CN210001919U

CN210001919U - Gas distribution structure and reaction cavity assembly with same

Info

Publication number: CN210001919U
Application number: CN201920328293.4U
Authority: CN
Inventors: 冯鑫彬; 贾晓霞; 李琳琳; 曹志强; 宋士佳; 陈光羽
Original assignee: Dongtai Hi Tech Equipment Technology Co Ltd
Current assignee: Zishi Energy Co.,Ltd.
Priority date: 2019-03-14
Filing date: 2019-03-14
Publication date: 2020-01-31
Anticipated expiration: 2029-03-14

Abstract

The utility model provides an kind gas distribution structures and have its reaction cavity subassembly, wherein, the gas distribution structure includes the casing, and the casing includes the lateral wall, is provided with air inlet and gas outlet on the lateral wall, has gas passage in the lateral wall, and gas passage communicates air inlet and gas outlet.

Description

Gas distribution structure and reaction cavity assembly with same

Technical Field

The utility model relates to a technical field of the gas distribution structure of coating film particularly, relates to kinds of gas distribution structures and have its reaction cavity subassembly.

Background

Pvd (physical Vapor deposition) — physical Vapor deposition: refers to a process of transferring atoms or molecules from a source to a substrate surface by physical processes to effect mass transfer. It can make some particles with special properties (high strength, wear resistance, heat radiation, corrosion resistance, etc.) spray-coated on the parent body with lower property, so that the parent body has better property.

The PVD basic method comprises: vacuum evaporation, sputtering, ion plating (hollow cathode ion plating, hot cathode ion plating, arc ion plating, active reactive ion plating, radio frequency ion plating, direct current discharge ion plating).

In sputtering coating, high requirements are required for uniform mixing and gas distribution of process gases, and if the design is unreasonable, the coating quality is affected.

SUMMERY OF THE UTILITY MODEL

The utility model aims to provide an kind of gas distribution structures and have its reaction cavity subassembly to gas distribution is inhomogeneous and causes the not good problem of coating film quality during the coating film among the prior art of solution.

In order to achieve the purpose, the utility model provides a gas distribution structures, which comprises a shell, wherein the shell comprises a side wall, an air inlet and an air outlet are arranged on the side wall, a gas channel is arranged in the side wall, and the gas channel is communicated with the air inlet and the air outlet.

, the side wall is enclosed into a cylindrical structure, the side wall comprises an outer side wall and an inner side wall, and the air outlet is arranged on the inner side wall.

, the number of air outlets is multiple.

Further , the exit area of the air outlet near the air inlet is smaller than the exit area of the air outlet remote from the air inlet.

, a gas passage is formed between the inner and outer side walls.

, the air inlet is multiple, and multiple air inlets are arranged at end of the cylindrical structure at intervals, and the inner side wall and the outer side wall are closed at end connected with the air inlets.

, the gas distribution structure further includes a baffle at the second end of the housing.

, the air distribution structure further comprises an air-equalizing screen, and the air-equalizing screen is arranged at the air outlet.

In addition the aspect, this application still provides kind of reaction cavity subassemblies, including reaction cavity and the gas distribution structure of setting in reaction cavity, the gas distribution structure is above-mentioned gas distribution structure.

, the reaction chamber includes a side plate and a cover plate, the cover plate is located at the end of the side plate away from the shell.

Use the technical scheme of the utility model, let in the casing with gaseous through the air inlet, gaseous through gas passage from the gas outlet flow, again with the target on the particle coating of sputter out on the base plate, such coating film is more even, the coating film quality is better. The technical scheme of the utility model the problem that the gas distribution is inhomogeneous and cause the coating film quality not good during the coating film among the prior art has been solved effectively.

Drawings

The accompanying drawings, which form a part of the specification , are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this specification, illustrate exemplary embodiments of the invention and together with the description serve to explain the invention and not to limit the invention properly, in which:

fig. 1 shows a schematic perspective view of an embodiment of an air distribution structure according to the present invention;

FIG. 2 shows an enlarged, partially sectioned, schematic view in front elevation of the gas distribution structure of FIG. 1;

FIG. 3 shows an enlarged, partially cut-away, schematic side view of the gas distribution structure of FIG. 1;

FIG. 4 shows a schematic view of an th arrangement of the gas distribution structure of FIG. 1, an

Fig. 5 shows a second arrangement of the gas distribution structure of fig. 1.

