CN211999896U - Target assembly convenient for brazing welding - Google Patents

Target assembly convenient for brazing welding Download PDF

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Publication number
CN211999896U
CN211999896U CN202020566679.1U CN202020566679U CN211999896U CN 211999896 U CN211999896 U CN 211999896U CN 202020566679 U CN202020566679 U CN 202020566679U CN 211999896 U CN211999896 U CN 211999896U
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groove
target
welding
recess
circular
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姚力军
潘杰
边逸军
王学泽
李小萍
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Ningbo Jiangfeng Electronic Material Co Ltd
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Ningbo Jiangfeng Electronic Material Co Ltd
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Abstract

The utility model provides a target material component convenient for soldering, which comprises a target blank and a back plate combined with the target blank; a first groove and a second groove are formed in the welding surface of the back plate, and the second groove is arranged around the first groove; dividing the side walls of the first groove and the second groove to form a tenon structure; the welding surface of the target blank is provided with a groove matched with the tenon clamping structure. The utility model discloses a set up first recess and second recess at backplate face of weld, make the lateral wall of cutting apart first recess and second recess play the trip effect of fixed target base, can guarantee the welding effect of brazing in the welding process of brazing, can also utilize the expend with heat and contract with cold effect improvement brazing strength of trip structure department to guarantee the stability of gained target subassembly in the magnetron sputtering in-process.

