CN210982787U - Anti-oxidation anti-infrared light band pattern lens of Eimei - Google Patents
Anti-oxidation anti-infrared light band pattern lens of Eimei Download PDFInfo
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- CN210982787U CN210982787U CN201922277940.6U CN201922277940U CN210982787U CN 210982787 U CN210982787 U CN 210982787U CN 201922277940 U CN201922277940 U CN 201922277940U CN 210982787 U CN210982787 U CN 210982787U
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Abstract
The utility model relates to an anti-oxidant anti infrared light band pattern lens of angstrom, be in including substrate and setting the rete of substrate surface, the rete includes bottom layer, pattern oxidation resisting layer and the anti infrared photosphere that stacks gradually from inside to outside, wherein: the pattern anti-oxidation layer is composed of a pattern and a fourth anti-oxidation film layer, and the infrared-resistant layer is composed of high-refractive-index film layers and low-refractive-index film layers alternately. Anti infrared band pattern lens of antioxidation has better antioxidation, anti infrared light effect, and the pattern combines closely with the lens, does not influence the person's of wearing sight, has better market prospect.
Description
Technical Field
The utility model relates to a functional lens, especially anti infrared light band pattern lens of oxidation resistance of angstrom rice.
Background
The infrared ray is one of a plurality of invisible rays in the solar ray, which is discovered by England scientist Henschel in 1800 years and is also called infrared heat radiation, the wavelength of the infrared ray on the solar spectrum is larger than that of the visible ray, and the wavelength is 0.75-1000 μm. The infrared ray can be divided into three parts, namely near infrared ray, and the wavelength is between (0.75-1) and (2.5-3) mu m; middle infrared ray with wavelength of 2.5-3-25-40 μm; far infrared rays having a wavelength of (25-40) to l000 μm. The infrared ray has stronger ability to penetrate through the cloud than the visible ray. The method has wide application in communication, detection, medical treatment, military and other aspects. Commonly known as infrared light.
The infrared ray can be made artificially, and widely exists in nature, and the infrared ray is widely applied, so the problem of infrared ray pollution is also generated, and the problem is firstly directed at the injury of eyes.
The damage of infrared rays to eyes has different conditions, and the infrared rays with the wavelength of 7500-13000 angstrom have higher transmittance to the cornea of the eyes, which can cause the damage of the retina of the eye fundus. Especially, the infrared ray near 11000 angstrom can lead the anterior medium (corneal lens, etc.) of the eye not to be damaged and directly cause the burn of the retina of the eyeground. Infrared rays having a wavelength of 19000 angstrom or more are almost completely absorbed by the cornea, and cause corneal burn (cloudiness, leukoplakia). The energy of infrared rays with a wavelength of more than 14000 angstroms is mostly absorbed by cornea and intraocular fluid and cannot penetrate iris. Only infrared rays below 13000 angstroms can penetrate through the iris, and the iris is damaged. The human eye may cause cataracts if exposed to infrared light for a long period of time. Therefore, designing a lens resistant to infrared light has a positive significance.
SUMMERY OF THE UTILITY MODEL
The utility model aims at overcoming current lens pattern layer and thin layer combination can disturb the sight, and the pattern layer is easy to be oxidized, the colour on pattern layer can only select the colour the same with the substrate base colour, relatively single problem, an anti-oxidation anti-infrared band pattern lens of angstrom is provided, combine pattern and lens closely, do not shelter from the person's of wearing sight, and better anti-oxidation has, anti-infrared light effect, the pattern colour can be rich and varied transform simultaneously, form two kinds of colours on same lens surface, a coating film colour of substrate, a coating film colour of pattern, the colour on pattern layer is changeable also can not shelter from the sight, fully embody fashion characteristic.
The specific scheme is as follows:
the utility model provides an anti infrared light band pattern lens of anti oxidation of amesdia, anti infrared light band pattern lens of amesdia includes the substrate and sets up the rete on substrate surface, the rete includes bottom layer, pattern oxidation resisting layer and the anti infrared photosphere that stacks gradually from inside to outside, wherein: the pattern anti-oxidation layer consists of a pattern and a fourth oxidation resistant film layer, wherein the fourth oxidation resistant film layer is adjacent to the infrared-resistant layer; the pattern in the pattern oxidation resisting layer is any one of an ink printing pattern, a copper template attaching pattern or an electrostatic attaching pattern; the fourth oxidation resistant film layer in the pattern oxidation resistant layer is a selenium layer, a nickel layer or a combined layer of the selenium layer and the nickel layer; the infrared resistant layer is composed of high-refractive-index film layers and low-refractive-index film layers alternately.
Further, the film layer covers the outer surface of the substrate.
Further, the substrate is any one of an acrylic substrate, a polycarbonate substrate, a nylon substrate, a CR-39 substrate or a glass substrate.
Further, the priming layer is composed of a low-refractive-index thin film layer and a high-refractive-index thin film layer alternately, wherein the low-refractive-index thin film layer is adjacent to the pattern anti-oxidation layer; the high refractive index layer is ZrO2Layer, Ti3O5Layer or Ta2O5Any one of the layers; the low refractive index layer is SiO2Layers, silicon-aluminium mixtures or MgF2Any one of the layers;
further, the priming layer consists of a first low-refractive-index thin film layer, a second high-refractive-index thin film layer and a third low-refractive-index thin film layer, wherein the first low-refractive-index thin film layer is adjacent to the substrate, and the third low-refractive-index thin film layer is adjacent to the pattern antioxidation layer;
optionally, the infrared light resistant layer is composed of a fifth high refractive index thin film layer, a sixth low refractive index thin film layer, a seventh high refractive index thin film layer, an eighth low refractive index thin film layer, a ninth high refractive index thin film layer, a tenth low refractive index layer, an eleventh high refractive index layer and a twelfth low refractive index layer which are sequentially stacked, wherein the fifth high refractive index thin film layer is adjacent to the pattern antioxidation layer.
