and a reference basis for production and sizing, so that the accurate measurement of the stress photoelastic coefficient of the optical material is an important prerequisite for optical design and optical material development.

In the prior art, the project indexes of the conventional optical material test mainly include: refractive index, stress birefringence, transmittance, etc. With the development of science and technology, the optical technology has been developed rapidly, the demand of optical materials in the national defense and civil fields is increased explosively, and the data of the traditional test project cannot meet the higher and higher design and use requirements at present. More and more customers are demanding new performance indicators for infrared optical glass. The stress photoelastic coefficient of the infrared optical glass has certain influence on imaging, all the previous infrared optical glasses do not provide parameters of the test item, and the data are essential technical parameters for carrying out optical design of an imaging system and are paid attention to by designers of the optical system. Therefore, it is very important to find a high-precision stress photoelastic coefficient testing device and method.

Disclosure of Invention

The utility model aims at providing an infrared optical glass's stress photoelastic coefficient testing arrangement for solve the test of infrared optical glass stress photoelastic coefficient.

In order to solve the technical problem, the utility model discloses a technical solution is: the utility model provides an infrared optics glass stress photoelastic coefficient testing arrangement for infrared optics glass stress photoelastic coefficient test, its characterized in that: the device comprises a light source, a polarizer, an elasticity meter, a spectroscope, an analyzer and a detector which are arranged on the same optical axis straight line; the elasticity appearance includes: the device comprises a sample clamping mechanism, an applying force mechanism and an applying force display mechanism.

The utility model adopts the technical proposal that the sample clamping mechanism comprises a base and a force transmission block, wherein the base is a U-shaped groove body, the bottom of the groove body close to one side wall of the U-shaped groove body is provided with a light path through hole, and the groove body is a rectangular body arranged in the groove; the force applying mechanism comprises a guide sliding block and a handle, the guide sliding block is fixed in the groove, and the handle is arranged on the other side wall of the U-shaped groove body and penetrates through a guide through hole of the guide sliding block; the force applying display mechanism is a force sensor and is arranged at the front end of the handle.

The polarizer in the technical solution of the utility model is a polaroid; the analyzer is a polaroid.

The elasticity instrument in the technical proposal of the utility model is installed and fixed on the sample placing platform; and a light path through hole is formed in the sample placing platform at the position corresponding to the straight line of the optical axis.

The technical solution of the utility model is that the light source wavelength is in the detector wavelength response range.

The technical solution of the utility model is that the light source wavelength is 1550nm infrared laser light source.

The elasticity tester applies a certain force to the object to be tested in the direction perpendicular to the light transmission direction, and the stress optical path difference of the object to be tested is accurately tested by the high-precision stress tester, so that the stress photoelastic coefficient of the object to be tested is accurately measured and calculated. In addition, due to the fact that the change of the stress optical path difference of the measured object is utilized, the stress photoelastic coefficient of different kinds of measured objects (other crystals which cannot transmit visible light and the like) can be measured, and the measuring range is wider.

Features and other aspects of the present invention will become apparent from the following detailed description of exemplary embodiments, which proceeds with reference to the accompanying drawings.

Drawings

The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate exemplary embodiments, features, and other aspects of the invention and, together with the description, serve to explain the principles of the invention.

Fig. 1 shows a flow chart of a method for testing stress photoelastic coefficient of infrared optical glass according to an embodiment of the present invention.

Fig. 2 shows a schematic structural diagram according to an embodiment of the present invention.

Fig. 3 is a schematic structural diagram of a force applying portion according to an embodiment of the present invention.

Detailed Description

Various exemplary embodiments, features, and other aspects of the present invention will be described in detail below with reference to the accompanying drawings. In the drawings, like reference numbers can indicate functionally identical or similar elements. While the various aspects of the embodiments are presented in drawings, the drawings are not necessarily drawn to scale unless specifically indicated.

The word "exemplary" is used exclusively herein to mean "serving as an example, embodiment, or illustration. Any embodiment described herein as "exemplary" is not necessarily to be construed as preferred or advantageous over other embodiments.

Furthermore, in the following detailed description, numerous specific details are set forth in order to provide a better understanding of the present invention. It will be understood by those skilled in the art that the present invention may be practiced without some of these specific details. In some instances, methods, means, elements and circuits that are well known to those skilled in the art have not been described in detail so as not to obscure the present invention.

