CN212247208U - Dynamic pressure balance control system in reaction cavity for CVD coating equipment - Google Patents

Dynamic pressure balance control system in reaction cavity for CVD coating equipment Download PDF

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Publication number
CN212247208U
CN212247208U CN202022278897.8U CN202022278897U CN212247208U CN 212247208 U CN212247208 U CN 212247208U CN 202022278897 U CN202022278897 U CN 202022278897U CN 212247208 U CN212247208 U CN 212247208U
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reaction cavity
pressure
liquid ring
valve
vacuum pump
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CN202022278897.8U
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王彤
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Changzhou Ainxi Nano Coating Technology Co ltd
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Changzhou Ainxi Nano Coating Technology Co ltd
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Abstract

The utility model relates to the technical field of metal cutting tools and tool and die coatings, and discloses a dynamic pressure balance control system in a reaction cavity for CVD coating equipment, which comprises a reaction cavity body, wherein the bottom of the reaction cavity body is respectively and fixedly provided with an air inlet, a first pressure transmitter and an air outlet, one end of the air outlet is fixedly connected with a condensation trap, a mechanical pressure gauge is replaced by a pressure transmitter, a pressure value is displayed on a control computer screen in real time, the maintenance of the pressure value of the reaction cavity body is realized by matching an electric control corrugated pipe valve with the first pressure transmitter in the reaction cavity body, the electric control corrugated pipe valve automatically adjusts the opening and closing degree, the whole process is completely and automatically controlled without artificial interference, the pressure transmitter is arranged at the inlet of a liquid ring pump, only when the pressure value at the inlet of the liquid ring vacuum pump is smaller than the, the pneumatic ball valve can be opened, so that the NaOH liquid in the liquid ring pump can be prevented from flowing back into the reaction cavity.