Further, the thickness of the first low-refractive-index thin film layer in the bottom layer is 50-150 angstroms, the thickness of the second high-refractive-index thin film layer is 100-300 angstroms, and the thickness of the third low-refractive-index thin film layer is 50-150 angstroms; the thickness of the fourth oxidation resistant thin film layer in the pattern oxidation resistant layer is 100-400 angstroms; the thicknesses of the fifth high-refractive-index thin film layer, the sixth low-refractive-index thin film layer, the seventh high-refractive-index thin film layer, the eighth low-refractive-index thin film layer, the ninth high-refractive-index thin film layer, the tenth low-refractive-index thin film layer, the eleventh high-refractive-index thin film layer and the twelfth low-refractive-index thin film layer in the infrared-resistant layer are 200-152 angstrom, 1000-charge 1300 angstrom, 650-charge 950 angstrom, 1000-charge 1300 angstrom, 500-charge 900 angstrom, 1000-charge 1400 angstrom, 550-charge 950 angstrom and 300-charge 950 angstrom.
Further, the thickness of a first low-refractive-index thin film layer in the priming layer is 100 angstroms, the thickness of a second high-refractive-index thin film layer is 200 angstroms, and the thickness of a third low-refractive-index thin film layer is 100 angstroms; the thickness of the fourth thin film layer in the patterned anti-oxidation layer is 300 angstroms; the thicknesses of a fifth high-refractive-index thin film layer, a sixth low-refractive-index thin film layer, a seventh high-refractive-index thin film layer, an eighth low-refractive-index thin film layer, a ninth high-refractive-index thin film layer, a tenth low-refractive-index thin film layer, an eleventh high-refractive-index thin film layer and a twelfth low-refractive-index thin film layer in the infrared-resistant layer are 350 angstroms m, 1150 angstroms m, 850 angstroms, 1150 angstroms, 800 angstroms, 1200 angstroms, 750 angstroms and 600 angstroms in sequence.
Furthermore, the anti-oxidation anti-infrared light band pattern lens in the Hermite further comprises a protective layer, wherein the protective layer covers the surface of one side, far away from the substrate, of the anti-infrared light layer, and is a waterproof layer, and the thickness of the protective layer is 50-500 Hermite.
Further, the thickness of the protective layer is 120-300 angstrom.
Has the advantages that:
the anti-oxidation anti-infrared light band pattern lens of angstrom rice has better anti-oxidation, anti-infrared light effect, and in the aspect of anti-infrared light, optical wavelength is greater than 30% at 750 + 1100nm minimum reflectivity, and average reflectivity is greater than 60%.
Then again, the utility model discloses fine solution thin layer and the interference sight problem on pattern layer, lens surface colour and pattern colour present two different colours simultaneously, abundant embodiment lens fashion characteristic.
Drawings
In order to illustrate the technical solution of the present invention more clearly, the accompanying drawings will be briefly described below, and it is to be understood that the drawings in the following description are only related to some embodiments of the present invention, and are not intended to limit the present invention.
Fig. 1 is a schematic view of a lens structure according to an embodiment of the present invention;
fig. 2 is a diagram of a reflectivity spectrum of a lens according to an embodiment of the present invention.
Detailed Description
Definitions of some terms used in the present invention are given below, and other unrecited terms have definitions and meanings known in the art:
substrate: the lens is any one of an acrylic substrate, a polycarbonate substrate, a nylon substrate, a CR-39 substrate or a glass substrate, and can be a plane lens or a lens with a certain radian.
Outer surface: the outer surface of the utility model is the side of the lens which directly receives the light of the light source in the using state, namely the side surface of the lens which is far away from the eyes.
In the egyptian antioxidant anti-infrared light band pattern lens provided by the utility model, the thickness of the substrate is 0.5-5.5mm, preferably 1-4mm, for example 2mm, for example 3mm, for example 3.5 mm.
The utility model provides an in the anti infrared light band pattern lens of anti-oxidant of angstrom, the material of low refracting index thin layer is SiO2Silicon-aluminum mixture or MgF2Any one of them. Wherein the silicon-aluminum mixture can be SiO2With Al2O3Mixtures of (A) with (B), e.g. Al2O32-6% of the total weight of the silicon-aluminum mixture, and more preferably Al2O33-3.5% of the total weight of the silicon-aluminum mixture, the material can be made by self or can be a commercial product, such as vacuum coating material L5, the general name of China is ' silicon-aluminum mixture ', L5 ' is the general name of Germany, the material can be provided by merck optical company, Nanyang happy reiter new optical material company Limited or Suzhou Prkyo vacuum technology company Limited, and the common specification is 1-3mm loose particles and white.
The high refractive index layer is made of ZrO2、Ti3O5Or Ta2O5Is preferably Ti3O5The oxidation resistant thin film layer in the patterned oxidation resistant layer is selenium or nickel or a combination of the selenium and the nickel, and preferably the combination of the selenium and the nickel is, for example: the thickness of the selenium film layer is 100-400 angstrom, the thickness of the nickel film layer is 100-400 angstrom, such as 100 angstrom and 300 angstrom; for example, the thickness of the selenium film layer is 200 angstrom, and the thickness of the nickel film layer is 200 angstrom; for example, the selenium film layer has a thickness of 300 angstroms and the nickel film layer has a thickness of 100 angstroms.
The utility model provides an in the anti-oxidant anti infrared light band pattern lens of angstrom, the bottoming layer comprises low refracting index thin layer and high refracting index thin layer in turn, preferably, the bottoming layer comprises first low refracting index thin layer, second high refracting index thin layer and third low refracting index thin layer, wherein first low refracting index thin layer with the substrate next-door neighbour, third low refracting index thin layer with pattern oxidation resisting layer next-door neighbour, the advantage of above-mentioned structure lies in that low refracting index layer is better with the substrate cohesion, can form two colours of pattern layer and the obvious difference of lens layer colour simultaneously, embodies the fashion sense of lens more.
