CN210012759U - Low-emissivity coated glass - Google Patents
Low-emissivity coated glass Download PDFInfo
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- CN210012759U CN210012759U CN201920879346.1U CN201920879346U CN210012759U CN 210012759 U CN210012759 U CN 210012759U CN 201920879346 U CN201920879346 U CN 201920879346U CN 210012759 U CN210012759 U CN 210012759U
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Abstract
The utility model relates to the field of coated glass, in particular to low-emissivity coated glass, which comprises a glass substrate and a coating, wherein the coating is arranged on the surface of the glass substrate; the coating film sequentially comprises a first indium tin oxide layer, a first silicon nitride layer, a first zinc oxide layer, a first silver layer, a copper layer, a first nickel-chromium alloy layer, a zinc tin oxide layer, a second zinc oxide layer, a second silver layer, a second nickel-chromium alloy layer, a second indium tin oxide layer and a second silicon nitride layer from the glass substrate to the outside; the coated glass has the advantages of dark brown appearance, high ultraviolet and infrared blocking rate, excellent energy-saving effect, neutral color development of transmission, better indoor lighting and less damage to eyes, and is favorable for large-scale application of dark brown coated glass.
Description
Technical Field
The utility model relates to coated glass, in particular to low-emissivity coated glass.
Background
In the early days, brown glass was produced mainly by adding a certain amount of colorant to the glass composition, or by using the heat of the float glass plate itself, so that the metal compound in the spray solution is decomposed at high temperature, oxidized and deposited on the surface of the glass plate to form a film layer. Although the brown glass produced by the two methods has certain decorative function and energy-saving effect, the brown glass is also widely used in the industries of building curtain walls, glass doors and windows and automobile glass; but also has the defects of more complex process flow, higher production energy consumption, higher cost and low production efficiency; in addition, in the online preparation process, functional material layers such as an infrared barrier material layer and a silver layer are difficult to add, so that the energy-saving property is very limited, the dark brown glass is difficult to apply to energy-saving buildings in a large scale, and the application field of the dark brown glass is severely limited. However, although the dark brown coated glass can be produced by an off-line coating method (for example, patent CN 202293507U), and functional material layers such as an infrared barrier material layer and a silver layer (for example, patent CN 109052989A) can also be added, so that the energy-saving property of the dark brown coated glass is greatly improved, the dark brown coated glass still has the defects of insignificant energy-saving effect, severe yellow transmittance and the like due to the unreasonable film layer design of the existing dark brown coated glass, and the large-scale application of the dark brown coated glass in energy-saving buildings is limited.
SUMMERY OF THE UTILITY MODEL
The invention of the utility model aims to: aiming at the defects of poor energy-saving effect and yellow transmission color in the existing dark brown coated glass, the low-emissivity coated glass is provided; this coated glass combines indium tin oxide layer and low radiation material layer to adjustment rete thickness makes this coated glass not only have the outward appearance of tawny, and is big to ultraviolet ray, infrared ray's separation rate moreover, has excellent energy-conserving effect, and simultaneously, it sees through look and shows neutrally, and indoor daylighting is better, and is littleer to the injury of eyes, is favorable to tawny coated glass's large-scale application.
In order to realize the purpose, the utility model discloses a technical scheme be:
a low-emissivity coated glass comprises a glass substrate 1 and a coating 2; the coating film 2 is arranged on the surface of the glass substrate 1; the coating film 2 sequentially comprises a first indium tin oxide layer (201) with the thickness of 5-100nm, a first silicon oxide layer (202) with the thickness of 5-30nm, a first silicon nitride layer (203) with the thickness of 5-40nm, a first zinc oxide layer (204) with the thickness of 5-15nm, a first silver layer (205) with the thickness of 3-15nm, a copper layer (206) with the thickness of 3-10nm, a first nickel-chromium alloy layer (207) with the thickness of 3-10nm, a zinc tin oxide layer (208) with the thickness of 20-50nm, a second zinc oxide layer (209) with the thickness of 5-15nm, a second silver layer (210) with the thickness of 5-15nm, a second nickel-chromium alloy layer (211) with the thickness of 3-10nm, a second indium tin oxide layer (212) with the thickness of 5-50nm and a second silicon nitride layer (213) with the thickness of 20-50nm from the glass substrate outwards.
