CN211858595U - Wafer transfer box cleaning equipment and system - Google Patents

Abstract

The utility model provides a can save space, action compactness, can avoid the particle to be stained with wafer transfer box cleaning equipment and system that attaches. The cleaning equipment comprises a front machine table and a rear machine table; the front machine table comprises a first frame body, a first horizontal displacement mechanism, a turnover mechanism, a suction device, a first vertical displacement mechanism, a front cleaning tank, a front cleaning device and a first isolation wall device; the rear machine table comprises a second frame body, a rear cleaning groove, a rear isolating device and a rear cleaning device; the front machine station can separate the box body from the door body, so that the door body descends, and the box body is turned to the rear machine station for cleaning respectively; the cleaning system comprises cleaning, moving, nitrogen charging and temporary storage equipment; the mobile equipment can drive the wafer transmission box cleaned by the cleaning equipment to move; the nitrogen filling equipment can receive the wafer transfer box brought by the movement of the mobile equipment from the cleaning equipment to fill nitrogen into the wafer transfer box; the temporary storage device can receive the wafer transfer box transferred from the nitrogen charging device by the mobile device for temporary storage and output.

Description

Wafer transfer box cleaning equipment and system

Technical Field

The present invention relates to a cleaning structure and system for a wafer transport box, and more particularly to a cleaning device and system for a wafer transport box.

Background

In the conventional semiconductor process, it is necessary to process a wafer by various methods, and the wafer is transported many times through a series of process facilities, so that it is necessary to take care not to be damaged by external impact when storing and transporting the wafer, and to manage so that the surface of the wafer is not contaminated by impurities such as moisture, dust, various organic substances, and the like.

Therefore, in the process, a Front Opening Unified Pod (FOUP), also called a Front Opening Unified Pod, is used to transport and store a plurality of wafers, which is an important carrier equipment for transporting and storing in a semiconductor process chamber.

The foup needs to be periodically cleaned to prevent contamination of the wafers, as the process improves and progresses, the cleaning criteria become more stringent, the number of cleaning cycles and the complexity of each cycle increases to prevent cross-contamination.

In order to avoid contamination, the time for cleaning the pod needs to be shortened, but the conventional pod cleaning machine is affected by the number of cleaning cycles, high complexity, high cleanliness requirement, and shared robot, so that the time reduction is very difficult.

In addition, the traditional wafer transfer box cleaning machine has larger occupied space, long maintenance time and easy solid particle pollution.

Accordingly, the present invention is directed to a wafer pod cleaning apparatus and system structure that can solve the above problems.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide an use more many units, can reduce cost, power consumption, fault rate to save the wafer transfer box cleaning equipment and the system in space.

In order to solve the above problems, the present invention provides a cleaning device for a wafer conveying box, which is characterized in that: the cleaning equipment at least comprises at least one front machine table and a rear machine table arranged at the rear side end of the front machine table; the front machine table comprises a first frame body, a first horizontal displacement mechanism arranged at the front side of the top end of the first frame body, a turnover mechanism arranged at the rear side of the top end of the first frame body corresponding to the first horizontal displacement mechanism, a suction device arranged at the rear side of the top end of the first frame body corresponding to the turnover mechanism, a first vertical displacement mechanism arranged corresponding to the suction device, a front cleaning tank arranged at the rear side of the bottom end of the first frame body, a front cleaning device arranged at the rear side of the first frame body and a first isolation wall device transversely arranged on the first horizontal displacement mechanism in a spanning manner; the first horizontal displacement mechanism can drive the wafer transmission box to displace towards the turnover mechanism; the turnover mechanism can drive the box body of the wafer conveying box to turn over to the rear machine station, and enables the opening of the box body to be changed from a vertical state to a horizontal state; the suction device can carry out vacuum adsorption positioning on the door body of the wafer transfer box and detach the door body from the box body; the first vertical displacement mechanism can drive the suction device to be switched between two states corresponding to the wafer transmission box and the front cleaning groove so as to drive the detached door body together; the front cleaning tank is internally provided with an accommodating space, an opening communicated with the accommodating space is arranged in front of the accommodating space, and the opening can be used for positioning and accommodating the door body transferred by the suction device; the front cleaning device is arranged in the accommodating space and is provided with a base, at least one movable cleaning unit arranged on the base and two drying units respectively arranged at two side ends of the base, the movable cleaning unit can clean the door body, and the drying units can dry the door body; the first isolation wall device can be opened when the first horizontal displacement mechanism drives the wafer transmission box to displace towards the turnover mechanism, so as to reduce the possibility of pollution; the rear machine table comprises a second frame body arranged corresponding to the rear side end of the first frame body, a rear cleaning groove arranged at the top end of the second frame body, a rear separating device arranged above the rear cleaning groove and a rear cleaning device arranged at the bottom end of the rear cleaning groove and with the top end arranged in the rear cleaning groove; the rear cleaning tank can be used for accommodating the box body overturned and moved by the overturning mechanism; the rear isolating device can be used for sealing the rear cleaning groove after the box body is overturned and moved by the overturning mechanism; the rear cleaning device can be covered by the box body which is turned over by the turnover mechanism and can be used for cleaning and drying the interior of the box body.

More preferably, the turnover mechanism further includes a turnover driving device disposed at the rear side of the top end of the first frame body corresponding to the first horizontal displacement mechanism, a left turnover support disposed at the left side of the turnover driving device, and a right turnover support disposed at the right side of the turnover driving device in a mirror image manner; the left turning support also comprises a left Y-shaped support, a left L-shaped support, a plurality of left spacing rods and at least one left positioning assembly, wherein the bottom end of the left Y-shaped support is connected with the left side of the turning driving device; one side of the top end of the left Y-shaped support is parallel to the horizontal plane, the other side of the top end of the left Y-shaped support is vertical to the horizontal plane, the left L-shaped support is further arranged corresponding to the top end of the left Y-shaped support, and the left positioning assembly can be used for positioning the wafer transmission box; the right overturning support further comprises a right Y-shaped support, a right L-shaped support and a plurality of right spacing rods, wherein the bottom end of the right Y-shaped support is connected with the right side of the overturning driving device, the right Y-shaped support is arranged on the left side of the right Y-shaped support at intervals, the right spacing rods are arranged between the right Y-shaped support and the right L-shaped support at intervals, the right positioning assembly is arranged on the left side face of the right L-shaped support, one side of the top end of the right Y-shaped support is parallel to the horizontal plane, the other side of the top end of the right Y-shaped support is perpendicular to the horizontal plane, the right L-shaped support is further corresponding to the top end of the right Y-.

More preferably, the front cleaning device further comprises a rotating device, and the rotating device can drive the movable cleaning unit to rotate; one side of the movable cleaning unit is also provided with a plurality of front cleaning spray heads at intervals; the rear cleaning device also comprises a second driving unit arranged at the bottom end of the rear cleaning tank, a cleaning unit arranged in the rear cleaning tank, a sliding seat movably connected with the second driving unit and a connecting column arranged between the cleaning unit and the sliding seat; the cleaning unit also comprises a left cleaning combination arranged on the left side of the top end of the connecting column, a right cleaning combination arranged on the right side of the top end of the connecting column, an adjusting component arranged between the left cleaning combination and the right cleaning combination and positioned on the top end of the connecting column, and a pipeline integration seat arranged between the left cleaning combination and the right cleaning combination and positioned on the top end of the connecting column; the left cleaning assembly and the right cleaning assembly both also comprise a seat body, an inverted L-shaped drying assembly arranged at the top end of the seat body, a sunken part formed between the seat body and one side of the inverted L-shaped drying assembly and a plurality of L-shaped cleaning spray heads arranged at the sunken part at intervals; the adjusting component is also provided with two inverted T-shaped supports, a left H-shaped wing plate, a right H-shaped wing plate, a cross rod, a bridging block, a screw and an adjusting rotating wheel; the inverted T-shaped brackets are correspondingly arranged at the front side edge and the rear side edge of the top end surface of the pipeline integration seat, and each inverted T-shaped bracket is also internally provided with an inverted T-shaped slot; the left H-shaped wing plate is arranged on the left side of the top end face of the pipeline integration seat, one end of the left H-shaped wing plate is arranged between the inverted T-shaped brackets, and the other end of the left H-shaped wing plate is connected with the left cleaning combination; the right H-shaped wing plate is arranged on the right side of the top end face of the pipeline integration seat, one end of the right H-shaped wing plate is arranged between the inverted T-shaped supports, the other end of the right H-shaped wing plate is connected with the right cleaning combination, the left H-shaped wing plate and the right H-shaped wing plate are positioned at one end between the inverted T-shaped supports and are mutually pivoted, the left H-shaped wing plate and the corresponding end of the horizontal section of each inverted T-shaped support are respectively positioned by a left limiting rod in a sliding mode, and the right H-shaped wing plate and the corresponding end of the horizontal section of each inverted T-shaped support are respectively positioned by a right limiting rod in a; the transverse rod is arranged at the pin joint of the left H-shaped wing plate and the right H-shaped wing plate, the two ends of the transverse rod are respectively matched with the inverted T-shaped grooves of the inverted T-shaped support correspondingly, and the center of the transverse rod is vertically provided with a connecting block; the bridging block is arranged between the inverted T-shaped brackets, and the two ends of the bridging block are respectively connected with the top ends of the inverted T-shaped brackets correspondingly; the screw rod penetrates through the bridging block and then is connected with the connecting block; the adjusting rotating wheel is in threaded connection with the screw and is positioned between the bridging block and the connecting block; the pipeline integration seat can also be used for efficiently transmitting gas and liquid to the left cleaning combination and the right cleaning combination after being connected with corresponding pipelines.

More preferably, the rear cleaning tank further comprises an inverted L-shaped opening disposed at the front end side and the top end side of the rear cleaning tank, a front U-shaped baffle disposed at the front end side of the inverted L-shaped opening, a rear U-shaped baffle disposed at the rear side of the front U-shaped baffle at intervals, an outer n-shaped rubber strip disposed at the top end edge of the rear cleaning tank, and an inner n-shaped rubber strip disposed at the top end edge of the rear cleaning tank and located at the inner side of the outer n-shaped rubber strip; the inner edge of the reverse L-shaped opening at the top end side corresponds to the top end of the front U-shaped baffle plate and is respectively concavely provided with a front sunken part, and the inner edge at the top end side corresponds to the rear U-shaped baffle plate and is also respectively concavely provided with a rear sunken part; the left side and the right side of the closed end of the front U-shaped baffle are respectively provided with a front groove in a concave manner, and the top edge of the closed end of the front U-shaped baffle is also provided with a front isolation rubber strip in a clamping manner; the left side and the right side of the closed end of the rear U-shaped baffle are respectively provided with a rear groove in a concave manner, and a rear separation rubber strip is clamped at the top edge of the closed end of the rear U-shaped baffle; the rear separation device also comprises an inverted L-shaped separation plate which is arranged above the rear cleaning tank and corresponds to the inverted L-shaped opening, a plate vertical driving unit which is arranged at the rear side end of the rear cleaning tank, two plate guide rails which are respectively arranged at the corresponding sides of the rear cleaning tank, a traction line connected with the top end of the inverted L-shaped separation plate and a balancing weight which is arranged at the free end of the traction line; the inverted L-shaped isolation plate is also provided with a front vertical plate body with an H-shaped section and a horizontal plate body with the bottom surface of the front end connected with the top end of the front vertical plate body, the bottom end of the front side surface of the front vertical plate body is further provided with a front baffle plate in an extending way, two sides of the edge of the front side surface of the front vertical plate body are respectively provided with a front sealing rubber strip, and two sides of the edge of the rear side surface of the front vertical plate body are respectively provided with a rear sealing rubber strip; the top end of the plate vertical driving unit is also connected with the inverted L-shaped isolation plate; the top ends of the plate guide rails are also respectively connected with the corresponding sides of the inverted L-shaped isolation plates; the traction wire is connected with the top end of the inverted L-shaped isolation plate and then turns around towards the rear side of the rear cleaning tank, and the traction wire extends to the rear side of the rear cleaning tank.

