CN210048651U - Oxyhydrogen flame burner for gas-phase synthesis of quartz glass lump - Google Patents
Oxyhydrogen flame burner for gas-phase synthesis of quartz glass lump Download PDFInfo
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- CN210048651U CN210048651U CN201920787116.2U CN201920787116U CN210048651U CN 210048651 U CN210048651 U CN 210048651U CN 201920787116 U CN201920787116 U CN 201920787116U CN 210048651 U CN210048651 U CN 210048651U
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Abstract
The utility model discloses a oxyhydrogen flame burner that is used for gas phase synthesis quartz glass to stick together, including inlet pipe, feeding siphunculus, protection tube buffer chamber, one deck oxygen buffer chamber, two layers of oxygen buffer chambers, hydrogen buffer chamber, outer ring tube buffer chamber, material protection siphunculus, one deck oxygen room, two layers of oxygen rooms, hydrogen room, outer ring room, one deck oxygen siphunculus, two layers of oxygen siphunculus, material protection tube, one deck oxygen pipe and two layers of oxygen pipe, hydrogen pipe and outer ring pipe, set up inert gas buffer chamber below outer ring tube buffer chamber, inert gas room and inert gas pipe that switch on with inert gas buffer chamber, inert gas room and outer ring room are concentric circles structural style and arrange and lie in the outer ring outdoor side. The utility model provides a glass attitude tumor falls easily along long-pending material outside the combustor port in vertical CVD technology, seriously reduces the problem that quartz glass sticks together the quality for a oxyhydrogen flame burner that is used for gas phase synthesis quartz glass sticks together.
Description
Technical Field
The utility model relates to an oxyhydrogen flame burner, in particular to an oxyhydrogen flame burner for gas phase synthesis quartz glass sticks together.
Background
The oxyhydrogen flame burner plays an important role in the manufacturing process of the synthetic quartz glass lump. The hydrogen and the oxygen are combusted in the deposition furnace through the combustor to generate water vapor and high temperature, and simultaneously, gaseous silicon tetrachloride sprayed by the combustor and the water vapor generate hydrolysis reaction to generate silicon dioxide particles which are deposited on a target surface and are fused into quartz glass under the action of the high temperature.
CN201245547Y discloses an oxyhydrogen burner for synthesizing quartz glass, and specifically discloses an oxyhydrogen burner which comprises a feeding pipe, a hydrogen chamber, a feeding through pipe, a hydrogen pipe, a first-layer oxygen pipe, a second-layer oxygen pipe and an outer cover pipe, wherein a buffer bag is arranged below the feeding pipe, a feeding buffer cavity is arranged below the buffer bag, and the feeding buffer cavity is connected with the feeding through pipe; a protective tube buffer cavity, a first-layer oxygen chamber, a second-layer oxygen chamber, a hydrogen chamber and an outer cover chamber are sequentially arranged below the feeding buffer cavity; a material protection through pipe is arranged below the protection pipe buffer cavity, and a material protection pipe is arranged above the protection pipe buffer cavity; the upper parts of the first layer oxygen chamber, the second layer oxygen chamber, the hydrogen chamber and the outer cover chamber are respectively provided with a first layer oxygen buffer cavity, a second layer oxygen buffer cavity, a hydrogen buffer cavity and an outer cover tube buffer cavity, and a first layer oxygen tube, a second layer oxygen tube and a hydrogen tube and an outer cover tube which are symmetrically arranged are respectively arranged on the first layer oxygen chamber, the second layer oxygen chamber, the hydrogen chamber and the outer cover chamber. The hydrogen and oxygen burner for the synthetic quartz glass solves the problems that in the prior art, feeding of a feeding pipe is not uniform, gaseous silicon tetrachloride directly enters the burner when condensed into liquid, the feeding pipe is easy to accumulate and block, and a hydrogen pipe and an oxygen pipe are not uniform and unstable when gas flows out.
However, in the vertical Chemical Vapor Deposition (CVD) process of such a burner, a part of the generated silica particles is accumulated outside the burner port due to the flame gas flow and the obstruction of the deposition surface. And because the temperature at the port is higher due to the structure of the burner, the accumulated silicon dioxide particles are easy to vitrify and drop to a deposition surface under the action of gravity to form nodule defects, thereby causing great influence on the quality of the quartz glass lump.
