CN211452058U - Electromagnetic thrust launching device - Google Patents
Electromagnetic thrust launching device Download PDFInfo
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- CN211452058U CN211452058U CN201921832088.8U CN201921832088U CN211452058U CN 211452058 U CN211452058 U CN 211452058U CN 201921832088 U CN201921832088 U CN 201921832088U CN 211452058 U CN211452058 U CN 211452058U
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Abstract
The utility model relates to an electromagnetic thrust emitter. The device comprises: a first track; second rails which are parallel to and insulated from each other and made of metal; an armature positioned between and slidable along the rails and in sliding electrical contact with the rails; a projectile, the projectile being propelled by the armature; a high power pulsed power supply; and a switch; the first track and the second track and the armature as well as the switch and the power supply form a series circuit, when the switch is closed, the power supply supplies power to the circuit, a magnetic field is generated in the circuit through the current of the first track and the second track, the current flowing through the armature forms electromagnetic force under the action of the magnetic field, the electromagnetic force accelerates the armature and the projectile to ultra high speed, and the armature further comprises a plurality of plasma generators which are arranged in the first track in sequence at equal intervals to generate plasma. The utility model provides a problem of the orbital serious ablation of electromagnetic thrust emitter for reduce armature and orbital ablation, improved orbital life.
Description
Technical Field
The utility model relates to an electromagnetism track technical field specifically relates to an electromagnetism thrust emitter.
Background
At present, the concept of the electromagnetic rail gun has been proposed for a long time, but the electromagnetic rail gun is not put into practical use in a test stage for many years, because some problems of the electromagnetic rail gun are not well solved, one of the problems is that a system generates a large amount of heat in the projectile body launching process, the rail is ablated and abraded and even fails, and the service life of the material is seriously influenced.
SUMMERY OF THE UTILITY MODEL
The utility model aims to solve the technical problem that an electromagnetic thrust emitter is provided has solved the orbital problem of seriously ablating of electromagnetic thrust emitter for reduce armature and orbital ablation, improved orbital life.
Technical objects that can be achieved by the present invention are not limited to what has been particularly described above, and other technical objects that are not described herein will be more clearly understood by those skilled in the art from the following detailed description.
The utility model provides an above-mentioned technical problem's technical scheme as follows:
according to an aspect of the present disclosure, the utility model provides an electromagnetic thrust emitter, a serial communication port, the device includes:
a first track;
a second rail, the first and second rails being parallel and insulated from each other and made of metal;
an armature positioned between and slidable along and in sliding electrical contact with the first and second rails;
a projectile propelled by the armature;
a high power pulsed power supply; and
a switch;
wherein the first and second tracks and the armature, and the switch and the power supply form a series circuit, when the switch is closed, the power supply supplies power to the circuit, a magnetic field is generated in the circuit by the current of the first and second tracks, the current flowing through the armature forms an electromagnetic force under the action of the magnetic field, and the electromagnetic force accelerates the armature and the projectile to a super high speed,
characterized in that the apparatus further comprises a plurality of plasma generators equidistantly arranged in sequence in the first track to generate plasma.
Optionally, in the apparatus as described above, the plasma generator comprises an anode cylinder, a cathode nozzle and an inclined gas jet hole.
Optionally, in the apparatus as described above, the armature further comprises a trumpet-shaped through hole which allows a plasma to have a large contact area with the armature.
Optionally, in the apparatus as described above, the plasma generator further comprises an electromagnetic coil surrounding the cathode nozzle.
Optionally, in the apparatus as described above, a trapezoidal groove is provided at one side of the first rail.
Alternatively, in the apparatus as described above, the apparatus ionizes the inert gas ejected from the oblique gas ejection hole to generate low-temperature plasma, which forms a plasma layer between the first rail and the armature and between the second rail and the armature, when the apparatus is turned on with a high voltage, and free electrons are absorbed by the armature under the action of lorentz force and an electric field.
