CN209348332U - powder purification treatment device - Google Patents
powder purification treatment device Download PDFInfo
- Publication number
- CN209348332U CN209348332U CN201821563481.7U CN201821563481U CN209348332U CN 209348332 U CN209348332 U CN 209348332U CN 201821563481 U CN201821563481 U CN 201821563481U CN 209348332 U CN209348332 U CN 209348332U
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- China
- Prior art keywords
- powder
- lautertuns
- chamber
- washing chamber
- water
- Prior art date
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- 239000000843 powder Substances 0.000 title claims abstract description 89
- 238000000746 purification Methods 0.000 title claims abstract description 7
- 238000011282 treatment Methods 0.000 title abstract description 13
- 238000005406 washing Methods 0.000 claims abstract description 73
- 239000004065 semiconductor Substances 0.000 claims abstract description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 88
- 238000005507 spraying Methods 0.000 claims description 24
- 239000007921 spray Substances 0.000 claims description 19
- 208000004350 Strabismus Diseases 0.000 claims description 3
- 238000010276 construction Methods 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 239000007789 gas Substances 0.000 abstract description 75
- 239000002912 waste gas Substances 0.000 abstract description 16
- 238000005245 sintering Methods 0.000 abstract description 6
- 239000002351 wastewater Substances 0.000 description 8
- 238000005192 partition Methods 0.000 description 7
- 230000008676 import Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D50/00—Combinations of methods or devices for separating particles from gases or vapours
- B01D50/60—Combinations of devices covered by groups B01D46/00 and B01D47/00
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Treating Waste Gases (AREA)
Abstract
The utility model provides a powder purification treatment device, include and be formed with a first washing cavity in a shell planning, a powder catches cavity and a second washing cavity, wherein this first washing cavity has the entry of leading-in waste gas, dispose a first sprinkler in this first washing cavity, dispose at least one sprinkler head and a plurality of entrapment ring in this powder catching cavity, this second washing cavity has the export of a row of exhaust gas, dispose a second sprinkler in this second washing cavity, this entry, this first washing cavity, this powder catching cavity, this second washing cavity and this export become a gas runner that the guide waste gas passes through in proper order; thus, the problem that fine powder generated after the semiconductor waste gas is subjected to high-temperature sintering treatment is difficult to capture is solved.
Description
Technical field
The utility model relates to the capturing technologies that manufacture of semiconductor exhaust gas is sintered the product after reaction, especially have
About a kind of powder purifying processing device.
Background technique
Known, manufacture of semiconductor exhaust gas generated includes SiH4、H2SiCl2(DCS)、WF6、BF3、NF3、SF6、CF4、
C2F6、C3F8Deng wherein NF3、SF6、CF4、C2F6And C3F8Deng harmful fluoride (the Per Fluorinated of ownership
Compounds, PFC), if being emitted into atmosphere, it will cause environmental pollution, even greenhouse effects, global warming caused
Serious influence, it is therefore necessary to by these described exhaust-gas treatments at harmless gas.
In the streets general semiconductor waste gas processing equipment, be exactly for by above-mentioned exhaust-gas treatment at harmless gas.One
As for, it is known that semiconductor waste gas processing equipment be designed with the reaction chamber of exhaust gas, manufacture of semiconductor exhaust gas system generated
It imports in reaction chamber, and the exhaust gas is sintered with high temperature provided by flame or hot-air in reaction chamber
(i.e. sintering reaction)；It particularly, can will be, for example, harmful NF by the sintering reaction of high temperature3、SF6、CF4、C2F6And C3F8Deng
Fluoride gas resolves into harmless fluorine ion (F-), and then achievees the purpose that purify exhaust gas.
And know, the exhaust gas, can be in generating SiO after the processing of above-mentioned high temperature sintering in reaction chamber2、PO2、AlO2、
W3O5、BO3Powder product, these products usually need to the water wash procedures (scrubber) through back segment capture and scrub, make
Above-mentioned product can be deposited in water and by filter screen from.
But due to SiO in the product2、PO2、AlO2、W3O5、BO3Powder it is extremely fine, in known semiconductor
Water wash procedures used in waste gas treatment equipment are unable to fully capture the powder product, cause manufacture of semiconductor exhaust gas
Purification efficiency it is unevident, or even improve the cost of waste gas treatment equipment and cleaning procedure, therefore urgently improved.
