CN210886206U - Double-chamber magnetron sputtering vacuum coating machine - Google Patents
Double-chamber magnetron sputtering vacuum coating machine Download PDFInfo
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- CN210886206U CN210886206U CN201921885786.4U CN201921885786U CN210886206U CN 210886206 U CN210886206 U CN 210886206U CN 201921885786 U CN201921885786 U CN 201921885786U CN 210886206 U CN210886206 U CN 210886206U
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- magnetron sputtering
- coating machine
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Abstract
The utility model relates to a vacuum coating machine technical field discloses a two room magnetron sputtering vacuum coating machines, including the coating machine frame, transversely be equipped with the magnetic control base plate on the coating machine frame, the side all is equipped with the magnetron sputtering device around the magnetic control base plate, the side all articulates around the magnetic control base plate has can cover rather than side magnetron sputtering device and establish airtight complex coating machine cover, and the upset of coating machine cover level, the inboard level of coating machine cover is equipped with carries the thing base station, be equipped with the vacuum generator with closed cavity evacuation between coating machine cover and the magnetron substrate on the coating machine frame, be equipped with on the coating machine frame with the vacuum generator, magnetron sputtering device complex regulation control box. The utility model solves the problems of small application range and low processing efficiency of the existing magnetron sputtering vacuum coating machine.
Description
Technical Field
The utility model relates to a vacuum coating machine technical field, in particular to two rooms magnetron sputtering vacuum coating machine.
Background
The vacuum coating machine mainly refers to a coating machine which needs to be carried out under a higher vacuum degree, and specifically comprises various types, including vacuum ion evaporation, magnetron sputtering, MBE molecular beam epitaxy, PLD laser sputtering deposition and the like. The main idea is to divide into evaporation and sputtering.
Vacuum coating is a coating technology at the forefront at present, a magnetron sputtering coating method in the vacuum coating adopts a method of discharging electrons through an electrified anode, and enabling the electrons to collide with gas molecules in a vacuum cavity under the acceleration action of an electric field so as to ionize the gas molecules, the ionized gas molecules bombard metal particles on a cathode under the action of the electric field so as to ionize and sputter the metal particles, and the ionized metal ions are deposited on the surface of a workpiece to be coated to form a film, wherein in order to enable the electrons to more efficiently collide with the gas molecules so as to improve the ionization rate of the gas molecules, a magnet is arranged in the cathode to form a magnetron cathode, so that the electrons form a spiral track in the vacuum cavity under the combined action of the electric field and the magnetic field so as to increase the collision probability of the electrons and the gas molecules.
The magnetron sputtering vacuum coating machine used at present is a single processing chamber, can only process the coating of the same type of substrates, can not simultaneously carry out the coating of the substrates of different types, has the problem of small application range, and has the problem of low working efficiency when carrying out coating processing, so that the magnetron sputtering vacuum coating machine with two chambers is urgently needed to solve the problems.
SUMMERY OF THE UTILITY MODEL
Based on the above problem, the utility model provides a two room magnetron sputtering vacuum coating machines has solved the problem that current magnetron sputtering vacuum coating machine application scope is little, machining efficiency is low.
For solving the above technical problem, the utility model discloses a technical scheme as follows:
the utility model provides a two room magnetron sputtering vacuum coating machine, including the coating machine frame, transversely be equipped with the magnetron substrate on the coating machine frame, the side all is equipped with magnetron sputtering device around the magnetron substrate, the side all articulates around the magnetron substrate has rather than the side magnetron sputtering device can cover establishes airtight complex coating machine aircraft bonnet, and the upset of coating machine aircraft bonnet level, the inboard level of coating machine aircraft bonnet is equipped with carries the thing base station, be equipped with on the coating machine frame with the vacuum generator who seals the cavity evacuation between coating machine aircraft bonnet and the magnetron substrate, be equipped with on the coating machine frame with vacuum generator, magnetron sputtering device complex regulation control box.
