CN210365259U - Processing liquid containing device - Google Patents
Processing liquid containing device Download PDFInfo
- Publication number
- CN210365259U CN210365259U CN201921305466.7U CN201921305466U CN210365259U CN 210365259 U CN210365259 U CN 210365259U CN 201921305466 U CN201921305466 U CN 201921305466U CN 210365259 U CN210365259 U CN 210365259U
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- leakage
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- 239000007788 liquid Substances 0.000 title claims abstract description 143
- 238000012545 processing Methods 0.000 title claims description 23
- 239000000110 cooling liquid Substances 0.000 claims abstract description 44
- 230000005540 biological transmission Effects 0.000 claims abstract description 10
- 238000002955 isolation Methods 0.000 claims description 78
- 238000005192 partition Methods 0.000 claims description 10
- 238000012546 transfer Methods 0.000 claims description 6
- 230000004308 accommodation Effects 0.000 claims description 4
- 210000005056 cell body Anatomy 0.000 abstract description 10
- 239000012530 fluid Substances 0.000 abstract description 9
- 239000002826 coolant Substances 0.000 description 21
- 238000001514 detection method Methods 0.000 description 14
- 239000000126 substance Substances 0.000 description 7
- 238000001816 cooling Methods 0.000 description 6
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30604—Chemical etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
- H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Weting (AREA)
- Heat-Exchange Devices With Radiators And Conduit Assemblies (AREA)
- General Engineering & Computer Science (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Mechanical Engineering (AREA)
Abstract
The utility model discloses a treatment fluid holding device, the device include a cell body, a leak protection unit and a cold liquid transmission unit. The tank body contains a treatment liquid. The leakage-proof unit is arranged on the upper side of the groove body. The cold liquid transmission unit supplies a cooling liquid to circulate, and the cold liquid transmission unit comprises a pipe body group, a first fixed end and a second fixed end, wherein the pipe body group is arranged in the groove body, and the first fixed end and the second fixed end are two sides of the pipe body group and are connected with the leakage-proof unit. When the cooling liquid leaks from at least one of the first fixing end or the second fixing end, the cooling liquid flows to the leakage preventing unit.
Description
Technical Field
The utility model relates to a processing liquid holding device, in particular to can avoid the processing liquid to be polluted by the weeping, and can examine the processing liquid holding device of checking the weeping immediately.
Background
When chemical liquid required by a semiconductor manufacturing process is stored, the chemical liquid is usually stored in a processing liquid tank with a cooling function to prevent the chemical liquid from being deteriorated due to high temperature. As shown in fig. 1, a general treatment liquid tank 900 has a tank body 910 and a U-shaped cooling liquid pipe 920. The tank 910 is used for storing chemical liquid. Two ends of the U-shaped cooling liquid pipe 920 are connected with the top of the tank body 910, and cooling liquid is arranged inside the cooling liquid pipe 920; in this way, the chemical liquid inside the tank 910 may contact the surface of the cooling liquid pipe 920 to reduce the temperature.
However, the connection point between the U-shaped cooling liquid pipe 920 and the top of the tank body 910 may be loose due to incomplete welding or insufficient strength, which causes liquid leakage, and the concentration of the chemical liquid in the tank body 910 changes, thereby affecting the process yield; in addition, leakage caused by loose connection points often cannot be detected immediately, and therefore, the leakage cannot be reported to the operator in time to maintain the processing liquid tank 900.
Therefore, it is necessary to provide a processing liquid tank capable of preventing the chemical liquid from being contaminated by the leakage and detecting the leakage immediately.
SUMMERY OF THE UTILITY MODEL
The main object of the present invention is to provide a processing liquid container capable of preventing the processing liquid from being contaminated by the leakage and detecting the leakage immediately.
To achieve the above object, the present invention provides a treating solution containing device, which comprises a tank, a leakage-proof unit and a cooling solution transferring unit. The tank body contains a treatment liquid. The leakage-proof unit is arranged on the upper side of the groove body. The cold liquid transmission unit supplies a cooling liquid to circulate, and the cold liquid transmission unit comprises a pipe body group, a first fixed end and a second fixed end, wherein the pipe body group is arranged in the groove body, and the first fixed end and the second fixed end are two sides of the pipe body group and are connected with the leakage-proof unit. When the cooling liquid leaks from at least one of the first fixing end or the second fixing end, the cooling liquid flows to the leakage preventing unit.
