CN113120873A - Device and method for recycling and preparing ultra-pure argon from vented tail gas of monocrystalline silicon and polycrystalline silicon furnaces - Google Patents
Device and method for recycling and preparing ultra-pure argon from vented tail gas of monocrystalline silicon and polycrystalline silicon furnaces Download PDFInfo
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Abstract
The invention relates to a device and a method for recovering and preparing ultra-pure argon from vented tail gas of a monocrystalline silicon furnace and a polycrystalline silicon furnace, belonging to the field of gas production and application. The main technical scheme is as follows: a device for recovering and preparing ultra-pure argon from the vented tail gas of a monocrystalline silicon furnace and a polycrystalline silicon furnace comprises a preposed buffer tank, a compressor, a tail gas pretreatment system and a low-temperature reboiling liquefied argon system which are connected in series sequentially through pipelines; the tail gas pretreatment system comprises a catalytic tower, a heat exchanger and an adsorption drying tower; the catalytic tower comprises a first catalytic tower and a second catalytic tower, the first catalytic tower is connected with the first heat exchanger, and the second catalytic tower is connected with the second heat exchanger; the invention can be flexibly adjusted according to the purity requirement of the product. The method is particularly suitable for recovering argon from the industrial furnace emptying waste gas taking argon as protective gas, and has very good economic benefit and environmental protection benefit.
Description
Technical Field
The invention belongs to the field of gas production and application, and particularly relates to a device and a method for recycling and preparing ultra-pure argon from vented tail gas of a monocrystalline silicon furnace and a polycrystalline silicon furnace.
Background
The argon gas has the characteristic of inertia, so that the argon gas can protect substances which are easy to react with surrounding substances, and compared with other inert gases, the argon gas has the advantages of relatively simple acquisition mode, low cost and more economic benefit. The volume ratio of argon in the ultra-pure argon is more than 99.9999%, and the contents of oxygen, carbon monoxide and carbon dioxide are all less than 1 x 10-6. The ultra-pure argon is an important variety in industrial gas and is widely applied to various fields such as chemical industry, petrifaction, petroleum, energy, electronics, metallurgy, food, machinery, aerospace, nuclear industry and the like.
In recent years, silicon wafers have been increasingly used to fabricate photovoltaic cells and large scale integrated circuits. Modules of photovoltaic cells can be connected together to form a photovoltaic array, so-called solar panels, which can generate electricity by converting solar energy into electrical energy. In the prior art, a vacuum furnace is adopted to crystallize and recrystallize silicon ingots and silicon wafers under the protection of inert atmosphere to form required photovoltaic manufacturing raw materials. In this type of vacuum furnace production process, 100000 liters of argon gas are typically required, the process lasts 40 hours or more, and one silicon ingot is produced. The purity of the inert gas used in such vacuum furnaces is important, and the argon purity of the inert atmosphere created using argon is to reach 6n, i.e., 99.9999% to about 1ppm total contaminants, to avoid reaction (oxidation) and damage of the silicon ingot and wafer in the furnace. As the demand for photovoltaic devices has increased dramatically, simplifying the manufacturing process, increasing the purity of argon, and reducing manufacturing and processing costs are currently major challenges.
Disclosure of Invention
In order to make up the defects of the prior art, the invention provides a device and a method for recovering and preparing ultra-pure argon from the vented tail gas of a monocrystalline silicon furnace and a polycrystalline silicon furnace.
The invention adopts the following technical scheme: a device for recovering and preparing ultra-pure argon from the vented tail gas of a monocrystalline silicon furnace and a polycrystalline silicon furnace comprises a preposed buffer tank, a compressor, a tail gas pretreatment system and a low-temperature reboiling liquefied argon system which are connected in series sequentially through pipelines;
the tail gas pretreatment system comprises a catalytic tower, a heat exchanger and an adsorption drying tower; the catalytic tower comprises a first catalytic tower and a second catalytic tower, the first catalytic tower is connected with the first heat exchanger, and the second catalytic tower is connected with the second heat exchanger; the second heat exchanger is connected with the first adsorption drying tower and the second adsorption drying tower, and outlets of the first adsorption drying tower and the second adsorption drying tower are connected with the main heat exchanger and the secondary heat exchanger;
the low-temperature reboiling liquefied argon system comprises a main heat exchanger, a turbine expander, a condensing tower, a reboiling degassing tower and a liquid ammonia storage kettle which are sequentially connected, wherein a secondary heat exchanger is arranged in the liquid ammonia storage kettle; the first adsorption drying tower and the second adsorption drying tower are connected with a secondary heat exchanger through a pipeline A, and an outlet of the secondary heat exchanger is connected with a condensing tower;
the liquid ammonia storage kettle is connected with a product gas outlet through a main heat exchanger;
the first adsorption drying tower and the second adsorption drying tower are connected with a main heat exchanger through a pipeline B, and the top of the reboiling degassing tower is connected with a waste gas discharge port through the main heat exchanger.