Description

Target assembly convenient for brazing welding
Technical Field
The utility model belongs to the technical field of the semiconductor, a target subassembly is related to, especially, relate to a target subassembly convenient to braze welding.
Background
Magnetron sputtering is a substrate coating process that bombards a target with charged particles to make target atoms escape from the surface and uniformly deposit on a substrate. Magnetron sputtering is an excellent coating process due to its advantages of high sputtering rate, low substrate temperature rise, good film-substrate bonding force, excellent metal coating uniformity and controllability, and is widely used in integrated circuit manufacturing processes.
The target assembly is composed of a target material which accords with sputtering performance and a back plate which is combined with the target material and has certain strength. The back plate can play a supporting role in a sputtering machine table arranged on the target assembly and has the effect of conducting heat. The target assembly is formed by welding the target and the back plate together, and needs to be reliably installed on a sputtering machine table and effectively perform magnetron sputtering under the action of a magnetic field and an electric field.
In the welding process of the target and the back plate, brazing is a welding method which heats the base metal and the solder at the same time at the temperature lower than the melting point of the base metal and higher than the melting point of the solder by using filler metal with the melting point lower than the melting point of the base metal, so that the solder is wetted and fills a gap connected with the base metal after being melted, and the solder and the base metal are mutually diffused to form firm connection. In the magnetron sputtering process, the target material assembly prepared by brazing is adopted, and the brazing layer connecting structure of the target material assembly enables the connecting interface of the target material and the back plate to have good heat conduction performance, so that the heat dissipation performance of the target material assembly can be effectively improved; after the magnetron sputtering is finished, the brazing filler metal layer between the target material and the back plate can be melted at a proper temperature, so that the back plate can be recycled, and the preparation cost of the target material is saved.
CN 101745714 a discloses a welding method of a target assembly, comprising: providing a chromium target blank, a back plate and brazing filler metal; preheating the obtained chromium target blank, and uniformly coating the brazing filler metal on the joint surface of the chromium target blank so that the brazing filler metal is fully infiltrated on the joint surface of the chromium target blank, and removing the redundant brazing filler metal on the joint surface of the chromium target blank; polishing the joint surface of the back plate, preheating, uniformly coating brazing filler metal on the joint surface of the back plate, and performing ultrasonic treatment on the back plate added with the brazing filler metal; brazing the chromium target blank and the back plate, and welding the chromium target blank to the back plate to form a target assembly; and cooling the target assembly. However, the target assembly has a complex and variable use environment, and the target assembly obtained by the welding method is likely to have a desoldering phenomenon in practical application, so that the magnetron sputtering effect is poor.
CN 205996402U discloses a welding layer structure of a brazing target, wherein the welding layer structure of the brazing target is that the welding surfaces of the target are all planes; the welding surface of the back plate is a flat-bottom groove or a concave lens curved surface, and the periphery is a narrow plane; the welding surface of the back plate is upward, the welding surface of the target material is downward, and a welding layer of the brazing material coated between the back plate and the target material is formed. The welding seam obtained by the welding layer structure is attractive, and adverse phenomena such as material shortage, welding seam water seepage and the like easily occurring on the periphery of a brazing target welding layer can be avoided. However, the obtained target assembly is easy to desolder in a complicated and changeable use environment.
CN 103343321 a discloses a method for manufacturing a sputtering target, comprising: the back plate is provided with a groove which is a cylindrical groove or a stepped groove which gradually reduces towards the inner side, the target blank is provided with a bulge, the bulge is a cylindrical bulge or a stepped cylindrical bulge with the diameter gradually reducing towards the inner side, and the bulge of the target blank is pressed into the groove of the back plate by a hot pressing, cold pressing or brazing method to prepare the integral target material. The method also comprises the steps of adding an intermediate layer between the target blank and the back plate by electroplating, thermal spraying, sputtering and brazing, and welding the target blank and the back plate into a whole by hot pressing, cold pressing or brazing. The sputtering target structure provided by the method can improve the welding strength of brazing to a certain extent, but the welding strength between the target obtained by sputtering the target and the back plate is still limited due to the limitation of the thickness of the welding layer.
Therefore, the welding assembly which is simple in structure and capable of improving the brazing strength of the target blank and the back plate is provided, and the welding assembly has important practical application significance for improving the brazing quality and ensuring the smooth proceeding of magnetron sputtering.
SUMMERY OF THE UTILITY MODEL
Not enough to prior art exists, the utility model aims to provide a target subassembly convenient to braze welding, the welded target subassembly simple structure of being convenient for braze, the target of being convenient for and the installation combination of backplate have good welding strength after the welding of just brazing.
To achieve the purpose, the utility model adopts the following technical proposal:
the utility model provides a target material component convenient for soldering, which comprises a target blank and a back plate combined with the target blank; a first groove and a second groove are formed in the welding surface of the back plate, and the second groove is arranged around the first groove; dividing the side walls of the first groove and the second groove to form a tenon structure; the welding surface of the target blank is provided with a groove matched with the tenon clamping structure.
Use the utility model provides a target subassembly convenient to braze welding makes of brazing, and the brazing solder is laid in first recess and/or second recess, and the thickness that the brazing solder was laid carries out reasonable setting according to the degree of depth of first recess and second recess, the utility model discloses do not specifically inject here. The utility model provides a backplate is through the trip structure of cutting apart the lateral wall formation of first recess and second recess, not only is favorable to being connected of target blank and backplate, can also improve target blank and backplate through expend with heat and contract with cold's effect and carry out the welded intensity of brazing.
Preferably, the sidewalls dividing the first and second grooves have the same thickness.
Preferably, the thickness of the side wall dividing the first and second grooves is 0.5-1mm, for example 0.5mm, 0.6mm, 0.7mm, 0.8mm, 0.9mm or 1mm, but not limited to the values recited, and other values not recited in the range of values are equally applicable.