Alternatively, in the apparatus as described above, a distance between adjacent two of the plurality of plasma generators is equal to a length of the trumpet-shaped through hole of the armature,
alternatively, in the apparatus as described above, the timing of the operation of the plasma generators is controlled such that the first plasma generator starts to operate to generate plasma and spray it to the second track when the upper edge of the flared through hole of the armature reaches the first plasma generator, the first plasma generator stops operating when the lower edge of the flared through hole of the armature reaches the first plasma generator, the second plasma generator starts to operate, and the remaining plasma generators sequentially perform the above operations, thereby ensuring that the plasma generators operate only when the armature passes, so as to prevent the plasma from spreading over the area after the armature passes, and ensuring that the armature has plasma function all the time.
Alternatively, in the apparatus as described above, a current is applied to the electromagnetic coil, the electromagnetic coil generates a time-varying magnetic field in the plasma generator, the varying magnetic field generates an induced electric field, and the low-temperature plasma is confined by the magnetic field and makes a cyclotron motion around magnetic lines of force in a direction perpendicular to the magnetic field so as to form a magnetic pinch.
Alternatively, in the apparatus as described above, the speed and direction of the plasma are indirectly controlled by controlling the flow rate of the inert gas.
Optionally, the device is an electromagnetic orbital cannon.
The above-described embodiments are only some of the embodiments of the present invention, and those skilled in the art can derive and understand various embodiments including the technical features of the present invention from the following detailed description of the present invention.
It will be appreciated by persons skilled in the art that the effects that can be achieved by the present invention are not limited to what has been particularly described hereinabove and other advantages of the present invention will be more clearly understood from the following detailed description.
Drawings
The accompanying drawings, which are included to provide a further understanding of the invention, illustrate embodiments of the invention and together with the description serve to explain the principles of the invention.
Fig. 1 is a schematic view of a plasma generator of an electromagnetic thrust launching device according to an embodiment of the present invention.
Fig. 2 is a schematic view of a plasma generator of an electromagnetic thrust emission device according to an embodiment of the present invention.
Fig. 3 is a schematic diagram of an armature and a plurality of plasma generators and a track of an electromagnetic thrust launching device according to an embodiment of the present invention.
Detailed Description
Reference will now be made in detail to the exemplary embodiments of the present invention, examples of which are illustrated in the accompanying drawings. The detailed description, which will be given below with reference to the accompanying drawings, is intended to explain exemplary embodiments of the present invention, rather than to show the only embodiments that can be implemented according to the present invention. The following detailed description includes specific details in order to provide a thorough understanding of the invention. It will be apparent, however, to one skilled in the art that the present invention may be practiced without these specific details.
In some instances, well-known structures and devices are omitted or shown in block diagram form, focusing on important features of the structures and devices so as not to obscure the concepts of the present invention. The same reference numbers will be used throughout the specification to refer to the same or like parts.
The principles and features of the present invention are described below in conjunction with the following drawings, the examples given are only intended to illustrate the present invention and are not intended to limit the scope of the present invention.
In the description of the present invention, it is to be understood that the terms "upper", "lower", "center", "inner", "outer", "top", "bottom", and the like, indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplicity of description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be construed as limiting the present invention.
In the description of the present invention, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art.
The tracks described below refer to the first track 2 and the second track.
