CN210026868U - Pad pasting apron and terminal - Google Patents

Abstract

The application discloses pad pasting apron and terminal. This pad pasting apron includes the apron body and sets up the pad pasting layer on the surface of apron body, and the pad pasting layer includes the pad pasting body, forms the grating pattern on the first surface of pad pasting body and forms the reflection stratum on the second surface of pad pasting body, and wherein, first surface sets up with the second surface relatively, and the grating pattern is located between apron body and the pad pasting body. By the mode, the definition of the grating pattern can be improved, and chemical pollution is reduced.

Description

Pad pasting apron and terminal

Technical Field

The application relates to the field of materials, in particular to a film-pasting cover plate and a terminal.

Background

The cover plate used in the fields of automobiles or terminals and the like often has higher requirements on appearance decoration, the cover plate usually adopts the processes of silk screen printing, transfer printing, coating and the like to print patterns on a base material so as to realize grating effect, but the cover plates manufactured by the processes have the problems of low surface finish, poor interference performance and the like, and in addition, because the cover plate etching mostly adopts a chemical corrosion method, the problems of uneven etching, deviation of etching patterns, unclear grating effect patterns, environmental pollution caused by chemical corrosion solution and the like generally exist.

SUMMERY OF THE UTILITY MODEL

The application provides a pad pasting apron and terminal to improve the definition of grating pattern, reduce chemical pollution.

In order to solve the technical problem, the application adopts a technical scheme that: a film cover is provided. This pad pasting apron includes the apron body and sets up the pad pasting layer on the surface of apron body, and the pad pasting layer includes the pad pasting body, forms the grating pattern on the first surface of pad pasting body and forms the reflection stratum on the second surface of pad pasting body, and wherein, first surface sets up with the second surface relatively, and the grating pattern is located between apron body and the pad pasting body.

Wherein, the pad pasting body comprises any one or the combination of a polyethylene film, a polypropylene film, a polyvinyl chloride film or a polyester film.

Wherein, the cover plate body comprises any one or combination of a glass substrate, a PC substrate and a PMMA substrate.

The grating pattern comprises a plurality of grating stripes arranged at intervals, the width of each grating stripe is 0.01mm-0.05mm, and the distance between every two adjacent grating stripes is 0.01mm-0.05 mm.

Wherein, the width of the grating stripe is 0.015mm-0.025mm, the space between two adjacent grating stripes is 0.015mm-0.025mm, and the ratio of the width to the space is 1: 1.

Wherein a plurality of nano microstructures are formed in gaps among the grating stripes, and the depth of each nano microstructure is 10nm-50 nm.

The film pasting layer further comprises transparent mask stripes arranged corresponding to the grating stripes, wherein the thickness of the transparent mask stripes is 5-30 mu m, and the width of the transparent mask stripes is 0.01-0.05 mm.

Wherein the thickness of the reflecting layer is 10nm-50 nm.

Wherein the refractive index of the reflecting layer is 2.0-2.8.

In order to solve the above technical problem, the present application adopts another technical solution: a terminal is provided, which comprises the film cover plate.

The beneficial effect of this application is: be different from prior art, the pad pasting apron of this application embodiment includes the apron body and sets up the pad pasting layer on the surface of apron body, and the pad pasting layer includes the pad pasting body, forms the grating pattern on the first surface of pad pasting body and forms the reflection stratum on the second surface of pad pasting body, and wherein, first surface sets up with the second surface is relative, and the grating pattern is located between apron body and the pad pasting body. By the mode, the film pasting layer with the grating patterns is arranged on the cover plate body, so that the grating pattern effect of the film pasting cover plate can be realized, the cover plate body is prevented from being etched by a chemical corrosion method, and chemical pollution can be reduced; simultaneously, this application embodiment can utilize the reflective interference of light to make the pad pasting apron have dazzling grating pattern more through setting up the grating pattern on the pad pasting body, and can increase the reflection strength of incident light through the reflector layer, can improve the definition of grating pattern, consequently, can improve the sight of pad pasting apron.

