CN209281153U - A kind of exposure machine - Google Patents
A kind of exposure machine Download PDFInfo
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- CN209281153U CN209281153U CN201920313794.5U CN201920313794U CN209281153U CN 209281153 U CN209281153 U CN 209281153U CN 201920313794 U CN201920313794 U CN 201920313794U CN 209281153 U CN209281153 U CN 209281153U
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- laser head
- exposure machine
- contraposition mark
- image
- mark
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Abstract
It the utility model discloses a kind of exposure machine, is provided in microscope carrier towards laser scanning section side and aligns mark correspondingly with each laser head, and the center of each contraposition mark is located at same straight line；And image capture module is used to obtain the image of contraposition mark corresponding to corresponding laser head, the image that contraposition corresponding to the corresponding laser head obtained in this way by analysis image capture module identifies, it is assured that whether the position of corresponding laser head shifts, it is adjusted with the position to laser head, graphic joining to avoid two neighboring laser head from exposing out is abnormal, and then Mura is avoided to occur.
Description
Technical field
The utility model relates to technical field of semiconductors, espespecially a kind of exposure machine.
Background technique
In the photoetching process of the preparation process of device, laser direct imaging (Laser Direct is generally used
Imaging, LDI) exposure machine of technology is exposed photoresist.Exposure machine includes laser scanning section and microscope carrier, wherein laser
Scanner section includes multiple laser heads, as shown in Figure 1, the light that laser light source 110 emits passes through reflecting optics 120 in laser head
It is reflected into digital micro-mirror device (Digital Micromirror Device, DMD) 130, light is passed through after reflecting using DMD
It learns imaging lens and exposes the pattern for forming graphic file in system on substrate 200.
Exposing uneven i.e. Mura at present is the main problem for influencing the development of exposure machine technology, in exposure process, when sharp
There is graphic joining dislocation in the splice region that the position of shaven head occurs to will cause exposure when opposite offset, to cause two neighboring sharp
The graphic joining that shaven head exposes out is abnormal, just will appear Mura macroscopically observing.
Utility model content
In view of this, the utility model embodiment provides a kind of exposure machine, to solve Mura existing in the prior art
Problem.
A kind of exposure machine provided by the embodiment of the utility model, including laser scanning section and microscope carrier；Wherein,
The laser scanning section is provided with multiple laser heads, and each laser head is provided with corresponding image capture module；
The microscope carrier is provided with towards the laser scanning section side and aligns mark correspondingly with each laser head,
And the center of each contraposition mark is located at same straight line；
Described image acquisition module is used to obtain the image of contraposition mark corresponding to the corresponding laser head.
Optionally, in exposure machine provided by the embodiment of the utility model, the contraposition mark is located at the non-of the microscope carrier
Bearing area.
Optionally, in exposure machine provided by the embodiment of the utility model, the thermal expansion system of the material of the contraposition mark
Number is less than 1.
Optionally, in exposure machine provided by the embodiment of the utility model, the material of the contraposition mark includes quartzy material
Matter.
Optionally, in exposure machine provided by the embodiment of the utility model, the pattern of each contraposition mark is consistent.
Optionally, in exposure machine provided by the embodiment of the utility model, the size of each contraposition mark is identical.
Optionally, symmetrical centered on the pattern of the contraposition mark in exposure machine provided by the embodiment of the utility model
Figure.
Optionally, in exposure machine provided by the embodiment of the utility model, the pattern of the contraposition mark is cross.
Optionally, in exposure machine provided by the embodiment of the utility model, the laser scanning section further include with it is each described
The one-to-one X of laser head adjusts motor to adjusting motor and Y-direction；
The X adjusts the figure that motor is used to obtain according to described image acquisition module to adjusting motor and the Y-direction
The center position of contraposition mark in the center position and described image of picture adjusts the position of the laser head.
The utility model has the beneficial effect that:
Above-mentioned exposure machine provided by the embodiment of the utility model is provided with towards laser scanning section side in microscope carrier and swashs with each
Bare headed one-to-one contraposition mark, and the center of each contraposition mark is located at same straight line；And image capture module is for obtaining
The image of contraposition mark corresponding to corresponding laser head is obtained by analysis image capture module corresponding in this way
Laser head corresponding to contraposition mark image, so that it may determine whether the position of corresponding laser head shifts, with right
The position of laser head is adjusted, so that the graphic joining for avoiding two neighboring laser head from exposing out is abnormal, and then is avoided
Mura occurs.
