CN212199409U - Double-sided deposition magnetic control vacuum winding coating equipment - Google Patents
Double-sided deposition magnetic control vacuum winding coating equipment Download PDFInfo
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- CN212199409U CN212199409U CN202020871238.2U CN202020871238U CN212199409U CN 212199409 U CN212199409 U CN 212199409U CN 202020871238 U CN202020871238 U CN 202020871238U CN 212199409 U CN212199409 U CN 212199409U
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Abstract
The utility model relates to the technical field of magnetic control coating, and discloses a double-sided deposition magnetic control vacuum winding coating device, which comprises a vacuum chamber in a vacuum state, wherein an unwinding roller for unwinding a strip, a winding roller for winding the strip and two main rollers which are distributed at intervals are arranged in the vacuum chamber, and the strip between the winding roller and the unwinding roller is reversely wound on the two main rollers after being reversed by a reversing roller; the vacuum chamber is provided with a cleaning ion source for cleaning the strip material by ions and a plurality of magnetron targets for magnetron sputtering coating of the strip material, the magnetron targets and the cleaning ion source are distributed around the main roller, and the cleaning ion source is positioned at the strip material film inlet end of the main roller. The utility model provides a current magnetic control vacuum winding coating machine only can realize single face coating film and handle, need carry out twice clamping operation during two-sided coating film, lead to current magnetic control vacuum winding coating machine coating film cycle length, the problem of inefficiency.
Description
Technical Field
The utility model relates to a magnetic control coating film technical field specifically indicates a two-sided deposit magnetic control vacuum winding coating equipment.
Background
Magnetron sputtering vacuum coating is a method which utilizes the phenomenon that direct current voltage is applied under vacuum condition, discharge phenomenon (called direct current glow discharge) between two electrodes generates electrons, the electrons are accelerated to move under the action of an electric field and collide with neutral atoms to generate positive ions, the positive ions are accelerated to collide with a target material arranged on a cathode under the action of the electric field to form sputtering, and sputtered target material atoms are condensed on the surface of a coating piece (a strip which can be continuously wound) to form a film.
Vacuum coating techniques generally fall into two broad categories, namely Physical Vapor Deposition (PVD) techniques and Chemical Vapor Deposition (CVD) techniques.
The physical vapor deposition technique is a method of directly depositing a plating material on the surface of a substrate by gasifying the plating material into atoms or molecules or ionizing the atoms or molecules into ions by various physical methods under a vacuum condition. The hard reaction film is prepared by physical vapor deposition method, which utilizes some physical process, such as thermal evaporation of material or sputtering of material surface atoms when being bombarded by ions, to realize the controllable transfer process of material atoms from source material to film. The physical vapor deposition technology has the advantages of good film/substrate binding force, uniform and compact film, good controllability of film thickness, wide application of target materials, wide sputtering range, capability of depositing thick films, capability of preparing alloy films with stable components, good repeatability and the like. Is particularly suitable for the field of new materials which are just started at present. Meanwhile, the physical vapor deposition technology can be used as a final treatment process for high-speed steel and hard alloy film cutters because the process treatment temperature can be controlled below 500 ℃. The cutting performance of the cutter can be greatly improved by adopting a physical vapor deposition process, so that the application field of the cutter is expanded while high-performance and high-reliability equipment is competitively developed, and the application of the cutter is more deeply researched especially in high-speed steel, hard alloy and ceramic cutters.
The chemical vapor deposition technique is a method for producing a metal or compound film on a substrate by supplying a simple substance gas or a compound containing a film-forming element to the substrate and by means of a vapor phase action or a chemical reaction on the surface of the substrate, and mainly includes atmospheric pressure chemical vapor deposition, low pressure chemical vapor deposition, plasma chemical vapor deposition having both CVD and PVD characteristics, and the like.
The conventional magnetic control high vacuum winding film plating machine can only carry out single-side film plating treatment on a strip, and in order to realize double-side film plating, the sputtering film plating process is stopped after one side is plated, and the second side is plated after the vacuum chamber is deflated and the turnover is clamped again, so that the pollution is caused when the one side which is subjected to film plating treatment is contacted with air, the efficiency is lower, the film plating period is prolonged, the cost is increased, and the yield is not high.
