CN211644606U - Device for recycling and preparing ultra-pure argon - Google Patents
Device for recycling and preparing ultra-pure argon Download PDFInfo
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- CN211644606U CN211644606U CN201922479770.XU CN201922479770U CN211644606U CN 211644606 U CN211644606 U CN 211644606U CN 201922479770 U CN201922479770 U CN 201922479770U CN 211644606 U CN211644606 U CN 211644606U
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Abstract
The invention relates to a device for recycling and preparing ultra-pure argon, belonging to the field of gas production and application. The main technical scheme is as follows: a device for recycling and preparing ultra-pure argon comprises a front buffer tank, a compressor, a tail gas pretreatment system and a low-temperature reboiling liquefied argon system which are connected in series sequentially through a pipeline; the tail gas pretreatment system comprises a catalytic tower, a heat exchanger and an adsorption drying tower; the catalytic tower comprises a first catalytic tower and a second catalytic tower, the first catalytic tower is connected with the first heat exchanger, and the second catalytic tower is connected with the second heat exchanger; the invention can be flexibly adjusted according to the purity requirement of the product. The method is particularly suitable for recovering argon from the industrial furnace emptying waste gas taking argon as protective gas, and has very good economic benefit and environmental protection benefit.
Description
Technical Field
The utility model belongs to the field of gas production and application, in particular to a device for recovering and preparing ultra-pure argon.
Background
The argon gas has the characteristic of inertia, so that the argon gas can protect substances which are easy to react with surrounding substances, compared with other inert gases, the argon gas has the advantages of relatively simple acquisition mode, low cost and more economic benefit, the volume ratio content of the argon gas in the ultra-pure argon is more than 99.9999 percent, and the contents of oxygen, carbon monoxide and carbon dioxide are all less than 1 × 10-6. The ultra-pure argon is an important variety in industrial gas and is widely applied to various fields such as chemical industry, petrifaction, petroleum, energy, electronics, metallurgy, food, machinery, aerospace, nuclear industry and the like.
In recent years, silicon wafers have been increasingly used to fabricate photovoltaic cells and large scale integrated circuits. Modules of photovoltaic cells can be connected together to form a photovoltaic array, so-called solar panels, which can generate electricity by converting solar energy into electrical energy. In the prior art, a vacuum furnace is adopted to crystallize and recrystallize silicon ingots and silicon wafers under the protection of inert atmosphere to form required photovoltaic manufacturing raw materials. In this type of vacuum furnace production process, 100000 liters of argon gas are typically required, the process lasts 40 hours or more, and one silicon ingot is produced. The purity of the inert gas used in such vacuum furnaces is important, and the argon purity of the inert atmosphere created using argon is to reach 6n, i.e., 99.9999% to about 1ppm total contaminants, to avoid reaction (oxidation) and damage of the silicon ingot and wafer in the furnace. As the demand for photovoltaic devices has increased dramatically, simplifying the manufacturing process, increasing the purity of argon, and reducing manufacturing and processing costs are currently major challenges.
SUMMERY OF THE UTILITY MODEL
In order to make up the defects of the prior art, the utility model provides a device for recovering and preparing the ultra-pure argon.
The utility model adopts the following technical scheme: a device for recycling and preparing ultra-pure argon comprises a front buffer tank, a compressor, a tail gas pretreatment system and a low-temperature reboiling liquefied argon system which are connected in series sequentially through a pipeline;
the tail gas pretreatment system comprises a catalytic tower, a heat exchanger and an adsorption drying tower; the catalytic tower comprises a first catalytic tower and a second catalytic tower, the first catalytic tower is connected with the first heat exchanger, and the second catalytic tower is connected with the second heat exchanger; the second heat exchanger is connected with the first adsorption drying tower and the second adsorption drying tower, and outlets of the first adsorption drying tower and the second adsorption drying tower are connected with the main heat exchanger and the secondary heat exchanger;
the low-temperature reboiling liquefied argon system comprises a main heat exchanger, a turbine expander, a condensing tower, a reboiling degassing tower and a liquid ammonia storage kettle which are sequentially connected, wherein a secondary heat exchanger is arranged in the liquid ammonia storage kettle; the first adsorption drying tower and the second adsorption drying tower are connected with a secondary heat exchanger through a pipeline A, and an outlet of the secondary heat exchanger is connected with a condensing tower;
the liquid ammonia storage kettle is connected with a product gas outlet through a main heat exchanger;
the first adsorption drying tower and the second adsorption drying tower are connected with a main heat exchanger through a pipeline B, and the top of the reboiling degassing tower is connected with a waste gas discharge port through the main heat exchanger.