Preferably, the depth of the first groove is 3.2-3.9mm, and may be, for example, 3.2mm, 3.3mm, 3.4mm, 3.5mm, 3.6mm, 3.7mm, 3.8mm or 3.9mm, but is not limited to the values recited, and other values not recited within the range of values are equally applicable.
Preferably, the depth of the second groove is 3-3.5mm, and may be, for example, 3mm, 3.1mm, 3.2mm, 3.3mm, 3.4mm or 3.5mm, but is not limited to the values recited, and other values not recited within the range of values are equally applicable.
Preferably, the depth of the groove in the bonding surface of the target blank is 2.7-3.2mm, and may be, for example, 2.7mm, 2.8mm, 2.9mm, 3mm, 3.1mm or 3.2mm, but is not limited to the values recited, and other values not recited in the range of values are equally applicable.
Preferably, the thickness of the back plate is 5-20mm, for example 5mm, 6mm, 8mm, 10mm, 12mm, 15mm, 16mm, 18mm or 20mm, but is not limited to the values listed, and other values not listed in the numerical range are equally applicable.
Preferably, the thickness of the target blank is 5-30mm, for example 5mm, 10mm, 15mm, 20mm, 25mm or 30mm, but is not limited to the recited values, and other values within the range of values not recited are equally applicable.
Preferably, the target blank comprises a circular target blank or a rectangular target blank.
Preferably, the back plate comprises a circular back plate or a rectangular back plate.
As a preferred technical solution of the target assembly convenient for brazing welding of the present invention, the target blank is a circular target blank, when the backing plate is a circular backing plate, the first groove is a circular groove, the second groove is an annular groove, and central axes of the circular target blank, the circular backing plate, the circular groove and the annular groove coincide; or, the target blank is a rectangular target blank, the backboard is a rectangular backboard, the first groove is a rectangular groove, the second groove is a frame-shaped groove, and the centroids of the rectangular target blank, the rectangular backboard, the rectangular groove and the frame-shaped groove are on the same straight line.
Compared with the prior art, the beneficial effects of the utility model are that:
the utility model discloses a set up first recess and second recess at backplate face of weld, make the lateral wall of cutting apart first recess and second recess play the trip effect of fixed target base, can guarantee the welding effect of brazing in the welding process of brazing, can also utilize the expend with heat and contract with cold effect improvement brazing strength of trip structure department to guarantee the stability of gained target subassembly in the magnetron sputtering in-process.
Drawings
Fig. 1 is a schematic structural diagram of a target assembly for facilitating brazing welding provided in example 1;
FIG. 2 is a schematic structural diagram of a target assembly for facilitating brazing welding provided in example 2;
FIG. 3 is a schematic structural diagram of a target assembly for facilitating brazing welding provided in example 3;
FIG. 4 is a schematic structural diagram of a target assembly for facilitating brazing welding provided in example 4;
fig. 5 is a schematic structural view of the circular back plate provided by the present invention;
fig. 6 is a schematic structural diagram of the rectangular back plate provided by the present invention.
Wherein: 1, a target blank; 2, a back plate; 3, a first groove; 4, a second groove.
Detailed Description
It is to be understood that in the description of the present invention, the terms "central," "longitudinal," "lateral," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like are used in the orientation or positional relationship indicated in the drawings for the purpose of convenience and simplicity of description, and are not intended to indicate or imply that the referenced device or element must have a particular orientation, be constructed and operated in a particular orientation, and are not to be construed as limiting the present invention.
It should be noted that, unless explicitly stated or limited otherwise, the terms "disposed," "connected" and "connected" in the description of the present invention are to be construed broadly, and may for example be fixedly connected, detachably connected or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art through specific situations.
As a preferred technical solution of the target assembly convenient for brazing welding of the present invention, the target assembly convenient for brazing welding comprises a target blank 1 and a back plate 2 combined with the target blank 1; a first groove 3 and a second groove 4 are formed in the welding surface of the back plate 2, and the second groove 4 is arranged around the first groove 3; dividing the side walls of the first groove 3 and the second groove 4 to form a tenon structure; and the welding surface of the target blank 1 is provided with a groove matched with the tenon structure.
Wherein, the thicknesses of the side walls of the first dividing groove 3 and the second dividing groove 4 are equal and are 0.5-1 mm. The depth of the first groove 3 is 3.2-3.9 mm; the depth of the second groove 4 is 3-3.5 mm; the depth of the groove on the welding surface of the target blank 1 is 2.7-3.2 mm; the thickness of the back plate 2 is 5-20 mm; the thickness of the target blank 1 is 5-30 mm.
The target comprises a round target blank 1 or a rectangular target blank 1; the back plate 2 includes a circular back plate or a rectangular back plate. When the target blank 1 is a circular target blank 1 and the back plate 2 is a circular back plate, the first groove 3 is a circular groove, the second groove 4 is an annular groove, and the central axes of the circular target blank 1, the circular back plate, the circular groove and the annular groove are coincided; or, the target blank 1 is a rectangular target blank 1, the backboard 2 is a rectangular backboard, the first groove 3 is a rectangular groove, the second groove 4 is a frame-shaped groove, and the centroids of the rectangular target blank 1, the rectangular backboard, the rectangular groove and the frame-shaped groove are on the same straight line.
The technical solution of the present invention is further explained by the following embodiments with reference to the accompanying drawings.
Example 1
The embodiment provides a target assembly convenient for brazing welding, a schematic structural diagram of the target assembly convenient for brazing welding is shown in fig. 1, and the target assembly comprises a circular target blank 1 and a circular back plate 2 combined with the circular target blank 1, and a schematic structural diagram of the circular back plate 2 is shown in fig. 5.
The welding face of circular backplate 2 is provided with first recess 3 and second recess 4, and second recess 4 encircles first recess 3 and sets up, first recess 3 is circular recess, second recess 4 is annular groove, the central axis coincidence of circular target blank 1, circular backplate 2, circular recess and annular groove.
The thicknesses of the side walls of the first dividing groove 3 and the second dividing groove 4 are equal and are 0.8 mm; the depth of the first groove 3 is 3.9 mm; the depth of the second groove 4 is 3 mm; the depth of the groove of the welding surface of the round target blank 1 is 3 mm. The thickness of the circular back plate 2 is 10mm, and the thickness of the circular target blank 1 is 20 mm.
When the target assembly convenient for brazing welding provided by the embodiment is brazed, brazing solder is laid in the first groove 3; circular target blank 1 is connected through the tenon structure of cutting apart the lateral wall formation of first recess 3 and second recess 4 to circular backplate 2, not only is favorable to being connected of circular target blank 1 and circular backplate 2, can also improve circular target blank 1 and circular backplate 2 through the effect of expend with heat and contract with cold and carry out the welded intensity of brazing.