The utility model discloses a principle and effect: the magnetron sputtering devices on the front side and the rear side of the magnetron substrate are respectively provided with different types of targets, substrates are placed in the two film plating machine covers, the two film plating machine covers are turned over to enable the film plating machine covers and the carrying substrate to form a closed cavity, the film plating machine covers are arranged on the magnetron sputtering devices, an adjusting control box is connected with a vacuum generating device, the vacuum generating device vacuumizes the closed cavity between the film plating machine covers and the carrying substrate into a vacuum state, the adjusting control box enables the magnetron sputtering devices to bombard the targets, so that the surface components of the targets are sputtered out in the form of atomic groups or ions and finally deposited on the surface of the substrates to finally form a film through a film forming process, in the process, the two sides of the sputtering substrate are provided with the matched film plating machine covers to form two independent processing chambers, the film plating work of different types can be carried out in the two processing chambers, and the problem that the, by arranging the two processing chambers, the film coating efficiency of the substrate is increased. The utility model solves the problems of small application range and low processing efficiency of the existing magnetron sputtering vacuum coating machine.
As a preferred mode, a storage box is arranged in the coating machine base.
As a preferred mode, the bottom side of the coating machine base is provided with a four-wheel traveling mechanism which consists of four universal wheels.
As a preferred mode, the adjusting control box and the magnetic control substrate are both arranged on the upper side of the coating machine base, the adjusting control box and the magnetic control substrate are arranged adjacently, and the vacuum generating device is arranged on one side far away from the adjusting control box.
As a preferred mode, the adjusting control box is provided with a liquid crystal display screen, a vacuum barometer, an ammeter, a start-stop switch of the vacuum generating device and a start-stop switch of the magnetron sputtering device.
As a preferable mode, the film coating machine cover is in a semi-cylinder shape, a notch with a shape similar to that of the film coating machine cover is arranged on the film coating machine cover, the notch faces the magnetron substrate, one side of the film coating machine cover is hinged with the magnetron substrate on one side of the magnetron sputtering device, and a mechanical lock connected with the magnetron substrate is arranged on the other side of the film coating machine cover.
In a preferable mode, a sealing gasket is arranged on one side of the film plating machine cover, which is opposite to the magnetic control substrate in a sealing mode.
Compared with the prior art, the beneficial effects of the utility model are that:
(1) the utility model solves the problems of small application range and low processing efficiency of the existing magnetron sputtering vacuum coating machine.
(2) The utility model discloses a be equipped with the storage tank in the coating film frame. Two storage boxes are symmetrically arranged in the coating machine base and can be used for storing articles, and the influence on the attractiveness due to too many parts can be avoided.
(3) The utility model discloses a coating film frame bottom side is equipped with positive four-wheel running gear, and positive four-wheel running gear comprises four universal wheels. Just four-wheel running gear makes the utility model discloses have the removal function, increased this device's application range, the direction of movement of this device of control that the universal wheel can be fine.
(4) The utility model discloses an adjusting control case and magnetic control base plate all set up the upside at the coating film frame, and adjusting control case and the adjacent setting of magnetic control base plate, and vacuum generator sets up the one side of keeping away from adjusting control case. The adjusting control box, the magnetic control substrate and the adjacent fixed arrangement increase the stability of the structure of the device.
(5) The utility model discloses a be equipped with opening of liquid crystal display, vacuum barometer, ampere meter, vacuum generating device and open opening of opening switch, magnetron sputtering device and open the switch. The starting and stopping switch of the vacuum generating device realizes one-key starting and stopping of the vacuum generating device, so that the vacuum generating device is convenient to control, the purpose of vacuumizing between the loading substrate and the coating machine cover is achieved in time, the starting and stopping switch of the magnetron sputtering device can realize independent and autonomous control of the magnetron sputtering device, and the vacuum barometer is convenient to detect the air pressure between the loading substrate and the coating machine cover.
(6) The utility model discloses a coating machine aircraft bonnet is the halfcylinder form, is equipped with the notch rather than the shape is similar on the coating machine aircraft bonnet, and the notch is towards the magnetic control base plate, and one side of coating machine aircraft bonnet is articulated with the magnetic control base plate of magnetic control sputtering device one side, and the opposite side of coating machine aircraft bonnet is equipped with the mechanical lock of being connected with the magnetic control base plate. An independent processing chamber is formed between the notch of the film coating machine cover and the magnetic control substrate, so that the film coating work of the substrate is finished in the notch, and the stability of connection of the film coating machine cover and the magnetic control substrate is improved due to the design of a mechanical lock.
(7) The utility model discloses a sealed relative one side of coating film aircraft bonnet and magnetic control base plate is equipped with seal gasket. The sealing gasket design increases the connection tightness of the film coating machine cover and the magnetic control substrate, and prevents leakage.