Further, the compressor is an oil-free compressor.
Furthermore, the inner part and the outer wall of the first catalytic tower, the second catalytic tower, the first adsorption drying tower and the second adsorption drying tower are respectively provided with an electric heating element.
Further, the length-diameter ratio of the first catalytic tower to the second catalytic tower is 3-8: 1.
The utility model discloses request simultaneously and protect a method for retrieving preparation ultra-pure argon from monocrystalline silicon, polycrystalline silicon stove unloading tail gas, include the following step: the method comprises the following steps of taking the discharged tail gas of a monocrystalline silicon furnace and a polycrystalline silicon furnace as a raw material gas, firstly entering a preposed buffer tank, pressurizing by a compressor, entering a catalytic purification process to remove hydrogen, oxygen, carbon monoxide and methane, then entering a terminal purification process to remove oxygen, water and carbon dioxide in the gas, and finally entering a low-temperature reboiling liquefied argon system to separate non-condensable nitrogen and hydrogen from argon so as to obtain ultrapure argon;
the catalytic purification process comprises the following steps: the raw material gas enters a first heat exchanger for heat exchange, enters a first catalytic tower for catalytic removal of reducing gas including carbon monoxide, hydrogen and methane in tail gas, then enters a second catalytic tower for hydrogenation to remove oxygen, and then is subjected to water diversion through a cooler and a drainer in a second heat exchanger;
the terminal purification process comprises the following steps: the mixture enters a first adsorption drying tower for dehydration and carbon dioxide, and the first adsorption drying tower and a second adsorption drying tower are connected in parallel and alternately operate;
the working process of the low-temperature reboiling liquefied argon system is as follows: the gas enters the main heat exchanger to exchange heat with reheated liquid argon and non-condensable gas, the temperature of the gas expanded by the turbine expander is reduced, the gas is throttled and expanded and then enters the condenser, a gas-liquid mixture in the condenser enters the degassing tower, liquefied argon flows to the reboiled liquid argon tower kettle at the lower part under the action of gravity, the gas flows upwards through the condenser, the gaseous argon is liquefied and flows to the reboiled liquid argon tower kettle at the lower part, and the non-condensable gas is discharged from a waste discharge port through the condenser, the top of the degassing tower and the main heat exchanger.
Furthermore, the number of the catalytic tower and the number of the adsorption drying tower are at least two.
Furthermore, a noble metal catalyst and a transition metal catalyst are filled in the catalytic tower.
Furthermore, the reboiled liquid argon tower kettle is provided with a secondary heat exchanger, partial gas entering the first adsorption drying tower or the second adsorption drying tower enters the secondary heat exchanger through control, part of the liquid argon is vaporized and meets with descending liquid argon in a degassing tower, and non-condensable gas dissolved in the liquid argon is stripped out, so that the purity of the purified liquid argon is improved.
Further, the compressor increases the pressure to 0.5Mpa to 2.0 Mpa.
The device for preparing the ultra-pure argon by recovering the argon from the emptying tail gas of the monocrystalline silicon furnace and the polycrystalline silicon furnace in the photovoltaic industry comprises a preposed buffer tank, a compressor, a tail gas pretreatment system and a low-temperature reboiling liquefied argon system which are sequentially connected in series through a pipeline. The tail gas pretreatment system comprises a catalytic tower, a heat exchanger and a terminal adsorption drying tower;
a low-temperature reboiling liquefied argon system is provided with an ultra-pure argon outlet and is sent out of a boundary area;
a purified argon outlet is arranged on the terminal adsorption drying tower;
the catalytic tower is a reaction tower and a hydrogenation catalytic deoxygenation tower which are used for dehydrogenation, carbon monoxide removal, methane and other reducing gases;
the terminal deoxidation adsorption drying tower is a double tower which is connected in parallel and alternately conducts deoxidation, dehydration and carbon dioxide removal operation.