Example 2
The embodiment provides a target assembly convenient for brazing welding, and the structural schematic diagram of the target assembly convenient for brazing welding is shown in fig. 2, and the target assembly comprises a circular target blank 1 and a circular backing plate 2 combined with the circular target blank 1, and the structural schematic diagram of the circular backing plate 2 is shown in fig. 5.
The welding face of circular backplate 2 is provided with first recess 3 and second recess 4, and second recess 4 encircles first recess 3 and sets up, first recess 3 is circular recess, second recess 4 is annular groove, the central axis coincidence of circular target blank 1, circular backplate 2, circular recess and annular groove.
The thicknesses of the side walls of the first dividing groove 3 and the second dividing groove 4 are equal and are 0.5 mm; the depth of the first groove 3 is 3.3 mm; the depth of the second groove 4 is 3.3 mm; the depth of the groove of the welding surface of the round target blank 1 is 2.7 mm. The thickness of the circular back plate 2 is 5mm, and the thickness of the circular target blank 1 is 5 mm.
When the target assembly convenient for brazing welding provided by the embodiment is brazed, brazing solder is laid in the first groove 3 and the second groove 4; circular target blank 1 is connected through the tenon structure of cutting apart the lateral wall formation of first recess 3 and second recess 4 to circular backplate 2, not only is favorable to being connected of circular target blank 1 and circular backplate 2, can also improve circular target blank 1 and circular backplate 2 through the effect of expend with heat and contract with cold and carry out the welded intensity of brazing.
Example 3
The embodiment provides a target assembly convenient for brazing welding, and the structural schematic diagram of the target assembly convenient for brazing welding is shown in fig. 3, and the target assembly comprises a circular target blank 1 and a circular backing plate 2 combined with the circular target blank 1, and the structural schematic diagram of the circular backing plate 2 is shown in fig. 5.
The welding face of circular backplate 2 is provided with first recess 3 and second recess 4, and second recess 4 encircles first recess 3 and sets up, first recess 3 is circular recess, second recess 4 is annular groove, the central axis coincidence of circular target blank 1, circular backplate 2, circular recess and annular groove.
The thicknesses of the side walls of the first dividing groove 3 and the second dividing groove 4 are equal and are 1 mm; the depth of the first groove 3 is 3.2 mm; the depth of the second groove 4 is 3.5 mm; the depth of the groove on the welding surface of the round target blank 1 is 3.2 mm. The thickness of the circular back plate 2 is 20mm, and the thickness of the circular target blank 1 is 30 mm.
When the target assembly convenient for brazing welding provided by the embodiment is brazed, brazing solder is laid in the second groove 4; circular target blank 1 is connected through the tenon structure of cutting apart the lateral wall formation of first recess 3 and second recess 4 to circular backplate 2, not only is favorable to being connected of circular target blank 1 and circular backplate 2, can also improve circular target blank 1 and circular backplate 2 through the effect of expend with heat and contract with cold and carry out the welded intensity of brazing.
Example 4
The embodiment provides a target assembly convenient for brazing welding, and the structural schematic diagram of the target assembly convenient for brazing welding is shown in fig. 4, and the target assembly comprises a circular target blank 1 and a circular backing plate 2 combined with the circular target blank 1, and the structural schematic diagram of the circular backing plate 2 is shown in fig. 5.
The welding face of circular backplate 2 is provided with first recess 3 and second recess 4, and second recess 4 encircles first recess 3 and sets up, first recess 3 is circular recess, second recess 4 is annular groove, the central axis coincidence of circular target blank 1, circular backplate 2, circular recess and annular groove.
The thicknesses of the side walls of the first dividing groove 3 and the second dividing groove 4 are equal and are 0.8 mm; the depth of the first groove 3 is 3.9 mm; the depth of the second groove 4 is 3 mm; the depth of the groove on the welding surface of the round target blank 1 is 3.2 mm. The thickness of the circular back plate 2 is 10mm, and the thickness of the circular target blank 1 is 20 mm.
When the target material assembly which is convenient for braze welding and provided by the embodiment is braze welded, braze welding materials are laid in the grooves of the welding surface of the first groove 3 and the target blank 1; circular target blank 1 is connected through the tenon structure of cutting apart the lateral wall formation of first recess 3 and second recess 4 to circular backplate 2, not only is favorable to being connected of circular target blank 1 and circular backplate 2, can also improve circular target blank 1 and circular backplate 2 through the effect of expend with heat and contract with cold and carry out the welded intensity of brazing.
Example 5
The embodiment provides a target assembly convenient for brazing welding, which comprises a rectangular target blank 1 and a rectangular back plate 2 combined with the rectangular target blank 1, wherein a schematic structural diagram of the rectangular back plate 2 is shown in fig. 6.
The welding face of rectangle backplate 2 is provided with first recess 3 and second recess 4, and second recess 4 encircles first recess 3 and sets up, first recess 3 is the rectangle recess, second recess 4 is the frame type recess, the central axis coincidence of rectangle target blank 1, rectangle backplate 2, rectangle recess and frame type recess.
The thicknesses of the side walls of the first dividing groove 3 and the second dividing groove 4 are equal and are 0.8 mm; the depth of the first groove 3 is 3.9 mm; the depth of the second groove 4 is 3 mm; the depth of the groove of the welding surface of the rectangular target blank 1 is 3 mm. The thickness of the rectangular back plate 2 is 10mm, and the thickness of the rectangular target blank 1 is 20 mm.
When the target assembly convenient for brazing welding provided by the embodiment is brazed, brazing solder is laid in the first groove 3; rectangular backplate 2 is connected rectangle target blank 1 through the trip structure of cutting apart the lateral wall formation of first recess 3 and second recess 4, not only is favorable to being connected of rectangle target blank 1 and rectangular backplate 2, can also improve rectangle target blank 1 and rectangular backplate 2 through the effect of expend with heat and contract with cold and carry out the welded intensity of brazing.
To sum up, the utility model discloses a set up first recess and second recess at backplate face of weld, make the lateral wall of cutting apart first recess and second recess play the trip effect of fixed target base, can guarantee the welding effect of brazing in the welding process of brazing, can also utilize the expend with heat and contract with cold effect improvement brazing strength of trip structure department to guarantee the stability of gained target subassembly in magnetron sputtering process.
The applicant states that the above description is only a specific embodiment of the present invention, but the protection scope of the present invention is not limited thereto, and those skilled in the art should understand that any changes or substitutions easily conceivable by those skilled in the art within the technical scope of the present invention are within the protection scope and the disclosure scope of the present invention.