Specifically, the thickness of the first low-refractive-index thin film layer in the priming layer is 50-150 angstroms, the thickness of the second high-refractive-index thin film layer is 100-300 angstroms, and the thickness of the third low-refractive-index thin film layer is 50-150 angstroms, preferably, the thickness of the first low-refractive-index thin film layer in the priming layer is 70-140 angstroms, the thickness of the second high-refractive-index thin film layer is 150-250 angstroms, and the thickness of the third low-refractive-index thin film layer is 70-140 angstroms, for example, the thickness of the first low-refractive-index thin film layer in the priming layer is 100 angstroms, the thickness of the second high-refractive-index thin film layer is 200 angstroms, and the thickness of the third low-refractive-index thin film layer is 100 angstroms.
The utility model provides an among the anti-oxidant anti infrared light band pattern lens of angstrom, the pattern in the pattern oxidation resisting layer is printing ink printing pattern, copper template laminating pattern or the arbitrary one in the static laminating pattern of pasting. When the pattern is manufactured, the pattern is printed or attached on the bottom layer, and the bonding force between the pattern and the film layer is enhanced by the bottom layer. After the mimeograph or the laminating pattern, carry out fourth anti-oxidation thin layer coating film, later get rid of printing ink or get rid of the copper template or get rid of the static subsides, utilize the contrast effect between blank region and the coating film region to form the pattern shape, reach special visual effect, promptly: the appearance of the pattern can not be experienced almost when the wearer observes, the visual integrity of the lens is guaranteed, the clear pattern can be seen by bystanders, and the aesthetic feeling and the fashion effect of the lens are improved.
The fourth oxidation resistant film layer in the pattern oxidation resistant layer is one or two combinations of selenium and nickel (namely, the selenium film layer and the nickel film layer are mutually laminated), the layer plays an oxidation resistant role, the action mechanism of the layer is to fully play the selenium oxidation resistant performance, and the nickel has the performance characteristics of good corrosion resistance, good ductility, good hardness and the like. The thickness of the fourth oxidation resistant thin film layer is 100-400 angstroms, preferably 150-350 angstroms, more preferably 200-320 angstroms, such as 220 angstroms, such as 250 angstroms, such as 300 angstroms.
The utility model provides an in the anti infrared light band pattern lens of the anti oxidation of angstrom rice, anti infrared photosphere comprises high refracting index thin layer and low refracting index thin layer in turn. Preferably, the infrared light resistant layer is composed of a fifth high refractive index thin film layer, a sixth low refractive index thin film layer, a seventh high refractive index thin film layer, an eighth low refractive index thin film layer, a ninth high refractive index thin film layer, a tenth low refractive index layer, an eleventh high refractive index layer and a twelfth low refractive index layer which are sequentially stacked, wherein the fifth high refractive index thin film layer is adjacent to the pattern anti-oxidation layer, and a good infrared light resistant effect can be achieved through the stacked design. Specifically, the thicknesses of the layers are 200-500-, 1000-1300-, 650-950-, 1000-1300-, 500-900-, 1000-1400-, 550-950-, 300-950-, preferably 300-400-, 1100-1200-, 750-900-, 1100-1200-, 700-900-, 1100-1300-, 650-850-, 500-800-, more preferably 300-, 1100-, 750-, 1100-, 700-, 1100-, 650-, 500-850-, 500-800-, more preferably 300-, 650-, 750-, 1100-, 700-, 1100-, 650-and 500-angstrom in sequence; e.g., 350, 1150, 800, 1200, 700, 600; such as 400, 1200, 900, 1300, 850, 800 angstroms.
The utility model provides an in the anti-oxidant anti infrared light band pattern lens of angstrom rice, can also contain the protective layer, the material is waterproof material, the thickness of protective layer is 50-500 angstrom rice, preferably 100 and 300 angstrom rice, for example 120 angstrom rice, for example 150 angstrom rice, for example 200 angstrom rice.
Preferred embodiments of the present invention will be described in more detail below. While the following describes preferred embodiments of the present invention, it should be understood that the present invention may be embodied in various forms and should not be construed as limited to the embodiments set forth herein. The examples do not specify particular techniques or conditions, and are performed according to the techniques or conditions described in the literature in the art or according to the product specifications. The reagents or instruments used are not indicated by the manufacturer, and are all conventional products commercially available. In the following examples, "%" means weight percent, unless otherwise specified.
The test methods used below included:
and (3) reflectivity testing: the 400-1100nm reflectance was tested using a spectrophotometer.
And (3) antioxidant test: using QUV tester, UV irradiation: strength 0.67W/m2Irradiating for 4 hours at the temperature of 60 ℃; condensation: the temperature was 50 ℃ for 4H. The UV irradiation and condensation cycle test recorded the time at which the film color began to fade.
The following main reagents were used:
silicon-aluminum mixture, commercially available as vacuum coating material L5 from merck optics, nichrome, commercially available as Poillin wire mesh, Inc.
Waterproof materials, commercially available products, are available from Kodak coating materials, Inc., Danyang.