Further, the compressor is an oil-free compressor.
Furthermore, the inner part and the outer wall of the first catalytic tower, the second catalytic tower, the first adsorption drying tower and the second adsorption drying tower are respectively provided with an electric heating element.
Further, the length-diameter ratio of the first catalytic tower to the second catalytic tower is 3-8: 1.
The invention simultaneously requests to protect a method for recovering and preparing the ultra-pure argon from the vented tail gas of the monocrystalline silicon furnace and the polycrystalline silicon furnace, which comprises the following steps: the method comprises the following steps of taking the discharged tail gas of a monocrystalline silicon furnace and a polycrystalline silicon furnace as a raw material gas, firstly entering a preposed buffer tank, pressurizing by a compressor, entering a catalytic purification process to remove hydrogen, oxygen, carbon monoxide and methane, then entering a terminal purification process to remove oxygen, water and carbon dioxide in the gas, and finally entering a low-temperature reboiling liquefied argon system to separate non-condensable nitrogen and hydrogen from argon so as to obtain ultrapure argon;
the catalytic purification process comprises the following steps: the raw material gas enters a first heat exchanger for heat exchange, enters a first catalytic tower for catalytic removal of reducing gas including carbon monoxide, hydrogen and methane in tail gas, then enters a second catalytic tower for hydrogenation to remove oxygen, and then is subjected to water diversion through a cooler and a drainer in a second heat exchanger;
the terminal purification process comprises the following steps: the mixture enters a first adsorption drying tower for dehydration and carbon dioxide, and the first adsorption drying tower and a second adsorption drying tower are connected in parallel and alternately operate;
the working process of the low-temperature reboiling liquefied argon system is as follows: the gas enters the main heat exchanger to exchange heat with reheated liquid argon and non-condensable gas, the temperature of the gas expanded by the turbine expander is reduced, the gas is throttled and expanded and then enters the condenser, a gas-liquid mixture in the condenser enters the degassing tower, liquefied argon flows to the reboiled liquid argon tower kettle at the lower part under the action of gravity, the gas flows upwards through the condenser, the gaseous argon is liquefied and flows to the reboiled liquid argon tower kettle at the lower part, and the non-condensable gas is discharged from a waste discharge port through the condenser, the top of the degassing tower and the main heat exchanger.
Furthermore, the number of the catalytic tower and the number of the adsorption drying tower are at least two.
Furthermore, a noble metal catalyst and a transition metal catalyst are filled in the catalytic tower.
Furthermore, the reboiled liquid argon tower kettle is provided with a secondary heat exchanger, partial gas entering the first adsorption drying tower or the second adsorption drying tower enters the secondary heat exchanger through control, part of the liquid argon is vaporized and meets with descending liquid argon in a degassing tower, and non-condensable gas dissolved in the liquid argon is stripped out, so that the purity of the purified liquid argon is improved.
Further, the compressor increases the pressure to 0.5Mpa to 2.0 Mpa.
The device for preparing the ultra-pure argon by recovering the argon from the emptying tail gas of the monocrystalline silicon furnace and the polycrystalline silicon furnace in the photovoltaic industry comprises a preposed buffer tank, a compressor, a tail gas pretreatment system and a low-temperature reboiling liquefied argon system which are sequentially connected in series through a pipeline. The tail gas pretreatment system comprises a catalytic tower, a heat exchanger and a terminal adsorption drying tower;
a low-temperature reboiling liquefied argon system is provided with an ultra-pure argon outlet and is sent out of a boundary area;
a purified argon outlet is arranged on the terminal adsorption drying tower;
the catalytic tower is a reaction tower and a hydrogenation catalytic deoxygenation tower which are used for dehydrogenation, carbon monoxide removal, methane and other reducing gases;
the terminal deoxidation adsorption drying tower is a double tower which is connected in parallel and alternately conducts deoxidation, dehydration and carbon dioxide removal operation.