Utility model content
In view of this, the main purpose of the utility model is that improving semiconductor waste gas after high temperature sintering is handled
SiO generated2、PO2、AlO2、W3O5、BO3Powder it is extremely fine, it is difficult to sufficiently capture the problem of.
In preferably implementing one, the technological means of the utility model, which is included in planning in a device shell and is formed, to be provided with containing keeping
What the exhaust gas of powder passed through: one first washing chamber, the entrance for the exhaust gas for importing the powder containing hiding with one, and the first washing chamber
Interior is configured with one first water jet；One powder catch chamber, inside interval form one first lautertuns and one second lautertuns,
It is connected between first lautertuns and second lautertuns via a channel, and on first lautertuns and second lautertuns
Side is each configured with an at least fountain head, is also placed with multiple trapping rings respectively in first lautertuns and second lautertuns；
And one second washing chamber, with one discharge purification after exhaust gas outlet, and this second washing chamber in configured with one second spray
Hydrophone, this second washing chamber be formed in this first washing chamber side so that the powder catch chamber be seated this first
It washes between chamber and the second washing chamber；Wherein, which is formed with multiple connections the first washing chamber
First air hole of room, and the second filtering trench bottom is formed with the second air hole of multiple connections the second washing chamber；It should
Entrance, the first washing chamber, the multiple first air hole, first lautertuns, the powder catch chamber, second filtering
Slot, the multiple second air hole, the second washing chamber and the outlet sequentially become the gas stream that exhaust gas routing passes through
Road.
In further implement, the entrance and the outlet are respectively formed in the top of the device shell.Wherein first water jet
One end protruded out to outside the device shell by the entrance, one end of second water jet is protruded out to outside the device shell by the outlet.
In further implement, first lautertuns and second lautertuns are respectively formed in the bottom of the powder catch chamber
Layer.
In further implement, which is formed in the upper layer of the powder catch chamber.
In further implement, it is in the tube body of hollow columnar which, which has one, which forms one and spray upward
The hole for water spraying of water, the periphery of the tube body are simultaneously equipped at intervals with multiple spray holes sprayed water downward, and the aperture of the hole for water spraying is greater than described
The aperture of spray holes.Wherein the tube body and a spoiler is extended outward to form by the hole for water spraying, the spoiler have by it is upper downward
One inclined-plane of squint makes the hole for water spraying interval correspond to the inclined-plane for water projection.
In further implement, the trapping ring is in loop shaped, is formed with multiple ventholes on the ring wall of the trapping ring
The tongue piece extended with the axis direction by the respectively venthole side towards the trapping ring.Wherein the multiple trapping ring is distinguished simultaneously
Row is horizontally placed in first lautertuns and second lautertuns.The multiple trapping ring is multilayer construction.
In further implement, the both-end of the fountain head is respectively formed an interconnecting piece and is extended spirally outward by interconnecting piece
A spire, an apopore is formed in the interconnecting piece, one end of the apopore is towards the spire for water projection.
In further implement, which is configured on semiconductor waste gas treatment equipment, and semiconductor waste gas processing is set
Standby that there is a reaction chamber and a back segment to wash chamber, which is connected via the entrance with the reaction chamber,
The second washing chamber is connected via the outlet with back segment washing chamber.
According to above-mentioned technology, what the utility model can be generated, which have the technical effect that, sequentially receives multistage water by exhaust gas
It washes and multistage powder mends the purified treatment caught, can adequately capture the powder in exhaust gas, and then promote the purification efficiency of exhaust gas.
Techniques described above means and its specific implementation details for generating efficiency, please refer to the following example and schema are subject to
Explanation.
Detailed description of the invention
Fig. 1 is the cut-away view of the utility model powder purifying processing device；
Fig. 2 is the stereoscopic schematic diagram of trapping ring；
Fig. 3 is schematic diagram of the exhaust gas by trapping ring；
Fig. 4 is the enlarged diagram of fountain head；
Fig. 5 is the action schematic diagram of Fig. 1；
Fig. 6 is the cut-away view that the utility model powder purifying processing device is configured at waste gas treatment equipment.
