CN212199084U - Large culture dish normal pressure low temperature plasma processing apparatus - Google Patents
Large culture dish normal pressure low temperature plasma processing apparatus Download PDFInfo
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- CN212199084U CN212199084U CN202020467728.6U CN202020467728U CN212199084U CN 212199084 U CN212199084 U CN 212199084U CN 202020467728 U CN202020467728 U CN 202020467728U CN 212199084 U CN212199084 U CN 212199084U
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Abstract
The utility model discloses a large culture dish normal pressure low temperature plasma processing device, which comprises a box body, a low temperature plasma electrode base station is fixedly arranged on the inner wall of the bottom of the box body, a supporting plate is fixedly arranged on the outer wall of the top of the low temperature plasma electrode base station, a fixing plate is welded at the top end of the supporting plate, a clamping spring is fixedly arranged on the side wall of a through hole, one end of the clamping spring is fixedly connected with a clamping plate, a fixing frame is welded on the outer wall of the top of the box body, the box body is connected with an air cylinder through the fixing frame, the output end of the air cylinder is fixedly connected with a push-pull rod, one end of the push-pull rod, which is far away from the air cylinder, is fixedly connected with a low temperature plasma upper electrode, a connecting plate is fixedly arranged on the outer wall of the bottom, an inner spring is arranged inside the fixed shaft, and an outer spring is sleeved on the outer wall of the movable shaft.
Description
Technical Field
The utility model relates to a plasma experimental facilities technical field, in particular to big culture dish ordinary pressure low temperature plasma processing apparatus.
Background
The plasma is a high-energy substance aggregation state which contains a large number of active particles such as electrons, ions, excited atoms, molecules, photons, free radicals and the like, the material is treated by the plasma to cause physical changes (such as etching, desorption, sputtering, injection, excitation, ionization and the like) and chemical changes (such as oxidation, decomposition, crosslinking, polymerization, grafting and the like) of the surface of the material so as to achieve the purpose of changing the surface characteristics (including hydrophilicity, hydrophobicity, adhesiveness, flame retardance, corrosion resistance, antistatic property and biocompatibility) of the material, the plasma polymerization is to utilize electric discharge to plasmatize organic gaseous monomers to generate various active substances, and to form a polymerization film by the addition reaction between the active substances or between the active substances and the monomers, and the surface treatment of the plasma is to utilize non-polymerizable inorganic gas (Ar 2), N2, H2, O2, etc.) to induce specific functional groups on the surface through surface reaction, to generate surface erosion, to form a cross-linked structure layer or to generate surface free radicals, which can further react to generate specific functional groups, such as hydroperoxide, at the surface free radical position activated by plasma, and because of the existence of ions, free electrons and free radicals in low temperature plasma, it provides chemical reaction conditions which are not available in conventional chemical reactors, not only can decompose molecules in the raw gas, but also can generate polymerization reaction for many organic monomers.
The low-temperature plasma surface modification technology is widely applied to biomedical materials with the special advantages, bioactive molecules can be fixed on the surface of a high polymer material after plasma treatment, and the purpose of being used as the biomedical materials is achieved.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a big culture dish ordinary pressure low temperature plasma processing apparatus to solve the problem that can not fix the product of shape size difference that proposes in the above-mentioned background art.
In order to achieve the above object, the utility model provides a following technical scheme: the utility model provides a big culture dish ordinary pressure low temperature plasma processing apparatus, includes the box, the fixed low temperature plasma electrode base station that is provided with on the bottom inner wall of box, the fixed backup pad that is provided with on the top outer wall of low temperature plasma electrode base station, the top welding of backup pad has the fixed plate, the through-hole has been seted up on the fixed plate, the fixed clamping spring that is provided with on the lateral wall of through-hole, clamping spring's one end fixedly connected with splint, the welding has the mount on the top outer wall of box, the box passes through the mount is connected with the cylinder, the output fixedly connected with push-pull rod of cylinder, the push-pull rod is kept away from the electrode on the one end fixedly connected with.
Preferably, fixed mounting has the connecting plate on the bottom outer wall of box, the welding has the loose axle on the bottom outer wall of connecting plate, the below of loose axle is provided with the fixed axle, the inside cavity of fixed axle, just the bottom of loose axle inserts the inside of fixed axle, the bottom welding of loose axle has the dog, the bottom welding of fixed axle has the backing plate, the inside of fixed axle is provided with the inner spring, just the inner spring is located the below of dog.
Preferably, the outer wall of the movable shaft is sleeved with an outer spring.
Preferably, a fan is fixedly mounted on one side plate of the box body, and a ventilation hole is formed in the side plate, away from the fan, of the box body.
Preferably, the box body is connected with a box door through a hinge, and a side plate of the box body is provided with a touch control plate.
Preferably, a power socket is fixedly arranged on the back plate of the box body, and the back plate of the box body is provided with heat dissipation holes.
Preferably, the support plate is provided with an airflow hole.
The utility model discloses a technological effect and advantage:
1. through backup pad, fixed plate, through-hole, clamping spring and the splint that set up for the device can press from both sides tightly fixedly placing the object of shape size difference on low temperature plasma electrode base station, thereby has guaranteed on low temperature plasma that the electrode pushes down the in-process, and the object of treating can not drop or the displacement.
2. Through connecting plate, loose axle, fixed axle, dog, inner spring and the outer spring that sets up, make the device have better shock attenuation effect when the steady support the device, when the device received the exogenic action, inner spring and outer spring compression cushioned, guaranteed to a certain extent that the object in the box can not be impaired.
3. Through the fan, ventilation hole, louvre and the air current hole that set up for the ventilation cooling effect of the device is better, is convenient for discharge the ozone and the heat that produce in the device use.
Drawings
Fig. 1 is a sectional view of the structure of the present invention.
Fig. 2 is a schematic diagram of the structure of the box body of the present invention.
Fig. 3 is a schematic view of the clamping structure of the present invention.
Fig. 4 is a schematic view of the shock absorbing structure of the present invention.
Fig. 5 is a rear view of the box structure of the present invention.
In the figure: 1. a box body; 2. a low-temperature plasma electrode base; 3. a support plate; 4. a fixing plate; 5. a through hole; 6. a clamping spring; 7. a splint; 8. a fixed mount; 9. a cylinder; 10. a push-pull rod; 11. a low temperature plasma upper electrode; 12. a connecting plate; 13. a movable shaft; 14. a fixed shaft; 15. a stopper; 16. a base plate; 17. an inner spring; 18. an outer spring; 19. a fan; 20. a vent hole; 21. a box door; 22. a touch pad; 23. a power outlet; 24. heat dissipation holes; 25. and an airflow hole.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
The utility model provides a large culture dish normal pressure low temperature plasma processing device as shown in figures 1-5, which comprises a box body 1, a low temperature plasma electrode base station 2 is fixedly arranged on the inner wall of the bottom of the box body 1, a support plate 3 is fixedly arranged on the outer wall of the top of the low temperature plasma electrode base station 2, a fixing plate 4 is welded at the top end of the support plate 3, a through hole 5 is arranged on the fixing plate 4, a clamping spring 6 is fixedly arranged on the side wall of the through hole 5, one end of the clamping spring 6 is fixedly connected with a clamping plate 7, a large culture dish to be processed is placed on the low temperature plasma electrode base station 2 by passing through the through hole 5 on the fixing plate 4, the large culture dish is clamped by the clamping spring 6 and the clamping plate 7, under the action of the clamping spring 6, the device can clamp and fix the large culture dish with different shapes and sizes, a fixing frame, the box body 1 is connected with an air cylinder 9 through a fixing frame 8, the output end of the air cylinder 9 is fixedly connected with a push-pull rod 10, one end, far away from the air cylinder 9, of the push-pull rod 10 is fixedly connected with a low-temperature plasma upper electrode 11, the air cylinder 9 is started, the push-pull rod 10 and the low-temperature plasma upper electrode 11 are driven to be pressed downwards until the push-pull rod and the low-temperature plasma upper electrode 11 are pressed with a large culture dish, and low-temperature plasma is generated in the area between the low-temperature plasma electrode base station 2.
Referring to fig. 1 and 4, a connecting plate 12 is fixedly mounted on the outer wall of the bottom of the box body 1, a movable shaft 13 is welded on the outer wall of the bottom of the connecting plate 12, a fixed shaft 14 is arranged below the movable shaft 13, the fixed shaft 14 is hollow inside, the bottom end of the movable shaft 13 is inserted into the fixed shaft 14, a stop block 15 is welded at the bottom end of the movable shaft 13, a backing plate 16 is welded at the bottom end of the fixed shaft 14, an inner spring 17 is arranged inside the fixed shaft 14, the inner spring 17 is located below the stop block 15, an outer spring 18 is sleeved on the outer wall of the movable shaft 13, when the device is subjected to external force, the connecting plate 12 compresses the outer spring 18, the movable shaft 13 compresses the inner spring 17 through the stop block 15, deformation is generated to buffer, and it is guaranteed to a certain extent.
Combine fig. 1, fig. 2 and fig. 5 show, fixed mounting has fan 19 on one curb plate of box 1, box 1 has seted up ventilation hole 20 on keeping away from one curb plate of fan 19, box 1 has chamber door 21 through hinged joint, install touch panel 22 on one curb plate of box 1, set up the parameter through touch panel 22, fixedly on the backplate of box 1 be provided with power socket 23, through power socket 23 switch on, louvre 24 has been seted up on the backplate of box 1, airflow hole 25 has been seted up on the backup pad 3, start fan 19, accelerate the air flow, make the device's ventilation cooling effect better, be convenient for discharge the ozone and the heat that produce in the device use.
This practical theory of operation: the utility model relates to a big culture dish ordinary pressure low temperature plasma processing apparatus, during the use, switch on the power through power socket 23, then open chamber door 21, pass the big culture dish of pending through-hole 5 on fixed plate 4 and place on low temperature plasma electrode base station 2, press from both sides tightly big culture dish through clamping spring 6 and splint 7, under clamping spring 6's effect, make the apparatus can press from both sides tightly the fixing to big culture dish that the shape size is different, then start cylinder 9, drive push-and-pull rod 10 and low temperature plasma upper electrode 11 and push down until with big culture dish pressfitting, set up the parameter through touch-control board 22, the regional low temperature plasma that produces between low temperature plasma electrode base station 2 and low temperature plasma upper electrode 11 handles big culture dish, start fan 19, under the effect of ventilation hole 20 and louvre 24, accelerate the air flow for the device's ventilation cooling effect is better, is convenient for discharge ozone and the heat that produces in the device use, and when the device received the exogenic action, connecting plate 12 compressed outer spring 18, and loose axle 13 produced deformation and cushions through spring 17 in the 15 compression of dog, has guaranteed to a certain extent that the big culture dish in the box 1 can not be impaired.
Finally, it should be noted that: although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that modifications and variations can be made in the embodiments or in part of the technical features of the embodiments without departing from the spirit and the scope of the invention.
Claims (7)
1. The utility model provides a big culture dish ordinary pressure low temperature plasma processing apparatus, includes box (1), its characterized in that: a low-temperature plasma electrode base station (2) is fixedly arranged on the inner wall of the bottom of the box body (1), a supporting plate (3) is fixedly arranged on the outer wall of the top part of the low-temperature plasma electrode base station (2), a fixing plate (4) is welded at the top end of the supporting plate (3), a through hole (5) is arranged on the fixing plate (4), a clamping spring (6) is fixedly arranged on the side wall of the through hole (5), one end of the clamping spring (6) is fixedly connected with a clamping plate (7), a fixing frame (8) is welded on the outer wall of the top of the box body (1), the box body (1) is connected with a cylinder (9) through the fixing frame (8), the output end of the air cylinder (9) is fixedly connected with a push-pull rod (10), and one end, far away from the air cylinder (9), of the push-pull rod (10) is fixedly connected with a low-temperature plasma upper electrode (11).
2. The atmospheric-pressure low-temperature plasma processing device for the large culture dish according to claim 1, wherein: fixed mounting has connecting plate (12) on the bottom outer wall of box (1), the welding has loose axle (13) on the bottom outer wall of connecting plate (12), the below of loose axle (13) is provided with fixed axle (14), the inside cavity of fixed axle (14), just the bottom of loose axle (13) inserts the inside of fixed axle (14), the bottom welding of loose axle (13) has dog (15), the bottom welding of fixed axle (14) has backing plate (16), the inside of fixed axle (14) is provided with inner spring (17), just inner spring (17) are located the below of dog (15).
3. The atmospheric-pressure low-temperature plasma processing device for the large culture dish according to claim 2, wherein: an outer spring (18) is sleeved on the outer wall of the movable shaft (13).
4. The atmospheric-pressure low-temperature plasma processing device for the large culture dish according to claim 1, wherein: a fan (19) is fixedly mounted on one side plate of the box body (1), and a ventilation hole (20) is formed in the side plate, far away from the fan (19), of the box body (1).
5. The atmospheric-pressure low-temperature plasma processing device for the large culture dish according to claim 1, wherein: the refrigerator is characterized in that the refrigerator body (1) is connected with a refrigerator door (21) through a hinge, and a touch panel (22) is installed on a side plate of the refrigerator body (1).
6. The atmospheric-pressure low-temperature plasma processing device for the large culture dish according to claim 1, wherein: a power socket (23) is fixedly arranged on the back plate of the box body (1), and a heat dissipation hole (24) is formed in the back plate of the box body (1).
7. The atmospheric-pressure low-temperature plasma processing device for the large culture dish according to claim 1, wherein: an airflow hole (25) is formed in the supporting plate (3).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020467728.6U CN212199084U (en) | 2020-04-02 | 2020-04-02 | Large culture dish normal pressure low temperature plasma processing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020467728.6U CN212199084U (en) | 2020-04-02 | 2020-04-02 | Large culture dish normal pressure low temperature plasma processing apparatus |
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| Publication Number | Publication Date |
|---|---|
| CN212199084U true CN212199084U (en) | 2020-12-22 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202020467728.6U Expired - Fee Related CN212199084U (en) | 2020-04-02 | 2020-04-02 | Large culture dish normal pressure low temperature plasma processing apparatus |
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| Country | Link |
|---|---|
| CN (1) | CN212199084U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114151371A (en) * | 2022-01-07 | 2022-03-08 | 肇庆晟辉电子科技有限公司 | Direct-current brushless fan running at low temperature of minus 50 DEG C |
-
2020
- 2020-04-02 CN CN202020467728.6U patent/CN212199084U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114151371A (en) * | 2022-01-07 | 2022-03-08 | 肇庆晟辉电子科技有限公司 | Direct-current brushless fan running at low temperature of minus 50 DEG C |
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Granted publication date: 20201222 |