CN209167785U - A kind of optical projection mould group - Google Patents
A kind of optical projection mould group Download PDFInfo
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- CN209167785U CN209167785U CN201821381376.1U CN201821381376U CN209167785U CN 209167785 U CN209167785 U CN 209167785U CN 201821381376 U CN201821381376 U CN 201821381376U CN 209167785 U CN209167785 U CN 209167785U
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Abstract
The utility model is suitable for optics and electronic technology field, provides a kind of optical projection mould group, is sensed in predetermined pattern to measured target object for projecting comprising beam modulation element and light-source structure.The light-source structure includes semiconductor base and is formed on a semiconductor substrate for issuing with the pattern beam illuminator for being uniformly distributed light intensity.The beam modulation element includes the patterned optical lines of substrate and formation on the substrate.The patterned optical lines corresponds to the pattern beam illuminator and is configured.There is the pattern beam of predetermined pattern to be projected on measured target object for formation after the light field for the optical power detection that pattern beam illuminator issues is carried out rearrangement by the patterned optical lines.
Description
Technical field
The utility model belongs to optical technical field more particularly to a kind of optical projection mould group.
Background technique
Existing three-dimensional (Three Dimensional, 3D) sensing mould group is usually required using with irregular distribution
The light source projects of luminescence unit go out the light pattern of irregular distribution to carry out three-dimensional sensing.However, forming the hair of irregular distribution
The technique of light unit is more complex, leads to the increased costs of three-dimensional sensing mould group, is unfavorable for the universalness of Related product.
Summary of the invention
The optical projection mould group with lower cost that the technical problem to be solved by the utility model is to provide a kind of.
The utility model embodiment provides a kind of optical projection mould group, for projecting predetermined pattern to measured target object
It is sensed comprising beam modulation element and light-source structure.The light-source structure includes that semiconductor base and being formed in partly is led
The pattern beam illuminator of optical power detection light beam is issued in body substrate.The beam modulation element includes substrate and is formed in
Patterned optical lines on the substrate.The patterned optical lines corresponds to the pattern beam illuminator and is configured.
The patterned optical lines is formed after the light field for the optical power detection that pattern beam illuminator issues is carried out rearrangement
Pattern beam with predetermined pattern is projected on measured target object.
In some embodiments, the predetermined pattern is selected from the striated of irregular distribution spot pattern, regular array
Pattern and along one of pattern beam of the cross one another regular grid pattern of different directions and combinations thereof.
In some embodiments, the pattern beam illuminator is multiple evenly arranged vertical according to default same intervals
Straight cavity surface-emitting laser luminescence unit.
In some embodiments, the quantitative range of the multiple vertical cavity surface emitting laser luminescence unit is 2 to 12
It is a.
In some embodiments, the pattern beam illuminator is the wide face type vertical cavity surface-emitting laser of a single hole
Device.
In some embodiments, the pattern beam illuminator is formed in the middle position of semiconductor base.
In some embodiments, the light-source structure further includes multiple for issuing with the floodlight for being uniformly distributed light intensity
Light beam illuminator.The flood beam illuminator and pattern beam illuminator are formed on identical semiconductor base, and can be with
It is independently controlled respectively luminous.
In some embodiments, the pattern beam illuminator is formed in the middle part of semiconductor base.The floodlight light
Beam illuminator is symmetrical around the pattern beam illuminator.
In some embodiments, the beam modulation element further includes being formed on substrate to correspond to flood beam illuminator
Diffusion optical grains.The original beam that the flood beam illuminator is issued is diffuseed to form light by the diffusion optical grains
Strong equally distributed flood beam is projected on measured target object.
In some embodiments, the diffusion optical grains and patterned optical lines are formed on the same substrate；
Alternatively, the diffusion optical grains are respectively formed on different substrates from patterned optical lines.
Optical projection mould group provided by the utility model embodiment uses the better simply evenly arranged VCSEL of processing procedure
Luminescence unit and beam modulation element cooperate the production for simplifying light source to project predetermined pattern on measured target object difficult
Degree, also further reduces the cost of device.
The additional aspect and advantage of the utility model embodiment will be set forth in part in the description, partially will be under
Become obvious in the description in face, or is recognized by the practice of the utility model embodiment.
Detailed description of the invention
Fig. 1 is the top view for the light-source structure that the utility model first embodiment provides.
Fig. 2 is the top view for the light-source structure that the utility model second embodiment provides.
Fig. 3 is the top view for the light-source structure that the utility model third embodiment provides.
Fig. 4 is the structural schematic diagram for the optical projection mould group that the 4th embodiment of the utility model provides.
Fig. 5 is the schematic diagram of the detection route on the transparent substrate of the beam modulation element of the optical projection mould group in Fig. 4.