Further, be equipped with the compressor on the connecting pipeline between leading buffer tank and the gas purification system, to the gas pressure boost that is about to flow into purification system, the compressor be oil free compressor, more preferably piston oil free compressor.
Electric heating elements are arranged inside and on the outer wall surface of the catalytic tower and the terminal deoxidation adsorption drying tower, and the electric heating elements are one or more than two of electric heating wires, electric heating ribbons or electric heating pipes.
Further, the catalyst packed in the catalytic tower uses a noble metal catalyst and a transition metal catalyst. The noble metal catalyst, preferably a platinum group catalyst; transition metal catalysts generally use catalysts containing one or more metals such as manganese, copper, nickel, zinc, iron, etc. as active components; the catalyst can be prepared by using a conventional catalyst preparation method, for example, by loading the active component on the carrier by impregnation, spraying or the like, and calcining. Preferably, a noble metal catalyst of type ZDC-1 (active component is palladium, carrier is metal oxide, active component accounts for 0.05% -0.5% of carrier weight) from Dalian Zhongding chemical company is used. The regeneration of the catalyst adopts the introduction of dry air to carry out oxidation reduction on the catalyst.
The method for recovering and preparing the ultrapure argon by adopting the device comprises the following specific steps: the method comprises the following steps of taking emptying tail gas of a monocrystalline silicon furnace and a polycrystalline silicon furnace as raw material gas, firstly entering a preposed buffer tank, entering a catalytic purification process after being pressurized by a compressor, removing hydrogen, oxygen and carbon monoxide, entering the raw material gas into a heat exchanger, reacting in a catalytic tower, then entering a terminal purification process after passing through a cooler and a drainer, removing oxygen, water and carbon dioxide in the gas, finally entering a low-temperature reboiling liquefied argon system, and separating non-condensable nitrogen and hydrogen from argon to obtain ultrapure argon.
Further, the pressurization of the oil-free compressor means that the normal pressure argon is pressurized to 0.6-2.0Mpa so as to provide the pressure for subsequent purification.
Further, the length-diameter ratio of the catalytic tower is 3-8: 1, and the reaction temperature is controlled within the range of 200-300 ℃. The catalyst (ZDC-1) is internally filled with a Dalian Zhongding patent catalyst and is provided with at least 2 catalytic towers, one catalytic tower is used for catalytically removing carbon monoxide, methane and other reducing gases in tail gas; the other is a hydrogenation catalytic deoxygenation tower, the oxygen which is not reacted in the first catalytic deoxygenation tower is combined with the added hydrogen in the hydrogenation catalytic deoxygenation tower to generate water, so that the oxygen is removed, and the excessive trace hydrogen is added to be separated out from the liquid argon as non-condensable gas in a subsequent low-temperature reboiling liquefied argon system.
Further, the utility model discloses the mode of the ultrapure argon of terminal adsorption drying tower preparation does: and water and carbon dioxide generated in the catalysis process are subjected to water cooling and water diversion, and then enter a terminal adsorption drying tower for adsorption dehydration and carbon dioxide. The length-diameter ratio of the adsorption drying tower is as follows: 2-10:1, the special adsorption drying agent (ZDM-2) for the big-link middle-tripod is arranged in the adsorption drying agent, and at least 2 adsorption towers are arranged for alternative operation; the regeneration of the adsorption drying agent adopts electric heating, and the regeneration temperature is 200-350 ℃.