According to an embodiment of the present invention, a plurality of plasma generators (rail-mounted) are provided on a rail. Fig. 1 and fig. 2 show schematic diagrams of a plasma generator of an electromagnetic thrust emission device provided by an embodiment of the present invention. As shown in fig. 1 and 2, the present invention provides an electromagnetic thrust launching device, which comprises: a first track 2; a second rail, said first rail 2 and second rail being parallel and insulated from each other and made of metal; an armature located between and slidable along the first and second rails 2 and in sliding electrical contact with the first and second rails; a projectile propelled by the armature; a high power pulsed power supply; and a switch; the first and second tracks and the armature, and the switch and the power supply constitute a series circuit, when the switch is closed, the power supply supplies power to the circuit, a magnetic field is generated in the circuit by the current of the first and second tracks, the current flowing through the armature forms an electromagnetic force under the action of the magnetic field, the electromagnetic force accelerates the armature and the projectile to a super high speed, and the armature further comprises a plurality of plasma generators 1 which are arranged in the first track 2 in sequence at equal intervals to generate plasma. In the apparatus as described above, the plasma generator 1 includes an anode cylinder 3, a cathode nozzle 4, and an inclined gas injection hole 5. In the apparatus as described above, the armature further includes a trumpet-shaped through hole which allows a plasma to have a large contact area with the armature. In the device described above, the armature further comprises an electromagnetic coil 6, the electromagnetic coil 6 surrounding the cathode nozzle 4. In the device as described above, a trapezoidal groove is provided on one side of the first rail. In the device as described above, the device ionizes the inert gas ejected from the oblique gas ejection hole 5 under the condition that the device is switched on with a high voltage to generate low-temperature plasma, and free electrons are absorbed by the armature under the action of lorentz force and an electric field, and the low-temperature plasma forms plasma layers between the first rail 2 and the armature and between the second rail and the armature. In the apparatus as described above, the distance between adjacent two of the plurality of plasma generators 1 is equal to the length of the trumpet-shaped through hole of the armature. In the device, the timing of the operation of the plasma generators 1 is controlled such that the first plasma generator 1 starts to operate to generate plasma when the upper edge of the flared through hole of the armature reaches the first plasma generator 1 and sprays the plasma to the second track, the first plasma generator 1 stops operating when the lower edge of the flared through hole of the armature reaches the first plasma generator 1, the second plasma generator 1 starts to operate, and the remaining plasma generators 1 sequentially perform the above operations, thereby ensuring that the plasma generators 1 operate only when the armature passes, so as to prevent the plasma from spreading over the area after the armature passes, and ensuring that the armature has plasma action all the time. In the device, a current is applied to the electromagnetic coil 6, the electromagnetic coil 6 generates a time-varying magnetic field in the plasma generator 1, the varying magnetic field generates an induced electric field, and the low-temperature plasma is constrained by the magnetic field and performs a rotary motion around magnetic lines of force in a direction perpendicular to the magnetic field so as to form magnetic pinch. In the apparatus as described above, the speed and direction of the plasma are indirectly controlled by controlling the flow rate of the inert gas.
Because the armature of the electromagnetic orbit gun has smaller volume, the space for arranging the plasma generator on the armature is smaller, the generation density of low-temperature plasma can be influenced, and the specific implementation also has certain engineering difficulty. The difficulty can be reduced by arranging the plasma generator on the track, external energy can be utilized to supply energy to the plasma generator, the existing mature low-temperature plasma generator can be adopted, and the engineering practice difficulty is reduced.
Research on magnetic confinement low-temperature plasma control technology
The low-temperature plasma control is to manually control the motion state or speed of the plasma by using a corresponding technical principle to achieve a specific purpose. Since the plasma contains a large amount of electrons, positive ions, and neutral particles, the plasma control methods mainly include magnetic field confinement control, external electric field control, other power source control, and the like.
(a) Magnetic field confinement control
By adding an electromagnetic coil to the plasma source, the frequency of the electromagnetic coil is omega, and the amplitude of the electromagnetic coil is I0The coil generates a time-varying magnetic field within the plasma source:
BZ(t)＝Bosin(ωt+φo) (1)
the changing magnetic field generates an induced electric field
Eθ(t)＝-Eocosωt (2)
The electrons of the ionized gas are confined by the magnetic field. The charged particles rotate around the magnetic lines in the direction perpendicular to the magnetic field, and the rotation radius of the electrons is about
Wherein m iseIs the electron mass, TeIs the electron temperature, q is the electron charge, BoIs the magnetic field within the plasma source.
The charged particles move linearly at a constant speed in the direction parallel to the magnetic field, so that the motion trail of the particles is in a spiral motion with equal pitch around the magnetic line of force.
(b) Control of applied electric field
By directly loading an electric field outside the plasma source, the direction of electron movement within the plasma can be controlled.