According to the utility model discloses an embodiment, wherein body group includes a plurality of subbodies, and cold liquid transmission unit still includes a space bar, and the space bar includes a plurality of perforation. The plurality of perforations are spaced apart from one another. The plurality of sub-tube bodies are arranged in the plurality of through holes in a penetrating mode, so that when the cooling liquid flows through the plurality of sub-tube bodies, the cold-heat exchange area between the plurality of sub-tube bodies and the treatment liquid is increased.
According to the utility model discloses an embodiment, wherein the leak protection unit includes a first isolation tank and a second isolation tank, and first stiff end sets up in first isolation tank and communicates with a coolant liquid supply pipe, and the second stiff end sets up in second isolation tank and communicates with a coolant liquid discharge pipe.
According to an embodiment of the present invention, the tube set is circumferentially disposed in the groove, so that the tube set has at least one intersection point.
According to the utility model discloses an embodiment, wherein the leak protection unit includes a first liquid detection spare and a second liquid detection spare, and first liquid detection spare sets up in first isolation tank, and second liquid detection spare sets up in the second isolation tank to detect separately and judge whether weeping takes place for first stiff end and second stiff end.
According to an embodiment of the present invention, the leakage preventing unit includes a first drain pipe and a second drain pipe, the first drain pipe is communicated with the first isolation groove, and the second drain pipe is communicated with the second isolation groove; when the cooling liquid leaks from at least one of the first fixing end or the second fixing end, the cooling liquid is discharged from the first liquid discharge pipe or the second liquid discharge pipe.
According to the utility model discloses an embodiment, wherein the leak protection unit includes a third liquid detection spare and a fourth liquid detection spare, and the third liquid detection spare sets up in the first fluid-discharge tube outside, and the fourth liquid detection spare sets up in the second fluid-discharge tube outside to whether the weeping takes place for first stiff end and second stiff end is judged in order to detect separately.
According to the utility model discloses an embodiment, wherein first fluid-discharge pipe and a first lateral wall intercommunication of first isolation tank, second fluid-discharge pipe and a second lateral wall intercommunication of second isolation tank. A first height is kept away from with a diapire of first isolation tank in the department of intercommunication of first drain pipe and first isolation tank, and first lateral wall is including supplying a first opening that body group wore to establish, and a second height is kept away from with the diapire of first isolation tank in first opening, and first height is less than the second height. A third height is kept away from a bottom wall of the second isolation groove at the communicating position of the second liquid discharge pipe and the second isolation groove, the second side wall comprises a second opening for the pipe body group to penetrate through, a fourth height is kept away from the bottom wall of the second isolation groove at the second opening, and the third height is smaller than the fourth height.
According to the utility model discloses an embodiment, wherein the leak protection unit includes a gas supply pipe, and the gas supply pipe communicates and provides a gas with first isolation tank and second isolation tank respectively, makes the atmospheric pressure of first isolation tank and second isolation tank be greater than the atmospheric pressure of cell body.
According to the utility model discloses an embodiment, wherein set up in the body group of cell body part and penetrate first lateral wall and second lateral wall with the horizontal direction, first stiff end and second stiff end set up respectively in first lateral wall and second lateral wall, make the body group that sets up in first isolation groove and second isolation groove part present the level to when making coolant liquid leak from at least one of first stiff end or second stiff end, can not flow to the cell body along the body group.
According to the utility model discloses an embodiment, wherein set up in the body group of cell body part and penetrate first lateral wall and second lateral wall with the incline direction, first stiff end and second stiff end set up respectively in first lateral wall and second lateral wall, make the body group that sets up in first isolation groove and second isolation groove part present the slope to when making coolant liquid leak from at least one of first stiff end or second stiff end, can not flow to the cell body along the body group.
Through the utility model discloses a treatment fluid holding device's design can preserve the treatment fluid with microthermal mode to let the weeping keep apart in the isolated tank and flow to the outside, prevent that the weeping from flowing into the cell body, so as to avoid the treatment fluid in the cell body to be polluted by the coolant liquid of weeping, and treatment fluid holding device can examine the inspection weeping immediately, in order to report staff's maintenance.
Drawings
FIG. 1 is a schematic view of a prior art treatment bath.
Fig. 2 is a schematic view of a treatment liquid containing device according to a first embodiment of the present invention.
Fig. 3 is a partial sectional view of a treatment liquid containing apparatus according to a first embodiment of the present invention.
Fig. 4 is a schematic view of the sub-pipe body and the partition plate according to the first embodiment of the present invention.