Further, through the steps, only two impurities of nitrogen and hydrogen exist in argon gas, in a low-temperature reboiling liquefied argon gas system, the gas enters a main heat exchanger to exchange heat with reheated liquid argon and non-condensable gas, the gas is connected with a turbine expander, the temperature of the expanded gas is reduced, the gas enters a condenser of a low-temperature reboiling degassing tower kettle after throttling expansion (the low-temperature reboiling degassing tower kettle consists of a low-temperature reboiling tower kettle, a degassing tower and a condenser), a gas-liquid mixture in the condenser enters the degassing tower from the middle part of the degassing tower, the liquefied argon gas flows to the low-temperature liquid argon tower kettle at the lower part under the action of gravity, the gas flows upwards through the condenser, the gaseous argon gas is liquefied and flows to the low-temperature liquid argon tower kettle at the lower part, and the non-condensable gas is discharged from the top of the degassing tower through the condenser.
And a secondary heat exchanger is further arranged in the low-temperature liquid argon tower kettle, part of gas entering the main heat exchanger enters the secondary heat exchanger in the low-temperature liquid argon tower kettle after being controlled, part of liquid argon is vaporized and meets with descending liquid argon in a degassing tower, non-condensable gas dissolved in the liquid argon is stripped out, and the purity of the liquid argon is further purified.
The utility model has the following conception: the utility model discloses designed leading buffer tank on the pipeline, the pressure fluctuation that the process brought around can buffering makes equipment ability more steady operation. The gas after passing through the buffer tank enters a piston type oil-free compressor for pressurization, so that the gas pressure is increased to 0.5-2.0 Mpa, the power required by the process gas is maintained, and the subsequent processes can better run. The pressurized gas enters a catalytic purification process to remove a large amount of reductive gas stripping such as oxygen, hydrogen, carbon monoxide and methane in argon, and the reaction is as follows:
1/2O2+H2→H2O
1/2O2+CO→CO2
2O2+CH4→2H2O+CO2
because the oxygen content in the raw material gas is high, the oxygen is not enough to completely react in the oxidation reaction, so that the hydrogen is required to react with the oxygen to generate water to be removed, and the reaction is as follows:
O2+H2→H2O+H2(excess hydrogen)
And a large amount of heat is released during the reaction, and the outlet argon is cooled to the temperature close to the normal temperature by water and then is sent to a terminal adsorption drying tower through water diversion, so that impurities such as residual water, carbon dioxide and the like in the gas are deeply removed, and the removal depth is 1 ppm.
After the above process, only two impurities of nitrogen and hydrogen are contained in argon, in the low-temperature reboiling liquefied argon system, the gas enters a main heat exchanger to exchange heat with reheated liquid argon and non-condensable gas, and is connected with a turbine expander, the temperature of the expanded gas is reduced, the gas enters a condenser of a low-temperature reboiling degassing tower kettle after throttling expansion (the low-temperature reboiling degassing tower kettle consists of a low-temperature reboiling tower kettle, a degassing tower and a condenser), a gas-liquid mixture in the condenser enters the degassing tower from the middle part of the degassing tower, the liquefied argon flows to the low-temperature liquid argon tower kettle at the lower part under the action of gravity, the gas flows through the condenser upwards, the gaseous argon is liquefied at the place and flows to the low-temperature liquid argon tower kettle at the lower part, and the non-condensable gas is discharged from the top of the degassing tower through the condenser.
And a heat exchanger is further arranged in the low-temperature liquid argon tower kettle, part of gas entering the main heat exchanger enters the heat exchanger in the low-temperature liquid argon tower kettle after being controlled, part of liquid argon is vaporized and meets with descending liquid argon in a degassing tower, non-condensable gas dissolved in the liquid argon is stripped out, the purity of the liquid argon is further purified, and the ultra-pure argon is obtained.
And the ultrapure argon is merged into an argon pipeline at the front end of the monocrystalline silicon furnace and the polycrystalline silicon furnace after passing through the pressure regulating valve for recycling.
The concentration of inert gases such as argon existing in the atmosphere is very low, considerable energy and cost are needed for extraction and purification, the burden is heavy for general enterprises, and the development of energy conservation and emission reduction technology is accelerated by the national requirements on energy consumption of the enterprises and domestic large energy conservation and emission reduction environment.
