CN208912387U - A kind of photoresist ejecting device - Google Patents
A kind of photoresist ejecting device Download PDFInfo
- Publication number
- CN208912387U CN208912387U CN201821535627.7U CN201821535627U CN208912387U CN 208912387 U CN208912387 U CN 208912387U CN 201821535627 U CN201821535627 U CN 201821535627U CN 208912387 U CN208912387 U CN 208912387U
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- photoresist
- nozzle cap
- spray head
- nozzle
- holding tank
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Abstract
The utility model provides a kind of photoresist ejecting device, wherein photoresist ejecting device includes: spray head and nozzle cap；Spray head includes the nozzle for spraying photoresist；Nozzle cap includes holding tank, spray head and nozzle cap by holding tank cladding nozzle, and spray head and nozzle cap form closed space.Coating nozzle by the nozzle cap with holding tank, to reduce the volatilization of the photoresist in spray head, reduces the probability that the photoresist of liquid is transformed into the substance of gel state and is attached at jet pipe or/and nozzle, to improve product quality so that nozzle is located in closed space.
Description
Technical field
The utility model belongs to semiconductor integrated circuit field, is related to a kind of photoresist ejecting device.
Background technique
In semiconductor integrated circuit field, photoetching process have always been considered as be most critical in IC manufacturing step
Suddenly, it needs to be used multiple times in entire technical process, there is important influence to the quality of product.
The method that photoresist is coated in existing semiconductor integrated circuit usually uses method of spin coating, i.e., by being located at substrate
The spray head of top sprays photoresist to substrate, then by the rotation of substrate so that photoresist even spread.Therefore, photoresist need to select one
Plant the material of volatile and easy dry condensation.
Currently, illustrating a kind of structural schematic diagram of spray head in the prior art such as Fig. 1, spray head 100 includes jet pipe 101
And nozzle 102.Referring to Fig.2, status architecture schematic diagram of the spray head being shown as in Fig. 1 when just terminating spraying.It can be with from figure
Find out, is in opening-wide state, i.e., so that being located at the photoresist in jet pipe 101 for spraying the spray head 100 of photoresist its nozzle 102
Directly contacted with the external world.Over time, portion gas 300 enters in the jet pipe 101, volatile in jet pipe 101
And the photoresist 200 of easily dry condensation can constantly volatilize, and the solvent in photoresist 200 is caused to gradually decrease, the photoresist 200 of liquid will
The substance 201 for becoming gel state, is attached at the inner wall or/and nozzle 102 of jet pipe 101, refering to Fig. 3 and Fig. 4.When spray head 100
When spraying photoresist 200 again, may cause: 1) photoresist 200 of liquid is when flowing through spray head 100, due to the substance 201 of gel state
Barrier effect so that photoresist 200 is unevenly coated on substrate；2) photoresist 200 of the substance 201 of gel state due to liquid
Impact, falls to the surface of substrate, causes product defects.
In existing processing procedure, the mode of maintenance spray head 100 is usually that spray head 100 is put into the opening equipped with protection liquid
In container, protection liquid can frequently result in the pollution to photoresist in jet pipe, cause the defect of photoetching process.Therefore it provides a kind of
Photoresist ejecting device generates the above problem brought by the substance of gel state preventing the volatilization due to the photoresist in spray head,
It is necessary.
Utility model content
In view of the foregoing deficiencies of prior art, the purpose of this utility model is to provide a kind of photoresist ejecting device,
For solving the problem of in the prior art since the nozzle in spray head is in a series of caused product defects of opening-wide state.
In consideration of it, the utility model provides a kind of photoresist ejecting device, the photoresist ejecting device includes:
Spray head, the spray head include the nozzle for spraying photoresist；
Nozzle cap, the nozzle cap include holding tank, and the spray head and the nozzle cap pass through holding tank cladding institute
Nozzle is stated, and the spray head and the nozzle cap form closed space.
Optionally, the thickness of the side wall of the nozzle cap is from the top of the nozzle cap to the bottom direction of the nozzle cap
Increase in a linear relationship.
