CN209934213U - Cleaning device for chemical filter - Google Patents
Cleaning device for chemical filter Download PDFInfo
- Publication number
- CN209934213U CN209934213U CN201920414313.XU CN201920414313U CN209934213U CN 209934213 U CN209934213 U CN 209934213U CN 201920414313 U CN201920414313 U CN 201920414313U CN 209934213 U CN209934213 U CN 209934213U
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- Prior art keywords
- filter
- way valve
- liquid
- pipeline
- chemical
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- 238000004140 cleaning Methods 0.000 title claims abstract description 132
- 239000000126 substance Substances 0.000 title claims abstract description 114
- 239000007788 liquid Substances 0.000 claims abstract description 116
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 25
- 238000004891 communication Methods 0.000 claims description 16
- 239000008367 deionised water Substances 0.000 claims description 3
- 229910021641 deionized water Inorganic materials 0.000 claims description 3
- 230000000694 effects Effects 0.000 abstract description 12
- 238000011010 flushing procedure Methods 0.000 abstract description 8
- 238000012544 monitoring process Methods 0.000 abstract description 4
- 238000000034 method Methods 0.000 description 15
- 239000003814 drug Substances 0.000 description 9
- 239000012535 impurity Substances 0.000 description 9
- 238000001914 filtration Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000000356 contaminant Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
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Abstract
The utility model provides a chemicals filter belt cleaning device, include: a filter; a cleaning device liquid inlet pipeline; a filter liquid inlet pipeline and a filter liquid outlet pipeline which are communicated with the filter; the first drainage pipeline is communicated with the filter liquid inlet pipeline; the second liquid discharge pipeline is communicated with the liquid outlet pipeline of the filter; a first three-way valve, a second three-way valve and a third three-way valve. The device realizes the automatic cleaning of the filter without disassembling the filter; in addition, the filter flushing direction can be randomly selected by adjusting the on-off of the first three-way valve, the second three-way valve and the third three-way valve, so that a good flushing effect is achieved; through setting up water resistance and taking into account the pressure gauge, can make the automatic liquid supply of controlling belt cleaning device liquid inlet pipe of system, take into account the digital monitoring mode of pressure gauge through water resistance simultaneously, improve the control to filter cleaning precision.
Description
Technical Field
The utility model relates to a semiconductor manufacturing equipment field especially relates to a chemicals filter belt cleaning device.
Background
In semiconductor manufacturing processes, corrosive chemical liquids are usually used, for example, during etching, plate making, cleaning, or polishing, the corrosive chemical liquids are required, but since the chemical liquids themselves and many contaminants such as solid particles, organic polymers, and metals are generated during the manufacturing process, the quality of the chemical liquids is seriously affected, and the wafer manufacturing process is seriously affected, and thus, the application of the filter to chemicals is indispensable for these contaminants.
In the using process of the chemical filter, impurities in the chemical liquid medicine can be absorbed and accumulated by the filter, so that the filtering effect is poor, even the filter is blocked, the pressure difference between the inside and the outside of the filter is overlarge, and the supply fault of the chemical liquid medicine is caused; in addition, when the filter is replaced, the chemical liquid medicine remained in the filter is difficult to be completely diluted and washed clean, so that the contact risk of personnel is increased.
Therefore, it is necessary to provide a chemical filter cleaning apparatus capable of automatically cleaning impurities in a chemical filter.
SUMMERY OF THE UTILITY MODEL
In view of the above prior art's shortcoming, the utility model aims to provide a chemicals filter belt cleaning device for solve among the prior art because accumulated impurity in the chemicals filter, cause the filter effect poor, block up the filter even, cause the inside and outside pressure differential of filter too big, make chemicals liquid medicine supply fault, and improve the problem of personnel's contact risk etc..
