CN208604238U - 一种单晶硅坩埚 - Google Patents
一种单晶硅坩埚 Download PDFInfo
- Publication number
- CN208604238U CN208604238U CN201820574698.1U CN201820574698U CN208604238U CN 208604238 U CN208604238 U CN 208604238U CN 201820574698 U CN201820574698 U CN 201820574698U CN 208604238 U CN208604238 U CN 208604238U
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- CN
- China
- Prior art keywords
- crucible
- unit
- monocrystalline
- carbon
- silicon
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 90
- 239000000377 silicon dioxide Substances 0.000 title claims abstract description 44
- 239000002131 composite material Substances 0.000 claims abstract description 16
- CREMABGTGYGIQB-UHFFFAOYSA-N carbon carbon Chemical compound C.C CREMABGTGYGIQB-UHFFFAOYSA-N 0.000 claims abstract description 14
- 239000011203 carbon fibre reinforced carbon Substances 0.000 claims abstract description 14
- 230000001965 increasing effect Effects 0.000 claims abstract description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 39
- 229910052710 silicon Inorganic materials 0.000 abstract description 39
- 239000010703 silicon Substances 0.000 abstract description 38
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 26
- 229910052760 oxygen Inorganic materials 0.000 abstract description 26
- 239000001301 oxygen Substances 0.000 abstract description 26
- 229910021421 monocrystalline silicon Inorganic materials 0.000 abstract description 24
- 238000009826 distribution Methods 0.000 abstract description 17
- 238000012546 transfer Methods 0.000 abstract description 6
- 239000013078 crystal Substances 0.000 description 22
- 238000000034 method Methods 0.000 description 20
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 13
- 229910052799 carbon Inorganic materials 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 7
- OBNDGIHQAIXEAO-UHFFFAOYSA-N [O].[Si] Chemical compound [O].[Si] OBNDGIHQAIXEAO-UHFFFAOYSA-N 0.000 description 6
- 230000008859 change Effects 0.000 description 6
- 238000002425 crystallisation Methods 0.000 description 6
- 238000013461 design Methods 0.000 description 6
- 239000007770 graphite material Substances 0.000 description 6
- 230000008025 crystallization Effects 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 230000007547 defect Effects 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 229920000049 Carbon (fiber) Polymers 0.000 description 3
- 239000004917 carbon fiber Substances 0.000 description 3
- 239000003575 carbonaceous material Substances 0.000 description 3
- 239000003610 charcoal Substances 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- 238000003475 lamination Methods 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IUHFWCGCSVTMPG-UHFFFAOYSA-N [C].[C] Chemical class [C].[C] IUHFWCGCSVTMPG-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000007812 deficiency Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 238000005265 energy consumption Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 229910052571 earthenware Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000000191 radiation effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 230000001755 vocal effect Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 238000004857 zone melting Methods 0.000 description 1
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- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
Claims (7)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201820574698.1U CN208604238U (zh) | 2018-04-20 | 2018-04-20 | 一种单晶硅坩埚 |
Applications Claiming Priority (1)
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CN201820574698.1U CN208604238U (zh) | 2018-04-20 | 2018-04-20 | 一种单晶硅坩埚 |
Publications (1)
Publication Number | Publication Date |
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CN208604238U true CN208604238U (zh) | 2019-03-15 |
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CN201820574698.1U Active CN208604238U (zh) | 2018-04-20 | 2018-04-20 | 一种单晶硅坩埚 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108396372A (zh) * | 2018-04-20 | 2018-08-14 | 周俭 | 一种单晶硅坩埚 |
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2018
- 2018-04-20 CN CN201820574698.1U patent/CN208604238U/zh active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108396372A (zh) * | 2018-04-20 | 2018-08-14 | 周俭 | 一种单晶硅坩埚 |
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GR01 | Patent grant | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right |
Effective date of registration: 20211018 Address after: 201304 floors 1-2, building 4, No. 1628, Lizheng Road, Lingang xinpian District, pilot Free Trade Zone, Pudong New Area, Shanghai Patentee after: Shanghai Dehui Cunzhi technology partnership (L.P.) Address before: 201204 room 512, building 1, Lane 2277, Zuchongzhi Road, Pudong New Area, Shanghai Patentee before: Zhou Jian |
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TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20220126 Address after: 201304 floors 1-2, building 4, No. 1628, Lizheng Road, Lingang xinpian District, pilot Free Trade Zone, Pudong New Area, Shanghai Patentee after: Shanghai Dingtai Wanbang Material Co.,Ltd. Address before: 201304 floors 1-2, building 4, No. 1628, Lizheng Road, Lingang xinpian District, pilot Free Trade Zone, Pudong New Area, Shanghai Patentee before: Shanghai Dehui Cunzhi technology partnership (L.P.) |
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TR01 | Transfer of patent right |