Fig. 6 is the structural schematic diagram for the optical projection mould group that the 5th embodiment of the utility model provides.
Fig. 7 is the structural schematic diagram for the optical projection mould group that the utility model sixth embodiment provides.
Fig. 8 is the structural schematic diagram for the optical projection mould group that the 7th embodiment of the utility model provides.
Fig. 9 is the top view of the light-source structure of the group of optical projection mould described in Fig. 8.
Figure 10 is the structural schematic diagram for the optical projection mould group that the 8th embodiment of the utility model provides.
Figure 11 is the top view of the light-source structure of the group of optical projection mould described in Figure 10.
Figure 12 is a kind of step flow chart of optical projection method provided by the utility model.
Figure 13 is the structural schematic diagram for the sensing device that the 9th embodiment of the utility model provides.
Figure 14 is the functional block diagram of sensing device described in Figure 13.
Figure 15 is the structural schematic diagram for the equipment that the tenth embodiment of the utility model provides.
Specific embodiment
The utility model patent application requires the applying date on July 30th, 2018, application No. is 201821217761.2, realities
The country with the earlier application that New Name is " a kind of light-source structure, optical projection mould group, biological identification device and equipment " is excellent
It first weighs, all the elements of the part application are described herein by reference.
The embodiments of the present invention is described below in detail, the example of the embodiment is shown in the accompanying drawings, wherein
Same or similar label indicates same or similar element or element with the same or similar functions from beginning to end.Lead to below
It crosses the embodiment being described with reference to the drawings to be exemplary, is only used for explaining the utility model, and should not be understood as practical to this
Novel limitation.In the description of the present invention, it should be understood that term " first ", " second " are only used for describing, without
It can be interpreted as indication or suggestion relative importance or implicitly indicate the quantity of indicated technical characteristic or put in order.By
This defines " first ", the technical characteristic of " second " can explicitly or implicitly include one or more technology
Feature.The meaning of " plurality " is two or more in the description of the present invention, unless otherwise clearly specific limit
It is fixed.
In the description of the present invention, it should be noted that unless otherwise specific regulation or limiting, term " peace
Dress ", " connected ", " connection " shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or integration
Connection；It can be mechanical connection, be also possible to be electrically connected or be in communication with each other；It can be directly connected, intermediate matchmaker can also be passed through
Jie is indirectly connected, and can be the connection inside two elements or the interaction relationship between two elements.For this field
For those of ordinary skill, the concrete meaning of above-mentioned term in the present invention can be understood as the case may be.
Following disclosure provides many different embodiments or example is used to realize the different structure of the utility model.
In order to simplify the disclosure of the utility model, hereafter only to the component of specific examples and being set for describing.Certainly, they are only
Example, and purpose does not lie in limitation the utility model.In addition, the utility model can reuse reference in different examples
Number and/or reference letter, this reuse are to simplify and clearly state the utility model, itself does not indicate institute
The particular kind of relationship between various embodiments and/or setting discussed.In addition, the utility model is provided in the following description
Various specific techniques and material are only the example for realizing technical solutions of the utility model, but those of ordinary skill in the art answer
This recognizes that the technical solution of the utility model can also be by other techniques for not describing hereafter and/or other materials come real
It is existing.
Further, described feature, structure can be incorporated in one or more embodiment party in any suitable manner
In formula.In the following description, many details are provided so as to fully understand the embodiments of the present invention.So
And one of ordinary skill in the art would recognize that, even if without one or more in the specific detail, or using other knots
Structure, constituent element etc. can also practice the technical solution of the utility model.In other cases, it is not shown in detail or describes known knot
Structure or operation to avoid fuzzy the utility model emphasis.
It should be understood that embodiments described herein and/or method are exemplary in itself, it is not construed as pair
The limitation of technical solutions of the utility model.Embodiment or method described herein are only the utility model the relevant technologies thought
One of numerous technical solutions covered are a variety of, therefore each step of described method and technology scheme can be according to
The order indicated executes, and can execute, may be performed simultaneously, or be omitted in some cases according to other order, on
The change stated is regarded as the range that the utility model technical solution claimed is covered.
As shown in Figure 1, the utility model first embodiment provides a kind of light-source structure 1, for emitting light beam to one
It is sensed on measured target object.The light beam can be the light beam with specific wavelength according to sensing principle and application scenarios.
In the present embodiment, the light beam is used to sense the three-dimensional information of measured target object, can be infrared or near-infrared wavelength light
Beam, wave-length coverage are 750 nanometers (Nanometer, nm) to 1650nm.
The light-source structure 1 includes the first emission part 10 and the second emission part 12.First emission part 10 issues first
Light beam is used to form the flood beam of optical power detection.The flood beam is projected on measured target object tested for sensing
The floodlight image of object.For example, the flood beam can be used for sensing whether the measured target object is face.Described second
The second light beam that emission part 12 issues is used to form the pattern beam that predetermined pattern can be projected on measured target object.It is described
Predetermined pattern can be used for the three-dimensional information for sensing the measured target object.