SUMMERY OF THE UTILITY MODEL
Based on above technical problem, the utility model provides a two-sided deposit magnetic control vacuum winding coating equipment has solved current magnetic control vacuum winding coating machine and has only can realize single face coating treatment, need carry out twice clamping operation during two-sided coating, leads to current magnetic control vacuum winding coating machine coating cycle length, the problem of inefficiency.
For solving the above technical problem, the utility model discloses a technical scheme as follows:
a double-sided deposition magnetic control vacuum winding coating device comprises a vacuum chamber in a vacuum state, wherein an unwinding roller for unwinding a strip, a winding roller for winding the strip and two main rollers which are distributed at intervals are arranged in the vacuum chamber, and the strip between the winding roller and the unwinding roller is reversely wound on the two main rollers after being reversed by a reversing roller; the vacuum chamber is provided with a cleaning ion source for cleaning the strip material by ions and a plurality of magnetron targets for magnetron sputtering coating of the strip material, the magnetron targets and the cleaning ion source are distributed around the main roller, and the cleaning ion source is positioned at the strip material film inlet end of the main roller.
The utility model discloses in, in the coating operation, the strip is through unreeling roller, home roll to the wind-up roll, because wind-up roll and unreel the strip between the roller reverse winding after the switching-over roller on two home rolls, can make one of them face of strip hug closely a home roll, another home roll is hugged closely to the another side. Thus, when the magnetron sputtering coating is carried out by utilizing the magnetron targets, one surface of the strip is coated by the magnetron targets at the periphery of one main roller, the other surface of the strip is coated by the magnetron targets at the periphery of the other main roller, and the strip can be coated on two surfaces in one winding process, so that the coating period is shortened, and the coating efficiency is increased. In addition, the cleaning ion source respectively cleans ions on the surface of the strip before coating, thereby enhancing the binding force between the strip and the coating material and improving the coating quality and yield.
In a preferred embodiment, the main roll has a sandwich structure, and the main roll sandwich is filled with cooling carriers for cooling the strip.
In a preferable mode, flattening rollers are arranged at the two end positions of the film inlet end and the film outlet end of the strip of the main roller.
Preferably, a transition roller is arranged in the vacuum chamber, and the transition roller is used for tensioning and transiting the strip between the two main rollers.
As a preferred mode, the winding roller and the unwinding roller are both provided with swing frames.
In a preferred mode, the magnetron target is a cylindrical rotary magnetron cathode target or a rectangular plane magnetron cathode target.
As a preferred mode, a plurality of observation windows are arranged on the side wall of the vacuum chamber.
Compared with the prior art, the beneficial effects of the utility model are that:
(1) the utility model discloses utilize real empty room's two main rolls and switching-over roller cooperation to thereby make wind-up roll and unreel the strip between the roller reverse winding after the switching-over roller on two main rolls, thereby utilize the strip to once only accomplish the two-sided coating film to the strip in the difference of winding face on the main roll. The problems that the existing magnetic control vacuum winding coating machine only can realize single-side coating treatment, and two times of clamping operation is needed during double-side coating, so that the existing magnetic control vacuum winding coating machine is long in coating period and low in efficiency are solved.
(2) The utility model discloses a washing ion source carries out the ion cleaning to the strip surface earlier respectively before the coating film to reinforcing strip and plating the cohesion between the material.
(3) The utility model discloses a nip roll is taken material operation in-process to take material to open up the paper-back edition, ensures that the strip can not corrugate on the home roll, avoids because the strip corrugates the problem that produces the white silk.
Drawings
Fig. 1 is a schematic structural diagram of the present invention.
The device comprises a vacuum chamber 1, a swing frame 2, a winding roller 3, an unwinding roller 4, a cleaning ion source 5, a magnetic control target 6, a main roller 7, a flattening roller 8, a transition roller 9, a strip material 10 and a reversing roller 11.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present disclosure more apparent, the technical solutions of the embodiments of the present disclosure will be described clearly and completely with reference to the drawings of the embodiments of the present disclosure. It is to be understood that the described embodiments are only a few embodiments of the present disclosure, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the described embodiments of the disclosure without any inventive step, are within the scope of protection of the disclosure.
