CN208829760U - Atomic layer deposition apparatus gas-filtering device - Google Patents
Atomic layer deposition apparatus gas-filtering device Download PDFInfo
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- CN208829760U CN208829760U CN201821616674.4U CN201821616674U CN208829760U CN 208829760 U CN208829760 U CN 208829760U CN 201821616674 U CN201821616674 U CN 201821616674U CN 208829760 U CN208829760 U CN 208829760U
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- furnace body
- fixedly installed
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- layer deposition
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Abstract
The utility model discloses a kind of atomic layer deposition apparatus gas-filtering devices, including furnace body, the lower end outer surface of the furnace body is fixedly installed with bottom plate, and the lower end of bottom plate is movably installed with idler wheel, the back end outer surface of the furnace body is fixedly installed with air inlet pipe, and a side external surface of furnace body is fixedly installed with water inlet pipe, the inside of the furnace body is fixedly installed with strainer close to the position of lower end, and the inside of furnace body is fixedly installed with pallet close to the position of upper end, the upper end outer surface of the furnace body is fixedly installed with top plate.The utility model makes the present apparatus have preferable filterability in use by being provided with a series of structure, the dosage of trimethyl aluminium is less during gas treatment, during gas treatment, filter vat can get rid of the impurity in gas, the impurity that reaction generates is less able to the case where avoiding blocking, the filter effect of gas is also preferable, convenient for the use of user.
Description
Technical field
The utility model relates to atomic layer deposition fields more particularly to a kind of atomic layer deposition apparatus to be filled with gas filtration
It sets.
Background technique
Gas-filtering device be it is a kind of by chemical reaction or physical absorption reach filter effect device, it can be achieved that will
Production bring exhaust gas is handled the process discharged again, but existing gas-filtering device structure is simple, and not
Having preferable filterability, the dosage of trimethyl aluminium is more during gas treatment, so that the impurity for reacting generation is more,
The case where be easy to causeing blocking in this case, while the filter effect of gas is also not good enough, the use for the person of being not convenient to use.
Utility model content
A kind of atomic layer deposition apparatus gas-filtering device that the utility model embodiment provides, including furnace body, institute
The lower end outer surface for stating furnace body is fixedly installed with bottom plate, and the lower end of bottom plate is movably installed with idler wheel, outside the rear end of the furnace body
Surface is fixedly installed with air inlet pipe, and a side external surface of furnace body is fixedly installed with water inlet pipe, and the inside of the furnace body is under
The position at end is fixedly installed with strainer, and the inside of furnace body is fixedly installed with pallet close to the position of upper end, the furnace body it is upper
End outer surface is fixedly installed with top plate, and the upper end outer surface of top plate is fixedly installed with escape pipe, and the other side of the furnace body is set
It is equipped with filter vat, and is provided with valve between filter vat and furnace body, the middle position of the outer surface of the furnace body is fixedly installed with
Fixed block.
By using above-mentioned technical proposal, the dosage of trimethyl aluminium is less in this process, in the process of gas treatment
In, filter vat can get rid of the impurity in gas, and the impurity for reacting generation is less able to the case where avoiding blocking, the mistake of gas
It is also preferable to filter effect, convenient for the use of user.
In some embodiments, the lower end of the strainer is fixedly installed with heater strip, and the outer surface of heater strip is fixed
Link block is installed.
By using above-mentioned technical proposal, trimethyl aluminium and vapor can be carried out by reaction treatment by heater strip, it can
Accelerate the speed of reaction.
In some embodiments, the upper end outer surface of the heater strip is fixedly installed with conduit, and conduit is in uniform parallel
It places.
By using above-mentioned technical proposal, the water for discharging into furnace interior can be evenly distributed in by heater strip by conduit
Surface on, convenient for the abundant of reaction.
In some embodiments, cylinder, and the upper end appearance of cylinder are fixedly installed between the two neighboring pallet
Face offers aperture.
By using above-mentioned technical proposal, pallet can be made to generate displacement, when being filtered to gas, energy by cylinder
Enough reduce the friction between component.
In some embodiments, the strainer is in burr-shaped, and strainer is internally provided with frame.
By using above-mentioned technical proposal, strainer is in burr structure, it can be made sufficiently to be contacted with gas, Ke Yigeng
Good is filtered gas.
In some embodiments, a side external surface of the furnace body is provided with power interface, and the inside of furnace body is close
The position of strainer is provided with pump, and the output end of power interface is electrically connected the input terminal of pump.
By using above-mentioned technical proposal, electric energy is provided to device by power interface, in the mistake being filtered to gas
Pump is constantly in evacuated state in journey.