Example 1
An Ammi antioxidant anti-infrared band pattern lens, refer to figure 1, comprises a substrate 0 and a film layer, wherein the film layer is positioned on the outer surface of the substrate 0. The rete begins outwards to extend by the one side that is close to the substrate, including the prime coat, pattern oxidation resisting layer and the anti infrared photosphere that stack gradually, wherein: the priming layer consists of a first low-refractive-index thin film layer 1, a second high-refractive-index thin film layer 2 and a third low-refractive-index thin film layer 3, wherein the first low-refractive-index thin film layer 1 is adjacent to the substrate 0, and the third low-refractive-index thin film layer 3 is adjacent to the pattern anti-oxidation layer; the pattern anti-oxidation layer consists of a pattern and a fourth oxidation resistant film layer 4, wherein the fourth oxidation resistant film layer 4 is adjacent to the infrared-resistant layer; the infrared-resistant layer is composed of a fifth high-refractive-index thin film layer 5, a sixth low-refractive-index thin film layer 6, a seventh high-refractive-index thin film layer 7, an eighth low-refractive-index thin film layer 8, a ninth high-refractive-index thin film layer 9, a tenth low-refractive-index layer 10, an eleventh high-refractive-index layer 11 and a twelfth low-refractive-index layer 12 which are sequentially stacked, wherein the fifth high-refractive-index thin film layer 5 is adjacent to the pattern oxidation-resistant layer. And a thirteenth water-repellent protective layer 13 located outermost and adjacent to the twelfth low refractive index layer 12.
Specifically, the first low-refractive-index thin film layer 1 is a silicon-aluminum mixture layer with a thickness of 80 angstroms, and the second high-refractive-index thin film layer 2 is Ti3O5Layer thicknessThe thickness of the third low refractive index layer 3 is 80 angstrom m, the thickness of the fourth oxidation resistant thin film layer 4 is 200 angstrom m, the fifth high refractive index thin film layer 5 is Ti3O5A layer with a thickness of 300 angstrom m, a sixth low refractive index thin film layer 6 of a silicon-aluminum mixture layer with a thickness of 1100 angstrom m, and a seventh high refractive index thin film layer 7 of Ti3O5A layer with a thickness of 750 angstroms, an eighth low refractive index thin film layer 8 of a silicon-aluminum mixture layer with a thickness of 1100 angstroms, and a ninth high refractive index thin film layer 9 of Ti3O5700 angstroms thick, the tenth low refractive index layer 10 being a silicon-aluminum mixture layer 1100 angstroms thick, the eleventh high refractive index layer 11 being Ti3O5The layer, thickness is 650 angstroms meters, and twelfth low refracting index layer 12 is silicon-aluminum mixture layer, and thickness is 500 angstroms meters, and thirteenth waterproof layer 13, thickness is 200 angstroms meters.
Example 2
An Eimei antioxidant anti-infrared band pattern lens comprises a substrate and a film layer, wherein the film layer is positioned on the outer surface of the substrate. The rete begins outwards to extend by the one side that is close to the substrate, including the prime coat that stacks gradually, pattern oxidation resisting layer and anti infrared photosphere, wherein: the bottom layer consists of a first low-refractive-index thin film layer, a second high-refractive-index thin film layer and a third low-refractive-index thin film layer, wherein the first low-refractive-index thin film layer is adjacent to the substrate, and the third low-refractive-index thin film layer is adjacent to the pattern anti-oxidation layer; the pattern anti-oxidation layer consists of a pattern and a fourth oxidation resistant film layer, wherein the fourth oxidation resistant film layer is adjacent to the infrared-resistant layer; the infrared-resistant layer is composed of a fifth high-refractive-index thin film layer, a sixth low-refractive-index thin film layer, a seventh high-refractive-index thin film layer, an eighth low-refractive-index thin film layer, a ninth high-refractive-index thin film layer, a tenth low-refractive-index layer, an eleventh high-refractive-index layer and a twelfth low-refractive-index layer which are sequentially stacked, wherein the fifth high-refractive-index thin film layer is adjacent to the pattern oxidation-resistant layer. And the thirteenth waterproof protective layer is positioned on the outermost layer and is close to the twelfth low-refractive-index layer.
Specifically, the first low-refractive-index thin film layer is SiO2A layer of 100 angstroms thick and a second high refractive index thin film layer of Ti3O5Layer thickness of 200 angstroms and a third low refractive index layer of SiO2The thickness of the layer is 100 angstroms, the fourth oxidation resistant thin film layer is a mixed layer of selenium and nickel, the thickness of selenium is 100 angstroms and the thickness of nickel is 300 angstroms, and the fifth high refractive index thin film layer is Ti3O5A layer with a thickness of 350 angstroms and a sixth low-refractive-index thin film layer of SiO2A layer with a thickness of 1150 angstrom meters and a seventh high refractive index thin film layer of Ti3O5A layer with a thickness of 800 angstrom m and an eighth low-refractive-index thin film layer of SiO2A layer with a thickness of 1150 angstrom meters and a ninth high refractive index thin film layer of Ti3O5Layer with thickness of 800 angstrom m and a tenth low refractive index layer of SiO2A layer having a thickness of 1200 angstroms and an eleventh high refractive index layer of Ti3O5Layer 700 angstroms thick and the twelfth low refractive index layer is SiO2A layer with a thickness of 600 angstrom meters and a thirteenth waterproof protective layer with a thickness of 300 angstrom meters.
Example 3
An Eimei antioxidant anti-infrared band pattern lens comprises a substrate and a film layer, wherein the film layer is positioned on the outer surface of the substrate. The rete begins outwards to extend by the one side that is close to the substrate, including the prime coat that stacks gradually, pattern oxidation resisting layer and anti infrared photosphere, wherein: the bottom layer consists of a first low-refractive-index thin film layer, a second high-refractive-index thin film layer and a third low-refractive-index thin film layer, wherein the first low-refractive-index thin film layer is adjacent to the substrate, and the third low-refractive-index thin film layer is adjacent to the pattern anti-oxidation layer; the pattern anti-oxidation layer consists of a pattern and a fourth oxidation resistant film layer, wherein the fourth oxidation resistant film layer is adjacent to the infrared-resistant layer; the infrared-resistant layer is composed of a fifth high-refractive-index thin film layer, a sixth low-refractive-index thin film layer, a seventh high-refractive-index thin film layer, an eighth low-refractive-index thin film layer, a ninth high-refractive-index thin film layer, a tenth low-refractive-index layer, an eleventh high-refractive-index layer and a twelfth low-refractive-index layer which are sequentially stacked, wherein the fifth high-refractive-index thin film layer is adjacent to the pattern oxidation-resistant layer. And the thirteenth waterproof protective layer is positioned on the outermost layer and is close to the twelfth low-refractive-index layer.