To achieve the above and other related objects, the present invention provides a chemical filter cleaning device, wherein a chemical filter is disposed in a circulation system of the chemical filter cleaning device, the chemical filter cleaning device at least includes:
a filter having an inlet and an outlet;
the cleaning device liquid inlet pipeline is used for inputting cleaning liquid to the filter;
a filter inlet line in communication with the filter through the inlet of the filter;
a filter outlet line in communication with the filter through the outlet of the filter;
the first drainage pipeline is communicated with the filter liquid inlet pipeline and is provided with a first valve;
the second liquid discharge pipeline is communicated with the filter liquid outlet pipeline and is provided with a second valve;
the first three-way valve is provided with an inlet and two outlets, and the inlet of the first three-way valve is communicated with the liquid inlet pipeline of the cleaning device;
a second three-way valve having two inlets and one outlet, a first inlet of the second three-way valve being in communication with a chemical tank effluent line, a second inlet of the second three-way valve being in communication with a first outlet of the first three-way valve, an outlet of the second three-way valve being in communication with the filter feed line;
and the third three-way valve is provided with two inlets and one outlet, the first inlet of the third three-way valve is communicated with the filter liquid outlet pipeline, the second inlet of the third three-way valve is communicated with the second outlet of the first three-way valve, and the outlet of the third three-way valve is communicated with the chemical tank liquid inlet pipeline.
Optionally, a third valve is arranged on a liquid inlet pipeline of the cleaning device.
Further, the third valve comprises a pneumatic valve.
Furthermore, a manual valve and a flowmeter are also arranged on the liquid inlet pipeline of the cleaning device.
Optionally, the first valve comprises a pneumatic valve.
Optionally, the second valve comprises a pneumatic valve.
Optionally, a water resistance meter is arranged on the first liquid discharge pipeline, and a water resistance meter is arranged on the second liquid discharge pipeline.
Optionally, the first liquid discharge pipeline and the second liquid discharge pipeline are connected to the same liquid discharge port, and a water resistance meter is arranged on the liquid discharge port.
Optionally, pressure gauges are arranged on the filter liquid inlet pipeline and the filter liquid outlet pipeline.
Optionally, the cleaning liquid comprises deionized water.
As described above, the chemical filter cleaning apparatus of the present invention achieves automatic cleaning of the filter without disassembling the filter; in addition, the filter flushing direction can be randomly selected by adjusting the on-off of the first three-way valve, the second three-way valve and the third three-way valve, so that a good flushing effect is achieved; through setting up water resistance meter and pressure gauge, can make system automated control belt cleaning device advances the confession liquid of liquid pipeline, simultaneously through water resistance meter and the digital monitoring mode of pressure gauge, improve the control to filter cleaning precision.
Drawings
Fig. 1 is a schematic diagram showing a chemical cleaning apparatus in the prior art.
Fig. 2 is a schematic structural view of a chemical cleaning apparatus including the chemical filter cleaning apparatus of the present invention.
Fig. 3 is a schematic view illustrating a first working scenario of the chemical filter cleaning apparatus of the present invention.
Fig. 4 is a schematic view illustrating a second working scenario of the chemical filter cleaning device according to the present invention.
Fig. 5 is a schematic view illustrating a third working scenario of the chemical filter cleaning apparatus according to the present invention.
Description of the element reference numerals
10 chemical tank
11 Filter
12 Process Chamber
13 chemical tank outlet pipe
14 chemical tank liquid inlet pipeline
15 heater
16 chemical pump
17 pressure gauge
20 filter
Liquid inlet pipeline of 21 cleaning device
22 filter liquid inlet pipeline
23 filter liquid outlet pipeline
24 first drain line
25 second drain line
26 first three-way valve
261 inlet of a first three-way valve
262 first outlet of first three-way valve
263 second outlet of the first three-way valve
27 second three-way valve
271 a first inlet of a second three-way valve
272 second inlet of the second three-way valve
273 outlet of a second three-way valve
28 third three-way valve
281 first inlet of third three-way valve
282 second inlet of third three-way valve
283 outlet of a third three-way valve
29 chemical tank outlet pipe
30 chemical tank liquid inlet pipeline
31 first valve
32 second valve
33 third valve
34 hand valve
35 flow meter
36 liquid discharge port
37 pressure gauge
Detailed Description
The following description is provided for illustrative purposes, and other advantages and features of the present invention will become apparent to those skilled in the art from the following detailed description.
