CN208809763U - One kind being applied to semiconductor waste gas processing equipment plasma electrode device - Google Patents
One kind being applied to semiconductor waste gas processing equipment plasma electrode device Download PDFInfo
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- CN208809763U CN208809763U CN201821064385.8U CN201821064385U CN208809763U CN 208809763 U CN208809763 U CN 208809763U CN 201821064385 U CN201821064385 U CN 201821064385U CN 208809763 U CN208809763 U CN 208809763U
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- cathode
- anode
- exocoel
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- processing equipment
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Abstract
The utility model discloses one kind to be applied to semiconductor waste gas processing equipment plasma electrode device, including connecting head, it has been connected through a screw thread on the downside of connection head into water connector, conduit is installed on the downside of water inlet connecting rod, cathode sheath is connected on the outside of conduit, cathode sheath lower end is equipped with cathode, cathode outer side is fixedly connected with cathode fixed ring, insulation sleeve is fixedly connected on the outside of cathode sheath, gas rotation ring is installed on the outside of insulation sleeve, anode exocoel is connected on the downside of cathode exocoel, anode outer chamber lower end is provided with magnetic pole set, magnetic pole covers internal upper and lower ends and is equipped with magnet ring, anode is installed on the inside of magnet ring, anode lower end is attached with water guide dish, anode upper end is attached by anode housing and anode exocoel.The utility model exhaust-gas treatment effect is good, quick heating, directly shortens the maintenance time, increases yield, increases economic efficiency, improve the security performance of gas supply, system.
Description
Technical field
The utility model relates to a kind of semiconductor field, it is specifically a kind of be applied to semiconductor waste gas processing equipment with etc. from
Sub-electrode device.
Background technique
Semiconductor (semiconductor) refers to that electric conductivity is between conductor (conductor) and insulator under room temperature
(insulator) material between.Semiconductor has a wide range of applications on radio, television set and thermometric.Such as diode
It is exactly the device using semiconductor fabrication.Semiconductor refers to that a kind of electric conductivity can be controlled, range can from insulator to conductor it
Between material.No matter from the perspective of science and technology or economic development, the importance of semiconductor is all very huge.Today is big
Partial electronic product, as the core cell in computer, mobile phone or digital audio tape all has pole with semiconductor
For close connection.Common semiconductor material has silicon, germanium, GaAs etc., and silicon is even more in various semiconductor materials, in business
Using upper most influential one kind.Semiconductor can be divided into four class products, be integrated circuit respectively, opto-electronic device, divide
Device and sensor are found, four classes can all generate exhaust gas in production and processing, all need using waste gas treatment equipment.
The existing scheme applied in semiconductor waste gas processing equipment has: (1) heating wire/stick heated type, by heating wire/stick
Computer heating control will decompose between 600-1000 DEG C by the high exhaust temperatures of reaction cavity, but heating wire/bar mode, heating
Temperature is low, exhaust-gas treatment effect is poor, it is incomplete to decompose, heat up slow, low efficiency etc..(2) natural gas/combustion of hydrogen formula, oxygen
Or the combustion-supporting gases such as air will be by the high exhaust temperatures combustion decomposition of reaction cavity, but natural gas/combustion of hydrogen formula, to hydrogen
Purity requirement is high, needs supply systems such as hydrogen, oxygen etc., there is certain risk, such as explosive.(3) activated carbon adsorption
Formula, will by the harmful toxic matter absorption in active carbon exhaust gas, activated carbon adsorption formula, can only absorbed portion toxic gas, be applicable in model
Limited, limited sorption capacity is enclosed, blocking is easy, needs to regularly replace.Therefore, those skilled in the art provide a kind of be applied to partly
Conductor waste gas treatment equipment plasma electrode device, to solve the problems mentioned in the above background technology.
Utility model content
The purpose of this utility model is to provide one kind to be applied to semiconductor waste gas processing equipment plasma electrode device,
To solve the problems mentioned in the above background technology.