Specifically, the first low-refractive-index thin film layer is SiO2A layer of 120 angstroms thick and a second high refractive index thin film layer of Ta2O5Layer thickness of 220 angstrom, third low refractive index layer of SiO2A layer with a thickness of 120 angstrom, a fourth oxidation resistant thin film layer of nickel with a thickness of 300 angstrom, and a fifth high refractive index thin film layer of Ta2O5A layer of 380 angstroms thick and a sixth low refractive index film layer of SiO2A layer of 1180 angstroms thick and a seventh high index of refraction film layer of Ta2O5A layer with a thickness of 850 angstroms and an eighth low-refractive-index thin film layer of SiO2A layer of 1200 angstroms thick and a ninth high index of refraction film layer of Ta2O5Layer 850 angstrom thick and the tenth low refractive index layer of SiO2Layer 1280 angstroms thick, and the eleventh high refractive index layer is Ta2O5A layer with a thickness of 790 angstroms and a twelfth low refractive index layer of SiO2A layer 700 angstroms thick, a thirteenth water-resistant protective layer 350 angstroms thick.
Example 4
An Eimei antioxidant anti-infrared band pattern lens comprises a substrate and a film layer, wherein the film layer is positioned on the outer surface of the substrate. The rete begins outwards to extend by the one side that is close to the substrate, including the prime coat that stacks gradually, pattern oxidation resisting layer and anti infrared photosphere, wherein: the bottom layer consists of a first low-refractive-index thin film layer, a second high-refractive-index thin film layer and a third low-refractive-index thin film layer, wherein the first low-refractive-index thin film layer is adjacent to the substrate, and the third low-refractive-index thin film layer is adjacent to the pattern anti-oxidation layer; the pattern anti-oxidation layer consists of a pattern and a fourth oxidation resistant film layer, wherein the fourth oxidation resistant film layer is adjacent to the infrared-resistant layer; the infrared-resistant layer is composed of a fifth high-refractive-index thin film layer, a sixth low-refractive-index thin film layer, a seventh high-refractive-index thin film layer, an eighth low-refractive-index thin film layer, a ninth high-refractive-index thin film layer, a tenth low-refractive-index layer, an eleventh high-refractive-index layer and a twelfth low-refractive-index layer which are sequentially stacked, wherein the fifth high-refractive-index thin film layer is adjacent to the pattern oxidation-resistant layer. And the thirteenth waterproof protective layer is positioned on the outermost layer and is close to the twelfth low-refractive-index layer.
Specifically, the first low-refractive-index thin film layer is SiO2A layer of 90 angstrom thick and a second high refractive index film layer of ZrO2Layer thickness of 200 angstroms and a third low refractive index layer of SiO2The thickness of the layer is 90 angstrom meters, the fourth oxidation resistant thin film layer is a selenium layer, the thickness of the layer is 400 angstrom meters, and the fifth high refractive index thin film layer is ZrO2A layer with a thickness of 400 angstroms and a sixth low refractive index film layer of SiO2A layer with a thickness of 1200 angstrom m and a seventh high refractive index film layer of ZrO2A layer of 880 Angstrom thick and an eighth low refractive index film layer of SiO2A layer of 1180 angstroms thick and a ninth high index of refraction film layer of ZrO2Layer 780 Angstrom thick, the tenth low refractive index layer being SiO2A layer of 1230 Angstrom thickness and an eleventh high refractive index layer of ZrO2Layer with thickness of 800 angstrom and the twelfth low refractive index layer of SiO2A layer 750 angstroms thick, a thirteenth water-resistant protective layer 280 angstroms thick.
Example 5
An Eimei antioxidant anti-infrared band pattern lens comprises a substrate and a film layer, wherein the film layer is positioned on the outer surface of the substrate. The rete begins outwards to extend by the one side that is close to the substrate, including the prime coat that stacks gradually, pattern oxidation resisting layer and anti infrared photosphere, wherein: the bottom layer consists of a first low-refractive-index thin film layer, a second high-refractive-index thin film layer and a third low-refractive-index thin film layer, wherein the first low-refractive-index thin film layer is adjacent to the substrate, and the third low-refractive-index thin film layer is adjacent to the pattern anti-oxidation layer; the pattern anti-oxidation layer consists of a pattern and a fourth oxidation resistant film layer, wherein the fourth oxidation resistant film layer is adjacent to the infrared-resistant layer; the infrared-resistant layer is composed of a fifth high-refractive-index thin film layer, a sixth low-refractive-index thin film layer, a seventh high-refractive-index thin film layer, an eighth low-refractive-index thin film layer, a ninth high-refractive-index thin film layer, a tenth low-refractive-index layer, an eleventh high-refractive-index layer and a twelfth low-refractive-index layer which are sequentially stacked, wherein the fifth high-refractive-index thin film layer is adjacent to the pattern oxidation-resistant layer. And the thirteenth waterproof protective layer is positioned on the outermost layer and is close to the twelfth low-refractive-index layer.
