CN208796977U - A kind of silicon wafer rotary table of ion implantation apparatus - Google Patents

A kind of silicon wafer rotary table of ion implantation apparatus Download PDF

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Publication number
CN208796977U
CN208796977U CN201821651109.1U CN201821651109U CN208796977U CN 208796977 U CN208796977 U CN 208796977U CN 201821651109 U CN201821651109 U CN 201821651109U CN 208796977 U CN208796977 U CN 208796977U
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China
Prior art keywords
silicon wafer
disk body
rotation
rotation plate
plate rail
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CN201821651109.1U
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Chinese (zh)
Inventor
丁桃宝
肖加政
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Jiangsu jinyuda Semiconductor Co.,Ltd.
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Suzhou Shanxi Yuda Industrial Ltd By Share Ltd
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Abstract

The utility model discloses a kind of silicon wafer rotary tables of ion implantation apparatus, including being rotatablely installed in the intracorporal revolution disk body of swinging disc, the revolution power device of driving revolution disk body rotation is provided on the swing disk body, the revolution disk body is removably mounted to swing on disk body, several rotation plate rails are evenly distributed on revolution disk body, the rotation plate rail is removably mounted on revolution disk body, each rotation plate rail is driven by rotation power device, the placement region for placing silicon wafer is provided on the rotation plate rail, the gripping mechanism of silicon chip edge is provided with for clamping or unclamped on the rotation plate rail.The silicon wafer rotary table can be convenient installation silicon wafer, while save the waiting time as far as possible, improve the injection efficiency of ion implantation apparatus.

