CN208588897U - Sealed lens subassembly - Google Patents

Abstract

The utility model relates to semiconductor equipment manufacturing technology fields, disclose a kind of sealed lens subassembly, it is arranged in litho machine, it include: convergent lens, projecting lens and the mask plate microscope carrier being arranged between, furthermore, sealed lens subassembly further include: seal chamber is arranged between convergent lens and projecting lens；Hermatic door is arranged on seal chamber；Air hose, air intake and outlet air end are connected to seal chamber at different locations.Sealed lens subassembly provided by the utility model is by forming air-tightness well and the seal chamber of light transmission, by the gas in seal chamber with extraneous containing the gas-insulated of the particle for being capable of forming haze spot, therefore reduce the concentration that the particle (such as sulphion, ammonium ion etc.) of haze spot is capable of forming in seal chamber.According to the utility model, the formation of haze spot on mask plate can be reduced, and then reduces the number for dismounting and cleaning to mask plate, reduce production cost and improves production efficiency.

Description

Sealed lens subassembly

Technical field

The utility model relates to semiconductor equipment manufacturing technology field, in particular to a kind of sealed lens subassembly.

Background technique

In semiconductor production process, photoetching process is particularly significant, and various figure can be formed in semicon-ductor structure surface Case.Usually, mask layer is formed in semiconductor surface first, forms photoresist layer on exposure mask later, then carrying out photoetching. Specifically, light is radiated on photoresist layer through mask plate, cause to chemically react in the exposure area of photoresist layer, then The photoresist that removal exposure area or unexposed area are dissolved by developing technique, so that the figure on mask plate be made to be copied to On photoresist layer.

It can be seen that mask is the indispensable component of photoetching process, the performance of mask directly determines photoetching process Quality.However, in the prior art, mask has a common defect: haze spot.Haze spot typically occurs in the area of mask light transmission Domain, positioned at the side of mask graph, it appears that as a stain, and can use the extension of time that can constantly add with mask Deeply, it grows up.

In the actual production process, shown in Figure 1, haze spot is to find on KrF mask, but at most appear in earliest On ArF mask.Haze spot will lead to mask local transparent rate loss 10% or so in the early stage, and the later period can be the part of mask plate thoroughly The loss of light rate reaches 50% or more, so that light changes in the exposure area that photoresist layer is formed, to influence finally to exist The figure formed on wafer, thus haze spot has a significant impact to the yield of etching wafer.

Specifically, the principle that haze spot is formed are as follows: containing the particle (such as: ammonium ion and sulphion etc.) for being capable of forming haze spot Compound, water, carbon dioxide under the excitation of high-energy photon and in ambient enviroment, which react, generates salt compounds. Wherein, the ion and molecule for constituting haze spot, can migrate in reticle surface, can also be deposited on the side wall of mask graph, therefore Seriously affect exposure figure quality.

In current production, the method for cleaning that the defects of haze spot occurs in mask is mask will to be sent back to fabrication mask Factory's removable protective film is done to be cleaned comprehensively, therefore cleans at high cost, and time-consuming seriously affects production efficiency, prolong the production cycle It is long.

Utility model content

The utility model is to propose in view of the above problems, and its purpose is to provide a kind of sealed lens subassembly, energy Enough reduce the formation of haze spot.

According to the utility model, by forming seal chamber between convergent lens and projecting lens, to inside cavity from Son is filtered, to reduce the formation for being placed between convergent lens and projecting lens haze spot on mask plate.

Specifically, a kind of sealed lens subassembly provided by the utility model is arranged in litho machine, comprising: assembles saturating Mirror, projecting lens and the mask plate microscope carrier being arranged between, in addition, sealed lens subassembly further include: seal chamber, if It sets between convergent lens and projecting lens and will be sealed between convergent lens and projecting lens；Hermatic door is arranged in seal chamber On；Air hose, air intake and outlet air end are connected to seal chamber at different locations.