Further, be equipped with the compressor on the connecting pipeline between leading buffer tank and the gas purification system, to the gas pressure boost that is about to flow into purification system, the compressor be oil free compressor, more preferably piston oil free compressor.
Electric heating elements are arranged inside and on the outer wall surface of the catalytic tower and the terminal deoxidation adsorption drying tower, and the electric heating elements are one or more than two of electric heating wires, electric heating ribbons or electric heating pipes.
Further, the catalyst packed in the catalytic tower uses a noble metal catalyst and a transition metal catalyst. The noble metal catalyst, preferably a platinum group catalyst; transition metal catalysts generally use catalysts containing one or more metals such as manganese, copper, nickel, zinc, iron, etc. as active components; the catalyst can be prepared by using a conventional catalyst preparation method, for example, by loading the active component on the carrier by impregnation, spraying or the like, and calcining. Preferably, a noble metal catalyst of type ZDC-1 (active component is palladium, carrier is metal oxide, active component accounts for 0.05% -0.5% of carrier weight) from Dalian Zhongding chemical company is used. The regeneration of the catalyst adopts the introduction of dry air to carry out oxidation reduction on the catalyst.
The invention adopts the method for recovering and preparing the ultrapure argon by the device, which comprises the following steps: the method comprises the following steps of taking emptying tail gas of a monocrystalline silicon furnace and a polycrystalline silicon furnace as raw material gas, firstly entering a preposed buffer tank, entering a catalytic purification process after being pressurized by a compressor, removing hydrogen, oxygen and carbon monoxide, entering the raw material gas into a heat exchanger, reacting in a catalytic tower, then entering a terminal purification process after passing through a cooler and a drainer, removing oxygen, water and carbon dioxide in the gas, finally entering a low-temperature reboiling liquefied argon system, and separating non-condensable nitrogen and hydrogen from argon to obtain ultrapure argon.
Further, the pressurization of the oil-free compressor means that the normal pressure argon is pressurized to 0.6-2.0Mpa so as to provide the pressure for subsequent purification.
Further, the length-diameter ratio of the catalytic tower is 3-8: 1, and the reaction temperature is controlled within the range of 200-300 ℃. The catalyst (ZDC-1) is internally filled with a Dalian Zhongding patent catalyst and is provided with at least 2 catalytic towers, one catalytic tower is used for catalytically removing carbon monoxide, methane and other reducing gases in tail gas; the other is a hydrogenation catalytic deoxygenation tower, the oxygen which is not reacted in the first catalytic deoxygenation tower is combined with the added hydrogen in the hydrogenation catalytic deoxygenation tower to generate water, so that the oxygen is removed, and the excessive trace hydrogen is added to be separated out from the liquid argon as non-condensable gas in a subsequent low-temperature reboiling liquefied argon system.
Further, the mode for preparing the ultrapure argon by the terminal adsorption drying tower of the invention is as follows: and water and carbon dioxide generated in the catalysis process are subjected to water cooling and water diversion, and then enter a terminal adsorption drying tower for adsorption dehydration and carbon dioxide. The length-diameter ratio of the adsorption drying tower is as follows: 2-10:1, the special adsorption drying agent (ZDM-2) for the big-link middle-tripod is arranged in the adsorption drying agent, and at least 2 adsorption towers are arranged for alternative operation; the regeneration of the adsorption drying agent adopts electric heating, and the regeneration temperature is 200-350 ℃.
Further, through the steps, only two impurities of nitrogen and hydrogen exist in argon gas, in a low-temperature reboiling liquefied argon gas system, the gas enters a main heat exchanger to exchange heat with reheated liquid argon and non-condensable gas, the gas is connected with a turbine expander, the temperature of the expanded gas is reduced, the gas enters a condenser of a low-temperature reboiling degassing tower kettle after throttling expansion (the low-temperature reboiling degassing tower kettle consists of a low-temperature reboiling tower kettle, a degassing tower and a condenser), a gas-liquid mixture in the condenser enters the degassing tower from the middle part of the degassing tower, the liquefied argon gas flows to the low-temperature liquid argon tower kettle at the lower part under the action of gravity, the gas flows upwards through the condenser, the gaseous argon gas is liquefied and flows to the low-temperature liquid argon tower kettle at the lower part, and the non-condensable gas is discharged from the top of the degassing tower through the condenser.
