CN210085623U - A separate heat exchanger device for carborundum is epitaxial - Google Patents
A separate heat exchanger device for carborundum is epitaxial Download PDFInfo
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- CN210085623U CN210085623U CN201920625832.0U CN201920625832U CN210085623U CN 210085623 U CN210085623 U CN 210085623U CN 201920625832 U CN201920625832 U CN 201920625832U CN 210085623 U CN210085623 U CN 210085623U
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Abstract
The utility model discloses mainly be applied to semiconductor epitaxial growth equipment, concretely relates to be used for epitaxial heat exchanger device of carborundum. Comprises an inner cylinder and an outer cylinder which are sleeved with each other; a cavity is formed between the inner cylinder and the outer cylinder; a graphite base is arranged in the inner cylinder, and a graphite felt is sleeved outside the graphite base; a plurality of induction heaters are arranged outside the outer cylinder and connected with the graphite base; the bottom side and the top side of one end of the outer barrel are provided with a plurality of pairs of openings in a facing manner, the openings at the bottom side are provided with water inlets, and the openings at the top side are provided with water outlets; the lower part in the cavity is provided with a water inlet runner, and the upper part is provided with a water outlet runner; one end of the water inlet branch channel and one end of the water outlet branch channel are respectively connected with a water inlet and a water outlet through a water inlet pipe and a water outlet pipe, and the other ends of the water inlet branch channel and the water outlet branch channel are sealed by a sealing plate; the water inlet branch channel and the water outlet branch channel are symmetrically provided with three channels, through holes are arranged on the walls of the branch channels, the through holes on the branch channels on two sides are single-row holes, and the branch channel in the middle is a double-row small hole which is symmetrically distributed. The utility model discloses simple structure, reasonable in design realizes that the degree of difficulty is not big, and it is convenient to maintain.
Description
Technical Field
The utility model discloses mainly be applied to semiconductor epitaxial growth equipment, concretely relates to be used for epitaxial heat exchanger device of carborundum.
Background
The semiconductor epitaxial wafer can grow only in a reaction chamber at a certain high temperature, the epitaxial growth of a silicon wafer is usually 1000-1300 ℃, the epitaxial growth of a silicon carbide wafer is about 1550-1750 ℃, and the high temperature not only ensures that the temperature in the reaction chamber is kept high, but also ensures that the outer wall is kept low.
The mainstream heating mode of the epitaxial furnace designed in the current market is divided into two types: one is radiant heating, heating the substrate surface by Lamp; one is induction heating, which heats the substrate from the backside by thermal conduction, both of which have their own advantages and disadvantages. In the Lamp heating method, the heating source is concentrated, so that the influence of heat on the periphery is small, and the temperature can be reduced by an air cooling method. The induction heating uses the graphite piece in the coil as the heat source, when the current changes rapidly flowing through the graphite piece, the skin effect is generated, the current is concentrated on the surface layer of the graphite piece, a heat source with high selectivity is generated on the surface layer of the graphite piece, the graphite piece heated to 1500-1750 ℃ has great influence on the surrounding heat, however, 1750 ℃ is just the melting point of the quartz material, and the temperature can not be rapidly reduced by the air cooling method.
SUMMERY OF THE UTILITY MODEL
The to-be-solved technical problem of the utility model is to overcome not enough among the prior art, provide a separate heat exchanger device for silicon carbide is epitaxial.
In order to solve the technical problem, the utility model discloses a solution is:
the heat shield device for silicon carbide epitaxy comprises an inner cylinder and an outer cylinder which are sleeved with each other; a cavity is formed between the inner cylinder and the outer cylinder;
a graphite base is arranged in the inner cylinder, and a graphite felt is sleeved outside the graphite base;
a plurality of induction heaters are arranged outside the outer cylinder and connected with the graphite base; the bottom side and the top side of one end of the outer barrel are provided with a plurality of pairs of openings in a facing manner, the openings at the bottom side are provided with water inlets, and the openings at the top side are provided with water outlets; the lower part in the cavity is provided with a water inlet runner, and the upper part is provided with a water outlet runner; one end of the water inlet branch channel and one end of the water outlet branch channel are respectively connected with a water inlet and a water outlet through a water inlet pipe and a water outlet pipe, and the other ends of the water inlet branch channel and the water outlet branch channel are sealed by a sealing plate;
the water inlet branch channel and the water outlet branch channel are symmetrically provided with three channels, through holes are arranged on the walls of the branch channels, the through holes on the branch channels on two sides are single-row holes, and the branch channel in the middle is a double-row small hole which is symmetrically distributed.
As an improvement, the inner cylinder is a straight cylinder with a circular or oval shape.
As an improvement, the outer cylinder is circular or oval, the two ends of the outer cylinder are provided with inner flanges in arc transition, and the circular or oval shape formed by the inner flanges is matched with the outer diameter of the inner cylinder.
