CN211771525U - Rate monitor and evaporation device - Google Patents
Rate monitor and evaporation device Download PDFInfo
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- CN211771525U CN211771525U CN202020045849.1U CN202020045849U CN211771525U CN 211771525 U CN211771525 U CN 211771525U CN 202020045849 U CN202020045849 U CN 202020045849U CN 211771525 U CN211771525 U CN 211771525U
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Abstract
The utility model provides a rate monitor and coating by vaporization device, the rate monitor is arranged in monitoring coating by vaporization rate among the coating by vaporization device, the rate monitor includes: a crystal oscillator base cover; the crystal oscillator base is arranged in the crystal oscillator base cover, and an opening is formed in the crystal oscillator base; the crystal oscillator plate is arranged on the crystal oscillator base, is positioned on one side of the opening and is opposite to the opening; the speed monitor also comprises a caliber adjusting part which is arranged at the opening and used for adjusting the caliber size of the opening. The utility model provides a speed monitor and evaporation plating device adjust the deposition rate of material on the crystal oscillator piece when can the coating by vaporization to compromise the life and the speed control accuracy of crystal oscillator piece.
Description
Technical Field
The utility model relates to a show technical field, especially relate to a speed monitor and coating by vaporization device.
Background
With the rapid development of OLED (Organic Light-Emitting Diode) technology in recent years, the advantages of wide color gamut, fast response speed, wide viewing angle, and foldable property, etc. begin to appear compared with the currently used LCD, and have attracted a great deal of capital investment to research and develop by many manufacturers.
Vacuum evaporation is an important thin film forming technology, and is widely used in industrial fields such as displays, electronic circuits, optics, and molds, for example, in an Organic Light Emitting Diode (OLED) display technology, film formation of organic materials and metal materials is performed by vacuum evaporation to produce OLED devices.
The basic process of evaporation is as follows: the evaporation material is placed in a crucible of an evaporation cavity, after the cavity is vacuumized to reach a certain vacuum degree, the crucible is heated to enable the evaporation material to reach a certain temperature, gas molecules of the evaporation material are sprayed out of the crucible and deposited on a substrate to form a target film, and meanwhile, the gas molecules can be deposited on a crystal oscillator of an evaporation rate monitor, the evaporation rate monitor monitors the evaporation rate of a material film layer deposited on the crystal oscillator, and then the evaporation rate and the thickness of the target film are monitored. The crystal oscillator plate has a certain vibration frequency, and after the material is deposited on the crystal oscillator plate, the vibration frequency of the crystal oscillator plate is reduced along with the increase of the deposition quality of the material. The evaporation rate of the material deposited on the crystal oscillator plate is calculated by monitoring the frequency change of the crystal oscillator plate, and then the deposition rate of the material on the substrate is calculated by the input Tooling Factor value, so that the evaporation rate is monitored. Too fast material deposition on the crystal oscillator can lead to the acceleration of the reduction of the vibration frequency, shorten the service life of the crystal oscillator, too slow can lead to the large fluctuation of the speed, and the monitoring of the film thickness is inaccurate.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a speed monitor and coating by vaporization device can adjust the deposition rate of material on the crystal oscillator piece to compromise the life and the speed control accuracy of crystal oscillator piece.
The utility model provides a technical scheme as follows:
on the one hand, the embodiment of the utility model provides a speed monitor for monitoring the evaporation rate in the evaporation device; the rate monitor comprises:
a crystal oscillator base cover;
the crystal oscillator base is arranged in the crystal oscillator base cover, and an opening is formed in the crystal oscillator base;
the crystal oscillator plate is arranged on the crystal oscillator base, is positioned on one side of the opening and is opposite to the opening;
the speed monitor also comprises a caliber adjusting part which is arranged at the opening and used for adjusting the caliber size of the opening.
Illustratively, the caliber adjusting member includes:
the adjusting baffles are arranged between the opening and the crystal oscillator plate and/or arranged on one side of the opening, which is far away from the crystal oscillator plate, and the adjusting baffles are distributed around the periphery of the opening, and at least one adjusting baffle can move to change the shielding area of the opening;
and a moving mechanism for moving the plurality of regulating baffles.