SUMMERY OF THE UTILITY MODEL
The utility model provides an overcome the problem that prior art exists, provide an oxyhydrogen flame burner for gas phase synthesis quartz glass sticks together, solve the oxyhydrogen flame burner of original use in vertical CVD technology, fall glass state tumor easily along long-pending material outside the combustor port, seriously reduce the problem that quartz glass sticks together the quality.
The utility model adopts the technical proposal that:
an oxyhydrogen flame burner for gas-phase synthesis of a quartz glass lump comprises a feeding pipe, a feeding through pipe, a protection pipe buffer cavity, a first-layer oxygen buffer cavity, a second-layer oxygen buffer cavity, a hydrogen buffer cavity, an outer ring pipe buffer cavity, a material protection through pipe, a first-layer oxygen chamber, a second-layer oxygen chamber, a hydrogen chamber, an outer ring chamber, a first-layer oxygen through pipe, a second-layer oxygen through pipe, a material protection pipe, a first-layer oxygen pipe, a second-layer oxygen pipe, a hydrogen pipe and an outer ring pipe;
the protective tube buffer cavity, the first-layer oxygen buffer cavity, the second-layer oxygen buffer cavity, the hydrogen buffer cavity and the outer ring tube buffer cavity are sequentially connected to form a whole, and the feeding through pipe penetrates through the whole;
the material protection through pipe, the first-layer oxygen chamber and the second-layer oxygen chamber are arranged in a concentric circle structure with the feeding through pipe from inside to outside and are respectively communicated with the protection pipe buffer cavity, the first-layer oxygen buffer cavity and the second-layer oxygen buffer cavity, and the lower end of the material protection through pipe is flush with the lower end of the feeding through pipe;
from inside to outside, the hydrogen chamber and the outer ring chamber are arranged in a concentric circle structure with the material protection through pipe and are respectively communicated with the hydrogen buffer cavity and the outer ring pipe buffer cavity;
the first-layer oxygen through pipe and the second-layer oxygen through pipe are respectively communicated with the first-layer oxygen chamber and the second-layer oxygen chamber, the lower ends of the first-layer oxygen through pipe and the second-layer oxygen through pipe are flush with the lower end of the feeding through pipe, an inert gas buffer cavity, an inert gas chamber communicated with the inert gas buffer cavity and an inert gas pipe used for introducing inert gas are arranged below the outer ring pipe buffer cavity, and the inert gas chamber and the outer ring chamber are arranged in a concentric circle structure mode and located on the outer side of the outer ring chamber.
Furthermore, the hydrogen pipe, the outer ring pipe and the inert gas pipe are respectively and uniformly arranged outside the hydrogen buffer cavity, the outer ring pipe buffer cavity and the inert gas buffer cavity.
Further, the bottom surfaces of the first-layer oxygen chamber and the second-layer oxygen chamber are flush and are positioned near the bottom in the hydrogen buffer chamber.
Further, the lower ends of the inert gas chamber, the outer ring chamber and the hydrogen chamber are flush with the lower end of the feed through pipe.
The utility model has the advantages that:
the utility model discloses beneficial effect compared with the prior art is: the oxyhydrogen flame burner for the synthetic quartz glass lump is characterized in that an inert gas chamber is additionally arranged outside an outer ring chamber of the oxyhydrogen flame burner on the basis of the originally used oxyhydrogen flame burner. An inert gas tube buffer cavity is additionally arranged below an outer ring tube buffer cavity of the originally used oxyhydrogen flame burner, and inert gas tubes are symmetrically arranged on the inert gas tube buffer cavity. In the process of the vertical CVD technology, the flow rate of the inert gas sprayed out of the inert gas chamber is larger than that of the outer epoxy gas, so that an annular inert gas curtain is formed outside the port of the oxyhydrogen flame burner, and the accumulation of silicon dioxide particles outside the port of the burner is effectively slowed down. Meanwhile, the annular inert gas curtain also effectively restrains oxyhydrogen flame, so that the temperature outside the port of the burner is obviously reduced, and accumulated silicon dioxide particles are prevented from being vitrified. Finally, the nodule defects of the quartz glass lump are controlled, and the quality of the quartz glass lump is obviously improved
Drawings
In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative efforts.
