CN210414069U - Durable grinding and polishing buffing - Google Patents

Abstract

The utility model discloses a durable grinding and polishing buffing, including buffing body, and the locating hole that buffing body center set up, the upper surface of buffing body is the polishing layer, is equipped with the first slot that is radial setting taking the locating hole as the center on this polishing layer, the second slot that communicates with first slot to and the ring groove that sets up with the locating hole is concentric, first slot, second slot and ring groove communicate each other, and first slot, second slot and ring groove enclose city grinding unit each other, are equipped with the net slot in each grinding unit, and the net slot is interior to be formed by the single groove of intercommunication each other, this net slot with first slot or second slot intercommunication, the net slot with the ring groove communicates each other; the width and/or depth of the first groove, the second groove, the circular ring groove and the grid groove are irregularly arranged, the bottom parts in the first groove, the second groove and the grid groove are provided with filling layers, and a rebound cavity is arranged in the polishing layer; the utility model discloses can polish of high quality, life extension.

Description

Durable grinding and polishing buffing

Technical Field

The utility model relates to a polishing buffing field, especially a durable type grinding polishing buffing.

Background

In our actual lapping and Polishing process, lapping and Polishing are mainly Chemical Mechanical Polishing (CMP). CMP is a combination of chemical and mechanical actions, in which a softened layer is formed on the surface of a workpiece under the action of an etching medium in a polishing solution under a certain pressure and in the presence of a polishing slurry, and abrasive grains in the polishing solution grind the softened layer on the workpiece, thereby forming a smooth surface on the ground workpiece surface. The polishing leather has the following functions: the polishing solution is effectively and uniformly delivered to different areas of the polishing leather; residual substances, scraps and the like in the polishing process are taken away from the surface to be processed, so that the removal effect is achieved; transferring and bearing mechanical load required in the machining removal process; maintaining the polishing solution film on the surface of the polishing leather so as to ensure that the chemical reaction is fully carried out; the polishing process is kept stable, and the surface is not deformed, so that better product surface appearance is obtained. Therefore, it is imperative to develop a polishing buff having the above functions.

SUMMERY OF THE UTILITY MODEL

In order to solve the existing problems, the utility model discloses a durable grinding and polishing buffing, including buffing body, and the locating hole that buffing body center set up, the upper surface of buffing body is the polishing layer, is equipped with on this polishing layer to use the locating hole as the first slot that the center is radial setting, with the second slot of first slot intercommunication, and with the ring groove of locating hole concentric setting, first slot, second slot and ring groove intercommunication each other, and first slot, second slot and ring groove enclose city grinding unit each other, are equipped with the net slot in every grinding unit, and the net slot is interior to be constituteed by the single groove of intercommunication each other, this net slot with first slot or second slot intercommunication, the net slot with the ring groove intercommunication each other; the width and/or depth of the first groove, the second groove, the circular groove and the grid groove are/is not equal, and filling layers are arranged at the bottoms in the first groove, the second groove and the grid groove, and specifically, the filling layers are made of inorganic materials; or the material of the filling layer is an organic material which is slightly soluble in alkali liquor or acid liquor, and a rebound cavity is arranged in the polishing layer.

Preferably, the first groove and the second groove have gradually increased widths outward with the positioning hole as a center.

Preferably, the width of the circular groove is gradually increased outwards by taking the positioning hole as a center.

Preferably, the single groove width is less than the minimum width of the circular groove.

Preferably, the single groove width is smaller than the minimum width of the first and/or second groove.

Preferably, the second groove is in a wave shape or a C shape opening in the same direction.

Preferably, the first groove is linear.

Preferably, the rebound cavity is in a shape of an elongated strip or an ellipse which is distributed randomly.

The utility model has the advantages that: (1) the first grooves and the second grooves are arranged, and the second grooves are arranged into a wave shape or a C shape at the same time, so that the flow of the polishing liquid is slowed down, and the polishing medium can be well contacted with the polishing piece; the polishing quality is improved; (2) by arranging the grooves with different widths, polishing slag with different sizes can be discharged, and the influence of residues on the polishing quality is avoided; (3) the bottom is equipped with the filling layer in first slot, second slot, net slot, can be after long-time the use, and the polishing layer is worn and torn for the depth of slot reduces or grinds the tie, and this filling layer sets up to inorganic material or adopts the organic material of slightly soluble alkali lye or acidizing fluid, can be at the in-process that uses, slightly soluble in the polishing solution, makes the slot degree of depth increase, makes the ability of flowing of polishing solution improve increase of life. (4) Through set up resilience cavity in polishing layer, can help polishing layer resilience to original condition.

Drawings

FIG. 1 is a schematic structural view of the present invention;

fig. 2 is a side view of the present invention;

in the figure, 1-polishing layer, 2-locating hole, 3-circular groove, 4-first groove, 5-second groove, 6-rebound chamber, 7-polishing unit.

Detailed Description

It should be noted that, in the present invention, the embodiments and features of the embodiments may be combined with each other without conflict.