Description of symbols: 1- powder purifying processing device；10- device shell；11- entrance；The outlet 12-；13- gas flow；
14- discharge outlet；15- overflow port；16- communicating pipe；21- first washes chamber；The first catch basin of 211-；22- powder catch chamber；
The first lautertuns of 221-；The second lautertuns of 222-；The first air hole of 223-；The second air hole of 224-；23- second washes chamber；
The second catch basin of 231-；24- partition；The channel 25-；The first water jet of 30a-；The second water jet of 30b-；31- blasthole；32- spray
Water hole；33- spray holes；34- spoiler；40- trapping ring；The upper layer 40a- trapping ring；40b- lower layer trapping ring；41- venthole；
42- tongue piece；50- fountain head；51- interconnecting piece；52- spire；53- apopore；54- water supplying pipe；The processing of 60- semiconductor waste gas is set
It is standby；61- reaction chamber；62- back segment washes chamber；63- waste gas ingress pipe；64- heater.
Specific embodiment
Firstly, referring to Fig. 1, disclosing the utility model provides a kind of preferable implementation shape of powder purifying processing device
State illustrates that the powder purifying processing device 1 includes a device shell 10, which can be by metal plate (such as stainless steel plate) spiral shell group
Or be welded, planning forms the one first washing chamber 21, one for being provided with and passing through containing the exhaust gas for keeping powder in the device shell 10
Powder catch chamber 22 and one second washing chamber 23, in which:
The first washing chamber 21 has the entrance 11 of the exhaust gas to import the powder containing hiding, which is formed at
The top of device shell 10, that is to say, that the exhaust gas is to import the first washing chamber 21 by entrance 11 in a manner of basipetal
It is interior.It is configured with one first water jet 30a in the first washing chamber 21, one end of first water jet 30a is convex by entrance 11
It extends to outside device shell 10, the useless of the first washing chamber 21 is imported by entrance 11 so that the first water jet 30a water sprayed captures
Containing the powder of hiding in gas.One first catch basin 211 is formed on the first washing 21 bottom of chamber, and first catch basin 211 is to receive
The waste water formed after collecting water that the first water jet 30a is sprayed in conjunction with the powder of hiding contained in exhaust gas.
Interval forms one first lautertuns 221 and one second lautertuns 222 inside the powder catch chamber 22.More specifically
It says, first lautertuns 221 and the second lautertuns 222 are the bottoms for being respectively formed in powder catch chamber 22.The powder catch
The upper layer of chamber 22 forms a channel 25, is to be connected between first lautertuns 221 and the second lautertuns 222 via the channel 25
It is logical.First lautertuns 221 and the top of the second lautertuns 222 (the namely top of powder catch chamber 22) be each configured with to
A few fountain head 50.It is also placed with multiple trapping rings 40 respectively in first lautertuns 221 and the second lautertuns 222.
This second washing chamber 23 have one to discharge purification after exhaust gas outlet 12, which is formed at device shell
10 top, that is to say, that the exhaust gas is to be given off in a manner of from lower to upper by the outlet 12 of the second washing chamber 23
It goes.It is configured with one second water jet 30b in the second washing chamber 23, one end of second water jet 30b is convex by outlet 12
It extends to outside device shell 10, is discharged so that the second water jet 30b water sprayed is captured by the outlet 12 of the second washing chamber 23
Containing the powder of hiding in the exhaust gas gone out.One second catch basin 231, second catch basin are formed on the second washing 23 bottom of chamber
231 waste water to be formed after collecting water that the second water jet 30b is sprayed in conjunction with the powder of hiding contained in exhaust gas.
The second washing chamber 23 is formed at the side of the first washing chamber 21 on the implementation, so that the powder catch chamber
Room 22 is seated between the first washing chamber 21 and the second washing chamber 23.The second washing chamber 23 and the first washing chamber 21
Between be to be spaced apart from each other via a partition 24 on the implementation, one end of the partition 24 extends to the bottom of device shell 10, the partition 24
The other end extend to the bottom of powder catch chamber 22.The partition 24 be on the implementation extend in powder catch chamber 22 and
It is spaced the first lautertuns 221 and the second lautertuns 222.The channel 25 is formed at top and partition of powder catch chamber 22
24 extend between one end in powder catch chamber 22.