Detailed description of the invention
The structural schematic diagram of Fig. 1 exposure machine in the related technology；
Fig. 2 is the structural schematic diagram of exposure machine provided by the embodiment of the utility model；
Fig. 3 a is the image for the contraposition mark that image capture module obtains in exposure machine provided by the embodiment of the utility model
One of schematic diagram；
Fig. 3 b is the image for the contraposition mark that image capture module obtains in exposure machine provided by the embodiment of the utility model
Schematic diagram two；
Fig. 4 is the structural schematic diagram of the contraposition mark in exposure machine provided by the embodiment of the utility model on microscope carrier；
Fig. 5 is the flow diagram of the method for adjustment of exposure machine provided by the embodiment of the utility model；
Fig. 6 is in method of adjustment provided by the embodiment of the utility model, according to the center position and image for obtaining image
In contraposition mark center position to laser head carry out position adjustment flow diagram.
Specific embodiment
In the prior art, in order to avoid the Mura as caused by laser head position deviation appearance, typically directly to exposure after
Figure tested the position deviation to determine adjacent laser head, deviation is then tested out by tester table, then carry out
Correction, such method can only be tested by artificial single, and not can be carried out real-time testing compensation in exposure process.
In view of this, the utility model embodiment provides a kind of exposure machine.In order to make the purpose of this utility model, technology
Scheme and advantage are clearer, are described in further detail below in conjunction with attached drawing to the utility model, it is clear that described
Embodiment is only the utility model a part of the embodiment, instead of all the embodiments.Based on the embodiments of the present invention,
All other embodiment obtained by those of ordinary skill in the art without making creative efforts, belongs to this reality
With novel protected range.
It should be appreciated that preferred embodiment disclosed below is only used for describing and explaining the present invention, it is not used to limit
Determine the utility model.And in the absence of conflict, the feature in the embodiments of the present invention and embodiment can phase
Mutually combination.It should be noted that the scale of each figure and shape do not reflect actual proportions in attached drawing, purpose is schematically illustrate
Utility model content.And same or similar label indicates same or similar element or has same or like from beginning to end
The element of function.
A kind of exposure machine provided by the embodiment of the utility model, as shown in Fig. 2, including laser scanning section 1 and microscope carrier 2；Its
In,
Laser scanning section 1 is provided with multiple laser heads 11, and each laser head is provided with corresponding image capture module (in figure
It does not regard out)；
Microscope carrier 2 is provided with towards 1 side of laser scanning section and identifies 21 with each contraposition correspondingly of laser head 11, and each right
The center of bit identification 21 is located at same straight line；
Image capture module is used to obtain the image of contraposition mark 21 corresponding to corresponding laser head 11.
Above-mentioned exposure machine provided by the embodiment of the utility model is provided with towards laser scanning section side in microscope carrier and swashs with each
Bare headed one-to-one contraposition mark, and the center of each contraposition mark is located at same straight line；And image capture module is for obtaining
The image of contraposition mark corresponding to corresponding laser head is obtained by analysis image capture module corresponding in this way
Laser head corresponding to contraposition mark image, so that it may determine whether the position of corresponding laser head shifts, with right
The position of laser head is adjusted, so that the graphic joining for avoiding two neighboring laser head from exposing out is abnormal, and then is avoided
Mura occurs.
Also, exposure machine provided by the embodiment of the utility model periodically can be obtained and be aligned in exposure process
The image of mark determines whether the position of laser head shifts in real time analyze by the image to contraposition mark, i.e.,
When position adjustment is carried out to the laser that shifts.
It should be noted that in above-mentioned exposure machine provided by the embodiment of the utility model, the centre bit of each contraposition mark
It is to be located at the reference position (i.e. there is no relative offsets) due to working as each laser head in laser scanning section in same straight line
When each laser head center be on the same line.In addition the distance between the center of adjacent contraposition mark is equal to corresponding two
Distance of a laser head in no relative position deviation between its central point.
In addition, it is necessary to explanation, in exposure machine provided by the embodiment of the utility model, when laser head is located at benchmark position
When setting, in the image for the contraposition mark corresponding with laser head that image capture module is got, as shown in Figure 3a, in image
This is overlapped heart point O1 with the central point of contraposition mark, when opposite offset occurs for the position of laser head, in Image Acquisition mould
In the image for the contraposition mark corresponding with laser head that block is got, as shown in Figure 3b, the central point O1 of image and contraposition are identified
Central point O2 be relative misalignment, therefore by the way that corresponding with laser head contraposition mark is arranged in microscope carrier, adopted further according to image
The image for the contraposition mark corresponding with laser head that collection module is got can be adjusted the position of laser head.