The first ITO layer 201 and the second ITO layer 212 belong to a first functional layer in the coating film 2 and are arranged in two layers, so that the brown appearance of the coated glass is guaranteed, the blocking rate of visible light can be reduced, the transmission color is more neutral, the coating film and other material layers act together, the blocking rate of the coating film on infrared rays and ultraviolet rays is improved, and the energy-saving effect is improved. As a preferred embodiment of the present invention, the thickness of the first ito layer 201 is 10-50nm, and the thickness of the second ito layer 212 is 15-25 nm; through optimization, the brown low-emissivity coated glass has better appearance and color. Most preferably, the thickness of the first ITO layer 201 is 20nm, and the thickness of the second ITO layer 212 is 20 nm.
The first silicon oxide layer 202, the first silicon nitride layer 203 and the zinc tin oxide layer 208 belong to dielectric layers in the coating film 2, and the dielectric layers can block diffusion of atoms in two adjacent layers of materials and act together with other material layers, so that the coating film 2 has higher infrared and ultraviolet blocking rate, better energy-saving effect and more neutral transmission color. As a preferable embodiment of the present invention, the thickness of the first silicon oxide layer 202 is 10-20nm, the thickness of the first silicon nitride layer 203 is 10-15nm, and the thickness of the zinc tin oxide layer 208 is 25-35 nm; through optimization, the diffusion barrier effect on atoms in two adjacent layers of materials is better, and the performance of the obtained brown low-emissivity coated glass is more stable. Most preferably, the thickness of the first silicon oxide layer 202 is 15nm, the thickness of the first silicon nitride layer 203 is 12nm, and the thickness of the zinc tin oxide layer 208 is 30 nm.
The first zinc oxide layer 204 and the second zinc oxide layer 209 belong to seed layers in the coating film 2, and are used for ensuring successful transition of the second functional layer, so that the stability of the coating film 2 is better, and the first zinc oxide layer and the second zinc oxide layer act together with other material layers, so that the coating film 2 has higher barrier rate to infrared rays and ultraviolet rays, better energy-saving effect and more neutral transmission color. As a preferable scheme of the present invention, the thickness of the first zinc oxide layer 204 is 8-12nm, and the thickness of the second zinc oxide layer 209 is 8-12 nm; through optimization, the obtained coated glass has stable performance and better energy-saving effect. Most preferably, the first zinc oxide layer 204 has a thickness of 10nm and the second zinc oxide layer 209 has a thickness of 10 nm.
The first silver layer, the copper layer and the second silver layer belong to a second functional layer in the coating film 2 and are arranged in a layered mode, the ultraviolet ray and infrared ray blocking effect is better, the visible light transmission effect is better, the coated glass is guaranteed to have excellent energy-saving effect and good light transmittance, and the coated glass and other material layers act together, so that the infrared ray and ultraviolet ray blocking rate of the coating film 2 is higher, the energy-saving effect is better, and the transmission color is more neutral. As the preferred scheme of the utility model, the thickness of first silver layer 205 be 5-10nm, the thickness of copper layer 206 be 5-8nm, the thickness of second silver layer 210 be 8-12nm, through preferred, the energy-conserving effect of the brown low-emissivity coated glass who obtains is better. Most preferably, the first silver layer 205 has a thickness of 8nm, the copper layer 206 has a thickness of 6nm, and the second silver layer 210 has a thickness of 11 nm.
The first nichrome layer 207, the second nichrome layer 211 and the second silicon nitride layer 213 belong to a protective layer in the coating film 2, respectively protect the functional layer to prevent the functional layer from being scratched, and act together with other material layers to ensure that the coating film 2 has higher infrared and ultraviolet blocking rate, better energy-saving effect and more neutral transmission color. As a preferable embodiment of the present invention, the thickness of the first nichrome layer 207 is 5 to 8nm, the thickness of the second nichrome layer 211 is 4 to 6nm, and the thickness of the second silicon nitride layer 213 is 25 to 40 nm; through optimization, the protective effect on the functional layer is better, and the service life of the obtained coated glass is longer. Most preferably, the thickness of the first nichrome layer 207 is 5nm, the thickness of the second nichrome layer 211 is 5nm, and the thickness of the second silicon nitride layer 213 is 30 nm.
