CN111562216A - Device and method for testing stress photoelastic coefficient of infrared optical glass - Google Patents
Device and method for testing stress photoelastic coefficient of infrared optical glass Download PDFInfo
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- CN111562216A CN111562216A CN202010397254.7A CN202010397254A CN111562216A CN 111562216 A CN111562216 A CN 111562216A CN 202010397254 A CN202010397254 A CN 202010397254A CN 111562216 A CN111562216 A CN 111562216A
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- 238000012360 testing method Methods 0.000 title claims abstract description 43
- 239000005304 optical glass Substances 0.000 title claims abstract description 27
- 238000000034 method Methods 0.000 title claims abstract description 20
- 230000003287 optical effect Effects 0.000 claims abstract description 47
- 230000007246 mechanism Effects 0.000 claims abstract description 29
- 239000011521 glass Substances 0.000 claims abstract description 5
- 230000004044 response Effects 0.000 claims description 4
- 230000005540 biological transmission Effects 0.000 claims description 3
- 239000013307 optical fiber Substances 0.000 claims 1
- 230000010287 polarization Effects 0.000 claims 1
- 230000008859 change Effects 0.000 abstract description 4
- 239000000463 material Substances 0.000 description 9
- 238000013461 design Methods 0.000 description 5
- 238000010998 test method Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000011161 development Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000007123 defense Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000004297 night vision Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000004513 sizing Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/3563—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing solids; Preparation of samples therefor
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N2021/0106—General arrangement of respective parts
- G01N2021/0112—Apparatus in one mechanical, optical or electronic block
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Abstract
The invention relates to a device and a method for testing the stress photoelastic coefficient of infrared optical glass, belonging to the technical field of testing the physicochemical property indexes of infrared optical glass, which is mainly used for testing the stress change coefficient of infrared glass under different pressures and is mainly characterized in that the stress photoelastic coefficient testing device is formed by a light source, a polarizer, an elastometer, an analyzer and a detector which are arranged on the same optical axis straight line, the elastometer comprises a sample clamping mechanism, an applying force mechanism and an applying force display mechanism, a tested object is arranged in the sample clamping mechanism, the applying force mechanism is adjusted to apply force F according to requirements, the corresponding stress optical path difference is obtained according to the applying force F, and the stress photoelastic coefficient B of the tested object is calculated‑12/pa。
Description
Technical Field
The invention belongs to the technical field of testing of physicochemical property indexes of infrared optical glass, and particularly relates to a device and a method for testing the stress photoelastic coefficient of infrared optical glass.
Background
The infrared optical glass is the most basic optical material in an infrared night vision optical path system, the optical material parameters are the basis for optical design, and high-quality design work can be completed according to requirements only by accurately mastering reliable data of the optical material. Furthermore, the stress of the optical material is significantly changed during the assembly process, which is particularly important for the terminal optical processing and assembly manufacturers. The method has a decisive effect on whether a set of lens or optical system is imaged perfectly, is a technical basis for material evaluation and a reference basis for production and sizing, so that the accurate measurement of the stress photoelastic coefficient of the optical material is an important prerequisite for optical design and optical material development.
In the prior art, the project indexes of the conventional optical material test mainly include: refractive index, stress birefringence, transmittance, etc. With the development of science and technology, the optical technology has been developed rapidly, the demand of optical materials in the national defense and civil fields is increased explosively, and the data of the traditional test project cannot meet the higher and higher design and use requirements at present. More and more customers are demanding new performance indicators for infrared optical glass. The stress photoelastic coefficient of the infrared optical glass has certain influence on imaging, all the previous infrared optical glasses do not provide parameters of the test item, and the data are essential technical parameters for carrying out optical design of an imaging system and are paid attention to by designers of the optical system. Therefore, it is very important to find a high-precision stress photoelastic coefficient testing device and method.
Disclosure of Invention
The invention aims to provide a device and a method for testing the stress photoelastic coefficient of infrared optical glass, which are used for testing the stress photoelastic coefficient of the infrared optical glass.
In order to solve the technical problems, the technical solution of the testing device of the present invention is: the utility model provides an infrared optics glass stress photoelastic coefficient testing arrangement for infrared optics glass stress photoelastic coefficient test, its characterized in that: the device comprises a light source, a polarizer, an elasticity meter, a spectroscope, an analyzer and a detector which are arranged on the same optical axis straight line; the elasticity appearance includes: the device comprises a sample clamping mechanism, an applying force mechanism and an applying force display mechanism.