More preferably, the rear machine table further comprises a left abutting member and a right abutting member, the left abutting member is arranged in the rear cleaning tank and corresponds to the left overturning support, the right abutting member corresponds to the right overturning support, the left abutting member can be used for supporting the left overturning support overturned from the inverted L-shaped opening into the rear cleaning tank, and the right abutting member can be used for supporting the right overturning support overturned from the inverted L-shaped opening into the rear cleaning tank; the front isolation rubber strip is also sequentially provided with an inverted U-shaped rubber strip and an O-shaped rubber strip in parallel from outside to inside, and the inner side surface of the front side end of the inverted U-shaped rubber strip is also provided with an inverted hook strip which can be used for matching and positioning the top edge of the closed end of the front U-shaped baffle; the rear separation rubber strip is also sequentially provided with an O-shaped rubber strip and an inverted U-shaped rubber strip in parallel from outside to inside, and an inverted hook strip is also arranged on the inner side surface of the rear end of the inverted U-shaped rubber strip and can be matched and positioned on the top edge of the closed end of the rear U-shaped baffle; the front sealing rubber strip and the rear sealing rubber strip both comprise a U-shaped rubber strip and a 3-shaped rubber strip which is arranged on one side of the U-shaped rubber strip in parallel and the sealing ends of which are mutually butted, and the inner side surface of the front side end of the U-shaped rubber strip is also provided with an inverted hook part.

More preferably, the left positioning assembly further comprises a left supporting block disposed at the free end of the horizontal section of the left L-shaped bracket, a left guiding block disposed at the center of the horizontal section of the left L-shaped bracket, a left limiting block disposed at the center of the vertical section of the left L-shaped bracket, and a left stop block disposed at the free end of the vertical section of the left L-shaped bracket; the right positioning component also comprises a right supporting block arranged at the free end of the horizontal section of the right L-shaped bracket, a right guiding block arranged at the center of the horizontal section of the right L-shaped bracket, a right limiting block arranged at the center of the vertical section of the right L-shaped bracket and a right stop block arranged at the free end of the vertical section of the right L-shaped bracket.

More preferably, the first horizontal displacement mechanism further comprises a first displacement driving device disposed at a front side of a top end of the first frame body and a first horizontal displacement pedestal disposed at a top end of the first displacement driving device, the first displacement driving device is capable of driving the first horizontal displacement pedestal to displace, and the first horizontal displacement pedestal is capable of receiving and positioning the wafer transport box; the suction device is also provided with two vacuum suction disc parts and two locking head parts which are respectively arranged at two sides of the front side surface of the suction device, the two vacuum suction disc parts are also arranged in a diagonal shape and can be used for sucking the door body, and the locking head part is positioned between the vacuum suction disc parts and can be used for locking the door body; the first vertical displacement mechanism further comprises a first driving unit arranged on the left side of the suction device and a vertical guide rail frame arranged on the right side of the suction device, the first driving unit can be used for driving the suction device to vertically displace, and the vertical guide rail frame can be used for guiding the suction device to vertically displace; the front cleaning tank also comprises a front cleaning tank shell and an accommodating plate body, the front cleaning tank shell can be matched with the accommodating plate body and the base to form the accommodating space, and the accommodating plate body can be matched to form the opening; the first partition wall device further comprises a first partition frame body transversely arranged on the first horizontal displacement mechanism in a spanning mode, a first wallboard moving device vertically arranged at the top end of the first partition frame body, and a first wallboard movably arranged at the bottom end of the first partition frame body and connected with one end of the first wallboard moving device, and the first wallboard moving device can drive the first wallboard to enable the first wallboard to move up and down along the first partition frame body in a sliding mode.

The technical means of the utility model, in the aspect of cleaning system, be realized like this, for a wafer transfer box cleaning system, cleaning system can be applied to and carry out clean usefulness, its characterized in that to the wafer transfer box: the cleaning system at least comprises at least one cleaning device as described in any one of the above, at least one moving device, at least one nitrogen charging device and at least one temporary storage device; the moving device is arranged above the cleaning device, the nitrogen charging device and the temporary storage device, spans the cleaning device, the nitrogen charging device and the temporary storage device, and can drive the wafer conveying box cleaned by the cleaning device to move; the nitrogen filling equipment is arranged on one side of the cleaning equipment and can receive the wafer conveying box brought by the movement of the mobile equipment from the cleaning equipment so as to fill nitrogen into the wafer conveying box; the temporary storage device is arranged on the other side of the cleaning device and can receive the wafer conveying box transferred from the nitrogen filling device by the mobile device for temporary storage and output.

More preferably, the mobile device further includes a square substrate disposed at the top end of the cleaning system, a lateral displacement mechanism disposed at the edge of the rear side of the opening of the substrate, a lateral guide rail disposed at the edge of the front side of the opening of the substrate, a first clamp seat straddling the lateral displacement mechanism and the lateral guide rail, and a clamp disposed at the bottom end of the first clamp seat and penetrating through the opening of the substrate, wherein the lateral displacement mechanism is capable of driving the first clamp seat to move along the lateral guide rail, the lateral guide rail is capable of guiding the first clamp seat, the first clamp seat is capable of driving the clamp together, and the clamp is capable of clamping and positioning the wafer transport box; the nitrogen filling device further comprises a bearing disc arranged on one side of the cleaning device, at least one nitrogen filling head group arranged on the bearing disc, a plurality of positioning pins arranged on the bearing disc, and a plurality of sensing units respectively arranged corresponding to the positioning pins, wherein the bearing disc can be used for bearing the wafer conveying box moved by the mobile device, the nitrogen filling head group can be used for filling nitrogen into the wafer conveying box moved by the mobile device, the positioning pins can be used for positioning the wafer conveying box moved by the mobile device, and the sensing units can be used for judging whether the wafer conveying box moved by the mobile device is correctly placed or not by the nitrogen filling device; the temporary storage equipment also comprises a third frame body, a second horizontal displacement mechanism arranged at the front end of the third frame body and a second isolation wall device transversely striding over the second horizontal displacement mechanism; the second horizontal displacement mechanism can drive the wafer transport box to displace towards the external direction, and further comprises a second displacement driving device arranged on the front side of the top end of the third frame body and a second horizontal displacement pedestal arranged on the top end of the second displacement driving device, wherein the second displacement driving device can drive the second horizontal displacement pedestal to displace, and the second horizontal displacement pedestal can be used for bearing and positioning the wafer transport box; the second isolation wall device further comprises a second isolation frame body arranged on the second horizontal displacement mechanism, a second wallboard moving device vertically arranged at the top end of the second isolation frame body, and a second wallboard movably arranged at the bottom end of the second isolation frame body and connected with one end of the second wallboard moving device, wherein the second wallboard moving device can drive the second wallboard to enable the second wallboard to slide up and down along the second isolation frame body.

More preferably, the fixture further includes a third driving unit disposed on one side of the first fixture seat, a fixture guiding rail disposed on the other side of the first fixture seat, a second fixture seat disposed between the third driving unit and the fixture guiding rail, a chuck driving set disposed on a bottom end surface of the second fixture seat, a left clamping jaw movably disposed on a left side of the chuck driving set, and a right clamping jaw movably disposed on a right side of the chuck driving set, the third driving unit is capable of driving the second fixture seat to move along the fixture guiding rail, the fixture guiding rail is capable of cooperating with the third driving unit to guide the second fixture seat, the second fixture seat is capable of carrying the chuck driving set, and the chuck driving set is capable of driving the left clamping jaw and the right clamping jaw to move away from each other, The left clamping jaw and the right clamping jaw can be matched with each other to clamp the wafer transmission box; the chuck driving group further comprises a bidirectional driving unit arranged on the bottom end face of the second chuck base, a left actuating block movably arranged at the left side of the bidirectional driving unit, a right actuating block movably arranged at the right side of the bidirectional driving unit, and a shell which is sleeved outside the bidirectional driving unit and connected with the second chuck base, wherein the bidirectional driving unit can drive the left actuating block and the right actuating block to actuate simultaneously, the bottom end face of the left actuating block is also connected with the left clamping jaw and can be used for driving the left clamping jaw, and the bottom end face of the right actuating block is also connected with the right clamping jaw and can be used for driving the left clamping jaw; the nitrogen filling head group also comprises a plurality of first nitrogen filling heads respectively arranged on the bearing disc and at least two second nitrogen filling heads respectively corresponding to the first nitrogen filling heads and arranged at the outer side of the first nitrogen filling heads.

Compared with the prior art, the utility model discloses an effect as follows:

the utility model discloses cleaning equipment, through the cooperation of preceding board and back board, can overturn, split wafer conveying box, clean box body, door body simultaneously, overall speaking, the action is compact, can the lifting efficiency, and the maintenance ageing is short moreover to pull down the mode of door body perpendicularly, can also avoid the particle to be stained with and attach, the pollution abatement probably.

The utility model discloses cleaning system utilizes the mobile device, fills nitrogen equipment and the cooperation of equipment of keeping in, can reach best utilization rate, does not use complicated and huge robot or arm, and occupation space is few, is different from traditional cleaning system, and each equipment independently functions moreover, moves compactly to the modular design, the maintenance is very convenient easy to maintain, and is most important, under certain efficiency, can avoid taking place the contaminated problem of clean in-process effectively.

Drawings

Fig. 1 is a schematic perspective view of the cleaning apparatus of the present invention.

Fig. 2 is a schematic perspective view of the first horizontal displacement mechanism in the front machine of the cleaning device of the present invention.

Fig. 3 is an exploded view of the first partition wall device in the front machine of the cleaning apparatus of the present invention.

Fig. 4 is a schematic perspective view of the turnover mechanism in the front machine of the cleaning device of the present invention.

Fig. 5 is a three-dimensional exploded view of the turnover mechanism in the front machine platform of the cleaning device of the present invention.

Fig. 6 is a schematic perspective view of the suction device and the first vertical displacement mechanism in the front machine of the cleaning apparatus of the present invention.

