CN209917517U - Tail gas treatment device - Google Patents

Tail gas treatment device Download PDF

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Publication number
CN209917517U
CN209917517U CN201920400872.5U CN201920400872U CN209917517U CN 209917517 U CN209917517 U CN 209917517U CN 201920400872 U CN201920400872 U CN 201920400872U CN 209917517 U CN209917517 U CN 209917517U
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CN
China
Prior art keywords
tail gas
treatment device
process chamber
exhaust gas
gas treatment
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Active
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CN201920400872.5U
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Chinese (zh)
Inventor
文鸥
张勇
伍波
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SHENZHEN S C NEW ENERGY EQUIPMENT CO Ltd
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SHENZHEN S C NEW ENERGY EQUIPMENT CO Ltd
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Priority to CN201920400872.5U priority Critical patent/CN209917517U/en
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Abstract

The utility model discloses a tail gas processing apparatus, including the process chamber, the splendid attire has the solution liquid that is arranged in dissolving the impurity of tail gas in the process chamber, be equipped with the baffle in the process chamber, first portion and second portion are separated into with the process chamber to the baffle, run through on the baffle and be equipped with the gas pocket of crossing that soaks in dissolving in the liquid, be equipped with the inlet port on the first portion of process chamber, be equipped with the venthole on the second portion of process chamber. The utility model discloses tail gas gets into the first part of process chamber from the inlet port after, because the pressure in the first part of process chamber constantly increases, tail gas can get into and dissolve in the liquid and pass the second part that the gas pocket got into the process chamber, and tail gas can make the impurity in the tail gas dissolved with dissolving the liquid contact in this process to get rid of the impurity in the tail gas, tail gas after getting rid of impurity flows out the process chamber from the venthole.

Description

Tail gas treatment device
Technical Field
The utility model relates to a crystalline silicon solar cell field, more specifically say so and relate to a tail gas processing apparatus who handles to the tail gas that produces crystalline silicon solar cell in-process.
Background
The crystalline silicon solar cell is divided into P-type crystalline silicon and N-type crystalline silicon, and the N-type crystalline silicon cell has the advantages of long minority carrier lifetime, no light-induced attenuation, good weak light effect, small temperature coefficient and the like, so that the crystalline silicon cell is hoped to reach the theoretical highest efficiency. Because the cost of the doping production line through ion implantation is too high, boron diffusion doping becomes the first choice of the mass production process of the N-type crystalline silicon battery, but compared with the phosphorus diffusion of the conventional battery, the generated tail gas contains B2O3 and H3BO3, and is in a powder shape, so that the tail gas pipeline and the vacuum diaphragm pump are easily blocked. Therefore, the treatment of B2O3 and H3BO3 powder in the tail gas becomes a bottleneck and a maintenance difficulty which plague the mass production process of boron diffusion.
The existing diffusion equipment generally adopts a filter mode to filter powder in tail gas, but too much powder is generated by boron diffusion, so that the cleaning period of a filter element and a pipeline is too short, and the time for maintaining the equipment is occupied during mass production to cause a great deal of waste. In addition, when B2O3 and H3BO3 powder enter the vacuum diaphragm pump along with tail gas, the diaphragm can be blocked and corroded, and the diaphragm pump is frequently damaged.
SUMMERY OF THE UTILITY MODEL
The utility model aims at providing a tail gas processing apparatus can get rid of the impurity in the tail gas.
The technical scheme of the utility model is that: the utility model provides a tail gas processing apparatus, includes the process chamber, the splendid attire has the solution that is arranged in dissolving the impurity in the tail gas in the process chamber, be equipped with the baffle in the process chamber, first portion and second portion are separated into with the process chamber to the baffle, run through on the baffle and be equipped with the gas passing hole of soaking in dissolving the liquid, be equipped with the inlet port on the first portion of process chamber, be equipped with the venthole on the second portion of process chamber.
The dissolving solution is water.
The tail gas treatment device also comprises a dry filter, and the dry filter is connected with the air outlet.
The tail gas treatment device also comprises a diaphragm pump, the diaphragm pump is connected with a drying filter, and tail gas coming out of the drying filter enters the diaphragm pump.
The treatment chamber is provided with a dissolved solution inlet and a dissolved solution outlet, and the tail gas treatment device also comprises a drainage pump connected with the dissolved solution outlet.
The tail gas treatment device also comprises a dissolving liquid input pipe and a flowmeter, wherein the flowmeter is connected between the dissolving liquid input pipe and the dissolving liquid inlet.
The tail gas treatment device also comprises a valve, and the valve is connected between the flowmeter and the dissolving liquid inlet.
The treatment chamber is also provided with a pressure detection port, and the tail gas treatment device further comprises a pressure detector connected with the pressure detection port.
The utility model discloses tail gas gets into the first part of process chamber from the inlet port after, because the pressure in the first part of process chamber constantly increases, tail gas can get into and dissolve in the liquid and pass the second part that the gas pocket got into the process chamber, and tail gas can make the impurity in the tail gas dissolved with dissolving the liquid contact in this process to get rid of the impurity in the tail gas, tail gas after getting rid of impurity flows out the process chamber from the venthole.
Drawings
FIG. 1 is a schematic diagram of a process chamber according to an embodiment of the present invention.
Fig. 2 is a structural diagram of an exhaust gas treatment device according to an embodiment of the present invention.
Detailed Description
As shown in fig. 1, the embodiment of the present invention provides a tail gas treatment device, including treatment chamber 2, the solution 26 that is used for dissolving impurities in the tail gas is contained in treatment chamber 2, be equipped with baffle 21 in treatment chamber 2, first portion 27 and second portion 28 are separated into with treatment chamber 2 to the baffle, run through on the baffle 21 and be equipped with the air passing hole 211 that soaks in solution 26, be equipped with inlet port 22 on the first portion 27 of treatment chamber 2, be equipped with venthole 23 on the second portion 28 of treatment chamber 2. After tail gas entered the first part of process chamber from the inlet port, because the pressure in the first part of process chamber constantly increases, tail gas can get into in the solution and pass the second part that the gas pocket got into the process chamber, and tail gas can make the impurity in the tail gas be dissolved with solution contact in this process to get rid of the impurity in the tail gas, the tail gas after getting rid of the impurity flows out the process chamber from the venthole.
In this example, the dissolved solution was water, the impurities in the tail gas were B2O3 and H3BO3 powders, and both the B2O3 and H3BO3 powders reacted with and dissolved in water.
The treatment chamber 2 is provided with a solution inlet port 24 and a solution outlet port 25.
As shown in fig. 2, the off-gas enters the treatment chamber 2 from the diffusion furnace 1. This tail gas processing apparatus still includes drier-filter 3 and diaphragm pump 4, and drier-filter 4 is connected with the venthole, and diaphragm pump 4 is connected with drier-filter 3, and the tail gas that comes out from drier-filter 3 gets into diaphragm pump 4.
The exhaust gas treatment apparatus further includes a drain pump 5 connected to the dissolved liquid discharge port, the drain pump 5 being for discharging the wastewater in the treatment chamber 2.
The tail gas treatment device also comprises a solution input pipe 6 and a flow meter 7, wherein the flow meter 7 is connected between the solution input pipe 6 and the solution inlet, and the volume of water flowing into the treatment chamber is accurately calculated through the flow meter. The tail gas treatment device also comprises a valve 8, and the valve 8 is connected between the flowmeter 7 and the dissolving liquid inlet.
The processing chamber 2 is further provided with a pressure detection port 29, and the tail gas processing device further comprises a pressure detector 9 connected with the pressure detection port 29, and the pressure in the processing chamber is detected through the pressure detector.
The above embodiments are only for illustrating the concept of the present invention, and those skilled in the art can make various modifications and changes under the concept of the present invention, and these modifications and changes are included in the protection scope of the present invention.