First lautertuns, 221 bottom is formed with the first air hole of multiple the first washing of connection chambers 21 on the implementation
223, which is formed with the second air hole 224 of multiple the second washing of connection chambers 23 on the implementation.With
By means of the entrance 11, the first washing chamber 21, the multiple first air hole 223, first lautertuns 221, the powder catch
Institute between chamber 22, second lautertuns 222, the multiple second air hole 224, the second washing chamber 23 and the outlet 12
The gas flow 13 formed carrys out exhaust gas routing and passes through, and exhaust gas is made sequentially to receive multistage washing and multistage powder along gas flow 13
Mend the purified treatment caught.
Referring to Fig. 1, illustrating that the first water jet 30a and the second water jet 30b has one is in the pipe of hollow columnar
Body, the first water jet 30a are respectively formed the blasthole 31 being connected and a court with the both-end of the tube body of the second water jet 30b
The hole for water spraying 32 of upper water spray, and the periphery of the tube body of the first water jet 30a and the second water jet 30b and it is equipped at intervals with multiple companies
The spray holes 33 for being passed through water hole 31 and spraying water downward, the aperture of the hole for water spraying 32 are greater than the aperture of the spray holes 33, make to spray water
The droplet granularity that hole 32 is sprayed is greater than the droplet granularity that spray holes 33 are sprayed.Wherein, the droplet sprayed by hole for water spraying 32
It can quickly be fallen in the first catch basin 211 and the second catch basin 231 again because its granularity is big.Conversely, by 33 institute of spray holes
Because its granularity is small and light, will be slow is in that diffusion type is distributed in the first washing chamber 21 and the second water due to falling to the droplet of spraying
It washes in chamber 23.
In specific implementation, the tube body of the first water jet 30a and the second water jet 30b and from the hole for water spraying 32 to extension
Stretch to form a spoiler 34, which is the water spraying direction for being located at hole for water spraying 32, the spoiler 34 have by it is upper downward
An inclined-plane (substantially coniform inclined-plane) for squint makes the hole for water spraying 32 be spaced the corresponding inclined-plane for water projection, makes hole for water spraying
32 droplets sprayed are distributed in the first washing chamber 21 and the second washing chamber in netted via the guiding of spoiler 34
In 23, coverage area of the hole for water spraying 32 when spraying droplet can be promoted.In addition, the first water jet 30a and the second water jet 30b
A water inlet pipe (not being painted) is connected via blasthole 31, water provided by the water inlet pipe is outside via hole for water spraying 32 and spray holes 33
It sprays.
Please refer to Fig. 1 to Fig. 3, illustrates that the trapping ring 40 can be and be formed by bending by metal sheet body and presented
Loop shaped (as shown in Figure 2).Multiple ventholes 41, and the ring wall of the trapping ring 40 are formed on the ring wall of the trapping ring 40
On be also formed with by 41 side of venthole towards trapping ring 40 axis direction extend tongue piece 42.The exhaust gas be on the implementation through
By venthole 41 by trapping ring 40 (as shown in Figure 3), which can increase the contact surface of trapping ring 40 Yu exhaust gas.The tongue piece
42 be the ring wall punch forming by trapping ring 40 on the implementation.The tongue piece 42 is to be attached to metal surface by hydrone
Characteristic, to capture the SiO in exhaust gas in conjunction with water2、PO2、AlO2、W3O5、BO3Powder.Further, the trapping ring 42
Be be horizontally placed in the first lautertuns 221 and the second lautertuns 222 in side-by-side fashion, that is, the trapping ring 40 axial direction with
The direction when exhaust gas is flowed along gas flow 13 is vertical, and exhaust gas is enable to pass through trapping ring 40 via venthole 41.It is described to catch
Collection ring 40 can be multilayer construction, in the present embodiment, the trapping ring 40 in the first lautertuns 221 and the second lautertuns 222
Upper layer trapping ring 40a and lower layer trapping ring 40b (as shown in Figure 3) can be divided into according to its position, can increase 40 internal tongue of trapping ring
42 with the contact surface of exhaust gas, and then promote the effect of the powder in capturing exhaust gas of trapping ring 40.
