CN209016041U - A kind of jet anticollision device, collision-prevention device for preventing processing from causing secondary pollution - Google Patents
A kind of jet anticollision device, collision-prevention device for preventing processing from causing secondary pollution Download PDFInfo
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- CN209016041U CN209016041U CN201821900816.XU CN201821900816U CN209016041U CN 209016041 U CN209016041 U CN 209016041U CN 201821900816 U CN201821900816 U CN 201821900816U CN 209016041 U CN209016041 U CN 209016041U
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- tracheae
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- wafer
- lifting
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Abstract
The utility model provides a kind of jet anticollision device, collision-prevention device for preventing processing from causing secondary pollution, including anti-collision unit and rotary lifting mechanism, and rotary lifting mechanism includes placing rack, rotation tracheae, fixed tracheae, lifting unit, power unit and vacuum pump.The lifting unit of rotary lifting mechanism rises, so that sucker passes through the fixed wafer of vacuum pump vacuumizing and adsorbing, when returning drop, pass through the detection of anti-collision unit, so that placing the position that rack stops will not collide with other equipment or rack, so that wafer will not mutually be touched with the equipment placed except rack, achievees the purpose that avoid wafer and place the mutual damaged in collision of rack.And in cleaning, the ring jet mouth by placing rack side blows to the wafer for being placed in mounting table top of support, and the cleaning solution of seepage flow to backside of wafer is blown down, and seepage flow to the cleaning solution of backside of wafer is avoided to pollute wafer.Therefore the cleaning problem damaged in lifting to wafer contamination and wafer is solved.
Description
Technical field
The utility model relates to remove the device field more particularly to one kind of film on crystal column surface to prevent processing from causing two
The jet anticollision device, collision-prevention device of secondary pollution.
Background technique
It is existing that crystal column surface is cleaned, the SiO2 film on crystal column surface is removed, is carried out by chemical liquid HF solution
Cleaning, however it is be easy to cause other one side of the wash liquid stream to wafer in cleaning, and infiltrate through in cleaning machine, cause wafer
It is contaminated, while the board service life of cleaning is reduced.And when carrying out absorption lifting to wafer, due to diameter wafer
The table top of board can be greater than, therefore wafer is be easy to cause to collide with the problem of damaging.
Utility model content
For this reason, it may be necessary to provide a kind of jet anticollision device, collision-prevention device for preventing processing from causing secondary pollution, it is clear to solve existing wafer
The problem that cleaning device be easy to cause wafer contaminated and/or damaged.
To achieve the above object, a kind of jet anticollision device, collision-prevention device for preventing processing from causing secondary pollution, packet are inventor provided
Include anti-collision unit and rotary lifting mechanism；The rotary lifting mechanism includes placing rack, rotation tracheae, fixed tracheae, lifting
Unit, power unit and vacuum pump, one end of the rotation tracheae, which is rotatably set on, to be fixed intratracheally, rotates tracheae
The middle part of the top surface of mounting table is arranged in through mounting table frame for the other end, and is provided with suction on the port of the other end of rotation tracheae
Disk, fixed tracheae are arranged on lifting unit, and vacuum pump connect setting with fixed tracheae pipe, and power unit is arranged in lifting unit
On, power unit is for driving rotation tracheae rotation, and lifting unit is for driving placement rack to be gone up and down；The placement rack
Top outer be provided with ring jet mouth, ring jet mouth connect setting, anticollision list with the second outlet tube of rotation tracheae
Member is arranged on the side for placing rack, and anti-collision unit is located at the side of ring jet mouth, and anti-collision unit is placed for detecting
The distance of rack lifting.
Further, the rotary lifting mechanism further includes the first oil sealing and the second oil sealing；The rotation tracheae and fixation
Bearing is provided between tracheae, between fixed tracheae outlet and bearing, the second oil sealing is arranged in rotary pneumatic the setting of the first oil sealing
On the pipe shaft of pipe, and the second oil sealing is located at placement rack and is placed in the through-hole of rotation tracheae, and the first oil sealing and rotation tracheae
Junction is provided with inflatable mouth, and ring jet mouth connect setting with inflatable mouth pipe.
Further, the inclination angle in the ring jet mouth towards the top surface direction for placing rack is 30 °~45 °.
Further, the lifting unit includes pedestal, lifting platform and lifting cylinder, and the lifting cylinder is arranged in pedestal
On, lifting platform is arranged on the output shaft of lifting cylinder, and on fixed tracheae is arranged in the middle part of the top surface of lifting platform, power unit is set
It sets on the top surface of lifting platform, and power unit is located at the side of fixed tracheae.