Fig. 7 is a schematic perspective view of the front cleaning tank and the front cleaning device in the front machine of the cleaning apparatus of the present invention.

Fig. 8 is a three-dimensional exploded view of the front cleaning tank and the front cleaning device in the front machine of the cleaning apparatus of the present invention.

Fig. 9 is a three-dimensional exploded view of the rear separation device in the rear machine of the cleaning apparatus of the present invention.

Fig. 10 is a three-dimensional exploded view of the rear cleaning device in the rear machine of the cleaning apparatus of the present invention.

Fig. 11 is an exploded perspective view of portion a of fig. 10.

Fig. 12 is a three-dimensional exploded view of the rear cleaning tank in the rear machine of the cleaning apparatus of the present invention.

Fig. 13 is a schematic view of a cleaning apparatus according to the present invention.

Fig. 14 is a schematic view of a cleaning apparatus according to the present invention.

Fig. 15 is a first schematic view of a cross-sectional implementation of the cleaning apparatus of the present invention.

Fig. 16 is a schematic diagram of a cross-sectional implementation of the cleaning apparatus of the present invention.

Fig. 17 is a schematic perspective view of the cleaning system of the present invention.

Fig. 18 is a schematic perspective view of the mobile device in the cleaning system of the present invention.

Fig. 19 is a schematic perspective view of the clamp of the mobile device in the cleaning system of the present invention.

Fig. 20 is a schematic perspective exploded view of the clamp of the mobile device in the cleaning system of the present invention.

Fig. 21 is a schematic perspective view of the temporary storage device in the cleaning system of the present invention.

Fig. 22 is an exploded view of the temporary storage device of the cleaning system of the present invention.

Fig. 23 is a schematic perspective view of a nitrogen charging device in the cleaning system of the present invention.

Fig. 24 is an exploded view of the nitrogen charging device of the cleaning system of the present invention.

Fig. 25 is a schematic diagram of a top view of the cleaning apparatus of the present invention.

Fig. 26 is a schematic diagram of a top view of the cleaning apparatus according to the present invention.

Fig. 27 is a schematic diagram of a top view of the cleaning apparatus according to the present invention.

Description of reference numerals:

1 vertical driving unit of front machine table 232 plate

11 first frame 233 plate guide rail

12 first horizontal displacement mechanism 234 pull wire

121 first displacement driving device 235 balancing weight

122 first horizontal displacement table 23a U rubber strip

13 turnover mechanism 23b 3-shaped adhesive tape

131 overturning driving device 23c barb part

132 left-turning bracket 24 back cleaning device

1321 left Y-bracket 241 second drive unit

1322 left L-shaped support 242 cleaning unit

1323 left spacer 2421 left side washs combination

1324 left positioning assembly 2422 right cleaning assembly

1324a left support block 2421a seat

1324b left guide block 2421b inverted L-shaped drying assembly

1324c left stop block 2421c concave part

1324d left stop 2421d L shaped cleaning nozzle

133 right flip stand 2423 adjustment assembly

1331 right Y-shaped support 2424 pipe integrated seat

1332 right L-shaped support 243 sliding seat

1333 right spacer bar 244 connecting the posts

1334 right positioning component 25 left propping rod piece

1334a right supporting block 26 right propping rod piece

1334b right guide block 10 foup

1334c right stopper 10A box body

1334d Right stop 10B door body

14 suction means 100 cleaning equipment

141 vacuum chuck part 200 cleaning system

142 locking head 300 mobile device

15 first vertical displacement mechanism 301 substrate body

151 first drive unit 302 lateral displacement mechanism

152 vertical guide rail holder 303 lateral guide rail

16 front cleaning tank 304 first clamp seat

161 accommodating space 305 clamp

162 opening 3051 third drive unit

163 front cleaning tank housing 3052 jig guide rail

164 receiving plate 3053 second holder

17 front cleaning device 3054 chuck driving set

171 base 3054a bidirectional drive unit

172 movable cleaning unit 3054b left actuating block

1721 Right actuating block of front cleaning nozzle 3054c

173 drying unit 3054d casing

174 rotating device 3055 left clamping jaw

18 first dividing wall means 3056 Right jaw

181 first isolation frame 400 nitrogen charging equipment

182 first wall moving device 401 carries tray

183 first wall plate 402 nitrogen filling head group

2 first nitrogen filling head of back machine 4021

21 second frame 4022 second nitrogen charging head

Post-cleaning tank 22 positioning pin 403

221 inverted L-shaped opening 404 sensing unit

2211 front recess 500 temporary storage facility

2212 rear recess 501 third shelf

Second horizontal displacement mechanism for 222 front U-shaped baffle 502

2221 front groove 5021 second displacement driving device

2222 front isolation rubber strip 5022 second horizontal displacement pedestal

Second dividing wall means of the U-shaped baffle 503 behind 223

2231 rear groove 5031 second spacer body

2232 rear separation rubber strip 5032 second wall plate moving device

224 outer U-shaped adhesive tape 5033 second wall plate

225 inside inverse U-shaped adhesive tape a inverse T-shaped bracket

22a inverted U-shaped adhesive tape a1 inverted T-shaped slot

Left H-shaped wing plate of 22b O-shaped adhesive tape b

22c left limiting rod with barb strips b1

23 rear spacer c right H-shaped wing plate

231 inverted-L-shaped partition board c1 right limiting rod

2311 front vertical plate d cross bar

2311a front baffle d1 connecting block

2312 horizontal plate e bridging block

2313 front sealing rubber strip f screw

2314 regulating rotary wheel of rear sealing rubber strip g

Detailed Description

The following detailed description is made in accordance with embodiments illustrated in the drawings as follows:

as shown in fig. 1 to 12, a cleaning apparatus 100 for a foup is disclosed, which can be applied to clean a foup 10, and is characterized in that: the cleaning equipment 100 at least comprises at least one front machine table 1 and a rear machine table 2 arranged at the rear end of the front machine table 1; the front machine table 1 comprises a first frame 11, a first horizontal displacement mechanism 12 disposed at the front side of the top end of the first frame 11, a turnover mechanism 13 disposed at the rear side of the top end of the first frame 11 corresponding to the first horizontal displacement mechanism 12, a suction device 14 disposed at the rear side of the top end of the first frame 11 corresponding to the turnover mechanism 13, a first vertical displacement mechanism 15 disposed corresponding to the suction device 14, a front cleaning tank 16 disposed at the rear side of the bottom end of the first frame 11, a front cleaning device 17 disposed at the rear side of the first frame 11, and a first isolation wall device 18 transversely spanning the first horizontal displacement mechanism 12; the first horizontal displacement mechanism 12 can drive the wafer transport box 10 to displace towards the turnover mechanism 13; the turnover mechanism 13 can drive the box body 10A of the wafer transfer box 10 to turn over to the rear machine table 2, and enables the opening of the box body 10A to be changed from a vertical state to a horizontal state; the suction device 14 can perform vacuum suction positioning on the door body 10B of the wafer transfer box 10, and detach the door body from the box body 10A; the first vertical displacement mechanism 15 is capable of driving the suction device 14 to switch between two states corresponding to the wafer pod 10 and the front cleaning tank 16, so as to drive the detached door body 10B together; the front cleaning tank 16 has an accommodating space 161 therein, an opening 162 communicated with the accommodating space 161 is arranged in front of the accommodating space 161, and the opening 162 can be used for positioning and accommodating the door body 10B transferred by the suction device 14; the front cleaning device 17, which is disposed in the accommodating space 161, has a base 171, at least one movable cleaning unit 172 disposed on the base 171, and two drying units 173 disposed at two ends of the base 171, respectively, wherein the movable cleaning unit 172 can clean the door body 10B, and the drying units 173 can dry the door body 10B; the first isolation wall 18 is capable of being opened when the first horizontal displacement mechanism 12 drives the pod 10 to displace toward the turnover mechanism 13, so as to reduce the possibility of contamination; the rear machine 2 comprises a second frame 21 arranged corresponding to the rear end of the first frame 11, a rear cleaning tank 22 arranged at the top end of the second frame 21, a rear separating device 23 arranged above the rear cleaning tank 22, and a rear cleaning device 24 arranged at the bottom end of the rear cleaning tank 22 and arranged at the top end of the rear cleaning tank 22; the rear cleaning tank 22 for accommodating the cartridge body 10A turned over by the turning mechanism 13; the rear isolation device 23 is capable of sealing the rear cleaning tank 22 after the box body 10A is turned over by the turning mechanism 13; the post-cleaning device 24 is covered with the cartridge body 10A turned over by the turning mechanism 13, and is operable to clean and dry the inside of the cartridge body 10A.

Wherein, the utility model discloses cleaning equipment 100, cooperation through preceding board 1 and back board 2, can utilize with first support body 11, first horizontal displacement mechanism 12, tilting mechanism 13, suction device 14, first vertical displacement mechanism 15, preceding washing tank 16, preceding board 1 that preceding belt cleaning device 17 and first division wall device 18 constitute, the upset, split wafer transfer box 10, the cooperation is with second support body 21, back washing tank 22, back board 2 that back separation device 23 and back belt cleaning device 24 constitute, through preceding board 1 and back board 2, it is clean to box body 10A, door body 10B simultaneously, board 1 before returning after the cleanness again, constitute complete wafer transfer box 10, wholly, the action is compact, save space, the maintenance ageing is short.

Secondly, the suction device 14 vertically detaches the door body 10B by means of vacuum adsorption positioning in cooperation with the first vertical displacement mechanism 15 to separate the door body from the box body 10A, thereby preventing particles from adhering, reducing the possibility of pollution and improving the overall cleaning effect.

As shown in fig. 13 to 16, the front machine 1 inputs the wafer transportation box 10 through the first horizontal displacement mechanism 12, the first partition wall device 18 can be opened and closed quickly to reduce the possibility of contamination, after the wafer transportation box 10 reaches the positioning position, the suction device 14 removes the door body 10B, the first vertical displacement mechanism 15 moves down vertically to move the door body 10B to the front cleaning tank 16, then the turnover mechanism 13 can turn over the box body 10A to transfer the box body 10A to the cleaning tank 22 of the rear machine 2, the rear partition device 23 is activated to close the cleaning tank 22, at this time, the front machine 1 can pass through the front cleaning device 17, and the rear machine 2 can pass through the rear cleaning device 24 to respectively clean and dry the door body 10B and the box body 10A, thereby completing the corresponding cleaning.

Finally, the rear isolation device 23 is opened, the turnover mechanism 13 turns the box body 10A from the rear machine 2 back to the front machine 1, the first vertical displacement mechanism 15 vertically moves upwards, the suction device 14 carries the door body 10B, and the door body is installed back to the box body 10A, so that the overall cleaning of the wafer transfer box 10 is completed.