In the specific implementation, the deviation progress in production of the contraposition mark on microscope carrier is the smaller the better, at least meets ± 0.1 μm
Relative deviation.
In the specific implementation, as shown in figure 4, the bearing area A of microscope carrier 2 is generally used for bearing substrate, therefore, optionally,
In exposure machine provided by the embodiment of the utility model, contraposition mark 21 be can be set in times that do not blocked by substrate on microscope carrier 2
The non-bearing regions that meaning position, i.e. contraposition mark 21 are located at microscope carrier.
Optionally, in exposure machine provided by the embodiment of the utility model, the thermal expansion coefficient for aligning the material of mark is small
In 1.It is abnormal to guarantee that because of the minor change of the temperature of exposure machine figure will not occur for the pattern of contraposition mark.
Optionally, in exposure machine provided by the embodiment of the utility model, the material for aligning mark includes quartz material etc.,
It is not limited thereto.
Optionally, in order to simplify the algorithm of image analysis, and in order to simplify the production of contraposition mark, in the utility model
In the exposure machine that embodiment provides, as shown in figure 4, the pattern of each contraposition mark 21 is consistent, but not limited to this.
Optionally, in exposure machine provided by the embodiment of the utility model, as shown in figure 4, the size of each contraposition mark 21
It is identical.
Optionally, in exposure machine provided by the embodiment of the utility model, as shown in figure 4, the pattern of contraposition mark 21 is
Centrosymmetric image, the in this way center convenient for aligning mark in determining image.Such as the pattern of contraposition mark 21 be it is round,
Square etc..
Optionally, in exposure machine provided by the embodiment of the utility model, as shown in figure 4, the pattern of contraposition mark 21 is
It is cross so that it is convenient to determine contraposition mark center, but not limited to this.
In the specific implementation, in exposure machine provided by the embodiment of the utility model, laser scanning section further includes swashing with each
Bare headed one-to-one X adjusts motor to adjusting motor and Y-direction；
X to adjust motor and Y-direction adjust the image that motor is used to be obtained according to image capture module center position and
The center position of contraposition mark in image adjusts the position of laser head.
Conceived based on same utility model, the utility model embodiment additionally provides a kind of adjustment of any of the above-described exposure machine
Method, as shown in Figure 5, comprising:
S101, each image acquisition units of control obtain and the image of contraposition mark corresponding to corresponding laser head；
S102, the center position identified according to the contraposition in the center position and image for obtaining image, to laser head
Carry out position adjustment.
Optionally, in method of adjustment provided by the embodiment of the utility model, step S102 is according to the center for obtaining image
The center position of contraposition mark in point position and image, carries out position adjustment to laser head, as shown in Figure 6, comprising:
S201, determine whether the center position of the contraposition mark in the center position and image of the image obtained weighs
It closes；
If it is not, thening follow the steps S202；
S202, when not being overlapped, calculate the center position of the contraposition mark in the center position and image of image
Whether distance exceeds preset range；
If the center position of S203, image is at a distance from the center position of the contraposition mark in image beyond default model
Enclose, then calculate the center position of the center position of image and the contraposition mark in image along X at a distance from and along Y-direction away from
From；
S204, according to calculating along X to distance and along the distance of Y-direction position adjustment is carried out to laser head.
In the specific implementation, preset range can be set according to the minimum laser head position deviation that can result in Mura
It is fixed, it is not limited thereto.
Optionally, in method of adjustment provided by the embodiment of the utility model, the center position and image of image are calculated
In contraposition mark center position along X to distance and along the distance of Y-direction, comprising:
By calculate image center position and image in contraposition mark center position along X to pixel quantity
Calculate along X to distance；
Pixel quantity of the center position of contraposition mark in center position and image by calculating image along Y-direction
Calculate the distance along Y-direction.
This is because the size of the pixel in image be it is fixed, by determining that pixel quantity determines that distance can simplify meter
Calculation method.
In the specific implementation, calculate along X to distance and calculating may be performed simultaneously along the distance of Y-direction, can also first count
Calculate along X to distance, then calculate the distance along Y-direction；Alternatively, first calculate the distance along Y-direction, then calculate along X to distance, herein
It is not construed as limiting.
Optionally, in method of adjustment provided by the embodiment of the utility model, laser scanning section further includes and each laser head
One-to-one X adjusts motor to adjusting motor and Y-direction；According to calculating along X to distance and along Y-direction distance to laser head
Carry out position adjustment, comprising:
According to calculating along X to distance determine the X of laser head to the circle number for adjusting motor and needing to rotate, and control X to
Adjust the corresponding circle number of motor rotation；
The circle number that the Y-direction adjusting motor of laser head needs to rotate is determined according to the distance along Y-direction of calculating, and controls Y-direction
Adjust the corresponding circle number of motor rotation.