To sum up, owing to adopted above-mentioned technical scheme, the beneficial effects of the utility model are that:
the utility model relates to a low-emissivity coated glass combines indium tin oxide layer and low radiation material layer to adjustment rete thickness makes this coated glass not only have the outward appearance of tawny, and is big to ultraviolet ray, infrared ray's separation rate moreover, has excellent energy-conserving effect, and simultaneously, its sees through look and shows neutrality, and indoor daylighting is better.
Drawings
FIG. 1 is a schematic view of the structure of the low-emissivity coated glass of the present invention.
The labels in the figure are: 1-glass substrate, 2-coating, 201-first indium tin oxide layer, 202-first silicon oxide layer, 203-first silicon nitride layer, 204-first zinc oxide layer, 205-first silver layer, 206-copper layer, 207-first nickel-chromium alloy layer, 208-zinc tin oxide layer, 209-second zinc oxide layer, 210-second silver layer, 211-second nickel-chromium alloy layer, 212-second indium tin oxide layer, 213-second silicon nitride layer.
Detailed Description
The present invention will be described in detail with reference to the accompanying drawings.
In order to make the objects, technical solutions and advantages of the present invention more clearly understood, the present invention is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the invention.
Example 1
A low-emissivity coated glass (figure 1) is composed of a glass substrate 1 and a coating film 2; the plating film 2 was composed of a first indium tin oxide layer 201 having a thickness of 20nm, a first silicon oxide layer 202 having a thickness of 15nm, a first silicon nitride layer 203 having a thickness of 12nm, a first zinc oxide layer 204 having a thickness of 10nm, a first silver layer 205 having a thickness of 8nm, a copper layer 206 having a thickness of 6nm, a first nickel-chromium alloy layer 207 having a thickness of 5nm, a zinc tin oxide layer 208 having a thickness of 30nm, a second zinc oxide layer 209 having a thickness of 10nm, a second silver layer 210 having a thickness of 11nm, a second nickel-chromium alloy layer 211 having a thickness of 5nm, a second indium tin oxide layer 212 having a thickness of 20nm, and a second silicon nitride layer 213 having a thickness of 30 nm.
Through experimental detection, the low-emissivity coated glass has 72% infrared blocking rate, 84% ultraviolet blocking rate and neutral transmission color.
Example 2
A low-emissivity coated glass comprises a glass substrate 1 and a coating film 2; the plating film 2 was composed of a first indium tin oxide layer 201 with a thickness of 5nm, a first silicon oxide layer 202 with a thickness of 30nm, a first silicon nitride layer 203 with a thickness of 5nm, a first zinc oxide layer 204 with a thickness of 15nm, a first silver layer 205 with a thickness of 3nm, a copper layer 206 with a thickness of 10nm, a first nichrome layer 207 with a thickness of 3nm, a zinc tin oxide layer 208 with a thickness of 20nm, a second zinc oxide layer 209 with a thickness of 15nm, a second silver layer 210 with a thickness of 15nm, a second nichrome layer 211 with a thickness of 3nm, a second indium tin oxide layer 212 with a thickness of 5nm, and a second silicon nitride layer 213 with a thickness of 50 nm.
Through experimental detection, the low-radiation coated glass has the infrared ray blocking rate of 68 percent, the ultraviolet ray blocking rate of 76 percent and neutral transmission color.
Example 3
A low-emissivity coated glass comprises a glass substrate 1 and a coating film 2; the plating film 2 was composed of a first indium tin oxide layer 201 having a thickness of 100nm, a first silicon oxide layer 202 having a thickness of 5nm, a first silicon nitride layer 203 having a thickness of 40nm, a first zinc oxide layer 204 having a thickness of 5nm, a first silver layer 205 having a thickness of 15nm, a copper layer 206 having a thickness of 3nm, a first nickel-chromium alloy layer 207 having a thickness of 10nm, a zinc tin oxide layer 208 having a thickness of 50nm, a second zinc oxide layer 209 having a thickness of 5nm, a second silver layer 210 having a thickness of 5nm, a second nickel-chromium alloy layer 211 having a thickness of 10nm, a second indium tin oxide layer 212 having a thickness of 50nm, and a second silicon nitride layer 213 having a thickness of 20 nm.