Compared to existing technologies, the seal chamber setting of sealed lens subassembly provided by the utility model is being assembled thoroughly Between mirror and projecting lens, by forming air-tightness well and the seal chamber of light transmission, the gas in seal chamber is contained with the external world It is capable of forming the gas-insulated of the particle of haze spot, therefore reduces particle (such as the sulphion, ammonia for being capable of forming haze spot in seal chamber Ion etc.) concentration.In photoetching, mask plate is mounted in seal chamber, to reduce the formation of haze spot on mask plate, in turn The number for dismounting and cleaning to mask plate is reduced, production cost is reduced and improves production efficiency.

Preferably, the detection device detected to the gas in seal chamber is provided on air hose, detection device packet The first detection device and second detection device are included, the first detection device is arranged at the air intake of air hose, and second detection device is set It sets at the outlet air end of air hose.

First detection device and second survey in the gas that device is used in detection seal chamber and are capable of forming haze spot The concentration of particle.The first detection device and second detection device is respectively set in the air intake and outlet air end of air hose, it can be more preferable Ground carries out the concentration of the particle for being capable of forming haze spot contained from the gas of gas and feeding seal chamber that seal chamber is extracted out Detection, to judge whether air hose effectively works.

Further, preferably, being provided in the first detection device in air hose and between second detection device filtering Device, for the gas in seal chamber by reaching filter after the first detection device, filter includes first filter and the second mistake Filter, the second filter is compared with first filter far from the first detection device.

Filter is used to be filtered the gas being pumped into air hose from seal chamber, filters out the grain that haze spot is enough formed in gas Son.The particle that first filter is capable of forming haze spot for intracorporal to gas carries out coarse filtration, and the second filter is used for can The particle for forming haze spot is carefully filtered, and the concentration of the particle for being capable of forming haze spot in seal chamber is further decreased, to subtract The formation of haze spot on few mask plate.

Further, preferably, being additionally provided with the air blast that can be aspirated to the gas in seal chamber on air hose Machine.

Promote the gas between air hose and seal chamber to flow by the way that air blower is arranged on air hose, makes the gas in seal chamber Air hose can be entered from air intake, and filter out the particle for being capable of forming haze spot by the filter on air hose, then by air blower from Outlet air end sends seal chamber back to, reduces the general of haze spot formation in a manner of reducing the required reactant for forming haze spot in seal chamber Rate.

Further, preferably, being provided with cooling device between the second filter and air blower, cooling device with Drier is provided between air blower.

Haze spot usually requires to be formed under conditions of having water and illumination, therefore, drier is arranged on air hose and absorbs Steam in gas, to reduce the content of water in seal chamber, to be further reduced the haze that mask plate is formed in use Spot.

Further, preferably, further including controller, controller is communicated with the first detection device and second detection device Connection, controller compares the testing result of the first detection device and second detection device, and controls air blower.

By comparing the testing result of the first detection device and second detection device, the mistake of filter etc. is judged by controller Effect is filtered, to control air blower to adjust the gas flow in air hose, it is ensured that gas pressure intensity and filter in seal chamber Filter effect.

Preferably, further include the alarm with controller communication connection, when controller judges working condition exception, by Alarm, which issues, to be reminded.

Controller is judged by working condition of the testing result to filter etc., when controller obtains filter etc. When the conclusion of working condition exception, then it can control alarm and sound an alarm, remind neighbouring operator

In addition, preferably, hermatic door is opposed to be arranged with mask plate microscope carrier.

Hermatic door and mask plate microscope carrier is opposite disposed, so that the installation and removal operation of mask plate is more easier.

In addition, preferably, air hose is removably mounted on seal chamber.

Air hose using dismountable design can save the cost, when air hose occurs damaged, the air hose only more renewed can To continue to use.

Preferably, the air intake and outlet air end in air hose are respectively arranged with sealing structure.

Sealing structure is respectively set in the air intake and outlet air end of air hose, it can be ensured that the air-tightness of air hose and seal chamber, All sent back to seal chamber after air hose is cleaned to enable to seal intracavity gas, to be difficult to be formed in seal chamber Haze spot gaseous environment reduces the wash number to mask plate.

Detailed description of the invention

Fig. 1 is the schematic diagram that lens subassembly carries out photoetching in the prior art；

Fig. 2 is the structural schematic diagram of the sealed lens subassembly of the utility model；

Fig. 3 is the structure for the sealed lens subassembly that air hose was removably disposed and was equipped with seal assembly in the utility model Schematic diagram.