Please refer to Fig. 1 and Fig. 4, illustrate that the both-end of the fountain head 50 is respectively formed an interconnecting piece 51 and by interconnecting piece
51 spires 52 extended spirally outward, form an apopore 53 in the interconnecting piece 51, and one end of the apopore 53 is towards spiral shell
Rotation portion 52 is for water projection.Further, the periphery of the interconnecting piece 51 is formed with screw thread, enables fountain head 50 in a manner of being spirally connected
It is locked on a water supplying pipe 54.The shape that the spire 52 helically extends can make water after through apopore 53 through by spiral shell
The guiding in rotation portion 52 and spiral outside spraying, so expand the spraying range of fountain head 50.Further, described
The water that fountain head 50 is sprayed is other than it can capture the powder in exhaust gas, moreover it is possible to for removing the powder adhered in trapping ring 40
End falls to powder in the first catch basin 211 and the second catch basin 231 with water, and then trapping ring 40 is maintained to capture exhaust gas
In powder when effect.
Please refer to Fig. 1 and Fig. 3, illustrate that exhaust gas in the first washing chamber 21 imports the via the first air hole 223
, can be sequentially by lower layer's trapping ring 40b and upper layer trapping ring 40a (as shown in Figure 3) in one lautertuns 221, then it flow to the second mistake
Filter pocket 222.Then, exhaust gas can sequentially pass through upper layer trapping ring 40a and lower layer trapping ring 40b in the second lautertuns 222, then pass through
Second washing chamber 23 is entered by the second air hole 224.Further, 222 top of the first lautertuns 221 and the second lautertuns
The water that is sprayed of fountain head 50 will form droplet and fall downwards and exhaust gas contact, and then capture the SiO in exhaust gas2、PO2、
AlO2、W3O5、BO3Powder.Then, droplet can enter upper by the venthole 41 above the trapping ring 40a of upper layer and along tongue piece 42
, can be in conjunction with other droplets be due to contact when droplet is moved along tongue piece 42 in layer trapping ring 40a, and then it is larger to form granularity
Droplet.The biggish droplet of granularity can fall downwards and be left by the venthole 41 below the trapping ring 40a of upper layer
Layer trapping ring 40a.Then, the biggish droplet of the granularity can then pass through the venthole 41 above lower layer's trapping ring 40b and edge
Tongue piece 42 enters in lower layer's trapping ring 40b, can be in conjunction with other droplets are due to contact, in turn when droplet is moved along tongue piece 42
Form the bigger droplet of granularity.Finally, the bigger droplet of the granularity can fall downwards and by below lower layer's trapping ring 40b
Venthole 41 and leave lower layer trapping ring 40b.The droplet of above-mentioned different granule size is caught by upper layer trapping ring 40a and lower layer
When collecting ring 40b, it can be contacted with exhaust gas and capture the SiO in exhaust gas2、PO2、AlO2、W3O5、BO3Powder.
Referring to Fig. 1, illustrating also there is a discharge outlet 14 and an overflow port 15 on the device shell 10, wherein the discharge outlet 14 is
It is formed on the device shell 10 of 231 lower section of the second catch basin, in order to discharge the waste water accumulated in the second catch basin 231.This
Partition 24 between two catch basins 231 and the first catch basin 211 is equipped with a connecting pipe 16, can make institute in the first catch basin 211
The waste water of accumulation is flowed into the second catch basin 231 by communicating pipe 16, then is discharged by discharge outlet 14.
The overflow port 15 is formed on the device shell 10 of 231 side of the second catch basin, and the height of the overflow port 15 is less than
First air hole 223 of powder catch chamber 22 and the height of the second air hole 224 make to be accumulated in the first catch basin 211
The height of waste water is lower than second lower than the height for the waste water accumulated in the height of the first air hole 223 and the second catch basin 231
The height of air hole 224 is avoided that the waste water accumulated in first catch basin 211 and the second catch basin 231 blocks first thoroughly
Stomata 223 and the second air hole 224, flow into exhaust gas can not in powder catch chamber 22.