Illustratively, the moving mechanism is a rotating mechanism capable of driving at least one adjusting baffle to rotate.
Illustratively, the rotation mechanism includes:
a drive motor;
the driving wheel is in transmission connection with an output shaft of the driving motor;
the driven wheel is meshed with the driving wheel and driven by the driving wheel to rotate;
and the driven wheel is connected with the adjusting baffle plate through the connecting rod, so that the adjusting baffle plate is driven by the driven wheel to rotate.
Illustratively, each adjusting baffle can rotate, the number of the driven wheels is multiple, and each adjusting baffle is correspondingly connected with one driven wheel;
wherein the content of the first and second substances,
one driving wheel is provided, and a plurality of driven wheels are meshed with the driving wheel;
or a plurality of driving wheels are provided, the driving wheels are connected to the same output shaft, and each driven wheel is correspondingly connected to one driving wheel;
or the driving wheels are multiple and are connected to different output shafts, and each driven wheel is correspondingly connected to one driving wheel.
Illustratively, when the adjusting baffles are arranged on one side of the opening far away from the crystal oscillator plate, the rotating mechanism is positioned on one side of the opening close to the crystal oscillator plate, a plurality of openings are distributed around the opening of the crystal oscillator base cover, and each connecting rod correspondingly penetrates through one of the openings.
Illustratively, each of the adjusting baffles is a plate-shaped structure including:
a linear side comprising a first end and a second end;
and an arcuate side connected between the first end and the second end of the linear side.
Illustratively, the connecting rod is connected to the adjusting flap at a position proximate to the first end of the linear side.
Illustratively, a plurality of the adjusting baffles are driven by the rotating mechanism to rotate, and at least have a first state and a second state, wherein,
in the first state, the straight side edge of each adjusting baffle faces towards the inner direction of the center of the opening, and the arc side edge faces towards the outer direction of the opening;
in the second state, the arc-shaped side edge of each adjusting baffle faces towards the inner side direction of the center of the opening, and the straight line side edge faces towards the outer side direction of the opening.
On the other hand, the embodiment of the utility model provides an evaporation device, include:
a cavity;
the evaporation source is arranged in the cavity;
the substrate placing device is arranged in the cavity and positioned above the evaporation source;
and the speed monitor is arranged in the cavity and positioned above the evaporation source, and the speed monitor is the speed monitor.
The utility model discloses the beneficial effect who brings as follows:
in the above scheme, by setting the aperture adjusting part, the aperture size of the opening on the crystal oscillator base can be adjusted to adjust the deposition rate of the material on the crystal oscillator piece, so that the deposition rate of the material on the crystal oscillator piece is optimal, and the service life and the rate monitoring accuracy of the crystal oscillator piece are considered.
Drawings
FIG. 1 is a schematic structural diagram of a vapor deposition apparatus in the prior art;
fig. 2 is a schematic structural view of an evaporation apparatus according to an embodiment of the present invention;
fig. 3 shows a schematic structure of the evaporation rate monitor in part a of fig. 2.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present disclosure more apparent, the technical solutions of the embodiments of the present disclosure will be described clearly and completely with reference to the drawings of the embodiments of the present disclosure. It is to be understood that the described embodiments are only a few embodiments of the present disclosure, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the described embodiments of the disclosure without any inventive step, are within the scope of protection of the disclosure.
Unless otherwise defined, technical or scientific terms used herein shall have the ordinary meaning as understood by one of ordinary skill in the art to which this disclosure belongs. The use of "first," "second," and similar terms in this disclosure is not intended to indicate any order, quantity, or importance, but rather is used to distinguish one element from another. Also, the use of the terms "a," "an," or "the" and similar referents do not denote a limitation of quantity, but rather denote the presence of at least one. The word "comprising" or "comprises", and the like, means that the element or item listed before the word covers the element or item listed after the word and its equivalents, but does not exclude other elements or items. The terms "connected" or "coupled" and the like are not restricted to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "upper", "lower", "left", "right", and the like are used merely to indicate relative positional relationships, and when the absolute position of the object being described is changed, the relative positional relationships may also be changed accordingly.