Description of symbols:

1- seal chamber；1a- hermatic door；2- air hose；2a- air intake；2b- outlet air end；The first detection device of 3a-；3b- second Detection device；4a- first filter；The second filter of 4b-；5- air blower；6- cooling device；7- drier；8- convergent lens； 9- projecting lens；10- mask plate microscope carrier；11- mask plate；12- wafer；13- sealing structure.

Specific embodiment

With reference to the accompanying drawings of the specification, the utility model is described in further detail.It is schematically simple in attached drawing Change shows the structure etc. of sealed lens subassembly.

The utility model provides a kind of sealed lens subassembly, is arranged in litho machine, shown in Figure 2, comprising: meeting Poly- lens 8, projecting lens 9 and the mask plate microscope carrier 10 being arranged between, in addition, sealed lens subassembly further include: Seal chamber 1 is arranged between convergent lens 8 and projecting lens 9 and will seal between convergent lens 8 and projecting lens 9；Hermatic door 1a is arranged on seal chamber 1；Air hose 2, air intake 2a and outlet air end 2b are connected to seal chamber 1 at different locations.

Wherein, the mirror surface of both convergent lens 8 and projecting lens 9 is arranged in parallel, and seal chamber 1 is located between the two and by two Person's sealing, to form the cavity for including mask plate microscope carrier 10.When carrying out photoetching, mask plate 11 is placed on mask plate microscope carrier 10 On, the lower section of projecting lens 9 is arranged in wafer 12, and light is assembled by convergent lens 8 and is radiated on mask plate 11, and passes through throwing The graphic projection of mask plate 11 on wafer 12, is exposed the photoresist layer on wafer 12 by shadow lens 9.Also, exposure mask Version microscope carrier 10 is arranged on the inner sidewall of seal chamber 1, after mask plate 11 is installed, the plane of mask plate 11 and convergent lens 8 and The mirror surface of both projecting lens 9 is parallel to each other.When seal chamber 1 is arranged, seal chamber 1 both can be with convergent lens 8 and projection Lens 9 link together, can also be separately positioned with the two, as long as can guarantee that light is insusceptibly irradiated to mask plate 11 Above and the figure on mask plate 11 is accurately passed through projecting lens 9 to project on wafer 12.

After seal chamber 1 is set, in order to simplify the operation of installation and removal mask plate 11, in the present embodiment, sealing Door 1a is opposed to be arranged with mask plate microscope carrier 10.When needing to install or remove mask plate 11, after opening hermatic door 1a, manipulator Arm, which horizontally extends into seal chamber 1, can be completed installation or removal to mask plate 11.Preferably, it is also set in the edge of hermatic door 1a Be equipped with corresponding sealing element, such as sealing ring, further ensure that seal chamber 1 has air-tightness well, by gas in seal chamber 1 with Ambient atmos isolation.

Also, air hose 2 in the present embodiment, is additionally provided on seal chamber 1, both ends, that is, air intake 2a of air hose 2 and go out Wind end 2b is both connected on seal chamber 1, and is additionally provided with cleaning equipment on air hose 2.Gas enters air hose 2 from seal chamber 1 After be cleaned equipment clean, returned in seal chamber 1 after filtering out the particle for being capable of forming haze spot.

In order to be monitored to the gas in seal chamber 1, in the present embodiment, it is provided on air hose 2 to sealing The detection device that gas in chamber 1 is detected, detection device include the first detection device 3a and second detection device 3b, and first Detection device 3a is arranged at the air intake 2a of air hose 2, and second detection device 3b is arranged at the outlet air end 2b of air hose 2.

The first detection device 3a and second detection device 3b, energy is respectively set in the air intake 2a and outlet air end 2b of air hose 2 The enough concentration preferably to the particle for being capable of forming haze spot from the gas that seal chamber 1 is extracted out and the gas being sent into seal chamber 1 It is measured in real time, to judge whether air hose 2 effectively works, and then reduces the formation of haze spot on mask plate 11.