At present, tail gas discharged in monocrystalline silicon and polycrystalline silicon furnace production in photovoltaic industry contains a large amount of argon with high concentration, but the tail gas can only be discharged into the atmosphere due to no recycling device, so that a large amount of waste is caused.
The utility model has the advantages as follows: the utility model provides a method of tail gas recycling of recovery not only saves product cost, has reduced the energy consumption, and this method can make the product argon gas purity that obtains reach 99.9999-99.999999 percent, the recovery rate can reach 95 percent, and the oxygen, water, carbon monoxide, carbon dioxide, nitrogen, methane and the like in the residual impurities can be respectively reduced to 0.1 × 10-6And the utility model discloses can require nimble the regulation according to the purity of product. The method is particularly suitable for recovering argon from the industrial furnace emptying waste gas taking argon as protective gas, and has very good economic benefit and environmental protection benefit.
Drawings
FIG. 1 is a schematic view of the apparatus of the present invention;
the system comprises a front buffer tank 1, a front buffer tank 2, a compressor 3, a first catalytic tower 4, a first heat exchanger 5, a second catalytic tower 6, a second heat exchanger 7, a first adsorption drying tower 8, a second adsorption drying tower 9, a tail gas inlet 10, a regeneration air inlet 11, a product gas outlet 12, a waste gas discharge outlet 13, a main heat exchanger 14, a turboexpander 15, a liquid ammonia storage kettle 16, a reboiling degassing tower 17, a condenser 18, a top 19 and a secondary heat exchanger.
Detailed Description
The present invention will be described in detail with reference to the following embodiments, but the scope of the invention is not limited thereto.
Example 1
As shown in fig. 1, a device for recovering and preparing ultra-pure argon comprises a front buffer tank 1, a compressor 2, a tail gas pretreatment system and a low-temperature reboiling liquefied argon system which are connected in series through a pipeline in turn; the tail gas pretreatment system comprises a catalytic tower, a heat exchanger and an adsorption drying tower; the catalytic tower comprises a first catalytic tower 3 and a second catalytic tower 5, the first catalytic tower 3 is connected with a first heat exchanger 4, and the second catalytic tower 5 is connected with a second heat exchanger 6; the second heat exchanger 6 is connected with a first adsorption drying tower 7 and a second adsorption drying tower 8, and the outlets of the first adsorption drying tower 7 and the second adsorption drying tower 8 are connected with a main heat exchanger 13 and a secondary heat exchanger 19; the low-temperature reboiling liquefied argon system comprises a main heat exchanger 13, a turbo expander 14, a condensing tower 17, a reboiling degassing tower 16 and a liquid ammonia storage kettle 15 which are connected in sequence, wherein a secondary heat exchanger 19 is arranged inside the liquid ammonia storage kettle 15; the first adsorption drying tower 7 and the second adsorption drying tower 8 are connected with a secondary heat exchanger 19 through a pipeline A, and the outlet of the secondary heat exchanger 19 is connected with a condensing tower 17; the liquid ammonia storage kettle 15 is connected with a product gas outlet 11 through a main heat exchanger 13; the first adsorption drying tower 7 and the second adsorption drying tower 8 are connected with a main heat exchanger 13 through a pipeline B, and the top 18 of the reboiled degasser 16 is connected with a waste gas discharge port 12 through the main heat exchanger 13. The compressor 2 is an oil-free compressor. And electric heating elements are arranged inside and on the outer wall of the first catalytic tower 3, the second catalytic tower 5, the first adsorption drying tower 7 and the second adsorption drying tower 8. The length-diameter ratio of the first catalytic tower 3 to the second catalytic tower 5 is 3-8: 1.
