CN212380391U - Wafer processing equipment and front cover plate thereof - Google Patents

Wafer processing equipment and front cover plate thereof Download PDF

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Publication number
CN212380391U
CN212380391U CN202020831832.9U CN202020831832U CN212380391U CN 212380391 U CN212380391 U CN 212380391U CN 202020831832 U CN202020831832 U CN 202020831832U CN 212380391 U CN212380391 U CN 212380391U
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Prior art keywords
wafer processing
processing apparatus
cover plate
front cover
window
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CN202020831832.9U
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Chinese (zh)
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金浩天
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Shanghai Z&h Electronic Co ltd
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Shanghai Z&h Electronic Co ltd
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Abstract

The utility model discloses a wafer processing equipment and front shroud of wafer processing equipment, the front shroud of wafer processing equipment includes, the apron main part has a window portion and an auxiliary control portion, the window portion with the adjacent setting of auxiliary control portion, the apron main part still has at least one window that forms in the window portion and installs in the transparent plate of window, can observe the operating condition of at least one processing unit of wafer processing equipment through the transparent plate; and the auxiliary control piece is arranged on the auxiliary control part of the cover plate main body, and the work of at least one processing unit can be controlled through the auxiliary control piece. The working condition of at least one processing unit of the wafer processing equipment is observed through the window part, and the auxiliary control part is operated to control the operation of the corresponding processing unit, so that the convenience and the accuracy of operation and control can be improved.