Also, in order to allow gas to enough circulate between air hose 2 and seal chamber 1, in the present embodiment, air hose 2 On be additionally provided with air blower 5, the gas in seal chamber 1 can be aspirated.

By the way that air blower 5 is arranged on air hose 2, promotes the gas flowing between air hose 2 and seal chamber 1, make in seal chamber 1 Gas can enter air hose 2 from air intake 2a, and the particle for being capable of forming haze spot is filtered out by the cleaning equipment on air hose 2, Seal chamber 1 is sent back to from outlet air end 2b by air blower 5 again, is dropped in a manner of reactant needed for formation haze spot by reducing in seal chamber 1 The probability that low haze spot is formed.Preferably, air blower 5 be frequency conversion air blower, can according in seal chamber 1 pressure and being capable of shape The gaseous environments condition such as particle concentration at haze spot adjusts the gas flow in air hose 2, to control haze spot on mask plate 11 It generates.

Specifically, in the present embodiment, cleaning equipment includes filter, cooling device 6, drier 7.Wherein, mistake Filter is used for purification gas；Cooling device 6 can adjust the temperature in seal chamber 1 by adjusting the gas temperature of air hose 2, make Gas environmental benefits are obtained in photoetching process；Drier 7 is used to absorb the moisture in gas, and cleaning equipment is covered from many aspects prevention Haze spot in film version 11 is formed.

In the present embodiment, using sulphion and ammonium ion as the particle for being capable of forming haze spot, the original of the formation of haze spot Reason are as follows:

H₂SO₄+2NH₄OH→(NH₄)₂SO₄+2H₂O

3NH₃+3CO₂→C₃O₃N₃H₃+3H₂O

Wherein, first reaction need in the environment of having steam could, and two reactions are required to illumination.Cause This, will prevent haze spot on mask plate 11 from being formed, then need to reduce sulfate ion in the gaseous environment locating for it and ammonia root from The concentration of son.It is then filled in filter for absorbing sulfate ion and ammonia radical ion in gas, such as barium hydroxide is molten Liquid.

Preferably, in the present embodiment, filter includes first filter 4a and the second filter 4b, the second filtering Device 4b is compared with first filter 4a far from the first detection device 3a.Wherein, it is filled out respectively in first filter 4a and first filter 4b Equipped with different substances, first filter 4a is used to carry out coarse filtration, the second mistake to sulfate ion in gas and ammonia radical ion Filter 4b for carefully being filtered to sulfate ion and ammonia radical ion, further decrease sulfate ion in seal chamber 1 with The concentration of ammonia radical ion, to reduce the formation of haze spot on mask plate 11.

In order to control the temperature and humidity of gaseous environment in seal chamber 1, and it is further reduced the formation of haze spot, in the second mistake It is provided with cooling device 6 between filter 4b and air blower 5, drier 7 is provided between cooling device 6 and air blower 5.

Haze spot usually requires to be formed under conditions of having water and illumination, therefore drier 7 is arranged on air hose 2 and absorbs Aqueous vapor in gas, to reduce the content of water in seal chamber 1, to be further reduced what mask plate 11 was formed in use Haze spot.

It is further preferred that in the present embodiment, being additionally provided with controller, controller and the first detection device 3a and second Detection device 3b communication connection, controller compare the testing result of the first detection device 3a and second detection device 3b, and right Air blower 5 is controlled.

First detection device 3a and second detection device 3b will test result and be sent to controller, and controller is surveyed according to the two The data obtained judge whether the gaseous environment in seal chamber 1 is in the range of permission, are especially capable of forming the particle of haze spot Concentration.When being capable of forming the excessive concentration of particle of haze spot, controller is issued to air blower 5 and is instructed, and is adjusted in air hose 2 Gas flow, so that gaseous environment be adjusted；It adjusts in gaseous environment to after in the range of permission, controller is to air blast Machine 5 issues instruction, it is made to stop working or reduce gas flow rate.

Also, further includes in the present embodiment, the alarm communicated to connect with controller, the finger of controller can be received It enables issuing and remind.

Controller is judged by working condition of the testing result to filter etc., when controller obtains filter etc. When the conclusion of working condition exception, then it can control alarm and sound an alarm, remind neighbouring operator.

