CN209276641U - Buffer mixing chamber - Google Patents
Buffer mixing chamber Download PDFInfo
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- CN209276641U CN209276641U CN201822182671.0U CN201822182671U CN209276641U CN 209276641 U CN209276641 U CN 209276641U CN 201822182671 U CN201822182671 U CN 201822182671U CN 209276641 U CN209276641 U CN 209276641U
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- mixing chamber
- buffering
- inlet pipe
- buffering mixing
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Abstract
The utility model discloses a kind of buffering mixing chamber, and buffering mixing chamber ontology is cylinder-like structure, and is made of corrosion-resistant material that the port of the buffering mixing chamber ontology two sides is sealed by seal cover board；The top vertical for buffering mixing chamber ontology is equipped with multichannel gas gas-phase objects inlet pipe, and the left side of the buffering mixing chamber body outer wall is equipped with multichannel aerosol inlet pipe；A block buffering plate is vertically fixed in buffering mixing chamber ontology, buffer board upper end is fixed with buffering mixing chamber ontology.This precipitation equipment introduces aerosol on the basis of traditional CVD, to assist forming a film using aerosol, is thus combined together CVD and spray pyrolysis, it was confirmed that CVD method cannot be mixed into the mistake of this academic viewpoint of liquid aersol presoma.The aerosol inlet pipe that this case uses connects an individual atomization source respectively, is first atomized, is input in buffering mixing chamber again in this way, finally sufficiently buffers and mix with gas gas-phase objects, be thus avoided that aerosol reacts in advance, and then guarantee the ingredient and content of film.
Description
Technical field
The utility model belongs to field of thin film fabrication more particularly to a kind of buffering mixing chamber.
Background technique
Thin-film material tool have been widely used, existing film plating process mainly have chemical vapour deposition technique (abbreviation CVD) and
This two major classes of physical vaporous deposition (abbreviation PVD), and every a kind of film plating process segments out because of the factors such as material characteristics again
The film plating process of many groups.Currently, conventional CVD deposition method presoma is full gas gas-phase objects, it is input to the reaction of reaction unit
Area is heated or is chemically reacted by after the excitation of other physical fields, and is deposited on substrate surface, and CVD method is suitble to prepare
The film of high quality, but it is at high cost, and film deposition rate is slow, and most of CVD process requirement carries out under vacuum conditions.
Generally first will in addition, there are also a kind of methods of spray pyrolysis at present for preparing film, this method on substrate
Precursor species are configured to mixed solution, then are placed in atomization source, and atomization source is atomized into again that liquid aersol is defeated after aerosol
Enter and pyrolytic reaction occurs in reaction zone after reaction chamber, and then in substrate surface plated film.The film quality of spray pyrolysis method preparation
Generally, but film forming speed it is fast, it is high-efficient, carry out under normal pressure, it is at low cost.
The status of the prior art is:
1, the presoma that CVD is used is gas phase, and present more academic viewpoint is to think that CVD method cannot be directly mixed in
Liquid aersol form presoma, practical equipment in use is also rarely seen the case where liquid phase precursor species input.
2, spray pyrolysis generally first configures solution or mixed solution for presoma and is placed in an atomization source again, is atomized source mist
It is melted into after aerosol again to input liquid aersol after reaction chamber and pyrolytic reaction occurs in reaction zone, not can guarantee forerunner thus
The concentration of body each component can not avoid presoma from reacting in advance, so that it is molten with gas not can guarantee precursor solution concentration
The concentration of glue liquid particles is consistent, and then not can guarantee and guarantee that the technological parameter of thin film composition is credible and repeatable.
Utility model content
The technical problem to be solved by the utility model is to provide a kind of buffering mixing chamber, it is intended to conventional CVD method and heat
Solution spray coating method is combined together.
The technical solution of the utility model is as follows: a kind of buffering mixing chamber, it is characterised in that: including buffering mixing chamber ontology
(1) it is somebody's turn to do with aerosol inlet pipe (3) wherein buffering mixing chamber ontology (1) is cylinder-like structure, and is made of corrosion-resistant material
The port for buffering mixing chamber ontology (1) two sides is sealed by seal cover board (6)；The top vertical of buffering mixing chamber ontology (1)
Equipped with multichannel gas gas-phase objects inlet pipe (2), the left side of buffering mixing chamber ontology (1) outer wall is equipped with aerosol inlet pipe (3) described in multichannel,
It is individually atomized source with one when every road aerosol inlet pipe (3) uses to be connected, and gas gas-phase objects inlet pipe (2) and aerosol inlet pipe (3)
It is connected to the inner cavity of buffering mixing chamber ontology (1)；A block buffering plate is vertically fixed in the buffering mixing chamber ontology (1)
(4), buffer board (4) upper end and buffering mixing chamber ontology (1) are fixed, and the buffer board lower end is hanging, and buffer board (4) is by aerosol
Inlet pipe (3) and gas gas-phase objects inlet pipe (2) and the outlet of buffering mixing chamber ontology (1) right part separate.