Description

A kind of silicon wafer rotary table of ion implantation apparatus
Technical field
The utility model relates to a kind of silicon wafer public affairs sabot, for use on ion implantation apparatus for install silicon wafer it is convenient from The silicon wafer public affairs sabot of son injection.
Background technique
Ion implantation apparatus is a kind of equipment used in semiconductor production process, and principle is more by ion source generation Kind ion, then screens different kinds of ions by magnet analyzer, and final useful object ion forms ion beam, ion Beam after accelerating the acceleration in magnetic field by that can be directly injected into silicon wafer.So current silicon wafer public affairs sabot includes including rotation It is installed on the intracorporal revolution disk body of swinging disc, it is described to swing the revolution power dress that driving revolution disk body rotation is provided on disk body It sets, swinging disk body is to be switched by swing mechanism driving in vertical position and horizontal position, and swing disk body is in vertical position Cooperate with end cap, this position is also ion implanting position.So current silicon wafer rotary table has the disadvantage in that the installation of 1, silicon wafer And it is unreasonable, due to needing to install multiple silicon wafers in rotary table, thus rotary table is relatively large sized, and installation is more troublesome, When installing silicon wafer simultaneously, ion implanting chance is in standby wait state, inefficient;2, current silicon wafer needs after mounting Silicon wafer does not loosen when gripping mechanism compression could facilitate rotary table to revolve, and the gripping mechanism of current osteocomma compression silicon wafer cannot Tension, it is broken that tension may cause silicon wafer, and silicon wafer when being put into due to needing to overcome the clamping force of gripping mechanism to be clamped, Therefore Fragmentation Phenomena is also likely to be present when silicon wafer is placed.
Utility model content
The technical problem to be solved by the utility model is to provide a kind of silicon wafer rotary table of ion implantation apparatus, the silicon wafers Rotary table can be convenient installation silicon wafer, while save the waiting time as far as possible, improve the injection efficiency of ion implantation apparatus.
In order to solve the above technical problems, the technical solution of the utility model is: a kind of silicon wafer rotary table of ion implantation apparatus, It is described to swing the revolution that driving revolution disk body rotation is provided on disk body including rotational installation in the intracorporal revolution disk body of swinging disc Power device, the revolution disk body are removably mounted to swing on disk body, are evenly distributed in several autorotation disks on the disk body that revolves Frame, the rotation plate rail be removably mounted to revolution disk body on, each rotation plate rail by rotation power device drive, it is described from It is provided with the placement region for placing silicon wafer on turntable mounting, be provided on the rotation plate rail for clamping or unclamps silicon chip edge Gripping mechanism.
As a preferred solution, the gripping mechanism includes circumference uniform distribution at least three cards of placement region periphery Tight block, the clamping block horizontal resiliency are slidably mounted on rotation plate rail, are provided on the clamping block to placement region center-diameter Have between being adapted to silicon wafer thickness to the inclined end portion of extension, between the bottom of the inclined end portion and the bottom of placement region Gap.
As a preferred solution, the clamping block includes clamping block body and the guiding that is set on clamping block body Bar, the free end level of the guide rod run through rotation plate rail and exposing, are provided with thread segment on the free end of the guide rod And stop nut is installed, compressed spring is provided between the clamping block body and rotation plate rail.
As a preferred solution, the corner of the inclined end portion of the clamping block body is circular arc chamfering, and is tilted The external margin of end is provided with wear-resistant plastic layer.
As a preferred solution, the clamping block includes clamping block body and is set on clamping block body at least Two guide rods, the clamping block are slidably mounted on rotation plate rail by the guide rod level, water on the clamping block body It is flat to be fixed with adjusting screw rod, it is rotatably equipped with adjusting nut on the rotation plate rail, the adjusting nut and adjusting screw rod screw thread connect It connects.
As a preferred solution, it is rotatably equipped with central axis at the center for swinging disk body, the central axis is by public affairs The driving of rotatory force device, the revolution disk body are removably fixed on central axis.
As a preferred solution, the upper end of the central axis is from top to bottom provided with threaded shaft section and polygon shaft Section, the revolution disk body are provided centrally with the polygonal hole being adapted to polygon shaft part, and the polygonal hole is set in polygon Shape shaft part, screw thread is equipped with the pressure cap for clamping revolution disk body on the threaded shaft section on central axis.
As a preferred solution, elastic filler block is provided in the placement region of the rotation plate rail.
As a preferred solution, it is rotatably equipped with the axis of rotation on the revolution disk body, which is filled by rotation power Driving is set, the thread segment opposite with axis of rotation direction of rotation is provided on the axis of rotation, the rotation plate rail screw thread is installed on certainly On the thread segment of shaft.
