CN209613638U - A kind of cleaning device of polishing pad - Google Patents
A kind of cleaning device of polishing pad Download PDFInfo
- Publication number
- CN209613638U CN209613638U CN201920265330.1U CN201920265330U CN209613638U CN 209613638 U CN209613638 U CN 209613638U CN 201920265330 U CN201920265330 U CN 201920265330U CN 209613638 U CN209613638 U CN 209613638U
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- China
- Prior art keywords
- disk
- cleaning
- polishing pad
- cleaning device
- inner groovy
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Abstract
The utility model discloses a kind of cleaning devices of polishing pad, including cleaning disk, drainage tube and several brush heads, the inside of the cleaning disk is equipped with cavity, its top surface is equipped with inner groovy, the circular in cross-section of the inner groovy, and the diameter r of the inner groovy is greater than the diameter R of disk on polishing machine, the depth h of inner groovy is less than or equal to the thickness H of disk on polishing machine；The inlet opening being connected to the cavity is additionally provided on separate groove or side wall on the cleaning disk top surface；The bottom surface of the cleaning disk is equipped with several apopores being connected with the cavity；One end of the drainage tube is connected with the inlet opening on the cleaning disk top surface, and the other end is for connecting water source；All brush heads are set on the bottom surface of the cleaning disk, and are arranged perpendicular to the bottom surface of the cleaning disk.The utility model avoids manually-operated uncontrollability, substantially increases the efficiency of cleaning polishing pad, and save water.
Description
Technical field
The utility model belongs to field, and in particular to a kind of cleaning device of polishing pad.
Background technique
Chemical Mechanical Polishing Technique combines the advantage of chemical polishing and mechanical polishing, wide range of applications, packet
Include sapphire wafer, silicon wafer, glass, stainless steel, the grinding and polishing of aluminium alloy and other semiconductor wafers.Chemical machinery
Polishing is usually that polishing pad and polishing fluid is cooperated to use with polishing machine, guarantees the throwing polished next time after each polishing
Optical speed and surface quality will clean the polishing pad on polishing machine.It is current most by manually using hairbrush to scrub by hand,
It is big to scrub process water amount, it is time-consuming and laborious, it can't ensure to scrub clean.During continuous production, the time shadow of dishwashing
Production efficiency is rung, whether disk, which cleans up, can also have an impact polishing effect.
Utility model content
In view of the foregoing deficiencies of prior art, it the utility model proposes a kind of cleaning device of polishing pad, is used for
Solve the disadvantage that manual cleaning polishing pad low efficiency in the prior art.
It realizes above-mentioned technical purpose, reaches above-mentioned technical effect, the utility model is achieved through the following technical solutions:
A kind of cleaning device of polishing pad, comprising:
Disk is cleaned, the inside of the cleaning disk is equipped with cavity, and top surface is equipped with inner groovy, the cross section of the inner groovy
It is rounded, and the diameter r of the inner groovy is greater than the diameter R of disk on polishing machine, the depth h of inner groovy is less than or equal to polishing
The thickness H of disk on machine；On the cleaning disk top surface far from be additionally provided on groove or side wall be connected to the cavity into
Water hole；The bottom surface of the cleaning disk is equipped with several apopores being connected with the cavity；
Drainage tube, one end of the drainage tube are connected with the inlet opening on the cleaning disk top surface, and the other end is used for
Connect water source；
Several brush heads, each brush head are set on the bottom surface of the cleaning disk, and perpendicular to the bottom table of the cleaning disk
Face setting.
The diameter R of disk with the diameter r of inner groovy differs 2- on the polishing machine as a further improvement of the utility model,
3mm。
As a further improvement of the utility model, on the depth h and polishing machine of the inner groovy between the thickness H of disk
Relationship is H/2 < h < H.
The brush head and apopore are evenly arranged in the bottom table of the cleaning disk as a further improvement of the utility model,
Face.
The distribution density of the brush head is 8-20/dm as a further improvement of the utility model,2, between adjacent brush head
Equipped with an apopore, the distribution density of the apopore and the distribution density of brush head are identical.
The material of the brush head upper bristle is plastics, animal wool or sponge as a further improvement of the utility model,
In any one.
The circular in cross-section of the cleaning disk as a further improvement of the utility model, and the diameter for cleaning disk is big
In or equal to polishing machine lower wall radius.
The material of the cleaning disk is plastics, timber or metal as a further improvement of the utility model,.
The material of the cleaning disk is HDPE, PC or PP material as a further improvement of the utility model,.
The volume of the cavity is more than or equal to the 1/3 of cleaning disk body product as a further improvement of the utility model,.