First emission part 10 is formed in the same substrate 14 with the second emission part 12 or is connected with each other to be integrated into
Overall structure.The first light emitting region 122 in the middle part of semiconductor base 14 is defined on the semiconductor base 14 and is enclosed
Around the second light emitting region 102 of first light emitting region 122 setting.
The integration mode of first emission part 10 and the second emission part 12 includes being directly connected to, be indirectly connected with or distinguishing shape
At on the same substrate 14 etc..In the present embodiment, first light beam and the second light beam are the identical near-infrared of wavelength
Light.
In the present embodiment, first emission part 10 includes that multiple flood beams for emitting the first light beam shine
Body 100.Second emission part 12 includes multiple for emitting the pattern beam illuminator 120 of the second light beam.The floodlight light
Beam illuminator 100 and pattern beam illuminator 120 are formed on the same semiconductor base 14.The flood beam illuminator
100 are uniformly distributed in the second light emitting region 102 of semiconductor base 14 according to preset same intervals.The pattern beam hair
Body of light 120 is randomly distributed in the first light emitting region 122 of the semiconductor base 14.
The flood beam illuminator 100 and pattern beam illuminator 120 can be semiconductor laser.Preferably, exist
In present embodiment, the flood beam illuminator 100 and pattern beam illuminator 120 are vertical cavity surface emitting laser
(Vertical Cavity Surface Emitting Laser, VCSEL), on the semiconductor base 14 by photoetching and
The techniques such as etching are made.The figure that the flood beam and pattern beam illuminator 120 that the flood beam illuminator 100 issues issue
Case light beam is that wavelength is identical infrared or near infrared light, wave-length coverage are 750nm to 1650nm.
In the present embodiment, first light emitting region 122 positioned at 14 middle part of semiconductor base is rectangle.Described
Two light emitting regions 102 are correspondingly arranged at four edges of the first light emitting region 122.The flood beam illuminator 100 is
Four corners of two light emitting regions 102 are uniform according to same intervals along two sides of each corner in the second light emitting region 102
Arrangement multilayer, it is each that first light emitting region 122 as dotted line described in Fig. 1 surrounded envelopes the first light emitting region 102
Four right angle frame bar-shaped zones at a right angle.The pattern beam illuminator 102 is irregularly arranged in the first light emitting region 122
Cloth, for issuing second light beam with irregular distribution pattern.
It is provided on the semiconductor base 14 and connect with external circuit for controlling in first light emitting region 122
The first luminous pad 104 of flood beam illuminator 100.It is provided with to connect with external circuit on the semiconductor base 14 and be used for
Control the second pad 124 that the pattern beam illuminator 120 in second light emitting region 102 shines.So present embodiment
In be located at the first light emitting region 122 in pattern beam illuminator 120 and the flood beam in the second light emitting region 102
Illuminator 100 can independently be worked by different control signals.
As shown in Fig. 2, the utility model second embodiment provides a kind of light-source structure 5, with first embodiment
In light-source structure 1 it is essentially identical, the main distinction be second light emitting region 502 be the semiconductor base 54 be formed with
Other regions on the surface of illuminator other than the first light emitting region 522.The flood beam illuminator 500 setting is the
In two light emitting regions 502.The pattern beam illuminator 520 is arranged in first light emitting region 522.The flood beam
Illuminator 500 and pattern beam illuminator 520 are equably arranged all in accordance with preset same intervals.
In the present embodiment, the second light beam that the pattern beam illuminator 520 of first light emitting region 522 is issued
Irregular distribution light can be projected on measured target object by being equipped with the optical element above light-source structure 5 and being formed
Spot pattern, the striped design of regular array or the pattern beam along the cross one another regular grid pattern of different directions.
It is understood that the pattern in the first light emitting region 522 is arranged in other embodiments out not shown
Light beam illuminator 520 can also be irregularly distributed.
It is understood that it is not shown go out other embodiments in, the flood beam illuminator 500 can also be by
It is evenly distributed in the first light emitting region 522 according to preset same intervals.The pattern beam illuminator 520 is randomly distributed
In the second light emitting region 502.