Before describing the rate monitor provided by the present invention in detail, it is necessary to describe the following:
currently, the OLED device is mainly prepared in a vacuum evaporation manner, and in the process of preparing the OLED device through a vacuum evaporation process, a crystal oscillator system is often used to monitor the evaporation rate of an evaporation source in an evaporation chamber, and the evaporation rate of the evaporation source is adjusted to control the thickness of an organic light-emitting material film layer formed by evaporation. The crystal oscillator plate has a certain vibration frequency, and after the material is deposited on the crystal oscillator plate, the vibration frequency of the crystal oscillator plate is reduced along with the increase of the deposition quality of the material. The device can calculate the evaporation rate of the material deposited on the crystal oscillator piece through the frequency change of the crystal oscillator piece, and then calculate the deposition rate of the material on the substrate through the input ToolingFactor value, thereby realizing the monitoring of the evaporation rate. Too fast material deposition on the crystal oscillator can lead to the acceleration of the reduction of the vibration frequency, shorten the service life of the crystal oscillator, too slow can lead to the large fluctuation of the speed, and the monitoring of the film thickness is inaccurate.
Fig. 1 is a schematic structural diagram of an evaporation apparatus in the prior art. As shown in fig. 1, a crucible 2 is arranged at the bottom of an evaporation chamber 1 for filling evaporation materials, an evaporation substrate placing device 3 is arranged at the top of the chamber 1, a substrate is placed on the evaporation substrate placing device 3, an evaporation rate monitor 4 is further arranged at the top of the chamber 1, a crystal oscillator base cover 5 for shielding the evaporation materials is arranged on the evaporation rate monitor 4, a crystal oscillator piece 6 is supported by a crystal oscillator base 7, an opening 8 which is right opposite to the crystal oscillator piece 6 is arranged on the crystal oscillator base 7, and the size of the opening 8 is fixed. During the coating by vaporization, 2 heating coating by vaporization materials of crucible, after the temperature reached certain numerical value, coating by vaporization materials become the gaseous state, diffuse inside 1 cavity, can condense the membrane after coating by vaporization materials meet the lower base plate of top temperature, the thick homogeneity of membrane is maintained through the rotation to the base plate during the coating by vaporization, coating by vaporization rate monitor 4 carries out real time monitoring to the coating by vaporization rate. The opening 8 size of crystal oscillator base 7 is fixed, can't change, and the opening 8 of crystal oscillator base 7 is big more, and Tooling factor is less, and the material deposition is too fast on the crystal oscillator piece 6, needs frequently to open the chamber and change crystal oscillator piece 6, if not change, and the monitoring rate accuracy descends, and the thick difference of target membrane is increaseed to the actual coating by vaporization membrane.
To the above problem, the utility model provides a speed monitor and coating by vaporization device can adjust the deposition rate of material on the crystal oscillator piece to compromise the life and the speed control accuracy of crystal oscillator piece.
As shown in fig. 2 and fig. 3, the speed monitor provided by the embodiment of the present invention is used for monitoring the evaporation rate in the evaporation apparatus; the rate monitor comprises: the crystal oscillator comprises a crystal oscillator base cover 100, a crystal oscillator base 200, a crystal oscillator piece 300 and a caliber adjusting part 400, wherein the crystal oscillator base 200 is arranged in the crystal oscillator base cover 100, an opening 210 is formed in the crystal oscillator base 200, the crystal oscillator piece 300 is arranged on the crystal oscillator base 200 and is positioned on one side of the opening 210, the position of the opening 210 is just opposite to that of the opening 210, and the caliber adjusting part 400 is arranged at the opening 210 and is used for adjusting the caliber size of the opening 210.