Description

Wafer processing equipment and front cover plate thereof
Technical Field
The utility model relates to a wafer processing field further relates to a wafer processing equipment and wafer processing equipment's front shroud.
Background
A wafer refers to a substrate (also called a base) from which semiconductor transistors or integrated circuits are fabricated. Since it is a crystalline material, it is also generally circular in shape and is called a wafer. Various circuit element structures can be fabricated on a wafer (e.g., a silicon wafer) to form an integrated circuit product with specific electrical functions.
With the continuous development of technology, various electronic products are rapidly developed, and the demand is increasing, directly resulting in the increase of the demand of wafers. Wafer processing equipment is key equipment for processing wafers by gluing, etching, developing and the like.
It is understood that a wafer processing apparatus often integrates multiple processing units, often requiring the use of one wafer processing apparatus for multiple wafer processing steps. Before or during wafer processing using a wafer processing apparatus, a processing unit of the wafer processing apparatus is often debugged and adjusted to improve the precision of the wafer processing. In the existing wafer processing equipment, due to the limitation of the working principle and the process of the wafer processing equipment, a main operation screen of the wafer processing equipment is far away from a window, an operator cannot operate the main operation screen to debug and adjust the internal processing unit of the wafer processing equipment while observing the working condition of the internal processing unit of the wafer processing equipment, great inconvenience is brought to the adjustment and debugging process, and the debugging precision of the wafer processing equipment can be reduced.
In view of the foregoing, there is a need for improvements in conventional wafer processing equipment.
SUMMERY OF THE UTILITY MODEL
In order to solve the above problem, an object of the present invention is to provide a front cover plate for wafer processing equipment and wafer processing equipment, wherein an operator can operate the control element to work of the internal processing unit of the wafer processing equipment while observing the working condition of the internal processing unit of the wafer processing equipment, thereby improving the convenience and accuracy of the operation.
In order to achieve the above object, the utility model provides a front cover plate of wafer processing equipment, include:
the wafer processing equipment comprises a cover plate main body, a wafer processing device and a control device, wherein the cover plate main body is provided with a window part and an auxiliary control part, the window part is arranged adjacent to the auxiliary control part, the cover plate main body is also provided with at least one window formed in the window part and a transparent plate installed on the window, and the working condition of at least one processing unit of the wafer processing equipment can be observed through the transparent plate;
and the auxiliary control piece is arranged on the auxiliary control part of the cover plate main body, and the work of at least one processing unit can be controlled through the auxiliary control piece.
In some preferred embodiments of the present invention, the auxiliary control member includes an auxiliary operation panel operatively connected to at least one of the processing units, through which the at least one of the processing units can be operated.
In some preferred embodiments of the present invention, the auxiliary control comprises at least one speed switch adapted to be operably connected to a main control unit of the wafer processing apparatus for adjusting the operating speed of the wafer processing apparatus.
In some preferred embodiments of the present invention, the auxiliary control member includes a set of emergency treatment members adapted to be operably connected to at least one processing unit of the wafer processing apparatus, through which the corresponding at least one processing unit can be emergently braked.
In some preferred embodiments of the present invention, one of the emergency treatment members is a first emergency switch adapted to be operably connected to a rotary treatment unit of the wafer processing apparatus, through which the rotary treatment unit can be emergently braked.
In some preferred embodiments of the present invention, one of the emergency treatment members is a second emergency switch adapted to be operably connected to a load handling unit of the wafer processing apparatus, through which the load handling unit can be emergently braked.
In some preferred embodiments of the present invention, one of the emergency treatment members is a third emergency switch adapted to be operably connected to a main processing unit of the wafer processing apparatus, through which the main processing unit can be emergently braked.
In some preferred embodiments of the present invention, the window portion includes a first window portion and a second window portion, and the first window portion and the second window portion are respectively located at upper and lower sides of the auxiliary operating portion.
In some preferred embodiments of the present invention, the auxiliary control part is installed with a connection circuit for connecting the auxiliary control part with the processing unit of the wafer processing apparatus.
According to the utility model discloses an on the other hand, the utility model discloses a wafer processing equipment is further provided, include:
a front cover plate of any of the wafer processing apparatus described above;
a wafer processing apparatus main body;
a main control unit, wherein the front cover plate of the wafer processing equipment and the main control unit are respectively installed on the wafer processing equipment main body, and the main control unit can be operatively connected to the auxiliary control member of the front cover plate of the wafer processing equipment.
In some preferred embodiments of the present invention, the wafer processing apparatus includes a processing area and a wafer taking and placing area, the front cover plate is installed in the processing area, and the main control unit is installed in the wafer taking and placing area.
The utility model discloses the scheme includes following at least one item beneficial effect:
1. the auxiliary control piece is arranged adjacent to the window portion, so that the working condition of at least one processing unit of the wafer processing equipment can be observed through the window portion, the auxiliary control piece is operated to control the operation of the corresponding processing unit, and the convenience and the accuracy of operation and control can be improved.