As an improvement, the outer wall of the water inlet pipe is provided with a step. The water pipe joint is convenient to clamp, one end of the water pipe joint is an inclined plane, the inclined plane is matched with the inclined plane of the sub-runner, so that the inner runner of the water inlet pipe is communicated with the inner runner of the sub-runner, one end of the water inlet pipe is arranged on the inner side of the outer barrel, and the other end of the water inlet pipe is arranged on the outer side.
As an improvement, the outer wall of the water outlet pipe is provided with a step. The water pipe joint is convenient to clamp, one end of the water pipe joint is an inclined plane, the inclined plane is matched with the inclined plane of the sub-runner, so that the inner runner of the water outlet pipe is communicated with the inner runner of the sub-runner, and one end of the water outlet pipe is arranged on the inner side of the outer barrel and the other end of the water outlet pipe is arranged on the outer side.
As an improvement, the sub-runners are straight pipes or spiral pipes, and holes are distributed in a straight line or a spiral manner. The holes are arranged in the device to form a certain included angle, the orifices of the holes are close to the contact lines of the sub-channels and the inner and outer cylinder walls, because the contact of the outer wall of the tubular sub-channel and the inner and outer cylinders is a line, the line projection is a point, an included angle is formed by drawing the tangent lines of the circles formed by the two sub-channels and the inner and outer cylinders, the water flow in the cooling process at the position of the included angle is static, the heat insulation effect of the device is influenced to a certain extent, and the positions of the holes are close to the contact lines as much as possible, and the dead water flows as much as possible.
As an improvement, the components are welded by high-temperature fusion.
As an improvement, the cavity is filled with cooling liquid to fill the whole cavity. The cooling fluid is typically purified water.
Compared with the prior art, the utility model has the technical effects that:
the utility model discloses simple structure, reasonable in design realizes that the degree of difficulty is not big, and it is convenient to maintain.
Drawings
Fig. 1 is a full sectional view of the present invention;
fig. 2 is a cross-sectional view perpendicular to the radial direction of the present invention;
FIG. 3 is a distribution diagram and a water inlet flow diagram of the water inlet runner of the present invention;
reference numerals: 1-an inner cylinder; 2-closing the plate; 3-an induction heater; 4-a shunt; 5-graphite felt; 6-a graphite base; 7-outer cylinder; 8-water outlet pipe; 9-a water inlet pipe; 10-cavity.
Detailed Description
The following detailed description of the embodiments of the present invention will be made with reference to the accompanying drawings.
As shown in FIG. 1, a heat shield device for silicon carbide epitaxy comprises an inner cylinder 1 and an outer cylinder 7 which are sleeved with each other. An annular cavity 10 is arranged between the inner cylinder 1 and the outer cylinder 7. The inner cylinder 1 is a straight cylinder of a circular or oval shape. The outer cylinder 7 is round or oval, the two ends are provided with circular arc transition inner flanging, and the round or oval shape formed by the inner flanging is matched with the outer diameter of the inner cylinder 1.
A graphite base 6 is arranged in the inner cylinder 1, and a graphite felt 5 is sleeved outside the graphite base 6.
A plurality of induction heaters 3 are arranged outside the outer cylinder 7, and the induction heaters 3 are connected with the graphite base 6. The bottom side and the top side of one end of the outer cylinder 7 are oppositely provided with a plurality of pairs of openings, the openings at the bottom side are internally provided with water inlets, and the openings at the top side are internally provided with water outlets. The cavity 10 is provided with a sub-channel 4 which comprises a water inlet sub-channel arranged at the lower part and a water outlet sub-channel arranged at the upper part. One end of the water inlet branch channel and one end of the water outlet branch channel are respectively connected with a water inlet and a water outlet through a water inlet pipe 9 and a water outlet pipe 8, and the other ends of the water inlet branch channel and the water outlet branch channel are sealed by a sealing plate 2. The outer wall of the water inlet pipe 9 is provided with a step. The water pipe joint is convenient to clamp, one end of the water pipe joint is an inclined plane, the inclined plane is matched with the inclined plane of the branch channel, so that the inner channel of the water inlet pipe 9 is communicated with the water inlet branch channel, one end of the water inlet pipe 9 is arranged on the inner side of the outer cylinder 7, and the other end of the water inlet pipe is arranged on the outer side of the. The outer wall of the water outlet pipe 8 is provided with a step. One end of the water pipe joint is an inclined plane which is matched with the inclined plane of the branch flow channel, so that the inner flow channel of the water outlet pipe 8 is communicated with the water outlet branch flow channel, and one end of the water outlet pipe 8 is arranged on the inner side of the outer cylinder 7 and the other end is arranged on the outer side of the outer cylinder 7.
The water inlet branch channel and the water outlet branch channel are symmetrically provided with three channels, the walls of the branch channels are provided with through holes, the branch channels on two sides are single-row holes outward, and the branch channels in the middle are distributed left and right with double-row small holes. The branch flow passage 4 is a straight pipe or a spiral pipe fitting, and holes are distributed in a straight line or a spiral manner. The holes are arranged in the device to form a certain included angle, the orifices of the holes are close to the contact lines of the sub-runners 4 and the inner and outer cylinder walls, because the contact of the outer wall of the tubular sub-runners 4 and the inner and outer cylinders is a line, the line projection is a point, an included angle is formed by drawing the tangent lines of the circles formed by the two sub-runners 4 and the inner and outer cylinders, the water flow in the cooling process at the position of the included angle is static, the heat insulation effect of the device is influenced to a certain extent, the positions of the holes are close to the contact lines as much as possible, and the dead water flows as much as possible.