Drawings

FIG. 1 is a schematic structural view of a first embodiment of a cover sheet for film attachment of the present application;

FIG. 2 is a schematic structural view of a second embodiment of a cover sheet of the present application;

FIG. 3 is a schematic flow chart illustrating a method for manufacturing the cover plate of FIG. 2;

FIG. 4 is a schematic process flow diagram illustrating a method of manufacturing the film cover of the embodiment of FIG. 2;

FIG. 5 is another schematic flow chart illustrating a method for manufacturing the cover plate of FIG. 2;

FIG. 6 is a schematic structural view of a third embodiment of a cover sheet of the present application;

FIG. 7 is a schematic flow chart illustrating a method for manufacturing the cover plate of FIG. 6;

fig. 8 is a schematic structural diagram of an embodiment of the terminal of the present application.

Detailed Description

The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only a part of the embodiments of the present application, and not all the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.

As shown in fig. 1, the film cover 101 of the present embodiment includes a cover body 102 and a film layer 103 disposed on a surface of the cover body 102, where the film layer 103 includes a film body 104, a grating pattern 105 formed on a first surface of the film body 104, and a reflective layer 106 formed on a second surface of the film body 104, where the first surface and the second surface are disposed opposite to each other, and the grating pattern 105 is disposed between the cover body 102 and the film body 104.

The film cover 101 of the present embodiment may be a rear cover of a terminal, such as a rear cover of a mobile phone. When the film-attached cover 101 is mounted on the terminal body, the reflective layer 106 of the film-attached cover 101 is disposed close to the terminal body, i.e., the cover body 102 is the outside of the terminal.

In other embodiments, the cover plate can also be used for products such as household appliances, automobiles and the like.

Incident light is incident from one side of the cover plate body 102, which is far away from the grating pattern 105, the grating pattern 105 reflects the incident light to generate an interference phenomenon, and when the filmed cover plate 101 is viewed at a certain angle in illumination, a divergent light pattern like the surface of a CD can be obtained; meanwhile, the incident light that is not reflected by the grating pattern 103 is reflected to the grating pattern 103 by the reflection layer 104, and the grating pattern 103 also generates an interference phenomenon to the reflected light, so as to improve the light utilization rate and improve the definition and brightness of the grating pattern of the cover plate 101.

In the embodiment, the film-pasting layer 103 with the grating pattern 105 is arranged on the cover plate body 102, so that the grating pattern effect of the film-pasting cover plate 101 can be realized, the cover plate body 102 is prevented from being etched by a chemical corrosion method, and chemical pollution can be reduced; meanwhile, in the embodiment, by providing the grating pattern 105 on the film attachment body 104, the reflective interference of light can be utilized to make the film attachment cover plate 101 have a more dazzling grating pattern, and the reflection intensity of incident light can be increased by the reflection layer, so that the definition of the grating pattern can be improved, and therefore, the ornamental value of the film attachment cover plate 101 can be improved.

Further, in consideration of the materials of the cover plate body 102, the film-attached body 103, the grating pattern 105 and the reflective layer 106, in order to achieve the above-mentioned effects, the cover plate body 102 includes at least one or a combination of a glass substrate, a PC substrate, a PMMA substrate and a PET substrate, and the combination thereof may be a three-layer composite substrate of PC, PMMA and PET, etc.; the film sticking body 103 comprises any one or combination of a polyethylene film, a polypropylene film, a polyvinyl chloride film or a polyester film; the grating pattern 105 may include UV glue; the reflective layer 106 is a transparent oxide film layer, and the transparent oxide film layer at least includes any one or a combination of a titanium oxide film layer, a niobium oxide film layer, a tin oxide film layer, a zinc oxide film layer, or a zinc tin oxide film layer.

Further, in view of the thickness of the reflective layer 104, the reflective layer 104 may have a thickness ranging from 10nm to 150nm, and specifically, may have a thickness of 10nm, 30nm, 50nm, 70nm, 90nm, 110nm, 130nm, 150nm, or the like, in order to achieve the above effects.

Further, in view of the physical characteristics of the reflective layer 104, in order to achieve the above effect, the refractive index of the reflective layer 104 may be in a range of 2.0 to 2.8, and specifically, the refractive index may be 2.0, 2.2, 2.4, 2.6, 2.8, and the like.

Optionally, the grating pattern 103 of the present embodiment includes a plurality of grating stripes 105 arranged at intervals.