Referring to fig. 1, 4 and 5, the turnover mechanism 13 further includes a turnover driving device 131 disposed at the rear side of the top end of the first frame 11 corresponding to the first horizontal displacement mechanism 12, a left turnover bracket 132 disposed at the left side of the turnover driving device 131, and a right turnover bracket 133 disposed at the right side of the turnover driving device 131 in a mirror image manner; the left turning support 132 further includes a left Y-shaped support 1321 having a bottom end connected to the left side of the turning driving device 131, a left L-shaped support 1322 disposed at the right side of the left Y-shaped support 1321 at an interval, a plurality of left spacing rods 1323 disposed between the left Y-shaped support 1321 and the left L-shaped support 1322 at an interval, and at least one left positioning assembly 1324 disposed at the right side of the left L-shaped support 1322; the top side of the left Y-bracket 1321 is parallel to the horizontal plane, and the other side is perpendicular to the horizontal plane, the left L-bracket 1322 is further disposed corresponding to the top side of the left Y-bracket 1321, and the left positioning assembly 1324 is capable of positioning the foup 10; the right flip frame 133 further includes a right Y-shaped frame 1331 having a bottom end connected to the right side of the flip driving device 131, a right L-shaped frame 1332 spaced apart from the left side of the right Y-shaped frame 1331, a plurality of right spacer rods 1333 spaced apart from the right Y-shaped frame 1331 and the right L-shaped frame 1332, and at least one right positioning assembly 1334 disposed at the left side of the right L-shaped frame 1332, wherein one side of the top end of the right Y-shaped frame 1331 is parallel to the horizontal plane, and the other side of the top end of the right Y-shaped frame 1331 is perpendicular to the horizontal plane, the right L-shaped frame 1332 is further disposed corresponding to the top end of the right Y-shaped frame 1331, and the right positioning assembly 1334 is capable of positioning the wafer cassette 10.

The turnover mechanism 13 is composed of the turnover driving device 131, the left turnover bracket 132 and the right turnover bracket 133, and the cassette body 10A of the wafer transfer cassette 10 can be turned over without using a complicated robot or a robot arm, so that the space is saved, the mechanism is simple and easy, and the maintenance time is short.

Secondly, the left turning bracket 132 passes through the left Y-shaped bracket 1321, the left L-shaped bracket 1322 and the left spacer 1323, and the right turning bracket 133 passes through the right Y-shaped bracket 1331, the right L-shaped bracket 1332 and the right spacer 1333, so that when turning, there is no worry about interference with the first vertical displacement mechanism 15, and the modular design can also change the corresponding left L-shaped bracket 1322 and the right L-shaped bracket 1332 for different box bodies 10A to adjust the arrangement of the left positioning component 1324 and the right positioning component 1334 of the positioning box body 10A, which is beneficial to shortening the time of maintenance and adjustment and is very easy to maintain.

Referring to fig. 1, 7 and 8, the front cleaning device 17 further includes a rotating device 174, and the rotating device 174 can drive the movable cleaning unit 172 to rotate; the movable cleaning unit 172 further has a plurality of front cleaning heads 1721 spaced apart from one another on one side thereof.

Wherein the movable cleaning unit 172 can be stably rotated by the application of the rotating device 174, and thus, the door body 10B can be completely cleaned; by using the front cleaning nozzle 1721, the movable cleaning unit 172 can be covered more completely without affecting the cleaning effect.

Referring to fig. 1, 10 and 11, the post-cleaning device 24 further includes a second driving unit 241 disposed at the bottom end of the post-cleaning tank 22, a cleaning unit 242 disposed in the post-cleaning tank 22, a sliding base 243 movably connected to the second driving unit 241, and a connecting column 244 disposed between the cleaning unit 242 and the sliding base 243; the cleaning unit 242 further comprises a left cleaning assembly 2421 disposed on the left side of the top end of the connecting column 244, a right cleaning assembly 2422 disposed on the right side of the top end of the connecting column 244, an adjusting assembly 2423 disposed between the left cleaning assembly 2421 and the right cleaning assembly 2422 and located at the top end of the connecting column 244, and a conduit integration seat 2424 disposed between the adjusting assembly and the connecting column 244; the left cleaning assembly 2421 and the right cleaning assembly 2422 both further include a seat body 2421a, an inverted L-shaped drying component 2421b disposed on the top end of the seat body 2421a, a recessed portion 2421c formed between the seat body 2421a and one side of the inverted L-shaped drying component 2421b, and a plurality of L-shaped cleaning nozzles 2421d arranged at the recessed portion 2421c at intervals.

The second driving unit 241 can drive the sliding seat 243 to move the cleaning unit 242 on the connecting column 244 up and down so as to effectively clean the inside of the box body 10A without passing through any corner.

Next, the cleaning unit 242 provides a left-right complete cleaning coverage area by the left cleaning assembly 2421 and the right cleaning assembly 2422 through the cooperation of the left cleaning assembly 2421, the right cleaning assembly 2422, the adjusting assembly 2423 and the pipe integrating seat 2424, and the left cleaning assembly 2421 and the right cleaning assembly 2422 can be adjusted in angle by the adjusting assembly 2423 to match with different box bodies 10A, and the application of the pipe integrating seat 2424 enables the whole pipe to obtain effective arrangement, reduce the influence on the cleaning effect, and further reduce the maintenance difficulty.

Furthermore, through the application of the seat 2421a, the inverted L-shaped drying element 2421b, the recess 2421c and the L-shaped cleaning head 2421d, the seat 2421a can provide stable support and stable guiding effect, the inverted L-shaped drying element 2421b can provide stable and sufficient drying effect within the range, and the L-shaped cleaning head 2421d can provide stable cleaning effect within the range, and can be adjusted for different cartridge bodies 10A to facilitate cleaning.

Referring to fig. 11, the adjusting component 2423 further has two inverted T-shaped brackets a, a left H-shaped wing b, a right H-shaped wing c, a cross bar d, a bridging block e, a screw f and an adjusting wheel g; the inverted T-shaped brackets a are correspondingly arranged at the front side edge and the rear side edge of the top end surface of the pipeline integrating seat 2424, and each inverted T-shaped bracket a is also internally provided with an inverted T-shaped groove a 1; the left H-shaped wing plate b is arranged on the left side of the top end surface of the pipeline integrating seat 2424, one end of the left H-shaped wing plate b is arranged between the inverted T-shaped brackets a, and the other end of the left H-shaped wing plate b is connected with the left cleaning combination 2421; the right H-shaped wing plate c is arranged on the right side of the top end face of the pipeline integrating seat 2424, one end of the right H-shaped wing plate c is arranged between the inverted T-shaped supports a, the other end of the right H-shaped wing plate c is connected with the right cleaning combination 2422, the left H-shaped wing plate b and the right H-shaped wing plate c are positioned at one ends between the inverted T-shaped supports a and are mutually pivoted, the left H-shaped wing plate b and the corresponding end of the horizontal section of each inverted T-shaped support a are respectively positioned in a sliding mode through a left limiting rod b1, and the right H-shaped wing plate c and the corresponding end of the horizontal section of each inverted T-shaped support a are respectively positioned in a sliding mode through a right limiting; the cross bar d is arranged at the pivoting position of the left H-shaped wing plate b and the right H-shaped wing plate c, the two ends of the cross bar d are respectively matched with the inverted T-shaped grooves a1 of the inverted T-shaped bracket a correspondingly, and the center of the cross bar d is vertically provided with a connecting block d 1; the bridging block e is arranged between the inverted T-shaped brackets a, and the two ends of the bridging block e are respectively connected with the top ends of the inverted T-shaped brackets a corresponding to each other; the screw f passes through the bridging block e and then is connected with the connecting block d 1; the adjusting rotating wheel g is in threaded connection with the screw f and is positioned between the bridging block e and the connecting block d 1; the pipe integrated seat 2424 can also be used for efficiently transmitting gas and liquid to the left cleaning assembly 2421 and the right cleaning assembly 2422 after being connected with corresponding pipelines.

The adjusting assembly 2423 is formed by matching the inverted T-shaped support a, the left H-shaped wing plate b, the right H-shaped wing plate c, the cross rod d, the bridging block e, the screw f and the adjusting rotating wheel g, the inverted T-shaped support a is used for limiting the left H-shaped wing plate b and the right H-shaped wing plate c through the left limiting rod b1 and the right limiting rod c1, and the left H-shaped wing plate b and the right H-shaped wing plate c are pivoted through the cross rod d, so that when the screw f limited by the adjusting rotating wheel g on the bridging block e is rotated, the left cleaning combination 2421 on the left H-shaped wing plate b and the right cleaning combination 2422 on the right H-shaped wing plate c can be synchronously inclined to generate the same angle change, the effect of adjusting the angles of the left cleaning combination 2421 and the right cleaning combination 2422 is achieved, the adjustment is performed on different wafer conveying boxes 10, and the cleaning effect is optimized.

Referring to fig. 1 and 12, the rear cleaning tank 22 further includes an inverted L-shaped opening 221 disposed at the front end side and the top end side of the rear cleaning tank 22, a front U-shaped baffle 222 disposed at the front end side of the inverted L-shaped opening 221, a rear U-shaped baffle 223 disposed at the rear side of the front U-shaped baffle 222 at intervals, an outer U-shaped adhesive tape 224 disposed at the top end edge of the rear cleaning tank 22, and an inner U-shaped adhesive tape 225 disposed at the top end edge of the rear cleaning tank 22 and located at the inner side of the outer U-shaped adhesive tape 224; the aforementioned inverted-L-shaped opening 221 has a front concave portion 2211 at the top side inner edge corresponding to the top end of the front U-shaped baffle 222, and a rear concave portion 2212 at the top side inner edge corresponding to the rear U-shaped baffle 223; a front groove 2221 is further concavely formed at the left and right sides of the closed end of the front U-shaped baffle 222, and a front isolation rubber strip 2222 is further clamped at the top edge of the closed end of the front U-shaped baffle 222; the rear U-shaped baffle 223 is further recessed with a rear groove 2231 at the left and right sides of the closed end, and a rear separation strip 2232 is clamped at the top edge of the closed end of the rear U-shaped baffle 223.

The wafer transport box 10 can be smoothly turned over and placed through the inverted-L-shaped opening 221, the front isolation rubber strip 2222, the rear isolation rubber strip 2232, the outer-n-shaped rubber strip 224 and the inner-n-shaped rubber strip 225 are matched with the front U-shaped baffle 222 and the rear U-shaped baffle 223, and two opening directions of the inverted-L-shaped opening 221 can be effectively matched with the rear isolation device 23, so that the wafer transport box can not only achieve sufficient sealing effect, but also be quickly isolated and opened, the cleaning time can be shortened, and the wafer transport box is very easy to maintain.

