CN210073787U

CN210073787U - Pre-cleaning device

Info

Publication number: CN210073787U
Application number: CN201921359201.5U
Authority: CN
Inventors: 王国辉
Original assignee: Atlas Photovoltaic Power Luoyang Co Ltd
Current assignee: Atlas Photovoltaic Power Luoyang Co Ltd
Priority date: 2019-08-20
Filing date: 2019-08-20
Publication date: 2020-02-14
Anticipated expiration: 2029-08-20

Abstract

The utility model relates to a solar cell technical field discloses a belt cleaning device in advance. The pre-cleaning device comprises a feeding groove and a spraying device, wherein a transmission mechanism is arranged on the feeding groove and is configured to transmit a silicon wafer to be cleaned, the spraying device is rotatably arranged on a transmission track of the transmission mechanism and is positioned above the transmission mechanism, and a spraying hole is formed in the spraying device and can spray cleaning liquid to the surface of the silicon wafer to be cleaned. The spraying device is arranged on the transmission track of the transmission mechanism and is positioned above the transmission mechanism, so that the residual cutting liquid, silicon powder, silicon oxide, other metal ions and other impurities on the surface of the silicon wafer to be cleaned can be cleaned; set up spray set as rotatable, make this spray set can treat the surface of wasing the silicon chip and carry out comprehensive washing to prevent to treat that to wash remaining impurity in silicon chip surface is air-dried in transmission process, reduce and treat the washing degree of difficulty and the cost of wasing the silicon chip in belt cleaning device, and the cleaning performance is better.

Description

Pre-cleaning device

Technical Field

The utility model relates to a solar cell technical field especially relates to a belt cleaning device in advance.

Background

Solar energy is a clean renewable energy source, and solar cells based on photovoltaic effect have good application prospects, and are devices for directly converting light energy into electric energy through photoelectric effect or photochemical effect. The solar cell is a green and environment-friendly product, does not cause environmental pollution, is a renewable resource, and has wide application prospect, wherein the silicon solar cell is the most mature in development at present.

A large amount of cutting liquid, silicon powder, silicon oxide and other metal ions and other impurities can be remained on the surface of a solar cell silicon wafer in the cutting process and need to be cleaned, but in the process of transmission between a silicon inserting machine and a cleaning tank, the silicon wafer is directly exposed in the air, and the exposure of the silicon wafer which is not cleaned in the air can cause the air drying of the residual cutting liquid, silicon powder, silicon oxide and other metal ions and other impurities on the surface of the silicon wafer, so that the cleaning difficulty of the silicon wafer in a cleaning device is large, and the cleaning cost is increased.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide a belt cleaning device in advance prevents that the remaining impurity in silicon chip surface from air-drying in transmission process, reduces and washs the degree of difficulty and washing cost.

As the conception, the utility model adopts the technical proposal that:

a precleaning apparatus comprising:

the feeding trough is provided with a transmission mechanism, and the transmission mechanism is configured to transmit the silicon wafer to be cleaned;

and the spraying device is provided with spraying holes and is rotatably arranged above the transmission mechanism so as to adjust the angle of spraying the cleaning liquid to the surface of the silicon wafer to be cleaned by the spraying device.

As a preferable scheme of the pre-cleaning device, a mist spray head is arranged on the spray hole.

As a preferable aspect of the pre-cleaning apparatus, the spray apparatus includes:

the spray pipe, the spray pipe is followed the width direction of material loading groove extends, be provided with along its axial on the outer peripheral face of spray pipe a plurality of spray hole, the spray pipe can rotate around its axis.

As a preferred scheme of the pre-cleaning device, the pre-cleaning device further comprises a support, the support is arranged on the outer side of the side wall of the feeding groove, and the spraying device is rotatably arranged on the support.

As a preferred scheme of the pre-cleaning device, the pre-cleaning device further comprises a sleeve, the sleeve is sleeved on the spray pipe, and the spray pipe can rotate relative to the sleeve.

As a preferred scheme of the pre-cleaning device, a rotating handle is further arranged on the spray pipe.

As a preferable aspect of the pre-cleaning apparatus, the pre-cleaning apparatus further includes a rotary drive assembly configured to drive the shower apparatus to rotate.

As a preferable scheme of the pre-cleaning device, a plurality of spraying devices are arranged, and the plurality of spraying devices are arranged at intervals along the length direction of the feeding trough.