The sample clamping mechanism comprises a base and a force transmission block, wherein the base is a U-shaped groove body, a light path through hole is formed in the bottom of the groove body close to one side wall of the U-shaped groove body, and the groove body is a rectangular body placed in the groove; the force applying mechanism comprises a guide sliding block and a handle, the guide sliding block is fixed in the groove, and the handle is arranged on the other side wall of the U-shaped groove body and penetrates through a guide through hole of the guide sliding block; the force applying display mechanism is a force sensor and is arranged at the front end of the handle.
The polarizer in the technical scheme of the testing device is a polaroid; the analyzer is a polaroid.
The elasticity instrument in the technical scheme of the testing device is fixedly arranged on the sample placing platform; and a light path through hole is formed in the sample placing platform at the position corresponding to the straight line of the optical axis.
The technical solution of the test method of the invention is as follows: the method for testing the stress photoelastic coefficient of the infrared optical glass is characterized by comprising the following steps of:
The technical solution of the test method of the invention is that the object to be tested is a cylinder with a diameter phi; the stress photoelastic coefficient B is calculated according to the formula:
。
in the technical scheme of the testing method, the side surface of a cylinder sample of the tested object is finely ground, the taper is not more than 1/100, the parallelism of the upper surface and the lower surface of the cylinder is less than 0.03mm, and the light-passing surface is polished; the thickness of the cylinder is 10 plus or minus 0.1mm, and the diameter phi is 30 plus or minus 0.1 mm.
The wavelength of the light source is in the wavelength response range of the detector in the technical scheme of the test method.
The technical scheme of the test method of the invention is that the light source wavelength is 1550nm infrared laser light source.
The elasticity tester applies a certain force to the object to be tested in the direction perpendicular to the light transmission direction, and the stress optical path difference of the object to be tested is accurately tested by the high-precision stress tester, so that the stress photoelastic coefficient of the object to be tested is accurately measured and calculated. In addition, due to the fact that the change of the stress optical path difference of the measured object is utilized, the stress photoelastic coefficient of different kinds of measured objects (other crystals which cannot transmit visible light and the like) can be measured, and the measuring range is wider.
Features and other aspects of the present invention will become apparent from the following detailed description of exemplary embodiments with reference to the attached drawings.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate exemplary embodiments, features, and other aspects of the invention and, together with the description, serve to explain the principles of the invention.
FIG. 1 is a flow chart of a method for testing the stress photoelastic coefficient of an infrared optical glass according to an embodiment of the present invention.
Fig. 2 shows a schematic diagram of a stress optical path difference test according to an embodiment of the invention.
FIG. 3 illustrates a schematic diagram of an applied force magnitude test according to an embodiment of the invention.
Detailed Description
Various exemplary embodiments, features, and other aspects of the present invention will be described in detail below with reference to the accompanying drawings. In the drawings, like reference numbers can indicate functionally identical or similar elements. While the various aspects of the embodiments are presented in drawings, the drawings are not necessarily drawn to scale unless specifically indicated.
The word "exemplary" is used exclusively herein to mean "serving as an example, embodiment, or illustration. Any embodiment described herein as "exemplary" is not necessarily to be construed as preferred or advantageous over other embodiments.
Furthermore, in the following detailed description, numerous specific details are set forth in order to provide a better understanding of the present invention. It will be understood by those skilled in the art that the present invention may be practiced without some of these specific details. In some instances, methods, procedures, components, and circuits that are well known to those skilled in the art have not been described in detail so as not to obscure the present invention.
Example 1
Fig. 1 shows a flowchart of a method for measuring a stress photoelastic coefficient according to an embodiment of the present invention. As shown in fig. 1, the method mainly includes:
step 101, measuring the magnitude F of the measured applied force by the force sensor.
And 102, testing the stress optical path difference by the high-precision stress tester.
And 103, obtaining a stress photoelastic coefficient B of the measured object according to the magnitude F of the applied force and the single-point stress optical path difference.