In conclusion the utility model has the following beneficial effects:
The atomic layer deposition apparatus gas-filtering device, in use, gas can be filtered by strainer, strainer is in hair
Structure is pierced, preferably gas can be filtered, wherein there is trimethyl aluminium to be attached on strainer, be filtered to gas
When, it need to carry out adding water by the water inlet pipe that a side external surface of furnace body is fixedly mounted, trimethyl aluminium is reacted with water can generate three
Al 2 O and hydrogen can carry out trimethyl aluminium with vapor to react place by the heater strip that the lower end of strainer is fixedly mounted
Reason, pump is constantly in evacuated state in this process, and the dosage of trimethyl aluminium is less in this process, last generation
Object has hydrogen gas and water and nitrogen, and gas passes through top bracing mechanism again later, is finally discharged by escape pipe, top bracing mechanism includes gas
Cylinder and pallet can reduce the friction between component, convenient for the operation of user, during gas treatment, and filter vat energy
Enough get rid of the impurity in gas, the efficiency of the controllable filtering of the valve being arranged between combined filtering bucket and furnace body, the above filtering
The impurity that process generates is less able to the case where avoiding blocking, and the filter effect of gas is also preferable, convenient for the use of user.
The additional aspect and advantage of the utility model embodiment will be set forth in part in the description, partially will be under
Become obvious in the description in face, or is recognized by the practice of the utility model.
Detailed description of the invention
In description of the above-mentioned and/or additional aspect and advantage of the utility model from combination following accompanying drawings to embodiment
It will be apparent and be readily appreciated that, in which:
Fig. 1 is the overall structure diagram of the utility model；
Fig. 2 is that the furnace body and air inlet pipe of the utility model matches view.
Specific embodiment
The embodiments of the present invention is described below in detail, the example of the embodiment is shown in the accompanying drawings, wherein
Same or similar label indicates same or similar element or element with the same or similar functions from beginning to end.Lead to below
It crosses the embodiment being described with reference to the drawings to be exemplary, is only used for explaining the utility model, and should not be understood as practical to this
Novel limitation.
In the description of the present invention, it should be understood that term " center ", " longitudinal direction ", " transverse direction ", " length ", " width
Degree ", " thickness ", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outside",
The orientation or positional relationship of the instructions such as " clockwise ", " counterclockwise " be based on the orientation or positional relationship shown in the drawings, be only for
Convenient for description the utility model and simplify description, rather than the device or element of indication or suggestion meaning must have specifically
Orientation is constructed and operated in a specific orientation, therefore should not be understood as limiting the present invention.In addition, term " first ",
" second " is used for descriptive purposes only and cannot be understood as indicating or suggesting relative importance or implicitly indicates indicated technology
The quantity of feature.Define " first " as a result, the feature of " second " can explicitly or implicitly include it is one or more
The feature.The meaning of " plurality " is two or more in the description of the present invention, unless otherwise clearly specific
It limits.
In the description of the present invention, it should be noted that unless otherwise clearly defined and limited, term " is pacified
Dress ", " connected ", " connection " shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or integrally
Connection；It can be mechanical connection, be also possible to be electrically connected or can mutually communicate；It can be directly connected, it can also be in
Between medium be indirectly connected, can be the connection inside two elements or the interaction relationship of two elements.For this field
For those of ordinary skill, the concrete meaning of above-mentioned term in the present invention can be understood as the case may be.
In the description of the present invention, unless otherwise clearly defined and limited, fisrt feature second feature it
"upper" or "lower" may include that the first and second features directly contact, may include the first and second features be not directly to connect yet
It touches but by the other characterisation contact between them.Moreover, fisrt feature second feature " on ", " top " and " on
Face " includes fisrt feature right above second feature and oblique upper, or to be merely representative of first feature horizontal height special higher than second
Sign.Fisrt feature include under the second feature " below ", " below " and " below " fisrt feature immediately below second feature and obliquely downward
Side, or first feature horizontal height is merely representative of less than second feature.
Following disclosure provides many different embodiments or example is used to realize the different structure of the utility model.
In order to simplify the disclosure of the utility model, hereinafter the component of specific examples and setting are described.Certainly, they are only
Example, and purpose does not lie in limitation the utility model.In addition, the utility model can in different examples repeat reference numerals
And/or reference letter, this repetition are for purposes of simplicity and clarity, itself not indicate discussed various embodiments
And/or the relationship between setting.In addition, the example of various specific techniques and material that the utility model provides, but this
Field those of ordinary skill can be appreciated that the application of other techniques and/or the use of other materials.