Unless otherwise defined, technical or scientific terms used herein shall have the ordinary meaning as understood by one of ordinary skill in the art to which this disclosure belongs. The use of "first," "second," and similar terms in this disclosure is not intended to indicate any order, quantity, or importance, but rather is used to distinguish one element from another. The word "comprising" or "comprises", and the like, means that the element or item listed before the word covers the element or item listed after the word and its equivalents, but does not exclude other elements or items. The terms "connected" or "coupled" and the like are not restricted to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "upper", "lower", "left", "right", and the like are used merely to indicate relative positional relationships, and when the absolute position of the object being described is changed, the relative positional relationships may also be changed accordingly.
Example 1:
referring to fig. 1, a double-sided deposition magnetron vacuum winding coating device comprises a vacuum chamber 1 in a vacuum state, wherein an unwinding roller 4 for unwinding a strip 10, a winding roller 3 for winding the strip 10 and two main rollers 7 which are distributed at intervals are arranged in the vacuum chamber 1, and the strip 10 between the winding roller 3 and the unwinding roller 4 is reversed by a reversing roller 11 and then reversely wound on the two main rollers 7; the vacuum chamber 1 is provided with a cleaning ion source 5 for carrying out ion cleaning on the strip 10 and a plurality of magnetron targets 6 for carrying out magnetron sputtering coating on the strip 10, the magnetron targets 6 and the cleaning ion source 5 are distributed around a main roller 7, and the cleaning ion source 5 is positioned at the film inlet end of the strip 10 of the main roller 7.
In the embodiment, in the film coating operation, the strip 10 passes through the unwinding roller 4 and the main roller 7 to the winding roller 3, and as the strip 10 between the winding roller 3 and the unwinding roller 4 is reversed by the reversing roller 11 and then is reversely wound on the two main rollers 7, one surface of the strip 10 can be tightly attached to one main roller 7, and the other surface of the strip 10 can be tightly attached to the other main roller 7. Thus, when the magnetron sputtering coating is carried out by using the magnetron targets 6, one surface of the strip 10 is coated by the magnetron targets 6 on the periphery of one main roller 7, the other surface of the strip 10 is coated by the magnetron targets 6 on the periphery of the other main roller 7, and the strip 10 can be coated on two surfaces in one winding process, so that the coating period is shortened, and the coating efficiency is increased. In addition, the cleaning ion source 5 respectively carries out ion cleaning on the surface of the strip 10 before film coating, so that the binding force between the strip 10 and the coating material is enhanced, and the film coating quality and the yield are improved.
Further, the main roller 7 has a sandwich structure, and a cooling carrier for cooling the strip 10 is filled in the sandwich of the main roller 7. The cooling carrier communicated with the interlayer is used for cooling the strip 10, so that the strip 10 is prevented from being deformed by the influence of high temperature generated by the glow starting of the magnetic control target 6 during film coating. Wherein, the cooling carrier can be cooling water or cooling oil.
Further, flattening rollers 8 are arranged at the two end positions of the film inlet end and the film outlet end of the strip 10 of the main roller 7. Flattening of the strip 10 by the flattening rollers 8 during the running of the strip 10 ensures that the strip 10 does not wrinkle on the main roller 7, avoiding the problem of white filaments due to wrinkling of the strip 10.
Further, a transition roller 9 is arranged in the vacuum chamber 1, and the transition roller 9 is used for tensioning and transiting the strip 10 between the two main rollers 7, so that the strip 10 is transmitted smoothly.
Further, the winding roller 3 and the unwinding roller 4 are both provided with swing frames 2. When the swing frame 2 is adopted, the swing frame 2 arranged on the winding roller 3 and the unwinding roller 4 has a following moving function along with the increase or decrease of the strip 10 when the strip is wound or unwound, the swing frame 2 can rotate around the central shaft of the swing frame, and a following roller mechanism of the swing frame 2 can always keep a certain distance from the outermost layer of the film surface of the strip 10 when the strip is wound or unwound, so that the flatness of the film surface of the strip 10 in the winding and unwinding process is ensured, and the quality of a coating film is ensured.