Drawings
FIG. 1 is a schematic structural view of the present invention;
FIG. 2 is an enlarged view of a portion of FIG. 1;
FIG. 3 is a side view of the coater housing of FIG. 1;
the labels in the figure are: the device comprises a 1-right four-wheel traveling mechanism, a 2-coating machine base, a 3-adjusting control box, a 4-magnetron substrate, a 5-magnetron sputtering device, a 6-coating machine cover, a 7-vacuum generating device, an 8-carrying base station, a 9-storage box and a 10-mechanical lock.
Detailed Description
The present invention will be further described with reference to the accompanying drawings. Embodiments of the present invention include, but are not limited to, the following examples.
Example 1:
the utility model provides a two room magnetron sputtering vacuum coating machine, including coating film frame 2, transversely be equipped with magnetron substrate 4 on the coating film frame 2, magnetron sputtering device 5 is all equipped with to the side around magnetron substrate 4, magnetron substrate 4 all articulates in the side has and can cover rather than side magnetron sputtering device 5 and establish airtight complex coating machine aircraft bonnet 6, and 6 horizontal upsets of coating machine aircraft bonnet, 6 inboard levels of coating machine aircraft bonnet are equipped with carry thing base station 8, be equipped with on the coating film frame 2 with the vacuum generator 7 of closed cavity evacuation between coating machine aircraft bonnet 6 and magnetron substrate 4, be equipped with on the coating film frame 2 with vacuum generator 7, magnetron sputtering device 5 complex regulation control box 3.
The utility model discloses a principle and effect: different types of target materials are respectively arranged on the magnetron sputtering devices 5 at the front side and the rear side of the magnetron substrate 4, substrates are arranged in the two film plating machine covers 6, the two film plating machine covers 6 are turned over to enable the film plating machine covers 6 and the object carrying substrate to form a closed cavity, the magnetron sputtering devices 5 are covered on the film plating machine covers 6, the adjusting control box 3 is connected with the vacuum generating device 7, the vacuum generating device 7 vacuumizes the closed cavity between the film plating machine covers 6 and the object carrying substrate into a vacuum state, the magnetron sputtering devices 5 bombard the target materials by adjusting the control box 3 to enable surface components of the target materials to be sputtered out in a radical or ion form and finally deposited on the surfaces of the substrates to form films after undergoing a film forming process, in the process, the two independent processing chambers are formed by arranging the matched film plating machine covers 6 at the two sides of the sputtering substrate, and different types of film plating work can be, the problem that the existing magnetron sputtering vacuum coating machine is small in application range is solved, and the coating efficiency of the substrate is improved by arranging two processing chambers. The utility model solves the problems of small application range and low processing efficiency of the existing magnetron sputtering vacuum coating machine.
Example 2:
the embodiment is further optimized on the basis of the embodiment 1, and specifically comprises the following steps:
a storage box 9 is arranged in the coating machine base 2. Two storage boxes 9 are symmetrically arranged in the coating machine base 2 and can be used for storing objects, and the influence on the attractiveness due to too many parts can be avoided.
As a preferred mode, the bottom side of the film coating machine base 2 is provided with a four-wheel walking mechanism 1, and the four-wheel walking mechanism consists of four universal wheels. Just four-wheel running gear 1 makes the utility model discloses have the removal function, increased this device's application range, this device's of control moving direction that the universal wheel can be fine.
As a preferable mode, the adjusting control box 3 and the magnetron substrate 4 are both arranged on the upper side of the coating machine base 2, the adjusting control box 3 is arranged adjacent to the magnetron substrate 4, and the vacuum generating device 7 is arranged on the side far away from the adjusting control box 3. The adjusting control box 3, the magnetic control substrate 4 are adjacently and fixedly arranged, so that the structural stability of the device is improved.
As a preferable mode, the adjusting control box 3 is provided with a liquid crystal display screen, a vacuum barometer, an ammeter, a start-stop switch of the vacuum generating device 7, and a start-stop switch of the magnetron sputtering device 5. The start-stop switch of the vacuum generating device 7 realizes the one-key start-stop of the vacuum generating device 7, so that the vacuum generating device 7 is convenient to control, the purpose of vacuumizing between the loading substrate and the coating machine cover 6 is achieved in time, the start-stop switch of the magnetron sputtering device 5 can realize the independent and autonomous control of the magnetron sputtering device 5, and the vacuum barometer is convenient to detect the air pressure between the loading substrate and the coating machine cover 6.