To achieve the above object, the utility model provides the following technical solutions:
One kind being applied to semiconductor waste gas processing equipment plasma electrode device, including connection head, the connection water
Head downside has been connected through a screw thread into water connector, and the water inlet connecting rod downside is equipped with conduit, connection on the outside of the conduit
There is cathode sheath, the cathode sheath lower end is equipped with cathode, and the cathode outer side is fixedly connected with cathode fixed ring, the cathode sheath
Outside is fixedly connected with insulation sleeve, and gas rotation ring is equipped on the outside of the insulation sleeve, is equipped with cathode on the outside of the gas rotation ring
Outer chamber, the cathode exocoel upside and water inlet connector are attached, and are connected with anode exocoel on the downside of the cathode exocoel,
Anode outer chamber lower end is provided with magnetic pole set, and the magnetic pole covers internal upper and lower ends and is equipped with magnet ring, in the magnet ring
Side is equipped with anode, and the anode is mounted on the fixed position in lower section of cathode, and the anode upper end passes through O-ring seal and anode
Exocoel is attached, and is attached on the downside of the anode exocoel by screw and air-guide disk.
As a further solution of the present invention: the cathode designs for deep trouth, better cooling effect can be played.
As a further solution of the present invention: the cathode upper end is attached by O-ring seal and cathode sheath,
Play the role of sealing, isolation water.
As a further solution of the present invention: anode exocoel upper end is connected by bolt and cathode exocoel
It connects.
As a further solution of the present invention: the magnet ring lower end is provided with insulating barrier, play anti-well
Shield effect.
Water guide dish, the water guide are provided on the downside of the insulating barrier of lower end as a further solution of the present invention,
Disk is mounted on anode outer chamber lower end.
Compared with prior art, the utility model has the beneficial effects that 1) the utility model plasma-arc temperature can be with
Reach 10000 DEG C to 15000 DEG C, so that exhaust gas moment is pyrolyzed and is ionized, form fairly simple easy-to-handle point by processing
Son, exhaust-gas treatment effect are substantially better than other processing modes.
2) the utility model has the good effect that cools, and cathode exocoel and anode outer chamber design flowing water are logical
Road, water that the high temperature that cathode is generated with anode rapidly can be cooled are taken away.
3) the utility model cathode and anode are made of high conductivity, high thermal conductivity and oxidation resistant special material, can be with
The impact of long-time high-temperature electric arc is born, the design of magnet ring can effectively control pencil electric arc, and protect anode not by arc erosion,
Service life between 6 months to 18 months, can satisfy actual demand according to the difference of processing procedure completely.
4) the utility model air-guide disk be individually gas supply, to anode arc torch export jet, protect anode lower end not by
It corrodes and prevents the congestion of exhaust gas solidfied material around outlet.
5) the utility model is mounted on reaction cavity upper vertical direction, and exhaust gas enters around this device, reaction cavity
Conical design can allow exhaust gas and torch comes into full contact with and reaches treatment effect.
6) the utility model is compared with electrical heating type, and plasma formula has electrical energy demands suitable, but energy efficiency be higher by it is more
Times, temperature is high and gas ionization exhaust-gas treatment effect is good, quick heating, directly shortens the maintenance time, increases yield, improves
Economic benefit.
7) compared with combustion-type, plasma has installation simple, does not need individual hydrogen/natural gas, oxygen gas supply system
System, it is only necessary to be easily obtained and improve gas supply, system safety in operation with cheap nitrogen, reduction operating cost.Temperature height and gas
It is more preferable that body ionizes treatment effect.
Detailed description of the invention
Fig. 1 is a kind of structural schematic diagram applied to semiconductor waste gas processing equipment plasma electrode device.
Specific embodiment
It should be noted that in the absence of conflict, the feature in the embodiments of the present invention and embodiment can
To be combined with each other.
In the description of the present invention, it should be understood that term " center ", " longitudinal direction ", " transverse direction ", "upper", "lower",
The orientation or positional relationship of the instructions such as "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outside" is
It is based on the orientation or positional relationship shown in the drawings, is merely for convenience of describing the present invention and simplifying the description, rather than indicate
Or imply that signified device or element must have a particular orientation, be constructed and operated in a specific orientation, therefore cannot understand
For limitations of the present invention.In addition, term " first ", " second " etc. are used for description purposes only, and should not be understood as indicating
Or it implies relative importance or implicitly indicates the quantity of indicated technical characteristic." first ", " second " etc. are defined as a result,
Feature can explicitly or implicitly include one or more of the features.It is in the description of the present invention, unless another
It is described, the meaning of " plurality " is two or more.