2. The front cover plate of the wafer processing equipment is provided with a plurality of emergency treatment pieces, and the emergency treatment pieces can emergently brake corresponding processing units so as to prevent the processing units from being damaged due to faults in the working process; the emergency processing pieces are arranged adjacent to the window part of the auxiliary control piece, so that when at least one processing unit of the wafer processing equipment is observed to be in fault through the window part, the corresponding emergency processing pieces are operated to work, the corresponding processing unit is emergently braked, and the response speed of coping with the fault can be improved.
Drawings
The present invention will be described in detail with reference to the accompanying drawings, which are used to illustrate various embodiments of the invention.
Fig. 1 is a schematic front view of a front cover plate of a wafer processing apparatus according to a preferred embodiment of the present invention;
fig. 2 is a schematic block diagram of the wafer processing apparatus according to the above preferred embodiment of the present invention;
fig. 3 is a schematic diagram of the overall structure of a wafer processing apparatus according to a preferred embodiment of the present invention.
The reference numbers illustrate:
1 front shroud, 2 wafer processing equipment main part, 11 apron main parts, 12 auxiliary control spare, 111 window portion, 121 auxiliary operation screen, 112 control portion, 122 speed governing switch, 123 emergency treatment spare, 21 processing unit, 22 main control unit, 23 rotatory processing unit, 24 load processing unit, 25 main processing unit, 26 main control screen, 1111 windows, 1112 transparent plates, the first window portion of 1113, 1114 second window portion, the first speed governing switch of 1221, 1222 second speed governing switch, the first emergency switch of 1231, the second emergency switch of 1232, 1233 third emergency switch.
Detailed Description
In order to more clearly illustrate embodiments of the present invention or technical solutions in the prior art, specific embodiments of the present invention will be described below with reference to the accompanying drawings. It is obvious that the drawings in the following description are only examples of the invention, and that for a person skilled in the art, other drawings and embodiments can be obtained from these drawings without inventive effort.
For the sake of simplicity, only the parts relevant to the present invention are schematically shown in the drawings, and they do not represent the actual structure as a product. In addition, in order to make the drawings concise and understandable, components having the same structure or function in some of the drawings are only schematically illustrated or only labeled. In this document, "one" means not only "only one" but also a case of "more than one".
Example one
Referring to fig. 1 to 2 of the specification, a first preferred embodiment of the present invention provides a front cover plate 1 of a wafer processing apparatus, wherein the front cover plate 1 is adapted to be installed in a wafer processing apparatus main body 2, so that an operating space of the wafer processing apparatus main body 2 can be isolated from an external environment.
The front cover plate 1 includes a cover plate body 11 and an auxiliary controller 12, the cover plate body 11 has a window portion 111 and an auxiliary controller 112, the window portion 111 is disposed adjacent to the auxiliary controller 112, the cover plate body 11 further has at least one window 1111 formed in the window portion 111 and at least one transparent plate 1112, the transparent plate 1112 is installed in the window 1111, and the operation of at least one processing unit 21 of the wafer processing apparatus body 2 can be observed through the transparent plate 1112; the auxiliary controller 12 is mounted on the auxiliary controller 112 of the cover main body 11, and the operation of at least one of the processing units 21 of the wafer processing apparatus main body 2 can be controlled by the auxiliary controller 12.
It should be noted that, in the present preferred embodiment, the window portion 111 is disposed adjacent to the auxiliary manipulation portion 112. In other words, the window 1111 of the window portion 111 is disposed adjacent to the auxiliary controller 12, so that an operator can observe the operation of at least one process unit 21 of the wafer processing apparatus main body 2 through the window 1111 while operating the auxiliary controller 12, thereby being capable of improving convenience of operation and a degree of accuracy of operation.
With reference to the description of fig. 1, the auxiliary control member 12 comprises an auxiliary operating screen 121. The auxiliary operation panel 121 is operatively connected to at least one of the processing units 21 of the wafer processing apparatus main body 2, and the at least one of the processing units 21 of the wafer processing apparatus main body 2 can be operated by the auxiliary operation panel 121.
Specifically, when the state of at least one of the processing units 21 in the wafer processing apparatus main body 2 is inspected and/or adjusted, the auxiliary operation panel 121 disposed adjacent to the window 111 can be operated to adjust and/or inspect the processing unit 21 while observing the operating state of the processing unit 21 through the window 111, so that the accuracy of inspection and/or adjustment can be improved.
Preferably, the auxiliary operation screen 121 is a touch screen, and an operator can directly operate the touch screen to operate at least one of the processing units 21 of the wafer processing apparatus main body 2. It is understood that as long as the utility model aims can be achieved, the secondary operation screen 121 can also be implemented as other operation settings, and the specific type of the secondary operation screen 121 should not constitute a limitation of the utility model.
Further, when the auxiliary operation panel 121 is installed in the wafer processing apparatus body 2, the auxiliary operation panel 121 is adapted to be operatively connected to the main control unit 22 of the wafer processing apparatus body 2 to control the corresponding processing unit 21 of the wafer processing apparatus body 2 through the main control unit 22.
The auxiliary control 12 also includes a speed switch 122. The speed control switch 122 is mounted on the auxiliary operating part 112 of the cover main body 11. The speed regulating switch is adapted to be operatively connected to the main control unit 22 of the wafer processing apparatus main body 2, and the operation speed of the wafer processing apparatus can be controlled by the speed regulating switch 122.