Through experimental detection, the low-radiation coated glass has the infrared ray blocking rate of 67 percent, the ultraviolet ray blocking rate of 78 percent and neutral transmission color.
Example 4
A low-emissivity coated glass comprises a glass substrate 1 and a coating film 2; the plating film 2 was composed of a first indium tin oxide layer 201 with a thickness of 50nm, a first silicon oxide layer 202 with a thickness of 10nm, a first silicon nitride layer 203 with a thickness of 15nm, a first zinc oxide layer 204 with a thickness of 8nm, a first silver layer 205 with a thickness of 10nm, a copper layer 206 with a thickness of 5nm, a first nichrome layer 207 with a thickness of 8nm, a zinc tin oxide layer 208 with a thickness of 25nm, a second zinc oxide layer 209 with a thickness of 8nm, a second silver layer 210 with a thickness of 12nm, a second nichrome layer 211 with a thickness of 4nm, a second indium tin oxide layer 212 with a thickness of 25nm, and a second silicon nitride layer 213 with a thickness of 25 nm.
Through experimental detection, the low-radiation coated glass has the infrared ray blocking rate of 69 percent, the ultraviolet ray blocking rate of 77 percent and neutral transmission color.
Example 5
A low-emissivity coated glass comprises a glass substrate 1 and a coating film 2; the plating film 2 was composed of a first indium tin oxide layer 201 with a thickness of 10nm, a first silicon oxide layer 202 with a thickness of 20nm, a first silicon nitride layer 203 with a thickness of 10nm, a first zinc oxide layer 204 with a thickness of 12nm, a first silver layer 205 with a thickness of 5nm, a copper layer 206 with a thickness of 8nm, a first nichrome layer 207 with a thickness of 5nm, a zinc tin oxide layer 208 with a thickness of 35nm, a second zinc oxide layer 209 with a thickness of 12nm, a second silver layer 210 with a thickness of 8nm, a second nichrome layer 211 with a thickness of 6nm, a second indium tin oxide layer 212 with a thickness of 15nm, and a second silicon nitride layer 213 with a thickness of 40 nm.
Through experimental detection, the low-emissivity coated glass has 70% infrared blocking rate, 75% ultraviolet blocking rate and neutral transmission color.
Comparative example 1
A low-emissivity coated glass comprises a glass substrate 1 and a coating film 2; the plating film 2 was composed of a first indium tin oxide layer 201 having a thickness of 20nm, a first silicon oxide layer 202 having a thickness of 15nm, a first silicon nitride layer 203 having a thickness of 12nm, a first zinc oxide layer 204 having a thickness of 10nm, a first silver layer 205 having a thickness of 8nm, a copper layer 206 having a thickness of 6nm, a first nickel-chromium alloy layer 207 having a thickness of 5nm, a zinc tin oxide layer 208 having a thickness of 30nm, a second zinc oxide layer 209 having a thickness of 10nm, a second silver layer 210 having a thickness of 11nm, a second nickel-chromium alloy layer 211 having a thickness of 5nm, and a second silicon nitride layer 213 having a thickness of 30 nm.
According to experimental detection, the coated film of the low-emissivity coated glass lacks the second indium tin oxide layer, the energy-saving performance of the coated film is reduced, the infrared ray blocking rate is 55%, the ultraviolet ray blocking rate is 68%, and the transmitted color is yellowish.
Comparative example 2
A low-emissivity coated glass comprises a glass substrate 1 and a coating film 2; the plating film 2 was composed of a first indium tin oxide layer 201 having a thickness of 20nm, a first silicon oxide layer 202 having a thickness of 15nm, a first silicon nitride layer 203 having a thickness of 12nm, a first zinc oxide layer 204 having a thickness of 10nm, a first silver layer 205 having a thickness of 8nm, a copper layer 206 having a thickness of 6nm, a first nickel-chromium alloy layer 207 having a thickness of 5nm, a zinc tin oxide layer 208 having a thickness of 30nm, a second zinc oxide layer 209 having a thickness of 10nm, a second silver layer 210 having a thickness of 11nm, a second copper layer having a thickness of 5nm, a second nickel-chromium alloy layer 211 having a thickness of 5nm, a second indium tin oxide layer 212 having a thickness of 20nm, and a second silicon nitride layer 213 having a thickness of 30 nm.