A method for recovering and preparing ultra-pure argon from the vented tail gas of a monocrystalline silicon furnace and a polycrystalline silicon furnace comprises the following steps: the method comprises the following steps of taking the discharged tail gas of a monocrystalline silicon furnace and a polycrystalline silicon furnace as a raw material gas, firstly entering a preposed buffer tank 1, pressurizing by a compressor 2, entering a catalytic purification process to remove hydrogen, oxygen, carbon monoxide and methane, then entering a terminal purification process to remove oxygen, water and carbon dioxide in the gas, and finally entering a low-temperature reboiling liquefied argon system to separate non-condensable nitrogen and hydrogen from argon so as to obtain ultrapure argon; the catalytic purification process comprises the following steps: the raw material gas enters a first heat exchanger 4 for heat exchange, enters a first catalytic tower 3 for catalytic removal of reducing gas including carbon monoxide, hydrogen and methane in tail gas, then enters a second catalytic tower 5 for hydrogenation to remove oxygen, and then is subjected to water diversion through a cooler and a drainer in a second heat exchanger 6; the terminal purification process comprises the following steps: the wastewater enters a first adsorption drying tower 7 for dehydration and carbon dioxide, and the first adsorption drying tower 7 and a second adsorption drying tower 8 are connected in parallel and alternately operate; the working process of the low-temperature reboiling liquefied argon system is as follows: the gas enters the main heat exchanger 13 to exchange heat with reheated liquid argon and non-condensable gas, the temperature of the gas expanded by the turbine expander 14 is reduced, the gas enters the condenser 17 after throttling expansion, a gas-liquid mixture in the condenser 17 enters the degassing tower 16, liquefied argon flows to the reboiled liquid argon tower kettle 15 at the lower part under the action of gravity, the gas flows upwards through the condenser 17, the gaseous argon is liquefied and flows to the reboiled liquid argon tower kettle 15 at the lower part, and the non-condensable gas is discharged from the waste discharge port 12 through the condenser 17, the top 18 of the degassing tower 16 and the main heat exchanger 13. The number of the catalytic tower and the number of the adsorption drying tower are at least two. The catalyst tower is filled with a noble metal catalyst and a transition metal catalyst. The reboiled liquid argon tower kettle 15 is provided with a secondary heat exchanger 19, part of gas entering the first adsorption drying tower 7 or the second adsorption drying tower 8 enters the secondary heat exchanger 19 through control, part of liquid argon is vaporized and meets with descending liquid argon in a degassing tower, non-condensable gas dissolved in the liquid argon is stripped out, and the purity of purified liquid argon is improved. The compressor 2 increases the pressure to 0.5Mpa-2.0 Mpa.
Example 2
A device for preparing ultra-pure argon by recovering argon from the emptying tail gas of monocrystalline silicon and polycrystalline silicon furnaces in the photovoltaic industry,
(1) monocrystalline silicon and polycrystalline silicon furnace tail gas
Tail gas flow of monocrystalline silicon and polycrystalline silicon furnaces: 15m3Temperature/h: pressure at 25 ℃: atmospheric pressure
The main components are as follows: ar 99.2%, O2≤1500ppm，H2≤200ppm，CO≤200ppm，H2O≤100ppm， N2≤6000ppm。
(2) Catalyst and process for preparing same
ZDC-1 type noble metal catalyst (the active component is palladium, the carrier is metal oxide, the active component accounts for 0.05% -0.5% of the carrier weight)
Noble metal catalyst use space velocity: 2000h-1
The total loading of the noble catalyst is as follows: 0.25m3
The height-diameter ratio of the catalytic deoxidizing tower is as follows: 5
(3) Process flow
Emptying tail gas (500 Nm) of monocrystalline silicon and polycrystalline silicon furnaces3H) as raw material gas firstly enters a preposed buffer tank 1. The gas after passing through the buffer tank enters a piston type oil-free compressor for pressurization, so that the gas pressure is increased to 0.8Mpa, the power required by the process gas is maintained, and the subsequent processes can better run. The pressurized gas enters a catalytic purification process to remove a large amount of oxygen, hydrogen and carbon monoxide in the argon, and raw materialsThe gas firstly enters a heat exchanger, the temperature of the gas is adjusted, the gas reacts with a catalyst in a catalytic tower, and then the gas enters a terminal purification process after passing through a cooler and a drainer to remove oxygen, water and carbon dioxide in the gas. And finally, entering a low-temperature reboiling degassing liquefaction process, cooling the gas to-190 ℃ to liquefy the argon, and adjusting the reflux ratio of a low-temperature liquid argon tower kettle heat exchanger to ensure that the content of nitrogen in the argon is less than 0.5ppm, so that the ultrapure argon is obtained, and the recovery rate can reach 95%. And the ultra-pure argon is merged into the front end argon pipeline of the monocrystalline silicon furnace and the polycrystalline silicon furnace through the pressure regulating valve for recycling.