It can be understood that during the maintenance of the wafer processing equipment, the wafer processing equipment does not need to have a fast operation speed, and the operation speed of the wafer processing equipment can be adjusted by the speed-adjusting switch 122 so as to better maintain the wafer processing equipment.
It should be noted that, in the preferred embodiment, the speed regulating switch 122 is disposed adjacent to the window 1111 of the window 111, so that an operator can operate the speed regulating switch 122 to adjust the operation speed of the wafer processing apparatus body 2 while observing the operation of the processing unit 21 in the wafer processing apparatus body 2, thereby enabling the operation speed of the wafer processing apparatus body 2 to be adapted to the speed required for maintenance, so as to improve the maintenance efficiency and the maintenance effect.
Referring to fig. 1 of the specification, the speed control switch 122 further includes a first speed control switch 1221 and a second speed control switch 1222, the first speed control switch 1221 is used for adjusting an operation speed of a Load handling unit 24(Load Port Robot) of the wafer processing apparatus main body 2; the second speed control switch 1222 is used to adjust the operation speed of the Main processing unit 25(Main Process Block) of the wafer processing apparatus Main body 2.
The auxiliary control member 12 also comprises a set of emergency treatment members 123. When the front cover plate 1 is mounted to the wafer processing apparatus body 2, the emergency treatment member 123 is adapted to be operatively connected to the main control unit 22 of the wafer processing apparatus body 2, in other words, the emergency treatment member 123 is adapted to be operatively connected to at least one of the processing units 21 of the wafer processing apparatus body 2, and at least one of the processing units 21 of the corresponding wafer processing apparatus body 2 can be emergency-actuated by a set of the emergency treatment members 123. When the processing unit 21 of the wafer processing apparatus main body 2 malfunctions, the emergency treatment member 123 can be triggered, and the corresponding processing unit 21 of the wafer processing apparatus main body 2 can immediately stop operating to prevent the processing unit 21 of the wafer processing apparatus main body 2 from being damaged; when the emergency treatment member 123 is released, the wafer processing apparatus main body 2 can be restored to operation.
Specifically, one of the emergency treatment members 123 is a first emergency switch 1231. When the front cover plate 1 is mounted to the wafer processing apparatus body 2, the first panic switch 1231 is adapted to be operatively connected to the rotation processing unit 23 of the wafer processing apparatus body 2, and the rotation processing unit 23 of the wafer processing apparatus body 2 can be urgently actuated by the first panic switch 1231. That is, when the rotary processing unit 23 of the wafer processing apparatus body 2 is damaged, the rotary processing unit 23 of the wafer processing apparatus body 2 can be urgently braked by operating the first emergency switch 1231 to prevent the rotary processing unit 23 of the wafer processing apparatus body 2 from being damaged; it is understood that when the malfunction is released, operating the first panic switch 1231 again enables the rotary processing unit 23 of the wafer processing apparatus main body 2 to be restored to operation.
It should be noted that the first panic switch 1231 is disposed adjacent to the window 1111 of the cover main body 11, and when the operator observes the malfunction of the rotating process unit 23 of the wafer processing apparatus main body 2 through the window 1111, the operator can directly operate the first panic switch 1231 to immediately stop the operation of the rotating process unit 23 of the wafer processing apparatus main body 2 to prevent the malfunction of the rotating process unit 23.
Referring to the description of fig. 1, one of the emergency treatment members 123 is a second emergency switch 1232. The second emergency switch 1232 is adapted to be operatively connected to a Load Port Robot (Load Port Robot) 24 of the wafer processing apparatus body 2 when the front cover 1 is mounted to the wafer processing apparatus body 2. When the load handling unit 24 of the wafer processing apparatus main body 2 malfunctions, the load handling unit 24 can be urgently braked by operating the second emergency switch 1232 to prevent the load handling unit 24 from being damaged; it is understood that when the failure of the load handling unit 24 is released, the second emergency switch 1232 is operated again to enable the load handling unit 24 of the wafer processing apparatus main body 2 to be restored to operation.
It should be noted that the second emergency switch 1232 is disposed adjacent to the window 1111 of the cover plate body 11, and when the operator observes the load handling unit 24 of the wafer processing apparatus body 2 to be out of order through the window 1111, the operator can directly operate the second emergency switch 1232 to immediately stop the load handling unit 24 of the wafer processing apparatus body 2 to prevent the load handling unit 24 from being out of order.
Referring to the description of fig. 1, one of the emergency treatment members 123 is a third emergency switch 1233. The third emergency switch 1233 is adapted to be operatively connected to a Main processing unit 25(Main Process Block) of the wafer processing apparatus body 2 when the front cover plate 1 is mounted to the wafer processing apparatus body 2. When the main processing unit 25 of the wafer processing apparatus main body 2 malfunctions, the main processing unit 25 can be urgently braked by operating the third emergency switch 1233 to prevent the main processing unit 25 from being damaged; it is understood that when the main process unit 25 is exhausted due to a failure, the main process unit 24 of the wafer processing apparatus body 2 can be restored to the operation by operating the third emergency switch 1233 again.
It should be noted that the second emergency switch 1233 is disposed adjacent to the window 1111 of the cover main body 11, and when the operator observes the trouble of the loading unit 24 of the wafer processing apparatus main body 2 through the window 111, the third emergency switch 1233 can be directly operated to immediately stop the operation of the main process unit 25 of the wafer processing apparatus main body 2 to prevent the trouble of the main process unit 25.
