CN211990114U

CN211990114U - Cleaning equipment for reaction chamber of semiconductor equipment

Info

Publication number: CN211990114U
Application number: CN201922351868.7U
Authority: CN
Inventors: 王迪杏; 蒋伟; 王宁; 张阳; 秦文兵; 王金裕; 苗全; 盛路阳; 王伟; 顾育琪
Original assignee: Wuxi Diyuante Technology Co ltd
Current assignee: Wuxi Diyuante Technology Co ltd
Priority date: 2019-12-24
Filing date: 2019-12-24
Publication date: 2020-11-24
Anticipated expiration: 2029-12-24

Abstract

The utility model discloses a cleaning equipment of semiconductor equipment reaction cavity, including the cavity body, the inside top of cavity body is fixed with the support column, the top of support column is fixed with the workstation, the ventilation pipe has been run through to the side of cavity body, the inside of ventilation pipe is provided with the air exhauster, the top of cavity body is provided with the apron, die through the bolt lock between apron and the cavity body, it has the casing to run through on the apron, the inside of casing is fixed with the mounting bracket, it is connected with the pivot to rotate through the bearing on the mounting bracket. The utility model discloses the beneficial effect who reaches is: by arranging the blades, the rotating shaft and the spray head, the cleaning gas introduced into the device is washed at multiple angles, so that the washing effect on the interior of the device is good; through setting up motor, gear, support and scraper blade, scrape the pollutant on the inside wall of chamber body, make it fully react with clean gaseous, improve clean effect.

Description

Cleaning equipment for reaction chamber of semiconductor equipment

Technical Field

The utility model relates to a cleaning equipment, in particular to cleaning equipment of semiconductor equipment reaction cavity belongs to reaction cavity clearance technical field.

Background

The reaction chamber of the semiconductor equipment is the most critical container in the production process of the semiconductor equipment, and can well isolate pollutants generated in the manufacturing process and effectively reduce the pollution generated when the device is used in the manufacturing process of the semiconductor equipment.

The existing reaction chamber is mostly filled with clean gas to be cleaned, so that problems exist, the angle of the clean gas filled in the reaction chamber is fixed, the gas scouring angle is fixed, the cleaning effect is poor, pollutants on the inner wall of the reaction chamber are difficult to clean, and the subsequent use is influenced.

SUMMERY OF THE UTILITY MODEL

The to-be-solved technical problem of the utility model is to overcome prior art's defect, current cleaning equipment's the angle of admitting air is fixed, is difficult to carry out the problem of clearing up to the pollutant on the inside wall of device and provides semiconductor equipment reaction chamber's cleaning equipment.

In order to solve the technical problem, the utility model provides a following technical scheme:

the cleaning equipment for the reaction chamber of the semiconductor equipment comprises a chamber body, wherein a supporting column is fixed at the top inside the chamber body, a workbench is fixed at the top of the supporting column, a ventilation pipe penetrates through the side surface of the chamber body, an exhaust fan is arranged inside the ventilation pipe, a cover plate is arranged at the top of the chamber body, the cover plate and the chamber body are locked through bolts, a shell penetrates through the cover plate, a mounting frame is fixed inside the shell, a rotating shaft is rotatably connected onto the mounting frame through a bearing, a spray head is fixedly sleeved at the bottom of the rotating shaft, a first connecting sleeve is fixed at the top of the spray head, the first connecting sleeve is inserted into the shell and is rotatably connected with the shell through a bearing, a paddle is fixedly sleeved at the top of the rotating shaft, a second connecting sleeve penetrates through the top of the shell, and a connecting pipe penetrates through the top of the second connecting sleeve, and a blower is arranged in the connecting pipe.

As a preferred technical scheme of the utility model, it is connected with the sliding sleeve to rotate through the bearing on the support column, be provided with the ring gear on the lateral wall of sliding sleeve, the motor is installed to the bottom of cavity body, the output shaft of motor inserts the inside of cavity body and fixed the cup joint has the gear, the side of sliding sleeve is fixed with the support, the support is kept away from the one end of sliding sleeve and is installed the scraper blade.

As an optimal technical scheme of the utility model, gear and rack meshing transmission, the scraper blade is circular-arc structure, the inside wall sliding connection of scraper blade and cavity body.

As an optimized technical scheme of the utility model, the shower nozzle is hollow cylinder structure, the orifice has been seted up to the side of shower nozzle.

As an optimal technical scheme of the utility model, the fixed coupling has the spacing ring in the pivot, the quantity of spacing ring is two, two the spacing ring is located the top and the bottom of mounting bracket respectively.

As an optimal technical scheme of the utility model, cavity body and casing are hollow cylinder structure, the landing leg is installed to the bottom of cavity body.