In the description of the present invention, it should be noted that unless otherwise clearly defined and limited, term " is pacified
Dress ", " connected ", " connection " shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or integrally
Connection；It can be mechanical connection, be also possible to be electrically connected；Can be directly connected, can also indirectly connected through an intermediary,
It can be the connection inside two elements.For the ordinary skill in the art, on being understood by concrete condition
State the concrete meaning of term in the present invention.
The utility model will be described in detail below with reference to the accompanying drawings and embodiments.
Refering to fig. 1, in the utility model embodiment, one kind being applied to semiconductor waste gas processing equipment and filled with plasma electrode
It sets, including connection head 1, has been connected through a screw thread on the downside of the connection head 1 into water connector 2, can be convenient equipment progress
Cooling Water is equipped with conduit 3 on the downside of the water inlet connecting rod 2, cathode sheath 4, the cathode sheath is connected on the outside of the conduit 3
4 lower ends are equipped with cathode 5, and cathode sheath 4 can effectively act as isolation cooling water and install the effect of cathode 5, and conduit 3 can incite somebody to action
Cooling water is sent at cathode 5, and the cathode 5 designs for deep trouth, can play better cooling effect, and 5 upper end of cathode is logical
It crosses O-ring seal to be attached with cathode sheath 4, cooling water can be effectively isolated, be fixedly connected with cathode on the outside of the cathode 5
Fixed ring 8 is fixedly connected with insulation sleeve 6 on the outside of the cathode sheath 4, can effectively act as insulation, fixed effect, it is described absolutely
6 outside of edge set is equipped with gas rotation ring 9, and nitrogen can make nitrogen enter cathode and plasma electric by the stomata that gas revolves ring 9
Position on the outside of arc, in this way for enhance the compression to arc column and concentrate plasma arc energy more, jet power it is stronger,
Cathode exocoel 7 is installed, 7 upside of cathode exocoel and water inlet connector 2 are attached, described on the outside of the gas rotation ring 9
Anode exocoel 16 is connected on the outside of cathode exocoel 7,16 upper end of anode exocoel is attached by bolt with cathode exocoel 7,
16 interior lower end of anode exocoel is provided with magnetic pole set 15, can be convenient the installation of internal equipment, and the magnetic pole covers in 15
Portion's upper and lower ends are equipped with magnet ring 14, and 14 lower end of magnet ring is provided with insulating barrier 13, plays good protective action, under
It is provided with water guide dish 12 on the downside of the insulating barrier 13 at end, plays the role of fixed magnet ring 14 and magnet ring set 15 and cooling water water conservancy diversion,
The water guide dish 12 is mounted on 16 interior lower end of anode exocoel, and anode 11 is equipped on the inside of the magnet ring 14, and the anode 11 is pacified
Mounted in the fixed position in the lower section of cathode 5, cathode 5 is isolated with anode 11 by insulating gas, passes through distance between the two and electricity
Striking is pressed, one end Jie cathode exocoel of power supply, an end Jie anode exocoel, 11 lower end of anode is connected with water guide dish 12
It connects, 11 upper end of anode is attached by O-ring seal with anode exocoel 16, passes through screw on the downside of the anode exocoel 16
It is attached with air-guide disk 10.
The utility model needs independent power controling box, is fed back by the detection to electric current, voltage, and control is output to electricity
The power supply of pole achievees the purpose that stabilized plasma electric arc, and voltage general control range is between 100V-200V, current control model
It is trapped among 50-100A, and cathode 5 is isolated with anode 11 by insulating gas, passes through distance and voltage striking between the two, electricity
One end Jie cathode exocoel 7 of source, an end Jie anode exocoel 16 is when such equipment is worked, between cathode 5 and anode 11
Stable plasma-arc can be formed, and plasma-arc temperature can achieve 10000 DEG C to 15000 DEG C, make exhaust gas wink
Between be pyrolyzed and ionization, form fairly simple easy-to-handle molecule by processing, exhaust-gas treatment effect is substantially better than other places
Reason mode, and cathode 5 is made with anode 11 of high conductivity, high thermal conductivity and oxidation resistant special material, can bear to grow
The impact of time high-temperature electric arc, the design of magnet ring 14 can effectively control pencil electric arc, and anode is protected by arc erosion, not use
Service life can satisfy actual demand, the cooling water in outside is set between 6 months to 18 months according to the difference of processing procedure completely
Set, there is the good effect that cools, cathode exocoel 7 and 16 interior design pipelined channel of anode exocoel, can by cathode with
The high temperature that anode generates rapidly take away by cooled water.