An electric field is a particular substance present around an electric charge and a changing magnetic field. The electric field has the objective properties of force and energy, which are typical of substances. The electric field has a force acting on the charge entering it, i.e. an electric force F.
F＝Eq (4)
E is the electric field strength and q is the charge amount.
i) Fundamental equation of plasma
The plasma basic equation comprises a plasma continuity equation (particle number conservation principle) and a plasma motion equation (momentum conservation principle):
wherein n is the particle density; u is the flow rate; g. l is the ratio of particles generated by ionization and annihilated by recombination in each unit volume per second; p is the pressure intensity; m is the mass of the particles; v is the thermal motion velocity of the particles.
ii) auxiliary equation
The partial ionization plasma state equation is
In the formula niIs the particle number density of the ith component; lambda [ alpha ]DIs the Debye length.
(c) Other power source control
Control of the plasma can also be achieved by simply controlling the velocity of the medium prior to ionization, e.g., by controlling the flow of an inert gas to control the plasma velocity and direction.
The technical scheme of the utility model the mode that adopts magnetic confinement low temperature plasma is controlled, because after adding transverse magnetic field, low temperature plasma is spiral motion and forms the magnetic hoop and contract, is favorable to increasing plasma density, can control plasma moreover and fill the gap between armature and track to reduce arc discharge, also can help reducing the ablation.
Pivot rail structure model design of electromagnetic rail gun
Fig. 3 shows a schematic diagram of an armature and a plurality of plasma generators and a track of an electromagnetic thrust launching device provided by an embodiment of the invention.
(a) Armature structure design of electromagnetic rail gun
In the current electromagnetic rail gun research, the solid armature is still the mainstream of the electromagnetic rail gun application.
The technical scheme of the utility model to the design requirement of solid armature, except considering that good pivot rail contact surface, the quality that need when normal electromagnetism track big gun transmission are enough little, good conductivity and resistant material that ablates, still need the key consideration to do benefit to electron adsorption's concrete structure, make plasma and solid armature have great area of contact. The technical scheme of the utility model to adopting big through-hole and tubaeform design, mainly be increase area of contact.
(b) Track structure design of electromagnetic rail gun
The technical scheme of the utility model the track design will follow aspects such as overall structure design angle consideration low temperature plasma generator, low temperature plasma control, electromagnetic insulation design, make structural arrangement device of being convenient for to produce a large amount of stable controllable low temperature plasma. The structure of the figure is preliminarily assumed, a trapezoidal groove is formed in the side edge of the track, the plasma spray guns are sequentially arranged on the track at one side, the distance between the spray guns is equal to the length of the armature horn hole, the working time of the plasma spray guns is controlled, when the upper edge of the armature horn hole reaches, the first spray gun starts to work to generate plasma to spray to the other side of the track, when the lower edge of the hole contacts, the plasma spray guns stop working, and the second spray gun starts to work sequentially, so that the plasma spray guns are guaranteed to work only when the armature passes through, and the plasma is prevented from being diffused in the area after the armature passes through due to the consideration, and the armature can be guaranteed to have the.
When the electromagnetic rail gun works, the heat generation quantity is overlarge, the internal environment is extremely severe, and the high-temperature failure of the material is a bottleneck restricting the technical development of the electromagnetic gun and seriously influences the service life of the electromagnetic gun. Under this background, the utility model discloses a technical scheme's plasma layer can reduce the heat effect of armature and track contact interface very showing to the calorific capacity of electromagnetic rail big gun is greatly reduced, the transmission performance and the life of improvement system, this has great meaning to this new concept kinetic energy weapon of electromagnetic rail big gun gets into practical phase.