And a secondary heat exchanger is further arranged in the low-temperature liquid argon tower kettle, part of gas entering the main heat exchanger enters the secondary heat exchanger in the low-temperature liquid argon tower kettle after being controlled, part of liquid argon is vaporized and meets with descending liquid argon in a degassing tower, non-condensable gas dissolved in the liquid argon is stripped out, and the purity of the liquid argon is further purified.
The invention conception is as follows: the invention designs the preposed buffer tank on the pipeline, which can buffer the pressure fluctuation caused by the front and the back working procedures and ensure that the equipment can run more stably. The gas after passing through the buffer tank enters a piston type oil-free compressor for pressurization, so that the gas pressure is increased to 0.5-2.0 Mpa, the power required by the process gas is maintained, and the subsequent processes can better run. The pressurized gas enters a catalytic purification process to remove a large amount of reductive gas stripping such as oxygen, hydrogen, carbon monoxide and methane in argon, and the reaction is as follows:
1/2O2+H2→H2O
1/2O2+CO→CO2
2O2+CH4→2H2O+CO2
because the oxygen content in the raw material gas is high, the oxygen is not enough to completely react in the oxidation reaction, so that the hydrogen is required to react with the oxygen to generate water to be removed, and the reaction is as follows:
O2+H2→H2O+H2(excess hydrogen)
And a large amount of heat is released during the reaction, and the outlet argon is cooled to the temperature close to the normal temperature by water and then is sent to a terminal adsorption drying tower through water diversion, so that impurities such as residual water, carbon dioxide and the like in the gas are deeply removed, and the removal depth is 1 ppm.
After the above process, only two impurities of nitrogen and hydrogen are contained in argon, in the low-temperature reboiling liquefied argon system, the gas enters a main heat exchanger to exchange heat with reheated liquid argon and non-condensable gas, and is connected with a turbine expander, the temperature of the expanded gas is reduced, the gas enters a condenser of a low-temperature reboiling degassing tower kettle after throttling expansion (the low-temperature reboiling degassing tower kettle consists of a low-temperature reboiling tower kettle, a degassing tower and a condenser), a gas-liquid mixture in the condenser enters the degassing tower from the middle part of the degassing tower, the liquefied argon flows to the low-temperature liquid argon tower kettle at the lower part under the action of gravity, the gas flows through the condenser upwards, the gaseous argon is liquefied at the place and flows to the low-temperature liquid argon tower kettle at the lower part, and the non-condensable gas is discharged from the top of the degassing tower through the condenser.
And a heat exchanger is further arranged in the low-temperature liquid argon tower kettle, part of gas entering the main heat exchanger enters the heat exchanger in the low-temperature liquid argon tower kettle after being controlled, part of liquid argon is vaporized and meets with descending liquid argon in a degassing tower, non-condensable gas dissolved in the liquid argon is stripped out, the purity of the liquid argon is further purified, and the ultra-pure argon is obtained.
And the ultrapure argon is merged into an argon pipeline at the front end of the monocrystalline silicon furnace and the polycrystalline silicon furnace after passing through the pressure regulating valve for recycling.
The concentration of inert gases such as argon existing in the atmosphere is very low, considerable energy and cost are needed for extraction and purification, the burden is heavy for general enterprises, and the development of energy conservation and emission reduction technology is accelerated by the national requirements on energy consumption of the enterprises and domestic large energy conservation and emission reduction environment.
At present, tail gas discharged in monocrystalline silicon and polycrystalline silicon furnace production in photovoltaic industry contains a large amount of argon with high concentration, but the tail gas can only be discharged into the atmosphere due to no recycling device, so that a large amount of waste is caused.
The invention has the following beneficial effects: the method for recycling the recovered tail gas not only saves the product cost and reduces the energy consumption, but also can ensure that the purity of the obtained product argon reaches 99.9999-99.999999 percent, and the recovery rate can reachUp to 95%, and the content of oxygen, water, carbon monoxide, carbon dioxide, nitrogen, methane, etc. in the residual impurities can be respectively reduced to 0.1 × 10-6The invention can be flexibly adjusted according to the purity requirement of the product. The method is particularly suitable for recovering argon from the industrial furnace emptying waste gas taking argon as protective gas, and has very good economic benefit and environmental protection benefit.