Optionally, the thickness of the bottom of the nozzle cap is greater than the thickness of the side wall of the nozzle cap.
Optionally, the longitudinal section pattern of the holding tank includes isosceles trapezoid, and the opening of the holding tank is in horizontal plane
Projection be greater than the bottom surface of the holding tank, the pattern of the bottom surface of the holding tank includes in round, ellipse and polygon
It is a kind of.
Optionally, the longitudinal section pattern of the nozzle cap includes isosceles trapezoid, and the top of the nozzle cap is in horizontal plane
Projection be greater than the bottom of the nozzle cap, the pattern of the bottom of the nozzle cap includes in round, ellipse and polygon
It is a kind of.
Optionally, the pattern of the holding tank includes rotary table, and the nozzle cap is in axis along the symmetry axis of the holding tank
Symmetrically.
Optionally, the opening of the holding tank includes the circle that diameter range is 0.06mm~8mm, the bottom of the holding tank
Face includes the circle that diameter range is 0.05mm~3mm, and the range of the height of the holding tank includes 0.5mm~10mm.
Optionally, the top of the nozzle cap includes the circle that diameter range is 0.1mm~10mm, the bottom of the nozzle cap
Portion includes the circle that diameter range is 0.1mm~5mm, and the range of the height of the nozzle cap includes 1mm~15mm.
Optionally, the nozzle cap includes being threadedly coupled, pin connection, latching connection and insert with the connection type of the spray head
One of connect.
It optionally, further include cavity between the bottom surface of the holding tank and the nozzle.
Optionally, the photoresist ejecting device further includes the sealing ring between the nozzle cap and spray head, described close
Seal includes silica gel sealing ring.
Optionally, the nozzle cap and the spray head have same material, including polytetrafluoroethylene (PTFE) nozzle cap and ceramics spray
One of skull.
As described above, the photoresist ejecting device of the utility model, has the advantages that through the spray with holding tank
Skull coats nozzle, and closed space is formed between spray head and nozzle cap, so that nozzle is located in closed space, to reduce
The volatilization of photoresist in spray head, the photoresist for reducing liquid are transformed into the substance of gel state and are attached at jet pipe or/and nozzle
Probability, to improve product quality.
Detailed description of the invention
Fig. 1 is shown as a kind of structural schematic diagram of spray head in the prior art.
Fig. 2 is shown as status architecture schematic diagram of the spray head in Fig. 1 when just terminating glue spraying.
Fig. 3 is shown as a kind of status architecture schematic diagram of the spray head in Fig. 1 after terminating glue spraying.
Fig. 4 is shown as the structural schematic diagram that the spray head in Fig. 1 forms the substance of gel state after terminating glue spraying in jet pipe.
Fig. 5 is shown as the decomposition disassembly and assembly structure schematic diagram of one of the utility model photoresist ejecting device.
Fig. 6 is shown as the structural schematic diagram after the connection of the photoresist ejecting device in Fig. 5.
Fig. 7 is shown as the schematic cross-sectional view of the photoresist ejecting device in Fig. 6.
Fig. 8 is shown as the schematic cross-sectional view of the nozzle cap in Fig. 5.
Fig. 9 is shown as the structural schematic diagram of the nozzle cap in Fig. 5.
Figure 10 is shown as the schematic cross-sectional view of another photoresist ejecting device in the utility model.
Figure 11 is shown as the process flow diagram of the coating photoresist in the utility model.
Component label instructions
100,110 spray head
101,111 jet pipe
102,112 nozzle
113 positioning steps
114 sealing rings
200,210 photoresist
The substance of 201 gel states
300 gases
310 nozzle caps
311 holding tanks
R1, R2, r1, r2 diameter
H1, h2 height
Specific embodiment
The embodiments of the present invention is illustrated by particular specific embodiment below, those skilled in the art can be by this
Content disclosed by specification understands other advantages and effect of the utility model easily.