Fig. 5 is a schematic view of a treatment liquid containing device according to a second embodiment of the present invention.
Wherein, the reference numbers:
treatment liquid tank 900 groove 910
Cooling liquid pipe 920
Treatment liquid containing device 1, 1a tank 10
Second liquid detector 24 first drain tube 25
Fourth liquid detector 28 gas supply pipe 29
Tube body group 31, 31a of cold liquid transmission unit 30, 30a
First fixed end 32 and second fixed end 33
The spacer 34 has a through hole 341
First height H1 of cooling liquid C
Second height H2 third height H3
Fourth level H4 treatment liquid L
Outflow direction M, N
Detailed Description
To better understand the technical content of the present invention, preferred embodiments are specifically illustrated as follows.
Referring to fig. 2 to 4, a treating liquid container according to a first embodiment of the present invention is described. Fig. 2 is a schematic view of a treatment liquid containing device according to a first embodiment of the present invention; fig. 3 is a partial sectional view of a treatment liquid accommodation apparatus according to a first embodiment of the present invention; fig. 4 is a schematic view of the sub-pipe body and the partition plate according to the first embodiment of the present invention.
As shown in fig. 2 and 3, in the first embodiment of the present invention, the processing liquid containing device 1 can store the processing liquid L in a low temperature manner, and can prevent the processing liquid L from being contaminated by the leaked coolant C, and can detect the leakage immediately. The treating liquid containing device 1 includes a tank 10, a leakage preventing unit 20 and a cold liquid transferring unit 30.
In the first embodiment of the present invention, the tank 10 contains a treatment liquid L. The leakage prevention unit 20 is used to contain leaked coolant C to prevent the coolant C from flowing into the tank 10 and contaminating the treatment liquid L. The leakage preventing unit 20 is provided at an upper side of the tank body 10. The leakage preventing unit 20 includes a first separating groove 21, a second separating groove 22, a first liquid detecting member 23, a second liquid detecting member 24, a first drain pipe 25, a second drain pipe 26, a third liquid detecting member 27, a fourth liquid detecting member 28, and a gas supplying pipe 29.
The first isolation tank 21 and the second isolation tank 22 are configured to accommodate the leaked coolant C to isolate the coolant C from the process liquid L. The first isolation groove 21 includes a first sidewall 211 which is a rectangular tubular wall surrounding the bottom wall of the first isolation groove 21. The second isolation groove 22 includes a second sidewall 221, which is a rectangular tubular wall surrounding the bottom wall of the second isolation groove 22. The first sidewall 211 includes a first opening 2111 through which the cooling liquid transfer unit 30 passes. The second side wall 221 includes a second opening 2211 through which the cooling liquid transferring unit 30 passes. The gas supply pipe 29 is communicated with the first isolation tank 21 and the second isolation tank 22, respectively, and supplies a gas so that the gas pressure of the first isolation tank 21 and the second isolation tank 22 is greater than the gas pressure of the tank body 10.
The first liquid detection member 23 is disposed in the first isolation tank 21, and can detect liquid. The second liquid detector 24 is disposed in the second separation tank 22, and can detect liquid. The first liquid detector 23 and the second liquid detector 24 can each determine whether or not liquid leakage occurs by the function of detecting liquid. The first drain pipe 25 is communicated with the first sidewall 211 of the first isolation groove 21, and the first drain pipe 25 is used for allowing the leaked cooling liquid C to flow out to the outside. The second drain pipe 26 is communicated with the second side wall 221 of the second isolation groove 22, and the second drain pipe 26 is used for allowing the leaked cooling liquid C to flow out to the outside. The third liquid detection member 27 is disposed outside the first drain pipe 25, and can detect whether liquid flows out from the first drain pipe 25. The fourth liquid detection member 28 is disposed outside the second drain pipe 26, and can detect whether or not liquid flows out from the second drain pipe 26. The third liquid detection part 27 and the fourth liquid detection part 28 are used for respectively detecting and judging whether liquid leakage occurs; the present invention provides a liquid detecting device, wherein the first liquid detecting device 23, the second liquid detecting device 24, the third liquid detecting device 27 and the fourth liquid detecting device 28 are electrically connected to an external computer (not shown), so that when a liquid leakage is detected, a transmission notification is transmitted to the external computer to warn a worker.