Also referring to Fig. 1 and Fig. 3, the utility model third embodiment provides a kind of light-source structure 8, with first
Light-source structure 1 in embodiment is essentially identical, and the main distinction is that second emission part 82 includes that setting shines first
Single pattern beam illuminator 820 in region 822, the pattern beam illuminator 820 is the wide face type VCSEL of single hole, with generation
For the pattern beam illuminator 120 being randomly distributed in the first light emitting region 122 described in first embodiment.First hair
Penetrating portion 80 includes the single flood beam illuminator 800 that setting is respectively corresponded in each first light emitting region 802, described each general
Light light beam illuminator 800 is the wide face type VCSEL of single hole, to replace in the second light emitting region 102 described in first embodiment
It is multiple according to the evenly arranged flood beam illuminator 100 of preset same intervals.The wide face type VCSEL of single hole only one
Lightening hole, but shine aperture it is larger, several times in first embodiment as flood beam illuminator 100 one of them
VCSEL luminescence unit.The illumination effect of the wide face type VCSEL of single hole is similar to the uniform area source of luminous intensity.The list
The light-emitting surface shape of the wide face type VCSEL in hole can be the shape of rule, such as rectangle；It may be irregular shape, such as
The right angle moulding shape of second light emitting region 802 in the present embodiment.
As shown in figure 4, the 4th embodiment of the utility model provides a kind of optical projection mould group 11, it is specific for projecting
It is sensed on light beam to measured target object.The optical projection mould group 11 include beam modulation element 110 and above-mentioned first to
Light-source structure 1 in third embodiment.
The beam modulation element 110 includes diffusion part 111 and patterning portion 112.The 111 corresponding light source knot of diffusion part
First emission part 10 of structure 1 is arranged, the first light beam for issuing the flood beam illuminator 100 of the first emission part 10
Diffuse to form the flood beam of optical power detection.Second emission part 12 of the 112 corresponding light source structure 1 of patterning portion is set
It sets, the second light beam formation for issuing the pattern beam illuminator 120 of the second emission part 12 can be in measured target
The pattern beam of predetermined pattern is projected on object with the three-dimensional information for sensing measured target object.
It is arranged in the first light emitting region 122 corresponding to the pattern beam illuminator 120 to issue and be used to form pattern
Second light beam of light beam, the flood beam illuminator 100 are arranged in the second light emitting region 102 to issue and be used to form floodlight
The middle position of beam modulation element 110 is arranged in exist with setting in the case where first light beam of pattern, the patterning portion 112
Pattern beam illuminator 120 in first light emitting region 122 is corresponding.The diffusion part 111, which surrounds, is arranged in patterning portion 112
Periphery is with corresponding with the flood beam illuminator 100 being arranged in the second light emitting region 102.
The function of the patterning portion 112 and diffusion part 111 in the corresponding position of transparent substrate 113 by forming specifically
Optical grains are realized.In the present embodiment, the patterning portion 112 of the beam modulation element 110 and diffusion part 111 are arranged
On the same transparent substrate 113.That is, the middle position of the transparent substrate 113 is formed with the figure for rearrangement light field
Case optical grains 1120 are used as the patterning portion 112, and the transparent substrate 113 is in the patterned optical lines 1120
Periphery position corresponding with 1 first light emitting region 102 of light-source structure is formed with the diffusion optical grains with light diffusion
1100 are used as the diffusion part 111.The patterned optical lines 1120 including but not limited to diffraction optics lines, optics is micro-
Lens array, grating and combinations thereof.
As shown in figure 5, detection route 134 can also be formed on the surface of the transparent substrate 113.The detection route can
It is made of an electrically conducting material, which is provided with multiple test points 135.By being detected to any two of them test point 135
Whether 113 surface of transparent substrate that route passes through between the road two o'clock, which has to burst apart etc., influences the flaw of optical element integrality.
As shown in fig. 6, the 5th embodiment of the utility model provides a kind of optical projection mould group 15, implement with the 9th
Optical projection mould group 11 in mode is essentially identical, and the main distinction is that the optical projection mould group 15 further includes optical path guiding member
Part 16.
The optical path director element 16 is arranged between light-source structure 1 and beam modulation element 110, and with the light source knot
At the corresponding position of light-emitting surface of first emission part 10 of structure 1.The optical path director element 16 is used for the first emission part 10
The first light beam guidance of divergent shape outgoing is irradiated to the diffusion part 111 of the beam modulation element 110.The optical path director element
16 setting is the technical solution in order to avoid being closer in the first emission part 10 of light-source structure 1 and the second emission part 12
In, issued from the first emission part 10 be used to form floodlight irradiation the first light beam of a part light can by beam modulation member
The patterning portion 112 of part 110 projects away the pattern beam for forming luminous intensity irregular distribution, to influence flood beam
Uniformity.The optical path director element 16 includes but is not limited to prism, lenticule and grating.The optical path director element 16 is set
Region is set to be consistent with the region where the first emission part 10 of light-source structure 1.
As shown in fig. 7, the utility model sixth embodiment provides a kind of optical projection mould group 17, implement with the 4th
Optical projection mould group 11 in mode is essentially identical, and the main distinction is the diffusion part 171 and figure of the beam modulation element 170
Case portion 172 is respectively formed on different transparent substrates.