In the above scheme, the aperture adjusting component 400 is arranged at the opening 210 of the crystal oscillator base 200, so that the aperture size of the opening 210 on the crystal oscillator base 200 can be adjusted to adjust the deposition rate of the material on the crystal oscillator piece 300, the deposition rate of the material on the crystal oscillator piece 300 is optimized, and the service life and the rate monitoring accuracy of the crystal oscillator piece 300 are considered.
In an exemplary embodiment, as shown in fig. 2 and 3, the caliber adjusting member 400 includes: the adjusting device comprises a plurality of adjusting baffles 410 and a moving mechanism for moving the adjusting baffles 410, wherein the adjusting baffles 410 are arranged between the opening 210 and the crystal oscillator plate 300, the adjusting baffles 410 are distributed around the opening 210, and at least one adjusting baffle 410 can move to change the shielding area of the opening 210.
In the above solution, the aperture adjusting component 400 is implemented by a plurality of adjusting baffles 410, and when performing vapor deposition, the adjusting baffles 410 can be controlled to move, so that the shapes of the adjusting baffles 410 surrounding the opening 210 are changed, that is, the shielding areas of the adjusting baffles 410 to the opening 210 are changed, thereby achieving the purpose of adjusting the aperture size of the opening 210. The structure is simple and easy to operate.
It is understood that, the above-mentioned embodiments in which the aperture adjustment component 400 is implemented by using the adjustment baffle 410 only provide an embodiment, and in practical applications, the aperture adjustment component 400 may also be implemented by using other structures, which is not limited thereto.
In addition, in the above embodiment, the plurality of adjusting baffles 410 in the aperture adjusting member 400 are disposed between the opening 210 and the quartz-crystal plate 300, and in another embodiment, the plurality of adjusting baffles 410 may be disposed on a side of the opening 210 away from the quartz-crystal plate 300.
Furthermore, in an exemplary embodiment of the present invention, the moving mechanism is a rotating mechanism capable of driving at least one of the adjusting baffles 410 to rotate.
With the above scheme, the adjusting baffle 410 moves in a rotating manner to change the shielding area of the opening 210. It should be noted that in other embodiments, the adjusting baffle 410 may also adopt other moving manners, such as: the moving means such as translation and inversion are not limited to this.
Furthermore, in an exemplary embodiment provided by the present invention, the rotating mechanism includes:
a drive motor (not shown in the drawings);
the driving wheel 420 is in transmission connection with an output shaft 421 of the driving motor;
a driven wheel 430, which is engaged with the driving wheel 420 to rotate under the driving of the driving wheel 420;
and the driven wheel 430 is connected with the adjusting baffle 410 through the connecting rod 440, so that the adjusting baffle 410 is driven by the driven wheel 430 to rotate.
By adopting the scheme, the rotating mechanism comprises the driving motor, the driving wheel 420, the driven wheel 430 and the connecting rod 440, the connecting rod 440 is connected with the driven wheel 430 and the adjusting baffle 410, the driving motor drives the driving wheel 420, the driving wheel 420 drives the driven wheel 430 to drive the adjusting baffle 410 to rotate, so that the caliber size of the opening 210 on the crystal oscillator base 200 is changed, the structure is simple, the driving motor can select the servo motor, the caliber size of the opening 210 can be accurately controlled, and the monitoring accuracy is improved. It is understood that, in practical applications, the rotating mechanism may be implemented in other manners, which is not limited to this.
In an exemplary embodiment of the present invention, as shown in fig. 3, each of the adjusting baffles 410 is capable of rotating, and a plurality of driven wheels 430 are provided, and each of the adjusting baffles 410 is correspondingly connected to one of the driven wheels 430; one of the driving wheels 420 and a plurality of the driven wheels 430 are engaged with the driving wheel 420.
By adopting the above scheme, the three driven wheels 430 are engaged with the middle driving wheel 420, the driving wheel 420 is connected with the motor (either directly connected with the driving motor or connected with the driving motor through the speed change gear 700), thus, the aperture size of the opening 210 on the crystal oscillator base 200 is controlled by the driving motor, the driving wheel 420, the driven wheels 430 and other structures in a linkage manner, a plurality of adjusting baffles 410 can be driven to synchronously rotate through one driving wheel 420, the structure is compact, all the adjusting baffles 410 can be driven by only one driving motor, and the cost is low.