Claims (10)

1. The target material assembly convenient for brazing welding is characterized by comprising a target blank and a back plate combined with the target blank;
a first groove and a second groove are formed in the welding surface of the back plate, and the second groove is arranged around the first groove; dividing the side walls of the first groove and the second groove to form a tenon structure;
the welding surface of the target blank is provided with a groove matched with the tenon clamping structure.
2. The target assembly of claim 1, wherein the sidewalls of the segmented first and second grooves are of equal thickness.
3. The target assembly for facilitating braze welding according to claim 1 or 2, wherein the thickness of the side wall dividing the first groove and the second groove is 0.5-1 mm.
4. The target assembly for facilitating braze welding of claim 1, wherein the depth of the first groove is 3.2-3.9 mm.
5. The target assembly for facilitating braze welding according to claim 4, wherein the depth of the second groove is 3-3.5 mm.
6. The target assembly of claim 5, wherein the depth of the groove on the bonding surface of the target blank is 2.7-3.2 mm.
7. A target assembly for facilitating braze welding according to any of claims 4-6, wherein the backing plate has a thickness of 5-20 mm.
8. The target assembly for facilitating braze welding of claim 7, wherein the thickness of the target blank is 5-30 mm.
9. A target assembly for facilitating braze welding according to claim 1, wherein the target blank comprises a circular target blank or a rectangular target blank.
10. The target assembly for facilitating braze welding of claim 7, wherein the backing plate comprises a circular backing plate or a rectangular backing plate.
CN202020566679.1U 2020-04-16 2020-04-16 Target assembly convenient for brazing welding Active CN211999896U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202020566679.1U CN211999896U (en) 2020-04-16 2020-04-16 Target assembly convenient for brazing welding

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202020566679.1U CN211999896U (en) 2020-04-16 2020-04-16 Target assembly convenient for brazing welding

Publications (1)

Publication Number Publication Date
CN211999896U true CN211999896U (en) 2020-11-24

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