Referring to fig. 1 and 9, the rear isolation device 23 further includes an inverted L-shaped isolation plate 231 disposed above the rear cleaning tank 22 and corresponding to the inverted L-shaped opening 221, a plate vertical driving unit 232 disposed at the rear side end of the rear cleaning tank 22, two plate guiding rails 233 respectively disposed at the corresponding sides of the rear cleaning tank 22, a pulling wire 234 connected to the top end of the inverted L-shaped isolation plate 231, and a weight block 235 disposed at the free end of the pulling wire 234; the aforementioned inverted L-shaped isolation plate 231 further includes a front vertical plate body 2311 with an H-shaped cross section and a horizontal plate body 2312 with a front end bottom surface connected to the top end of the front vertical plate body 2311, and a front baffle 2311a is further extended from the bottom end of the front side surface of the front vertical plate body 2311, and a front sealing adhesive tape 2313 is further respectively disposed at two sides of the front side surface edge of the front vertical plate body 2311, and a rear sealing adhesive tape 2314 is further respectively disposed at two sides of the rear side surface edge of the front vertical plate body 2311; the top end of the plate vertical driving unit 232 is further connected to the inverted L-shaped partition plate 231; the top ends of the plate guide rails 233 are also connected to the corresponding sides of the inverted L-shaped partition plate 231, respectively; the pulling wire 234 is connected to the top end of the inverted-L-shaped isolation plate 231, and then turns around toward the rear side of the rear cleaning tank 22, where it extends to the rear side of the rear cleaning tank 22.

Wherein, through the cooperation of the inverted-L division board 231, the board vertical driving unit 232, the board guide rail 233, the pull wire 234 and the balancing weight 235, constitute the back isolating device 23, with the inverted-L division board 231 who has preceding vertical plate body 2311 and horizontal plate body 2312, the inverted-L opening 221 of the washing tank 22 behind the cooperation, with board vertical driving unit 232 cooperation board guide rail 233, stable drive inverted-L division board 231, and still through the application of pull wire 234 and balancing weight 235, let the inverted-L division board 231 can open fast, shorten clean consuming time.

Secondly, the application of the front baffle 2311a, the front sealing strip 2313 and the rear sealing strip 2314 can provide better isolation effect on the premise of not influencing the opening speed.

Referring to fig. 1 and 12, the rear machine 2 further includes a left abutting rod 25 disposed in the rear cleaning tank 22 and corresponding to the left turning support 132, and a right abutting rod 26 corresponding to the right turning support 133, wherein the left abutting rod 25 can support the left turning support 132 turned into the rear cleaning tank 22 from the inverted L-shaped opening 221, and the right abutting rod 26 can support the right turning support 133 turned into the rear cleaning tank 22 from the inverted L-shaped opening 221.

The left and right turning brackets 132 and 133 of the rear cleaning tank 22 are turned over from the inverted L-shaped opening 221 and the inverted L-shaped opening 221 by the left and right abutting rods 25 and 26, so that the rear cleaning tank 22 is stably supported, the left and right turning brackets 132 and 133 are prevented from colliding with the rear cleaning tank 22, and the burden of the turning driving device 131 is reduced to reduce the maintenance probability.

Referring to fig. 1 and 12, the front isolation rubber strip 2222 is further provided with an inverted U-shaped rubber strip 22a and an O-shaped rubber strip 22b in parallel from outside to inside, and an inverted hook strip 22c is further provided at the inner side surface of the front side end of the inverted U-shaped rubber strip 22a for matching and positioning the front U-shaped baffle 222 on the top edge of the closed end; the rear isolation rubber strip 2232 is further provided with an O-shaped rubber strip 22b and an inverted U-shaped rubber strip 22a in parallel in sequence from outside to inside, and an inverted hook strip 22c is further provided on the inner side surface of the rear end of the inverted U-shaped rubber strip 22a for being matched and positioned on the top edge of the closed end of the rear U-shaped baffle 223; the front sealing rubber strip 2313 and the rear sealing rubber strip 2314 both comprise a U-shaped rubber strip 23a and a 3-shaped rubber strip 23b which is arranged on one side of the U-shaped rubber strip 23a in parallel and has mutually butted sealing ends, and the inner side surface of the front side end of the U-shaped rubber strip 23a is also provided with an inverted hook part 23 c.

Wherein, through the cooperation of the inverted U-shaped adhesive tape 22a and the barb strip 22c, let preceding isolation adhesive tape 2222, back isolation adhesive tape 2232, can be stably positioned in preceding U-shaped baffle 222 closed end top edge, back U-shaped baffle 223 closed end top edge, keep apart adhesive tape 2222, the O shape adhesive tape 22b of back isolation adhesive tape 2232 before the cooperation, let preceding U-shaped baffle 222, the back U-shaped baffle 223 of back washing tank 22, with the preceding perpendicular plate body 2311 of back isolation device 23, closely cooperate, provide a sufficient airtight effect.

Secondly, through the cooperation of the U-shaped adhesive tape 23a and the barbed portion 23c, the front sealing adhesive tape 2313 and the rear sealing adhesive tape 2314 can be positioned on the front and rear side edges of the front vertical plate body 2311, so that the 3-shaped adhesive tape 23b passing through the front sealing adhesive tape 2313 and the rear sealing adhesive tape 2314 is engaged with the inner edges of the front U-shaped baffle 222 and the rear U-shaped baffle 223 of the rear cleaning tank 22 at the corresponding sides to form a clamping structure, thereby providing a sufficient sealing effect.

Referring to fig. 1, 4 and 5, the left positioning assembly 1324 further includes a left supporting block 1324a disposed at the free end of the horizontal segment of the left L-shaped support 1322, a left guiding block 1324b disposed at the center of the horizontal segment of the left L-shaped support 1322, a left limiting block 1324c disposed at the center of the vertical segment of the left L-shaped support 1322, and a left stop 1324d disposed at the free end of the vertical segment of the left L-shaped support 1322; the right positioning assembly 1334 further comprises a right supporting block 1334a disposed at the free end of the horizontal section of the right L-shaped bracket 1332, a right guiding block 1334b disposed at the center of the horizontal section of the right L-shaped bracket 1332, a right limiting block 1334c disposed at the center of the vertical section of the right L-shaped bracket 1332, and a right stopping block 1334d disposed at the free end of the vertical section of the right L-shaped bracket 1332.

The left positioning assembly 1324 is composed of the left supporting block 1324a, the left guiding block 1324b, the left limiting block 1324c and the left retaining block 1324d, the right positioning assembly 1334 is composed of the right supporting block 1334a, the right guiding block 1334b, the right limiting block 1334c and the right retaining block 1334d, stable positioning which is a horizontal plane before turning and a vertical plane after turning can be provided by matching the left supporting block 1324a, the right supporting block 1334a, the left guiding block 1324b and the right guiding block 1334b, and stable positioning which is a vertical plane before turning and a horizontal plane after turning can be provided by the left limiting block 1324c, the left retaining block 1324d, the right limiting block 1334c and the right retaining block 1334d, so that the wafer transfer box 10 can be cleaned smoothly without worrying about slippage before turning, before cleaning or after cleaning.

Referring to fig. 1 and 2, the first horizontal displacement mechanism 12 further includes a first displacement driving device 121 disposed at a front side of a top end of the first frame 11 and a first horizontal displacement pedestal 122 disposed at a top end of the first displacement driving device 121, wherein the first displacement driving device 121 can drive the first horizontal displacement pedestal 122 to displace, and the first horizontal displacement pedestal 122 can receive and position the foup 10.

The first displacement driving device 121 and the first horizontal displacement pedestal 122 are used in cooperation, so that the foup 10 can be stably moved without affecting or interfering with the operation of other devices, and the foup can be moved in the most efficient manner, and is more compact in operation and convenient to maintain.

Referring to fig. 1 and 6, the suction device 14 further includes two vacuum chuck portions 141 respectively disposed at two sides of the front side of the suction device 14 and two locking head portions 142, the two vacuum chuck portions 141 are also disposed in a diagonal line shape and can be used for sucking the door body 10B, and the locking head portion 142 is located between the vacuum chuck portions 141 and can be used for locking the door body 10B.

The suction device 14 is matched with the vacuum chuck 141 to stably suck the door body 10B, and is also matched with the locking head 142 to ensure that the door body 10B can be stably moved, removed and installed back, so that the possibility of particle adhesion can be reduced, and the maintenance is more convenient.

Referring to fig. 1 and fig. 6, the first vertical displacement mechanism 15 further includes a first driving unit 151 disposed on the left side of the suction device 14 and a vertical guiding rail frame 152 disposed on the right side of the suction device 14, the first driving unit 151 can drive the suction device 14 to move vertically, and the vertical guiding rail frame 152 can guide the suction device 14 to move vertically.

Wherein, the first driving unit 151 and the vertical guide rail bracket 152 are matched to allow the suction device 14 to stably vertically move up and down, so as to rapidly and stably remove and install back the door body 10B, to allow the whole operation to smoothly operate, to reduce the particle adhesion, and to facilitate the maintenance.

Referring to fig. 1, fig. 7 and fig. 8, the front cleaning tank 16 further includes a front cleaning tank housing 163 and a containing plate 164, the front cleaning tank housing 163 can cooperate with the containing plate 164 and the base 171 to form the containing space 161, and the containing plate 164 can cooperate with the opening 162 to form the opening 162.

Wherein, through the cooperation of preceding cleaning tank casing 163 with hold the plate body 164, constitute accommodation space 161 with base 171 together, let preceding belt cleaning device 17 can be settled effectively to constitute opening 162 through holding the plate body 164, let the door body 10B of putting into from opening 162, can have firm location, let preceding belt cleaning device 17 can be to door body 10B, carry out cleaning process, the maintenance time efficiency is short.

Referring to fig. 1 and 3, the first partition wall device 18 further includes a first partition frame 181 transversely straddling the first horizontal displacement mechanism 12, a first wall plate moving device 182 vertically disposed at a top end of the first partition frame 181, and a first wall plate 183 movably disposed at a bottom end of the first partition frame 181 and connected to an end of the first wall plate moving device 182, wherein the first wall plate moving device 182 can drive the first wall plate 183 to move up and down along the first partition frame 181.

Wherein, the cooperation of utilizing first isolation support body 181, first wallboard mobile device 182 and first wallboard 183 can avoid inside to be contaminated before the input of wafer transfer box 10, can also open up fast when first horizontal displacement mechanism 12 inputs wafer transfer box 10 fast, avoids inside to be contaminated, ensures the cleanness of whole device, and it is very convenient to maintain.

As shown in fig. 17-24, a cleaning system 200 for a foup 10 is disclosed, wherein the cleaning system is characterized by: the cleaning system 200 at least comprises at least one cleaning apparatus 100, at least one moving apparatus 300, at least one nitrogen charging apparatus 400 and at least one temporary storage apparatus 500 according to the present embodiment; the moving device 300 is disposed above the cleaning device 100, the nitrogen filling device 400, and the temporary storage device 500, and spans the three devices, so as to drive the wafer transport box 10 cleaned by the cleaning device 100 to move; the nitrogen filling apparatus 400, which is disposed at one side of the cleaning apparatus 100, is capable of receiving the wafer transfer box 10 brought by the movement of the moving apparatus 300 from the cleaning apparatus 100 to perform a nitrogen filling operation thereon; the buffer device 500 is disposed at the other side of the cleaning device 100, and is capable of receiving the wafer cassette 10 transferred from the nitrogen filling device 400 by the mobile device 300 for buffering and outputting.