Fig. 1 and Fig. 2 are please referred to, a kind of atomic layer deposition apparatus that the utility model embodiment provides is filled with gas filtration
It sets, including furnace body 1, bottom plate 2 is fixedly mounted in the lower end outer surface of furnace body 1, and idler wheel 3 is installed in the lower end activity of bottom plate 2, furnace body 1
Air inlet pipe 4 is fixedly mounted in back end outer surface, and water inlet pipe 5 is fixedly mounted in a side external surface of furnace body 1, and the inside of furnace body 1 is under
Strainer 6 is fixedly mounted in the position at end, and gas first can be filtered by strainer 6, and strainer 6 is in burr structure, can be better
Gas is filtered, wherein there is trimethyl aluminium to be attached on strainer 6, when being filtered to gas, need to by water inlet pipe 5 into
Row plus water, trimethyl aluminium is reacted with water can generate aluminum oxide and hydrogen, by heater strip 14 can by trimethyl aluminium and
Vapor carries out reaction treatment, and pump is constantly in evacuated state in this process, the position of the inside of furnace body 1 close to upper end
Pallet 9 is fixedly mounted, top plate 13 is fixedly mounted in the upper end outer surface of furnace body 1, and filter vat 12, filtering is arranged in the other side of furnace body 1
Valve 11 is set between bucket 12 and furnace body 1, and fixed block 7, the upper end of top plate 13 is fixedly mounted in the middle position of the outer surface of furnace body 1
Escape pipe 10 is fixedly mounted in outer surface, is finally discharged by escape pipe 10, top bracing mechanism includes cylinder 8 and pallet 9, can be subtracted
Friction between few component, convenient for the operation of user, during gas treatment, filter vat 12 can be got rid of in gas
Impurity, in conjunction with the efficiency of the controllable filtering of valve 11, the impurity that the above filtering process generates is less able to avoid the feelings of blocking
The filter effect of condition, gas is also preferable.
In some embodiments, the lower end of strainer 6 is fixedly installed with heater strip 14, and the outer surface of heater strip 14 is fixed
Link block is installed, trimethyl aluminium and vapor can be carried out by reaction treatment by heater strip 14, the speed of reaction can be accelerated.
In some embodiments, the upper end outer surface of heater strip 14 is fixedly installed with conduit, and conduit is put in uniform parallel
It sets, the water inside furnace body 1 can will be discharged by conduit and be evenly distributed on the surface of heater strip 14, convenient for filling for reaction
Point.
In some embodiments, cylinder 8, and the upper end outer surface of cylinder 8 are fixedly installed between two neighboring pallet 9
Aperture is offered, pallet 9 can be made to generate displacement by cylinder 8, when being filtered to gas, can reduced between component
Friction.
In some embodiments, strainer 6 is in burr-shaped, and strainer 6 is internally provided with frame, and strainer 6 is in burr knot
Structure can be such that it is sufficiently contacted with gas, can preferably be filtered to gas.
In some embodiments, a side external surface of furnace body 1 is provided with power interface, and the inside of furnace body 1 is close to filter
The position of net 6 is provided with pump, and the output end of power interface is electrically connected the input terminal of pump, provides electricity to device by power interface
Can, pump is constantly in evacuated state during being filtered to gas.
It should be noted that the utility model is a kind of atomic layer deposition apparatus gas-filtering device, in use, first
Device need to be moved to job site by idler wheel 3 by user, and when in use, user can divide air inlet pipe 4 and escape pipe 10
Lian Jie upper other equipment carry out using giving device to provide electric energy by power interface again later, led in gas by air inlet pipe 4
When entering to the inside of furnace body 1, gas can be filtered by strainer 6 first, and strainer 6 is in burr structure, can be preferably to gas
Body is filtered, wherein there is trimethyl aluminium to be attached on strainer 6, when being filtered to gas, need to be added by water inlet pipe 5
Water, trimethyl aluminium is reacted with water can generate aluminum oxide and hydrogen, can be steamed trimethyl aluminium and water by heater strip 14
Gas carries out reaction treatment, and pump is constantly in evacuated state, the model 150QJ20-78 of pump, in this mistake in this process
The dosage of trimethyl aluminium is less in journey, and last product has hydrogen gas and water and nitrogen, and gas passes through top bracing mechanism again later, most
It is discharged afterwards by escape pipe 10, top bracing mechanism includes cylinder 8 and pallet 9, can reduce the friction between component, is easy to use
The operation of person, during gas treatment, filter vat 12 can get rid of the impurity in gas, can control in conjunction with valve 11
The efficiency of filter, the impurity that the above filtering process generates are less able to the case where avoiding blocking, and the filter effect of gas is also preferable, has
Effect increases the functionality of its own, more practical.