The utility model discloses the beneficial effect who reaches is: when cleaning, the vent pipe is connected with a waste gas collecting device, cleaning gas is introduced into the device through a connecting pipe, a blower is started, the blower drives the cleaning gas to be injected into the shell, under the impact of the cleaning gas, the paddle drives the rotating shaft, the rotating shaft drives the spray head, the spray head drives the first connecting sleeve, the cleaning gas is sprayed out from spray holes on the spray head, the interior of the device is uniformly impacted along with the rotation of the spray head, a motor is started, the motor drives a gear, the gear drives a toothed ring through meshing transmission, the toothed ring drives a sliding sleeve, the sliding sleeve drives a support, the support drives a scraper, the scraper scrapes pollutants on the inner side wall of the cavity body to enable the pollutants to fully react with the cleaning gas, after the cleaning is finished, an exhaust fan is started, the mixed gas in the device is extracted to the waste gas collecting device by the exhaust fan, the cleaning effect is good.

Drawings

The accompanying drawings are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention, and together with the description serve to explain the invention and not to limit the invention.

In the drawings:

fig. 1 is a schematic structural diagram of a first embodiment of the present invention;

fig. 2 is a schematic structural diagram of a second embodiment of the present invention;

fig. 3 is a top view of a chamber body according to a second embodiment of the present invention.

In the figure: the device comprises a chamber body 1, supporting columns 2, a workbench 3, a ventilating pipe 4, an exhaust fan 5, a cover plate 6, a shell 7, a mounting rack 8, a rotating shaft 9, a first connecting sleeve 10, a spray head 11, blades 12, a second connecting sleeve 13, a connecting pipe 14, a blower 15, a motor 16, gears 17, a sliding sleeve 18, a support 19 and a scraper 20.

Detailed Description

The preferred embodiments of the present invention will be described in conjunction with the accompanying drawings, and it will be understood that they are presented herein only to illustrate and explain the present invention, and not to limit the present invention.

Examples

The first embodiment is as follows:

as shown in FIG. 1, the utility model provides a cleaning device for semiconductor device reaction chamber, which comprises a chamber body 1, a support column 2 is fixed on the top of the inner part of the chamber body 1, a worktable 3 is fixed on the top of the support column 2, a ventilation pipe 4 penetrates through the side surface of the chamber body 1, an exhaust fan 5 is arranged in the ventilation pipe 4, a cover plate 6 is arranged on the top of the chamber body 1, the cover plate 6 and the chamber body 1 are locked by bolts, a housing 7 penetrates through the cover plate 6, a mounting frame 8 is fixed in the inner part of the housing 7, a rotating shaft 9 is rotatably connected on the mounting frame 8 by a bearing, a nozzle 11 is fixedly sleeved on the bottom of the rotating shaft 9, a first connecting sleeve 10 is fixed on the top of the nozzle 11, the first connecting sleeve 10 is inserted into the inner part of the housing 7 and rotatably connected with the housing 7 by a bearing, a paddle 12 is fixedly sleeved on the top of the rotating, a connecting pipe 14 penetrates through the top of the second connecting sleeve 13, and a blower 15 is arranged inside the connecting pipe 14.

The spray head 11 is a hollow cylinder structure, and the side surface of the spray head 11 is provided with a spray hole; the rotating shaft 9 is fixedly sleeved with two limiting rings, and the two limiting rings are respectively positioned at the top and the bottom of the mounting rack 8; the chamber body 1 and the shell 7 are both hollow cylinder structures, and the bottom of the chamber body 1 is provided with supporting legs.

Example two:

as shown in FIGS. 2-3, the utility model provides a cleaning device for a reaction chamber of a semiconductor device, which comprises a chamber body 1, a support column 2 is fixed at the top inside the chamber body 1, a worktable 3 is fixed at the top of the support column 2, a ventilation pipe 4 penetrates through the side surface of the chamber body 1, an exhaust fan 5 is arranged inside the ventilation pipe 4, a cover plate 6 is arranged at the top of the chamber body 1, the cover plate 6 and the chamber body 1 are locked by bolts, a shell 7 penetrates through the cover plate 6, a mounting frame 8 is fixed inside the shell 7, a rotating shaft 9 is rotatably connected on the mounting frame 8 by a bearing, a spray head 11 is fixedly sleeved at the bottom of the rotating shaft 9, a first connecting sleeve 10 is fixed at the top of the spray head 11, the first connecting sleeve 10 is inserted into the shell 7 and rotatably connected with the shell 7 by a bearing, a paddle 12 is fixedly sleeved at the top of the rotating shaft 9, a second connecting sleeve, a connecting pipe 14 penetrates through the top of the second connecting sleeve 13, and a blower 15 is arranged inside the connecting pipe 14.

