CN210701511U - Novel cavity cleaning device of plasma cleaning machine - Google Patents
Novel cavity cleaning device of plasma cleaning machine Download PDFInfo
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- CN210701511U CN210701511U CN201921741297.1U CN201921741297U CN210701511U CN 210701511 U CN210701511 U CN 210701511U CN 201921741297 U CN201921741297 U CN 201921741297U CN 210701511 U CN210701511 U CN 210701511U
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- frequency power
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- 238000004140 cleaning Methods 0.000 title claims abstract description 67
- 239000003990 capacitor Substances 0.000 claims description 14
- 239000004020 conductor Substances 0.000 claims description 7
- 229910001094 6061 aluminium alloy Inorganic materials 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 239000000956 alloy Substances 0.000 claims description 3
- 238000012423 maintenance Methods 0.000 abstract description 7
- 238000013461 design Methods 0.000 abstract description 5
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 239000002356 single layer Substances 0.000 abstract description 3
- 230000005684 electric field Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000003344 environmental pollutant Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 231100000719 pollutant Toxicity 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002957 persistent organic pollutant Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
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Abstract
The utility model belongs to the technical field of ion cleaning machines, in particular to a cavity cleaning device of a novel plasma cleaning machine, which comprises a radio frequency power supply module, a matcher and a cleaning cavity; the cleaning cavity comprises a cavity body and an electrode frame positioned in the cavity body; the output end of the radio frequency power supply module is connected with the input end of a matcher, the output end of the matcher is connected with an electrode frame, and the cavity is grounded. The utility model discloses a single-layer electrode design regards electrode frame as the anode electrode, regards the cavity as the cathode electrode, and simple structure easily washs the maintenance, has reduced manufacturing cost.
Description
Technical Field
The utility model belongs to the technical field of the ion cleaning machine, concretely relates to novel cavity of plasma cleaning machine washs device.
Background
The plasma cleaner is also called a plasma surface treatment instrument, and plasma is used for achieving the effect which cannot be achieved by a conventional cleaning method. The principle of the plasma cleaning equipment is that gas atoms are ionized into positive ions and electrons under the action of an electric field (namely, radio frequency), the positive ions move towards the direction of a cathode under the action of the electric field in an accelerated manner to bombard photoresist on the surface of a lead frame, and the photoresist removing and cleaning effect is achieved.
The existing plasma cleaning structure is complex, and a cathode and an anode are usually arranged, so that the cleaning and maintenance are troublesome, the cleaning time is longer, and pollutants in an electrode groove are difficult to clean.
SUMMERY OF THE UTILITY MODEL
To the defect among the prior art, the utility model discloses a novel cavity cleaning device of plasma cleaning machine adopts the design of individual layer electrode, regards electrode frame as the positive pole electrode, regards the cavity as the negative pole electrode, simple structure easily washs the maintenance, has reduced manufacturing cost.
The utility model provides a cavity cleaning device of a novel plasma cleaning machine, which comprises a radio frequency power supply module, a matcher and a cleaning cavity;
the cleaning cavity comprises a cavity body and an electrode frame positioned in the cavity body;
the output end of the radio frequency power supply module is connected with the input end of a matcher, the output end of the matcher is connected with an electrode frame, and the cavity is grounded.
Preferably, the radio frequency power supply module comprises a radio frequency power supply and a resistor R;
the negative pole of the radio frequency power supply is grounded, the positive pole of the radio frequency power supply is connected with one end of a resistor R, and the other end of the resistor R is connected with the input end of a matcher.
Preferably, the matcher comprises a capacitor C1, an inductor L and a capacitor Ct;
the other end of the resistor R is connected with the electrode frame through an inductor L and a capacitor Ct which are sequentially connected in series, and the common end of the resistor R and the inductor L is grounded through a capacitor C1.
Preferably, the electrode frame comprises a horizontal electrode plate and an electrical conductor;
the cavity comprises a cavity upper cover and a cavity lower cover, and the cavity lower cover is provided with a through hole;
the lower cover of the cavity is provided with the horizontal electrode plate, and the electric conductor penetrates through the through hole and then is fixed on the lower surface of the horizontal electrode plate.
Preferably, the cavity cleaning device of the novel plasma cleaning machine further comprises a main controller, and the main controller is electrically connected with the radio frequency power supply.
Preferably, the radio frequency used by the radio frequency power supply is 13.56 MHZ.
Preferably, the cavity is made of SUS304 material.
Preferably, the horizontal electrode plate is made of 6061 aluminum alloy material.