Fig. 5 is please referred to Figure 11.It should be clear that this specification structure depicted in this specification institute accompanying drawings, ratio, size etc., are only used
To cooperate the revealed content of specification, so that those skilled in the art understands and reads, it is practical new to be not limited to this
The enforceable qualifications of type, therefore do not have technical essential meaning, the modification of any structure, the change of proportionate relationship or size
Adjustment it is practical new should all still to fall in this in the case where not influencing the effect of the utility model can be generated and the purpose that can reach
The revealed technology contents of type obtain in the range of capable of covering.Meanwhile in this specification it is cited as "upper", "lower", " left side ",
The term on " right side ", " centre " and " one " etc. is merely convenient to being illustrated for narration, rather than enforceable to limit the utility model
Range, relativeness are altered or modified, under the content of no substantial changes in technology, enforceable when being also considered as the utility model
Scope.
As shown in Fig. 5~7, the utility model provides a kind of photoresist ejecting device, and described device includes: spray head 110 and spray
Skull 310.The spray head 110 includes nozzle 112, and the nozzle 112 is for spraying photoresist；The nozzle cap 310 includes accommodating
Slot 311, the spray head 110 coat the nozzle 112, and the spray head by the holding tank 311 with the nozzle cap 310
110 form closed space with the nozzle cap 310.
Specifically, the spray head 110 further includes the jet pipe 111 being connected with the nozzle 112, the jet pipe 111 is used for
Pass through institute after the photoresist 210 of liquid flows through the jet pipe 111 to the photoresist 210 of the nozzle 112 transmission liquid
The upper surface that nozzle 112 is sprayed at substrate is stated, for the substrate after rotation, the photoresist 210 can be spread evenly across the base
The upper surface of plate.The photoresist 210 includes one of positive photoresist and negative photoresist, the substrate and the photoresist
210 type herein with no restriction, number, pattern and the distribution of the nozzle 112, herein with no restriction.
The utility model coats the nozzle 112 by the holding tank 311, and in the spray head 110 and the spray head
Closed space is formed between lid 310, so that the nozzle 112 is located in closed space, to reduce easy in the spray head 110
The volatilization of the photoresist 210 of volatilization and easily dry condensation, the photoresist 210 for reducing liquid are transformed into the substance of gel state simultaneously
The probability being attached at the jet pipe 111 or/and the nozzle 112, thus avoid the photoresist 210 of liquid flow through it is described
When spray head 110, due to the barrier effect of the substance of gel state, so that the photoresist 210 is unevenly coated on the substrate；And
When using the spray head 110 next time, the substance of gel state is fallen to described due to the impact of the photoresist 210 of liquid
The surface of substrate, the problem of causing product defects.
As the further embodiment of the embodiment, the thickness of the side wall of the nozzle cap 310 is from the nozzle cap 310
Bottom direction in a linear relationship increase of the top to the nozzle cap 310, the thickness of the bottom of the nozzle cap 310 are greater than described
The thickness of the side wall of nozzle cap 310 is conducive to extend the service life of the nozzle cap 310, avoids frequently replacing by liquid
When the photoresist 210 is to corrosion and the subsequent cleaning nozzle cap 310 of the nozzle cap 310, cleaning solution is to the spray head
The nozzle cap 310 of 310 corrosion and damage of lid.
As the further embodiment of the embodiment, the longitudinal section pattern of the holding tank 311 includes isosceles trapezoid, and institute
The opening for stating holding tank 311 is greater than the bottom surface of the holding tank 311 in the projection of horizontal plane, the bottom surface of the holding tank 311
Pattern includes one of round, ellipse and polygon.To provide receiving for the nozzle 112 in the spray head 110
Space.
Specifically, as shown in figure 8, the opening of the holding tank 311 includes the circle that diameter R2 range is 0.06mm~8mm
Shape, the bottom surface of the holding tank 311 include the circle that diameter r2 range is 0.05mm~3mm, the height h2 of the holding tank 311
Range include 0.5mm~10mm.The size range can the spray head that is applicable in of nozzle cap 310 described in further expansion
110 range, and the longitudinal section pattern of the holding tank 311 uses isosceles trapezoid, the opening and the appearance of the holding tank 311
Receiving the bottom surface of slot 311 is all made of circle, can meet the needs of existing spray head, and can also reduce and prepare the nozzle cap 310
Complexity.In another embodiment, opening, side and the bottom surface of the holding tank 311 may also comprise by plane and curved surface
One kind or other patterns for being surrounded of combination, herein with no restrictions, the preferably described holding tank 311 has with the spray head 110
There is identical pattern.