Specifically, the first low-refractive-index thin film layer is SiO2A layer of 130 angstroms thick and a second high refractive index thin film layer of ZrO2Layer thickness of 180 angstroms and a third low refractive index layer of SiO2The thickness of the layer is 130 angstroms, the fourth oxidation resistant thin film layer is a mixed layer of selenium and nickel, the selenium thickness is 200 angstroms, the nickel thickness is 200 angstroms, and the fifth high refractive index thin film layer is ZrO2A layer with a thickness of 450 angstroms and a sixth low-refractive-index thin film layer of SiO2A layer of 1250 angstroms thick and a seventh high refractive index film layer of ZrO2Layer with thickness of 900 angstrom and eighth low refractive index film layer of SiO2A layer of 1250 angstroms thick and a ninth high refractive index film layer of ZrO2Layer 850 angstrom thick and the tenth low refractive index layer of SiO2A layer of 1330 Angstrom m in thickness and an eleventh high refractive index layer of ZrO2A layer with a thickness of 880 Angstrom and a twelfth low refractive index layer of SiO2A layer with a thickness of 850 angstrom meters and a thirteenth waterproof protective layer with a thickness of 450 angstrom meters.
Example 6
The method for preparing the antioxidant anti-infrared band pattern lens comprises the following steps:
(1) cleaning and drying the substrate, wherein the baking temperature is 40-65 ℃ and the baking time is 1-2 hours;
(2) sequentially carrying out vacuum coating of a bottom layer on the outer surface of the substrate;
A. placing the dried substrate on a jig, and sending the substrate into a vacuum chamber for vacuumizing;
B. when the vacuum degree of the vacuum chamber reaches less than or equal to 5 x 10-5Starting an ion source during Torr, and cleaning the surface of the substrate;
C. plating a priming layer on the outer surface of the substrate
When the vacuum degree of the vacuum chamber reaches less than or equal to 2.0 x 10-5Controlling the temperature of the vacuum chamber at 40-60 deg.C while Torr, bombarding the first low refractive index film layer material with electron gun, evaporating the material, and depositing on the surface of the substrate in the form of Hermitian moleculesSimultaneously controlling the evaporation rate of the first low-refractive-index thin film layer to be
The thickness of the first low-refractive-index thin film layer after final formation is 50-150 angstroms;
maintaining vacuum chamber vacuum degree less than or equal to 2.0 x 10-5Keeping the temperature of the vacuum chamber at 40-60 deg.C while Torr, bombarding the film material of the second high refractive index layer with electron gun, evaporating the material, depositing the evaporated material on the outer surface of the substrate in the form of Hermitian molecules, and controlling the evaporation rate of the second high refractive index layer to be
The thickness of the second high refractive index layer after final formation is 100-300 angstrom;
maintaining vacuum chamber vacuum degree less than or equal to 2.0 x 10-5Keeping the temperature of the vacuum chamber at 40-60 ℃ during Torr, bombarding the film material of the third low-refractive-index layer by using an electron gun, depositing the evaporated material on the outer surface of the substrate in the form of Hermitian molecules, and controlling the evaporation rate of the third low-refractive-index layer to be at the same time
The thickness of the third low refractive index layer after final formation is 50 to 150 angstroms;
(3) after the bottom coating is finished, flushing the vacuum chamber into the atmosphere, then taking out the substrate, and then printing or attaching a coating pattern on the bottom coating of the substrate;
(4) arranging the substrates on a jig, putting the substrates into a vacuum chamber for vacuumizing, and coating a fourth oxidation-resistant thin film layer;
when the vacuum degree of the vacuum chamber reaches less than or equal to 2.0 x 10-5Controlling the temperature of the vacuum chamber at 40-60 deg.C, bombarding the fourth oxidation-resistant film layer material with an electron gun, evaporating the material, depositing the material on the outer surface of the substrate in the form of Hermitian molecules, and controlling the evaporation rate of the fourth oxidation-resistant film layer to be
The thickness of the fourth oxidation resistant film layer after final formation is 100-400 angstrom;
(5) after the film coating is finished, flushing the vacuum chamber into the atmosphere, then taking out the substrate, and then removing ink or copper templates or removing static pastes on the substrate;
(6) cleaning and drying the substrate, wherein the baking temperature is 40-60 ℃ and the baking time is 30 minutes;
(7) coating the outer surface of the substrate with an infrared-resistant layer
A. Placing the dried substrate on a jig, and sending the substrate into a vacuum chamber for vacuumizing;
B. when the vacuum degree of the vacuum chamber reaches less than or equal to 5 x 10-5Starting an ion source during Torr, and cleaning the surface of the substrate;
maintaining vacuum chamber vacuum degree less than or equal to 2.0 x 10-5Keeping the temperature of the vacuum chamber at 40-60 ℃ during Torr, bombarding a fifth high-refractive-index thin film layer material by using an electron gun, depositing the material on the outer surface of the substrate in a Hermite molecular form after evaporation, and simultaneously controlling the evaporation rate of the fifth high-refractive-index thin film layer to be
The thickness of the fifth high-refractive-index thin film layer after final formation is 200-500 angstrom;
maintaining vacuum chamber vacuum degree less than or equal to 2.0 x 10-5Keeping the temperature of the vacuum chamber at 40-60 ℃ during Torr, bombarding the material of the sixth low-refractive-index thin film layer by using an electron gun, depositing the sixth low-refractive-index thin film layer on the outer surface of the substrate in a Hermitian molecular form after evaporation, and simultaneously controlling the evaporation rate of the sixth low-refractive-index thin film layer to be
The thickness of the sixth low-refractive-index thin film layer after final formation is 1000-1300 angstroms;
maintaining vacuum chamber vacuum degree less than or equal to 2.0 x 10-5While Torr, while maintaining the temperature of the vacuum chamber at 40-60 deg.C, bombarding the first with an electron gunSeven high refractive index film layer materials, wherein the seventh high refractive index film layer material is evaporated and then deposited on the outer surface of the substrate in the form of Hermitian molecules, and the evaporation rate of the seventh high refractive index film layer is controlled to be