Fig. 2 and 3 show an apparatus for measuring stress photoelastic coefficient according to an embodiment of the present invention. The testing device comprises a light source 1, a polarizer 2, an elastometer 3 for placing a tested object 10, a sample placing platform 4, a spectroscope 5, an analyzer 6 and a detector 7 which are arranged on the same optical axis straight line from top to bottom, wherein the polarizer 2 is a polaroid, and the analyzer 6 is a polaroid. The light source 1 and the detector 7 are respectively arranged at the upper end and the lower end of the object 10 to be tested, the optical axes of the light source 1 and the detector 7 are on the same straight line, and light rays need to be vertical to the object 10 to be tested during testing, wherein the wavelength of the light source 1 needs to be within the wavelength response range of the detector 7. The elasticity meter 3 comprises a sample clamping mechanism, an applying force mechanism and an applying force display mechanism. The sample clamping mechanism comprises a base 12 and a force conduction block 9, wherein the base 12 is a U-shaped groove body, a light path through hole for light to pass through is hollowed in the bottom of the groove body close to one side wall of the U-shaped groove body, the groove body is a rectangular body placed in the groove, and a measured object 10 needs to be placed between the one side wall of the U-shaped groove body and the force conduction block 9. The force applying mechanism comprises a guide sliding block 11 and a handle 13, the guide sliding block 11 is fixed in the groove, a guide through hole is formed in the guide sliding block 11, the handle 13 is a rotary handle and is arranged on the other side wall of the U-shaped groove body, a rod body of the handle 13 penetrates through the guide through hole of the guide sliding block 11 and can touch the force conducting block 9, the force conducting block transmits force to act on the measured object 10, force of any size can be applied to the measured object 10, and the force applying accuracy is high. The force display mechanism is a force sensor 8 which is arranged at the front end of the rod body of the handle 13 and is used for measuring the magnitude of the horizontal force F applied to the measured object 10. The elastic force meter 3 is placed on the sample placing platform 4, and the elastic force meter 3 is fixed to ensure that light passes through the right center of the measured object 10. The sample placing platform 4 is provided with a light path through hole corresponding to the straight line position of the optical axis. The change of the stress optical path difference is tested, the magnitude value of the stress optical path difference of the central point of the tested object under the condition of applying different forces is measured according to the mode, a plurality of applied force and stress optical path difference data pairs are formed, the stress photoelastic coefficient B of the tested object is obtained according to the applied force F and the stress optical path difference, the measurement precision is high, and the range of the measurable samples is wide.
The method for testing the stress photoelastic coefficient of the infrared optical glass comprises the following steps:
the invention accurately tests the optical path difference of the measured object 10 under the action of different applied forces by a high-precision stress tester to accurately measure and calculate the stress photoelastic coefficient B of the measured object 10. in addition, the change of the optical path difference of the measured object 10 along with the applied force can be utilized to measure the stress photoelastic coefficient of different kinds of measured objects (such as common crystals which can transmit visible light or other crystals which can not transmit visible light) so that the measurement range is wider, the numerical value of the stress optical path difference of the central point of the measured object under the condition of applying different forces is measured according to the mode to form a plurality of applied force and stress optical path difference data pairs, and the stress photoelastic coefficient B of the measured object is obtained according to the applied force F and the stress optical path difference-12/pa。
Claims (9)
1. The utility model provides an infrared optics glass stress photoelastic coefficient testing arrangement for infrared optics glass sample stress photoelastic coefficient test, its characterized in that: the optical fiber polarization analyzer comprises a light source (1), a polarizer (2), an elastometer (3), a spectroscope (5), an analyzer (6) and a detector (7) which are arranged on the same optical axis straight line; the elasticity meter (3) comprises a sample clamping mechanism, an applying force mechanism and an applying force display mechanism.
2. The device for testing the stress photoelastic coefficient of the infrared optical glass according to claim 1, wherein: the sample clamping mechanism comprises a base (12) and a force transmission block (9), wherein the base (12) is a U-shaped groove body, a light path through hole is formed in the bottom of the groove body close to one side wall of the U-shaped groove body, and the groove body is a rectangular body placed in the groove; the force applying mechanism comprises a guide sliding block (11) and a handle (13), the guide sliding block (11) is fixed in the groove, and the handle (13) is installed on the other side wall of the U-shaped groove body and penetrates through a guide through hole of the guide sliding block (11); the force applying display mechanism is a force sensor (8) arranged at the front end of the handle (13).
3. The device for testing the stress photoelastic coefficient of the infrared optical glass according to claim 1 or 2, wherein: the polarizer (2) is a polaroid; the analyzer (6) is a polaroid.