Drawings
FIG. 1 is a schematic view of the apparatus of the present invention;
the system comprises a front buffer tank 1, a front buffer tank 2, a compressor 3, a first catalytic tower 4, a first heat exchanger 5, a second catalytic tower 6, a second heat exchanger 7, a first adsorption drying tower 8, a second adsorption drying tower 9, a tail gas inlet 10, a regeneration air inlet 11, a product gas outlet 12, a waste gas discharge outlet 13, a main heat exchanger 14, a turboexpander 15, a liquid ammonia storage kettle 16, a reboiling degassing tower 17, a condenser 18, a top 19 and a secondary heat exchanger.
Detailed Description
The invention is described in more detail below with reference to specific examples, without limiting the scope of the invention.
Example 1
As shown in figure 1, the device for recovering and preparing the ultra-pure argon from the vent tail gas of the monocrystalline silicon furnace and the polycrystalline silicon furnace comprises a preposed buffer tank 1, a compressor 2, a tail gas pretreatment system and a low-temperature reboiling liquefied argon system which are connected in series through a pipeline; the tail gas pretreatment system comprises a catalytic tower, a heat exchanger and an adsorption drying tower; the catalytic tower comprises a first catalytic tower 3 and a second catalytic tower 5, the first catalytic tower 3 is connected with a first heat exchanger 4, and the second catalytic tower 5 is connected with a second heat exchanger 6; the second heat exchanger 6 is connected with a first adsorption drying tower 7 and a second adsorption drying tower 8, and the outlets of the first adsorption drying tower 7 and the second adsorption drying tower 8 are connected with a main heat exchanger 13 and a secondary heat exchanger 19; the low-temperature reboiling liquefied argon system comprises a main heat exchanger 13, a turbo expander 14, a condensing tower 17, a reboiling degassing tower 16 and a liquid ammonia storage kettle 15 which are connected in sequence, wherein a secondary heat exchanger 19 is arranged inside the liquid ammonia storage kettle 15; the first adsorption drying tower 7 and the second adsorption drying tower 8 are connected with a secondary heat exchanger 19 through a pipeline A, and the outlet of the secondary heat exchanger 19 is connected with a condensing tower 17; the liquid ammonia storage kettle 15 is connected with a product gas outlet 11 through a main heat exchanger 13; the first adsorption drying tower 7 and the second adsorption drying tower 8 are connected with a main heat exchanger 13 through a pipeline B, and the top 18 of the reboiled degasser 16 is connected with a waste gas discharge port 12 through the main heat exchanger 13. The compressor 2 is an oil-free compressor. And electric heating elements are arranged inside and on the outer wall of the first catalytic tower 3, the second catalytic tower 4, the first adsorption drying tower 7 and the second adsorption drying tower 8. The length-diameter ratio of the first catalytic tower 3 to the second catalytic tower 4 is 3-8: 1.
A method for recovering and preparing ultra-pure argon from the vented tail gas of a monocrystalline silicon furnace and a polycrystalline silicon furnace comprises the following steps: the method comprises the following steps of taking the discharged tail gas of a monocrystalline silicon furnace and a polycrystalline silicon furnace as a raw material gas, firstly entering a preposed buffer tank 1, pressurizing by a compressor 2, entering a catalytic purification process to remove hydrogen, oxygen, carbon monoxide and methane, then entering a terminal purification process to remove oxygen, water and carbon dioxide in the gas, and finally entering a low-temperature reboiling liquefied argon system to separate non-condensable nitrogen and hydrogen from argon so as to obtain ultrapure argon; the catalytic purification process comprises the following steps: the raw material gas enters a first heat exchanger 4 for heat exchange, enters a first catalytic tower 3 for catalytic removal of reducing gas including carbon monoxide, hydrogen and methane in tail gas, then enters a second catalytic tower 4 for hydrogenation to remove oxygen, and then is subjected to water diversion through a cooler and a drainer in a second heat exchanger 6; the terminal purification process comprises the following steps: the wastewater enters a first adsorption drying tower 7 for dehydration and carbon dioxide, and the first adsorption drying tower 7 and a second adsorption drying tower 8 are connected in parallel and alternately operate; the working process of the low-temperature reboiling liquefied argon system is as follows: the gas enters the main heat exchanger 13 to exchange heat with reheated liquid argon and non-condensable gas, the temperature of the gas expanded by the turbine expander 14 is reduced, the gas enters the condenser 17 after throttling expansion, a gas-liquid mixture in the condenser 17 enters the degassing tower 16, liquefied argon flows to the reboiled liquid argon tower kettle 15 at the lower part under the action of gravity, the gas flows upwards through the condenser 17, the gaseous argon is liquefied and flows to the reboiled liquid argon tower kettle 15 at the lower part, and the non-condensable gas is discharged from the waste discharge port 12 through the condenser 17, the top 18 of the degassing tower 16 and the main heat exchanger 13. The number of the catalytic tower and the number of the adsorption drying tower are at least two. The catalyst tower is filled with a noble metal catalyst and a transition metal catalyst. The reboiled liquid argon tower kettle 15 is provided with a secondary heat exchanger 19, part of gas entering the first adsorption drying tower 7 or the second adsorption drying tower 8 enters the secondary heat exchanger 19 through control, part of liquid argon is vaporized and meets with descending liquid argon in a degassing tower, non-condensable gas dissolved in the liquid argon is stripped out, and the purity of purified liquid argon is improved. The compressor 2 increases the pressure to 0.5Mpa-2.0 Mpa.