FIG. 1 is a schematic view of the oxyhydrogen flame burner of the present invention.
Fig. 2 is a schematic view of the oxyhydrogen flame burner of the present invention at another angle.
Fig. 3 is a schematic view of a part a of the enlarged structure in fig. 2.
Fig. 4 is a schematic view of a partially cut-open structure of an oxyhydrogen flame burner of the present invention.
FIG. 5 is a schematic view of the material area sprayed from the oxyhydrogen flame burner of the present invention.
Detailed Description
In the following, only certain exemplary embodiments are briefly described. As those skilled in the art will recognize, the described embodiments may be modified in various different ways, all without departing from the spirit or scope of the present invention. Accordingly, the drawings and description are to be regarded as illustrative in nature, and not as restrictive.
In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", and the like, indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for convenience of description and simplicity of description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, should not be construed as limiting the present invention.
The following disclosure provides many different embodiments or examples for implementing different features of the invention. In order to simplify the disclosure of the present invention, the components and arrangements of specific examples are described below. Of course, they are merely examples and are not intended to limit the present invention.
Embodiments of the present invention/utility model will be described in detail below with reference to the drawings.
An oxyhydrogen flame burner for gas-phase synthesis of a quartz glass lump, as shown in attached figures 1-5, comprises a feeding pipe 1, a feeding through pipe 2, a protection pipe buffer cavity 3, a first layer oxygen buffer cavity 4, a second layer oxygen buffer cavity 5, a hydrogen buffer cavity 6, an outer ring pipe buffer cavity 7, an inert gas buffer cavity 8, a material protection through pipe 9, a first layer oxygen chamber 10, a second layer oxygen chamber 11, a hydrogen chamber 12, an outer ring chamber 13, an inert gas chamber 14, a first layer oxygen through pipe 15, a second layer oxygen through pipe 16, a material protection pipe 17, a first layer oxygen pipe 18, a second layer oxygen pipe 19, a hydrogen pipe 20, an outer ring pipe 21 and an inert gas pipe 22.
The lower end of the feeding pipe 1 is communicated with the upper end of the feeding through pipe 2, and the lower end of the feeding through pipe 2 is open.
The protection tube buffer cavity 3, the first layer oxygen buffer cavity 4, the second layer oxygen buffer cavity 5, the hydrogen buffer cavity 6, the outer ring tube buffer cavity 7 and the inert gas buffer cavity 8 which are mutually closed and independent are sequentially connected in an up-down position relationship to form a whole. The feed pipe 2 is arranged along the center direction of the whole body, and the lower end of the feed pipe is positioned outside the inert gas buffer chamber 8.
The material protection siphunculus 9 is arranged with feeding siphunculus 2 to be concentric circles structural style, sets up in the feeding siphunculus 2 outside, and the upper end switches on with protection tube buffer chamber 3 bottom inboard, and the lower extreme is uncovered and flushes with feeding siphunculus 2 lower extreme.
The hollow cylindrical first-layer oxygen chamber 10 and second-layer oxygen chamber 11 are arranged in a concentric circle structure with the material protection through pipe 9, and the first-layer oxygen chamber 10 is positioned between the second-layer oxygen chamber 11 and the material protection through pipe 9 and outside the material protection through pipe 9. The upper end of the first-layer oxygen chamber 10 is communicated with the bottom of the first-layer oxygen buffer cavity 4, the upper end of the second-layer oxygen chamber 11 is communicated with the bottom of the second-layer oxygen buffer cavity 5, and the lower end of the first-layer oxygen chamber 10 and the lower end of the second-layer oxygen chamber 11 are sealed and flush and are positioned near the bottom surface of the inner side of the hydrogen buffer cavity 6.
The hollow cylindrical hydrogen chamber 12 and the material protection through pipe 9 are arranged in a concentric circle structure form, are arranged outside the material protection through pipe 9, and the inner diameter of the hollow cylindrical hydrogen chamber is larger than the outer diameter of the secondary oxygen chamber 11. The upper end of the hydrogen chamber 12 is communicated with the inner side of the bottom of the hydrogen buffer cavity 6, and the lower end is open and flush with the lower end of the feed pipe 2.