Description

Dynamic pressure balance control system in reaction cavity for CVD coating equipment
Technical Field
The utility model relates to a metal cutting tool and worker's mould coating technical field specifically are a pressure dynamic balance control system in reaction chamber for CVD coating equipment.
Background
CVD is a method for forming a film, especially a thin film forming method, on the surface of a workpiece for metal working of other materials (substrates), such as a die, a cutting tool, a wear-resistant, corrosion-resistant part, etc., and chemical vapor deposition is characterized by the progress of a chemical reaction of compounds contained in reaction gases, the main product of the desired chemical reaction being deposited on the substrate surface and forming a coating or film thereon, possible reaction by-products being present in gaseous form and having to be removed from the gas mixture to secure the film properties, which is achieved by means of an exhaust line. The service life of the coated cutting tool and the tool and die can be greatly prolonged, and the coated parts are more corrosion-resistant and wear-resistant.
In the existing common technology, the pressure measurement in the reaction cavity is generally read by a mechanical pressure gauge, the pressure value set in the reaction cavity is controlled by manually adjusting the opening and closing size of a valve at the inlet of the liquid ring vacuum pump, however, in the technology, the pressure measurement in the reaction cavity is read by a mechanical pressure gauge, the actual pressure in the reaction cavity needs to be known by manually checking the pressure gauge, the set pressure value in the reaction cavity is realized by manually adjusting the opening and closing size of a manual valve at the inlet of the liquid ring vacuum pump to control the air flow pumped away by the liquid ring vacuum pump, because the pressure values of the reaction cavity in each step of each process are different, therefore, the required pressure set value is achieved by controlling the opening and closing size of the valve through manual repeated operation, the workload of field operators is greatly increased, and meanwhile, the stable control of the process parameter pressure value is not facilitated.
SUMMERY OF THE UTILITY MODEL
Technical scheme
For realizing above-mentioned complete automatic control of whole production process, need not the artificial interference purpose, the utility model provides a following technical scheme: the utility model provides a pressure dynamic balance control system in reaction chamber for CVD coating equipment, includes the reaction chamber, reaction chamber bottom fixed mounting has air inlet, first pressure transmitter and gas outlet respectively, the one end fixedly connected with condensation trap of gas outlet, the one end fixed mounting of condensation trap has first pneumatic ball valve, the one end fixedly connected with electric control bellows valve of first pneumatic ball valve, the one end fixedly connected with second pneumatic ball valve of electric control bellows valve, the one end fixedly connected with liquid ring vacuum pump of second pneumatic ball valve, the one end fixed mounting of liquid ring vacuum pump has liquid ring vacuum pump discharge port, the other end fixed mounting of liquid ring vacuum pump has NaOH liquid inlet.
Preferably, a second pressure transmitter is fixedly installed between the second pneumatic ball valve and the liquid ring vacuum pump.
Preferably, the air outlet amount of the air outlet is controlled by an electric control corrugated pipe valve.
Preferably, the pressure in the reaction chamber is controlled by an electrically controlled bellows valve.
Advantageous effects
Compared with the prior art, the utility model provides a pressure dynamic balance control system in reaction chamber for CVD coating equipment possesses following beneficial effect:
1. the system comprises a reaction cavity, a gas inlet, a gas outlet, a gas inlet, a gas outlet, a condensation trap, a first pneumatic ball valve, an electric control corrugated pipe valve, a second pneumatic ball valve, a liquid ring vacuum pump, a gas inlet, a gas outlet.
2. This a pressure dynamic balance control system in reaction chamber for CVD coating equipment, change for pressure transmitter through mechanical pressure gauge, the pressure value shows on controlling the computer screen in real time, the pressure value of reaction chamber passes through the cooperation of the first pressure transmitter in electric control bellows valve and the reaction chamber, electric control bellows valve automatically regulated degree of opening and shutting size is realized, and the complete automatic control of whole process, need not artificial interference, pressure transmitter is installed to liquid ring pump entrance, only when the pressure value of liquid ring vacuum pump entry is less than reaction chamber internal pressure, just can open pneumatic valve, can avoid the interior NaOH liquid of liquid ring pump to flow backward in the reaction chamber like this.
Drawings
FIG. 1 is a schematic view of the overall structure of the present invention;
FIG. 2 is a schematic view of the electrically controlled bellows valve of the present invention in a fully open state;
fig. 3 is a schematic view of the closed state of the electric control bellows valve of the present invention.
In the figure: 1-air inlet, 2-first pressure transmitter, 3-air outlet, 4-condensation trap, 5-first pneumatic ball valve, 6-electric control bellows valve, 7-second pneumatic ball valve, 8-second pressure transmitter, 9-liquid ring vacuum pump, 10-NaOH liquid inlet, 11-liquid ring vacuum pump outlet, 12-reaction cavity.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
Referring to fig. 1-3, a dynamic pressure balance control system for a reaction chamber of a CVD coating apparatus includes a reaction chamber 12, an air inlet 1 is fixedly installed at the bottom of the reaction chamber 12, first pressure transmitter 2 and gas outlet 3, the one end fixedly connected with condensate trap 4 of gas outlet 3, the one end fixed mounting of condensate trap 4 has first pneumatic ball valve 5, the one end fixedly connected with electric control bellows valve 6 of first pneumatic ball valve 5, electric control bellows valve 6 can realize the regulation of degree of opening and shutting size for electric control needle valve or soft pipe pinch valve, the one end fixedly connected with second pneumatic ball valve 7 of electric control bellows valve 6, the one end fixedly connected with liquid ring vacuum pump 9 of second pneumatic ball valve 7, the one end fixed mounting of liquid ring vacuum pump 9 has liquid ring vacuum pump discharge port 11, the other end fixed mounting of liquid ring vacuum pump 9 has NaOH liquid entry 10.
Preferably, a second pressure transmitter 8 is fixedly installed between the second pneumatic ball valve 7 and the liquid ring vacuum pump 9.
Wherein, preferably, the air output of the air outlet 3 is controlled by an electric control corrugated pipe valve 6.
Wherein, preferably, the pressure in the reaction chamber 12 is controlled by the electrically controlled bellows valve 6.
The utility model discloses a theory of operation and use flow: the total real-time air input of the air inlet 1 is different, because the suction force of the liquid ring vacuum pump 9 is fixed, the opening degree of the liquid ring vacuum pump 9 is adjusted according to the difference between the actual pressure and the set pressure in the reaction cavity 12 by the electric control corrugated valve 6, so as to increase or decrease the gas quantity pumped by the liquid ring vacuum pump 9 in the reaction cavity 12, and realize the dynamic balance of the pressure value in the reaction cavity 12, when the actual pressure value (the first pressure transmitter 2) in the reaction cavity 12 is greater than the set value, more gas in the reaction cavity 12 is needed to be pumped by the liquid ring vacuum pump 9, at this time, the electric control corrugated pipe valve 6 rotates reversely according to the instruction given by the system, the screw rotates to drive the rubber valve core or needle valve opening in the electric control corrugated pipe valve 6, thereby increasing the opening degree, the gas quantity pumped away by the gas in the reaction cavity 12 is increased, the pressure value in the reaction cavity 12 is reduced, and when the pressure value in the reaction cavity 12 reaches a set value, the motor of the electric control corrugated pipe valve 6 stops rotating or slightly rotates forwards until the pressure value in the reaction cavity 12 reaches a set dynamic balance; when the actual pressure value (the first pressure transmitter 2) in the reaction cavity 12 is smaller than the set value, at this time, less gas in the reaction cavity 12 needs to be pumped away by the liquid ring vacuum pump 9, at this time, the motor of the electric control bellows valve 6 rotates forward according to the instruction given by the system, and the screw rotates to drive the rubber valve core or the needle valve in the electric control bellows valve 6 to compress the opening, so that the opening and closing degree is reduced, the gas pumping away amount of the gas in the reaction cavity 12 is reduced, the pressure value in the reaction cavity 12 is increased, and when the pressure value in the reaction cavity 12 reaches the set value, the motor of the electric control bellows valve 6 stops rotating or slightly rotates reversely until the pressure value in the reaction cavity 12 reaches the set dynamic balance; when the pressure value (second pressure transmitter 8) of the inlet of the liquid ring vacuum pump 9 is greater than the pressure value in the reaction cavity 12, the gas or liquid can move from the high pressure to the low pressure, so that the backflow phenomenon can be formed, which is undesirable, in order to avoid the backflow phenomenon, the opening condition of the pneumatic ball valve 7 is set in the control system, namely, when the pressure value (second pressure transmitter 8) of the inlet of the liquid ring vacuum pump 9 is less than the pressure value in the reaction cavity 12 (first pressure transmitter 2), the pneumatic ball valve 7 can be opened.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.