Wherein, the utility model discloses cleaning system 200 passes through cleaning equipment 100's application, mobile device 300 is gone up in the cooperation, nitrogen-filled equipment 400 and equipment 500 of keeping in, can reach best utilization rate, because cleaning equipment 100 does not use robot or arm, so whole occupation space can reduce by a wide margin, be different from traditional cleaning system, be favorable to very much investing the multiunit and use, and each equipment independently functions, the action is compact, and still maintain more easily, let wafer conveying box 10 clean with lower cost, most important, can avoid taking place the contaminated problem in the cleaning process effectively, the modularized design, it is very convenient to maintain.

As shown in fig. 25, 26 and 27, when the cleaning system 200 of the present invention uses two cleaning apparatuses 100 to form two cleaning lines, two wafer transport boxes 10 can be inputted as required, and the wafer transport boxes 10 inputted correspondingly can be separated into a box body 10A and a door body 10B, so that the cleaning can be performed respectively.

After the cleaning device 100 performs cleaning and drying processes, the box body 10A and the door body 10B are combined, then the mobile device 300 can respectively transport each wafer transfer box 10 cleaned on line to the nitrogen filling device 400 for nitrogen filling, and after the nitrogen filling of the wafer transfer box 10 is completed, the wafer transfer box 10 filled with nitrogen can be moved to the temporary storage device 500 through the mobile device 300 to be temporarily stored for output.

The utility model discloses among the whole operation flow of cleaning system 200, each washs online cleaning equipment 100 and independently functions, and the action is very compact, and cleaning equipment 100 is for demolising door body 10B, upset box body 10A's mode through the vertical type moreover, effectively avoids the particle to be stained with and attaches, is superior to traditional wafer conveying box cleaning system far away.

Referring to fig. 18, 19 and 20, the mobile device 300 further includes a square-shaped substrate 301 disposed at the top end of the cleaning system 200, a lateral displacement mechanism 302 disposed at the edge of the rear side of the opening of the substrate 301, a lateral guide rail 303 disposed at the edge of the front side of the opening of the substrate 301, a first clamp seat 304 disposed on one side of the lateral displacement mechanism 302 and the lateral guide rail 303, and a clamp 305 disposed at the bottom end of the first clamp seat 304 and passing through the opening of the substrate 301, the lateral displacement mechanism 302 can be used for driving the first clamp base 304 to displace along the lateral guide rail 303, the lateral guide rails 303 can be used for guiding the first chuck base 304, the first chuck base 304 can be used for driving the chuck 305 together, and the chuck 305 can be used for clamping and positioning the foup 10.

Wherein, through the substrate body 301, horizontal displacement mechanism 302, horizontal guide track 303, the cooperation of first anchor clamps seat 304 and anchor clamps 305, a mobile device 300 that can the steady operation is provided, substrate body 301 provides stable location and support, horizontal displacement mechanism 302 and horizontal guide track 303, can remove first anchor clamps seat 304 fast and steadily, let anchor clamps 305 on the first anchor clamps seat 304, can reach the location fast, simultaneously when the centre gripping has wafer transfer box 10, also can not be because of the rapid transit, and produce excessive rocking, it consumes time to reduce the removal, promote the efficiency of whole device, and easy maintenance.

Referring to fig. 23 and 24, the nitrogen filling apparatus 400 further includes a carrier plate 401 disposed at one side of the cleaning apparatus 100, at least one nitrogen filling head set 402 disposed on the carrier plate 401, a plurality of positioning pins 403 disposed on the carrier plate 401, and a plurality of sensing units 404 disposed corresponding to the positioning pins 403, the carrier plate 401 can be used for carrying the foup 10 moved by the moving apparatus 300, the nitrogen filling head set 402 can be used for filling nitrogen into the wafer transfer box 10 moved by the moving device 300, the positioning pins 403 can be used for positioning the foup 10 moved by the moving apparatus 300, the sensing unit 404 is used by the nitrogen filling apparatus 400 to determine whether the foup 10 moved by the moving apparatus 300 is properly positioned.

The loading tray 401, the nitrogen filling head set 402, the positioning pins 403 and the sensing unit 404 are matched to provide a nitrogen filling apparatus 400 capable of efficiently filling nitrogen, so that the wafer transport box 10 is loaded on the loading tray 401, the nitrogen filling head set 402 fills nitrogen efficiently, the positioning pins 403 enable the wafer transport box 10 to be positioned quickly, the sensing unit 404 can ensure the positioning of the wafer transport box 10, the time consumption for positioning the wafer transport box 10 is reduced, the whole time consumption for filling nitrogen can be shortened, and the nitrogen filling apparatus is easy to maintain.

Referring to fig. 21 and fig. 22, the temporary storage apparatus 500 further includes a third frame 501, a second horizontal displacement mechanism 502 disposed at a front end of the third frame 501, and a second partition wall device 503 transversely straddling the second horizontal displacement mechanism 502; the second horizontal displacement mechanism 502 can drive the wafer transport box 10 to displace in an external direction, and further includes a second displacement driving device 5021 disposed at a front side of a top end of the third frame 501 and a second horizontal displacement pedestal 5022 disposed at a top end of the second displacement driving device 5021, wherein the second displacement driving device 5021 can drive the second horizontal displacement pedestal 5022 to displace, and the second horizontal displacement pedestal 5022 can be used for receiving and positioning the wafer transport box 10; the second partition wall device 503 further includes a second partition frame 5031 disposed on the second horizontal displacement mechanism 502, a second wall plate moving device 5032 vertically disposed at the top end of the second partition frame 5031, and a second wall plate 5033 movably disposed at the bottom end of the second partition frame 5031 and connected to one end of the second wall plate moving device 5032, wherein the second wall plate moving device 5032 can drive the second wall plate 5033 to move up and down along the second partition frame 5031.

Wherein, the temporary storage equipment 500 can be used as a buffer area through the cooperation of the third frame body 501, the second horizontal displacement mechanism 502 and the second partition wall device 503, so that the whole cleaning efficiency is improved, meanwhile, the pollution can be avoided, and the maintenance is convenient.

Secondly, through the cooperation of second displacement drive arrangement 5021 and second horizontal displacement pedestal 5022, make up into second horizontal displacement mechanism 502, can keep in wafer transport box 10 to after keeping in, steadily and fast toward external direction displacement improves whole operating efficiency, whole just easy maintenance.

Furthermore, the second partition wall device 503 can temporarily store the wafer transport box 10 by the cooperation of the second partition frame 5031, the second wall plate moving device 5032 and the second wall plate 5033, so as to prevent the wafer transport box 10 from being contaminated, and can be opened up quickly when the second horizontal displacement mechanism 502 outputs quickly, so as to prevent the interior from being contaminated, thereby ensuring the cleanness of the whole device and facilitating maintenance.

Referring to fig. 19, the clamp 305 further includes a third driving unit 3051 disposed on one side of the first clamp base 304, a clamp guide rail 3052 disposed on the other side of the first clamp base 304, a second clamp base 3053 disposed between the third driving unit 3051 and the clamp guide rail 3052, a chuck driving unit 3054 disposed on a bottom end surface of the second clamp base 3053, a left clamping jaw 3055 movably disposed on a left side of the chuck driving unit 3054, and a right clamping jaw 3056 movably disposed on a right side of the chuck driving unit 3054, wherein the third driving unit 3051 can drive the second clamp base 3053 to move along the clamp guide rail 3052, the clamp guide rail 3052 can be matched with the third driving unit 3051 to guide the second clamp base 3053, the second clamp base 3053 can be used for carrying the chuck driving unit 3054, and the left clamping jaw 3055 and the right clamping jaw 3056 can be driven to move away from each other, The two states are close to each other for switching, and the left clamping jaw 3055 and the right clamping jaw 3056 can be matched with each other to clamp the wafer transmission box 10.

Wherein, through third drive unit 3051, anchor clamps guide rail 3052, second anchor clamps seat 3053, chuck drive group 3054, left clamping jaw 3055 and right clamping jaw 3056 cooperation, constitute anchor clamps 305, can drive and guide second anchor clamps seat 3053 with third drive unit 3051 and anchor clamps guide rail 3052, let chuck drive group 3054 and left clamping jaw 3055, right clamping jaw 3056, can be stably displaced, to stable centre gripping to wafer transfer box 10, and can be to going on smoothly and stably moving of wafer transfer box 10, the mechanism is succinct, easy maintenance.

Referring to fig. 20, the chuck driving assembly 3054 further includes a bi-directional driving unit 3054a disposed on a bottom end surface of the second chuck base 3053, a left actuating block 3054b movably disposed on a left side of the bi-directional driving unit 3054a, a right actuating block 3054c movably disposed on a right side of the bi-directional driving unit 3054a, and a housing 3054d sleeved outside the bi-directional driving unit 3054a and connected to the second chuck base 3053, wherein the bi-directional driving unit 3054a can simultaneously drive the left actuating block 3054b and the right actuating block 3054c to simultaneously actuate, a bottom end surface of the left actuating block 3054b is further connected to the left chuck jaw 3055 and can drive the left chuck jaw 3055, and a bottom end surface of the right actuating block 3054c is further connected to the right chuck jaw 3056 and can drive the left chuck jaw 3055.

The bidirectional driving unit 3054a can enable the left actuating block 3054b and the right actuating block 3054c to synchronously and stably operate in two directions by the bidirectional driving unit 3054a through the cooperation of the bidirectional driving unit 3054a, the left actuating block 3054b, the right actuating block 3054c and the housing 3054d, so that the left clamping jaw 3055 and the right clamping jaw 3056 can be simultaneously operated to switch between two states of being away from each other and approaching each other, the effect of putting down and clamping the wafer transfer box 10 is achieved, and the maintenance time is short.

Referring to fig. 23 and 24, the nitrogen charging head set 402 further includes a plurality of first nitrogen charging heads 4021 respectively disposed on the carrier plate 401, and at least two second nitrogen charging heads 4022 respectively disposed at outer sides of the first nitrogen charging heads 4021.

Wherein, fill nitrogen head 4021, second through first, fill nitrogen head 4022's application, not only can provide the difference and fill nitrogen effect, like the volume of nitrogen gas, the velocity of flow change to fill nitrogen efficiently, and can also let the utility model discloses cleaning system 200 can cooperate different manufacturers' wafer transfer box 10, is favorable to holistic popularization and application.

The structure, features and effects of the present invention have been described in detail above according to the embodiment shown in the drawings, and the above description is only the preferred embodiment of the present invention, but the present invention is not limited to the implementation scope shown in the drawings, and all changes made according to the idea of the present invention or equivalent embodiments modified to the same changes should be considered within the protection scope of the present invention when not exceeding the spirit covered by the description and drawings.