Further, the power unit includes motor and gear, and motor is arranged on lifting platform, rotates tracheae
Lateral surface is provided with external tooth, and gear is set on the output shaft of motor, and gear and external tooth intermeshing are arranged.
Further, the anti-collision unit includes detector, comparator and alarm, and detector, which is arranged in, places rack
On side, comparator and alarm setting place rack in, detector be electrically connected with the input terminal of comparator, alarm and than
Output end compared with device is electrically connected.
It further, further include wiper mechanism, the wiper mechanism includes steering engine, rotating turret, spray tube and cleaning pipe, is turned
Moving frame is arranged on the output shaft of steering engine, and spray tube and purge tank are disposed side by side on rotating turret, and steering engine is for driving spray tube
Turn to the top for placing rack with cleaning pipe, spray tube and cleaning pipe be used for the wafer being installed on mounting table top of support into
Row cleaning.
It is different from the prior art, above-mentioned technical proposal is risen by the lifting unit of rotary lifting mechanism, so that sucker is logical
The fixed wafer of vacuum pump vacuumizing and adsorbing is crossed, when returning drop, by the detection of anti-collision unit, so that placing the position that rack stops
It will not be collided with other equipment or rack, so that wafer will not mutually be touched with the equipment placed except rack, reach and avoid
Wafer and the purpose for placing the mutual damaged in collision of rack.And in cleaning, by placing the ring jet mouth of rack side to putting
The wafer for being placed in mounting table top of support is blown, and the cleaning solution of seepage flow to backside of wafer is blown down, and seepage flow to wafer is avoided to carry on the back
The cleaning solution in face pollutes wafer.Therefore the cleaning problem damaged in lifting to wafer contamination and wafer is solved.
Detailed description of the invention
Fig. 1 is the schematic diagram for preventing from processing the jet anticollision device, collision-prevention device for causing secondary pollution described in specific embodiment；
Fig. 2 is the partial structurtes for preventing from processing the jet anticollision device, collision-prevention device for causing secondary pollution described in specific embodiment
Figure；
Fig. 3 is the partial view for preventing from processing the jet anticollision device, collision-prevention device for causing secondary pollution described in specific embodiment.
Description of symbols:
10, anti-collision unit；11, detector；12, comparator；13, alarm；
20, rotary lifting mechanism；21, rack is placed；22, tracheae is rotated；23, fixed tracheae；
24, lifting unit；25, power unit；26, vacuum pump；27, the first oil sealing；
28, the second oil sealing；221, sucker；222, bearing；223, inflatable mouth；224, external tooth；
241, pedestal；242, lifting platform；243, lifting cylinder；251, motor；
252, gear；
30, wiper mechanism；31, steering engine；32, rotating turret；33, spray tube；34, cleaning pipe；
Specific embodiment
Technology contents, construction feature, the objects and the effects for detailed description technical solution, below in conjunction with specific reality
It applies example and attached drawing is cooperated to be explained in detail.
Fig. 1, Fig. 2 and Fig. 3 are please referred to, prevents processing from the jet anticollision of secondary pollution being caused to fill the present embodiment provides a kind of
It sets, including anti-collision unit 10 and rotary lifting mechanism 20；The rotary lifting mechanism include place rack 21, rotation tracheae 22,
One end of fixed tracheae 23, lifting unit 24, power unit 25 and vacuum pump 26, the rotation tracheae is rotatably set on
Fixed intratracheal, the other end for rotating tracheae runs through the middle part that the top surface of mounting table is arranged in mounting table frame, and rotates tracheae
Sucker 221 is provided on the port of the other end, sucker can be vacuum chuck, and fixed tracheae is arranged on lifting unit, vacuum
Pump connect setting with fixed tracheae pipe, and power unit is arranged on lifting unit, and power unit is used to drive rotation tracheae rotation,
Lifting unit is for driving placement rack to be gone up and down；The top outer for placing rack is provided with ring jet mouth, annular
Puff prot connect setting with the second outlet tube of rotation tracheae, and anti-collision unit is arranged on the side for placing rack, and anticollision
Unit is located at the side of ring jet mouth, and anti-collision unit is used to detect the distance for placing rack lifting.
It is risen overally by the lifting unit of rotary lifting mechanism by rack is placed in the present embodiment, then opens vacuum pump
So that sucker is in vacuum state, and then pass through the fixed wafer of sucker suction.When returning drop, by the detection of anti-collision unit, make
The position that rack stopping must be placed will not be collided with other equipment or rack, such as: the marginal portion of wafer and other equipment
The distance between be 3mm to 8mm when stop so that wafer will not with place rack other equipment mutually touch, other equipment
For the jet pipe of cleaning, achieve the purpose that wafer is avoided to be damaged by collision.And in cleaning, the annular by placing rack side is sprayed
Port blows to the wafer for being placed in mounting table top of support, and the cleaning solution of seepage flow to backside of wafer is blown down, seepage flow is avoided
Cleaning solution to backside of wafer pollutes wafer.Therefore it is broken in lifting to wafer contamination and wafer to solve cleaning
The problem of damage.
The inclination angle in ring jet mouth described in the present embodiment towards the top surface direction for placing rack is 30 °~45 °.By setting
The angle of annular puff prot can make when cleaning solution is seepage flow to the back side of wafer, cleaning solution by wafer at blowing,
Solve the problems, such as that wafer is secondary polluted.
Rotary lifting mechanism described in the present embodiment further includes the first oil sealing 27 and the second oil sealing 28；The rotation tracheae with
Bearing 222 is provided between fixed tracheae, between fixed tracheae outlet and bearing, the setting of the second oil sealing exists the setting of the first oil sealing
On the pipe shaft for rotating tracheae, and the second oil sealing is located at placement rack and is placed in the through-hole of rotation tracheae, and the first oil sealing and rotation
Turn tracheae junction and be provided with inflatable mouth 223, ring jet mouth connect setting with inflatable mouth pipe.
When cleaning to wafer, entire rack of placing will do it rotation, by rotating so that the back side of wafer is equal
Even cleaning achievees the effect that complete cleaning wafer.Specifically, driving the rotation of rotation tracheae by power unit and placing rack
It rotates together, reaches and the wafer being adsorbed on sucker is driven to rotate together, therefore when spray wafer is cleaned, avoid spraying
Not exclusively, cause to clean sordid problem.And rotary pneumatic pipe can be made mutually to be socketed with fixed tracheae by bearing, and reach
The purpose of rotation can be driven by power unit to rotation tracheae, then passes through the fixed tracheae of the first oil sealing sealing and rotary pneumatic
The interface of pipe keeps the leakproofness between rotation tracheae and fixed tracheae, achievees the effect that suction disc vacuum pumping.Second oil sealing is then
It is mounted on the middle part of rotation tracheae, and the second oil sealing is located in the through-hole for placing the rotation tracheae of the accommodating in rack, and second
Rotation tracheae side wall at oil sealing opens up a nozzle, is connect nozzle with ring jet mouth by tracheae, can be using welding
Mode be tightly connected.Therefore ring jet mouth can arrange that tracheae carries out conveying gas by rotation pipe, and then should
Tracheae is arranged on the side wall of fixed tracheae, then carries out pipe connection with external air pump, provides the gas blowed and sprayed for ring jet mouth
Body.It ensure that the gas for improving steady pressure for ring jet mouth, wafer prevented to be cleaned liquid secondary pollution.
Lifting unit described in the present embodiment includes pedestal 241, lifting platform 242 and lifting cylinder 243, the lifting cylinder
It being set on the base, lifting platform is arranged on the output shaft of lifting cylinder, on fixed tracheae is arranged in the middle part of the top surface of lifting platform,
Power unit is arranged on the top surface of lifting platform, and power unit is located at the side of fixed tracheae.The power unit includes electricity
Motivation 251 and gear 252, motor can be servo motor, and motor is arranged on lifting platform, and the lateral surface for rotating tracheae is set
It is equipped with external tooth 224, gear is set on the output shaft of motor, and gear and external tooth intermeshing are arranged.
It places rack and rotates the rotation of tracheae, can be driven by motor.Specifically, in the outer of rotation tracheae
External tooth is set, therefore motor drives rotation tracheae rotation by way of gear engaged transmission, by rotating tracheae on side wall
There is local connection between rack with placing, therefore rotating tracheae can drive placement rack to rotate together.And place rack
Lifting then pushes lifting platform to move up and down by lifting cylinder, so that placement rack, rotary pneumatic on peace letter wealth and rank bird lifting platform
Pipe, fixed tracheae and power unit all follow it to move up and down, and achieve the effect that lifting.By in lifting cylinder mounting seat, lead to
The surface area for crossing pedestal is greater than the area on lifting platform surface, so that the center of gravity of jet anticollision device, collision-prevention device can be fallen on pedestal, improves
The effect of its stability.Wherein lifting cylinder can be cylinder or hydraulic cylinder.
Anti-collision unit described in the present embodiment includes detector 11, comparator 12 and alarm 13, and detector setting is being put
It sets on the side of rack, comparator and alarm setting are being placed in rack, and detector is electrically connected with the input terminal of comparator, report
Alert device is electrically connected with the output end of comparator.It is detected by detector and places the position of rack or apart from the height on ground, into
And the data that will test are transmitted in comparator, by being compared with the numerical value manually set in comparator, when exceeding
When the numerical value manually set, then the feedback information that alarm can receive comparator is alarmed, and is reached prompting and is operated manually
Effect avoids wafer and other equipment damaged in collision.Detector can be position sensor, such as Keyemce GT2 serial position
Sensor, alarm then can be buzzer or alarm lamp.
The model of comparator can be LM393, TLV3011 and MAX9028, comparator be to two or more data item into
Row compares, and to determine whether they equal, or determines size relation between them and puts in order and be known as comparing.It can be realized
The circuit or device of this comparing function are known as comparator.Comparator is by an analog voltage signal and a reference voltage phase
The circuit compared.The two-way input of comparator is analog signal, and output is then binary signal 0 or 1, when the difference of input voltage
It increases or reduces and when sign symbol is constant, output is kept constant.
It further include wiper mechanism 30 in the present embodiment, the wiper mechanism includes steering engine 31, rotating turret 32,33 and of spray tube
Cleaning pipe 34, rotating turret is arranged on the output shaft of steering engine, and spray tube and purge tank are disposed side by side on rotating turret, and steering engine is used for
Spray tube and cleaning pipe is driven to turn to the top for placing rack, spray tube and cleaning pipe are used for being installed on mounting table top of support
On wafer cleaned.For the ease of being sprayed and cleaning, sprayed by two pipelines side by side, in spray piping
Chemical liquid is connected, it is if HF chemical liquid is rinsed, the surface washing of wafer is clean.And cleaning pipe connects clear water, i.e., not
Clear water containing chemical liquid is rinsed, and the chemical liquid for remaining in crystal column surface is rinsed well, reaches the mesh rinsed completely
's.For ease of operation, one end of spray tube and cleaning pipe is installed on rotating turret, and is rotated back and forth by steering engine, made
It obtains and is sprayed above the outlet of spray tube and the mouth rotation to rack of cleaning pipe, after spray, then pass through rudder
Machine removes spray tube and cleaning pipe, carries out going up and down wafer of taking convenient for mounting table, improves the practicability of jet anticollision device, collision-prevention device.
It should be noted that being not intended to limit although the various embodiments described above have been described herein
The scope of patent protection of the utility model.Therefore, based on the innovative idea of the utility model, embodiment described herein is carried out
Change and modification or equivalent structure or equivalent flow shift made based on the specification and figures of the utility model, directly
Or above technical scheme is used in other related technical areas indirectly, it is included in the protection model of the utility model patent
Within enclosing.
Claims (7)
1. a kind of jet anticollision device, collision-prevention device for preventing processing from causing secondary pollution, it is characterised in that: risen including anti-collision unit and rotation
Descending mechanism；
The rotary lifting mechanism includes placing rack, rotation tracheae, fixed tracheae, lifting unit, power unit and vacuum pump,
One end of the rotation tracheae, which is rotatably set on, fixes the other end for intratracheally rotating tracheae through the setting of mounting table frame
At the middle part of the top surface of mounting table, and sucker is provided on the port of the other end of rotation tracheae, fixed tracheae setting is being gone up and down
On unit, vacuum pump connect setting with fixed tracheae, and power unit is arranged on lifting unit, and power unit is for driving rotation
Tracheae rotation, lifting unit is for driving placement rack to be gone up and down；
The top outer for placing rack is provided with ring jet mouth, the second outlet tube of ring jet mouth and rotation tracheae
Connection setting, anti-collision unit is arranged on the side for placing rack, and anti-collision unit is located at the side of ring jet mouth, anticollision list
Member places the distance of rack lifting for detecting.
2. a kind of jet anticollision device, collision-prevention device for preventing processing from causing secondary pollution according to claim 1, it is characterised in that: institute
Stating rotary lifting mechanism further includes the first oil sealing and the second oil sealing；
Be provided with bearing between the rotation tracheae and fixed tracheae, the setting of the first oil sealing fixed tracheae outlet and bearing it
Between, the second oil sealing is arranged on the pipe shaft of rotation tracheae, and the second oil sealing is located at the through-hole that placement rack is placed in rotation tracheae
It is interior, and the first oil sealing and rotation tracheae junction are provided with inflatable mouth, ring jet mouth connect setting with inflatable mouth pipe.
3. a kind of jet anticollision device, collision-prevention device for preventing processing from causing secondary pollution according to claim 1, it is characterised in that: institute
The inclination angle for stating ring jet mouth towards the top surface direction for placing rack is 30 °~45 °.
4. a kind of jet anticollision device, collision-prevention device for preventing processing from causing secondary pollution according to claim 1, it is characterised in that: institute
Stating lifting unit includes pedestal, lifting platform and lifting cylinder, and the lifting cylinder is set on the base, and lifting platform setting is being gone up and down
On the output shaft of cylinder, on fixed tracheae is arranged in the middle part of the top surface of lifting platform, power unit is arranged on the top surface of lifting platform,
And power unit is located at the side of fixed tracheae.
5. a kind of jet anticollision device, collision-prevention device for preventing processing from causing secondary pollution according to claim 4, it is characterised in that: institute
Stating power unit includes motor and gear, and motor is arranged on lifting platform, and the lateral surface for rotating tracheae is provided with external tooth, tooth
Wheel is set on the output shaft of motor, and gear and external tooth intermeshing are arranged.
6. a kind of jet anticollision device, collision-prevention device for preventing processing from causing secondary pollution according to claim 1, it is characterised in that: institute
Stating anti-collision unit includes detector, comparator and alarm, and detector is arranged on the side for placing rack, comparator and alarm
Device setting is being placed in rack, and detector is electrically connected with the input terminal of comparator, and alarm is electrically connected with the output end of comparator.
7. a kind of jet anticollision device, collision-prevention device for preventing processing from causing secondary pollution according to claim 1, it is characterised in that: also
Including wiper mechanism, the wiper mechanism includes steering engine, rotating turret, spray tube and cleaning pipe, and the defeated of steering engine is arranged in rotating turret
On shaft, spray tube and purge tank are disposed side by side on rotating turret, and steering engine is for driving spray tube and cleaning pipe to turn to placement
The top of rack, spray tube and cleaning pipe are for cleaning the wafer being installed on mounting table top of support.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821900816.XU CN209016041U (en) | 2018-11-19 | 2018-11-19 | A kind of jet anticollision device, collision-prevention device for preventing processing from causing secondary pollution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821900816.XU CN209016041U (en) | 2018-11-19 | 2018-11-19 | A kind of jet anticollision device, collision-prevention device for preventing processing from causing secondary pollution |
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| Publication Number | Publication Date |
|---|---|
| CN209016041U true CN209016041U (en) | 2019-06-21 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821900816.XU Active CN209016041U (en) | 2018-11-19 | 2018-11-19 | A kind of jet anticollision device, collision-prevention device for preventing processing from causing secondary pollution |
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| CN (1) | CN209016041U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112547603A (en) * | 2020-11-13 | 2021-03-26 | 马鞍山锲恒精密组件科技有限公司 | Semiconductor wafer surface cleaning device |
| CN114431881A (en) * | 2022-01-20 | 2022-05-06 | 李妮妮 | Special placement table for electroencephalogram detection equipment for neurology diagnosis |
| CN115338171A (en) * | 2022-08-21 | 2022-11-15 | 浙江奥首材料科技有限公司 | Wafer protective coating cleaning equipment |
-
2018
- 2018-11-19 CN CN201821900816.XU patent/CN209016041U/en active Active
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112547603A (en) * | 2020-11-13 | 2021-03-26 | 马鞍山锲恒精密组件科技有限公司 | Semiconductor wafer surface cleaning device |
| CN114431881A (en) * | 2022-01-20 | 2022-05-06 | 李妮妮 | Special placement table for electroencephalogram detection equipment for neurology diagnosis |
| CN114431881B (en) * | 2022-01-20 | 2024-01-12 | 陕西省人民医院 | Special platform of placing of brain electricity detection equipment of department of neurology diagnosis |
| CN115338171A (en) * | 2022-08-21 | 2022-11-15 | 浙江奥首材料科技有限公司 | Wafer protective coating cleaning equipment |
| CN115338171B (en) * | 2022-08-21 | 2023-08-29 | 浙江奥首材料科技有限公司 | Wafer protective coating cleaning equipment |
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