Claims (8)

1. The utility model provides a tail gas processing apparatus, its characterized in that includes treatment chamber (2), splendid attire has solution (26) that is arranged in dissolving the impurity in the tail gas in treatment chamber (2), be equipped with baffle (21) in treatment chamber (2), first portion (27) and second part (28) are separated into with treatment chamber (2) baffle (21), it is equipped with air passing hole (211) of soaking in solution (26) to run through on baffle (21), be equipped with inlet port (22) on first portion (27) of treatment chamber (2), be equipped with venthole (23) on second part (28) of treatment chamber (2).
2. The exhaust gas treatment device according to claim 1, wherein the dissolving liquid (26) is water.
3. The exhaust gas treatment device according to claim 1, further comprising a dry filter (3), wherein the dry filter (3) is connected to the outlet aperture (23).
4. The exhaust gas treatment device according to claim 2, further comprising a diaphragm pump (4), wherein the diaphragm pump (4) is connected to a dry filter (3), and exhaust gas from the dry filter (3) enters the diaphragm pump (4).
5. The exhaust gas treatment device according to claim 1, wherein the treatment chamber (2) is provided with a solution inlet (24) and a solution outlet (25), and the exhaust gas treatment device further comprises a drain pump (5) connected to the solution outlet (25).
6. The exhaust gas treatment device according to claim 5, further comprising a solution inlet pipe (6) and a flow meter (7), the flow meter (7) being connected between the solution inlet pipe (6) and the solution inlet port (24).
7. The exhaust gas treatment device according to claim 6, further comprising a valve (8), the valve (8) being connected between the flow meter (7) and the dissolving liquid inlet (24).
8. The exhaust gas treatment device according to claim 1, wherein the treatment chamber is further provided with a pressure detection port (29), and the exhaust gas treatment device further comprises a pressure detector (9) connected to the pressure detection port (29).
CN201920400872.5U 2019-03-27 2019-03-27 Tail gas treatment device Active CN209917517U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201920400872.5U CN209917517U (en) 2019-03-27 2019-03-27 Tail gas treatment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201920400872.5U CN209917517U (en) 2019-03-27 2019-03-27 Tail gas treatment device

Publications (1)

Publication Number Publication Date
CN209917517U true CN209917517U (en) 2020-01-10

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Application Number Title Priority Date Filing Date
CN201920400872.5U Active CN209917517U (en) 2019-03-27 2019-03-27 Tail gas treatment device

Country Status (1)

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CN (1) CN209917517U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109954346A (en) * 2019-03-27 2019-07-02 深圳市捷佳伟创新能源装备股份有限公司 Exhaust gas processing device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109954346A (en) * 2019-03-27 2019-07-02 深圳市捷佳伟创新能源装备股份有限公司 Exhaust gas processing device

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