As the further embodiment of the embodiment, the longitudinal section pattern of the nozzle cap 310 includes isosceles trapezoid, and institute
The top for stating nozzle cap 310 is greater than the bottom of the nozzle cap 310, the pattern of the bottom of the nozzle cap in the projection of horizontal plane
Including one of round, ellipse and polygon.In order to which user operates the nozzle cap 310.
Specifically, as shown in figure 9, the top of the nozzle cap 310 includes the circle that diameter R1 range is 0.1mm~10mm
Shape, the bottom of the nozzle cap 310 include the circle that diameter r1 range is 0.1mm~5mm, the height h1 of the nozzle cap 310
Range include 1mm~15mm.It is empty that the size range of the nozzle cap 310 can provide enough processing for the holding tank 311
Between, and the longitudinal section pattern of the nozzle cap 310 uses isosceles trapezoid, the top of the nozzle cap 310 and the nozzle cap 310
Bottom be all made of circle, be conducive to user and operate the nozzle cap 310.In another embodiment, the nozzle cap 310
Top, side and bottom may also comprise other patterns surrounded by one of plane and curved surface or combination, not limit herein
System.
As the further embodiment of the embodiment, the pattern of the holding tank 311 includes rotary table, and the nozzle cap
310 along the holding tank 311 symmetry axis axisymmetricly.To be conducive to what nozzle cap 310 described in further expansion was applicable in
The range of the spray head 110, and reduce the complexity for preparing the nozzle cap 310.
As the further embodiment of the embodiment, the connection type of the nozzle cap 310 and the spray head 110 includes spiral shell
One of line connection, pin connection, lock connection and grafting.Those skilled in the art can select as needed, herein not
It is restricted.
Specifically, when the nozzle cap 310 uses the inserting mode being attached by frictional force with the spray head 110
When, the outer wall of the preferably described spray head 110 includes positioning step 113, thus avoid the nozzle cap 310 with the spray head
During 110 carry out grafting, the pollution and damage to the spray head 110 are caused, as shown in Figure 10.
As the further embodiment of the embodiment, further include between the bottom surface and the nozzle 112 of the holding tank 311
Cavity.It is directly contacted to can avoid the bottom surface of the holding tank 311 with the nozzle 112, it is contaminated to reduce the nozzle 112
Or impaired probability.
As the further embodiment of the embodiment, the photoresist ejecting device further include positioned at the nozzle cap 310 and
Sealing ring 114 between spray head 110, the sealing ring 114 include silica gel sealing ring.To be conducive in the nozzle cap 310
Closed closed space is formed with 110 bracket of spray head, the photoresist 210 for further decreasing liquid is transformed into gel state
Substance and the probability being attached at the jet pipe 111 or/and the nozzle 112, to improve product quality.The sealing ring
114 material, pattern, quantity and distribution are herein with no restriction.
As the further embodiment of the embodiment, the nozzle cap 310 has same material, packet with the spray head 110
One of polytetrafluoroethylene (PTFE) nozzle cap and ceramic spray head lid are included, so as to further extend the use longevity of the nozzle cap 310
Life.
Such as Figure 11, the utility model also provides a kind of method for being coated with photoresist, comprising the following steps:
The photoresist ejecting device is provided；
The nozzle cap and spray head are separated, photoresist is sprayed by the spray head；
Connect the nozzle cap and spray head.
As the further embodiment of the embodiment, after separating the nozzle cap and spray head, connect the nozzle cap and
Before spray head, further include the steps that cleaning the nozzle cap.
Specifically, details are not described herein again for the structure and connection relationship of the photoresist ejecting device, the nozzle cap institute is cleaned
The cleaning solution used includes one of OK73, PGMEA, PGME and deionized water, the specific type and flow velocity of the cleaning solution
Herein with no restriction.