As shown in fig. 2 and 3, a connection point of the first drain pipe 25 and the first isolation groove 21 is spaced apart from the bottom wall of the first isolation groove 21 by a first height H1, the first opening 2111 is spaced apart from the bottom wall of the first isolation groove 21 by a second height H2, and the first height H1 is smaller than the second height H2; therefore, if liquid leakage occurs and the height of the coolant C in the first isolation tank 21 reaches the first height H1, the coolant C flows to the outside along the outflow direction M, and the coolant C does not reach the second height H2 and does not flow from the first opening 2111 to the tank body 10. A third height H3 is formed between the connection position of the second liquid discharge pipe 26 and the second isolation groove 22 and the bottom wall of the second isolation groove 22, a fourth height H4 is formed between the second opening 2211 and the bottom wall of the second isolation groove 22, and the third height H3 is smaller than the fourth height H4; therefore, if liquid leakage occurs, when the height of the coolant C in the second isolation tank 22 reaches the third height H3, the coolant C flows to the outside along the outflow direction N, and the height of the coolant C does not reach the fourth height H4, and thus the coolant C does not flow from the second opening 2211 to the tank body 10.
In the first embodiment of the present invention, as shown in fig. 2 to 4, the cold liquid transfer unit 30 is used for circulating a cooling liquid C, so as to cool the processing liquid L contacting the surface of the cold liquid transfer unit 30. The cold liquid transfer unit 30 includes a tube assembly 31, a first fixing end 32, a second fixing end 33 and a partition 34. The tube assembly 31 includes a plurality of sub-tubes 311. The first opening 2111 and the second opening 2211 are respectively formed at both ends of the pipe assembly 31 provided in the tank 10 in the horizontal direction. The tube set 31 is disposed in the tank 10 in a surrounding manner, so that the surrounding tube set 31 has at least one intersection point 312; the surrounding arrangement can prevent each sub-tube 311 of the tube assembly 31 from being bent excessively to generate a corner, so as to ensure smooth and steady circulation of the cooling liquid C and prevent the sub-tube 311 from being damaged due to excessive bending.
The first fixing end 32 and the second fixing end 33 are two sides of the tube assembly 31, the first fixing end 32 is disposed on the first sidewall 211 of the first isolation groove 21 and is communicated with a cooling liquid supply pipe 800, and the second fixing end 33 is disposed on the second sidewall 221 of the second isolation groove 22 and is communicated with a cooling liquid discharge pipe 900; the first fixing end 32 and the second fixing end 33 are disposed in such a manner that the tube assembly 31 disposed at the first isolation groove 21 and the second isolation groove 22 is horizontal, so that when the cooling liquid C leaks from at least one of the first fixing end 32 or the second fixing end 33, the cooling liquid C does not flow along the tube assembly 31 to the tank body 10, the cooling liquid C flows to the first isolation groove 21 or the second isolation groove 22 of the leakage preventing unit 20, and the cooling liquid C is discharged from the first liquid discharge pipe 25 or the second liquid discharge pipe 26.
The partition plate 34 includes a plurality of through holes 341, and the plurality of through holes 341 are spaced apart from each other. The plurality of sub-tubes 311 are disposed in the plurality of through holes 341, such that the plurality of sub-tubes 311 can be spaced apart from each other by a certain distance without contacting each other, thereby increasing the surface area of the plurality of sub-tubes 311 (i.e. the area of heat and cold exchange with the processing liquid L); therefore, when the cooling liquid C flows through the plurality of sub-pipes 311, the cooling efficiency can be improved by a preferable heat exchange area between the plurality of sub-pipes 311 and the processing liquid L.
When a user needs to use the treatment solution containing device 1 to store the treatment solution L, as shown in fig. 2 and 3, the user may first place the treatment solution L in the tank 10, and then input the cooling solution C to the first fixed end 32 of the cooling solution transmission unit 30 through the cooling solution supply pipe 800; the cooling liquid C flows along the tube assembly 31 and cools the processing liquid L around the tube assembly 31 to ensure that the processing liquid L does not deteriorate due to temperature. Finally, the cooling liquid C flows out from the second fixed end 33 to the cooling liquid discharge pipe 900.