After above-mentioned technical proposal, the effect of the utility model is: driving revolution is provided on the swing disk body The revolution power device of disk body rotation, the revolution disk body are removably mounted to swing on disk body, circumference uniform distribution on the disk body that revolves There are several rotation plate rails, the rotation plate rail is removably mounted on revolution disk body, and each rotation plate rail is by rotation power Device drives, and the placement region for placing silicon wafer is provided on the rotation plate rail, is provided on the rotation plate rail for card Gripping mechanism that is tight or unclamping silicon chip edge, in this way, the revolution disk body of the silicon wafer rotary table can be dismantled, then when a disk silicon wafer After the completion of injection, directly revolution disk body integrally can be taken out, then replace another rotary table for having installed silicon wafer The replacement of body, silicon wafer can be completed during silicon wafer injects, and be greatly saved the replacement waiting time in this way, meanwhile, from Turntable mounting is also to be removably mounted on revolution disk body, therefore rotation plate rail can be removed to installation when carrying out silicon wafer installation, It is easier for installation, while operator more can control the dynamics of installation, avoid causing breakage to silicon wafer when installation.
Again since the gripping mechanism includes circumference uniform distribution at least three clamping blocks of placement region periphery, the clamping block Horizontal resiliency is slidably mounted on rotation plate rail, and the beveled end radially extended to placement region is provided on the clamping block Portion has the gap being adapted to silicon wafer thickness, clamping block tool between the bottom of the inclined end portion and the bottom of placement region There is inclined end portion, therefore, clamping block receives horizontal distracted power to Elastic Sliding when installing silicon wafer, facilitates putting for silicon wafer It sets.
Again due to the guide rod that the clamping block includes clamping block body and is set on clamping block body, the guide rod Free end level run through rotation plate rail and exposing, be provided with thread segment on the free end of the guide rod and limit spiral shell be installed Mother is provided with compressed spring between the clamping block body and rotation plate rail.The corner of the inclined end portion of the clamping block body It is circular arc chamfering, and the external margin of inclined end portion is provided with wear-resistant plastic layer, utilizes the adjustable clamping of stop nut Block body compress silicon wafer position, and wear-resistant plastic layer can to avoid with silicon wafer hard collision.
It, should again due at least two guide rods that the clamping block includes clamping block body and is set on clamping block body Clamping block is slidably mounted on rotation plate rail by the guide rod level, is horizontally fixed with adjusting spiral shell on the clamping block body Bar is rotatably equipped with adjusting nut on the rotation plate rail, which is threadedly coupled with adjusting screw rod, passes through adjusting nut Clamping block body can be driven to move horizontally, in this way, placement region can be avoided after clamping block body moves horizontally, and work as silicon After piece is placed, then the sliding of clamping block ontology can be made to stretch out by rotating backward adjusting nut just, such clamping block body can To push down silicon wafer, can be convenient in this way silicon wafer placement, without with clamping block body contacts, will not thus damage.
Again due to being provided with elastic filler block in the placement region of the rotation plate rail, can be given using the elastic filler block Give a little upward elastic force so that it is convenient to silicon wafer pop-up, meanwhile, then cooperate the snap action of clamping block can be to avoid silicon wafer pine It is dynamic.
Again due to being rotatably equipped with the axis of rotation on the revolution disk body, which is driven by rotation power device, the rotation The thread segment opposite with axis of rotation direction of rotation is provided on axis, the rotation plate rail screw thread is installed on the thread segment of the axis of rotation On, the disassembly of the rotation plate rail is very simple, and the rotation plate rail after disassembly can carry out the installation of single silicon wafer again, is not necessarily in this way It installs, can be installed in the position in other spaces on revolution disk body, it is easier for installation.
Detailed description of the invention
The present invention will be further described with reference to the accompanying drawings and examples.
Fig. 1 is the structural schematic diagram of the utility model embodiment;
Fig. 2 is the top view of Fig. 1;
Fig. 3 is the structural schematic diagram of revolution disk body;
Fig. 4 is one of structural schematic diagram of gripping mechanism;
Fig. 5 is another structural schematic diagram of gripping mechanism;
In attached drawing: 1. swing disk body;2. central axis;3. revolve power device;4. revolve disk body;5. rotation plate rail;6. pressure Cap;7. rotation power device;8. the axis of rotation;81. thread segment;9. elastic filler block;10. gripping mechanism;101. clamping block body; 102. guide rod;103. stop nut;104. compressed spring;105. turnover pressing plate;106. wear-resistant plastic layer;107. adjusting spiral shell Bar;108. adjusting nut;109. guide rod;11. silicon wafer.
Specific embodiment
The utility model is described in further detail below by specific embodiment.