The transparent substrate for being formed with patterning portion 172 is defined as patterned substrate 1721.The patterned substrate
It is formed at position corresponding with the second emission part 12 of light-source structure 1 on 1721 and the light field of light beam is subjected to rearrangement
Patterned optical lines 1720.In the present embodiment, 1 middle part of light-source structure is set corresponding to second emission part 12
Situation, the patterned optical lines 1720 are formed in the middle position of patterned substrate 1721.
The transparent substrate for being formed with diffusion part 171 is defined as diffusion substrate 1710.On the diffusion substrate 1710 with
The diffusion optical grains 1711 for playing light diffusion are formed at the corresponding position of the first emission part 10 of light-source structure 1.
The diffusion substrate 1710 region corresponding with patterned optical lines 1720 on patterned substrate 1721 keeps light transmission, the figure
The region corresponding with optical grains 1711 are spread on diffusion substrate 1710 of case substrate 1721 keeps light transmission, is defined as transmission region
1712.In the present embodiment, the light-source structure 1 of the second emission part 12 setting, institute are surrounded corresponding to first emission part 10
Diffusion substrate 1710 is stated to be formed at the periphery position corresponding with 1 first emission part 10 of light-source structure of the transmission region 1712
There are the diffusion optical grains 1711.
The patterned substrate 1721 and diffusion substrate 1710 can be stacked together, and can also be thrown along the optics
The projecting light path of shadow mould group 17 is respectively and independently arranged at the different location in optical path.It is understood that needing only assure that described
It corresponds to optical grains position on diffusion substrate 1710 and patterned substrate 1721 to be mutually aligned, for diffusion substrate 1710 and pattern
Change substrate 1721 not specially require along putting in order for the projecting light path.
As shown in Figure 8 and Figure 9, the 7th embodiment of the utility model provides a kind of optical projection mould group 18, for sending out
The pattern beam of predetermined pattern can be projected on measured target object out.The predetermined pattern can be used for sensing described tested
The three-dimensional information of object.It can be the light beam with specific wavelength according to sensing principle and application scenarios, the light beam.At this
In embodiment, the light beam is used to sense the three-dimensional information of measured target object, can be infrared or near-infrared wavelength light beam, wave
Long range is 750 nanometers (Nanometer, nm) to 1650nm.
The optical projection mould group 18 includes beam modulation element 180 and light-source structure 181.The light-source structure 181 wraps
The pattern beam illuminator 1810 for including semiconductor base 1812 and being formed on the semiconductor base 1812.The pattern shines
The original beam of the sending optical power detection of body 1810.The original beam of the optical power detection is by setting in light-source structure
Beam modulation element 180 above 181 light-emitting surfaces can project the pattern of predetermined pattern to formation after the rearrangement of light field
Light beam.The predetermined pattern can be for irregular distribution spot pattern, the striped design of regular array and along different directions
One of cross one another regular grid pattern and combinations thereof.
The pattern beam illuminator 1810 can be semiconductor laser.The pattern beam illuminator 1810 is formed in
The middle position of semiconductor base 1812.Preferably, in the present embodiment, the pattern beam illuminator 1810 is multiple presses
According to the evenly arranged VCSEL luminescence unit of default same intervals, it is formed in by the techniques such as photoetching and etching described semiconductor-based
On bottom 1812.The quantitative range of the multiple VCSEL luminescence unit is 2 to 12, is evenly spaced according to default same intervals
On the semiconductor base 1812.
The beam modulation element 180 includes substrate 1800 and the patterned optical lines being formed on the substrate 1800
1802.The corresponding pattern beam illuminator 1810 of the patterned optical lines 1802 is configured.The patterned optical
The light field of the original beam for the optical power detection that lines 1802 issues pattern beam illuminator 1810 carries out rearrangement, with
Form the pattern beam that predetermined pattern can be projected on measured target object.The patterned optical lines 1802 is in substrate
Range of exposures of the coverage area at least more than the pattern beam illuminator 1810 on beam modulation element 180 on 1800,
The original beam is completely converted into pattern beam.The patterned optical lines 1802 includes but is not limited to diffraction optics
Lines, optical micro lens array, grating and combinations thereof.
It is understood that the optical projection mould group 18 can also include being arranged in light-source structure 181 and beam modulation
Optical element 183 between element 180 for collimating or expanding, so that the original beam that light-source structure 181 is issued is entering
It is basic before being mapped to beam modulation element 180 to keep collimating and meet preset light hole diameter requirement.
As shown in Figure 10 and Figure 11, the 8th embodiment of the utility model provides a kind of optical projection mould group 19, with
Optical projection mould group 18 in 7th embodiment is essentially identical, and the main distinction is that the light-source structure 191 includes being formed in
A pattern beam illuminator 1910 on semiconductor base 1912.The single pattern beam illuminator is the wide face type of single hole
VCSEL.Described wide only one lightening hole of face type VCSEL of single hole, but the aperture that shines is larger, several times in the 7th embodiment
One of VCSEL luminescence unit as pattern beam illuminator.The illumination effect of the wide face type VCSEL of single hole is equal to
The uniform area source of luminous intensity, issues the original beam of optical power detection.
Referring to Figure 4 together, to Figure 12, the utility model also provides a kind of using above-mentioned any by Fig. 6, Fig. 7, Fig. 8, Figure 10
Optical projection mould group 11 provided by one embodiment projects the optical projection method of predetermined pattern on measured target object.Institute
Optical projection method is stated to include the following steps:
Step S01 issues the first light beam of optical power detection.First light beam by the first emission part 10 floodlight light
The diffusion part 111 of beam illuminator 100 towards beam modulation element 110 issues.
The flood beam illuminator 100 can divide to be multiple according to the evenly arranged VCSEL luminescence unit of same intervals
Do not issue evenly spaced multiple beamlets to form the first light beam of optical power detection.
Each first emission part 10 can also be the wide face type VCSEL of a single hole.Each described wide face type of single hole
VCSEL is the single lightening hole with wider bore diameter, the first light beam of the capable of emitting optical power detection similar to area source.
Entire first emission part 10 can also be single area source, issue the of complete uniform intensity alone
One light beam.
First light beam is uniformly diffused into flood beam around and projected on measured target object by step S02.
First light beam is diffused via the diffusion part 111 of beam modulation element 110.Because being used to form flood beam
First light beam need to be integrated in the same light-source structure 1 with the second light beam of projection specific pattern, it is described to issue the
The position of the flood beam illuminator 100 of one light beam can not cover the entire light-emitting surface of light-source structure 1, need by the diffusion
First light beam is uniformly spread around to form the flood beam for covering entire crevice projection angle range in portion 111.The diffusion part
111 are realized by the way that diffusion optical grains 1100 corresponding with first emission part 10 are arranged on transparent substrate 113 to the
The diffusion function of one light beam.
Step S03 issues the second light beam of optical power detection or irregular distribution.Second light beam is by being arranged in
The pattern beam illuminator 120 of two emission parts 12 is issued towards the patterning portion 112 of beam modulation element 110.
First light beam and the second light beam are required to not by the interference of visible light and should reduce to the greatest extent to measured target
Object impacts.In the present embodiment, first light beam and the second light beam are infrared or near infrared light, and wave-length coverage is
750nm to 1650nm.
The pattern beam illuminator 120 can be the VCSEL luminescence unit of multiple irregular distributions.It is the multiple not advise
The VCSEL luminescence unit being then distributed, which issues, has the second light beam of irregular distribution spot pattern to the beam modulation element
110 patterning portion 112.
The pattern beam illuminator 120 can also to be multiple according to the evenly arranged VCSEL luminescence unit of same intervals,
Issue evenly spaced multiple beamlets respectively to form the second light beam of optical power detection.
The pattern beam illuminator 120 can also be the wide face type VCSEL of a single hole.Each described wide face type of single hole
VCSEL is the single lightening hole with wider bore diameter, capable of emitting the second light beam that optical power detection is issued similar to area source.
The light field of second light beam is carried out rearrangement to project default figure on measured target object by step S04
Case.
The patterning portion 112 is formed on the transparent substrate 113 of beam modulation element 110 to shine with the pattern beam
The corresponding position of body 120 is realized by forming patterned optical lines 1120 on the transparent substrate 113 to the second light beam
Light field carry out rearrangement function.The patterned optical lines 1120 includes but is not limited to diffraction optics lines, optics
Microlens array, grating etc..
For the pattern beam illuminator 120 be multiple irregular distributions VCSEL luminescence unit the case where, the figure
Case portion 112 will have the second beam replication of irregular distribution spot pattern multiple and open up within the scope of preset expanded- angle
It opens and forms the more patterns of irregular distribution number of spots being incident upon on measured target object.
It is multiple according to the evenly arranged VCSEL luminescence unit of same intervals for the pattern beam illuminator 120
Situation, the patterning portion 112 forms the light field rearrangement of the optical power detection of second light beam can be tested
The pattern beam of projection irregular distribution spot pattern on object.
It is multiple according to the evenly arranged VCSEL luminescence unit of same intervals for the pattern beam illuminator 120
Situation, what the patterning portion 112 can also issue respectively the VCSEL luminescence unit along the arrangement of the same preset direction
Light beam is fused to the pattern beam with regular array candy strip.
It is multiple according to the evenly arranged VCSEL luminescence unit of same intervals for the pattern beam illuminator 120
Situation, the patterning portion 112 can also be by the VCSEL luminescence unit institutes along the arrangement of cross one another two preset directions
The light of sending is fused the pattern beam to be formed and can project regular grid pattern.
The case where being a single hole wide face type VCSEL for the pattern beam illuminator 120, the patterning portion 112
The light field rearrangement formation of the optical power detection of second light beam can be projected irregular point on measured target object
The pattern beam of cloth pattern.
As shown in FIG. 13 and 14, the 9th embodiment of the utility model provides a kind of sensing device 21, is used to feel
Survey the spatial information of measured target object.The spatial information includes but is not limited to the depth information on measured target object surface, is tested
Object location information in space, the dimension information etc. of measured target object other three-dimensional letters relevant to measured target object
Breath.The spatial information of the measured target object sensed can be used for identifying measured target object or construct the three-dimensional of measured target object
Model.
The sensing device 21 includes the optical projection mould group 11 as provided by above-mentioned 4th to the 8th embodiment and sense
Survey mould group 210.The optical projection mould group 11 is for projecting particular beam to measured target object.The sensing mould group 210 is wrapped
Include camera lens 211, imaging sensor 212 and image analysis processor 213.Described image sensor 213 senses institute by camera lens 211
State the image that particular beam is formed on measured target object.What the analysis of described image analysis processor 213 was sensed is incident upon
Image on measured target object obtains the three-dimensional information of measured target object.
In the present embodiment, the sensing device 21 is to sense the three-dimensional information on measured target object surface and identify accordingly
The 3D face authentification device of measured target object identity.
The particular beam includes the flood beam of even intensity and can project default figure on measured target object
The pattern beam of case.The sensing mould group 210 according to the image that the flood beam sensed is formed on measured target object come
Identify whether close measured target object is face.The sensing mould group 210 is according to the pattern beam sensed tested
The change in shape of the predetermined pattern projected on object is to analyze the three-dimensional information on measured target object surface and accordingly to quilt
It surveys object and carries out face recognition.
As shown in figure 15, the tenth embodiment of the utility model provides a kind of equipment 22, for example, mobile phone, laptop,
Tablet computer, touch-control interaction screen, door, the vehicles, robot, automatic numerical control lathe etc..The equipment 19 includes at least one
Sensing device 18 provided by above-mentioned 12nd embodiment.The equipment 19 is used for the sensing result according to the sensing device 18
Corresponding function is executed to correspond to.The corresponding function unlocks after including but not limited to identifying user's identity, payment, starts in advance
If application program, avoidance, using depth learning technology judge the mood and health of user after identification user's countenance
Any one or more in situation.
In the present embodiment, the sensing device 21 is to sense the three-dimensional information on measured target object surface and identify accordingly
The 3D face authentification device of measured target object identity.The equipment 22 is the mobile phone equipped with the 3D face authentification device, notes
Electric terminals, door, the vehicles, safety check, the entry and exit such as this computer, tablet computer, touch-control interaction screen etc. are related to passing in and out permission
Equipment.
It needs to be respectively set floodlight transmitter with the existing light-source structure for sensing three-dimensional information and light pattern emits
Device is compared, and light-source structure 1 provided by the utility model integrates the transmitter for projecting flood beam and pattern beam,
The not only smaller design for being conducive to equipment of volume, but also also further reduce the cost of device.
In the description of this specification, reference term " embodiment ", " certain embodiments ", " schematically implementation
What the description of mode ", " example ", " specific example " or " some examples " etc. meant to describe in conjunction with the embodiment or example
Particular features, structures, materials, or characteristics are contained at least one embodiment or example of the utility model.In this explanation
In book, schematic expression of the above terms are not necessarily referring to identical embodiment or example.Moreover, the specific spy of description
Sign, structure, material or feature can be combined in any suitable manner in any one or more embodiments or example.
The foregoing is merely the better embodiments of the utility model, are not intended to limit the utility model, it is all
It is practical new to should be included in this for made any modifications, equivalent replacements, and improvements etc. within the spirit and principles of the utility model
Within the protection scope of type.
Claims (10)
1. a kind of optical projection mould group is sensed in predetermined pattern to measured target object comprising beam modulation for projecting
Element and light-source structure, the light-source structure include that semiconductor base and formation issue optical power detection on a semiconductor substrate
The pattern beam illuminator of light beam, the beam modulation element include the patterned optical line of substrate and formation on the substrate
Road, the patterned optical lines correspond to the pattern beam illuminator and are configured, and the patterned optical lines is by pattern
The light field for the optical power detection that light beam illuminator issues forms the pattern beam throwing with predetermined pattern after carrying out rearrangement
It is incident upon on measured target object.
2. optical projection mould group as described in claim 1, which is characterized in that the predetermined pattern is selected from irregular distribution hot spot
Pattern, the striped design of regular array and along the pattern beam of the cross one another regular grid pattern of different directions
One kind and combinations thereof.