Claims (10)

1. A wafer pod cleaning apparatus, the cleaning apparatus (100) being applicable to cleaning a wafer pod (10), characterized by:

the cleaning equipment (100) at least comprises at least one front machine table (1) and a rear machine table (2) arranged at the rear side end of the front machine table (1);

the front machine table (1) comprises a first frame body (11), a first horizontal displacement mechanism (12) arranged at the front side of the top end of the first frame body (11), a turnover mechanism (13) arranged at the rear side of the top end of the first frame body (11) corresponding to the first horizontal displacement mechanism (12), a suction device (14) arranged at the rear side of the top end of the first frame body (11) corresponding to the turnover mechanism (13), a first vertical displacement mechanism (15) arranged corresponding to the suction device (14), a front cleaning tank (16) arranged at the rear side of the bottom end of the first frame body (11), a front cleaning device (17) arranged at the rear side of the first frame body (11) and a first isolation wall device (18) transversely crossing the first horizontal displacement mechanism (12);

the first horizontal displacement mechanism (12) can drive the wafer transmission box (10) to displace towards the direction of the turnover mechanism (13);

the turnover mechanism (13) can drive the box body (10A) of the wafer conveying box (10) to turn over to the rear machine table (2), and enables the opening of the box body (10A) to be changed from a vertical state to a horizontal state;

the suction device (14) can perform vacuum adsorption positioning on the door body (10B) of the wafer transfer box (10) and detach the door body from the box body (10A);

the first vertical displacement mechanism (15) can drive the suction device (14) to switch between two states corresponding to the wafer transfer box (10) and the front cleaning tank (16) so as to drive the detached door body (10B) together;

the front cleaning tank (16) is internally provided with an accommodating space (161), an opening (162) communicated with the accommodating space (161) is arranged in front of the accommodating space (161), and the opening (162) can be used for positioning and accommodating the door body (10B) transferred by the suction device (14);

the front cleaning device (17) is arranged in the accommodating space (161), and is provided with a base (171), at least one movable cleaning unit (172) arranged on the base (171) and two drying units (173) respectively arranged at two side ends of the base (171), the movable cleaning unit (172) can clean the door body (10B), and the drying units (173) can dry the door body (10B);

the first isolation wall device (18) can be opened when the first horizontal displacement mechanism (12) drives the wafer transmission box (10) to displace towards the direction of the turnover mechanism (13) so as to reduce the possibility of pollution;

the rear machine table (2) comprises a second frame body (21) arranged corresponding to the rear side end of the first frame body (11), a rear cleaning tank (22) arranged at the top end of the second frame body (21), a rear separating device (23) arranged above the rear cleaning tank (22) and a rear cleaning device (24) with the top end arranged in the rear cleaning tank (22) and positioned at the bottom end of the rear cleaning tank (22);

the rear cleaning tank (22) can be used for accommodating the box body (10A) overturned and moved by the overturning mechanism (13);

the rear isolation device (23) can be used for sealing the rear cleaning groove (22) after the box body (10A) is overturned and moved by the overturning mechanism (13);

the rear cleaning device (24) can be covered by the box body (10A) which is turned over by the turning mechanism (13) and moved, and can perform the action of cleaning and drying the inside of the box body (10A).

2. The foup cleaning apparatus of claim 1, wherein: the turnover mechanism (13) further comprises a turnover driving device (131) which is arranged at the rear side of the top end of the first frame body (11) corresponding to the first horizontal displacement mechanism (12), a left turnover bracket (132) which is arranged at the left side of the turnover driving device (131), and a right turnover bracket (133) which is arranged at the right side of the turnover driving device (131) in a mirror image manner;

the left overturning support (132) further comprises a left Y-shaped support (1321) with the bottom end connected with the left side of the overturning driving device (131), a left L-shaped support (1322) arranged on the right side of the left Y-shaped support (1321) at intervals, a plurality of left spacing rods (1323) arranged between the left Y-shaped support (1321) and the left L-shaped support (1322) at intervals, and at least one left positioning assembly (1324) arranged on the right side face of the left L-shaped support (1322), one side of the top end of the left Y-shaped support (1321) is parallel to the horizontal plane, the other side of the top end of the left Y-shaped support is perpendicular to the horizontal plane, the left L-shaped support (1322) is further arranged corresponding to the top end of the left Y-shaped support (1321), and the left positioning assembly (1324) can be used for positioning the wafer transmission box (10;

the right overturning support (133) further comprises a right Y-shaped support (1331) with a bottom end connected with the right side of the overturning driving device (131), a right L-shaped support (1332) arranged at the left side of the right Y-shaped support (1331) at intervals, a plurality of right spacing rods (1333) arranged between the right Y-shaped support (1331) and the right L-shaped support (1332) at intervals, and at least one right positioning assembly (1334) arranged at the left side face of the right L-shaped support (1332), one side of the top end of the right Y-shaped support (1331) is parallel to the horizontal plane, the other side of the top end of the right Y-shaped support (1331) is perpendicular to the horizontal plane, the right L-shaped support (1332) is also arranged corresponding to the top end of the right Y-shaped support (1331), and the right positioning assembly (1334) can be used for positioning the wafer conveying.

3. The foup cleaning apparatus of claim 2, wherein: the front cleaning device (17) further comprises a rotating device (174), and the rotating device (174) can drive the movable cleaning unit (172) to rotate;

one side of the movable cleaning unit (172) is also provided with a plurality of front cleaning spray heads (1721) at intervals;

the rear cleaning device (24) further comprises a second driving unit (241) arranged at the bottom end of the rear cleaning tank (22), a cleaning unit (242) arranged in the rear cleaning tank (22), a sliding seat (243) movably connected with the second driving unit (241), and a connecting column (244) arranged between the cleaning unit (242) and the sliding seat (243);

the cleaning unit (242) further comprises a left cleaning assembly (2421) arranged on the left side of the top end of the connecting column (244), a right cleaning assembly (2422) arranged on the right side of the top end of the connecting column (244), an adjusting assembly (2423) arranged between the left cleaning assembly (2421) and the right cleaning assembly (2422) and positioned at the top end of the connecting column (244), and a pipeline integrating seat (2424) arranged between the adjusting assembly and the connecting column (244);

the left cleaning assembly (2421) and the right cleaning assembly (2422) both further comprise a seat body (2421a), an inverted L-shaped drying assembly (2421b) arranged at the top end of the seat body (2421a), a sunken part (2421c) formed between the seat body (2421a) and one side of the inverted L-shaped drying assembly (2421b) and a plurality of L-shaped cleaning spray heads (2421d) arranged at the sunken part (2421c) at intervals;

the adjusting component (2423) is also provided with two inverted T-shaped brackets (a), a left H-shaped wing plate (b), a right H-shaped wing plate (c), a cross bar (d), a bridging block (e), a screw (f) and an adjusting rotating wheel (g); the inverted T-shaped brackets (a) are respectively arranged at the front side edge and the rear side edge of the top end surface of the pipeline integrating seat (2424), and each inverted T-shaped bracket (a) is also internally provided with an inverted T-shaped groove (a 1);

the left H-shaped wing plate (b) is arranged on the left side of the top end face of the pipeline integration seat (2424), one end of the left H-shaped wing plate is arranged between the inverted T-shaped brackets (a), and the other end of the left H-shaped wing plate is connected with the left cleaning combination (2421);

the right H-shaped wing plate (c) is arranged on the right side of the top end face of the pipeline integration seat (2424), one end of the right H-shaped wing plate is arranged between the inverted T-shaped brackets (a), the other end of the right H-shaped wing plate is connected with the right cleaning combination (2422), the left H-shaped wing plate (b) and the right H-shaped wing plate (c) are positioned at one end between the inverted T-shaped brackets (a) and are mutually pivoted, the left H-shaped wing plate (b) and the corresponding end of the horizontal section of each inverted T-shaped bracket (a) are respectively positioned in a sliding mode through a left limiting rod (b1), and the right H-shaped wing plate (c) and the corresponding end of the horizontal section of each inverted T-shaped bracket (a) are respectively positioned in a sliding mode through a right limiting rod (c 1);

the cross rod (d) is arranged at the pivoting position of the left H-shaped wing plate (b) and the right H-shaped wing plate (c), the two ends of the cross rod (d) are respectively matched with the inverted T-shaped grooves (a1) of the inverted T-shaped bracket (a) correspondingly, and the center of the cross rod (d) is vertically provided with a connecting block (d 1);

the bridging block (e) is arranged between the inverted T-shaped brackets (a), and the two ends of the bridging block are respectively connected with the top ends of the corresponding inverted T-shaped brackets (a); the screw (f) passes through the bridging block (e) and then is connected with the connecting block (d 1);

the adjusting rotating wheel (g) is in threaded connection with the screw (f) and is positioned between the bridging block (e) and the connecting block (d 1);

the pipe integrated seat (2424) can also be used for efficiently transmitting gas and liquid to the left cleaning combination (2421) and the right cleaning combination (2422) after connecting corresponding pipelines.

4. The foup cleaning apparatus of claim 3, wherein: the rear cleaning tank (22) also comprises an inverted L-shaped opening (221) arranged at the front end side and the top end side of the rear cleaning tank (22), a front U-shaped baffle (222) arranged at the front end side of the inverted L-shaped opening (221), a rear U-shaped baffle (223) arranged at the rear side of the front U-shaped baffle (222) at intervals, an outer U-shaped adhesive tape (224) arranged at the top end edge of the rear cleaning tank (22) and an inner U-shaped adhesive tape (225) arranged at the top end edge of the rear cleaning tank (22) and positioned at the inner side of the outer U-shaped adhesive tape (224);

the top side inner edge of the inverted L-shaped opening (221) is corresponding to the top end of the front U-shaped baffle (222), and is respectively concavely provided with a front concave part (2211), and the top side inner edge is corresponding to the rear U-shaped baffle (223), and is also respectively concavely provided with a rear concave part (2212);

a front groove (2221) is respectively concavely arranged at the left side and the right side of the closed end of the front U-shaped baffle (222), and a front isolation rubber strip (2222) is clamped at the top edge of the closed end of the front U-shaped baffle (222);

the left side and the right side of the closed end of the rear U-shaped baffle plate (223) are respectively provided with a rear groove (2231) in a concave manner, and the top edge of the closed end of the rear U-shaped baffle plate (223) is also provided with a rear separation rubber strip (2232) in a clamping manner;

the rear isolation device (23) further comprises an inverted L-shaped isolation plate (231) which is arranged above the rear cleaning tank (22) and corresponds to the inverted L-shaped opening (221), a plate vertical driving unit (232) which is arranged at the rear side end of the rear cleaning tank (22), two plate guide rails (233) which are respectively arranged at the corresponding sides of the rear cleaning tank (22), a traction wire (234) connected with the top end of the inverted L-shaped isolation plate (231), and a balancing weight (235) arranged at the free end of the traction wire (234);

the inverted L-shaped isolation plate (231) is further provided with a front vertical plate body (2311) with an H-shaped section and a horizontal plate body (2312) with the bottom surface at the front end connected with the top end of the front vertical plate body (2311), the bottom end of the front side surface of the front vertical plate body (2311) is further provided with a front baffle plate (2311a) in an extending mode, two sides of the edge of the front side surface of the front vertical plate body (2311) are further respectively provided with a front sealing adhesive tape (2313), and two sides of the edge of the rear side surface of the front vertical plate body (2311) are further respectively provided with a rear sealing adhesive tape (2314);

the top end of the plate vertical driving unit (232) is also connected with the inverted L-shaped isolation plate (231);

the top ends of the plate guide rails (233) are also respectively connected with the corresponding sides of the inverted L-shaped isolation plate (231);

the pull wire (234) is connected to the top end of the inverted-L-shaped isolation plate (231), and then is wound around the rear side of the rear cleaning tank (22) and extends to the rear side of the rear cleaning tank (22).

