CN211506164U

CN211506164U - Novel coating equipment for producing photoetching film

Info

Publication number: CN211506164U
Application number: CN201921752770.6U
Authority: CN
Inventors: 高凡
Original assignee: Kunshan Bailihe Electronic Materials Co ltd
Current assignee: Kunshan Bailihe Electronic Materials Co ltd
Priority date: 2019-10-18
Filing date: 2019-10-18
Publication date: 2020-09-15
Anticipated expiration: 2029-10-18

Abstract

The utility model discloses a novel coating device for producing a photoetching film, which comprises a machine body and a pot body, a pot body is embedded in the middle of the upper side of the machine body, an interception device is arranged at the middle end in the pot body, the intercepting device comprises an embedding groove, a sleeve joint, a liquid collecting groove and a liquid absorbing sponge sleeve, wherein the middle part of the upper end of the liquid absorbing sponge sleeve is provided with the embedding groove, the intercepting device of the utility model comprises the embedding groove, the sleeve joint, the liquid collecting groove and the liquid absorbing sponge sleeve, the liquid absorbing sponge sleeve is sleeved on the placing tray through the embedding groove, the interface is fixedly connected with the clamping joint through the sleeve joint, when the glue is dripped manually, if the glue is dripped too much and seeps, the seeped photoresist flows into the liquid collecting tank, the photoresist is absorbed by the liquid absorption sponge sleeve, so that the photoresist cannot slide downwards to enter the machine body, and the leaked photoresist is collected and absorbed by the intercepting device, so that the photoresist cannot flow into the machine body to cause equipment damage.

Description

Novel coating equipment for producing photoetching film

Technical Field

The utility model belongs to the technical field of the photoetching membrane production is relevant, concretely relates to novel a coating equipment for photoetching membrane production.

Background

The photoresist is one of the key materials for fine pattern processing in the microelectronic technology, and particularly, the development of large-scale and ultra-large-scale integrated circuits in recent years greatly promotes the research, development and application of the photoresist. The printing industry is another important area of photoresist application. The polyvinyl alcohol cinnamate, which was first studied successfully by Minisc et al in 1954, is used in the printing industry and later in the electronics industry, in which a photoresist is uniformly applied to a PCB board to form a photoresist film, and the photoresist film is applied by a coating apparatus.

The prior art has the following problems: use coating equipment to paint the photoresist and form the photoetching membrane, through placing the PCB board at the bearing bench of coating equipment the manual work again and instil into the photoresist, make the photoresist evenly paint at PCB board formation photoresist through highly rotating, nevertheless if instil into the photoresist when too much, the photoresist can be through the viscidity along with the landing of bearing bench before rotating, gets into inside the organism through oozing the pot body, causes the inside organism of organism to damage.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide a novel a coating equipment for photoetching membrane production to propose in solving above-mentioned background art and scribbling the photoresist and form the photoetching membrane using coating equipment, through placing the PCB board at the bearing bench of coating equipment artifical instil into the photoresist again, make the photoresist evenly scribble at the PCB board formation photoresist through high rotation, nevertheless if instil into the photoresist when too much, the photoresist can be through the consistency along with the landing of bearing platform is downflow before rotating, inside the pot body gets into the organism through oozing, cause the inside organism problem of damaging of organism.

In order to achieve the above object, the utility model provides a following technical scheme:

a novel coating device for producing a photoetching film, which comprises a machine body and a pot body, wherein the pot body is embedded in the middle of the upper side of the machine body, the middle end in the pot body is provided with an interception device which comprises an embedding groove, a sleeve joint, a liquid collecting groove and a liquid absorbing sponge sleeve, the middle part of the upper end of the liquid absorbing sponge sleeve is provided with an embedding groove, the middle part of the bottom of the embedding groove is penetrated with a sleeve joint, the outer end of the embedding groove is positioned at the upper end of the liquid absorbing sponge sleeve and is provided with a liquid collecting groove, the edge of the inner end of the pot body is embedded with a pot cover, a fixing mechanism is fixed at the right lower end of the pot cover through a bolt, a power switch key is embedded at the left side of the lower part of the pot cover, a starting and closing key is arranged on the right of the power switch key, a timing device is arranged on the right of the starting and closing key, the right side of the timing device is provided with a rotating speed adjusting plate, and the machine body is electrically connected with an external power supply.

Preferably, the inside of the pot body is rotated and is provided with the bearing platform, the lower extreme that the lower extreme of bearing platform is located the pot body is provided with the joint, the lower extreme of joint has cup jointed the pivot, the lower extreme of pivot is provided with the vacuum pump.

Preferably, the bearing platform includes the suction inlet, places dish and interface, the upper end middle part of placing the dish runs through in the suction inlet, the lower extreme welding of placing the dish has the interface.

Preferably, the pot cover is made of transparent glass, and the inside of the pot body can be seen when the pot cover works.

Preferably, the liquid absorbing sponge sleeve enables the lower end interface of the placing disc to be fixedly connected with the clamping head through the sleeve joint.

Preferably, the inside of the rotating shaft is hollow.