Wherein, the width range of the grating stripe can be 0.01mm-0.05mm, and the width can be 0.01mm, 0.02mm, 0.03mm, 0.04mm, 0.05mm, etc.; the distance between two adjacent grating strips 105 may be in a range of 0.01mm-0.05mm, and specifically, the distance may be 0.01mm, 0.02mm, 0.03mm, 0.04mm, 0.05mm, and the like.

Alternatively, the width of the grating stripe 105 preferably ranges from 0.015mm to 0.025mm, and the width may specifically be 0.015mm, 0.017mm, 0.19mm, 0.021mm, 0.023mm, 0.025mm, and the like; the interval between two adjacent grating strips 105 is preferably in the range of 0.015mm to 0.025mm, and specifically, the interval may be 0.015mm, 0.017mm, 0.19mm, 0.021mm, 0.023mm, 0.025mm, and the like.

In a specific application, considering the physical characteristics of the grating effect, in order to obtain a 45-degree grating blaze effect, the ratio of the width of the grating stripe 105 to the pitch between two adjacent grating stripes 105 is 1: 1.

In other embodiments, in order to obtain grating blaze effects at different angles, the ratio of the width of a grating stripe to the distance between two adjacent grating stripes can be adaptively adjusted.

In order to further improve the clarity of the grating pattern, the cover 201 of the present embodiment is different from the cover of the above embodiment in that, as shown in fig. 2, the cover 201 of the present embodiment is a film-covered cover of a second embodiment: the nano-micro structure 203 is formed in the gap between two adjacent grating stripes 202 of the present embodiment, so that the grating stripes 202 and the gap have different optical characteristics.

Because the physical microstructures of the grating stripe 202 without the nano-microstructure and the gap between two adjacent grating stripes 202 with the nano-microstructure 203 are different, the two grating stripes have different optical characteristics such as light reflection and interference. Specifically, there are significant differences in light reflectance, interference, and reflection angle between incident light incident from the cover body 204 and reflected light reflected from the reflective layer 205 through the grating stripes 202 and the gap between two adjacent grating stripes 202. For example, the gap in which the nano-microstructures 203 are disposed may produce significant diffuse reflection of incident or reflected light.

Optionally, the depth range of the nano-micro structure 203 of the embodiment may be 10nm to 50nm, and the depth may be 10nm, 30nm, 40nm, 50nm, and 60nm specifically; the width of the nano-micro structure 203 is in the range of 100nm-200nm, and the width may be specifically 100m, 120nm, 140nm, 160nm, 180nm, 200nm, and the like.

The width of the grating stripe 202 of the present embodiment may be the same as the width of the grating stripe of the above-mentioned embodiment, and the pitch between two adjacent grating stripes 202 of the present embodiment may be the same as the pitch between two adjacent grating stripes of the above-mentioned embodiment.

Further, in a specific application, the depth of the nano-micro structure 203 may preferably be 20nm to 35nm, and the depth may specifically be 20nm, 25nm, 30nm, and 35 nm; the width of the nano-micro structure 203 may preferably be 125-150nm, and the width may specifically be 125nm, 130nm, 135nm, 140nm, 145nm, 150nm, and the like.

In this embodiment, the nano-microstructures 203 are formed in the gaps between two adjacent grating stripes 202, so that the grating stripes 202 in the grating pattern and the gaps between two adjacent grating stripes 202 have different optical characteristics, which can improve the interference reflectivity of light and further improve the definition of the grating pattern.

It should be noted that, unlike the above-mentioned embodiment, the grating stripe 202 of the present embodiment includes not only a UV glue stripe but also a stripe formed on the film-attaching body 206 when the nano-micro-structure 203 is formed, i.e. a structural portion between two adjacent nano-micro-structures 203.

The present application further proposes a method of manufacturing a film-covered panel for use in the manufacture of the film-covered panel shown in fig. 2. As shown in fig. 3 and 4, the manufacturing method of the present embodiment specifically includes the following steps:

further, the cover plate 101 of the present embodiment may be manufactured by the method shown in fig. 3, specifically, the method of the present embodiment includes the following steps:

s301: a plurality of mask stripes 202 are formed on the surface of the film-attached body 206 at intervals.