5. The foup cleaning apparatus of claim 4, wherein: the rear machine table (2) further comprises a left abutting rod piece (25) which is arranged in the rear cleaning tank (22) and corresponds to the left overturning support (132) and a right abutting rod piece (26) which corresponds to the right overturning support (133), the left abutting rod piece (25) can be used for supporting the left overturning support (132) which is overturned from the inverted L-shaped opening (221) into the rear cleaning tank (22), and the right abutting rod piece (26) can be used for supporting the right overturning support (133) which is overturned from the inverted L-shaped opening (221) into the rear cleaning tank (22);

the front isolation rubber strip (2222) is further provided with an inverted U-shaped rubber strip (22a) and an O-shaped rubber strip (22b) in parallel from outside to inside in sequence, and an inverted hook strip (22c) is further arranged on the inner side surface of the front side end of the inverted U-shaped rubber strip (22a) and can be used for matching and positioning the top edge of the closed end of the front U-shaped baffle (222);

the rear separation rubber strip (2232) is also provided with an O-shaped rubber strip (22b) and an inverted U-shaped rubber strip (22a) in parallel from outside to inside in sequence, and the inner side surface of the rear end of the inverted U-shaped rubber strip (22a) is also provided with an inverted hook strip (22c) which can be matched and positioned on the top edge of the closed end of the rear U-shaped baffle (223);

the front sealing rubber strip (2313) and the rear sealing rubber strip (2314) both comprise a U-shaped rubber strip (23a) and a 3-shaped rubber strip (23b) which is arranged on one side of the U-shaped rubber strip (23a) in parallel and has mutually butted sealing ends, and the inner side surface of the front side end of the U-shaped rubber strip (23a) is also provided with an inverted hook part (23 c).

6. The foup cleaning apparatus of claim 5, wherein: the left positioning component (1324) also comprises a left supporting block (1324a) arranged at the free end of the horizontal section of the left L-shaped support (1322), a left guiding block (1324b) arranged at the center of the horizontal section of the left L-shaped support (1322), a left limiting block (1324c) arranged at the center of the vertical section of the left L-shaped support (1322) and a left stop block (1324d) arranged at the free end of the vertical section of the left L-shaped support (1322);

the right positioning component (1334) further comprises a right supporting block (1334a) arranged at the free end of the horizontal section of the right L-shaped bracket (1332), a right guiding block (1334b) arranged at the center of the horizontal section of the right L-shaped bracket (1332), a right limiting block (1334c) arranged at the center of the vertical section of the right L-shaped bracket (1332) and a right stopping block (1334d) arranged at the free end of the vertical section of the right L-shaped bracket (1332).

7. The foup cleaning apparatus of claim 6, wherein: the first horizontal displacement mechanism (12) further comprises a first displacement driving device (121) arranged on the front side of the top end of the first frame body (11) and a first horizontal displacement pedestal (122) arranged on the top end of the first displacement driving device (121), the first displacement driving device (121) can drive the first horizontal displacement pedestal (122) to displace, and the first horizontal displacement pedestal (122) can be used for bearing and positioning the wafer conveying box (10);

the suction device (14) is also provided with two vacuum suction disc parts (141) and two locking head parts (142) which are respectively arranged at two sides of the front side surface of the suction device (14), the vacuum suction disc parts (141) are also arranged in a diagonal shape and can be used for sucking the door body (10B), and the locking head parts (142) are positioned between the vacuum suction disc parts (141) and can be used for locking the door body (10B);

the first vertical displacement mechanism (15) further comprises a first driving unit (151) arranged on the left side of the suction device (14) and a vertical guide rail frame (152) arranged on the right side of the suction device (14), the first driving unit (151) can drive the suction device (14) to vertically displace, and the vertical guide rail frame (152) can guide the suction device (14) to vertically displace;

the front cleaning tank (16) further comprises a front cleaning tank shell (163) and an accommodating plate body (164), the front cleaning tank shell (163) can be matched with the accommodating plate body (164) and the base (171) to form the accommodating space (161), and the accommodating plate body (164) can be matched with the opening (162) to form the opening;

the first isolation wall device (18) further comprises a first isolation frame body (181) transversely spanned on the first horizontal displacement mechanism (12), a first wall plate moving device (182) vertically arranged at the top end of the first isolation frame body (181), and a first wall plate (183) movably arranged at the bottom end of the first isolation frame body (181) and connected with one end of the first wall plate moving device (182), wherein the first wall plate moving device (182) can drive the first wall plate (183) to enable the first wall plate (183) to move up and down along the first isolation frame body (181).

8. A pod cleaning system, the cleaning system (200) being adapted for use in cleaning a pod (10), the system characterized by:

the cleaning system (200) comprising at least one cleaning apparatus (100) according to any one of claims 1 to 7, at least one moving apparatus (300), at least one nitrogen charging apparatus (400) and at least one temporary storage apparatus (500);

the moving device (300) is arranged above the cleaning device (100), the nitrogen filling device (400) and the temporary storage device (500), spans the cleaning device, the nitrogen filling device and the temporary storage device, and can drive the wafer conveying box (10) cleaned by the cleaning device (100) to move;

the nitrogen filling equipment (400) is arranged at one side of the cleaning equipment (100) and can receive the wafer transfer box (10) brought by the movement of the moving equipment (300) from the cleaning equipment (100) so as to fill nitrogen into the wafer transfer box;

the temporary storage device (500) is arranged at the other side of the cleaning device (100) and can receive the wafer transfer box (10) transferred by the mobile device (300) from the nitrogen filling device (400) for temporary storage and output.

9. The foup cleaning system of claim 8, wherein: the mobile device (300) further comprises a square substrate body (301) arranged at the top end of the cleaning system (200), a transverse displacement mechanism (302) arranged at the edge of the rear side of the opening of the substrate body (301), a transverse guide rail (303) arranged at the edge of the front side of the opening of the substrate body (301), a first clamp seat (304) arranged on one side of the transverse displacement mechanism (302) and the transverse guide rail (303) in a spanning manner, and a clamp (305) arranged at the bottom end of the first clamp seat (304) and penetrating through the opening of the substrate body (301), wherein the transverse displacement mechanism (302) can drive the first clamp seat (304) to move along the transverse guide rail (303), the transverse guide rail (303) can guide the first clamp seat (304), and the first clamp seat (304) can drive the clamp (305) together, the clamp (305) can be used for clamping and positioning the wafer transmission box (10);

the nitrogen filling device (400) further comprises a bearing plate (401) arranged on one side of the cleaning device (100), at least one nitrogen filling head group (402) arranged on the bearing plate (401), a plurality of positioning pins (403) arranged on the bearing plate (401), and a plurality of sensing units (404) respectively arranged corresponding to the positioning pins (403), wherein the bearing plate (401) can be used for bearing the wafer transfer box (10) moved by the mobile device (300), the nitrogen filling head group (402) can be used for filling nitrogen into the wafer transfer box (10) moved by the mobile device (300), the positioning pins (403) can be used for positioning the wafer transfer box (10) moved by the mobile device (300), and the sensing units (404) can be used for judging whether the wafer transfer box (10) moved by the mobile device (300) is correctly placed by the nitrogen filling device (400);

the temporary storage facility (500) further comprises a third frame body (501), a second horizontal displacement mechanism (502) arranged at the front end of the third frame body (501), and a second partition wall device (503) transversely spanned on the second horizontal displacement mechanism (502);

the second horizontal displacement mechanism (502) can drive the wafer transport cassette (10) to displace towards the external direction, and further comprises a second displacement driving device (5021) arranged at the front side of the top end of the third frame body (501) and a second horizontal displacement pedestal (5022) arranged at the top end of the second displacement driving device (5021), wherein the second displacement driving device (5021) can drive the second horizontal displacement pedestal (5022) to displace, and the second horizontal displacement pedestal (5022) can be used for bearing and positioning the wafer transport cassette (10);

the second partition wall device (503) further comprises a second partition frame body (5031) arranged on the second horizontal displacement mechanism (502), a second wall plate moving device (5032) vertically arranged at the top end of the second partition frame body (5031), and a second wall plate (5033) movably arranged at the bottom end of the second partition frame body (5031) and connected with one end of the second wall plate moving device (5032), wherein the second wall plate moving device (5032) can drive the second wall plate (5033) to move up and down along the second partition frame body (5031).

10. The foup cleaning system of claim 9, wherein: the clamp (305) further comprises a third driving unit (3051) arranged on one side of the first clamp base (304), a clamp guide rail (3052) arranged on the other side of the first clamp base (304), a second clamp base (3053) arranged between the third driving unit (3051) and the clamp guide rail (3052), a chuck driving set (3054) arranged at the bottom end face of the second clamp base (3053), a left clamping jaw (3055) movably arranged on the left side of the chuck driving set (3054) and a right clamping jaw (3056) movably arranged on the right side of the chuck driving set (3054), wherein the third driving unit (3051) can drive the second clamp base (3053) to shift along the clamp guide rail (2), and the clamp guide rail (3052) can be matched with the third driving unit (3051) to guide the second clamp 3053), the second clamp seat (3053) can be used for bearing the chuck driving group (3054), the chuck driving group (3054) can be used for driving the left clamping jaw (3055) and the right clamping jaw (3056) to be switched between a state of being far away from each other and a state of being close to each other, and the left clamping jaw (3055) and the right clamping jaw (3056) can be matched with each other to be used for clamping the wafer transfer box (10);

the chuck driving group (3054) further comprises a bidirectional driving unit (3054a) disposed on the bottom end surface of the second chuck base (3053), a left actuating block (3054b) movably disposed at the left side of the bidirectional driving unit (3054a), a right actuating block (3054c) movably disposed at the right side of the bidirectional driving unit (3054a), and a housing (3054d) sleeved outside the bidirectional driving unit (3054a) and connected to the second chuck base (3053), the bidirectional driving unit (3054a) can drive the left actuating block (3054b) and the right actuating block (3054c) to actuate simultaneously, the bottom end face of the left actuating block (3054b) is also connected with the left clamping jaw (3055) and can be used for driving the left clamping jaw (3055), the bottom end face of the right actuating block (3054c) is also connected with the right clamping jaw (3056) and can be used for driving the left clamping jaw (3055);

the nitrogen filling head group (402) also comprises a plurality of first nitrogen filling heads (4021) which are respectively arranged on the bearing disc (401) and at least two second nitrogen filling heads (4022) which are respectively arranged at the outer side of the first nitrogen filling heads (4021).

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