In said structure, this case introduces aerosol precursor body on the basis of conventional CVD process, and utilizes atomization
Aerosol precursor body auxiliary film forming, this technology there are no technical literature and disclose, and also demonstrate that CVD method cannot be mixed into liquid gas
The mistake of this academic viewpoint of sol precursor.Also, it buffers and is provided with multichannel gas gas-phase objects inlet pipe (2) on mixing chamber ontology (1)
With aerosol inlet pipe (3), every road aerosol inlet pipe (3) is individually atomized source with one and is connected, and thus realizes the elder generation of aerosol
It is mixed after input, commonly first mixes with spray pyrolysis and input afterwards with essential distinction, so that presoma be avoided to occur in advance
Reaction also can guarantee the ingredient and content of film, and then guarantee the quality of forming film of subsequent thin film.Meanwhile multichannel gas gas-phase objects inlet pipe
(2) it is inputted with aerosol inlet pipe (3), the presoma that can be realized different component, thus to prepare multicomponent, multilayer and multicomponent
Gradual film provides engineering feasibility.In addition, when preparing film input kinds of processes gas can also be assisted into gas gas-phase objects inlet pipe (2)
Body, technique auxiliary gas has reaction gas, impurity gas and diluent gas, so as to adjust the atmosphere of film preparation.
As preferred design, liquid collection tank (5), the liquid collection tank are connected to below the buffering mixing chamber ontology (1)
Linkage section with buffering mixing chamber ontology (1) bottom be connected, and for collect buffer mixing chamber ontology (1) in liquid.
It designs using the above structure, presoma will become liquid after encountering buffering mixing chamber ontology (1), and liquid is mixed into forerunner
The quality of forming film of film can be seriously affected in body, therefore this case collects liquid using liquid collection tank (5), before avoiding liquid from polluting
Drive body.
As optimization design, the outlet of the aerosol inlet pipe (3) and buffering mixing chamber ontology (1) right part is located at same
In horizontal plane, buffer board (4) lower end is more than the bottom surface 10-15mm of aerosol inlet pipe (3).
It designs using the above structure, thus convenient for effectively blocking gas gas-phase objects and aerosol, and is allowed to be sufficiently mixed
Together.
For the ease of materials, the buffering mixing chamber ontology (1) and seal cover board (6) are all made of stainless steel, and sealing cover
Plate (6) is equipped with observation window.
The utility model has the advantages that compared with prior art, this case has following substantive difference and significant technological progress:
1, this precipitation equipment introduces aerosol on the basis of traditional CVD, thus assist forming a film using aerosol, this
CVD and spray pyrolysis are just combined together by sample, it was confirmed that CVD method cannot be mixed into this science sight of liquid aersol presoma
The mistake of point.
2, the aerosol inlet pipe that this case uses connects an individual atomization source respectively, is first atomized in this way, is input to buffering again
It in mixing chamber, finally sufficiently buffers and mixes with gas gas-phase objects, be thus avoided that aerosol reacts in advance, and then guarantee thin
The ingredient and content of film, to guarantee the quality of forming film of subsequent thin film.Meanwhile multichannel gas gas-phase objects inlet pipe and aerosol inlet pipe, energy
The presoma input for enough realizing different component, to provide engineering feasibility to prepare multicomponent, multilayer and the gradual film of multicomponent.
In addition, can also input kinds of processes auxiliary gas when preparing film into gas gas-phase objects inlet pipe, technique auxiliary gas has reaction
Gas, impurity gas and diluent gas, so as to adjust the atmosphere of film preparation.
Detailed description of the invention
Fig. 1 is the axonometric drawing of the utility model.
Fig. 2 is the main view of the utility model.
Fig. 3 is the cross-sectional view of Fig. 2.
Specific embodiment
The utility model is described in further detail with reference to the accompanying drawings and examples:
As shown in Figure 1-3, a kind of buffering mixing chamber, including buffering mixing chamber ontology 1 and aerosol inlet pipe 3, wherein buffering
Mixing chamber ontology 1 is cylinder-like structure, and is made of corrosion-resistant material that the port of 1 two sides of buffering mixing chamber ontology is by close
Plate 6 is covered to seal.In the present case, it buffers mixing chamber ontology 1 and seal cover board 6 is all made of stainless steel, and seal cover board 6 is equipped with
Observation window.
The top vertical for buffering mixing chamber ontology 1 is equipped with multichannel gas gas-phase objects inlet pipe 2,1 outer wall of buffering mixing chamber ontology
Left side is equipped with multichannel aerosol inlet pipe 3, is individually atomized source with one when every road aerosol inlet pipe 3 uses and (is not drawn into) phase in figure
Even, and gas gas-phase objects inlet pipe 2 and aerosol inlet pipe 3 are connected to the inner cavity of buffering mixing chamber ontology 1.Atomization source is not the one of this case
Part, atomization source can use existing atomization source, can also be with brand-new design, as long as atomizing the liquid into drop, (i.e. gas is molten
Glue), and aerosol is sent into aerosol inlet pipe 3 under the carrier gas effect of atomization source output.