The aperture adjusting process of the aperture adjusting part 400 in this embodiment is exemplified: the driving wheel 420 rotates clockwise to drive the other three driven wheels 430 to rotate counterclockwise, so that the openings 210 formed by the plurality of adjusting baffles 410 in the aperture adjusting part 400 are narrowed, that is, the openings 210 on the crystal oscillator base 200 are narrowed by shielding the crystal oscillator base 200; on the contrary, the capstan 420 rotates counterclockwise, and finally the opening 210 on the crystal oscillator base 200 becomes larger.
In another exemplary embodiment of the present invention, as shown in fig. 3, there may be a plurality of driving wheels 420, a plurality of driving wheels 420 are connected to the same output shaft 421, and each of the driven wheels 430 is correspondingly connected to one of the driving wheels 420. Above-mentioned scheme can be that a plurality of action wheels 420 are connected on a driving motor's the output shaft 421, and each action wheel 420 is connected from driving wheel 430, corresponds a drive adjustment baffle 410, like this, according to different space installation demands, the rotation rate of different adjustment baffles 410, angle demand etc. accessible change different action wheels 420, follow parameters such as the external diameter size of driving wheel 430, adapt to different application occasions.
In addition, in another embodiment of the present invention, there are a plurality of driving wheels 420, a plurality of driving wheels 420 are connected to different output shafts 421, and each of the driven wheels 430 is correspondingly connected to one of the driving wheels 420. Above-mentioned scheme can be that different action wheels 420 connect different driving motor respectively, and each action wheel 420 connects a driven wheel 430, corresponds a drive adjusting baffle 410, like this, according to different space installation demands, the rotation rate of different adjusting baffle 410, angle demand etc. accessible changes different driving motor's power, action wheel 420 and follows the outer diameter size isoparametric of wheel 430, adapts to different application occasions.
In addition, as shown in the drawing, in an exemplary embodiment, when a plurality of the adjusting baffles 410 are disposed on a side of the opening 210 far from the crystal oscillator plate 300, the rotating mechanism is located on a side of the opening 210 near the crystal oscillator plate 300, a plurality of holes are distributed around the opening 210 of the crystal oscillator base cover 100, and each of the connecting rods 440 correspondingly passes through one of the holes.
With the above scheme, in order to avoid the influence of the rotating mechanism on the deposition of the evaporation material on the crystal oscillator plate 300, the rotating mechanism is disposed on one side of the opening 210 close to the crystal oscillator plate 300, that is, the rotating mechanism avoids the space between the opening 210 and the evaporation source, and the adjusting baffles 410 are disposed on one side of the opening 210 far from the crystal oscillator plate 300, so that holes can be formed around the opening 210 of the crystal oscillator base cover 100, and the connecting rod 440 passes through the holes to connect the adjusting baffles 410 and the driven wheel 430. The specific position of the rotating mechanism may be adjusted according to actual requirements, and is not limited thereto.
Further, as shown in fig. 3, in an exemplary embodiment, each of the adjusting baffles 410 is a plate-shaped structure including: a linear side 410a, the linear side 410a comprising a first end and a second end; and an arcuate side 410b connected between said first end and said second end of said linear side 410 a; the plurality of adjusting baffles 410 are driven by the rotating mechanism to rotate, and at least have a first state and a second state, wherein in the first state, the straight side 410a of each adjusting baffle 410 faces to the central inner direction of the opening 210, and the arc side 410b faces to the outer direction of the opening 210; in the second state, the arc-shaped side 410b of each of the adjusting baffles 410 faces the central inner direction of the opening 210, and the straight side 410a faces the outer direction of the opening 210.
By adopting the above scheme, the shape design of the adjusting baffle 410 is that one side is the straight side 410a, and the other side is the arc side 410b, so that when the adjusting baffle 410 rotates, the shape enclosed by the adjusting baffles 410 changes, and when the adjusting baffles 410 rotate by different angles, the shape enclosed by the arc sides 410b of the adjusting baffles 410 has different shapes, and the change difference of the shapes is more accurate than that of the straight sides.