As a preferred scheme of the pre-cleaning device, the rotation angle of the spraying device ranges from 0 degrees to 180 degrees.

As a preferred scheme of the pre-cleaning device, a bearing part is arranged on the transmission mechanism, the bearing part is used for bearing the silicon wafer to be cleaned, and a plurality of leakage holes are formed in the bottom and/or the side surface of the bearing part.

The utility model has the advantages that:

the utility model provides a pre-cleaning device, which completes the transmission of the silicon wafer to be cleaned through a transmission mechanism arranged on a feeding groove; the spraying device is arranged on the transmission track of the transmission mechanism and is positioned above the transmission mechanism, so that the residual cutting liquid, silicon powder, silicon oxide, other metal ions and other impurities on the surface of the silicon wafer to be cleaned can be cleaned; set up spray set as rotatable, make this spray set have a plurality of directions that spray, can treat the surface of wasing the silicon chip and carry out comprehensive washing to prevent to treat that to wash silicon chip surface remaining impurity from air-drying in transmission process, reduce and treat the washing degree of difficulty and the cost of wasing the silicon chip in belt cleaning device, and the cleaning performance is better.

Drawings

Fig. 1 is a schematic structural diagram of a precleaning apparatus according to an embodiment of the present invention.

In the figure:

1-feeding trough;

2-a spray pipe; 21-a water inlet; 22-spray holes;

3-water inlet pipe; 31-water pressure regulating valve.

Detailed Description

The present invention will be described in further detail with reference to the accompanying drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention. It should be further noted that, for the convenience of description, only some of the structures related to the present invention are shown in the drawings, not all of the structures.

In the description of the present invention, unless expressly stated or limited otherwise, the terms "connected," "connected," and "fixed" are to be construed broadly, e.g., as meaning permanently connected, detachably connected, or integral to one another; can be mechanically or electrically connected; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art.

In the present disclosure, unless expressly stated or limited otherwise, the first feature "on" or "under" the second feature may comprise direct contact between the first and second features, or may comprise contact between the first and second features not directly. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature includes the first feature being directly under and obliquely below the second feature, or simply meaning that the first feature is at a lesser elevation than the second feature.

In the description of the present embodiment, the terms "upper", "lower", "right", etc. are used in an orientation or positional relationship based on that shown in the drawings only for convenience of description and simplicity of operation, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first" and "second" are used only for descriptive purposes and are not intended to have a special meaning.

Among the prior art, treat that to wash the silicon chip and carry out abluent belt cleaning device and include a plurality of washing tanks usually, treat that to wash the silicon chip and wash through a plurality of washing tanks in proper order, common cleaning process is: normal temperature cleaning, high temperature alkali cleaning, high temperature rinsing, slow drawing dehydration and drying. In the process of conveying the silicon wafer to be cleaned to the cleaning device by the wafer inserting machine, the silicon wafer to be cleaned is directly exposed in the air, and residual impurities on the silicon wafer are easily dried in the air, so that the cleaning difficulty of the silicon wafer to be cleaned in the cleaning device is high, and the cleaning cost is increased.

In order to solve the above problem, as shown in fig. 1, the present embodiment provides a pre-cleaning device, which includes a feeding trough 1 and a spraying device, wherein the feeding trough 1 is provided with a transmission mechanism, the transmission mechanism is configured to transmit a silicon wafer to be cleaned, the spraying device is provided with a spraying hole 22, and the spraying device is rotatably disposed above the transmission mechanism to adjust an angle at which the spraying device sprays a cleaning solution onto the surface of the silicon wafer to be cleaned. Alternatively, the cleaning solution may be clear water or a mixed solution of clear water and cleaning agent.

The silicon wafers to be cleaned are conveyed through a conveying mechanism arranged on the feeding chute 1; the spraying device is arranged above the transmission mechanism, so that cutting liquid, silicon powder, silicon oxide, other metal ions and other impurities remained on the surface of the silicon wafer to be cleaned can be cleaned; set up spray set as rotatable for spray angle is variable in the cleaning process, thereby makes this spray set can treat the surface of wasing the silicon chip and carry out comprehensive washing, in order to prevent to treat that the remaining impurity in silicon chip surface that washs from air-drying in transmission process, reduces the washing degree of difficulty and the cost of wasing of waiting to wash the silicon chip in cleaning device, and the cleaning performance is better.