The above, only for the utility model discloses create the concrete implementation way of preferred, nevertheless the utility model discloses the protection scope of creation is not limited to this, and any person skilled in this technical field is in the utility model discloses create the technical scope of disclosure, according to the utility model discloses the technical scheme of creation and utility model design equivalence replacement or change all should be covered in the protection scope of creation of the utility model.
Claims (4)
1. The device for recycling and preparing the ultra-pure argon is characterized by comprising a preposed buffer tank (1), a compressor (2), a tail gas pretreatment system and a low-temperature reboiling liquefied argon system which are sequentially connected in series through a pipeline;
the tail gas pretreatment system comprises a catalytic tower, a heat exchanger and an adsorption drying tower; the catalytic tower comprises a first catalytic tower (3) and a second catalytic tower (5), wherein the first catalytic tower (3) is connected with a first heat exchanger (4), and the second catalytic tower (5) is connected with a second heat exchanger (6); the second heat exchanger (6) is connected with the first adsorption drying tower (7) and the second adsorption drying tower (8), and outlets of the first adsorption drying tower (7) and the second adsorption drying tower (8) are connected with the main heat exchanger (13) and the secondary heat exchanger (19);
the low-temperature reboiling liquefied argon system comprises a main heat exchanger (13), a turboexpander (14), a condensing tower (17), a reboiling degassing tower (16) and a liquid ammonia storage kettle (15) which are sequentially connected, wherein a secondary heat exchanger (19) is arranged in the liquid ammonia storage kettle (15); the first adsorption drying tower (7) and the second adsorption drying tower (8) are connected with a secondary heat exchanger (19) through a pipeline A, and the outlet of the secondary heat exchanger (19) is connected with a condensing tower (17);
the liquid ammonia storage kettle (15) is connected with a product gas outlet (11) through a main heat exchanger (13);
the first adsorption drying tower (7) and the second adsorption drying tower (8) are connected with a main heat exchanger (13) through a pipeline B, and the top (18) of the reboiling degassing tower (16) is connected with a waste gas discharge port (12) through the main heat exchanger (13).
2. The apparatus according to claim 1, characterized in that said compressor (2) is an oil-free compressor.
3. The apparatus according to claim 1, characterized in that the inner and outer walls of the first catalytic tower (3), the second catalytic tower (5), the first adsorption drying tower (7) and the second adsorption drying tower (8) are provided with electric heating elements.
4. The device according to claim 1, wherein the length-diameter ratio of the first catalytic tower (3) to the second catalytic tower (5) is 3-8: 1.
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| CN113120873A (en) * | 2019-12-31 | 2021-07-16 | 大连中鼎化学有限公司 | Device and method for recycling and preparing ultra-pure argon from vented tail gas of monocrystalline silicon and polycrystalline silicon furnaces |
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| CN113120873A (en) * | 2019-12-31 | 2021-07-16 | 大连中鼎化学有限公司 | Device and method for recycling and preparing ultra-pure argon from vented tail gas of monocrystalline silicon and polycrystalline silicon furnaces |
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Denomination of utility model: A device for recovering and preparing ultra pure argon Effective date of registration: 20211221 Granted publication date: 20201009 Pledgee: Guangfa Bank Co.,Ltd. Dalian Branch Pledgor: DALIAN ZHONGDING CHEMICAL Co.,Ltd. Registration number: Y2021210000097 |
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Date of cancellation: 20230530 Granted publication date: 20201009 Pledgee: Guangfa Bank Co.,Ltd. Dalian Branch Pledgor: DALIAN ZHONGDING CHEMICAL Co.,Ltd. Registration number: Y2021210000097 |