It is of course understood that the specific shape of the adjustment flap 410 is not limited.
Further, in an exemplary embodiment, as shown in fig. 3, the connection rod 440 is connected to the adjustment flap 410 at a position near the first end of the straight side 410 a.
By adopting the above scheme, the connecting rod 440 is connected to the end position of the adjusting baffle 410, and compared with the connecting rod connected to the middle position of the adjusting baffle 410, the moving stroke of the adjusting baffle 410 is larger, and the aperture size adjusting range is larger.
Furthermore, in an exemplary embodiment provided by the present invention, as shown in fig. 2, the rate monitor may further include: and the crystal oscillator shielding plate 600 is arranged in the crystal oscillator base cover 100, is positioned between the opening 210 and the evaporation source 20 and can move, the crystal oscillator shielding plate 600 is used for controlling the crystal oscillator piece 300 to be switched on and off, and the crystal oscillator shielding plate 600 is opened during evaporation.
In addition, as shown in fig. 2 and fig. 3, the embodiment of the present invention further provides an evaporation apparatus, including:
a cavity 10;
the evaporation source 20 is arranged in the cavity 10;
the substrate placing device 30 is arranged in the cavity 10 and is positioned above the evaporation source 20;
and locate in the cavity and be located the rate monitor 40 of evaporation coating source 20 top, rate monitor 40 is the utility model discloses the rate monitor that the embodiment provided.
Above-mentioned scheme, through aperture adjusting part 400 automatically regulated crystal oscillator base 200 on the opening 210 bore size, and then adjust the deposition rate of evaporation material on crystal oscillator piece 300 to and the tool, make crystal oscillator piece 300's availability factor reach the optimum, solved among the prior art crystal oscillator piece 300 life-span decline faster, need frequently open the problem in chamber, compromise crystal oscillator piece 300's life and rate control accuracy.
It should be noted that, in the exemplary embodiment provided in the present invention, as shown in the figure, the evaporation source 20 may be a crucible, which can hold the evaporation material, and the evaporation material is gasified by heating the evaporation material.
The following points need to be explained:
(1) the drawings of the embodiments of the disclosure only relate to the structures related to the embodiments of the disclosure, and other structures can refer to the common design.
(2) For purposes of clarity, the thickness of layers or regions in the figures used to describe embodiments of the present disclosure are exaggerated or reduced, i.e., the figures are not drawn on a true scale. It will be understood that when an element such as a layer, film, region, or substrate is referred to as being "on" or "under" another element, it can be "directly on" or "under" the other element or intervening elements may be present.
(3) Without conflict, embodiments of the present disclosure and features of the embodiments may be combined with each other to arrive at new embodiments.
The above description is only for the specific embodiments of the present disclosure, but the scope of the present disclosure is not limited thereto, and the scope of the present disclosure should be subject to the claims.
Claims (10)
1. A speed monitor is used for monitoring the evaporation rate in an evaporation device; the rate monitor comprises:
a crystal oscillator base cover;
the crystal oscillator base is arranged in the crystal oscillator base cover, and an opening is formed in the crystal oscillator base;
the crystal oscillator plate is arranged on the crystal oscillator base, is positioned on one side of the opening and is opposite to the opening;
the speed monitor is characterized by further comprising a caliber adjusting part, wherein the caliber adjusting part is arranged at the opening and used for adjusting the caliber size of the opening.
2. The rate monitor of claim 1,
the caliber adjusting part comprises:
the adjusting baffles are arranged between the opening and the crystal oscillator plate and/or arranged on one side of the opening, which is far away from the crystal oscillator plate, and the adjusting baffles are distributed around the periphery of the opening, and at least one adjusting baffle can move to change the shielding area of the opening;
and a moving mechanism for moving the plurality of regulating baffles.
3. The rate monitor of claim 2,
the moving mechanism is a rotating mechanism capable of driving at least one adjusting baffle to rotate.