Since the cleanliness of the surface of the film-attached body 206 greatly affects the film-coating process, the surface of the film-attached body 206 should be cleaned before the step S301 to achieve the surface cleanliness required by the film-coating process.

Specifically, the surface of the film body 206 may be cleaned by the method shown in fig. 5, and the method of this embodiment includes the following steps:

s501: the ultrasonic cleaning agent is added into the first ultrasonic cleaning tank, heated to 50 ℃, and then the film pasting body 206 is placed in the first ultrasonic cleaning tank and cleaned for 5 minutes by ultrasonic.

S502: pure water is added into the second cleaning tank, and the film-attached body 206 is placed into the second ultrasonic cleaning tank to be ultrasonically rinsed for 2 minutes.

S503: an ultrasonic cleaning agent is added into the third ultrasonic cleaning tank, the pad pasting body 206 is placed into the third ultrasonic cleaning tank, and ultrasonic cleaning is carried out for 2 minutes under the normal temperature condition.

S504: pure water was added to the fourth to seventh ultrasonic cleaning tanks, and the film-attached body 206 was sequentially placed therein and sequentially subjected to ultrasonic rinsing for 2 minutes.

Wherein the resistivity of the pure water is more than or equal to 18M omega/CM 3.

S505: the film-pasting body 206 is placed in an eighth ultrasonic cleaning tank for thermal drying and dehydration.

The above-mentioned washing/drying process, washing/drying temperature and washing/drying time can be adaptively modified according to the material of the film-sticking body 206, the surface roughness and other factors; in this embodiment, the surface cleanliness of the film-attached body 206 after each cleaning can be automatically detected by the detector, and the subsequent cleaning/drying process, cleaning/drying temperature and cleaning/drying time can be adjusted or planned according to the cleanliness, so as to improve the cleaning and drying efficiency and effect of the film-attached body 206.

Further, the film main body 206 after the heat drying and dehydration is placed in a tray to prepare for the processing of the grating pattern.

In this embodiment, the mask stripes 202 are made of UV glue 202. Since the selection of the UV glue 202 has a great influence on the pattern printing, the UV glue with good visual effect, good wear resistance, no solvent, green environmental protection and rotational viscosity of 300-. In other embodiments, the mask stripes may also be made of organic thermosetting glue or the like

Specifically, the UV paste 202 is attached to the surface of the washed sticker main body 206 by a gravure pattern printing process. The thickness of the UV glue 202 may be 5 μm to 30 μm, and the thickness may be 5 μm, 10 μm, 15 μm, 20 μm, 25 μm, 30 μm, etc., and the width of the UV glue 202 may be 0.01mm to 0.05mm, and the width may be 0.01mm, 0.02mm, 0.03mm, 0.04mm, 0.05mm, etc.

Optionally, the thickness of the UV glue 202 is preferably in the range of 10 μm to 20 μm micrometers, and the thickness may be specifically 10 μm, 12 μm, 14 μm, 16 μm, 18 μm, 20 μm, and the like; the width of the UV glue 202 is preferably in the range of 0.015mm to 0.025mm, and the width may be specifically 0.015mm, 0.017mm, 0.19mm, 0.021mm, 0.023mm, 0.025mm, and the like.

In view of the physical characteristics of the grating effect, in order to obtain a 45 degree grating blaze effect, the width-to-pitch ratio of the UV paste 202 is 1: 1.

Further, the printed UV glue 202 is cured on the surface of the film body 206 by using UV ultraviolet curing technology. In the process, the selection of ultraviolet curing equipment is more important, the UV-LED surface light source curing equipment can be preferentially selected, the UV adhesive 202 is cured by adopting the ultraviolet light output irradiation intensity of 5600mW/m2, and the stability, reliability and consistency of the UV adhesive 202 curing can be ensured.

S302: the film body 206 under the protection of the mask stripes 202 is subjected to plasma etching to form the nano-microstructures 203 on the surface of the film body 206 exposed by the mask stripes 202, and further form grating stripes corresponding to the mask stripes 202 on the surface of the film body 206.