Claims (4)

1. A system for controlling the dynamic equilibrium of the internal pressure of a reaction chamber for a CVD coating apparatus, comprising a reaction chamber (12), characterized in that: reaction cavity (12) bottom respectively fixed mounting have air inlet (1), first pressure transmitter (2) and gas outlet (3), the one end fixedly connected with condensate trap (4) of gas outlet (3), the one end fixed mounting of condensate trap (4) has first pneumatic ball valve (5), the one end fixedly connected with electric control bellows valve (6) of first pneumatic ball valve (5), the one end fixedly connected with second pneumatic ball valve (7) of electric control bellows valve (6), the one end fixedly connected with liquid ring vacuum pump (9) of second pneumatic ball valve (7), the one end fixed mounting of liquid ring vacuum pump (9) has liquid ring vacuum pump discharge port (11), the other end fixed mounting of liquid ring vacuum pump (9) has NaOH liquid inlet (10).
2. The system of claim 1, wherein the reaction chamber comprises a chamber body, a chamber cover, a: and a second pressure transmitter (8) is fixedly arranged between the second pneumatic ball valve (7) and the liquid ring vacuum pump (9).
3. The system of claim 1, wherein the reaction chamber comprises a chamber body, a chamber cover, a: the air outlet quantity of the air outlet (3) is controlled by an electric control corrugated pipe valve (6).
4. The system of claim 1, wherein the reaction chamber comprises a chamber body, a chamber cover, a: the pressure in the reaction chamber (12) is controlled by an electrically controlled bellows valve (6).
CN202022278897.8U 2020-10-13 2020-10-13 Dynamic pressure balance control system in reaction cavity for CVD coating equipment Active CN212247208U (en)

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CN202022278897.8U CN212247208U (en) 2020-10-13 2020-10-13 Dynamic pressure balance control system in reaction cavity for CVD coating equipment

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Application Number Priority Date Filing Date Title
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112095091A (en) * 2020-10-13 2020-12-18 常州艾恩希纳米镀膜科技有限公司 Dynamic pressure balance control system in reaction cavity for CVD coating equipment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112095091A (en) * 2020-10-13 2020-12-18 常州艾恩希纳米镀膜科技有限公司 Dynamic pressure balance control system in reaction cavity for CVD coating equipment

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