Example 2
A device for preparing ultra-pure argon by recovering argon from the emptying tail gas of monocrystalline silicon and polycrystalline silicon furnaces in the photovoltaic industry,
(1) monocrystalline silicon and polycrystalline silicon furnace tail gas
Tail gas flow of monocrystalline silicon and polycrystalline silicon furnaces: 15m3Temperature/h: pressure at 25 ℃: atmospheric pressure
The main components are as follows: ar 99.2%, O2≤1500ppm，H2≤200ppm，CO≤200ppm，H2O≤100ppm，N2≤6000ppm。
(2) Catalyst and process for preparing same
ZDC-1 type noble metal catalyst (the active component is palladium, the carrier is metal oxide, the active component accounts for 0.05% -0.5% of the carrier weight)
Noble metal catalyst use space velocity: 2000h-1
The total loading of the noble catalyst is as follows: 0.25m3
The height-diameter ratio of the catalytic deoxidizing tower is as follows: 5
(3) Process flow
Emptying tail gas (500 Nm) of monocrystalline silicon and polycrystalline silicon furnaces3H) as raw material gas firstly enters a preposed buffer tank 1. The gas after passing through the buffer tank enters a piston type oil-free compressor for pressurization, so that the gas pressure is increased to 0.8Mpa, the power required by the process gas is maintained, and the subsequent processes can better run. The pressurized gas enters a catalytic purification process to remove a large amount of oxygen, hydrogen and carbon monoxide in the argon, the raw material gas firstly enters a heat exchanger to adjust the gasThe temperature of the gas reacts with the catalyst in the catalytic tower, and then enters a terminal purification process after passing through a cooler and a drainer to remove oxygen, water and carbon dioxide in the gas. And finally, entering a low-temperature reboiling degassing liquefaction process, cooling the gas to-190 ℃ to liquefy the argon, and adjusting the reflux ratio of a low-temperature liquid argon tower kettle heat exchanger to ensure that the content of nitrogen in the argon is less than 0.5ppm, so that the ultrapure argon is obtained, and the recovery rate can reach 95%. And the ultra-pure argon is merged into the front end argon pipeline of the monocrystalline silicon furnace and the polycrystalline silicon furnace through the pressure regulating valve for recycling.
The above description is only for the purpose of creating a preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art can substitute or change the technical solution and the inventive concept of the present invention within the technical scope of the present invention.