As shown in Figure 1-3, being vertically fixed a block buffering plate 4 in buffering mixing chamber ontology 1, buffer board 4 uses stainless steel.
4 upper end of buffer board and buffering mixing chamber ontology 1 are fixed, and the buffer board lower end is hanging, and buffer board 4 is gentle by aerosol inlet pipe 3
Phase object inlet pipe 2 and the outlet of buffering 1 right part of mixing chamber ontology separate.In the present case, aerosol inlet pipe 3 and buffering mixing chamber ontology
The outlet of 1 right part is located in the same horizontal plane, and 4 lower end of buffer board is more than the bottom surface 10-15mm of aerosol inlet pipe 3, and can be with
Preferably 13mm.In addition, being connected to liquid collection tank 5, the linkage section and buffering of the liquid collection tank below buffering mixing chamber ontology 1
1 bottom of mixing chamber ontology is connected, and for collecting the liquid in buffering mixing chamber ontology 1.
The above is only the preferred embodiment of the utility model only, is not limitation with the utility model, all at this
Made any modifications, equivalent replacements, and improvements etc., should be included in the utility model within the spirit and principle of utility model
Protection scope within.
Claims (4)
1. a kind of buffering mixing chamber, it is characterised in that: including buffering mixing chamber ontology (1) and aerosol inlet pipe (3), wherein buffering
Mixing chamber ontology (1) is cylinder-like structure, and corrosion-resistant material is used to be made, the port of buffering mixing chamber ontology (1) two sides
It is sealed by seal cover board (6)；The top vertical of buffering mixing chamber ontology (1) is equipped with multichannel gas gas-phase objects inlet pipe (2), the buffering
The left side of mixing chamber ontology (1) outer wall is equipped with aerosol inlet pipe (3) described in multichannel, and every road aerosol inlet pipe (3) uses Shi Yuyi
A individual atomization source is connected, and the inner cavity of gas gas-phase objects inlet pipe (2) and aerosol inlet pipe (3) with buffering mixing chamber ontology (1)
Connection；A block buffering plate (4), buffer board (4) upper end and buffering mixing chamber are vertically fixed in the buffering mixing chamber ontology (1)
Ontology (1) is fixed, and the buffer board lower end is hanging, and buffer board (4) by aerosol inlet pipe (3) and gas gas-phase objects inlet pipe (2) and buffers
The outlet of mixing chamber ontology (1) right part separates.
2. buffering mixing chamber according to claim 1, it is characterised in that: be connected to below the buffering mixing chamber ontology (1)
The linkage section of liquid collection tank (5), the liquid collection tank is connected with buffering mixing chamber ontology (1) bottom, and for collecting buffering
Liquid in mixing chamber ontology (1).
3. buffering mixing chamber according to claim 1, it is characterised in that: the aerosol inlet pipe (3) and buffering mixing chamber
The outlet of ontology (1) right part is located in the same horizontal plane, and buffer board (4) lower end is more than the bottom surface of aerosol inlet pipe (3)
10-15mm。
4. buffering mixing chamber according to claim 1 to 3, it is characterised in that: the buffering mixing chamber ontology (1) and
Seal cover board (6) is all made of stainless steel, and seal cover board (6) is equipped with observation window.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201822182671.0U CN209276641U (en) | 2018-12-25 | 2018-12-25 | Buffer mixing chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201822182671.0U CN209276641U (en) | 2018-12-25 | 2018-12-25 | Buffer mixing chamber |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN209276641U true CN209276641U (en) | 2019-08-20 |
Family
ID=67606966
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201822182671.0U Expired - Fee Related CN209276641U (en) | 2018-12-25 | 2018-12-25 | Buffer mixing chamber |
Country Status (1)
| Country | Link |
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| CN (1) | CN209276641U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111364020A (en) * | 2020-04-10 | 2020-07-03 | 南昌航空大学 | Aerosol transmission auxiliary device and aerosol transmission method |
| CN114892144A (en) * | 2022-04-14 | 2022-08-12 | 重庆理工大学 | Atomization-assisted CVD reaction cavity |
-
2018
- 2018-12-25 CN CN201822182671.0U patent/CN209276641U/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111364020A (en) * | 2020-04-10 | 2020-07-03 | 南昌航空大学 | Aerosol transmission auxiliary device and aerosol transmission method |
| CN111364020B (en) * | 2020-04-10 | 2022-01-28 | 南昌航空大学 | Aerosol transmission auxiliary device and aerosol transmission method |
| CN114892144A (en) * | 2022-04-14 | 2022-08-12 | 重庆理工大学 | Atomization-assisted CVD reaction cavity |
| CN114892144B (en) * | 2022-04-14 | 2023-08-08 | 重庆理工大学 | Atomization-assisted CVD reaction cavity |
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| Date | Code | Title | Description |
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| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20190820 Termination date: 20191225 |
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| CF01 | Termination of patent right due to non-payment of annual fee |