Referring to fig. 1 of the specification, the window portion 111 includes a first window portion 1113 and a second window portion 1114, and the first window portion 1113 and the second window portion 1114 are respectively located at upper and lower sides of the auxiliary operating portion 112. Preferably, the auxiliary manipulation part 112 is located at a middle position of the first window part 1113 and the second window part 1114, and the first window part 1113 and the second window part 1114 are vertically symmetrical with respect to the auxiliary manipulation part 112.
Further, the first window 1113 has two windows 111 on the left and right, and the second window 1114 also has two windows 111 on the left and right, so that the operation of the process unit 21 in the wafer processing apparatus main body 2 can be observed through the windows 111 in the first window 1113 and the windows 111 in the second window 114.
It should be noted that the auxiliary controller 112 is internally installed with a connection line for connecting the auxiliary controller 12 with the processing unit 21 and/or the main control unit 22 of the wafer processing apparatus main body 2. It should be noted that the connection line is installed inside the auxiliary operating part 112, so that the stability of the connection between the auxiliary controller 12 and the process unit 21 and/or the main control unit 22 of the wafer processing apparatus main body 2 can be ensured. Optionally, the auxiliary control element 12 can also be connected to the processing unit 21 and/or the main control unit 22 of the wafer processing apparatus main body 2 by a wireless connection, and the specific link between the auxiliary control element 12 and the processing unit 21 and the main control unit 22 of the wafer processing apparatus main body 2 should not constitute a limitation of the present invention.
Referring to fig. 1 of the specification, the auxiliary control member 12 of the front cover plate 1 extends along a left-right direction of the cover plate main body 11, and when the front cover plate 1 is mounted to the wafer processing apparatus main body 2 of the wafer processing apparatus main body 2, a right end of the auxiliary control member 12 can contact the main control unit 22 of the wafer processing apparatus main body 2, so that connection of the auxiliary control member 12 to the main control unit 22 of the wafer processing apparatus main body 2 can be facilitated.
Example two
Referring to fig. 3, according to another aspect of the present invention, the second preferred embodiment of the present invention provides a wafer processing apparatus, which includes the front cover plate 1 and the wafer processing apparatus main body 2 of the wafer processing apparatus in the first embodiment, wherein the front cover plate 1 is installed in the wafer processing apparatus main body 2.
The wafer processing apparatus further includes a plurality of processing units 21 and a main control unit 22 formed in the wafer processing apparatus main body 2, and the plurality of processing units 21 and the main control unit 22 are respectively installed in the wafer processing apparatus main body 2. The supplementary control member 12 of the front cover 1 is operatively connected to the process unit 21 and/or the main control unit 22 of the wafer processing apparatus body 2 when the front cover 1 is mounted to the wafer processing apparatus body 2. While observing the operating state of the process unit 21 through the window 1111 of the front cover 1, the process unit 21 of the wafer processing apparatus body 2 can be manipulated by operating the auxiliary controller 12.
It should be noted that the plurality of processing units 21 of the wafer processing apparatus main body 2 form a processing area of the wafer processing apparatus main body 2, and the wafer processing apparatus main body 2 further includes a wafer taking and placing area, through which a wafer to be processed can be placed into the wafer processing apparatus main body 2 or taken out from the wafer processing apparatus main body 2.
The front cover 1 is installed in the process area of the wafer processing apparatus main body 2 so that the plurality of processing units 21 of the wafer processing apparatus main body 2 can be viewed through the window portion of the front cover 1. The wafer processing equipment main body 2 further comprises a main control screen, the main control screen is installed in the wafer taking and placing area of the wafer processing equipment main body 2, and the front cover plate 1 is adjacent to the main control screen.
Preferably, the auxiliary operation panel 121 of the front cover 1 is located at the center of the plurality of processing units 21 of the wafer processing apparatus main body 2, so that the auxiliary operation panel 121 can be operated while observing the operation of the processing units 21 through the window portion of the front cover 1.
The window portion 111 of the front cover plate 1 includes a first window portion 1113 and a second window portion 1114, and the first window portion 1113 and the second window portion 1114 are respectively located at upper and lower sides of the auxiliary manipulation portion 112 of the front cover plate 1. Preferably, the auxiliary manipulation part 112 is located at a middle position of the first window part 1113 and the second window part 1114, and the first window part 1113 and the second window part 1114 are vertically symmetrical with respect to the auxiliary manipulation part 112.
Further, the first window 1113 has two windows 111 on the left and right, and the second window 1114 also has two windows 111 on the left and right, so that the operation of the process unit 21 in the wafer processing apparatus main body 2 can be observed through the windows 111 in the first window 1113 and the windows 111 in the second window 114.
The auxiliary control member 12 of the front cover plate 1 extends in the left-right direction of the cover plate body 11, and when the front cover plate 1 is mounted to the wafer processing apparatus body 2 of the wafer processing apparatus body 2, the right end of the auxiliary control member 12 can be in contact with the main control unit 22 of the wafer processing apparatus body 2, so that the connection of the auxiliary control member 12 to the main control unit 22 of the wafer processing apparatus body 2 can be facilitated.
The wafer processing apparatus main body 2 further has a main control panel 26, and the main control panel 26 is operatively connected to the main processing unit 25, and the operation of the main processing unit 25 can be controlled by the main control panel 26.
It should be noted that the above embodiments can be freely combined as necessary. The foregoing is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, a plurality of improvements and decorations can be made without departing from the principle of the present invention, and these improvements and decorations should also be regarded as the protection scope of the present invention.