Specifically, in this embodiment, the transmission mechanism is a transmission chain arranged inside the feeding chute 1, of course, in other embodiments, the transmission mechanism may also be a conveyor belt, and other arrangement modes of the transmission mechanism capable of realizing transmission of the silicon wafer to be cleaned between the wafer inserting machine and the cleaning device may be adopted.

Preferably, the transmission mechanism is provided with a bearing part, the bearing part is used for bearing the silicon wafer to be cleaned, and the bottom and/or the side surface of the bearing part are/is provided with a plurality of leakage holes. Through set up a plurality of small openings on bearing the piece, can in time discharge the washing liquid that washs the silicon chip of waiting to wash, avoid waiting to wash the silicon chip and soak in unclean washing liquid for a long time. In this embodiment, the bearing member is a conveying basket, and the silicon wafer to be cleaned is inserted into the conveying basket by a wafer inserting machine before pre-cleaning. Preferably, the distance h between the spraying device and the upper surface of the silicon wafer to be cleaned is more than or equal to 20 cm.

Further, spray and be provided with vaporific shower nozzle on the hole 22, through set up vaporific shower nozzle on spraying hole 22, can make the washing liquid be vaporific and spray to the surface of treating the washing silicon chip, reduce the washing liquid and spray to the dynamics of treating washing silicon chip surface, and can increase the washing liquid and spray to the area of treating washing silicon chip surface, improve the cleaning performance.

Further, spray set includes shower 2, and shower 2 extends along the width direction of material loading groove 1, is provided with a plurality of spray holes 22 along its axial on the outer peripheral face of shower 2, and shower 2 can rotate around its axis. Because the conveying basket is parallel to each other and the silicon chips to be cleaned are arranged at intervals, the connecting lines between the silicon chips to be cleaned are parallel to the axis direction of the spraying pipe 2, the spraying holes 22 are formed in the outer peripheral surface of the spraying pipe 2 along the axial direction of the spraying pipe, the spraying distance of the cleaning liquid in the axis direction of the spraying pipe 2 can be increased, it is guaranteed that each silicon chip to be cleaned in the conveying basket can be cleaned comprehensively, and the cleaning effect and the cleaning efficiency are improved. Preferably, the number a of spray holes 22 is ≧ 10.

Further, the spraying pipe 2 can be arranged close to the transmission initial end of the transmission mechanism, so that the to-be-cleaned silicon wafer in the transmission process can be in contact with cleaning liquid in time, and the air drying of residual cutting liquid, silicon powder, silicon oxide, other metal ions and other impurities on the surface of the to-be-cleaned silicon wafer is avoided.

Further, this belt cleaning device in advance still includes the support (not shown in the figure), and the support sets up on the outside of the lateral wall of material loading chute 1, and spray set rotates and sets up on the support, and the support can play the effect of support to spray set.

Furthermore, a water inlet pipe 3 is arranged on the bracket, and the water inlet pipe 3 is communicated with a water inlet 21 of the spray pipe 2. In this embodiment, the number of support is two, and the line direction between two supports is perpendicular with transmission mechanism's transmission direction, all is provided with a inlet tube 3 on each support, and the water inlet 21 at the both ends of shower 2 connects the export of a inlet tube 3 respectively. The water outlet effect of the spraying holes 22 can be improved by arranging the water inlet pipes 3 at the two ends of the spraying pipe 2. Preferably, a water pressure regulating valve 31 is provided on the water inlet pipe 3 for regulating the water inlet pressure of the water inlet pipe 3.

Further, this belt cleaning device still includes the sleeve pipe, and the sleeve pipe cover is located on shower 2, and shower 2 can rotate relative to the sleeve pipe. In this embodiment, two sleeves are provided, and the two sleeves are sleeved on the periphery of the connection position of the spray pipe 2 and the water outlet pipe 3. Of course, in other embodiments, the number of the sleeves may also be multiple, and multiple sleeves are sleeved on the shower pipe 2 at intervals, and the sleeves do not block the shower holes 22.

Preferably, in this embodiment, the spray pipe 2, the water inlet pipe 3, the water pressure regulating valve 31 and the mist head are all made of plastic. Compared with metal materials, the spray pipe 2, the water inlet pipe 3, the water pressure regulating valve 31 and the mist-shaped spray head which are made of plastic materials are not easy to rust, and the manufacturing cost is low.

It should be noted that the internal structure of the water pressure regulating valve 31 is conventional, and redundant description is not given here.