4. The device for testing the stress photoelastic coefficient of the infrared optical glass according to claim 1 or 2, wherein: the elasticity meter (3) is fixedly arranged on the sample placing platform (4); and a light path through hole is formed in the sample placing platform (4) corresponding to the straight line position of the optical axis.
5. A method for testing the stress photoelastic coefficient of the infrared optical glass by using the device for testing the stress photoelastic coefficient of the infrared optical glass according to claim 1 is characterized by comprising the following steps:
6. The method for testing the stress photoelastic coefficient of the infrared optical glass according to claim 5, wherein: the measured object (10) is a cylinder with the diameter phi; the stress photoelastic coefficient B is calculated according to the formula:
。
7. the method for testing the stress photoelastic coefficient of the infrared optical glass according to claim 6, wherein: the surface of a cylindrical sample of the tested object (10) is finely ground, and the taper is not more than 1/100; the parallelism of the cylinders is less than 0.03mm, and the light passing surfaces are polished; the thickness of the cylinder is 10 plus or minus 0.1mm, and the diameter phi is 30 plus or minus 0.1 mm.
8. The method for testing the stress photoelastic coefficient of the infrared optical glass according to any one of claims 5 to 7, characterized in that: the wavelength of the light source (1) is in the wavelength response range of the detector (7).
9. The method for testing the stress photoelastic coefficient of the infrared optical glass according to any one of claims 8, wherein: the wavelength of the light source (1) is 1550nm infrared laser light source.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010397254.7A CN111562216A (en) | 2020-05-12 | 2020-05-12 | Device and method for testing stress photoelastic coefficient of infrared optical glass |
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| CN202010397254.7A CN111562216A (en) | 2020-05-12 | 2020-05-12 | Device and method for testing stress photoelastic coefficient of infrared optical glass |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112630001A (en) * | 2020-12-16 | 2021-04-09 | 中国建材检验认证集团股份有限公司 | Glass photoelastic constant measuring device and measuring method |
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|---|---|---|---|---|
| JPH10153500A (en) * | 1996-11-26 | 1998-06-09 | Nikon Corp | Method and device for measuring photoelastic constant |
| CN101592537A (en) * | 2009-07-10 | 2009-12-02 | 成都光明光电股份有限公司 | Stress of optical glass device and measuring method thereof |
| CN201429483Y (en) * | 2009-06-29 | 2010-03-24 | 成都光明光电股份有限公司 | Optical glass stress measuring device |
| CN203376221U (en) * | 2013-07-23 | 2014-01-01 | 重庆市翔银电器配件制造有限公司 | Hardness test device for composite metals |
| CN104535232A (en) * | 2014-11-18 | 2015-04-22 | 湖北新华光信息材料有限公司 | Device and method for testing stress of infrared optical material |
| CN205785610U (en) * | 2016-05-04 | 2016-12-07 | 中国计量大学 | A kind of visible ray, glasses for infrared use dual pathways stress mornitoring system |
| CN111122030A (en) * | 2019-12-10 | 2020-05-08 | 同济大学 | Reflection-transmission type dual-purpose photoelastic instrument |
-
2020
- 2020-05-12 CN CN202010397254.7A patent/CN111562216A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10153500A (en) * | 1996-11-26 | 1998-06-09 | Nikon Corp | Method and device for measuring photoelastic constant |
| CN201429483Y (en) * | 2009-06-29 | 2010-03-24 | 成都光明光电股份有限公司 | Optical glass stress measuring device |
| CN101592537A (en) * | 2009-07-10 | 2009-12-02 | 成都光明光电股份有限公司 | Stress of optical glass device and measuring method thereof |
| CN203376221U (en) * | 2013-07-23 | 2014-01-01 | 重庆市翔银电器配件制造有限公司 | Hardness test device for composite metals |
| CN104535232A (en) * | 2014-11-18 | 2015-04-22 | 湖北新华光信息材料有限公司 | Device and method for testing stress of infrared optical material |
| CN205785610U (en) * | 2016-05-04 | 2016-12-07 | 中国计量大学 | A kind of visible ray, glasses for infrared use dual pathways stress mornitoring system |
| CN111122030A (en) * | 2019-12-10 | 2020-05-08 | 同济大学 | Reflection-transmission type dual-purpose photoelastic instrument |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN112630001A (en) * | 2020-12-16 | 2021-04-09 | 中国建材检验认证集团股份有限公司 | Glass photoelastic constant measuring device and measuring method |
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Application publication date: 20200821 |