A sliding sleeve 18 is rotatably connected to the supporting column 2 through a bearing, a gear ring is arranged on the outer side wall of the sliding sleeve 18, a motor 16 is installed at the bottom of the chamber body 1, an output shaft of the motor 16 is inserted into the chamber body 1 and fixedly sleeved with a gear 17, a support 19 is fixed on the side surface of the sliding sleeve 18, and a scraper 20 is installed at one end, far away from the sliding sleeve 18, of the support 19; the gear 17 is in meshed transmission with the rack, the scraper 20 is of an arc-shaped structure, and the scraper 20 is in sliding connection with the inner side wall of the chamber body 1; the spray head 11 is a hollow cylinder structure, and the side surface of the spray head 11 is provided with a spray hole; the rotating shaft 9 is fixedly sleeved with two limiting rings, and the two limiting rings are respectively positioned at the top and the bottom of the mounting rack 8; the chamber body 1 and the shell 7 are both hollow cylinder structures, and the bottom of the chamber body 1 is provided with supporting legs.

Specifically, when the utility model is used for cleaning, the ventilation pipe 4 is connected with the waste gas collecting device, cleaning gas is introduced into the device through the connecting pipe 14, the air blower 15 is started, the air blower 15 drives the cleaning gas to be injected into the shell 7, under the impact of the cleaning gas, the paddle 12 drives the rotating shaft 9, the rotating shaft 9 drives the nozzle 11, the nozzle 11 drives the first connecting sleeve 10, the cleaning gas is sprayed out through the spray holes on the nozzle 11, the interior of the device is uniformly impacted along with the rotation of the nozzle 11, the motor 16 is started, the motor 16 drives the gear 17, the gear 17 drives the toothed ring through meshing transmission, the toothed ring drives the sliding sleeve 18, the sliding sleeve 18 drives the bracket 19, the bracket 19 drives the scraper 20, the scraper 20 scrapes in the chamber body 1 to scrape pollutants on the inner side wall of the chamber body 1, so that the pollutants are fully reacted with the cleaning gas, after the cleaning is finished, the, the exhaust fan 5 is used for pumping out the mixed gas in the device to the waste gas collecting device, so that the chamber body 1 is convenient to clean, and the cleaning effect is good.

Finally, it should be noted that: although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that modifications may be made to the embodiments described in the foregoing embodiments, or equivalents may be substituted for elements thereof. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims

1. Cleaning equipment for reaction chambers of semiconductor equipment comprises a chamber body (1) and is characterized in that a support column (2) is fixed at the top inside the chamber body (1), a workbench (3) is fixed at the top of the support column (2), a ventilation pipe (4) penetrates through the side face of the chamber body (1), an exhaust fan (5) is arranged inside the ventilation pipe (4), a cover plate (6) is arranged at the top of the chamber body (1), the cover plate (6) and the chamber body (1) are locked through bolts, a shell (7) penetrates through the cover plate (6), a mounting frame (8) is fixed inside the shell (7), a rotating shaft (9) is rotatably connected onto the mounting frame (8) through a bearing, a spray head (11) is fixedly sleeved at the bottom of the rotating shaft (9), and a first connecting sleeve (10) is fixed at the top of the spray head (11), first adapter sleeve (10) insert the inside of casing (7) and pass through the bearing rotation with casing (7) and be connected, paddle (12) have been cup jointed to the top of pivot (9) is fixed, second adapter sleeve (13) has been run through at the top of casing (7), second adapter sleeve (13) rotate with casing (7) through the bearing and are connected, connecting pipe (14) have been run through at the top of second adapter sleeve (13), the inside of connecting pipe (14) is provided with air-blower (15).

2. The cleaning equipment for the reaction chamber of the semiconductor equipment as claimed in claim 1, wherein the supporting column (2) is rotatably connected with a sliding sleeve (18) through a bearing, a toothed ring is arranged on the outer side wall of the sliding sleeve (18), a motor (16) is installed at the bottom of the chamber body (1), an output shaft of the motor (16) is inserted into the chamber body (1) and fixedly sleeved with a gear (17), a bracket (19) is fixed on the side surface of the sliding sleeve (18), and a scraper (20) is installed at one end of the bracket (19) far away from the sliding sleeve (18).

3. The cleaning equipment for the reaction chamber of the semiconductor equipment as claimed in claim 2, wherein the gear (17) is in meshed transmission with a rack, the scraper (20) is of a circular arc structure, and the scraper (20) is in sliding connection with the inner side wall of the chamber body (1).

4. The apparatus for cleaning a reaction chamber of a semiconductor device as claimed in claim 1, wherein the showerhead (11) has a hollow cylindrical structure, and the side surface of the showerhead (11) is opened with a spray hole.

5. The apparatus for cleaning the reaction chamber of the semiconductor device as claimed in claim 1, wherein two limit rings are fixedly sleeved on the rotating shaft (9), and the two limit rings are respectively located at the top and the bottom of the mounting frame (8).

6. The cleaning equipment for the reaction chamber of the semiconductor equipment as claimed in claim 1, wherein the chamber body (1) and the shell (7) are both hollow cylinder structures, and the bottom of the chamber body (1) is provided with a supporting leg.