Referring to Fig. 5, explanation is when exhaust gas is when entering the first washing chamber 21 by entrance 11, exhaust gas can first touch the
The droplet that one water jet 30a is sprayed, wherein spray holes 33 spray in diffusion type distribution the lesser droplet of granularity be easy with
SiO in exhaust gas2、PO2、AlO2、W3O5、BO3Powder collides in conjunction with above-mentioned powder, and the granularity of above-mentioned powder is enabled to become
Greatly, and then keep the movement speed of above-mentioned powder slack-off and easy to be sprayed by hole for water spraying 32 biggish in the granularity of net distribution
Droplet is washed away to the first catch basin 211.Then, exhaust gas imports the first lautertuns 221 via the multiple first air hole 223
It is interior, the SiO in exhaust gas2、PO2、AlO2、W3O5、BO3Powder because first washing chamber 21 in conjunction with water due to it is easy to attach in trapping
It can receive the water that fountain head 50 is sprayed on ring 40, and during exhaust gas flows to the second lautertuns 222 by the first lautertuns 221
Stream scrub, exhaust gas contact multiple trapping rings 40 in second lautertuns 222 then to capture powder again.Then, exhaust gas passes through
It is imported in the second washing chamber 23 by the multiple second air hole 224, and contacts the water that the second water jet 30b is sprayed
Stream captures the powder carried under one's arms in exhaust gas again, and sprays and hold under the arm via the second water jet 30b of the second catch basin 231 collection
With the waste water of powder, exhaust gas is then enabled to be discharged via the outlet 12.
Referring to Fig. 6, it is useless to illustrate that the gas shell 10 of the powder purifying processing device 1 of the utility model is arranged in semiconductor
There is a reaction chamber 61 and a back segment to wash chamber 62 in gas disposal equipment 60, in the semiconductor waste gas processing equipment 60, it should
First washing chamber 21 be to be connected via entrance 11 with reaction chamber 61, this second washing chamber 23 be via outlet 12 and after
Duan Shuixi chamber 62 is connected.Further, the top of the semi-conductor waste gas treatment tank 60 is imported configured with an at least exhaust gas
Pipe 63 and a heater 64, wherein 63 exhaust gas routing of waste gas ingress pipe enters in reaction chamber 61, which provides height
Temperature is sintered exhaust gas, which can be fired heater or hot pin.
The exhaust gas is first to import in reaction chamber 61, then, is sintered with high temperature provided by heater 63,
The exhaust gas can generate SiO after the sintering reaction of high temperature2、PO2、AlO2、W3O5、BO3Powder product.Then, described
Exhaust gas via entrance 11 enter powder purifying processing device 1 in, sequentially by first washing chamber 21, powder catch chamber 22 and
Second washing chamber 23 receives multistage by washing in chamber 21, powder catch chamber 22 and the second washing chamber 23 first
Washing and multistage powder mend the purified treatment caught, and can adequately capture the powder in exhaust gas, achieve the purpose that purify exhaust gas.
It is described above to be merely exemplary for the utility model, and not restrictive, those of ordinary skill in the art
Understand, without departing from the spirit and scope defined by the claims, can many modifications may be made, variation or it is equivalent, but
It falls within the protection scope of the utility model.
Claims (12)
1. a kind of powder purifying processing device, it is characterized in that including planning to be formed to be provided with to contain in a device shell to keep the useless of powder
What gas passed through:
One first washing chamber, the entrance for the exhaust gas for importing the powder containing hiding with one, and one is configured in the first washing chamber
First water jet；
One powder catch chamber, inside interval form one first lautertuns and one second lautertuns, first lautertuns and this
It is connected between two lautertuns via a channel, and is each configured with a water spray above first lautertuns and second lautertuns
It is also placed with multiple trapping rings respectively in head, first lautertuns and second lautertuns；And
One second washing chamber, the outlet with exhaust gas after a discharge purification, and one second is configured in the second washing chamber
Water jet, the second washing chamber are formed in the side of the first washing chamber so that the powder catch chamber be seated this
Between one washing chamber and the second washing chamber；
Wherein, which is formed with the first air hole of multiple connections the first washing chamber, and second mistake
Filter pocket bottom is formed with the second air hole of multiple connections the second washing chamber；The entrance, the first washing chamber, described more
A first air hole, first lautertuns, the powder catch chamber, second lautertuns, the multiple second air hole, this
Two washing chambers and the outlet sequentially become the gas flow that exhaust gas routing passes through.
2. powder purifying processing device as described in claim 1, it is characterised in that: the entrance and the outlet are respectively formed in the device
The top of shell.
3. powder purifying processing device as claimed in claim 1 or 2, it is characterised in that: one end of first water jet is by being somebody's turn to do
Entrance protrudes out to outside the device shell, and one end of second water jet is protruded out to outside the device shell by the outlet.
4. powder purifying processing device as described in claim 1, it is characterised in that: first lautertuns and second lautertuns point
It is not formed in the bottom of the powder catch chamber.