3. optical projection mould group as described in claim 1, which is characterized in that the pattern beam illuminator is multiple according to pre-
If the evenly arranged vertical cavity surface emitting laser luminescence unit of same intervals.
4. optical projection mould group as claimed in claim 3, which is characterized in that the multiple vertical cavity surface emitting laser shines
The quantitative range of unit is 2 to 12.
5. optical projection mould group as described in claim 1, which is characterized in that the pattern beam illuminator is that a single hole is wide
Face type vertical cavity surface emitting laser.
6. optical projection mould group as described in claim 1, which is characterized in that the pattern beam illuminator is formed in semiconductor
The middle position of substrate.
7. optical projection mould group as described in claim 1, which is characterized in that the light-source structure further includes multiple sending light intensity
It is uniformly distributed the flood beam illuminator of light beam, the flood beam illuminator and pattern beam illuminator are formed in identical half
In conductor substrate, and it can be independently controlled respectively luminous.
8. optical projection mould group as claimed in claim 7, which is characterized in that the pattern beam illuminator is formed in semiconductor
The middle part of substrate, the flood beam illuminator are symmetrical around the pattern beam illuminator.
9. optical projection mould group as claimed in claim 7, which is characterized in that the beam modulation element further includes being formed in base
The diffusion optical grains of flood beam illuminator are corresponded on plate, the diffusion optical grains are sent out the flood beam illuminator
The flood beam that original beam out diffuses to form optical power detection is projected on measured target object.
10. optical projection mould group as claimed in claim 9, which is characterized in that the diffusion optical grains and patterned optical
Lines is formed on the same substrate；Or
The diffusion optical grains are respectively formed on different substrates from patterned optical lines.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821217761 | 2018-07-30 | ||
| CN2018212177612 | 2018-07-30 |
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| CN209167785U true CN209167785U (en) | 2019-07-26 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821383492.7U Active CN209044634U (en) | 2018-07-30 | 2018-08-25 | A kind of sensing device |
| CN201821381345.6U Active CN209167159U (en) | 2018-07-30 | 2018-08-25 | A kind of sensing device and equipment |
| CN201821381376.1U Active CN209167785U (en) | 2018-07-30 | 2018-08-25 | A kind of optical projection mould group |
| CN201821393222.4U Active CN208872951U (en) | 2018-07-30 | 2018-08-25 | A kind of beam modulation element |
| CN201821393223.9U Active CN208871346U (en) | 2018-07-30 | 2018-08-25 | A kind of light-source structure and the equipment using the light-source structure |
| CN201821389805.XU Active CN209167786U (en) | 2018-07-30 | 2018-08-25 | A kind of optical projection mould group |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821383492.7U Active CN209044634U (en) | 2018-07-30 | 2018-08-25 | A kind of sensing device |
| CN201821381345.6U Active CN209167159U (en) | 2018-07-30 | 2018-08-25 | A kind of sensing device and equipment |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201821393222.4U Active CN208872951U (en) | 2018-07-30 | 2018-08-25 | A kind of beam modulation element |
| CN201821393223.9U Active CN208871346U (en) | 2018-07-30 | 2018-08-25 | A kind of light-source structure and the equipment using the light-source structure |
| CN201821389805.XU Active CN209167786U (en) | 2018-07-30 | 2018-08-25 | A kind of optical projection mould group |
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| CN (6) | CN209044634U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109031872A (en) * | 2018-07-30 | 2018-12-18 | 深圳阜时科技有限公司 | A kind of optical projection mould group and optical projection method |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111721232B (en) | 2020-06-19 | 2022-05-31 | 广州立景创新科技有限公司 | Three-dimensional sensing device, light emitting module and control method thereof |
-
2018
- 2018-08-25 CN CN201821383492.7U patent/CN209044634U/en active Active
- 2018-08-25 CN CN201821381345.6U patent/CN209167159U/en active Active
- 2018-08-25 CN CN201821381376.1U patent/CN209167785U/en active Active
- 2018-08-25 CN CN201821393222.4U patent/CN208872951U/en active Active
- 2018-08-25 CN CN201821393223.9U patent/CN208871346U/en active Active
- 2018-08-25 CN CN201821389805.XU patent/CN209167786U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109031872A (en) * | 2018-07-30 | 2018-12-18 | 深圳阜时科技有限公司 | A kind of optical projection mould group and optical projection method |
| CN109031872B (en) * | 2018-07-30 | 2024-02-13 | 深圳阜时科技有限公司 | Optical projection module and optical projection method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN209167159U (en) | 2019-07-26 |
| CN209044634U (en) | 2019-06-28 |
| CN209167786U (en) | 2019-07-26 |
| CN208871346U (en) | 2019-05-17 |
| CN208872951U (en) | 2019-05-17 |
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