Preferably, a rotating handle can be further arranged on the spraying pipe 2, the rotating handle is arranged on one side, close to one of the water inlets 21, of the spraying pipe 2, and an operator can rotate the rotating handle to rotate the spraying pipe 2.

In order to realize the automatic rotation of the spraying pipe 2, the pre-cleaning device can further comprise a rotary driving assembly, the rotary driving assembly is configured to drive the spraying pipe 2 to rotate, the automatic rotation of the spraying pipe 2 can be realized by arranging the rotary driving assembly, the labor intensity of operators is reduced, and the automation degree of the pre-cleaning device is improved.

Specifically, the rotation driving assembly comprises a cylinder, a connecting rod and a semicircular rotation clamp, the semicircular rotation clamp sleeve is arranged at the middle part of the spraying pipe 2, one end of the connecting rod is connected with the output end of the cylinder, the other end of the connecting rod is connected with the semicircular rotation clamp, and the cylinder can drive the connecting rod to move up and down so as to drive the spraying pipe 2 to rotate.

Of course, in other embodiments, only one water inlet 21 may be provided on the shower pipe 2, the rotation driving assembly may also be a rotation motor, an output end of the rotation motor is connected to an end of the shower pipe 2 away from the water inlet 21, so that the shower pipe 2 can be automatically rotated, and other setting manners of the rotation driving assembly that can automatically rotate the shower pipe 2 may be adopted.

Further, in order to further improve the cleaning effect of the pre-cleaning device on the silicon wafer to be cleaned, the spraying device is provided with a plurality of spraying devices, the plurality of spraying devices are arranged along the length direction interval of the upper trough 1, the spraying distance of the spraying device on the upper trough 1 can be increased, the cleaning liquid is always sprayed to the surface of the silicon wafer to be cleaned in the transmission process, the air drying of the silicon wafer to be cleaned in the transmission process is avoided, and the cleaning difficulty of the silicon wafer in the cleaning device is reduced. Preferably, the rotation angle of the spray device ranges from 0 ° to 180 °.

The pre-cleaning device is simple in structure, low in manufacturing cost and capable of improving cleaning efficiency and cleaning effect.

The above embodiments have been described only the basic principles and features of the present invention, and the present invention is not limited by the above embodiments, and is not departing from the spirit and scope of the present invention. The scope of the invention is defined by the appended claims and equivalents thereof.

Claims

1. A precleaning apparatus, comprising:

the silicon wafer cleaning device comprises a feeding groove (1), wherein a conveying mechanism is arranged on the feeding groove and is configured to convey a silicon wafer to be cleaned;

and the spraying device is provided with spraying holes (22), and the spraying device is rotatably arranged above the transmission mechanism so as to adjust the angle of spraying the cleaning liquid to the surface of the silicon wafer to be cleaned by the spraying device.

2. The pre-cleaning device according to claim 1, characterized in that the spray holes (22) are provided with mist nozzles.

3. The pre-cleaning apparatus as set forth in claim 1, wherein the spray means comprises:

the spraying pipe (2), the spraying pipe (2) are followed the width direction of material loading groove (1) extends, be provided with a plurality ofly along its axial on the outer peripheral face of spraying pipe (2) spray hole (22), spraying pipe (2) can rotate around its axis.

4. The pre-cleaning device according to claim 3, characterized in that it further comprises a support, which is arranged on the outside of the side wall of the loading chute (1), on which support the spraying device is rotatably arranged.

5. The pre-cleaning device according to claim 4, characterized in that it further comprises a sleeve, said sleeve being fitted over said shower pipe (2), said shower pipe (2) being able to rotate with respect to said sleeve.

6. A pre-cleaning device according to claim 3, characterised in that a turning handle is also provided on the shower pipe (2).

7. The pre-cleaning apparatus of claim 1, further comprising a rotary drive assembly configured to drive rotation of the spray device.

8. The pre-cleaning device according to any one of claims 1 to 7, characterized in that a plurality of spraying devices are provided, and the plurality of spraying devices are arranged at intervals along the length direction of the feeding trough (1).

9. The precleaner of claim 8, wherein said spray assembly is rotated through an angle in a range of 0 ° to 180 °.

10. The pre-cleaning device as claimed in claim 1, wherein the transport mechanism is provided with a carrier for carrying the silicon wafer to be cleaned, and a plurality of holes are provided on the bottom and/or the side of the carrier.