5. powder purifying processing device as described in claim 1, it is characterised in that: the channel is formed in the powder catch chamber
Upper layer.
6. powder purifying processing device as claimed in claim 1 or 2, it is characterised in that: it is in hollow columnar that the water jet, which has one,
Tube body, which forms the hole for water spraying sprayed water upward, and the periphery of the tube body and being equipped at intervals with multiple is sprayed water downward
Spray holes, the aperture of the hole for water spraying are greater than the aperture of the spray holes.
7. powder purifying processing device as claimed in claim 6, it is characterised in that: the tube body is simultaneously extended outwardly shape by the hole for water spraying
At a spoiler, which has the inclined-plane by upper squint downward, and the hole for water spraying interval is made to correspond to the inclined-plane for water projection.
8. powder purifying processing device as described in claim 1, it is characterised in that: the trapping ring is in loop shaped, the trapping
The tongue that multiple ventholes extend with the axis direction by the respectively venthole side towards the trapping ring is formed on the ring wall of ring
Piece.
9. the powder purifying processing device as described in claim 1 or 8, it is characterised in that: the multiple trapping ring is horizontal side by side respectively
It is placed in first lautertuns and second lautertuns.
10. powder purifying processing device as claimed in claim 9, it is characterised in that: the multiple trapping ring is multilayer construction.
11. powder purifying processing device as described in claim 1, it is characterised in that: the both-end of the fountain head is respectively formed one
Interconnecting piece and the spire extended spirally outward by interconnecting piece, the interconnecting piece one apopore of interior formation, the one of the apopore
End is towards the spire for water projection.
12. powder purifying processing device as described in claim 1, it is characterised in that: the device shell is configured at semiconductor exhaust gas
It manages in equipment, which there is a reaction chamber and a back segment to wash chamber, the first washing chamber warp
It is connected by the entrance with the reaction chamber, which is connected via the outlet with back segment washing chamber.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW107131435 | 2018-09-07 | ||
| TW107131435A TW202010563A (en) | 2018-09-07 | 2018-09-07 | Powder purification treatment device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN209348332U true CN209348332U (en) | 2019-09-06 |
Family
ID=67780581
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821563481.7U Expired - Fee Related CN209348332U (en) | 2018-09-07 | 2018-09-25 | powder purification treatment device |
| CN201811116934.6A Withdrawn CN110882596A (en) | 2018-09-07 | 2018-09-25 | Powder purification treatment device |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811116934.6A Withdrawn CN110882596A (en) | 2018-09-07 | 2018-09-25 | Powder purification treatment device |
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| CN (2) | CN209348332U (en) |
| TW (1) | TW202010563A (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114392616A (en) * | 2022-01-21 | 2022-04-26 | 江苏中瑞咨询有限公司 | Industrial waste gas treatment device and process thereof |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100492475B1 (en) * | 2002-06-19 | 2005-06-03 | 주식회사 엔비시스템 | Low temperature plasma-catalysts system for VOC and odor treatment and method using thereof |
| CN100375645C (en) * | 2005-01-26 | 2008-03-19 | 中芯国际集成电路制造(上海)有限公司 | Wet waste gas pre-treating device |
| CN102218262A (en) * | 2011-04-15 | 2011-10-19 | 肖柏圣 | Resin-cast desulphurization nozzle and manufacturing method thereof |
| CN203556243U (en) * | 2013-04-23 | 2014-04-23 | 刘会平 | Industrial organic waste gas processing device |
| CN104436948B (en) * | 2014-11-04 | 2016-12-07 | 南京钢铁股份有限公司 | Integral type sulfur ammonium washing tail gas knot screen and impurity-removing method |
| TWM517015U (en) * | 2015-11-26 | 2016-02-11 | Orient Service Co Ltd | Dust filter installed in semiconductor waste gas treatment apparatus |
-
2018
- 2018-09-07 TW TW107131435A patent/TW202010563A/en unknown
- 2018-09-25 CN CN201821563481.7U patent/CN209348332U/en not_active Expired - Fee Related
- 2018-09-25 CN CN201811116934.6A patent/CN110882596A/en not_active Withdrawn
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| Publication number | Publication date |
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| CN110882596A (en) | 2020-03-17 |
| TW202010563A (en) | 2020-03-16 |
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