The technical scheme of the utility model, adopt the design of individual layer electrode, regard electrode frame as the anode electrode, regard the cavity as the cathode electrode, simple structure easily washs the maintenance, has reduced manufacturing cost.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the embodiments or the technical solutions in the prior art will be briefly described below. Throughout the drawings, like elements or portions are generally identified by like reference numerals. In the drawings, elements or portions are not necessarily drawn to scale.
Fig. 1 is a schematic structural diagram of a chamber cleaning device of the novel plasma cleaning machine in the embodiment;
reference numerals:
1-radio frequency power supply module, 2-matcher, 3-electrode frame and 4-cavity
31-horizontal electrode plate, 32-conductor
41-cavity upper cover and 42-cavity lower cover
Detailed Description
Embodiments of the present invention will be described in detail below with reference to the accompanying drawings. The following examples are only for illustrating the technical solutions of the present invention more clearly, and therefore are only examples, and the protection scope of the present invention is not limited thereby.
Example (b):
the utility model provides a cavity cleaning device of a novel plasma cleaning machine, which comprises a radio frequency power supply module, a matcher 2 and a cleaning cavity, as shown in figure 1;
the cleaning cavity comprises a cavity 4 and an electrode frame 3 positioned in the cavity 4;
the output end of the radio frequency power supply module is connected with the input end of a matcher 2, the output end of the matcher 2 is connected with an electrode frame 3, and the cavity 4 is grounded.
The principle of plasma cleaning is that under the vacuum state, the pressure is smaller and smaller, the intermolecular distance is larger and smaller, the high-voltage alternating electric field between the cathode electrode and the anode electrode generated by the radio frequency power supply is utilized to vibrate working gases such as oxygen, argon, hydrogen and the like into ions with high reaction activity or high energy, then the working gases react with or collide with organic pollutants and microparticle pollutants on a product to form volatile substances, and then the volatile substances are removed by the working gases and a vacuum pump, so that the purpose of cleaning the surface of the product is achieved.
The existing cleaning machine is usually provided with a positive layer electrode and a negative layer electrode in a cleaning cavity, so that the electrodes are troublesome in cleaning and maintenance, the cleaning time is longer, the cavity cleaning device of the embodiment adopts a single-layer electrode design, the electrode frame 3 is used as an anode electrode, the cavity 4 is used as a cathode electrode, the structure is simple, and the cleaning and maintenance are more convenient.
The radio frequency power supply module comprises a radio frequency power supply and a resistor R;
the negative pole of the radio frequency power supply is grounded, the positive pole of the radio frequency power supply is connected with one end of a resistor R, and the other end of the resistor R is connected with the input end of the matcher 2.
The matcher 2 comprises a capacitor C1, an inductor L and a capacitor Ct;
the other end of the resistor R is connected with the electrode frame 3 through an inductor L and a capacitor Ct which are sequentially connected in series, and the common end of the resistor R and the inductor L is grounded through a capacitor C1.
Wherein the electrode frame 3 comprises a horizontal electrode plate 31 and a conductor 32;
the cavity 4 comprises a cavity upper cover 41 and a cavity lower cover 42, and a through hole is formed in the cavity lower cover 42;
the horizontal electrode plate 31 is arranged on the cavity lower cover 42, and the conductor 32 passes through the through hole and then is fixed on the lower surface of the horizontal electrode plate 31.
In this embodiment, the capacitor C1, the inductor L and the capacitor Ct form a matching unit 2, which is matched with the load impedance. The rf power supply of this embodiment generates a sine wave voltage with a fixed frequency, and transmits the electric energy to the horizontal electrode plate 31 through the matcher 2, so as to generate a high voltage alternating electric field between the horizontal electrode plate 31 and the upper cover 41 of the cavity. The radio frequency adopted by the radio frequency power supply is 13.56MHz, the radio frequency output power is less than 1000W, the impedance automatic matching time is less than 3S, the load impedance in the cavity 4 can be quickly and automatically matched, the reflected power is less than 5W during working, the RIE mode and the cathode bias mode are provided, the product cleaning efficiency is high and uniform, and the deviation between the center of the cleaning surface of the product and the angle of the edge water drop is extremely small.
In the embodiment, the glass plate is arranged below the horizontal electrode plate 31, the glass plate is an insulator, and the barrier is formed below the horizontal electrode plate 31, so that an electric field below the horizontal electrode plate 31 can be weakened, and thus, under the same cleaning time, the power of a used radio frequency power supply is smaller, the temperature of a material is lower during cleaning, and the service life of the radio frequency power supply is longer.
The novel cavity cleaning device of the plasma cleaning machine further comprises a main controller, and the main controller is electrically connected with the radio frequency power supply. The model that the main control unit adopted is STM32F103C8T6, and the main control unit is used for sending operating command to the radio frequency power supply to control the operating condition of radio frequency power supply.