4. The rate monitor of claim 3,
the rotating mechanism includes:
a drive motor;
the driving wheel is in transmission connection with an output shaft of the driving motor;
the driven wheel is meshed with the driving wheel and driven by the driving wheel to rotate;
and the driven wheel is connected with the adjusting baffle plate through the connecting rod, so that the adjusting baffle plate is driven by the driven wheel to rotate.
5. The rate monitor of claim 4,
each adjusting baffle can rotate, a plurality of driven wheels are arranged, and each adjusting baffle is correspondingly connected with one driven wheel;
wherein the content of the first and second substances,
one driving wheel is provided, and a plurality of driven wheels are meshed with the driving wheel;
or a plurality of driving wheels are provided, the driving wheels are connected to the same output shaft, and each driven wheel is correspondingly connected to one driving wheel;
or the driving wheels are multiple and are connected to different output shafts, and each driven wheel is correspondingly connected to one driving wheel.
6. The rate monitor of claim 5,
when the adjusting baffles are arranged on one side of the opening far away from the crystal oscillator piece, the rotating mechanism is positioned on one side of the opening close to the crystal oscillator piece, a plurality of holes are distributed around the opening of the crystal oscillator base cover, and each connecting rod correspondingly penetrates through one hole.
7. The rate monitor of claim 5,
each adjusting baffle is of a plate-shaped structure and comprises:
a linear side comprising a first end and a second end;
and an arcuate side connected between the first end and the second end of the linear side.
8. The rate monitor of claim 7,
the connecting rod is connected to the position, close to the first end of the straight line side edge, of the adjusting baffle.
9. The rate monitor of claim 7,
a plurality of adjusting baffles are driven by the rotating mechanism to rotate and at least have a first state and a second state, wherein,
in the first state, the straight side edge of each adjusting baffle faces towards the inner direction of the center of the opening, and the arc side edge faces towards the outer direction of the opening;
in the second state, the arc-shaped side edge of each adjusting baffle faces towards the inner side direction of the center of the opening, and the straight line side edge faces towards the outer side direction of the opening.
10. An evaporation apparatus, comprising:
a cavity;
the evaporation source is arranged in the cavity;
the substrate placing device is arranged in the cavity and positioned above the evaporation source;
and a rate monitor disposed in the chamber above the evaporation source, the rate monitor being as claimed in any one of claims 1 to 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020045849.1U CN211771525U (en) | 2020-01-09 | 2020-01-09 | Rate monitor and evaporation device |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202020045849.1U CN211771525U (en) | 2020-01-09 | 2020-01-09 | Rate monitor and evaporation device |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112458407A (en) * | 2020-11-27 | 2021-03-09 | 江苏集萃有机光电技术研究所有限公司 | Crystal oscillator measuring system, measuring method and device |
| CN112981352A (en) * | 2021-05-11 | 2021-06-18 | 陛通半导体设备(苏州)有限公司 | Physical vapor deposition equipment capable of flexibly adjusting sputtering range |
| TWI815135B (en) * | 2021-06-29 | 2023-09-11 | 天虹科技股份有限公司 | Shielding device and thin film deposition equipment with shielding device |
-
2020
- 2020-01-09 CN CN202020045849.1U patent/CN211771525U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112458407A (en) * | 2020-11-27 | 2021-03-09 | 江苏集萃有机光电技术研究所有限公司 | Crystal oscillator measuring system, measuring method and device |
| CN112981352A (en) * | 2021-05-11 | 2021-06-18 | 陛通半导体设备(苏州)有限公司 | Physical vapor deposition equipment capable of flexibly adjusting sputtering range |
| CN112981352B (en) * | 2021-05-11 | 2021-08-06 | 陛通半导体设备(苏州)有限公司 | Physical vapor deposition equipment capable of flexibly adjusting sputtering range |
| TWI815135B (en) * | 2021-06-29 | 2023-09-11 | 天虹科技股份有限公司 | Shielding device and thin film deposition equipment with shielding device |
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