Preferably, the surface of the upper end of the placing plate is provided with textures, and the suction port penetrates through the placing plate and the connector to be connected with the clamping head.

Preferably, the fixing mechanism fixes and opens the pot cover through the fixing bolt, and when the fixing bolt is loosened, the pot cover is opened, and when the fixing bolt is screwed, the pot cover is fixed on the pot body.

Compared with the prior art, the utility model provides a novel a coating equipment for production of photoetching membrane possesses following beneficial effect:

1. the utility model discloses intercepting device comprises inlaying groove, cup joint mouth, receipts cistern and imbibition sponge cover, and the imbibition sponge cover cup joints on placing the dish through inlaying the groove, makes interface and joint fixed connection through cup joint mouth, when carrying out artifical glue dripping, if glue instils into too much and oozes, and the photoresist that oozes flows into receives the cistern in, absorbs it through the imbibition sponge cover, makes it can not inside the landing gets into the organism.

2. The utility model discloses arresting gear beneficial effect is through placing the PCB board at the bearing bench of coating equipment artifical instil into the photoresist again, make the photoresist evenly scribble at the PCB board formation photoresist through highly rotating, nevertheless if instil into the photoresist when too much, the photoresist can be through the consistency along with the landing of bearing platform is downflow before rotating, through oozing the pot body get into the organism inside, cause the inside organism of organism to damage, collect the absorption through the photoresist that arresting gear will ooze, make it can not flow into the organism and cause the equipment to damage.

Drawings

The accompanying drawings are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention, and together with the description, do not constitute a limitation of the invention, in which:

FIG. 1 is a schematic structural view of a novel coating apparatus for producing a photolithographic film according to the present invention;

FIG. 2 is a schematic structural view of a novel coating apparatus for producing a photolithographic film according to the present invention;

FIG. 3 is a schematic view of the internal structure of a novel coating apparatus for producing a photolithographic film according to the present invention;

FIG. 4 is a schematic structural view of a novel coating apparatus bearing table for producing a photolithographic film according to the present invention;

in the figure: 1. a pan body; 2. a pot cover; 3. a body; 4. a rotating speed adjusting plate; 5. a timing device; 6. starting a closing key; 7. a power switch key; 8. a fixing mechanism; 9. an intercepting device; 10. A bearing table; 11. a rotating shaft; 12. a vacuum pump; 13. a clamping head; 91. embedding a groove; 92. a socket; 93. a liquid collecting tank; 94. a liquid-absorbing sponge cover; 101. a suction port; 102. placing a tray; 103. An interface.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.

Referring to fig. 1-4, the present invention provides a technical solution:

the utility model provides a novel coating equipment for production of photoetching membrane, including organism 3 and the pot body 1, the upside middle part of organism 3 is inlayed and is had the pot body 1, the inside middle-end of the pot body 1 is provided with intercepting device 9, intercepting device 9 is including inlaying groove 91, socket 92, receive cistern 93 and imbibition sponge cover 94, imbibition sponge cover 94 makes through socket 92 place set 102 lower extreme interface 103 cup joint with joint 13 and fix, wherein imbibition sponge cover 94 cup joints on placing set 102 through inlaying groove 91, make interface 103 and joint 13 fixed connection through socket 92, the upper end middle part of imbibition sponge cover 94 is provided with inlays groove 91, the bottom middle part of inlaying groove 91 runs through socket 92, the upper end that the outer end of inlaying groove 91 is located imbibition sponge cover 94 is provided with and receives cistern 93.

A novel coating device for producing a photoetching film comprises a pot cover 2 inlaid at the inner end edge of a pot body 1, the pot cover 2 is made of transparent glass, the inside of the pot body 1 can be seen when the coating device works, wherein the working condition of the inside of the pot body is observed through the pot cover 2 when the coating device works, a fixing mechanism 8 is fixed on a right lower end bolt of the pot cover 2, the pot cover 2 is fixed and opened through a fixing bolt by the fixing mechanism 8, the pot cover 2 is opened when the fixing bolt is unscrewed, the pot cover 2 is fixed on the pot body 1 when the fixing bolt is unscrewed, wherein the fixing bolt on the fixing mechanism 8 is unscrewed, the pot cover 2 is taken out of the pot body 1 and opened, a PCB (printed circuit board) is placed on a bearing table 10 in the pot body 1, a power switch key 7 is inlaid at the left side of the lower part of the pot cover 2, a start-off key 6 is arranged, the right side of the timing device 5 is provided with a rotating speed adjusting plate 4, and the machine body 3 is electrically connected with an external power supply.