Fig. 2 and 3 show an apparatus for measuring stress photoelastic coefficient according to an embodiment of the present invention. The testing device comprises a light source 1, a polarizer 2, an elastometer 3 for placing a tested object 10, a sample placing platform 4, a spectroscope 5, an analyzer 6 and a detector 7 which are arranged on the same optical axis straight line from top to bottom, wherein the polarizer 2 is a polaroid, and the analyzer 6 is a polaroid. The light source 1 and the detector 7 are respectively arranged at the upper end and the lower end of the object 10 to be tested, the optical axes of the light source 1 and the detector 7 are on the same straight line, and light rays need to be vertical to the object 10 to be tested during testing, wherein the wavelength of the light source 1 needs to be within the wavelength response range of the detector 7. The elasticity meter 3 comprises a sample clamping mechanism, an applying force mechanism and an applying force display mechanism. The sample clamping mechanism comprises a base 12 and a force conduction block 9, wherein the base 12 is a U-shaped groove body, a light path through hole for light to pass through is hollowed in the bottom of the groove body close to one side wall of the U-shaped groove body, the groove body is a rectangular body placed in the groove, and a measured object 10 needs to be placed between the one side wall of the U-shaped groove body and the force conduction block 9. The force applying mechanism comprises a guide sliding block 11 and a handle 13, the guide sliding block 11 is fixed in the groove, a guide through hole is formed in the guide sliding block 11, the handle 13 is a rotary handle and is arranged on the other side wall of the U-shaped groove body, a rod body of the handle 13 penetrates through the guide through hole of the guide sliding block 11 and can touch the force conducting block 9, the force conducting block transmits force to act on the measured object 10, force of any size can be applied to the measured object 10, and the force applying accuracy is high. The force display mechanism is a force sensor 8 which is arranged at the front end of the rod body of the handle 13 and is used for measuring the magnitude of the horizontal force F applied to the measured object 10. The elastic force meter 3 is placed on the sample placing platform 4, and the elastic force meter 3 is fixed to ensure that light passes through the right center of the measured object 10. The sample placing platform 4 is provided with a light path through hole corresponding to the straight line position of the optical axis. The change delta of the stress optical path difference is tested, the magnitude value of the stress optical path difference of the central point of the tested object under the condition of applying different forces is measured according to the method, a plurality of applied force and stress optical path difference data pairs are formed, the stress photoelastic coefficient B of the tested object is obtained according to the applied force F and the stress optical path difference delta, the measurement precision is high, and the range of the measurable samples is wide.

Fig. 1 shows a flowchart of a method for measuring stress photoelastic coefficient according to an embodiment of the present invention. As shown in fig. 1, the method mainly includes:

step 101, measuring the magnitude F of the measured applied force by the force sensor.

And 102, testing the stress optical path difference delta by the high-precision stress tester.

And 103, obtaining a stress photoelastic coefficient B of the measured object according to the magnitude F of the applied force and the single-point stress optical path difference delta.

The utility model discloses test infrared optical glass stress photoelastic coefficient includes following step:

an infrared optical glass stress photoelastic coefficient testing device which is composed of a light source 1, a polarizer 2, an elasticity meter 3, a sample placing platform 4, a spectroscope 5, an analyzer 6 and a detector 7 is adopted, wherein the light source 1 is an infrared laser light source with the wavelength of 1550nm, and the light source is in the wavelength response range of the detector 7;

the measured object 10 is arranged in a sample clamping mechanism, an optical axis is perpendicular to the center of the measured object, the measured object 10 is a cylinder, the side surface of the cylinder is finely ground, the taper is not more than 1/100, the parallelism of the cylinder is less than 0.03mm, the light passing surface is polished, the thickness of the cylinder is 10 +/-0.1 mm, and the diameter phi is 30 +/-0.1 mm; adjusting the force applying mechanism to apply force F according to requirements;

obtaining the corresponding stress optical path difference delta according to the applied force F, calculating the stress photoelastic coefficient B of the measured object,

。

the utility model discloses a high accuracy stress tester accuracy tests out the difference and exerts the optical path difference of measurand 10 under the force effect, comes the accurate measurement and calculates the stress photoelastic coefficient B of measurand 10. In addition, because the optical path difference of the measured object 10 is changed along with the applied force, the stress photoelastic coefficient of different kinds of measured objects (such as common crystal which can transmit visible light or other crystal which can not transmit visible light) can be measured, so that the measurement range is widerIs wide in application. And measuring the numerical value of the stress optical path difference of the central point of the measured object under the condition of applying different forces according to the mode to form a plurality of applied force and stress optical path difference data pairs, and obtaining the stress photoelastic coefficient B of the measured object according to the applied force F and the stress optical path difference delta. The utility model discloses a to the accurate test of infrared optics glass stress photoelastic coefficient, photoelastic coefficient survey precision can reach 0.03 x 10^-12/pa。

Claims

1. The utility model provides an infrared optics glass stress photoelastic coefficient testing arrangement for infrared optics glass sample stress photoelastic coefficient test, its characterized in that: the optical fiber polarization analyzer comprises a light source (1), a polarizer (2), an elastometer (3), a spectroscope (5), an analyzer (6) and a detector (7) which are arranged on the same optical axis straight line; the elasticity meter (3) comprises a sample clamping mechanism, an applying force mechanism and an applying force display mechanism.

2. The device for testing the stress photoelastic coefficient of the infrared optical glass according to claim 1, wherein: the sample clamping mechanism comprises a base (12) and a force transmission block (9), wherein the base (12) is a U-shaped groove body, a light path through hole is formed in the bottom of the groove body close to one side wall of the U-shaped groove body, and the groove body is a rectangular body placed in the groove; the force applying mechanism comprises a guide sliding block (11) and a handle (13), the guide sliding block (11) is fixed in the groove, and the handle (13) is installed on the other side wall of the U-shaped groove body and penetrates through a guide through hole of the guide sliding block (11); the force applying display mechanism is a force sensor (8) arranged at the front end of the handle (13).

3. The device for testing the stress photoelastic coefficient of the infrared optical glass according to claim 1 or 2, wherein: the polarizer (2) is a polaroid; the analyzer (6) is a polaroid.

4. The device for testing the stress photoelastic coefficient of the infrared optical glass according to claim 1 or 2, wherein: the elasticity meter (3) is fixedly arranged on the sample placing platform (4); and a light path through hole is formed in the sample placing platform (4) corresponding to the straight line position of the optical axis.

5. The device for testing the stress photoelastic coefficient of the infrared optical glass according to claim 1 or 2, wherein: the wavelength of the light source (1) is in the wavelength response range of the detector (7).

6. The device for testing the stress photoelastic coefficient of the infrared optical glass according to claim 1 or 2, wherein: the wavelength of the light source (1) is 1550nm infrared laser light source.