Claims (9)
1. A device for recovering and preparing ultra-pure argon from the vented tail gas of a monocrystalline silicon furnace and a polycrystalline silicon furnace is characterized by comprising a preposed buffer tank (1), a compressor (2), a tail gas pretreatment system and a low-temperature reboiling liquefied argon system which are connected in series sequentially through pipelines;
the tail gas pretreatment system comprises a catalytic tower, a heat exchanger and an adsorption drying tower; the catalytic tower comprises a first catalytic tower (3) and a second catalytic tower (5), wherein the first catalytic tower (3) is connected with a first heat exchanger (4), and the second catalytic tower (5) is connected with a second heat exchanger (6); the second heat exchanger (6) is connected with the first adsorption drying tower (7) and the second adsorption drying tower (8), and outlets of the first adsorption drying tower (7) and the second adsorption drying tower (8) are connected with the main heat exchanger (13) and the secondary heat exchanger (19);
the low-temperature reboiling liquefied argon system comprises a main heat exchanger (13), a turboexpander (14), a condensing tower (17), a reboiling degassing tower (16) and a liquid ammonia storage kettle (15) which are sequentially connected, wherein a secondary heat exchanger (19) is arranged in the liquid ammonia storage kettle (15); the first adsorption drying tower (7) and the second adsorption drying tower (8) are connected with a secondary heat exchanger (19) through a pipeline A, and the outlet of the secondary heat exchanger (19) is connected with a condensing tower (17);
the liquid ammonia storage kettle (15) is connected with a product gas outlet (11) through a main heat exchanger (13);
the first adsorption drying tower (7) and the second adsorption drying tower (8) are connected with a main heat exchanger (13) through a pipeline B, and the top (18) of the reboiling degassing tower (16) is connected with a waste gas discharge port (12) through the main heat exchanger (13).
2. The apparatus according to claim 1, characterized in that said compressor (2) is an oil-free compressor.
3. The apparatus according to claim 1, characterized in that the inner and outer walls of the first catalytic tower (3), the second catalytic tower (4), the first adsorption drying tower (7) and the second adsorption drying tower (8) are provided with electric heating elements.
4. The device according to claim 1, wherein the length-diameter ratio of the first catalytic tower (3) to the second catalytic tower (4) is 3-8: 1.
5. A method for recovering and preparing ultra-pure argon from the vented tail gas of a monocrystalline silicon furnace and a polycrystalline silicon furnace is characterized by comprising the following steps: the method comprises the following steps of taking the discharged tail gas of a monocrystalline silicon furnace and a polycrystalline silicon furnace as a raw material gas, firstly entering a preposed buffer tank (1), pressurizing by a compressor (2), entering a catalytic purification process to remove hydrogen, oxygen, carbon monoxide and methane, then entering a terminal purification process to remove oxygen, water and carbon dioxide in the gas, and finally entering a low-temperature reboiling liquefied argon system to separate non-condensable nitrogen and hydrogen from argon so as to obtain ultra-pure argon;
the catalytic purification process comprises the following steps: the raw material gas enters a first heat exchanger (4) for heat exchange, enters a first catalytic tower (3) for catalytic removal of reducing gas including carbon monoxide, hydrogen and methane in tail gas, then enters a second catalytic tower (4) for hydrogenation to remove oxygen, and then is subjected to water diversion through a cooler and a drainer in a second heat exchanger (6);
the terminal purification process comprises the following steps: the wastewater enters a first adsorption drying tower (7) for dehydration and carbon dioxide, and the first adsorption drying tower (7) and a second adsorption drying tower (8) are connected in parallel and alternately operate;
the working process of the low-temperature reboiling liquefied argon system is as follows: the gas enters a main heat exchanger (13) to exchange heat with reheated liquid argon and non-condensable gas, the temperature of the gas expanded by a turbine expander (14) is reduced, the gas enters a condenser (17) after throttling expansion, a gas-liquid mixture in the condenser (17) enters a degassing tower (16), liquefied argon flows to a reboiled liquid argon tower kettle (15) at the lower part under the action of gravity, the gas flows upwards through the condenser (17), gaseous argon is liquefied and flows to the reboiled liquid argon tower kettle (15) at the lower part, and the non-condensable gas is discharged from a waste discharge port (12) through the condenser (17), the top (18) of the degassing tower (16) and the main heat exchanger (13).
6. The method of claim 5, wherein the number of the catalytic tower and the number of the adsorption drying tower are at least two.
7. The method of claim 5, wherein the catalytic column is packed with a noble metal catalyst and a transition metal catalyst.
8. The method according to claim 5, characterized in that the reboiled liquid argon column (15) is provided with a secondary heat exchanger (19), part of the gas entering the first adsorption drying column (7) or the second adsorption drying column (8) enters the secondary heat exchanger (19) through control, part of the liquid argon is vaporized and upwards meets with the descending liquid argon in a degassing column, and the non-condensable gas dissolved in the liquid argon is stripped out, so that the purity of the purified liquid argon is improved.
9. The method as claimed in claim 5, characterized in that the compressor (2) increases the pressure to 0.5Mpa-2.0 Mpa.
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