Please refer to fig. 1 to 5. It should be understood that the structure, ratio, size and the like shown in the drawings attached to the present specification are only used for matching with the content disclosed in the specification, so as to be known and read by those skilled in the art, and are not used for limiting the limit conditions that the present invention can be implemented, so that the present invention has no technical essential meaning, and any structure modification, ratio relationship change or size adjustment should still fall within the scope that the technical content disclosed in the present invention can cover without affecting the function that the present invention can produce and the purpose that the present invention can achieve. Meanwhile, the terms such as "upper", "lower", "left", "right", "middle" and "one" used in the present specification are for convenience of description, and are not intended to limit the scope of the present invention, and changes or adjustments of the relative relationship thereof may be made without substantial technical changes, and the present invention is also regarded as the scope of the present invention.
Fig. 1 is a schematic structural diagram of a chemical cleaning apparatus in the prior art. The chemical cleaning device can comprise a chemical tank 10, a filter 11, a process chamber 12, a chemical tank liquid outlet pipeline 13 and a chemical tank liquid inlet pipeline 14. The chemicals in the chemical tank 10 flow into the filter 11 through the chemical tank outlet line 13 for filtering, and the filtered chemicals directly circulate to the chemical tank 10 through the chemical tank inlet line 14, or first enter the process chamber 12 and then enter the chemical tank 10. The filtering of the chemical is performed in two paths, mainly because impurities are generated during the processing (i.e., during the processing in the processing chamber 12), and the chemical liquid itself generates many impurities such as solid particles.
Further, the chemical cleaning apparatus may further include a heater 15, and the heater 15 may be installed on the chemical tank outlet line 13 to heat the chemical, so as to improve the reaction effect of the process chamber 12.
Further, the chemical cleaning apparatus may further include a chemical tank pump 16, and the chemical tank pump 16 may be installed on the chemical tank effluent line 13 to pump out the chemical liquid in the chemical tank 10 such that the chemical liquid circulates in the chemical cleaning apparatus.
Further, the chemical cleaning apparatus may further include pressure gauges 17, and the pressure gauges 17 may be installed at both sides of the inlet and the outlet of the filter 11 to monitor a pressure difference across the filter to determine whether impurities inside the filter 11 exceed standards.
When the filter 11 is in use, impurities in the chemical liquid medicine are absorbed by the filter 11 and accumulated in the filter 11, and long-time accumulation causes the filtering effect of the filter 11 to be poor, so that the cleaning effect of the chemical liquid medicine is poor, and the process in the process chamber 12 is affected; furthermore, the filter 11 is blocked, so that the pressure difference between the inside and the outside of the filter 11 is too large, and the supply of the chemical liquid medicine is failed; in addition, when the filter needs to be replaced, the residual chemical liquid medicine in the filter is difficult to be completely diluted and washed clean, and therefore the contact risk of personnel is increased.
Based on this, the inventor of the present invention has studied and proposed a chemical filter cleaning apparatus, which can effectively and automatically clean a filter without disassembling the filter in a circulation system of the chemical cleaning apparatus, and can change a cleaning mode according to actual needs to increase a cleaning effect, thereby increasing a service life of the filter.
In order to make the above objects, features and advantages of the present invention easier to understand, the chemical filter cleaning device of the present invention will be described in detail with reference to the accompanying drawings.