It should be noted that the grating stripe of the present embodiment includes, in addition to the mask stripe 202, a stripe formed on the film-attached body 206 when the nano-micro-structure 203 is formed, i.e., a structural portion between two adjacent nano-micro-structures 203.

In a specific application, the surface of the film-attached body 206 is subjected to plasma 301 etching under the Ar atmosphere with the vacuum degree of 1.0pa to 0.01pa to form the nano-structure 203, and the film-attached body 206 of the mask stripes 202 is not affected by the etching. Other parameters of the process can be found in table one:

watch 1

Sample (I)	Voltage (V)	Power (W)	Ar flow (Sccm)	Etch depth (nm)
					1	1000	1000	200	100
2	15000	1500	300	175
					3	2000	2000	400	250

S303: a reflective layer 205 is formed on a second surface of the film-attached body 206 opposite to the first surface.

Specifically, the reflective layer 205 is formed on the second surface of the film-attached body 206 by vacuum sputtering using a reflective material.

In the above steps, the film body 206, the nano-microstructures 203, the mask stripes 202 and the reflective layer 205 may be made of the above-described materials, and the physical properties and dimensional parameters of the cover plate body 204, the nano-microstructures 203, the grating stripes 202 and the reflective layer 205 may be set to the above-described numerical ranges.

The vacuum sputtering of the embodiment can adopt one or a combination of medium-frequency reactive sputtering, radio-frequency sputtering, high-energy pulse sputtering and magnetron sputtering. Among them, medium-frequency reactive sputtering is preferably employed.

In other embodiments, a reflective layer can also be formed on the surface of the film-attached body by a process such as optical coating, Physical Vapor Deposition (PVD), Chemical Vapor Deposition (CVD), Plasma Enhanced Chemical Vapor Deposition (PECVD), reactive DC etching, and the like.

S304: the first surface of the film body 206 is attached to the surface of the cover plate body 204.

Specifically, the processed film body 206 and the cover plate body 204 may be closely attached by a hot press attaching device using a transfer attaching technique.

Different from the prior art, the film attaching layer with the grating pattern is arranged on the cover plate body, so that the grating pattern effect of the film attaching cover plate can be realized, the cover plate body is prevented from being etched by a chemical corrosion method, and chemical pollution can be reduced; simultaneously, this application embodiment can utilize the reflective interference of light to make the pad pasting apron have dazzling grating pattern more through setting up the grating pattern on the pad pasting body, and can increase the reflection strength of incident light through the reflector layer, can improve the definition of grating pattern, consequently, can improve the sight of pad pasting apron.

As shown in fig. 6, the cover plate 601 with a grating pattern of the present embodiment further includes an anti-reflection layer 602 based on the above embodiments, where the anti-reflection layer 602 is disposed between the grating pattern 603 and the cover plate body 604, and the anti-reflection layer 602 is used to increase the transmittance of incident light.

Further, in this embodiment, the antireflection film 602 includes SiO2 strips and TiO2 strips arranged in a staggered manner. It is understood that in other embodiments, other films that increase light transmittance may be used.

Optionally, the cover plate 601 with the grating pattern of the present embodiment further includes: an ink layer 605, the ink layer 605 being disposed on a side of the reflective layer 606 facing away from the film body 607, the ink layer 605 being for masking and decorating internal components of the terminal.

The grating pattern of the above embodiments may include a specific pattern identifier, such as Logo of the product, required description words of the product, product pattern and motif, and the like.

The ink layer 605 may be provided on the surface of the side of the reflective layer 606 facing away from the decal body 607 by at least one of screen printing, roll printing, or ink jet printing techniques.

In one embodiment, to further enhance the appearance of the cover plate, a gradient color layer may be provided on the side of the reflective layer facing away from the grating pattern. The gradient color layer comprises a plurality of ink layers.

Specifically, a first ink layer is disposed on the surface of the reflective layer 606, and a second ink layer is disposed on at least a partial surface of the first ink layer, so as to form a gradient color layer on the first surface.

Wherein, a plurality of ink layers can be formed on the reflective layer 606 by the method shown in fig. 7, and the method of this embodiment includes:

s701: and obtaining the color scheme of the gradient layer.

Specifically, the color scheme of the gradient layer may be designed through a computer simulation program, and the color scheme may include the thickness, the coverage area, and the color scheme of the first ink layer and the second ink layer.