It should be noted that exposure machine provided by the embodiment of the utility model is used by increasing contraposition mark in microscope carrier
Above-mentioned method of adjustment can carry out the adjustment of laser head position in exposure process.In the specific implementation, one can be spaced
The section time just adjusts once, and specific interval time can determine according to the actual situation, be not limited thereto.
To be conceived based on same utility model, the utility model embodiment additionally provides a kind of computer readable storage medium,
It is stored thereon with computer program, and when program is executed by processor realizes above-mentioned provided by the embodiment of the utility model
A kind of the step of method of adjustment of exposure machine.Specifically, it wherein includes to calculate that the utility model, which can be used in one or more,
It is real in the computer-usable storage medium (including but not limited to magnetic disk storage and optical memory etc.) of machine usable program code
The form for the computer program product applied.
Conceived based on same utility model, the utility model embodiment additionally provides a kind of computer equipment, including storage
On a memory and the computer program that can run on a processor, when processor execution program, is realized for device, processor and storage
The step of method of adjustment of any of the above-described kind of exposure machine provided by the embodiment of the utility model.
Above-mentioned exposure machine provided by the embodiment of the utility model is provided with towards laser scanning section side in microscope carrier and swashs with each
Bare headed one-to-one contraposition mark, and the center of each contraposition mark is located at same straight line；And image capture module is for obtaining
The image of contraposition mark corresponding to corresponding laser head is obtained by analysis image capture module corresponding in this way
Laser head corresponding to contraposition mark image, so that it may determine whether the position of corresponding laser head shifts, with right
The position of laser head is adjusted, so that the graphic joining for avoiding two neighboring laser head from exposing out is abnormal, and then is avoided
Mura occurs.
Obviously, it is practical without departing from this can to carry out various modification and variations to the utility model by those skilled in the art
Novel spirit and scope.If in this way, these modifications and variations of the present invention belong to the utility model claims and
Within the scope of its equivalent technologies, then the utility model is also intended to include these modifications and variations.
Claims (9)
1. a kind of exposure machine, which is characterized in that including laser scanning section and microscope carrier；Wherein,
The laser scanning section is provided with multiple laser heads, and each laser head is provided with corresponding image capture module；
The microscope carrier is provided with towards the laser scanning section side and aligns mark correspondingly with each laser head, and each
The center of the contraposition mark is located at same straight line；
Described image acquisition module is used to obtain the image of contraposition mark corresponding to the corresponding laser head.
2. exposure machine as described in claim 1, which is characterized in that the contraposition mark is located at the non-bearing area of the microscope carrier
Domain.
3. exposure machine as described in claim 1, which is characterized in that the thermal expansion coefficient of the material of the contraposition mark is less than 1.
4. exposure machine as claimed in claim 3, which is characterized in that the material of the contraposition mark includes quartz material.
5. exposure machine as described in claim 1, which is characterized in that the pattern of each contraposition mark is consistent.
6. exposure machine as described in claim 1, which is characterized in that the size of each contraposition mark is identical.
7. exposure machine as described in claim 1, which is characterized in that the pattern of the contraposition mark is center symmetric figure.
8. exposure machine as claimed in claim 7, which is characterized in that the pattern of the contraposition mark is cross.
9. such as the described in any item exposure machines of claim 1-7, which is characterized in that the laser scanning section further include with it is each described
The one-to-one X of laser head adjusts motor to adjusting motor and Y-direction；
The X adjusts described image of the motor for obtaining according to described image acquisition module to adjusting motor and the Y-direction
Center position adjusts the position of the laser head with the center position for aligning mark in described image.
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|---|---|---|---|
| CN201920313794.5U CN209281153U (en) | 2019-03-12 | 2019-03-12 | A kind of exposure machine |
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| CN201920313794.5U CN209281153U (en) | 2019-03-12 | 2019-03-12 | A kind of exposure machine |
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| CN209281153U true CN209281153U (en) | 2019-08-20 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111275667A (en) * | 2020-01-13 | 2020-06-12 | 武汉科技大学 | Machining error detection method and device and machining method |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111275667A (en) * | 2020-01-13 | 2020-06-12 | 武汉科技大学 | Machining error detection method and device and machining method |
| CN111275667B (en) * | 2020-01-13 | 2024-05-24 | 武汉科技大学 | Machining error detection method, device and machining method |
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