As described above, the setting of seal chamber 1 of sealed lens subassembly provided by the utility model is in convergent lens 8 and projection Between lens 9, by forming air-tightness well and the seal chamber 1 of light transmission, the gas in seal chamber 1 is contained with the external world being capable of shape At haze spot particle it is gas-insulated, therefore reduce particle (such as the sulphion, ammonium ion that haze spot is capable of forming in seal chamber 1 Deng) concentration.In photoetching, mask plate 11 is mounted in seal chamber 1, so that the formation of haze spot on mask plate 11 is reduced, into And the number for dismounting and cleaning to mask plate 11 is reduced, production cost is reduced and improves production efficiency.

In the present embodiment, air hose 2 is removably mounted on seal chamber 1, and each device is removably installed On air hose 2.When breakage occurs in air hose 2, the air hose 2 only more renewed can be continued to use, or when a certain device occurs When damage, only replaces corresponding device just and can continue to realize that reducing haze spot forms effect, to reduce maintenance cost.

Correspondingly, shown in Figure 3, since air hose 2 uses dismountable design, in the air inlet of air hose 2 End 2a and outlet air end 2b is respectively arranged with sealing structure 13.Ensure the air-tightness of air hose 2 and seal chamber 1 with this, to make to seal Gas can all be sent back to seal chamber 1 after air hose 2 is cleaned in chamber 1, to be difficult to form haze spot gas in seal chamber 1 Environment reduces the wash number to mask plate 11.Common sealing structure 13 is sealant or sealing ring etc..

It will be understood by those skilled in the art that in above-mentioned each embodiment, in order to keep reader more preferably geographical It solves the application and proposes many technical details.But even if without these technical details and based on the respective embodiments described above Various changes and modifications can also realize each claim of the application technical solution claimed substantially.Therefore, in reality In, can to above embodiment, various changes can be made in the form and details, without departing from the spirit of the utility model And range.

Claims (10)

1. a kind of sealed lens subassembly is arranged in litho machine, comprising: convergent lens, projecting lens and setting are in the two Between mask plate microscope carrier, which is characterized in that

The sealed lens subassembly further include:

Seal chamber is arranged between the convergent lens and the projecting lens and by the convergent lens and the projecting lens Between seal；

Hermatic door is arranged on the seal chamber；

Air hose, air intake and outlet air end are connected to the seal chamber at different locations.

2. sealed lens subassembly according to claim 1, which is characterized in that be provided on the air hose to described close The detection device that intracavitary gas is detected is sealed, the detection device includes the first detection device and second detection device, institute It states the first detection device to be arranged at the air intake of the air hose, the institute of the air hose is arranged in the second detection device It states at outlet air end.

3. sealed lens subassembly according to claim 2, which is characterized in that first detection in the air hose Filter is provided between device and the second detection device, the gas in the seal chamber passes through first detection device After reach the filter, the filter includes first filter and the second filter, and second filter is relatively described First filter is far from first detection device.

4. sealed lens subassembly according to claim 3, which is characterized in that being additionally provided on the air hose can be right The air blower that gas in the seal chamber is aspirated.

5. sealed lens subassembly according to claim 4, which is characterized in that in second filter and the air blast It is provided with cooling device between machine, is provided with drier between the cooling device and the air blower.

6. according to described in any item sealed lens subassemblies of claim 4 or 5, which is characterized in that it further include controller, institute It states controller and first detection device and the second detection device communicates to connect, controller first inspection The testing result of device and the second detection device is surveyed, and the air blower is controlled.

7. sealed lens subassembly according to claim 6, which is characterized in that further include being communicated to connect with the controller Alarm, when the controller judges working condition exception, by the alarm issue remind.

8. -5 described in any item sealed lens subassemblies according to claim 1, which is characterized in that the hermatic door with it is described Mask plate microscope carrier is opposed to be arranged.

9. -5 described in any item sealed lens subassemblies according to claim 1, which is characterized in that the air hose is removably It is mounted on the seal chamber.

10. sealed lens subassembly according to claim 9, which is characterized in that the air hose the air intake and The outlet air end is respectively arranged with sealing structure.