As shown in Figures 1 to 5,11 rotary table of silicon wafer of a kind of ion implantation apparatus, including rotational installation is in swing disk body 1 Revolution disk body 4, it is described swing disk body 1 on be provided with driving revolution disk body 4 rotate revolution power device 3, the rotary table Body 4 is removably mounted to swing on disk body 1, is evenly distributed in several rotation plate rails 5, the rotation plate rail 5 on the disk body 4 that revolves It is removably mounted on revolution disk body 4, each rotation plate rail 5 is driven by rotation power device 7, is set on the rotation plate rail 5 It is equipped with the placement region for placing silicon wafer 11, the card at 11 edge of silicon wafer is provided with for clamping or unclamped on the rotation plate rail 5 Tight device 10.
In the present embodiment, the power device 3 that revolves and rotation power device 7 are all made of servo motor driving, pass through servo electricity Machine can effectively control the speed of revolution disk body 4 and rotation disk body.Servo motor is current existing power, structure and principle And control is the prior art.
As shown in Figure 3 and Figure 4, the gripping mechanism 10 includes circumference uniform distribution at least three clampings of placement region periphery Block, the clamping block horizontal resiliency are slidably mounted on rotation plate rail 5, are provided with to placement region radially on the clamping block The inclined end portion of extension has between the bottom of the inclined end portion and the bottom of placement region between being adapted to 11 thickness of silicon wafer Gap.Elastic filler block 9 is provided in the placement region of the rotation plate rail 5.The clamping block includes clamping block body 101 and sets The free end level of the guide rod 102 being placed on clamping block body 101, the guide rod 102 through rotation plate rail 5 and is exposed, Be provided with thread segment 81 on the free end of the guide rod 102 and stop nut 103 be installed, the clamping block body 101 with It is provided with compressed spring 104 between rotation plate rail 5, turnover pressing plate 105 is wherein provided on clamping block body 101, it is corresponding Spring mounting hole is provided on rotation plate rail 5, the compression of compressed spring 104 is set in spring mounting hole, limits spiral shell by adjusting Mother 103 can adjust the position of clamping block body 101, to adjust the width at 101 clamping silicon wafer of clamping block body, 11 edge.
As shown in figure 4, the corner of the inclined end portion of the clamping block body 101 is circular arc chamfering, and inclined end portion External margin is provided with wear-resistant plastic layer 106.The wear-resistant plastic layer 106 can effectively prevent the hard collision of silicon wafer 11.
The clamping block structure can also use other modes, as shown in figure 5, the clamping block includes clamping block body 101 With at least two guide rods 109 being set on clamping block body 101, which passes through the horizontal sliding of the guide rod 109 It is installed on rotation plate rail 5, adjusting screw rod 107 is horizontally fixed on the clamping block body 101, is turned on the rotation plate rail 5 Dynamic to be equipped with adjusting nut 108, which is threadedly coupled with adjusting screw rod 107.By turning adjusting nut 108 just The advance and retreat of adjustable clamping block body 101 retreat clamping block body 101 when needing to install silicon wafer 11, make entirely to place Region is all exposed, and such silicon wafer 11 does not have any collision when installing, and silicon wafer 11 is hardly damaged.And after placing, then pass through tune Section nut 108 can compress silicon wafer 11 to adjust the stretching of clamping block body 101.
Again as shown in figures 1 and 3, it is rotatably equipped with central axis 2 at the center for swinging disk body 1, the central axis 2 is by public affairs Rotatory force device 3 drives, and the revolution disk body 4 is removably fixed on central axis 2.The upper end of the central axis 2 is from top to bottom It is provided with threaded shaft section and polygon shaft part, the revolution disk body 4 is provided centrally with the polygon being adapted to polygon shaft part Hole, the polygonal hole are set in polygon shaft part, and screw thread is equipped with for clamping rotary table on the threaded shaft section on central axis 2 The pressure cap 6 of body 4.
It is rotatably equipped with the axis of rotation 8 on the revolution disk body 4, which is driven by rotation power device 7, the axis of rotation 8 On be provided with the thread segment 81 opposite with 8 direction of rotation of the axis of rotation, 5 screw thread of rotation plate rail is installed on the screw thread of the axis of rotation 8 In section 81.
Servo motor, the leadscrew-nut mechanism mentioned in the present embodiment are current routine techniques, in April, 2008 north It is detailed in " mechanical design handbook the 5th edition " of the 5th edition the 28th printing in capital to disclose cylinder, motor and other biographies The specific structure and principle of motivation structure and other designs, belong to the prior art, and structure is cheer and bright, and on 08 01st, 2008 It is just detailed in modern times practical the 3rd edition SMC training materials of pneumatics published by China Machine Press to disclose vacuum member Part, gas return path and process control, showing the gas circuit structure in the present embodiment is also existing technology, cheer and bright, Also the detailed motor that describes in " the motor driven and speed regulation " book published by Chemical Industry Press on 07 01st, 2015 Control and travel switch, therefore, circuit, air circuit connection are all clear.
Embodiment described above is only the description to the preferred embodiment of the present invention, not as the limit to the scope of the invention It is fixed, on the basis of not departing from design spirit of the present invention, to various modifications and transformation that technical solution of the present invention is made, it should all fall Enter in the protection scope that claims of the present invention determines.