In the description of this specification, reference term " embodiment ", " certain embodiments ", " schematically implementation
What the description of mode ", " example ", " specific example " or " some examples " etc. meant to describe in conjunction with the embodiment or example
Particular features, structures, materials, or characteristics are contained at least one embodiment or example of the utility model.In this explanation
In book, schematic expression of the above terms are not necessarily referring to identical embodiment or example.Moreover, the specific spy of description
Sign, structure, material or feature can be combined in any suitable manner in any one or more embodiments or example.
While there has been shown and described that the embodiments of the present invention, those skilled in the art can manage
Solution: a variety of to the progress of these embodiments can change in the case where not departing from the principles of the present invention and objective, modify,
Replacement and variant, the scope of the utility model are defined by the claims and their equivalents.
Claims (6)
1. a kind of atomic layer deposition apparatus gas-filtering device, including furnace body (1), it is characterised in that: under the furnace body (1)
End outer surface is fixedly installed with bottom plate (2), and the lower end of bottom plate (2) is movably installed with idler wheel (3), the rear end of the furnace body (1)
Outer surface is fixedly installed with air inlet pipe (4), and a side external surface of furnace body (1) is fixedly installed with water inlet pipe (5), the furnace body
(1) inside is fixedly installed with strainer (6) close to the position of lower end, and the inside of furnace body (1) is close to the fixed peace in position of upper end
Equipped with pallet (9), the upper end outer surface of the furnace body (1) is fixedly installed with top plate (13), and the upper end outer surface of top plate (13)
It is fixedly installed with escape pipe (10), the other side of the furnace body (1) is provided with filter vat (12), and filter vat (12) and furnace body
(1) it is provided between valve (11), the middle position of the outer surface of the furnace body (1) is fixedly installed with fixed block (7).
2. atomic layer deposition apparatus gas-filtering device according to claim 1, it is characterised in that: the strainer (6)
Lower end be fixedly installed with heater strip (14), and the outer surface of heater strip (14) is fixedly installed with link block.
3. atomic layer deposition apparatus gas-filtering device according to claim 2, it is characterised in that: the heater strip
(14) upper end outer surface is fixedly installed with conduit, and conduit is placed in uniform parallel.
4. atomic layer deposition apparatus gas-filtering device according to claim 1, it is characterised in that: two neighboring described
It is fixedly installed between pallet (9) cylinder (8), and the upper end outer surface of cylinder (8) offers aperture.
5. atomic layer deposition apparatus gas-filtering device according to claim 1, it is characterised in that: the strainer (6)
In burr-shaped, and strainer (6) is internally provided with frame.
6. atomic layer deposition apparatus gas-filtering device according to claim 1, it is characterised in that: the furnace body (1)
A side external surface be provided with power interface, and the inside of furnace body (1) is provided with pump, power interface close to the position of strainer (6)
Output end be electrically connected pump input terminal.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821616674.4U CN208829760U (en) | 2018-09-30 | 2018-09-30 | Atomic layer deposition apparatus gas-filtering device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821616674.4U CN208829760U (en) | 2018-09-30 | 2018-09-30 | Atomic layer deposition apparatus gas-filtering device |
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| Publication Number | Publication Date |
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| CN208829760U true CN208829760U (en) | 2019-05-07 |
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| CN201821616674.4U Active CN208829760U (en) | 2018-09-30 | 2018-09-30 | Atomic layer deposition apparatus gas-filtering device |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111036013A (en) * | 2019-08-14 | 2020-04-21 | 湖南红太阳光电科技有限公司 | Tail gas dust capturing device for tubular PECVD (plasma enhanced chemical vapor deposition) equipment |
| CN112391611A (en) * | 2019-08-14 | 2021-02-23 | 湖南红太阳光电科技有限公司 | Plasma enhanced atomic layer deposition coating device |
-
2018
- 2018-09-30 CN CN201821616674.4U patent/CN208829760U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111036013A (en) * | 2019-08-14 | 2020-04-21 | 湖南红太阳光电科技有限公司 | Tail gas dust capturing device for tubular PECVD (plasma enhanced chemical vapor deposition) equipment |
| CN112391611A (en) * | 2019-08-14 | 2021-02-23 | 湖南红太阳光电科技有限公司 | Plasma enhanced atomic layer deposition coating device |
| CN111036013B (en) * | 2019-08-14 | 2021-11-26 | 湖南红太阳光电科技有限公司 | Tail gas dust capturing device for tubular PECVD (plasma enhanced chemical vapor deposition) equipment |
| CN112391611B (en) * | 2019-08-14 | 2023-05-26 | 湖南红太阳光电科技有限公司 | Plasma enhanced atomic layer deposition coating device |
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