According to experimental detection, the coated film of the low-radiation coated glass is provided with a second copper layer with the thickness of 5nm, the energy-saving performance of the coated film is not greatly different, but the light transmittance is reduced, the infrared ray blocking rate is 71%, the ultraviolet ray blocking rate is 82%, and the transmitted color is yellowish.
The above description is only exemplary of the present invention and should not be taken as limiting the scope of the present invention, as any modifications, equivalents, improvements and the like made within the spirit and principles of the present invention are intended to be included within the scope of the present invention.
Claims (10)
1. A low-radiation coated glass comprises a glass substrate (1) and a coating (2), wherein the coating (2) is arranged on the surface of the glass substrate (1), and is characterized in that the coating (2) sequentially comprises a first indium tin oxide layer (201) with the thickness of 5-100nm, a first silicon oxide layer (202) with the thickness of 5-30nm, a first silicon nitride layer (203) with the thickness of 5-40nm, a first zinc oxide layer (204) with the thickness of 5-15nm, a first silver layer (205) with the thickness of 3-15nm, a copper layer (206) with the thickness of 3-10nm, a first nickel chromium alloy layer (207) with the thickness of 3-10nm, a zinc tin oxide layer (208) with the thickness of 20-50nm, a second zinc oxide layer (209) with the thickness of 5-15nm, and a second silver layer (210) with the thickness of 5-15nm from the glass substrate to the outside, a second nichrome layer (211) with a thickness of 3-10nm, a second indium tin oxide layer (212) with a thickness of 5-50nm, and a second silicon nitride layer (213) with a thickness of 20-50 nm.
2. The coated glass according to claim 1, wherein the first ITO layer (201) has a thickness of 10-50nm and the second ITO layer (212) has a thickness of 15-25 nm.
3. The coated glass according to claim 2, wherein the first ITO layer (201) has a thickness of 20nm and the second ITO layer (212) has a thickness of 20 nm.
4. The coated glass according to claim 1, wherein the first silicon oxide layer (202) has a thickness of 10-20nm, the first silicon nitride layer (203) has a thickness of 10-15nm, and the zinc tin oxide layer (208) has a thickness of 25-35 nm.
5. The coated glass according to claim 4, wherein the first silicon oxide layer (202) has a thickness of 15nm, the first silicon nitride layer (203) has a thickness of 12nm, and the zinc tin oxide layer (208) has a thickness of 30 nm.
6. The coated glass according to claim 1, wherein the first zinc oxide layer (204) has a thickness of 8-12nm and the second zinc oxide layer (209) has a thickness of 8-12 nm.
7. The coated glass according to claim 6, wherein the first zinc oxide layer (204) has a thickness of 10nm and the second zinc oxide layer (209) has a thickness of 10 nm.
8. The coated glass according to claim 1, wherein the thickness of the first silver layer (205) is 5-10nm, the thickness of the copper layer (206) is 5-8nm, and the thickness of the second silver layer (210) is 8-12 nm.
9. The coated glass according to claim 8, wherein the first silver layer (205) has a thickness of 8nm, the copper layer (206) has a thickness of 6nm, and the second silver layer (210) has a thickness of 11 nm.
10. The coated glass according to claim 1, wherein the thickness of the first nichrome layer (207) is 5 to 8nm, the thickness of the second nichrome layer (211) is 4 to 6nm, and the thickness of the second silicon nitride layer (213) is 25 to 40 nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920879346.1U CN210012759U (en) | 2019-06-12 | 2019-06-12 | Low-emissivity coated glass |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920879346.1U CN210012759U (en) | 2019-06-12 | 2019-06-12 | Low-emissivity coated glass |
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| CN210012759U true CN210012759U (en) | 2020-02-04 |
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| CN201920879346.1U Active CN210012759U (en) | 2019-06-12 | 2019-06-12 | Low-emissivity coated glass |
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