S702: at least one masking shield is prepared according to a color scheme.

Specifically, a shielding baffle is designed according to the color scheme, and the shielding baffle is used for covering the area which is not provided with the first ink layer and the second ink layer.

S703: a shadow mask is placed over the reflective layer 606.

The shielding baffle is used for shielding a first area, and the first area is an area without the first ink layer on the first surface of the reflecting layer.

S704: a first ink layer is disposed on the reflective layer 606.

Specifically, the first ink layer can be printed or printed on the first surface of the reflective layer 606 by screen printing, roll printing, or ink jet printing techniques.

S705: and placing a shielding baffle on at least partial surface of the first ink layer.

The shielding baffle is used for shielding a second area, and the second area is an area on the first ink layer where the second ink layer is not arranged.

S706: and arranging a second ink layer on at least partial surface of the first ink layer.

In particular, the second ink layer may be printed or printed on the first ink layer by screen printing, roll printing or ink jet printing techniques.

Further, a shielding baffle is arranged on at least partial surface of the second ink layer. The shielding baffle is used for covering a third area, and the third area is an area where the nth ink layer (n is an integer greater than 2) is not arranged on the second ink layer. The nth ink layer may be deposited on the second ink layer by optical coating, Physical Vapor Deposition (PVD), Chemical Vapor Deposition (CVD), Plasma Enhanced Chemical Vapor Deposition (PECVD), reactive DC sputtering, RF sputtering, magnetron sputtering, or the like.

Through the shielding baffle mode that adopts in this embodiment, can shelter from the different positions on reflector layer, first printing ink layer, second printing ink layer or nth printing ink layer to realize the obvious manifestation effect of colour gradual change gradient.

Further, the thickness of the second ink layer can be gradually reduced from the left side boundary to the right side boundary of the first ink layer during spraying, so that a gradual change effect can be obtained. Or after the first ink layer is dried, at least one second ink layer can be sprayed on the partial surface of the first ink layer. In other embodiments, after the second ink layer is dried, ink may be sprayed on at least a partial surface of the second ink layer to form a third ink layer. The first ink layer, the second ink layer and the third ink layer have the same thickness, but the covered area is gradually reduced. For example, the coverage area of the first ink layer is 100% of the coverage area of the reflective layer 606, the coverage area of the second ink layer is 70% of the coverage area of the reflective layer 606, and the coverage area of the third ink layer is 30% of the coverage area of the reflective layer 606.

The materials of the first ink layer, the second ink layer and the third ink layer can comprise UV curing resin, a monomer, a photoinitiator, sand powder and an additive, wherein the additive can comprise pigment; the UV curable resin may include epoxy acrylic resins, ethoxy ethyl acrylate, and modified urethane resins; the monomers may include TPGDA and HDDA; the photoinitiator may be TPO; the pigment may be an air-drying resin pigment.

In one embodiment, the gradient color layer may include multiple dielectric layers, each of which may be formed by mixing nano-structured color crystals with varnish. The nanostructure color crystal can be obtained by crushing a multilayer optical interference film, and the multilayer optical interference film can be a structure with first refractive index optical medium layers L1, L2 and second refractive index optical medium layers H1, H2 and H3 alternately deposited, that is, the multilayer optical interference film can comprise a second refractive index optical medium layer H1, a first refractive index optical medium layer L1, a second refractive index optical medium layer H3, a first refractive index optical medium layer L2 and a second refractive index optical medium layer H2 which are sequentially stacked.

In one embodiment, to improve the hardness and wear resistance of the cover plate, a transparent hard layer may be further disposed on a side of the cover plate body facing away from the grating pattern.

The material of the transparent hard layer comprises at least one or a combination of nitride and diamond-like carbon. The nitride may also be a boronitride or a carbonitride. For example, at least one or a combination of silicon nitride, aluminum nitride, titanium nitride, chromium nitride, tantalum nitride, zirconium nitride, silicon aluminum nitride, titanium aluminum nitride, chromium titanium aluminum nitride, chromium silicon aluminum nitride, silicon titanium aluminum nitride, boron nitride, titanium boride, chromium boride, titanium aluminum boride, titanium silicon boride, silicon titanium aluminum boride, titanium carbide nitride, chromium carbide nitride, zirconium carbide nitride, tungsten carbide nitride.