As shown in fig. 2, the utility model provides a chemical filter belt cleaning device, the chemical filter sets up in chemical belt cleaning device's circulation system, chemical filter belt cleaning device includes at least:
a filter 20 having an inlet and an outlet;
a cleaning device liquid inlet line 21 for inputting a cleaning liquid to the filter 20;
a filter inlet line 22 communicating with said filter 20 through said inlet of said filter 20;
a filter outlet line 23 communicating with the filter 20 through the outlet of the filter 20;
the first drainage pipeline 24 is communicated with the filter liquid inlet pipeline 22, and a first valve 31 is arranged on the first drainage pipeline 24;
a second drainage pipeline 25, which is communicated with the filter outlet pipeline 23, and a second valve 32 is arranged on the second drainage pipeline 25;
a first three-way valve 26 having one inlet and two outlets, the inlet 261 of the first three-way valve being in communication with the washer fluid inlet line 21;
a second three-way valve 27 having two inlets and one outlet, a first inlet 271 of the second three-way valve being in communication with the chemical tank effluent line 29, a second inlet 272 of the second three-way valve being in communication with the first outlet 262 of the first three-way valve, and an outlet 273 of the second three-way valve being in communication with the filter influent line 22;
and a third three-way valve 28 having two inlets and one outlet, a first inlet 281 of the third three-way valve being communicated with the filter outlet line 23, a second inlet 282 of the third three-way valve being communicated with a second outlet 263 of the first three-way valve, and an outlet 283 of the third three-way valve being communicated with the chemical tank inlet line 30.
When the filter 20 needs to be cleaned, the chemical circulation process in the chemical cleaning device is shut off by the second three-way valve 27 and the third three-way valve 28, so that the chemical liquid medicine contained in the chemical tank 10 stops the cleaning circulation, cleaning liquid is introduced through the cleaning device liquid inlet pipeline 21, the cleaning of the filter 20 by the cleaning liquid is realized by the first three-way valve 26, the second three-way valve 27 and the third three-way valve 28, and cleaning residual liquid is discharged through the corresponding first liquid discharge pipeline 24 or the second liquid discharge pipeline 25, so that the automatic cleaning of the filter 20 is realized without disassembling the filter 20.
As shown in fig. 2, the liquid inlet line 21 of the cleaning device is provided with a third valve 33 for controlling whether to enter the cleaning liquid. Any on-off valve may be selected as the third valve 33, and in this embodiment, the third valve 33 is provided as an air-operated valve.
As shown in fig. 2, the cleaning device liquid inlet pipe 21 is further provided with a manual valve 34 and a flow meter 35 for controlling the amount of cleaning liquid.
As an example, the first valve 31 may be any on-off valve, and in the present embodiment, the first valve 31 is provided as an air-operated valve.
As an example, the second valve 32 may be any on-off valve, and in the present embodiment, the second valve 32 is provided as a pneumatic valve.
As an example, a water resistance meter is disposed on the first drainage pipe 24, and a water resistance meter is disposed on the second drainage pipe 25. And judging whether the cleaning is finished or not through the change of the water resistance value monitored by the water resistance meter, and when the water resistance value measured by the water resistance meter reaches a set value, transmitting a signal back to the controller, and controlling the liquid inlet pipeline 21 of the cleaning device to stop supplying liquid by the controller to finish the washing.
For example, as shown in fig. 2, the first drainage pipe 24 and the second drainage pipe 25 lead into the same drainage port, and a water resistance meter is arranged on the drainage port. And the first liquid discharge pipeline and the second liquid discharge pipeline are communicated with the same liquid discharge port, so that unified collection of residual liquid is facilitated, and the water resistance value of the first liquid discharge pipeline and the water resistance value of the second liquid discharge pipeline can be monitored only by arranging one water resistance meter.
As an example, as shown in fig. 2, pressure gauges 37 are provided on both the filter liquid inlet line 22 and the filter liquid outlet line 23. Whether cleaning is finished or not is judged by monitoring the pressure difference of the pressure values of the pressure gauges 37 on the two sides of the filter 20, when the pressure difference reaches a set value, a signal is transmitted back to the controller, and the controller controls the liquid inlet pipeline 21 of the cleaning device to stop liquid supply, so that flushing is finished.
As an example, the cleaning liquid comprises deionized water.