Further, the magnetron target 6 is a cylindrical rotary magnetron cathode target or a rectangular plane magnetron cathode target.
Furthermore, a plurality of observation windows are arranged on the side wall of the vacuum chamber 1, and the observation windows can be used for facilitating an operator to observe the internal condition of the vacuum chamber.
The embodiment of the present invention is the above. The above embodiments and the specific parameters in the embodiments are only for the purpose of clearly showing the verification process of the utility model, and are not used to limit the patent protection scope of the utility model, the patent protection scope of the utility model is still subject to the claims, all the equivalent structural changes made by using the contents of the specification and the drawings of the utility model are included in the protection scope of the utility model.
Claims (7)
1. The utility model provides a two-sided deposit magnetic control vacuum winding filming equipment, includes vacuum chamber (1) that is the vacuum state, its characterized in that: an unwinding roller (4) for unwinding a strip (10), a winding roller (3) for winding the strip (10) and two main rollers (7) which are distributed at intervals are arranged in the vacuum chamber (1), and the strip (10) between the winding roller (3) and the unwinding roller (4) is reversed by a reversing roller (11) and then reversely wound on the two main rollers (7); the vacuum chamber (1) is provided with a cleaning ion source (5) for performing ion cleaning on the strip (10) and a plurality of magnetron targets (6) for performing magnetron sputtering coating on the strip (10), the magnetron targets (6) and the cleaning ion source (5) are distributed around the main roller (7), and the cleaning ion source (5) is positioned at the film inlet end of the strip (10) of the main roller (7).
2. The double-sided deposition magnetron vacuum winding coating equipment according to claim 1, characterized in that: the main roller (7) is of a sandwich structure, and a cooling carrier for cooling the strip (10) is filled in the sandwich of the main roller (7).
3. The double-sided deposition magnetron vacuum winding coating equipment according to claim 1, characterized in that: flattening rollers (8) are arranged at the two end positions of the film inlet end and the film outlet end of the strip (10) of the main roller (7).
4. The double-sided deposition magnetron vacuum winding coating equipment according to claim 1, characterized in that: the vacuum chamber (1) is internally provided with a transition roller (9), and the transition roller (9) is used for tensioning and transitionally conveying the belt material (10) between the two main rollers (7).
5. The double-sided deposition magnetron vacuum winding coating equipment according to claim 1, characterized in that: and swing frames (2) are arranged on the winding roller (3) and the unwinding roller (4).
6. The double-sided deposition magnetron vacuum winding coating equipment according to claim 1, characterized in that: the magnetic control target (6) is a cylindrical rotary magnetic control cathode target or a rectangular plane magnetic control cathode target.
7. The double-sided deposition magnetron vacuum winding coating equipment according to claim 1, characterized in that: the side wall of the vacuum chamber (1) is provided with a plurality of observation windows.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020871238.2U CN212199409U (en) | 2020-05-21 | 2020-05-21 | Double-sided deposition magnetic control vacuum winding coating equipment |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020871238.2U CN212199409U (en) | 2020-05-21 | 2020-05-21 | Double-sided deposition magnetic control vacuum winding coating equipment |
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| CN212199409U true CN212199409U (en) | 2020-12-22 |
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| CN202020871238.2U Active CN212199409U (en) | 2020-05-21 | 2020-05-21 | Double-sided deposition magnetic control vacuum winding coating equipment |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114182228A (en) * | 2021-09-29 | 2022-03-15 | 上海治臻新能源股份有限公司 | Roll-to-roll continuous deposition equipment for fuel cell bipolar plate coating |
| CN114438456A (en) * | 2021-12-24 | 2022-05-06 | 重庆金美新材料科技有限公司 | Preparation device and preparation process of light and high-conductivity thin film |
-
2020
- 2020-05-21 CN CN202020871238.2U patent/CN212199409U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114182228A (en) * | 2021-09-29 | 2022-03-15 | 上海治臻新能源股份有限公司 | Roll-to-roll continuous deposition equipment for fuel cell bipolar plate coating |
| CN114438456A (en) * | 2021-12-24 | 2022-05-06 | 重庆金美新材料科技有限公司 | Preparation device and preparation process of light and high-conductivity thin film |
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