The utility model has the beneficial effects that
The utility model proposes a kind of cleaning devices of polishing pad will clean disk after polishing terminates to remove by throwing part
The disk on polishing machine is covered, the water inlet cleaned on disk connects water source by drainage tube, adjusts polishing machine pressure 2-4kg, opens and throws
Ray machine, with the rotation of polishing machine lower and upper disk, the polishing pad of the automatic cleaning polishing machine of brush head can be completed for 2-5 minutes.This
The cleaning device of the polishing pad of utility model avoids manually-operated uncontrollability, substantially increases the effect of cleaning polishing pad
Rate, and save water.
Detailed description of the invention
Fig. 1 uses structural schematic diagram for a kind of embodiment of the utility model；
Fig. 2 is the structural schematic diagram of utility model device；
Wherein:
Disk on 1- polishing machine；2- cleans disk；3- brush head；4- polishing pad；5- polishing machine lower wall；6- inner groovy；7- drainage tube.
Specific embodiment
In order to make the purpose of the utility model, technical solutions and advantages more clearly understood, with reference to embodiments, to this
Utility model is further elaborated.It should be appreciated that specific embodiment described herein is only used to explain that this is practical
It is novel, it is not used to limit the utility model.
The application principle of the utility model is explained in detail with reference to the accompanying drawing.
As shown in Figs. 1-2, the cleaning device of the polishing pad in the utility model, including cleaning disk, drainage tube and several
Brush head；
The inside of the cleaning disk 2 is equipped with cavity, it is preferable that the volume of the cavity is more than or equal to cleaning 2 body of disk
Long-pending 1/3；The circular in cross-section of the cleaning disk 2, and the diameter for cleaning disk 2 is more than or equal to 5 radius of polishing machine lower wall；
The top surface of the cleaning disk 2 is equipped with inner groovy 6 for accommodating disk 1 on polishing machine, the inner groovy 6 it is transversal
Face is rounded, and the diameter r of the inner groovy 6 is more than or equal to the diameter R of disk 1 on polishing machine, it is preferable that the polishing machine
The diameter R of upper disk 1 differs 2-3mm with the diameter r of inner groovy 6；The depth h of the inner groovy 6 is less than or equal on polishing machine
The thickness H of disk 1, it is preferable that the relationship on the depth h and polishing machine of the inner groovy 6 between the thickness H of disk 1 is H/2 < h < H；
The inlet opening being connected to the cavity is additionally provided on separate groove or side wall on cleaning 2 top surface of disk；The cleaning
The bottom surface of disk 2 is equipped with several apopores being connected with the cavity；The material of the cleaning disk 2 is plastics, timber
Or metal, it is preferable that the material of the cleaning disk 2 is HDPE, PC or PP material；
One end of the drainage tube 7 is connected with the inlet opening on cleaning 2 top surface of disk, and the other end is for connecting water
Source；The effect of drainage tube 7 in the utility model is to realize drainage, therefore, any restriction is not done to its material, as long as can
It realizes that the pipe of drainage is suitable for the cleaning device in the utility model, can directly be obtained from buying on the market；
Each brush head 3 is set on the bottom surface of the cleaning disk 2, and is arranged perpendicular to the bottom surface of the cleaning disk 2；In
In the preferred embodiment of the utility model, the brush head 3 and apopore are evenly arranged in the bottom surface for cleaning disk 2；It is described
The distribution density of brush head 3 is 8-20/dm2, be equipped with an apopore between adjacent brush head 3, the distribution density of the apopore with
Brush head 3 is identical；The material of 3 upper bristle of brush head is any one in plastics, animal wool or sponge.
In conclusion the working principle of the cleaning device in the utility model specifically:
After polishing, removes by after throwing part, 2 sets of disk 1 on polishing machine of disk will be cleaned, clean the water inlet on disk 2
Water source is connected by drainage tube 7, adjusts polishing machine pressure 2-4kg, opens polishing machine；
With the rotation of the lower and upper disk of polishing machine, the polishing pad 4 of the automatic cleaning polishing machine of brush head 3 is automatic in brush head 3
It during cleaning, constantly there are flowing out in apopore, to cooperate brush head 3 to be cleaned, scavenger can be completed within 2-5 minutes
Make.
Embodiment 1
By taking small-scale test is with polishing machine Shenyang section crystalline substance Unipol-1200s as an example, the cleaning device of polishing pad is made, wherein
The diameter for cleaning disk 2 is 180mm, and with a thickness of 25mm, the diameter positioned at the inner groovy 6 of cleaning disk top surface is 162mm, inner groovy
6 depth are 10mm, and brush head 3 uses plastic optical fibre.