The thickness of the seventh high refractive index thin film layer after final formation is 650-950 angstrom;
maintaining vacuum chamber vacuum degree less than or equal to 2.0 x 10-5Keeping the temperature of the vacuum chamber at 40-60 ℃ during Torr, bombarding the material of the eighth low-refractive-index thin film layer by using an electron gun, depositing the eighth low-refractive-index thin film layer on the outer surface of the substrate in a Hermitian molecular form after evaporation, and simultaneously controlling the evaporation rate of the eighth low-refractive-index thin film layer to be
The thickness of the eighth low-refractive-index thin film layer after final formation is 1000-1300 angstroms;
maintaining vacuum chamber vacuum degree less than or equal to 2.0 x 10-5Keeping the temperature of the vacuum chamber at 40-60 ℃ during Torr, bombarding the ninth high-refractive-index thin film layer material by using an electron gun, depositing the ninth high-refractive-index thin film layer material on the outer surface of the substrate in a Hermite molecular form after evaporating, and controlling the evaporation rate of the ninth high-refractive-index thin film layer material to be
The thickness of the ninth high refractive index thin film layer material after final formation is 500-900 angstrom;
maintaining vacuum chamber vacuum degree less than or equal to 2.0 x 10-5Keeping the temperature of the vacuum chamber at 40-60 ℃ during Torr, bombarding the material of the film layer with the tenth low refractive index by adopting an electron gun, depositing the film layer with the tenth low refractive index on the outer surface of the substrate in a Hermitian molecular form after evaporating, and simultaneously controlling the evaporation rate of the film layer with the tenth low refractive index to be
The tenth low refractive index film layerThe thickness after final formation is 1000-1400 angstrom;
maintaining vacuum chamber vacuum degree less than or equal to 2.0 x 10-5Keeping the temperature of the vacuum chamber at 40-60 ℃ during Torr, bombarding an eleventh high-refractive-index thin film layer material by using an electron gun, evaporating the eleventh high-refractive-index thin film layer material, depositing the eleventh high-refractive-index thin film layer material on the outer surface of the substrate in a Hermite molecular form, and controlling the evaporation rate of the eleventh high-refractive-index thin film layer to be equal to
The thickness of the eleventh high-refractive-index thin film layer after final formation is 550-950 angstrom;
maintaining vacuum chamber vacuum degree less than or equal to 2.0 x 10-5Keeping the temperature of the vacuum chamber at 40-60 ℃ during Torr, bombarding the material of the twelfth low-refractive-index thin film layer by using an electron gun, depositing the twelfth low-refractive-index thin film layer on the outer surface of the substrate in a Hermitian molecular form after evaporation, and simultaneously controlling the evaporation rate of the twelfth low-refractive-index thin film layer to be
The thickness of the twelfth low-refractive-index thin film layer after final formation is 300-950 angstrom meters, and the infrared-resistant layer is formed.
(8) After the preparation of the infrared light resistant film layer is finished, the inner surface of the substrate is plated with a protective layer: maintaining vacuum chamber vacuum degree less than or equal to 2.0 x 10-5When the temperature of the vacuum chamber is kept at 40-60 ℃ during Torr, a tungsten boat is adopted to heat the film material waterproof material of the thirteenth film layer, the thirteenth film layer is evaporated and then deposited on the outer surface of the substrate in a micron-level molecular form, and the evaporation rate of the thirteenth film layer is controlled to be 40-60 DEG C
The thirteenth thin film layer is formed to a thickness of 50-300 angstroms to form a protective layer.
Comparative example 1
The common Eimei anti-infrared lens comprises a substrate and a film layer, wherein the film layer is positioned on the outer surface of the substrate. The film layer begins to extend outwards by the side close to the substrate, and is composed of a first low-refractive-index film layer, a second high-refractive-index film layer and a third low-refractive-index film layer in sequence, and a fourth high-refractive-index film layer, a fifth low-refractive-index film layer, a sixth high-refractive-index film layer, a seventh low-refractive-index film layer, an eighth high-refractive-index film layer, a ninth low-refractive-index layer and a tenth waterproof protective layer.
Specifically, the first low-refractive-index thin film layer is a silicon-aluminum mixture layer with the thickness of 80 angstroms, and the second high-refractive-index thin film layer is Ti3O5A layer with a thickness of 300 angstrom m, a third low refractive index layer of a silicon-aluminum mixture layer with a thickness of 1100 angstrom m, and a fourth high refractive index thin film layer of Ti3O5A layer with a thickness of 750 angstroms, a fifth low refractive index thin film layer of Si-Al mixture with a thickness of 1100 angstroms, and a sixth high refractive index thin film layer of Ti3O5The layer with the thickness of 700 angstroms, the seventh low-refractive-index thin film layer is a silicon-aluminum mixture layer with the thickness of 1100 angstroms, and the eighth high-refractive-index thin film layer is Ti3O5The layer, thickness is 650 angstroms meters, and the ninth low refracting index layer is silicon-aluminum mixture layer, and thickness is 500 angstroms meters, and tenth waterproof layer, thickness are 200 angstroms meters.
Performance detection
The lenses in the embodiment 1 and the comparative example 1 are tested, and the reflectivity of the lens in the embodiment 1 to the wavelength of 380-.
The average reflectivity and the saline soak resistance time of the lenses of example 1 and comparative example 1 are shown in table 1.
TABLE 1 Performance test Table
| Item | Example 1 | Example 2 | Example 3 | Example 4 | Example 5 | Example 6 | Comparative example 1 |
| Average reflectance/%) | 65 | 71 | 68 | 68 | 69 | 67 | 58 |
| Oxidation resistance QUV test/h | 190 | 200 | 194 | 188 | 201 | 196 | 90 |
As can be seen from Table 1, the average reflectivity of the lens prepared by the method of the invention at the wavelength of 750-1100nm is more than 65%, and the lens has obvious anti-infrared effect; in a QUV test, the film can resist the color fading of an oxidation resistance test film for about 190h and has good oxidation resistance.