The hollow cylindrical outer ring chamber 13 and the hydrogen chamber 12 are arranged in a concentric circle structure form and are arranged outside the hydrogen chamber 12, the upper end of the hollow cylindrical outer ring chamber is communicated with the bottom of the inner side of the outer ring tube buffer cavity 7, and the lower end of the hollow cylindrical outer ring chamber is open and flush with the lower end of the feeding through tube 2.
The hollow cylindrical inert gas chamber 14 and the outer ring chamber 13 are arranged in a concentric circle structure form, are arranged outside the outer ring chamber 13, are communicated with the bottom of the inner side of the inert gas buffer cavity 8 at the upper ends thereof, and are open at the lower ends thereof and flush with the lower end of the feeding through pipe 2.
In the hydrogen chamber 12, a circle of one-layer oxygen through pipe 15 and a circle of two-layer oxygen through pipe 16 are arranged in the outer area of the material protection through pipe 9 in a concentric circle structure mode. The arrangement direction of the first layer oxygen through pipe 15 is parallel to the length direction of the material protection through pipe 9, the upper end of the first layer oxygen through pipe is communicated with the bottom area of the first layer oxygen chamber 10, and the lower end of the first layer oxygen through pipe is open and flush with the lower end of the feeding through pipe 2. The arrangement direction of the two-layer oxygen through pipe 16 is also parallel to the length direction of the material protection through pipe 9, the upper end of the two-layer oxygen through pipe is communicated with the bottom area of the two-layer oxygen chamber 11, and the lower end of the two-layer oxygen through pipe is open and flush with the lower end of the feeding through pipe 2.
The protective tube buffer cavity 3, the first-layer oxygen buffer cavity 4 and the second-layer oxygen buffer cavity 5 are respectively provided with a material protective tube 17, a first-layer oxygen tube 18 and a second-layer oxygen tube 19. Two hydrogen pipes 20, an outer ring pipe 21 and an inert gas pipe 22 are symmetrically arranged on the hydrogen buffer cavity 6, the outer ring pipe buffer cavity 7 and the inert gas buffer cavity 8. The number of the hydrogen pipes 20, the outer ring pipes 21 and the inert gas pipes 22 can be more than 3 according to actual needs, and the hydrogen pipes, the outer ring pipes 21 and the inert gas pipes are uniformly distributed.
In this embodiment, the feeding pipe 1, the material protection pipe 17, the first layer oxygen pipe 18, the second layer oxygen pipe 19, the hydrogen pipe 20, the outer ring pipe 21 and the inert gas pipe 22 are respectively fed with the gaseous raw material, oxygen, hydrogen, oxygen and inert gas, and formed on the outer side of the lower end of the feeding pipe 2, and the annular hydrogen layer, the annular oxygen air curtain layer, the annular hydrogen layer and the inert gas air curtain layer are cylindrical from inside to outside, and the annular hydrogen layer includes a cylindrical oxygen layer.
In the embodiment, when the hydrogen-oxygen flame burner for the synthetic quartz glass lump works, hydrogen and oxygen enter respective buffer cavities before combustion to be buffered and then are uniformly sprayed out, so that the combustion is stable and thorough. Gaseous raw material (silicon tetrachloride) enters a feeding through pipe through a feeding pipe; at the outlet of the feeding through pipe, oxygen enters through the material protection pipe and is sprayed out through the outlet of the material protection through pipe to form an air curtain, so that silicon tetrachloride gas is not easy to hydrolyze at high temperature at the outlet of the feeding through pipe, and the blockage of the accumulated material of the feeding through pipe is prevented. Similarly, the inert gas entering the inert gas chamber through the inert gas pipe is sprayed out to form a gas curtain. Setting the flow rate of the inert gas ejected from the inert gas chamber to be larger than the flow rate of the gas ejected from the outer ring chamber effectively prevents the accumulation of silica particles at the burner port. Meanwhile, the annular inert gas curtain effectively restrains oxyhydrogen flame, so that the flame is isolated from the outside, the temperature outside the port of the burner is obviously reduced, accumulated silicon dioxide particles are difficult to melt and vitrify, further nodules are prevented from dropping on a deposition surface to form defects, and finally the lump quality of the quartz glass is guaranteed.