The utility model provides a chemical filter belt cleaning device can realize three kinds of cleaning methods, including forward cleaning method, reverse cleaning method, forward, reverse washing mode in turn. Here, the forward direction and the reverse direction are defined as a circulation direction of the chemical solution in the chemical tank 10 in the entire chemical cleaning apparatus, and the direction along the circulation direction of the chemical solution is defined as the forward direction, and the direction opposite to the circulation direction of the chemical solution is defined as the reverse direction. During the use process, the cleaning mode can be selected according to the actual situation, for example, when the impurities in the filter 20 are relatively less, a one-way cleaning mode of forward cleaning or reverse cleaning can be selected to shorten the cleaning time and reduce the cleaning cost; when the amount of impurities in the filter 20 is relatively large, i.e. when the pressure difference across the filter 20 is large, or when the filter 20 needs to be replaced, a forward and reverse alternate flushing manner can be selected to achieve a better cleaning effect.
As shown in fig. 2 and fig. 3, the forward cleaning mode (as the direction of the dotted arrow in fig. 3) of the chemical filter cleaning device of the present invention is shown, specifically:
1) when the filter 20 needs to be cleaned, the first inlet 271 of the second three-way valve is shut off by the second three-way valve 27 to shut off the chemical tank outlet line 29, the outlet 283 of the third three-way valve is shut off by the third three-way valve 28 to shut off the chemical tank inlet line 30, and the second outlet 263 of the first three-way valve is shut off by the first three-way valve 26 to shut off the communication between the cleaning device inlet line 21 and the chemical tank inlet line 30;
2) introducing a cleaning liquid into the cleaning device liquid inlet pipeline 21, wherein the cleaning liquid flows to the filter liquid inlet pipeline 22 through the first three-way valve 26 and the second three-way valve 27 and enters the filter 20 through the inlet of the filter, so that the filter 20 is cleaned in the forward direction;
3) the cleaning liquid becomes a residual liquid after cleaning the filter 20, and is discharged from the filter discharge line 23, enters the second discharge line 25, and is finally discharged from the liquid discharge port 36.
The above process chemical filter cleaning apparatus achieves automatic cleaning of the filter 20 from the forward direction.
As shown in fig. 2 and fig. 4, the reverse cleaning mode (as the direction of the dotted arrow in fig. 4) of the chemical filter cleaning device of the present invention is shown, specifically:
1) when the filter 20 needs to be cleaned, the first inlet 271 of the second three-way valve is shut off by the second three-way valve 27 to shut off the chemical tank outlet line 29, the outlet 283 of the third three-way valve is shut off by the third three-way valve 28 to shut off the chemical tank inlet line 30, and the first outlet 262 of the first three-way valve is shut off by the first three-way valve 26 to shut off the communication between the cleaning device inlet line 21 and the chemical tank outlet line 29;
2) introducing a cleaning liquid into the cleaning device liquid inlet pipeline 21, wherein the cleaning liquid flows to the filter liquid outlet pipeline 23 through the first three-way valve 26 and the second three-way valve 27, and enters the filter 20 through the outlet of the filter, so that the filter 20 is cleaned reversely;
3) the cleaning liquid becomes a residual liquid after cleaning the filter 20, and is discharged from the filter liquid inlet line 22, into the first liquid discharge line 24, and finally discharged from the liquid discharge port 36.
The above process chemistry filter cleaning apparatus achieves automated cleaning of the filter 20 from the reverse direction.
As shown in fig. 2 and fig. 5, a forward and reverse alternate cleaning manner (as the directions of the dotted line arrow and the solid line arrow in fig. 5) of the chemical filter cleaning device of the present invention is shown, when forward cleaning is required, the filter 20 can be cleaned according to the forward cleaning manner of the chemical filter cleaning device, which is not described herein; during the reverse cleaning, the filter 20 may be cleaned in a reverse cleaning manner of the chemical filter cleaning apparatus, which is not described herein again. The number of forward and reverse alternate cleaning times can be set according to actual needs until the cleaning effect of the filter 20 reaches a preset requirement.
The above process chemical filter cleaning device realizes the automatic cleaning of the filter 20 from the forward direction and the reverse direction alternate cleaning mode.