Preferably, the coating machine cover 6 is in a semi-cylinder shape, the coating machine cover 6 is provided with a notch with a shape similar to that of the semi-cylinder, the notch faces the magnetron substrate 4, one side of the coating machine cover 6 is hinged with the magnetron substrate 4 on one side of the magnetron sputtering device 5, and the other side of the coating machine cover 6 is provided with a mechanical lock 10 connected with the magnetron substrate 4. An independent processing chamber is formed between the notch of the film coating machine cover 6 and the magnetic control substrate 4, so that the film coating work of the substrate is completed in the notch, and the stability of connection of the film coating machine cover 6 and the magnetic control substrate 4 is improved due to the design of the mechanical lock 10.
In a preferable mode, a sealing gasket is arranged on the side of the film plating cover 6 opposite to the magnetron substrate 4 in a sealing mode. The sealing gasket design increases the connection tightness of the film coating machine cover 6 and the magnetic control substrate 4, and prevents leakage.
The other parts of this embodiment are the same as embodiment 1, and are not described herein again.
The embodiment of the present invention is the above. The specific parameters in the above embodiments and examples are only for the purpose of clearly showing the verification process of the present invention, and are not used to limit the patent protection scope of the present invention, which is still subject to the claims, and all the equivalent structural changes made by using the contents of the specification and the drawings of the present invention should be included in the protection scope of the present invention.
Claims (7)
1. The utility model provides a two room magnetron sputtering vacuum coating machine, includes coating film frame (2), its characterized in that, transversely be equipped with magnetron substrate (4) on coating film frame (2), the side all is equipped with magnetron sputtering device (5) around magnetron substrate (4), the side all articulates around magnetron substrate (4) has and can cover with its side magnetron sputtering device (5) and establish airtight complex coating film aircraft bonnet (6), and coating film aircraft bonnet (6) horizontal upset, the inboard level of coating film aircraft bonnet (6) is equipped with objective base platform (8), be equipped with on coating film frame (2) with vacuum generator (7) of closed cavity evacuation between coating film aircraft bonnet (6) and magnetron substrate (4), be equipped with on coating film frame (2) with vacuum generator (7), magnetron sputtering device (5) complex regulation control box (3).
2. A double-chamber magnetron sputtering vacuum coater according to claim 1, characterized in that a storage box (9) is arranged in the coater base (2).
3. The dual-chamber magnetron sputtering vacuum coater according to claim 2, wherein the bottom side of the coater base (2) is provided with a four-wheel traveling mechanism (1), and the four-wheel traveling mechanism is composed of four universal wheels.
4. A twin chamber magnetron sputtering vacuum coater according to claim 1 wherein the regulating control box (3) and the magnetron substrate (4) are both arranged on the upper side of the coater base (2), and the regulating control box (3) and the magnetron substrate (4) are arranged adjacently, and the vacuum generating device (7) is arranged on the side far away from the regulating control box (3).
5. A double-chamber magnetron sputtering vacuum coating machine according to claim 4, characterized in that the adjusting control box (3) is provided with a liquid crystal display screen, a vacuum barometer, an ammeter, a start-stop switch of the vacuum generating device (7) and a start-stop switch of the magnetron sputtering device (5).
6. A dual-chamber magnetron sputtering vacuum coater according to claim 1, wherein the coater housing (6) is a semi-cylinder, the coater housing (6) is provided with a notch similar to the shape of the coater housing, the notch faces the magnetron substrate (4), one side of the coater housing (6) is hinged with the magnetron substrate (4) on one side of the magnetron sputtering device (5), and the other side of the coater housing (6) is provided with a mechanical lock (10) connected with the magnetron substrate (4).
7. A double-chamber magnetron sputtering vacuum coater according to claim 6, characterized in that the side of the coater hood (6) opposite to the magnetron substrate (4) is provided with a sealing gasket.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921885786.4U CN210886206U (en) | 2019-11-04 | 2019-11-04 | Double-chamber magnetron sputtering vacuum coating machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921885786.4U CN210886206U (en) | 2019-11-04 | 2019-11-04 | Double-chamber magnetron sputtering vacuum coating machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN210886206U true CN210886206U (en) | 2020-06-30 |
Family
ID=71338675
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201921885786.4U Expired - Fee Related CN210886206U (en) | 2019-11-04 | 2019-11-04 | Double-chamber magnetron sputtering vacuum coating machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN210886206U (en) |
-
2019
- 2019-11-04 CN CN201921885786.4U patent/CN210886206U/en not_active Expired - Fee Related
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| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20200630 Termination date: 20211104 |
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| CF01 | Termination of patent right due to non-payment of annual fee |