If at least one of the first and second fixing ends 32 and 33 is leaked, the cooling liquid C flows into the first or second separation groove 21 or 22 of the corresponding leakage preventing unit 20, and is discharged from the first or second discharge pipe 25 or 26. The first liquid detecting element 23 can detect whether liquid exists in the first isolation groove 21 or not, or the third liquid detecting element 27 can detect whether liquid flows out from the first liquid discharging pipe 25 or not, so as to judge whether liquid leakage occurs at the first fixing end 32 in real time; the second liquid detector 24 can also detect whether liquid exists in the second isolation groove 22 or not, or the fourth liquid detector 28 can detect whether liquid flows out from the second liquid discharge pipe 26 or not, so as to judge whether liquid leakage occurs at the second fixed end 33 in real time; therefore, the detection piece which detects the leakage can inform the external computer in real time to inform the staff to maintain.
Referring to fig. 5, a treating liquid container according to a second embodiment of the present invention is described. Fig. 5 is a schematic view of a treatment liquid containing device according to a second embodiment of the present invention.
As shown in fig. 5, the second embodiment of the present invention is different from the first embodiment in that, in the treatment liquid accommodation apparatus 1a of the second embodiment, the pipe body group 31a of the cold liquid transfer unit 30a provided in the tank body 10 portion penetrates the first side wall 211 and the second side wall 221 in an inclined direction. The first fixing end 32 and the second fixing end 33 are respectively disposed on the first sidewall 211 and the second sidewall 221; the coupling height of the first fixing end 32 and the first sidewall 211 of the second embodiment is lower than that of the first fixing end 32 and the first sidewall 211 of the first embodiment, and the coupling height of the second fixing end 33 and the second sidewall 221 of the second embodiment is lower than that of the second fixing end 33 and the second sidewall 221 of the first embodiment; in this way, the pipe body group 31a provided in the first isolation groove 21a and the second isolation groove 22a of the leakage prevention unit 20a can be inclined so that the coolant C does not flow along the pipe body group 31a to the tank body 10 when leaking from at least one of the first fixed end 32 or the second fixed end 33.
Through the utility model discloses a treatment fluid holding device 1, 1 a's design can preserve the treatment fluid with microthermal mode to let the weeping keep apart and flow out to the outside in the isolation tank, prevent that the weeping from flowing into the cell body, in order to avoid the treatment fluid in the cell body to be polluted by the coolant liquid of weeping, and treatment fluid holding device 1, 1a can examine the weeping immediately, in order to report staff's maintenance.
It should be noted that the above-mentioned embodiments are only examples, and are not limited to the examples. For example, those who do not depart from the basic structure of the invention should be construed to fall within the scope of the claims that follow.
Claims (11)
1. A treatment liquid accommodation apparatus, comprising:
a tank body for accommodating a treatment liquid;
a leakage-proof unit arranged on the upper side of the groove body; and
the cold liquid transmission unit is used for circulating a cooling liquid and comprises a pipe body group, a first fixed end and a second fixed end, the pipe body group is arranged in the groove body, and the first fixed end and the second fixed end are two sides of the pipe body group and are connected with the leakage-proof unit;
wherein, when the cooling liquid leaks from at least one of the first fixed end or the second fixed end, the cooling liquid flows to the leakage-proof unit.
2. The processing liquid containing apparatus according to claim 1, wherein the tube assembly comprises a plurality of sub-tubes, the cold liquid transfer unit further comprises a partition plate, the partition plate comprises a plurality of perforations, and the perforations are spaced from each other; the plurality of sub-tubes penetrate through the plurality of through holes, so that when the cooling liquid flows through the plurality of sub-tubes, a heat exchange area between the plurality of sub-tubes and the treatment liquid is increased.
3. The processing liquid containing apparatus according to claim 2, wherein the leakage preventing unit includes a first isolation groove and a second isolation groove, the first fixing end is provided in the first isolation groove and communicates with a cooling liquid supply pipe, and the second fixing end is provided in the second isolation groove and communicates with a cooling liquid discharge pipe.
4. The apparatus of claim 3, wherein the set of tubes is circumferentially disposed in the trough such that the set of tubes has at least one intersection.
5. The apparatus as claimed in claim 4, wherein the leakage-proof unit comprises a first liquid detector and a second liquid detector, the first liquid detector is disposed in the first isolation groove, and the second liquid detector is disposed in the second isolation groove for detecting and determining whether leakage occurs at the first and second fixing ends.
6. The processing liquid containing apparatus according to claim 5, wherein the leakage preventing unit includes a first drain pipe communicating with the first partition groove and a second drain pipe communicating with the second partition groove; when the cooling liquid leaks from at least one of the first fixing end or the second fixing end, the cooling liquid is discharged from the first liquid discharge pipe or the second liquid discharge pipe.