The above detailed description describes the preferred embodiments of the present invention, but the present invention is not limited to the details of the above embodiments, and the technical idea of the present invention can be within the scope of the present invention, and can be right to the technical solution of the present invention, and these simple modifications all belong to the protection scope of the present invention.
It should be noted that the various features described in the above embodiments may be combined in any suitable manner without departing from the scope of the invention. In order to avoid unnecessary repetition, the present invention does not separately describe various possible combinations.
In addition, various embodiments of the present invention can be combined arbitrarily, and the disclosed content should be regarded as the present invention as long as it does not violate the idea of the present invention.
Claims (10)
1. An anti-oxidation anti-infrared band pattern lens of amesdia which is characterized in that: the anti-oxidation anti-infrared light band pattern lens of the angstrom includes the substrate and sets up the rete on substrate surface, the rete includes base coat, pattern oxidation resisting layer and the anti infrared photosphere that stacks gradually from inside to outside, wherein: the pattern anti-oxidation layer consists of a pattern and a fourth oxidation resistant film layer, wherein the fourth oxidation resistant film layer is adjacent to the infrared-resistant layer; the pattern in the pattern oxidation resisting layer is any one of an ink printing pattern, a copper template attaching pattern or an electrostatic attaching pattern; the fourth oxidation resistant film layer in the pattern oxidation resistant layer is a selenium layer, a nickel layer or a combined layer of the selenium layer and the nickel layer; the infrared resistant layer is composed of high-refractive-index film layers and low-refractive-index film layers alternately.
2. The emm antioxidant anti-infrared band patterned lens of claim 1, wherein: the film layer covers the outer surface of the substrate.
3. The emm antioxidant anti-infrared band patterned lens of claim 1, wherein: the substrate is any one of an acrylic substrate, a polycarbonate substrate, a nylon substrate, a CR-39 substrate or a glass substrate.
4. The emm antioxidant anti-infrared band patterned lens of claim 1, wherein: the bottom layer is composed of low-refractive-index thin film layers and high-refractive-index thin film layers alternately, wherein the low-refractive-index thin film layers are adjacent to the pattern anti-oxidation layer; the high refractive index layer is ZrO2Layer, Ti3O5Layer or Ta2O5Any one of the layers; the low refractive index layer is SiO2Layers, silicon-aluminium mixtures or MgF2Any of the layers.
5. The Am antioxidant anti-IR band patterned lens of any of claims 1-4, wherein: the bottom layer is composed of a first low-refractive-index thin film layer, a second high-refractive-index thin film layer and a third low-refractive-index thin film layer, wherein the first low-refractive-index thin film layer is close to the substrate, and the third low-refractive-index thin film layer is close to the pattern anti-oxidation layer.
6. The Am antioxidant anti-infrared band patterned lens of claim 5, wherein: the infrared-resistant layer is composed of a fifth high-refractive-index thin film layer, a sixth low-refractive-index thin film layer, a seventh high-refractive-index thin film layer, an eighth low-refractive-index thin film layer, a ninth high-refractive-index thin film layer, a tenth low-refractive-index layer, an eleventh high-refractive-index layer and a twelfth low-refractive-index layer which are sequentially stacked, wherein the fifth high-refractive-index thin film layer is adjacent to the pattern oxidation-resistant layer.
7. The Am antioxidant anti-infrared band patterned lens of claim 6, wherein: the thickness of the first low-refractive-index thin film layer in the bottom layer is 50-150 angstroms, the thickness of the second high-refractive-index thin film layer is 100-300 angstroms, and the thickness of the third low-refractive-index thin film layer is 50-150 angstroms; the thickness of the fourth oxidation resistant thin film layer in the pattern oxidation resistant layer is 100-400 angstroms; the thicknesses of the fifth high-refractive-index thin film layer, the sixth low-refractive-index thin film layer, the seventh high-refractive-index thin film layer, the eighth low-refractive-index thin film layer, the ninth high-refractive-index thin film layer, the tenth low-refractive-index thin film layer, the eleventh high-refractive-index thin film layer and the twelfth low-refractive-index thin film layer in the infrared-resistant layer are 200-152 angstrom, 1000-charge 1300 angstrom, 650-charge 950 angstrom, 1000-charge 1300 angstrom, 500-charge 900 angstrom, 1000-charge 1400 angstrom, 550-charge 950 angstrom and 300-charge 950 angstrom.
8. The emm antioxidant anti-infrared band patterned lens of claim 7, wherein: the thickness of a first low-refractive-index thin film layer in the bottom layer is 100 angstroms, the thickness of a second high-refractive-index thin film layer is 200 angstroms, and the thickness of a third low-refractive-index thin film layer is 100 angstroms; the thickness of the fourth thin film layer in the patterned anti-oxidation layer is 300 angstroms; the thicknesses of a fifth high-refractive-index thin film layer, a sixth low-refractive-index thin film layer, a seventh high-refractive-index thin film layer, an eighth low-refractive-index thin film layer, a ninth high-refractive-index thin film layer, a tenth low-refractive-index thin film layer, an eleventh high-refractive-index thin film layer and a twelfth low-refractive-index thin film layer in the infrared-resistant layer are 350 angstroms m, 1150 angstroms m, 850 angstroms, 1150 angstroms, 800 angstroms, 1200 angstroms, 750 angstroms and 600 angstroms in sequence.
9. The Am antioxidant anti-infrared band patterned lens of any of claims 1-4, wherein: the protective layer covers the surface of one side, far away from the substrate, of the infrared-resistant layer, and is a waterproof layer, and the thickness of the protective layer is 50-500 angstroms.
10. The emm antioxidant anti-infrared band patterned lens of claim 9, wherein: the thickness of the protective layer is 120-300 angstrom.
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| CN201922277940.6U CN210982787U (en) | 2019-12-18 | 2019-12-18 | Anti-oxidation anti-infrared light band pattern lens of Eimei |
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