The utility model discloses a working process does: referring to fig. 2, the induction heater 3 applies work to heat the graphite base 6 to 1550-1750 ℃, the high temperature of the graphite base is gradually transferred to the graphite felt 5 to heat the heat shield, and therefore pure water is started before the induction heater 3 applies work to cool the heat shield. Pure water enters from a water inlet pipe 9 in three paths and enters a cavity 10 from small holes of the sub-channels 4 respectively, the sub-channels on two sides are single-row small holes and symmetrically discharge water from two sides respectively, the sub-channels in the middle are two rows of small holes, and water is discharged from the left side and the right side. The pure water circularly flows in this way to take away the heat of the quartz inner cylinder 1, so that the heat insulation effect of heat dissipation inside and outside the graphite base is realized, the water temperature is generally controlled below 35 ℃, the water flow is not lower than 30L/h, and the temperature of the quartz heat insulation cover can be controlled to be about 200 DEG C
Finally, it is to be noted that the above-mentioned embodiments are only specific embodiments of the present invention. Obviously, the present invention is not limited to the above embodiments, and many variations are possible. All modifications which can be derived or suggested by a person skilled in the art from the disclosure of the invention should be considered as within the scope of the invention.
Claims (6)
1. A heat shield device for silicon carbide epitaxy comprises an inner cylinder and an outer cylinder which are sleeved with each other; a cavity is formed between the inner cylinder and the outer cylinder; it is characterized in that the preparation method is characterized in that,
a graphite base is arranged in the inner cylinder, and a graphite felt is sleeved outside the graphite base;
a plurality of induction heaters are arranged outside the outer barrel and connected with the graphite base; the bottom side and the top side of one end of the outer barrel are provided with a plurality of pairs of openings in a facing manner, the openings at the bottom side are provided with water inlets, and the openings at the top side are provided with water outlets; the lower part in the cavity is provided with a water inlet runner, and the upper part is provided with a water outlet runner; one end of the water inlet branch channel and one end of the water outlet branch channel are respectively connected with a water inlet and a water outlet through a water inlet pipe and a water outlet pipe, and the other ends of the water inlet branch channel and the water outlet branch channel are sealed by a sealing plate;
the water inlet sub-runner and the water outlet sub-runner are symmetrically provided with three ways, through holes are arranged on the walls of the sub-runners, the through holes on the sub-runners at two sides are single-row holes, and the middle sub-runner is a double-row small hole which is symmetrically distributed.
2. The device of claim 1, wherein the inner barrel is a straight barrel that is circular or elliptical.
3. The device of claim 1, wherein the outer cylinder is circular or elliptical, and the two ends of the outer cylinder are provided with inward flanges with arc transition, and the circular or elliptical shape formed by the inward flanges is matched with the outer diameter of the inner cylinder.
4. The apparatus of claim 1, wherein the outer wall of the water inlet pipe is provided with a step.
5. The apparatus of claim 1 wherein the outlet pipe outer wall is stepped.
6. The device of claim 1, wherein the inlet and outlet channels are straight or helical tubes with holes arranged in a straight or helical pattern.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920625832.0U CN210085623U (en) | 2019-05-05 | 2019-05-05 | A separate heat exchanger device for carborundum is epitaxial |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920625832.0U CN210085623U (en) | 2019-05-05 | 2019-05-05 | A separate heat exchanger device for carborundum is epitaxial |
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| CN210085623U true CN210085623U (en) | 2020-02-18 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112111785A (en) * | 2020-09-18 | 2020-12-22 | 北京北方华创微电子装备有限公司 | Semiconductor equipment and process chamber thereof |
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- 2019-05-05 CN CN201920625832.0U patent/CN210085623U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112111785A (en) * | 2020-09-18 | 2020-12-22 | 北京北方华创微电子装备有限公司 | Semiconductor equipment and process chamber thereof |
| CN113668051A (en) * | 2020-09-18 | 2021-11-19 | 北京北方华创微电子装备有限公司 | Semiconductor equipment and process chamber thereof |
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Effective date of registration: 20211025 Address after: 311100 floor 3, building 2, No. 96, longchuanwu Road, Yuhang District, Hangzhou City, Zhejiang Province Patentee after: ZHEJIANG QIUSHI SEMICONDUCTOR EQUIPMENT Co.,Ltd. Patentee after: ZHEJIANG JINGSHENG M&E Co.,Ltd. Address before: 311100 zone a, floor 1, building 1, No. 96, longchuanwu Road, Yuhang District, Hangzhou City, Zhejiang Province Patentee before: HANGZHOU HONGSHENG INTELLIGENT TECHNOLOGY Co.,Ltd. |