7. The processing liquid containing apparatus according to claim 6, wherein the leakage preventing unit comprises a third liquid detecting member disposed outside the first liquid discharge pipe and a fourth liquid detecting member disposed outside the second liquid discharge pipe for detecting and determining whether or not the first fixing end and the second fixing end have leakage.
8. The processing liquid accommodation apparatus according to claim 7, wherein the first drain pipe communicates with a first side wall of the first partition groove, and the second drain pipe communicates with a second side wall of the second partition groove; a first height is kept between a communication position of the first liquid discharge pipe and the first isolation groove and a bottom wall of the first isolation groove, the first side wall comprises a first opening for the pipe body group to penetrate through, a second height is kept between the first opening and the bottom wall of the first isolation groove, and the first height is smaller than the second height; the distance between the communicating position of the second liquid discharge pipe and the second isolation groove and a bottom wall of the second isolation groove is a third height, the second side wall comprises a second opening for the pipe body group to penetrate through, the distance between the second opening and the bottom wall of the second isolation groove is a fourth height, and the third height is smaller than the fourth height.
9. The apparatus of claim 8, wherein the anti-leakage unit comprises a gas supply tube, the gas supply tube is respectively connected to the first isolation tank and the second isolation tank and provides a gas to make the gas pressure in the first isolation tank and the second isolation tank greater than the gas pressure in the tank body.
10. The apparatus of claim 9, wherein the tube set disposed in the trough penetrates the first sidewall and the second sidewall in a horizontal direction, and the first fixing end and the second fixing end are disposed in the first sidewall and the second sidewall, respectively, such that the tube set disposed in the first isolation slot and the second isolation slot is horizontal, such that the cooling liquid will not flow along the tube set to the trough when leaking from at least one of the first fixing end or the second fixing end.
11. The apparatus of claim 9, wherein the tube assembly disposed on the trough penetrates the first sidewall and the second sidewall in an oblique direction, and the first fixing end and the second fixing end are disposed on the first sidewall and the second sidewall, respectively, so that the tube assembly disposed on the first isolation slot and the second isolation slot is inclined, such that the cooling liquid will not flow along the tube assembly to the trough when leaking from at least one of the first fixing end or the second fixing end.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
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| US3712330A (en) * | 1970-10-16 | 1973-01-23 | M Davis | Liquid spill collection system |
| JPH05267514A (en) * | 1992-03-18 | 1993-10-15 | Fujitsu Ltd | Immersion cooling structure |
| JPH09143761A (en) * | 1995-11-28 | 1997-06-03 | Hitachi Ltd | Etching method and apparatus |
| US6406641B1 (en) * | 1997-06-17 | 2002-06-18 | Luxtron Corporation | Liquid etch endpoint detection and process metrology |
| US6318581B1 (en) * | 2000-03-06 | 2001-11-20 | Snyder Industries, Inc. | Discharge outlet for double wall containment tank assembly |
| US6635573B2 (en) * | 2001-10-29 | 2003-10-21 | Applied Materials, Inc | Method of detecting an endpoint during etching of a material within a recess |
| US6806948B2 (en) * | 2002-03-29 | 2004-10-19 | Lam Research Corporation | System and method of broad band optical end point detection for film change indication |
| KR100452918B1 (en) * | 2002-04-12 | 2004-10-14 | 한국디엔에스 주식회사 | Spin-etcher with thickness measuring system |
| KR20110039673A (en) * | 2009-10-12 | 2011-04-20 | 세메스 주식회사 | Apparatus for cooling a solution |
| KR101199028B1 (en) * | 2012-03-14 | 2012-11-08 | (주)혜원전기 | Cooling coil fixing apparatus for cold and warmth water purifier |
| JP2013222914A (en) * | 2012-04-19 | 2013-10-28 | Hitachi Ltd | Liquid leakage prevention device and method, and liquid cooling system |
| US9698062B2 (en) * | 2013-02-28 | 2017-07-04 | Veeco Precision Surface Processing Llc | System and method for performing a wet etching process |
| CN107112186B (en) * | 2014-09-05 | 2020-04-21 | Tel艾派恩有限公司 | Process gas enhancement for beam processing of substrates |
| TWI656594B (en) * | 2016-12-15 | 2019-04-11 | 辛耘企業股份有限公司 | Substrate processing device |
| US10262910B2 (en) * | 2016-12-23 | 2019-04-16 | Lam Research Corporation | Method of feature exaction from time-series of spectra to control endpoint of process |
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| TWI734207B (en) | 2021-07-21 |
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