As described above, a detailed description of preferred embodiments of the present invention has been given to enable those skilled in the art to make and practice the present invention. Although the present invention has been described with reference to exemplary embodiments, those skilled in the art will appreciate that various modifications and changes can be made in the present invention without departing from the spirit or scope of the invention described in the appended claims. Thus, the present invention is not intended to be limited to the particular embodiments shown and described herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (10)
1. An electromagnetic thrust launching device, characterized in that it comprises:
a first track;
a second rail, the first and second rails being parallel and insulated from each other and made of metal;
an armature positioned between and slidable along and in sliding electrical contact with the first and second rails;
a projectile propelled by the armature;
a high power pulsed power supply; and
a switch;
wherein the first and second tracks and armature and switch, power supply form a series circuit, when the switch is closed, the power supply supplies power to the circuit, a magnetic field is generated in the circuit by the current of the first and second tracks, the current flowing through the armature forms an electromagnetic force under the action of the magnetic field, the electromagnetic force accelerates the armature and the projectile to a super high speed,
the apparatus further includes a plurality of plasma generators equidistantly arranged in sequence in the first track to generate plasma.
2. The apparatus of claim 1, wherein the first and second electrodes are disposed on opposite sides of the housing,
the plasma generator is characterized by comprising an anode cylinder, a cathode nozzle and an air injection inclined hole.
3. The apparatus of claim 2, wherein the first and second electrodes are disposed in a common plane,
the plasma generator is characterized in that the armature further comprises a horn-shaped through hole which enables the plasma to have a large contact area with the armature.
4. The apparatus of claim 3, wherein the first and second electrodes are disposed in a common plane,
wherein the plasma generator further comprises an electromagnetic coil surrounding the cathode nozzle.
5. The apparatus of claim 4, wherein the first and second electrodes are disposed on opposite sides of the substrate,
the plasma generator is characterized in that a trapezoid groove is formed on one side of the first rail, the inert gas sprayed from the inclined gas spraying hole is ionized by the device under the condition that the device is switched on high voltage, so that low-temperature plasma is generated, free electrons are absorbed by the armature under the action of Lorentz force and an electric field, and plasma layers are formed between the first rail and the armature and between the second rail and the armature by the low-temperature plasma.
6. The apparatus of claim 3, wherein the first and second electrodes are disposed in a common plane,
wherein a distance between adjacent two of the plurality of plasma generators is equal to a length of the trumpet-shaped through hole of the armature.
7. The apparatus of claim 3, wherein the first and second electrodes are disposed in a common plane,
the plasma generator is characterized in that the working time of the plasma generator is controlled, so that the first plasma generator starts to work to generate plasma when the upper edge of the horn-shaped through hole of the armature reaches the first plasma generator, the plasma is sprayed to the second rail, the first plasma generator stops working when the lower edge of the horn-shaped through hole of the armature reaches the first plasma generator, the second plasma generator starts to work, and the rest plasma generators sequentially perform the operations, so that the plasma generator is guaranteed to work only when the armature passes through, plasma is prevented from spreading in the area after the armature passes through, and the armature is guaranteed to have plasma action all the time.
8. The apparatus of claim 5, wherein the first and second electrodes are disposed in a common plane,
the plasma generator is characterized in that current is applied to the electromagnetic coil, the electromagnetic coil generates a magnetic field which changes along with time in the plasma generator, the changing magnetic field generates an induction electric field, and the low-temperature plasma is restrained by the magnetic field and does rotary motion around magnetic lines of force in the direction perpendicular to the magnetic field so as to form magnetic pinch.
9. The apparatus of claim 5, wherein the first and second electrodes are disposed in a common plane,
the method is characterized in that the speed and the direction of the plasma are indirectly controlled by controlling the flow of the inert gas.
10. The apparatus of claim 1, wherein the apparatus is an electromagnetic orbital cannon.
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| CN201921832088.8U CN211452058U (en) | 2019-10-29 | 2019-10-29 | Electromagnetic thrust launching device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110671966A (en) * | 2019-10-29 | 2020-01-10 | 中国人民解放军陆军装甲兵学院 | Electromagnetic thrust launching device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110671966A (en) * | 2019-10-29 | 2020-01-10 | 中国人民解放军陆军装甲兵学院 | Electromagnetic thrust launching device |
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