In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like, indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are used merely for convenience of description and for simplicity of description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, should not be construed as limiting the present invention. Furthermore, the terms "first", "second", etc. are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first," "second," etc. may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless otherwise specified.

In the description of the present invention, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art through specific situations.

The following detailed description of the embodiments of the present invention will be made with reference to the accompanying drawings.

Example 1

As shown in fig. 1 and 2, a durable grinding and polishing buffing pad comprises a buffing pad body and a positioning hole 2 arranged at the center of the buffing pad body, wherein the upper surface of the buffing pad body is a polishing layer 1, the polishing layer 1 is provided with a first groove 4 radially arranged by taking the positioning hole 2 as the center, a second groove 5 communicated with the first groove 4, and a circular groove 3 concentrically arranged with the positioning hole 2, the first groove 4, the second groove 5 and the circular groove 3 are communicated with each other, the first groove 4, the second groove 5 and the circular groove 3 enclose grinding units 7, each grinding unit 7 is provided with a grid groove, the grid groove is composed of single grooves communicated with each other, the grid groove is communicated with the first groove 4 or the second groove 5, and the grid groove is communicated with the circular groove 3; the first groove 4, the second groove 5, the circular groove 3 and the grid groove are arranged in different widths and/or depths, and the bottom parts in the first groove 4, the second groove 5 and the grid groove are provided with filling layers made of inorganic materials in specific implementation; or the material of filling layer adopts the organic material of slightly soluble alkali lye or acidizing fluid, and this setting can be after long-time use, because polishing layer is worn and torn for the degree of depth of slot reduces or grinds the tie, and this filling layer sets up to inorganic material or adopts the organic material of slightly soluble alkali lye or acidizing fluid, can be at the in-process that uses, slightly soluble in polishing solution for the slot depth increases, makes the flow ability of polishing solution improve, increase of service life, rebound cavity 6 has in the polishing layer 1, the length of strip or the ellipse shape of kick-back cavity 6 for unordered distribution, and this setting can be effectively after the use is accomplished, and effective help mill skin kick-backs.

In specific implementation, the first groove 4 and the second groove 5 have gradually increasing widths towards the outside with the positioning hole 2 as the center.

The width of the circular groove 3 is gradually increased outwards by taking the positioning hole 2 as a center.

The single groove width is smaller than the smallest width of the circular groove 3.

The single groove width is smaller than the minimum width of the first trench 4 and/or the second trench 5. The width, the degree of depth inequality setting of single groove, ring groove and first slot, second slot can effectively discharge the polishing material sediment of not uniform in size.

The second grooves 5 are waved or C-shaped with openings in the same direction, and are used for slowing down the flow of the polishing liquid so that the polishing medium can be well contacted with the polishing piece; the polishing quality is improved.

The first grooves 4 are rectilinear.

The above embodiments only describe the best mode of use of the existing equipment, and similar common mechanical means are used to replace the elements in the present embodiments, which fall into the protection scope.

Claims (8)

1. The utility model provides a durable type grinding and polishing buffing, includes the buffing body, and locating hole (2) that buffing body center set up, its characterized in that: the polishing leather comprises a leather grinding body and is characterized in that the upper surface of the leather grinding body is a polishing layer (1), first grooves (4) which are radially arranged by taking a positioning hole (2) as a center, second grooves (5) which are communicated with the first grooves (4) and annular grooves (3) which are concentrically arranged with the positioning hole (2) are arranged on the polishing layer (1), the first grooves (4), the second grooves (5) and the annular grooves (3) are communicated with each other, the first grooves (4), the second grooves (5) and the annular grooves (3) enclose grinding units (7) mutually, grid grooves are arranged in each grinding unit (7), each grid groove is formed by single grooves which are communicated with each other, the grid grooves are communicated with the first grooves (4) or the second grooves (5), and the grid grooves are communicated with the annular grooves (3); the width and/or the depth of first slot (4), second slot (5), ring groove (3) and net slot are not equal, the bottom is equipped with the filling layer in first slot (4), second slot (5), the net slot, it has resilience cavity (6) to polish in the layer (1).

2. A durable abrasive polishing skin according to claim 1, wherein: the first groove (4) and the second groove (5) are gradually increased in width towards the outside by taking the positioning hole (2) as a center.

3. A durable abrasive polishing skin according to claim 1, wherein: the width of the circular ring groove (3) is gradually increased outwards by taking the positioning hole (2) as a center.

4. A durable abrasive polishing skin according to claim 1, wherein: the single groove width is smaller than the minimum width of the circular ring groove (3).

5. A durable abrasive polishing skin according to claim 4, wherein: the single groove width is smaller than the smallest width of the first (4) and/or second (5) groove.

6. A durable abrasive polishing skin according to claim 5, characterized in that: the second grooves (5) are wavy or C-shaped with openings in the same direction.

7. A durable abrasive polishing skin according to claim 6, characterized in that: the first grooves (4) are linear.

8. A durable abrasive polishing skin according to claim 7, wherein: the springback cavity (6) is in a strip shape or an oval shape which is distributed in disorder.

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