It is obvious to a person skilled in the art that the present invention is not limited to the details of the above exemplary embodiments, and
And without departing substantially from the spirit or essential attributes of the utility model, it can realize that this is practical new in other specific forms
Type.Therefore, in all respects, the present embodiments are to be considered as illustrative and not restrictive, this is practical new
The range of type is indicated by the appended claims rather than the foregoing description, it is intended that containing for the equivalent requirements of the claims will be fallen in
All changes in justice and range are embraced therein.It should not treat any reference in the claims as limiting
Related claim.
In addition, it should be understood that although this specification is described in terms of embodiments, but not each embodiment is only wrapped
Containing an independent technical solution, this description of the specification is merely for the sake of clarity, and those skilled in the art should
It considers the specification as a whole, the technical solutions in the various embodiments may also be suitably combined, forms those skilled in the art
The other embodiments being understood that.
Claims (6)
1. one kind is applied to semiconductor waste gas processing equipment plasma electrode device, including connection head, the connection head
Downside has been connected through a screw thread into water connector, and the water inlet connecting rod downside is equipped with conduit, is connected on the outside of the conduit
Cathode sheath, which is characterized in that the cathode sheath lower end is equipped with cathode, and the cathode outer side is fixedly connected with cathode fixed ring,
It is fixedly connected with insulation sleeve on the outside of the cathode sheath, gas rotation ring, the gas rotation ring outside are installed on the outside of the insulation sleeve
Cathode outer chamber is installed, is attached on the upside of the cathode exocoel with water inlet connector, connection on the downside of the cathode exocoel
There is anode exocoel, anode outer chamber lower end is provided with magnetic pole set, and the magnetic pole covers internal upper and lower ends and is equipped with magnet ring,
Anode is installed, the anode is mounted on the fixed position in lower section of cathode, and the anode upper end passes through O-shaped close on the inside of the magnet ring
Seal is attached with anode exocoel, is attached on the downside of the anode exocoel by screw and air-guide disk.
2. according to claim 1 a kind of applied to semiconductor waste gas processing equipment plasma electrode device, feature
It is, the cathode designs for deep trouth.
3. it is according to claim 1 or 2 a kind of applied to semiconductor waste gas processing equipment plasma electrode device, it is special
Sign is that the cathode upper end is attached by O-ring seal and cathode sheath.
4. according to claim 1 a kind of applied to semiconductor waste gas processing equipment plasma electrode device, feature
It is, anode exocoel upper end is attached by bolt and cathode exocoel.
5. according to claim 1 a kind of applied to semiconductor waste gas processing equipment plasma electrode device, feature
It is, the magnet ring lower end is provided with insulating barrier.
6. a kind of according to claim 1 or 5 be applied to semiconductor waste gas processing equipment plasma electrode device, spy
Sign is, is provided with water guide dish on the downside of the insulating barrier of lower end, the water guide dish is mounted on anode outer chamber lower end.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821064385.8U CN208809763U (en) | 2018-07-06 | 2018-07-06 | One kind being applied to semiconductor waste gas processing equipment plasma electrode device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821064385.8U CN208809763U (en) | 2018-07-06 | 2018-07-06 | One kind being applied to semiconductor waste gas processing equipment plasma electrode device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN208809763U true CN208809763U (en) | 2019-05-03 |
Family
ID=66270443
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821064385.8U Expired - Fee Related CN208809763U (en) | 2018-07-06 | 2018-07-06 | One kind being applied to semiconductor waste gas processing equipment plasma electrode device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN208809763U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108744902A (en) * | 2018-07-06 | 2018-11-06 | 上海高生集成电路设备有限公司 | One kind being applied to semiconductor waste gas processing equipment plasma electrode device |
-
2018
- 2018-07-06 CN CN201821064385.8U patent/CN208809763U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108744902A (en) * | 2018-07-06 | 2018-11-06 | 上海高生集成电路设备有限公司 | One kind being applied to semiconductor waste gas processing equipment plasma electrode device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20190503 Termination date: 20190706 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |