CN208928755U - The OLED vapor deposition Dry ice cleaning device of baffle - Google Patents

The OLED vapor deposition Dry ice cleaning device of baffle Download PDF

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Publication number
CN208928755U
CN208928755U CN201821608516.4U CN201821608516U CN208928755U CN 208928755 U CN208928755 U CN 208928755U CN 201821608516 U CN201821608516 U CN 201821608516U CN 208928755 U CN208928755 U CN 208928755U
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China
Prior art keywords
dry ice
cleaning
baffle
cleaning chamber
vapor deposition
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CN201821608516.4U
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Chinese (zh)
Inventor
陈文勇
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Shanghai Keyyi Electronic Technology Co Ltd
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Shanghai Keyyi Electronic Technology Co Ltd
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Abstract

The utility model discloses the Dry ice cleaning devices of OLED vapor deposition baffle, including dry ice generator, the material collector equipped with negative pressure drainage device and cleaning chamber, OLED vapor deposition to be cleaned is placed in cleaning chamber with baffle, cleaning chamber is transparent or semitransparent enclosed construction, top is equipped with blower fan filtering unit, bottom is connect with material collector, and inside is equipped with baffle fixing, is connect inside dry ice generator and cleaning chamber;For the device using Dry ice cleaning substitution conventional organic solvents cleaning, structure is simple, easily operated, reduces baffle and cleans cost, OLED material recycling is convenient and recovery efficiency is high, environmental-friendly.

Description

The OLED vapor deposition Dry ice cleaning device of baffle
Technical field
The utility model belongs to OLED device preparation technical field, and in particular to the Dry ice cleaning of OLED vapor deposition baffle fills It sets.
Background technique
Currently, the structure of OLED top emitting device mainly includes transmitting anode (RE), hole injection layer (HIL), hole biography Defeated layer (HTL), luminescent layer (EML), electron transfer layer (ETL), electron injecting layer (EIL) and cathode (Cathode) successively heap It is folded to constitute, have many advantages, such as that wide viewing angle, highlighted high contrast, low energy consumption and volume are more frivolous, is that current flat panel display closes Infuse focus.
OLED top emitting device preparation process are as follows: will first be reflected in metal material deposition or spraying plating to base material with being formed Conventional organic EL device substrate can be used in anode, it is possible to use has good mechanical strength, thermal stability, transparency, surface The glass substrate or transparent plastic substrate of pliability, tractability and water resistance.Similarly, will have metal material deposit or To form reflective cathode in spraying plating to base material.The preferred material of reflection anode and reflective cathode is Ag or Ag alloy, reflection Rate is greater than 85%@550nm.It is formed on anode with vacuum evaporation, spin coating, casting or Langmuir-Blodgett (LB) method again Hole injection layer (HIL).
When forming HIL using vacuum evaporation, sedimentary condition can be according to the type of compounds for being used as hole-injecting material And structure and HIL thermal property and change, general depositing temperature is 50-500 DEG C, and vacuum degree is that 10-8-10-3 is held in the palm, and deposition rate isDeposition thickness isOLED evaporated device structure is as shown in Figure 1.OLED material quilt from evaporation source Heating evaporation, gaseous state OLED material deposit near glass substrate and form film.But OLED material is not during above-mentioned vapor deposition It only deposits on the glass substrate, also in other site depositions of cavity, causes OLED material utilization rate very low, generally 5% or so. To improve OLED material utilization rate, production cost is reduced, baffle is wrapped up in OLED evaporated device cavity surrounding, can only pass through replacement Baffle realizes the effect of cleaning chamber, and adheres to a large amount of OLED materials on baffle, can recycle and further save cost.
But baffle cleaning is at high cost in the prior art, because baffle dimensions are larger, and irregular.It needs a large amount of Organic solvent impregnates and cleaning.For example largely use methylene chloride.Cost is very high.OLED material is difficult to recycle, OLED after cleaning Material is dissolved in a large amount of organic solvents, if it is desired to be recycled, be needed many energy devaporation organic solvents, and a large amount of uses Organic solvent pollutes environment.
Utility model content
In view of this, being adopted the purpose of this utility model is to provide a kind of Dry ice cleaning device of OLED vapor deposition baffle Conventional organic solvents cleaning way is substituted with Dry ice cleaning, baffle is reduced and cleans cost, is easy recycling OLED material, and environment friend It is good, the problems such as overcoming existing apparatus clean at high cost, pollution environment with baffle to OLED vapor deposition.
To achieve the above object, the technical solution of the utility model is as follows:
OLED vapor deposition the Dry ice cleaning device of baffle, including dry ice generator, material collector and cleaning chamber, to clear The OLED vapor deposition washed is placed in the cleaning chamber with baffle;Wherein,
The cleaning chamber be transparent or semitransparent enclosed construction, top be equipped with blower fan filtering unit (FFU), bottom with The material collector connection, inside are equipped with the fixation device that the OLED vapor deposition to be cleaned uses baffle;
It is connect inside the dry ice generator and the cleaning chamber;
The material collector is equipped with negative pressure drainage device.
Preferably, the Dry ice cleaning device further includes air knife drying device, infrared heating device and sand blasting unit.
Preferably, the cleaning chamber is inverted trapezoidal structure.
Preferably, it is connect outside the cleaning chamber with high pressure water spraying device.
Preferably, the side wall of the cleaning chamber is equipped with several operation ports.
The utility model has the beneficial effects that:
It is connected with dry ice generator in the utility model Dry ice cleaning device, conventional organic solvents are substituted using Dry ice cleaning Cleaning way, structure is simple, easily operated, and can substantially reduce baffle cleaning cost, and OLED material facilitates recycling and recycling Rate height saves cost, avoids using a large amount of organic solvents, environmental-friendly.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of existing OLED evaporated device.
Fig. 2 is the structural schematic diagram of the utility model Dry ice cleaning device.
Specific embodiment
The technical solution that according to the present invention will be described in detail below with reference to the accompanying drawings, but the protection scope of the utility model is not limited to Following embodiments.
Referring to fig. 2, the OLED vapor deposition Dry ice cleaning device of baffle, including dry ice generator, material collector and cleaning Cavity, OLED vapor deposition to be cleaned are placed in cleaning chamber with baffle;Wherein, cleaning chamber is transparent or semitransparent closing knot Structure, top are equipped with blower fan filtering unit (FFU), and bottom is connect with material collector, and inside is equipped with OLED to be cleaned vapor deposition gear It is connect inside the fixation device of plate, dry ice generator and cleaning chamber, material collector is equipped with negative pressure drainage device.
In the preferred case, Dry ice cleaning device further includes air knife drying device, infrared heating device and sand blasting unit.
In another preferred embodiment, cleaning chamber is inverted trapezoidal structure.
In another preferred embodiment, it is connect outside cleaning chamber with high pressure water spraying device.
In another preferred embodiment, the side wall of cleaning chamber is equipped with several operation ports.
When above-mentioned Dry ice cleaning device, which carries out OLED vapor deposition, to be cleaned with baffle, comprising the following steps: (I) Dry ice cleaning, The cleaning of (II) pure water, (III) drying and (IV) sandblasting;Specifically: first OLED vapor deposition to be cleaned is fixed with baffle through operation port In in cleaning chamber, and enclosed cleaning cavity;The negative pressure for opening blower fan filtering unit progress water conservancy diversion and material collector simultaneously is drawn It flows device and forms negative pressure.It is then turned on dry ice generator and generates high pressure dry ice, be directly injected on above-mentioned OLED vapor deposition baffle anti- Multiple hydro-peening, the OLED material of its surface enrichment is rapidly separated under the effect of cold and hot dilation, above-mentioned double to water conservancy diversion and negative pressure Under recast is used, the OLED material after above-mentioned separation is flowed to along air to be flowed into the material collector of bottom.Again in high water pressure The high pressure water spraying device that power is 1-10MPa acts on the OLED vapor deposition after lower Dry ice cleaning, and with baffle to carry out step (II) pure water clear It washes, then with baffle first through air knife drying, rear infrared heating is to 75-85 DEG C, after sand blasting unit sandblasting is roughened Washing, dry, packaging.
Although above having made detailed description to the utility model with generality explanation and specific embodiment, On the basis of the utility model, it can be made some modifications or improvements, this is apparent to those skilled in the art 's.Therefore, these modifications or improvements on the basis of without departing from the spirit of the present invention, belong to the utility model and want Seek the range of protection.

Claims (5)

  1. The 1.OLED vapor deposition Dry ice cleaning device of baffle, which is characterized in that including dry ice generator, material collector and cleaning Cavity, OLED vapor deposition to be cleaned are placed in the cleaning chamber with baffle;Wherein,
    The cleaning chamber is transparent or semitransparent enclosed construction, and top is equipped with blower fan filtering unit, bottom and the material Collector connection, inside are equipped with the fixation device that the OLED vapor deposition to be cleaned uses baffle;
    It is connect inside the dry ice generator and the cleaning chamber;
    The material collector is equipped with negative pressure drainage device.
  2. 2. Dry ice cleaning device according to claim 1, which is characterized in that further include air knife drying device, infrared heating Device and sand blasting unit.
  3. 3. Dry ice cleaning device according to claim 1, which is characterized in that the cleaning chamber is inverted trapezoidal structure.
  4. 4. Dry ice cleaning device according to claim 1, which is characterized in that sprayed outside the cleaning chamber with high pressure water Device connection.
  5. 5. Dry ice cleaning device according to claim 1, which is characterized in that the side wall of the cleaning chamber is equipped with several Operation port.
CN201821608516.4U 2018-09-30 2018-09-30 The OLED vapor deposition Dry ice cleaning device of baffle Active CN208928755U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201821608516.4U CN208928755U (en) 2018-09-30 2018-09-30 The OLED vapor deposition Dry ice cleaning device of baffle

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201821608516.4U CN208928755U (en) 2018-09-30 2018-09-30 The OLED vapor deposition Dry ice cleaning device of baffle

Publications (1)

Publication Number Publication Date
CN208928755U true CN208928755U (en) 2019-06-04

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CN201821608516.4U Active CN208928755U (en) 2018-09-30 2018-09-30 The OLED vapor deposition Dry ice cleaning device of baffle

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109107997A (en) * 2018-09-30 2019-01-01 上海钥熠电子科技有限公司 The OLED vapor deposition Dry ice cleaning device and its technique of baffle

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109107997A (en) * 2018-09-30 2019-01-01 上海钥熠电子科技有限公司 The OLED vapor deposition Dry ice cleaning device and its technique of baffle

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