CN210560761U - 一种具有双层调节功能的蚀刻铜片 - Google Patents
一种具有双层调节功能的蚀刻铜片 Download PDFInfo
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- CN210560761U CN210560761U CN201921191407.1U CN201921191407U CN210560761U CN 210560761 U CN210560761 U CN 210560761U CN 201921191407 U CN201921191407 U CN 201921191407U CN 210560761 U CN210560761 U CN 210560761U
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- Prior art keywords
- copper sheet
- connecting piece
- chassis
- double
- roof
- Prior art date
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 60
- 229910052802 copper Inorganic materials 0.000 title claims abstract description 60
- 239000010949 copper Substances 0.000 title claims abstract description 60
- 238000005530 etching Methods 0.000 claims abstract description 28
- 230000007246 mechanism Effects 0.000 claims abstract description 18
- 230000033228 biological regulation Effects 0.000 claims description 6
- 230000017525 heat dissipation Effects 0.000 abstract description 5
- 230000009711 regulatory function Effects 0.000 abstract description 5
- 230000000694 effects Effects 0.000 abstract description 4
- 230000006870 function Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000003139 buffering effect Effects 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
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Abstract
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Claims (6)
Priority Applications (1)
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CN201921191407.1U CN210560761U (zh) | 2019-07-26 | 2019-07-26 | 一种具有双层调节功能的蚀刻铜片 |
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CN201921191407.1U CN210560761U (zh) | 2019-07-26 | 2019-07-26 | 一种具有双层调节功能的蚀刻铜片 |
Publications (1)
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CN210560761U true CN210560761U (zh) | 2020-05-19 |
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CN201921191407.1U Active CN210560761U (zh) | 2019-07-26 | 2019-07-26 | 一种具有双层调节功能的蚀刻铜片 |
Country Status (1)
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CN (1) | CN210560761U (zh) |
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2019
- 2019-07-26 CN CN201921191407.1U patent/CN210560761U/zh active Active
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
GR01 | Patent grant | ||
GR01 | Patent grant | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of utility model: An etched copper sheet with double layer adjustment function Effective date of registration: 20210126 Granted publication date: 20200519 Pledgee: China Co. truction Bank Corp Dongguan branch Pledgor: Dongguan sanuogaode Etching Technology Co.,Ltd. Registration number: Y2021980000711 |
|
PC01 | Cancellation of the registration of the contract for pledge of patent right | ||
PC01 | Cancellation of the registration of the contract for pledge of patent right |
Date of cancellation: 20230803 Granted publication date: 20200519 Pledgee: China Co. truction Bank Corp Dongguan branch Pledgor: Dongguan sanuogaode Etching Technology Co.,Ltd. Registration number: Y2021980000711 |
|
CP02 | Change in the address of a patent holder | ||
CP02 | Change in the address of a patent holder |
Address after: Room 101, Building 5, No. 788 Xiecao Road, Xiegang Town, Dongguan City, Guangdong Province, 523000 Patentee after: Dongguan sanuogaode Etching Technology Co.,Ltd. Address before: 523000 floors 1 and 2, No. 22, jinlang 3rd Street, diaolang village, Tianmei community, Huangjiang Town, Dongguan City, Guangdong Province Patentee before: Dongguan sanuogaode Etching Technology Co.,Ltd. |