In conclusion the photoresist ejecting device of the utility model, by the nozzle cap cladding nozzle with holding tank, and
Closed space is formed between spray head and nozzle cap, so that nozzle is located in closed space, to reduce waving for the photoresist in spray head
Hair, reduces the probability that the photoresist of liquid is transformed into the substance of gel state and is attached at jet pipe or/and nozzle, to improve product
Quality.So the utility model effectively overcomes various shortcoming in the prior art and has high industrial utilization value.
The above embodiments are only illustrative of the principle and efficacy of the utility model, and not for limitation, this is practical new
Type.Any person skilled in the art can all carry out above-described embodiment under the spirit and scope without prejudice to the utility model
Modifications and changes.Therefore, such as those of ordinary skill in the art without departing from the revealed essence of the utility model
All equivalent modifications or change completed under mind and technical idea, should be covered by the claim of the utility model.
Claims (8)
1. a kind of photoresist ejecting device, which is characterized in that the photoresist ejecting device includes:
Spray head, the spray head include the nozzle for spraying photoresist；
Nozzle cap, the nozzle cap include holding tank, and the spray head and the nozzle cap pass through the spray of holding tank cladding
Mouth, and the spray head and the nozzle cap form closed space.
2. photoresist ejecting device according to claim 1, it is characterised in that: the longitudinal section pattern of the holding tank include etc.
Waist is trapezoidal, and the opening of the holding tank is greater than the bottom surface of the holding tank, the bottom surface of the holding tank in the projection of horizontal plane
Pattern include one of round, ellipse and polygon.
3. photoresist ejecting device according to claim 1, it is characterised in that: the longitudinal section pattern of the nozzle cap include etc.
Waist is trapezoidal, and the top of the nozzle cap is greater than the bottom of the nozzle cap, the bottom of the nozzle cap in the projection of horizontal plane
Pattern include one of round, ellipse and polygon.
4. photoresist ejecting device according to claim 1, it is characterised in that: the opening of the holding tank includes diameter range
For the circle of 0.06mm~8mm, the bottom surface of the holding tank includes the circle that diameter range is 0.05mm~3mm, the receiving
The range of the height of slot includes 0.5mm~10mm.
5. photoresist ejecting device according to claim 1, it is characterised in that: the top of the nozzle cap includes diameter range
For the circle of 0.1mm~10mm, the bottom of the nozzle cap includes the circle that diameter range is 0.1mm~5mm, the nozzle cap
The range of height include 1mm~15mm.
6. photoresist ejecting device according to claim 1, it is characterised in that: the connection side of the nozzle cap and the spray head
Formula includes one of threaded connection, pin connection, lock connection and grafting.
7. photoresist ejecting device according to claim 1, it is characterised in that: the bottom surface of the holding tank and the nozzle it
Between further include cavity.
8. photoresist ejecting device according to claim 1, it is characterised in that: the photoresist ejecting device further includes being located at institute
The sealing ring between nozzle cap and spray head is stated, the sealing ring includes silica gel sealing ring.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821535627.7U CN208912387U (en) | 2018-09-19 | 2018-09-19 | A kind of photoresist ejecting device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821535627.7U CN208912387U (en) | 2018-09-19 | 2018-09-19 | A kind of photoresist ejecting device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN208912387U true CN208912387U (en) | 2019-05-31 |
Family
ID=66706294
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821535627.7U Active CN208912387U (en) | 2018-09-19 | 2018-09-19 | A kind of photoresist ejecting device |
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|---|---|
| CN (1) | CN208912387U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110918333A (en) * | 2018-09-19 | 2020-03-27 | 长鑫存储技术有限公司 | Photoresist spray head device and method for coating photoresist |
-
2018
- 2018-09-19 CN CN201821535627.7U patent/CN208912387U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110918333A (en) * | 2018-09-19 | 2020-03-27 | 长鑫存储技术有限公司 | Photoresist spray head device and method for coating photoresist |
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