Wherein the figures include the following reference numerals:

10. a housing; 11. an air inlet; 12. an air outlet; 20. a baffle plate; 30. a reaction chamber; 31. a side plate; 32. a cover plate; 40. a target material; 50. a substrate.

Detailed Description

It should be noted that the embodiments and features of the embodiments in the present application may be combined with each other without conflict. The present invention will be described in detail below with reference to the accompanying drawings in conjunction with embodiments.

It is noted that the following detailed description is exemplary and is intended to provide further explanation of the invention at unless otherwise indicated.

For ease of description, spatially relative terms such as "over … …", "over … …", "over … …", "over" and the like may be used herein to describe the spatially positional relationship of devices or features to other devices or features as illustrated in the figures.

Exemplary embodiments according to the present application will now be described in more detail with reference to the accompanying drawings. These exemplary embodiments may, however, be embodied in many different forms and should not be construed as limited to only the embodiments set forth herein. It is to be understood that these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the concept of the exemplary embodiments to those skilled in the art, in the drawings, the thicknesses of layers and regions are exaggerated for clarity, and the same devices are denoted by the same reference numerals, and thus the description thereof will be omitted.

As shown in fig. 1 to 5, the gas distribution structure of the present embodiment includes: a housing 10. The housing 10 includes a side wall, on which an air inlet 11 and an air outlet 12 are provided, and an air passage is provided in the side wall and communicates the air inlet 11 and the air outlet 12.

By applying the technical scheme of the embodiment, gas is introduced into the shell 10 through the gas inlet 11, flows out from the gas outlet 12 through the gas channel, and is coated on the substrate 50 together with particles sputtered from the target 40, so that the coating is relatively uniform and the coating quality is relatively good. The technical scheme of this embodiment has solved the problem that the gas distributes unevenly and causes the coating film quality not good during the coating film among the prior art effectively.

As shown in FIG. 1, in the solution of the present embodiment, the sidewall is enclosed into a cylindrical structure, the sidewall includes an outer sidewall and an inner sidewall, and the gas outlet 12 is disposed on the inner sidewall, the above structure makes the gas more easily concentrated and reduces the waste, the gas enters from the gas inlet 11 and flows out from the gas outlet 12, the gas outlet 12 is located on the inner sidewall of the cylindrical structure, the gas is not dispersed in the invalid space, the substrate 50 is also located in the area of the cylindrical structure projected along the axis, specifically, the gas outlet 12 is multiple, the multiple gas outlets are distributed on the inner sidewall of the cylindrical structure at intervals, so that the distribution of the gas is more uniform, the gas outlet 12 is circular hole-shaped, of course, the gas outlet 12 may also be or multiple long strip-shaped structures, and the extending direction of the long strip-.

It should be noted that, the two ends of the cylindrical structure are open, the side surface is enclosed to form a closed ring, the cross section of the ring can be rectangular, square, circular, etc. and can be set according to the needs, the particles sputtered from the target 40 and the gas are coated on the substrate 50 by chemical reaction, the inner side wall and the outer side wall can be body structure or split structure.

As shown in fig. 1, in the solution of the present embodiment, the outlet area of the air outlet 12 close to the air inlet 11 is smaller than the outlet area of the air outlet 12 far from the air inlet 11. Thus, the gas output of each gas outlet 12 is uniform, which is more beneficial to the uniform coating of the substrate 50. As another arrangement, a resistance structure may be provided between the inner sidewall and the outer sidewall, so that the resistances from the air inlet 11 to the air outlets 12 are the same as much as possible, and the air output is the same.

As shown in fig. 1 to 4, in the solution of the present embodiment, the gas channel is formed between the inner side wall and the outer side wall. The structure is easy to process and low in manufacturing cost. The inner and outer side walls may be connected by various means, such as fasteners, welding, and adhesives.

As shown in fig. 1 to 4, in the technical solution of the present embodiment, a plurality of gas inlets 11 are provided, the plurality of gas inlets 11 are disposed at th end of the cylindrical structure at intervals, and the inner side wall and the outer side wall are sealed at end connected to the gas inlets 11, so that the gas outlet is more uniform.

As shown in fig. 1, in the solution of the present embodiment, the air distribution structure further includes a baffle 20, and the baffle 20 is located at the second end of the casing 10. The provision of the baffle 20 enables the gas and sputtered particles to be coated at desired locations and reduces contamination of the chamber. Specifically, in the present embodiment, the baffle 20 is annular, and the outer edge of the baffle 20 is connected to the housing 10. Of course, other baffles may be provided as desired, such as to cover locations of the substrate 50 where no coating is desired.

In the technical solution of this embodiment (not shown in the figure), the air distribution structure further includes an air-equalizing screen, and the air-equalizing screen is disposed at the air outlet 12. The setting of the gas-homogenizing screen cloth enables the distribution of gas to be more uniform. The gas-homogenizing screen is a porous grid.

As shown in fig. 5, the present application further provides reaction chamber assemblies, which include a reaction chamber 30 and a gas distribution structure disposed in the reaction chamber 30, wherein the gas distribution structure is the above-mentioned gas distribution structure, the arrangement is such that the shell 10 and the target 40 are respectively located at two sides of the substrate 50, the substrate 50 is located in the reaction chamber 30, the gas enters the reaction chamber 30 and fills the surface of the substrate 50, and the sputtered particles are sputtered on the substrate 50 and react with the gas to be uniformly coated on the substrate 50.

As shown in FIG. 5, the reaction chamber 30 includes a side plate 31 and a cover plate 32, the cover plate 32 is located at the end of the side plate 31 away from the housing 10. the cover plate 32 has a channel through which sputtered particles impinge on the substrate 50. the cover plate 32 can reduce the escape of gas.

It is noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of example embodiments according to the present application. As used herein, the singular forms "a", "an" and "the" are intended to include the plural forms as well, and it should be understood that when the terms "comprises" and/or "comprising" are used in this specification, they specify the presence of stated features, steps, operations, devices, components, and/or combinations thereof, unless the context clearly indicates otherwise.

Furthermore, the terms "comprises" and "comprising," and any variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a series of steps or elements is not necessarily limited to the expressly listed steps or elements, but may include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus.

The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims

1, kind of gas distribution structure, its characterized in that includes:

the shell (10), the shell (10) includes the lateral wall, be provided with air inlet (11) and gas outlet (12) on the lateral wall, gas passage has in the lateral wall, gas passage intercommunication air inlet (11) with gas outlet (12).

2. The gas distribution structure of claim 1, wherein the side wall is enclosed in a cylindrical structure, the side wall comprises an outer side wall and an inner side wall, and the gas outlet (12) is arranged on the inner side wall.

3. The gas distribution structure according to claim 2, characterized in that the gas outlet (12) is plural.

4. A gas distribution structure according to claim 3, characterized in that the outlet area of the gas outlet (12) close to the gas inlet (11) is smaller than the outlet area of the gas outlet (12) remote from the gas inlet (11).

5. The gas distribution structure of claim 2, wherein the gas channel is formed between the inner sidewall and the outer sidewall.

6. The air distribution structure of claim 2, characterized in that the air inlet (11) is a plurality of air inlets (11), the air inlets (11) are arranged at th end of the cylindrical structure at intervals, and the inner side wall and the outer side wall are closed at end connected with the air inlets (11).

7. Gas distribution structure according to claim 6, characterized in that it further comprises a baffle (20), said baffle (20) being located at the second end of the casing (10).

8. The gas distribution structure of , according to any of claims 1 to 7, further comprising a gas homogenizing screen disposed at the gas outlet (12).

A reaction chamber assembly of kinds, comprising a reaction chamber (30) and a gas distribution structure disposed in the reaction chamber (30), characterized in that the gas distribution structure is the gas distribution structure of any of claims 1 to 8, .

10. The reaction chamber assembly according to claim 9, wherein the reaction chamber (30) comprises a side plate (31) and a cover plate (32), the cover plate (32) being located at the end of the side plate (31) remote from the housing (10).