In summary, the chemical filter cleaning device of the present invention realizes the automatic cleaning of the filter without disassembling the filter; in addition, the filter flushing direction can be randomly selected by adjusting the on-off of the first three-way valve, the second three-way valve and the third three-way valve, so that a good flushing effect is achieved; through setting up water resistance meter and pressure gauge, can make system automated control belt cleaning device advances the confession liquid of liquid pipeline, simultaneously through water resistance meter and the digital monitoring mode of pressure gauge, improve the control to filter cleaning precision. Therefore, the utility model effectively overcomes various defects in the prior art and has high industrial utilization value.
The above embodiments are merely illustrative of the principles and effects of the present invention, and are not to be construed as limiting the invention. Modifications and variations can be made to the above-described embodiments by those skilled in the art without departing from the spirit and scope of the present invention. Accordingly, it is intended that all equivalent modifications or changes which may be made by those skilled in the art without departing from the spirit and technical spirit of the present invention be covered by the claims of the present invention.
Claims (10)
1. A chemical filter cleaning apparatus, the chemical filter being provided in a circulation system of the chemical filter cleaning apparatus, characterized by comprising at least:
a filter having an inlet and an outlet;
the cleaning device liquid inlet pipeline is used for inputting cleaning liquid to the filter;
a filter inlet line in communication with the filter through the inlet of the filter;
a filter outlet line in communication with the filter through the outlet of the filter;
the first drainage pipeline is communicated with the filter liquid inlet pipeline and is provided with a first valve;
the second liquid discharge pipeline is communicated with the filter liquid outlet pipeline and is provided with a second valve;
the first three-way valve is provided with an inlet and two outlets, and the inlet of the first three-way valve is communicated with the liquid inlet pipeline of the cleaning device;
a second three-way valve having two inlets and one outlet, a first inlet of the second three-way valve being in communication with a chemical tank effluent line, a second inlet of the second three-way valve being in communication with a first outlet of the first three-way valve, an outlet of the second three-way valve being in communication with the filter feed line;
and the third three-way valve is provided with two inlets and one outlet, the first inlet of the third three-way valve is communicated with the filter liquid outlet pipeline, the second inlet of the third three-way valve is communicated with the second outlet of the first three-way valve, and the outlet of the third three-way valve is communicated with the chemical tank liquid inlet pipeline.
2. The chemical filter cleaning device according to claim 1, wherein: and a third valve is arranged on the liquid inlet pipeline of the cleaning device.
3. The chemical filter cleaning device according to claim 2, wherein: the third valve comprises a pneumatic valve.
4. The chemical filter cleaning device according to claim 3, wherein: and a manual valve and a flowmeter are also arranged on the liquid inlet pipeline of the cleaning device.
5. The chemical filter cleaning device according to claim 1, wherein: the first valve comprises a pneumatic valve.
6. The chemical filter cleaning device according to claim 1, wherein: the second valve comprises a pneumatic valve.
7. The chemical filter cleaning device according to claim 1, wherein: and a water resistance meter is arranged on the first liquid discharge pipeline, and a water resistance meter is arranged on the second liquid discharge pipeline.
8. The chemical filter cleaning device according to claim 1, wherein: the first liquid discharge pipeline and the second liquid discharge pipeline are communicated with the same liquid discharge port, and a water resistance meter is arranged on the liquid discharge port.
9. The chemical filter cleaning device according to claim 1, wherein: and pressure gauges are arranged on the filter liquid inlet pipeline and the filter liquid outlet pipeline.
10. The chemical filter cleaning device according to claim 1, wherein: the cleaning liquid comprises deionized water.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920414313.XU CN209934213U (en) | 2019-03-28 | 2019-03-28 | Cleaning device for chemical filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920414313.XU CN209934213U (en) | 2019-03-28 | 2019-03-28 | Cleaning device for chemical filter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN209934213U true CN209934213U (en) | 2020-01-14 |
Family
ID=69125859
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201920414313.XU Expired - Fee Related CN209934213U (en) | 2019-03-28 | 2019-03-28 | Cleaning device for chemical filter |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN209934213U (en) |
-
2019
- 2019-03-28 CN CN201920414313.XU patent/CN209934213U/en not_active Expired - Fee Related
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| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20200114 |