Claims (10)

1. A front cover plate for a wafer processing apparatus, comprising:
the wafer processing equipment comprises a cover plate main body, a wafer processing device and a control device, wherein the cover plate main body is provided with a window part and an auxiliary control part, the window part is arranged adjacent to the auxiliary control part, the cover plate main body is also provided with at least one window formed in the window part and a transparent plate installed on the window, and the working condition of at least one processing unit of the wafer processing equipment can be observed through the transparent plate;
and the auxiliary control piece is arranged on the auxiliary control part of the cover plate main body, and the work of at least one processing unit can be controlled through the auxiliary control piece.
2. The front cover plate of wafer processing apparatus as claimed in claim 1, wherein said auxiliary control member comprises an auxiliary operation panel operatively connected to at least one of said processing units, whereby at least one of said processing units can be operated.
3. The front cover plate of wafer processing apparatus as claimed in claim 1, wherein the auxiliary control comprises at least one speed switch adapted to be operably connected to a main control unit of the wafer processing apparatus for adjusting the operating speed of the wafer processing apparatus.
4. The front cover plate of wafer processing apparatus of claim 1, wherein the auxiliary control comprises a set of emergency treatment members adapted to be operably connected to at least one processing unit of the wafer processing apparatus, through which a corresponding at least one processing unit can be emergency actuated.
5. The front cover plate of wafer processing apparatus of claim 4, wherein one of the emergency treatment members is a first emergency switch adapted to be operably connected to a rotary handling unit of the wafer processing apparatus, by which the rotary handling unit can be emergency actuated.
6. The front cover plate of wafer processing apparatus of claim 4, wherein one of the emergency treatment members is a second emergency switch adapted to be operably connected to a load handling unit of the wafer processing apparatus, the load handling unit being emergency actuatable by the second emergency switch.
7. The front cover plate of wafer processing apparatus of claim 4, wherein one of the emergency treatment members is a third emergency switch adapted to be operably connected to a main processing unit of the wafer processing apparatus, the main processing unit being emergency actuatable by the third emergency switch.
8. The front cover plate of a wafer processing apparatus as claimed in any one of claims 1 to 7, wherein the window portion includes a first window portion and a second window portion, and the first window portion and the second window portion are respectively located at upper and lower sides of the auxiliary manipulation portion.
9. A wafer processing apparatus, comprising:
a front cover plate of the wafer processing apparatus of any one of claims 1-8;
a wafer processing apparatus main body;
a main control unit, wherein the front cover plate of the wafer processing equipment and the main control unit are respectively installed on the wafer processing equipment main body, and the main control unit can be operatively connected to the auxiliary control member of the front cover plate of the wafer processing equipment.
10. The wafer processing apparatus as claimed in claim 9, wherein the wafer processing apparatus comprises a process area and a wafer pick-and-place area, the front cover plate is mounted in the process area, and the main control unit is mounted in the wafer pick-and-place area.
CN202020831832.9U 2020-05-18 2020-05-18 Wafer processing equipment and front cover plate thereof Active CN212380391U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202020831832.9U CN212380391U (en) 2020-05-18 2020-05-18 Wafer processing equipment and front cover plate thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202020831832.9U CN212380391U (en) 2020-05-18 2020-05-18 Wafer processing equipment and front cover plate thereof

Publications (1)

Publication Number Publication Date
CN212380391U true CN212380391U (en) 2021-01-19

Family

ID=74178272

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202020831832.9U Active CN212380391U (en) 2020-05-18 2020-05-18 Wafer processing equipment and front cover plate thereof

Country Status (1)

Country Link
CN (1) CN212380391U (en)

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