When practical cleaning, cleaning disk is covered on polishing machine after disk 1, clear water is connected to inlet opening by drainage tube, is adjusted
Water stream.Polishing machine is opened, the revolving speed for adjusting disk 1 on polishing machine is 45rpm, and the revolving speed of polishing machine lower wall 5 is 50rpm, adjustment
Pressure is 2kg, automatic cleaning 3 minutes, and remaining polishing powder cleans up completely in 4 hole of polishing pad.
The basic principles and main features of the present invention and the advantages of the present invention have been shown and described above.Current row
The technical staff of industry is described in above embodiments and description it should be appreciated that the present utility model is not limited to the above embodiments
Only illustrate the principles of the present invention, on the premise of not departing from the spirit and scope of the utility model, the utility model is also
It will have various changes and improvements, these various changes and improvements fall within the scope of the claimed invention.The utility model
Claimed range is defined by the appending claims and its equivalent thereof.
Claims (10)
1. a kind of cleaning device of polishing pad characterized by comprising
Disk is cleaned, the inside of the cleaning disk is equipped with cavity, and top surface is equipped with inner groovy, and the cross section of the inner groovy is in circle
Shape, and the diameter r of the inner groovy is greater than the diameter R of disk on polishing machine, the depth h of inner groovy is less than or equal on polishing machine
The thickness H of disk；The inlet opening being connected to the cavity is additionally provided on separate groove or side wall on the cleaning disk top surface；
The bottom surface of the cleaning disk is equipped with several apopores being connected with the cavity；
Drainage tube, one end of the drainage tube are connected with the inlet opening on the cleaning disk top surface, and the other end is for connecting
Water source；
Several brush heads, each brush head are set on the bottom surface of the cleaning disk, and are set perpendicular to the bottom surface of the cleaning disk
It sets.
2. a kind of cleaning device of polishing pad according to claim 1, it is characterised in that: the diameter of disk on the polishing machine
R differs 2-3mm with the diameter r of inner groovy.
3. a kind of cleaning device of polishing pad according to claim 1, it is characterised in that: the depth h of the inner groovy with
Relationship on polishing machine between the thickness H of disk is H/2 < h < H.
4. a kind of cleaning device of polishing pad according to claim 1, it is characterised in that: the brush head and apopore are uniform
It is arranged in the bottom surface of the cleaning disk.
5. a kind of cleaning device of polishing pad according to claim 4, it is characterised in that: the distribution density of the brush head is
8-20/dm2, an apopore is equipped between adjacent brush head, the distribution density of the apopore and the distribution density of brush head are identical.
6. a kind of cleaning device of polishing pad according to claim 4 or 5, it is characterised in that: the brush head upper bristle
Material is any one in plastics, animal wool or sponge.
7. a kind of cleaning device of polishing pad according to claim 1, it is characterised in that: the cross section of the cleaning disk is in
Circle, and the diameter for cleaning disk is more than or equal to polishing machine lower wall radius.
8. a kind of cleaning device of polishing pad according to claim 1, it is characterised in that: the material of the cleaning disk is modeling
Material, timber or metal.
9. a kind of cleaning device of polishing pad according to claim 1, it is characterised in that: it is described cleaning disk material be
HDPE, PC or PP material.
10. a kind of cleaning device of polishing pad according to claim 1, it is characterised in that: the volume of the cavity is greater than
Or equal to the 1/3 of cleaning disk body product.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920265330.1U CN209613638U (en) | 2019-03-01 | 2019-03-01 | A kind of cleaning device of polishing pad |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920265330.1U CN209613638U (en) | 2019-03-01 | 2019-03-01 | A kind of cleaning device of polishing pad |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN209613638U true CN209613638U (en) | 2019-11-12 |
Family
ID=68455583
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201920265330.1U Active CN209613638U (en) | 2019-03-01 | 2019-03-01 | A kind of cleaning device of polishing pad |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN209613638U (en) |
-
2019
- 2019-03-01 CN CN201920265330.1U patent/CN209613638U/en active Active
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| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP02 | Change in the address of a patent holder | ||
| CP02 | Change in the address of a patent holder |
Address after: 201799 Shanghai city Qingpu District Youth Road 958, No. 968 building 4 S zone 3 room 329 Patentee after: SHANGHAI YINGZHI ABRASIVE MATERIALS Co.,Ltd. Address before: Room 506, floor 5, No. 938, Shunda Road, Nanxiang Town, Jiading District, Shanghai 201802 Patentee before: SHANGHAI YINGZHI ABRASIVE MATERIALS Co.,Ltd. |