Claims (4)
1. An oxyhydrogen flame burner for gas-phase synthesis of a quartz glass lump comprises a feeding pipe, a feeding through pipe, a protection pipe buffer cavity, a first-layer oxygen buffer cavity, a second-layer oxygen buffer cavity, a hydrogen buffer cavity, an outer ring pipe buffer cavity, a material protection through pipe, a first-layer oxygen chamber, a second-layer oxygen chamber, a hydrogen chamber, an outer ring chamber, a first-layer oxygen through pipe, a second-layer oxygen through pipe, a material protection pipe, a first-layer oxygen pipe, a second-layer oxygen pipe, a hydrogen pipe and an outer ring pipe;
the protective tube buffer cavity, the first-layer oxygen buffer cavity, the second-layer oxygen buffer cavity, the hydrogen buffer cavity and the outer ring tube buffer cavity are sequentially connected to form a whole, and the feeding through pipe penetrates through the whole;
the material protection through pipe, the first-layer oxygen chamber and the second-layer oxygen chamber are arranged in a concentric circle structure with the feeding through pipe from inside to outside and are respectively communicated with the protection pipe buffer cavity, the first-layer oxygen buffer cavity and the second-layer oxygen buffer cavity, and the lower end of the material protection through pipe is flush with the lower end of the feeding through pipe;
from inside to outside, the hydrogen chamber and the outer ring chamber are arranged in a concentric circle structure with the material protection through pipe and are respectively communicated with the hydrogen buffer cavity and the outer ring pipe buffer cavity;
one deck oxygen siphunculus and two-layer oxygen siphunculus communicate with one deck oxygen room and two-layer oxygen room respectively, and its lower extreme flushes its characterized in that with feeding siphunculus lower extreme: and an inert gas buffer cavity, an inert gas chamber communicated with the inert gas buffer cavity and an inert gas pipe for introducing inert gas are arranged below the outer ring pipe buffer cavity, and the inert gas chamber and the outer ring chamber are arranged in a concentric circle structure and are positioned outside the outer ring chamber.
2. An oxyhydrogen flame burner for gas-phase synthesis of a quartz glass lump according to claim 1, characterized in that: the hydrogen pipe, the outer ring pipe and the inert gas pipe are respectively and uniformly arranged on the outer sides of the hydrogen buffer cavity, the outer ring pipe buffer cavity and the inert gas buffer cavity.
3. An oxyhydrogen flame burner for gas-phase synthesis of a quartz glass lump according to claim 1 or 2, characterized in that: the bottom surfaces of the first-layer oxygen chamber and the second-layer oxygen chamber are flush and are positioned near the bottom in the hydrogen buffer chamber.
4. An oxyhydrogen flame burner for gas-phase synthesis of a quartz glass lump according to claim 3, characterized in that: the lower ends of the inert gas chamber, the outer ring chamber and the hydrogen chamber are flush with the lower end of the feeding through pipe.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920787116.2U CN210048651U (en) | 2019-05-29 | 2019-05-29 | Oxyhydrogen flame burner for gas-phase synthesis of quartz glass lump |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920787116.2U CN210048651U (en) | 2019-05-29 | 2019-05-29 | Oxyhydrogen flame burner for gas-phase synthesis of quartz glass lump |
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| Publication Number | Publication Date |
|---|---|
| CN210048651U true CN210048651U (en) | 2020-02-11 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201920787116.2U Active CN210048651U (en) | 2019-05-29 | 2019-05-29 | Oxyhydrogen flame burner for gas-phase synthesis of quartz glass lump |
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| Country | Link |
|---|---|
| CN (1) | CN210048651U (en) |
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- 2019-05-29 CN CN201920787116.2U patent/CN210048651U/en active Active
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Address after: 610000 floor 2, No. 9, Jianshe South Street, Chenghua District, Chengdu, Sichuan Patentee after: Shenguang Optical Group Co.,Ltd. Address before: 621700 science and Technology Incubation Park, south section of Chuangyuan Road, Jiangyou Industrial Park, Mianyang City, Sichuan Province Patentee before: SICHUAN SHENGUANG QUARTZ TECHNOLOGY CO.,LTD. |