A novel coating device for photoetching film production comprises a bearing table 10 which is rotatably arranged inside a pot body 1, the bearing table 10 comprises a suction port 101, a placing disc 102 and a connector 103, the upper end surface of the placing disc 102 is provided with textures, the suction port 101 penetrates through the placing disc 102 and the connector 103 to be connected with a clamping joint 13, a PCB is sucked and fixed through the suction port 101, the middle part of the upper end of the placing disc 102 penetrates through the suction port 101, the connector 103 is welded at the lower end of the placing disc 102, the bearing table 10 can be replaced, the lower end of the bearing table 10 is positioned at the lower end of the pot body 1 and is provided with the clamping joint 13, the lower end of the clamping joint 13 is sleeved with a rotating shaft 11, the inside of the rotating shaft 11 is in a hollow state, the rotating shaft 11 is connected with the suction port 101 through the hollow part, the PCB is sucked through the suction port, wherein a fixing bolt on a fixing mechanism 8 is unscrewed, a pot cover 2 is taken out of the pot, the lower end of the rotating shaft 11 is provided with a vacuum pump 12, wherein the smearing work is carried out by driving equipment of the vacuum pump 12 inside the machine body

The utility model discloses a theory of operation and use flow: after the utility model is installed, the production of the photoetching film is carried out through coating equipment, firstly, the machine body 3 is connected with a power supply, then, the fixing bolt on the fixing mechanism 8 is unscrewed, the pot cover 2 is taken out of the pot body 1 and opened, the PCB is placed on the bearing table 10 in the pot body 1, then, photoresist is dripped in the middle of the PCB manually, the photoresist is protected through the intercepting device 9 in the dripping process, the liquid absorbing sponge sleeve 94 is sleeved on the placing disc 102 through the embedding groove 91, the interface 103 is fixedly connected with the clamping head 13 through the sleeving opening 92, when the manual glue dripping is carried out, if glue is dripped to be excessively exuded, the exuded photoresist flows into the liquid receiving groove 93, the photoresist is absorbed through the liquid absorbing sponge sleeve 94, so that the photoresist can not slide downwards and enter the machine body 3, then, the pot cover 2 is covered on the pot body 1, then, the pot cover 2 is fixed on the fixing mechanism 8 by screwing the fixing bolt to fix the pot cover 1, the power switch key 7 is turned on, the rotating speed of IH125-100 and 250-fold is adjusted through the rotating speed adjusting plate 4, the rotating working time is set through the timing device 5, the start closing key 6 is pressed to start working, the vacuum pump 12 starts working and is connected with the suction port 101 through the hollow part of the rotating shaft 11, the suction head sucks the PCB, the motor device part of the vacuum pump 12 drives the rotating shaft 11 to start rotating, the rotating shaft 11 drives the clamping joint 13, the clamping joint 13 drives the operating platform to rotate, the photoresist is uniformly spread on the upper part of the PCB through high-speed rotation, the fixing bolt on the fixing mechanism 8 is unscrewed after the working is finished, the pot cover 2 is taken out of the pot body 1 and opened, and the PCB is placed out of the bearing platform 10 in the pot body 1.

Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.

Claims

1. The utility model provides a novel a coating equipment for production of photoetching membrane, includes organism (3) and pot body (1), its characterized in that: the utility model discloses a pot, including organism (3), upside middle part inlay of organism (3) has the pot body (1), the inside middle-end of the pot body (1) is provided with intercepting device (9), intercepting device (9) are including inlaying groove (91), socket (92), receipts liquid groove (93) and imbibition sponge cover (94), the upper end middle part of imbibition sponge cover (94) is provided with inlays groove (91), the bottom middle part of inlaying groove (91) has run through socket (92), the outer end that inlays groove (91) is located the upper end of imbibition sponge cover (94) and is provided with receipts liquid groove (93), the inner edge of the pot body (1) is inlayed and is had pot cover (2), the right side lower extreme bolt fastening of pot cover (2) has fixed establishment (8), the lower part left side of pot cover (2) is inlayed and is had switch key (7), switch key (7) right-hand is provided with start-up closure key (6, the right-hand timing device (5) that is provided with of start-up key (6), the right-hand rotational speed regulating plate (4) that is provided with of timing device (5), organism (3) and external power source electrical property link to each other.

2. The novel coating apparatus for photolithographic film production as claimed in claim 1, wherein: the pot body (1) is internally provided with a bearing platform (10) in a rotating manner, the lower end of the bearing platform (10) located at the lower end of the pot body (1) is provided with a clamping joint (13), the lower end of the clamping joint (13) is sleeved with a rotating shaft (11), and the lower end of the rotating shaft (11) is provided with a vacuum pump (12).

3. The novel coating apparatus for photolithographic film production as claimed in claim 2, wherein: bearing platform (10) include suction inlet (101), place dish (102) and interface (103), the upper end middle part of placing dish (102) runs through in suction inlet (101), the lower extreme welding of placing dish (102) has interface (103).

4. The novel coating apparatus for photolithographic film production as claimed in claim 1, wherein: the liquid suction sponge sleeve (94) enables a lower end interface (103) of the placing disc (102) to be fixedly sleeved with the clamping joint (13) through the sleeve joint (92).

5. The novel coating apparatus for photolithographic film production as claimed in claim 2, wherein: the rotating shaft (11) is hollow.

6. The novel coating apparatus for photolithographic film production as claimed in claim 3, wherein: the upper end surface of the placing disc (102) is provided with textures, and the suction port (101) penetrates through the placing disc (102) and the interface (103) to be connected with the clamping head (13).