The cavity 4 of the embodiment is made of SUS304, and the SUS304 is chromium-nickel stainless steel which is widely applied, and has good corrosion resistance, heat resistance, low-temperature strength and mechanical properties as steel which is widely applied; good hot-working properties such as stamping, bending and the like. The horizontal electrode plate 31 of the embodiment is made of 6061 aluminum alloy material, and the 6061 aluminum alloy has excellent processing performance, excellent welding characteristics, electroplating performance, corrosion resistance, toughness and the like, is not deformed after processing, is compact and free of defects, is easy to polish, is easy to color a film, and has excellent oxidation effect.
In conclusion, the cavity cleaning device of the embodiment adopts a single-layer electrode design, the electrode frame 3 is used as an anode electrode, the cavity 4 is used as a cathode electrode, the structure is simple, the cleaning and the maintenance are easy, and the production cost is reduced. In the embodiment, an insulating glass plate is arranged below the horizontal electrode plate 31, so that a barrier is formed, and an electric field below the horizontal electrode plate 31 is weakened, so that the power of a used radio frequency power supply is smaller, the temperature of a material is lower during cleaning, and the service life of the radio frequency power supply is longer under the same cleaning time.
Finally, it should be noted that: the above embodiments are only used to illustrate the technical solution of the present invention, and not to limit it; although the present invention has been described in detail with reference to the foregoing embodiments, it should be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; such modifications and substitutions do not substantially depart from the scope of the embodiments of the present invention, and are intended to be covered by the claims and the specification.
Claims (8)
1. A novel cavity cleaning device of a plasma cleaning machine is characterized by comprising a radio frequency power supply module, a matcher and a cleaning cavity;
the cleaning cavity comprises a cavity body and an electrode frame positioned in the cavity body;
the output end of the radio frequency power supply module is connected with the input end of a matcher, the output end of the matcher is connected with an electrode frame, and the cavity is grounded.
2. The novel chamber cleaning device of the plasma cleaning machine as claimed in claim 1, wherein the radio frequency power supply module comprises a radio frequency power supply and a resistor R;
the negative pole of the radio frequency power supply is grounded, the positive pole of the radio frequency power supply is connected with one end of a resistor R, and the other end of the resistor R is connected with the input end of a matcher.
3. The novel chamber cleaning device of the plasma cleaning machine as claimed in claim 2, wherein the matching device comprises a capacitor C1, an inductor L and a capacitor Ct;
the other end of the resistor R is connected with the electrode frame through an inductor L and a capacitor Ct which are sequentially connected in series, and the common end of the resistor R and the inductor L is grounded through a capacitor C1.
4. The novel chamber cleaning device of the plasma cleaning machine according to claim 3,
the electrode frame comprises a horizontal electrode plate and a conductor;
the cavity comprises a cavity upper cover and a cavity lower cover, and the cavity lower cover is provided with a through hole;
the lower cover of the cavity is provided with the horizontal electrode plate, and the electric conductor penetrates through the through hole and then is fixed on the lower surface of the horizontal electrode plate.
5. The novel chamber cleaning device for the plasma cleaning machine according to claim 4, further comprising a main controller electrically connected to the RF power source.
6. The cleaning device for the cavity of the novel plasma cleaning machine as claimed in claim 5, wherein the radio frequency adopted by the radio frequency power supply is 13.56 MHz.
7. The cleaning device for the chamber of the novel plasma cleaning machine as claimed in claim 6, wherein the chamber is made of SUS304 material.
8. The novel cleaning device for the cavity of the plasma cleaning machine as claimed in claim 7, wherein the horizontal electrode plate is made of 6061 aluminum alloy material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921741297.1U CN210701511U (en) | 2019-10-17 | 2019-10-17 | Novel cavity cleaning device of plasma cleaning machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921741297.1U CN210701511U (en) | 2019-10-17 | 2019-10-17 | Novel cavity cleaning device of plasma cleaning machine |
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| Publication Number | Publication Date |
|---|---|
| CN210701511U true CN210701511U (en) | 2020-06-09 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201921741297.1U Active CN210701511U (en) | 2019-10-17 | 2019-10-17 | Novel cavity cleaning device of plasma cleaning machine |
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| Country | Link |
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| CN (1) | CN210701511U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114649184A (en) * | 2020-12-21 | 2022-06-21 | Tes股份有限公司 | Substrate processing apparatus |
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2019
- 2019-10-17 CN CN201921741297.1U patent/CN210701511U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114649184A (en) * | 2020-12-21 | 2022-06-21 | Tes股份有限公司 | Substrate processing apparatus |
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