Claims (9)

1. a kind of silicon wafer rotary table of ion implantation apparatus, including rotational installation is in the intracorporal revolution disk body of swinging disc, the swing The revolution power device of driving revolution disk body rotation is provided on disk body, it is characterised in that: the revolution disk body is detachably installed In swinging on disk body, several rotation plate rails are evenly distributed on the disk body that revolves, the rotation plate rail is removably mounted to revolve On disk body, each rotation plate rail is driven by rotation power device, is provided on the rotation plate rail for placing putting for silicon wafer Region is set, the gripping mechanism of silicon chip edge is provided with for clamping or unclamped on the rotation plate rail.
2. a kind of silicon wafer rotary table of ion implantation apparatus as described in claim 1, it is characterised in that: the gripping mechanism includes Circumference uniform distribution is slidably mounted on rotation plate rail at least three clamping blocks of placement region periphery, the clamping block horizontal resiliency, The inclined end portion radially extended to placement region, the bottom and rest area of the inclined end portion are provided on the clamping block There is the gap being adapted to silicon wafer thickness between the bottom in domain.
3. a kind of silicon wafer rotary table of ion implantation apparatus as claimed in claim 2, it is characterised in that: the clamping block includes card Tight block body and the guide rod being set on clamping block body, the free end level of the guide rod run through rotation plate rail and dew Out, thread segment is provided on the free end of the guide rod and stop nut is installed, the clamping block body and rotation plate rail Between be provided with compressed spring.
4. a kind of silicon wafer rotary table of ion implantation apparatus as claimed in claim 3, it is characterised in that: the clamping block body The corner of inclined end portion is circular arc chamfering, and the external margin of inclined end portion is provided with wear-resistant plastic layer.
5. a kind of silicon wafer rotary table of ion implantation apparatus as claimed in claim 2, it is characterised in that: the clamping block includes card Tight block body and at least two guide rods being set on clamping block body, which is slided by the guide rod level pacifies Loaded on adjusting screw rod on rotation plate rail, is horizontally fixed on the clamping block body, tune is rotatably equipped on the rotation plate rail Nut is saved, which is threadedly coupled with adjusting screw rod.
6. such as a kind of silicon wafer rotary table of ion implantation apparatus described in any one of claim 1 to 5, it is characterised in that: the pendulum It is rotatably equipped with central axis at the center of Moving plate body, which is driven by revolution power device, and the revolution disk body is detachable It is fixed on central axis.
7. a kind of silicon wafer rotary table of ion implantation apparatus as claimed in claim 6, it is characterised in that: the upper end of the central axis From top to bottom it is provided with threaded shaft section and polygon shaft part, what being provided centrally with of the revolution disk body was adapted to polygon shaft part Polygonal hole, the polygonal hole are set in polygon shaft part, and screw thread is equipped with for clamping on the threaded shaft section on central axis The pressure cap of revolution disk body.
8. a kind of silicon wafer rotary table of ion implantation apparatus as claimed in claim 7, it is characterised in that: the rotation plate rail is put It sets and is provided with elastic filler block in region.
9. a kind of silicon wafer rotary table of ion implantation apparatus as claimed in claim 8, it is characterised in that: rotated on the revolution disk body The axis of rotation is installed, which is driven by rotation power device, is provided on the axis of rotation opposite with axis of rotation direction of rotation Thread segment, the rotation plate rail screw thread is installed on the thread segment of the axis of rotation.
CN201821651109.1U 2018-10-12 2018-10-12 A kind of silicon wafer rotary table of ion implantation apparatus Active CN208796977U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201821651109.1U CN208796977U (en) 2018-10-12 2018-10-12 A kind of silicon wafer rotary table of ion implantation apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201821651109.1U CN208796977U (en) 2018-10-12 2018-10-12 A kind of silicon wafer rotary table of ion implantation apparatus

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109244032A (en) * 2018-10-12 2019-01-18 苏州晋宇达实业股份有限公司 A kind of silicon wafer rotary table of ion implantation apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109244032A (en) * 2018-10-12 2019-01-18 苏州晋宇达实业股份有限公司 A kind of silicon wafer rotary table of ion implantation apparatus

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Address after: 215600 Fuxin Road, Zhangjiagang economic and Technological Development Zone, Suzhou, Jiangsu 2

Patentee after: Jiangsu jinyuda Semiconductor Co.,Ltd.

Address before: 215600 Suzhou jinyuda Industrial Co., Ltd., No.2, Fuxin Road, Zhangjiagang Economic and Technological Development Zone, Suzhou City, Jiangsu Province

Patentee before: SUZHOU JYD INDUSTRIAL Co.,Ltd.

CP03 Change of name, title or address