CN211999949U - Surface copper plating equipment for titanium mesh - Google Patents
Surface copper plating equipment for titanium mesh Download PDFInfo
- Publication number
- CN211999949U CN211999949U CN202020554787.7U CN202020554787U CN211999949U CN 211999949 U CN211999949 U CN 211999949U CN 202020554787 U CN202020554787 U CN 202020554787U CN 211999949 U CN211999949 U CN 211999949U
- Authority
- CN
- China
- Prior art keywords
- shell
- copper plating
- guide roll
- electrolytic cell
- polishing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000007747 plating Methods 0.000 title claims abstract description 34
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 32
- 239000010949 copper Substances 0.000 title claims abstract description 32
- 229910052802 copper Inorganic materials 0.000 title claims abstract description 32
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 title claims abstract description 28
- 238000005498 polishing Methods 0.000 claims abstract description 17
- 239000003792 electrolyte Substances 0.000 claims abstract description 10
- 239000010936 titanium Substances 0.000 claims abstract description 10
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 10
- 229910001651 emery Inorganic materials 0.000 claims abstract description 4
- 238000001035 drying Methods 0.000 claims description 26
- 239000007788 liquid Substances 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 6
- 238000000034 method Methods 0.000 abstract description 3
- 239000010410 layer Substances 0.000 description 5
- 238000005868 electrolysis reaction Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005255 carburizing Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910001431 copper ion Inorganic materials 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005485 electric heating Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
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- Electrolytic Production Of Metals (AREA)
Abstract
The embodiment of the application discloses titanium net is with surperficial copper facing equipment, including the electrolytic bath, electrolyte has been placed to the inside of electrolytic bath, and the both sides fixed mounting at electrolytic bath top has the collateral branch frame, fixed mounting has the shell of polishing on the collateral branch frame, the inboard fixed cup joint of the shell of polishing has the emery wheel of polishing. This application sets up two first guide rolls through the both sides at the electrolytic bath, and set up two second guide rolls and a third guide roll in the inside of electrolytic bath, thereby utilize first guide roll, the second guide roll, the cooperation of third guide roll is spread the titanium net, and all set up second guide roll and third guide roll in electrolyte, make copper-plating process high efficiency more even, copper-plated thickness is inhomogeneous can not appear, still can influence the use when influencing pleasing to the eye degree, and utilize the cooperation of second guide roll and third guide roll, make the expansion that the titanium net can be complete, avoid appearing the inhomogeneous condition of both sides copper-plating, the practicality of device has been improved.
Description
Technical Field
The application relates to the technical field of electroplating equipment, in particular to surface copper plating equipment for a titanium mesh.
Background
The copper plating layer is an important constituent of a protective and decorative plating layer copper/nickel/chromium system, the copper plating layer is flexible and low in porosity, plays an important role in improving the bonding force and corrosion resistance between plating layers, and is also used for local anti-carburizing and printing plate hole metallization and used as a surface layer of a printing roller. The color copper layer after chemical treatment is coated with an organic film and can also be used for decoration, but most of the existing copper plating devices carry out copper plating through manual operation, the situation of uneven surface copper plating thickness exists while the operation is troublesome, and meanwhile, no device for drying and polishing in real time exists during copper plating, so that the copper plating effect is greatly reduced, the market competition is not facilitated, and therefore the surface copper plating equipment for the titanium mesh is provided.
SUMMERY OF THE UTILITY MODEL
In view of the above problems, the present application provides a surface copper plating apparatus for titanium mesh, which has the advantages of uniform copper plating, good copper plating effect and comfortable use, so as to improve the above problems.
In order to achieve the above purpose, the utility model discloses a following technical scheme realizes: the utility model provides a surface copper plating equipment for titanium net, includes the electrolytic bath, electrolyte has been placed to the inside of electrolytic bath, and the both sides fixed mounting at electrolytic bath top has the collateral branch frame, fixed mounting has the shell of polishing on the collateral branch frame, the inboard fixed cover of shell of polishing has cup jointed the emery wheel of polishing, the inside both sides of electrolytic bath are fixed to have cup jointed the second guide roll, and the fixed third guide roll that has cup jointed in middle part of electrolytic bath inner chamber, opposite side fixed cover has cup jointed the buffer beam on the collateral branch frame, the top fixed mounting of buffer beam has the stoving shell, the inboard bottom fixed mounting of stoving shell has the heating wire, and the inboard top of stoving shell is fixed to have cup jointed drying fan.
Optionally, a middle supporting plate is fixedly installed in the middle of the top end of the electrolytic cell, and a liquid feeding pipe is fixedly sleeved on the middle supporting plate.
Optionally, one end of the side support close to the middle of the electrolytic cell is fixedly sleeved with a first guide roller, and the rotation directions of the two first guide rollers are consistent.
Optionally, the middle part of the side support is fixedly sleeved with a left electrode rod, the middle part of the other side support is fixedly sleeved with a right electrode rod, and the left electrode rod and the right electrode rod are symmetrically distributed.
Optionally, a buffer spring is movably sleeved on the buffer rod, and the top end of the buffer spring on the buffer rod is fixedly mounted with the bottom end of the drying shell.
Optionally, a driving motor is fixedly mounted at the top end of the drying shell, and a drying fan is fixedly sleeved at the bottom end of the driving motor.
The application provides a pair of titanium net is with surperficial copper plating equipment possesses following beneficial effect:
1. this application sets up two first guide rolls through the both sides at the electrolytic bath, and set up two second guide rolls and a third guide roll in the inside of electrolytic bath, thereby utilize first guide roll, the second guide roll, the cooperation of third guide roll is spread the titanium net, and all set up second guide roll and third guide roll in electrolyte, make copper-plating process high efficiency more even, copper-plated thickness is inhomogeneous can not appear, still can influence the use when influencing pleasing to the eye degree, and utilize the cooperation of second guide roll and third guide roll, make the expansion that the titanium net can be complete, avoid appearing the inhomogeneous condition of both sides copper-plating, the practicality of device has been improved.
2. This application sets up two collateral branch framves through the both sides at the electrolytic bath top, thereby set up a shell of polishing on the collateral branch frame of feed end, thereby utilize the inside emery wheel of polishing of shell to polish titanium net surface, polish some burrs on it smoothly, subsequent copper facing has been improved, set up a stoving shell simultaneously on the collateral branch frame of discharge end, and at inside heating wire and the drying blower of setting up of stoving shell, and utilize driving motor to drive the rotatory wind-force that produces of drying blower, thereby make and to utilize the heating wire to dry to the titanium net, the reliability of device has been improved.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the description of the embodiments are briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
FIG. 1 shows a schematic structural diagram of the present application;
fig. 2 shows a schematic view of a heating wire of the present structure.
In the figure: 1. an electrolytic cell; 2. a middle support plate; 3. a liquid feeding pipe; 4. an electrolyte; 5. a side bracket; 6. polishing the shell; 7. grinding a grinding wheel; 8. a left electrode bar; 9. a first guide roller; 10. a second guide roller; 11. a third guide roller; 12. a right electrode bar; 13. a buffer rod; 14. drying the shell; 15. an electric heating wire; 16. a drive motor; 17. and (5) drying the fan.
Detailed Description
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only a part of the embodiments of the present application, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
Referring to fig. 1 to 2, the present invention provides a technical solution: a surface copper plating device for a titanium mesh comprises an electrolytic cell 1, wherein a middle supporting plate 2 is fixedly installed in the middle of the top end of the electrolytic cell 1, a liquid feeding pipe 3 is fixedly sleeved on the middle supporting plate 2, the middle of the top end of the electrolytic cell 1 is provided with the middle supporting plate 2, two liquid feeding pipes 3 penetrating through the middle supporting plate 2 can be arranged on the electrolytic cell 1 while shielding the opening of the electrolytic cell 1, so that liquid feeding can be conveniently carried out at any time, the problem of copper plating caused by insufficient electrolyte is avoided, the reliability of the device is improved, electrolyte 4 is placed in the electrolytic cell 1, side brackets 5 are fixedly installed on two sides of the top of the electrolytic cell 1, one ends of the side brackets 5, close to the middle of the electrolytic cell 1, are fixedly sleeved with first guide rollers 9, the rotating directions of the two first guide rollers 9 are consistent, the first guide rollers 9 are respectively arranged on opposite sides of the two side brackets 5, so that the external titanium mesh is guided into the electrolyte 4 in the electrolytic, the titanium mesh can smoothly enter the electrolyte 4 to start copper plating, the practicability of the device is improved, meanwhile, the rotating directions of the two first guide rollers 9 are set to be consistent, so that the titanium mesh can smoothly move forward towards one direction, the middle part of the side bracket 5 is fixedly sleeved with the left electrode bar 8, the middle part of the other side bracket 5 is fixedly sleeved with the right electrode bar 12, the left electrode bar 8 and the right electrode bar 12 are symmetrically distributed, the middle parts of the two side brackets 5 are respectively provided with the left electrode bar 8 and the right electrode bar 12, the electrolysis foundation is ensured, the copper plating can be smoothly carried out, the left electrode bar 8 and the right electrode bar 12 are symmetrically arranged, the electrolysis is more uniform, the reliability of the device is improved, the polishing shell 6 is fixedly arranged on the side bracket 5, the polishing grinding wheel 7 is fixedly sleeved on the inner side of the polishing shell 6, the second guide rollers 10 are fixedly sleeved on the two sides in the electrolytic cell 1, and the middle part of the inner cavity of the electrolytic cell 1 is fixedly sleeved with a third guide roller 11, the bracket 5 at the other side is fixedly sleeved with a buffer rod 13, the buffer rod 13 is movably sleeved with a buffer spring, the top end of the buffer spring on the buffer rod 13 is fixedly installed with the bottom end of the drying shell 14, the buffer spring is arranged on the buffer rod 13, the buffer characteristic of the buffer rod 13 is ensured, so that the shock generated by external force can be eliminated by using the buffer spring on the buffer rod 13 when in use, the copper plating process is prevented from being influenced, the use comfort of the device is improved, the top end of the buffer rod 13 is fixedly provided with the drying shell 14, the top end of the drying shell 14 is fixedly provided with a driving motor 16, the bottom end of the driving motor 16 is fixedly sleeved with a drying fan 17, the top end of the drying shell 14 is provided with a driving motor 16, so that the drying fan 17 is driven to rotate, thereby utilize drying fan 17 rotation to produce wind-force to make air velocity accelerate around, improve the speed of drying, the inboard bottom fixed mounting of drying shell 14 has heating wire 15, and the inboard top of drying shell 14 is fixed to be cup jointed drying fan 17.
In summary, when the surface copper plating equipment for the titanium mesh provided by the application is used, the titanium mesh firstly penetrates through the polishing shell 6 and then is movably connected to the first guide roller 9, then sequentially passes through the second guide roller 10 and the third guide roller 11, finally is guided by the first guide roller 9 again, finally penetrates through the middle part of the drying shell 14, the installation of the device is completed, electroplating is started, electrolysis is started by the left electrode bar 8 and the right electrode bar 12, copper ions are adsorbed on the titanium mesh, the surface of the titanium mesh is sequentially electroplated along with the movement of the first guide roller 9, the second guide roller 10 and the third guide roller 11, and finally liquid is added through the liquid adding pipe 3 at regular time.
Finally, it should be noted that: the above embodiments are only used to illustrate the technical solutions of the present application, and not to limit the same; although the present application has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; such modifications and substitutions do not necessarily depart from the spirit and scope of the corresponding technical solutions in the embodiments of the present application.
Claims (6)
1. The utility model provides a titanium net is with surface copper plating equipment, includes electrolytic bath (1), its characterized in that: electrolyte (4) have been placed to the inside of electrolytic cell (1), and the both sides fixed mounting at electrolytic cell (1) top has collateral branch frame (5), fixed mounting has shell (6) of polishing on collateral branch frame (5), the inboard fixed cover of shell (6) of polishing has cup jointed emery wheel (7) of polishing, the inside both sides of electrolytic cell (1) are fixed to have cup jointed second guide roll (10), and the middle part of electrolytic cell (1) inner chamber is fixed to have cup jointed third guide roll (11), the opposite side fixed cover has cup jointed buffer beam (13) on collateral branch frame (5), the top fixed mounting of buffer beam (13) has stoving shell (14), the inboard bottom fixed mounting of stoving shell (14) has heating wire (15), and stoving shell (14) inboard top is fixed to have cup jointed drying fan (17).
2. The surface copper plating equipment for the titanium mesh according to claim 1, characterized in that: the middle part of the top end of the electrolytic cell (1) is fixedly provided with a middle support plate (2), and the middle support plate (2) is fixedly sleeved with a liquid feeding pipe (3).
3. The surface copper plating equipment for the titanium mesh according to claim 1, characterized in that: one end of the side support (5) close to the middle part of the electrolytic cell (1) is fixedly sleeved with a first guide roller (9), and the rotating directions of the two first guide rollers (9) are consistent.
4. The surface copper plating equipment for the titanium mesh according to claim 1, characterized in that: the middle part of the side support (5) is fixedly sleeved with a left electrode rod (8), the middle part of the other side support (5) is fixedly sleeved with a right electrode rod (12), and the left electrode rod (8) and the right electrode rod (12) are symmetrically distributed.
5. The surface copper plating equipment for the titanium mesh according to claim 1, characterized in that: buffer spring is movably sleeved on the buffer rod (13), and the top end of the buffer spring on the buffer rod (13) is fixedly installed at the bottom end of the drying shell (14).
6. The surface copper plating equipment for the titanium mesh according to claim 1, characterized in that: the drying device is characterized in that a driving motor (16) is fixedly installed at the top end of the drying shell (14), and a drying fan (17) is fixedly sleeved at the bottom end of the driving motor (16).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020554787.7U CN211999949U (en) | 2020-04-15 | 2020-04-15 | Surface copper plating equipment for titanium mesh |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020554787.7U CN211999949U (en) | 2020-04-15 | 2020-04-15 | Surface copper plating equipment for titanium mesh |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN211999949U true CN211999949U (en) | 2020-11-24 |
Family
ID=73413427
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202020554787.7U Expired - Fee Related CN211999949U (en) | 2020-04-15 | 2020-04-15 | Surface copper plating equipment for titanium mesh |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN211999949U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113579929A (en) * | 2021-09-26 | 2021-11-02 | 江苏芝麻工具有限公司 | Automatic machining device and method for metal pressing plate for marble machine |
-
2020
- 2020-04-15 CN CN202020554787.7U patent/CN211999949U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113579929A (en) * | 2021-09-26 | 2021-11-02 | 江苏芝麻工具有限公司 | Automatic machining device and method for metal pressing plate for marble machine |
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| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20201124 |