In one embodiment, to adjust the color value of the ink layer, a transparent layer may be disposed on a side of the ink layer adjacent to the reflective layer.

Furthermore, a fingerprint-proof layer can be arranged on one side of the cover plate body, which is far away from the grating pattern. Wherein the anti-fingerprint layer is coated by polymer with hydrophobic and oleophobic properties or a coating film of a suitable material.

The present application further provides a terminal, as shown in fig. 8, fig. 8 is a schematic structural diagram of an embodiment of the terminal of the present application. The terminal 801 of the embodiment includes the film cover 802, which is disposed on a side of the terminal 801 away from the display screen, and the cover body of the film cover 802 is disposed close to the terminal body 803, that is, the cover body is an outermost side of the terminal 801 away from the display screen.

The film cover 802 of this embodiment is the film cover of the above embodiments, and the structure and the operation principle thereof are not described herein again.

Be different from prior art, the pad pasting apron of this application embodiment includes the apron body and sets up the pad pasting layer on the surface of apron body, and the pad pasting layer includes the pad pasting body, forms the grating pattern on the first surface of pad pasting body and forms the reflection stratum on the second surface of pad pasting body, and wherein, first surface sets up with the second surface is relative, and the grating pattern is located between apron body and the pad pasting body. By the mode, the film pasting layer with the grating patterns is arranged on the cover plate body, so that the grating pattern effect of the film pasting cover plate can be realized, the cover plate body is prevented from being etched by a chemical corrosion method, and chemical pollution can be reduced; simultaneously, this application embodiment can utilize the reflective interference of light to make the pad pasting apron have dazzling grating pattern more through setting up the grating pattern on the pad pasting body, and can increase the reflection strength of incident light through the reflector layer, can improve the definition of grating pattern, consequently, can improve the sight of pad pasting apron.

The above description is only for the purpose of illustrating embodiments of the present application and is not intended to limit the scope of the present application, and all modifications of equivalent structures and equivalent processes, which are made by the contents of the specification and the drawings of the present application or are directly or indirectly applied to other related technical fields, are also included in the scope of the present application.

Claims (10)

1. The utility model provides a pad pasting apron, its characterized in that, the pad pasting apron includes the apron body and sets up the pad pasting layer on the surface of apron body, the pad pasting layer includes the pad pasting body, forms in grating pattern on the first surface of pad pasting body and formed in the reflector layer on the second surface of pad pasting body, wherein, the first surface with the second surface sets up relatively, the grating pattern be located the apron body with between the pad pasting body.

2. The film cover sheet of claim 1, wherein the film body comprises any one or a combination of a polyethylene film, a polypropylene film, a polyvinyl chloride film, or a polyester film.

3. The film cover of claim 1, wherein the cover body comprises any one or combination of a glass substrate, a PC substrate, and a PMMA substrate.

4. The film cover according to claim 1, wherein the grating pattern comprises a plurality of grating stripes arranged at intervals, the width of each grating stripe is 0.01mm-0.05mm, and the distance between two adjacent grating stripes is 0.01mm-0.05 mm.

5. The cover sheet according to claim 4, wherein the width of the grating stripe is 0.015mm to 0.025mm, the pitch between two adjacent grating stripes is 0.015mm to 0.025mm, and the ratio of the width to the pitch is 1: 1.

6. The film cover according to claim 4, wherein a plurality of nano-microstructures are formed in the gaps between the grating stripes, and the depth of the nano-microstructures is 10nm to 50 nm.

7. The film cover according to claim 4, wherein the film layer further comprises transparent mask stripes disposed corresponding to the grating stripes, wherein the thickness of the transparent mask stripes is 5 μm to 30 μm, and the width of the transparent mask stripes is 0.01mm to 0.05 mm.

8. The film cover of claim 1, wherein the reflective layer has a thickness of 10nm to 150 nm.

9. The film cover of claim 1, wherein the reflective layer has a refractive index of 2.0-2.8.

10. A terminal, characterized in that it comprises a film cover according to claims 1-9.

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