CN208580730U - Contactless substrate-operations equipment - Google Patents

Contactless substrate-operations equipment Download PDF

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Publication number
CN208580730U
CN208580730U CN201821230434.0U CN201821230434U CN208580730U CN 208580730 U CN208580730 U CN 208580730U CN 201821230434 U CN201821230434 U CN 201821230434U CN 208580730 U CN208580730 U CN 208580730U
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Prior art keywords
cavity
suction piece
equipment
closed cavity
piece unit
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CN201821230434.0U
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Chinese (zh)
Inventor
弓利军
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Beijing Naura Microelectronics Equipment Co Ltd
Beijing North Microelectronics Co Ltd
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Beijing North Microelectronics Co Ltd
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Priority to CN201821230434.0U priority Critical patent/CN208580730U/en
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Publication of CN208580730U publication Critical patent/CN208580730U/en
Priority to PCT/CN2019/098611 priority patent/WO2020024984A1/en
Priority to JP2020572505A priority patent/JP7144547B2/en
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Abstract

The utility model embodiment discloses a kind of contactless substrate-operations equipment, and equipment includes: crawl arm (222) and grabs disc-dismounting device;The bottom for grabbing disc-dismounting device is provided with the multiple suction piece units (102,103) for the arrangement that is centrosymmetric;Suction piece unit (102,103) is provided with cavity and the tangential hole communicated with cavity (102-1,103-1);Crawl arm is internally provided with snorkel, grabs disc-dismounting device and is internally provided with ventilation cavity, and snorkel is connected to by ventilation cavity and tangential hole (102-1,103-1), adsorbs substrate using the pressure difference that the rotating vortex that suction piece unit generates generates.The equipment of the utility model can eliminate wafer spin, deflection situation, improve equipment accuracy;The problems such as polluting, weighing wounded caused by wafer surface can be effectively avoided, the quality of product is improved;It can carry out high temperature and pick and place piece, improve equipment capacity.

Description

Contactless substrate-operations equipment
Technical field
The utility model relates to semiconductor Integrated-manufacturing Techniques fields more particularly to a kind of contactless substrate-operations to set It is standby.
Background technique
In semiconductor integrated circuit manufacturing field, in order to generate the semiconductor crystal wafer of extension coating, generally use externally Prolong the semiconductor crystal wafer in reactor and carry out epitaxial coating, deposition gases pass through epitaxial reactor, can be in the table of semiconductor crystal wafer Epitaxial material is deposited on face.In epitaxial reactor, wafer substrates transmission belongs to very important content.Chip is typically round , there is front and back, front wafer surface is to form the wafer face for realizing integrated circuit structure;In addition, the edge of chip is several Millimeter region is without in realization IC manufacturing.So in chip transmit process, protect that front wafer surface is not damaged to be It is very important.
Currently, having a variety of equipment for transmitting substrate in existing epitaxial reactor, but there is shortcoming.Example Such as, it for the contactless substrate-operations equipment in a kind of epitaxial reactor, during taking piece, is formed at each aspirating hole Adsorption force is in the front center of substrate, and the adsorption capacity of substrate center effect will make substrate deformation excessive, thus easy to form It weighs wounded;In addition, substrate has remained certain temperature when taking piece in by process cavity, exist between the grabbing device of equipment certain Adhesiveness, substrate very may not be able to be adsorbed horizontally, not can guarantee steady absorption, thus cause to take piece failure or It falls;For the contactless substrate-operations equipment in another epitaxial reactor, the direction and layout of the tangential hole of sucker There are problems, so that the air-flow size of each sucker, rotating vortex have differences, when chip is picked up, it may appear that unstable, The phenomenon that spinning, drifting is unable to satisfy positioning, fixed point picks and places, the demand of transmission chip.Therefore, it is necessary to a kind of new for passing The equipment for sending substrate.
Utility model content
In view of this, the utility model embodiment provides a kind of contactless substrate-operations equipment.
According to the one aspect of the utility model embodiment, a kind of contactless substrate-operations equipment is provided, comprising: crawl Arm and grab disc-dismounting device;One end of the crawl arm is connect with the disc-dismounting device of grabbing;It is set in the bottom for grabbing disc-dismounting device It is equipped with the multiple suction piece units for the arrangement that is centrosymmetric;The suction piece unit is provided with cavity and cuts with what the cavity communicated Xiang Kong;The crawl arm is internally provided with snorkel, and the disc-dismounting device of grabbing is internally provided with ventilation cavity, and the snorkel is logical The ventilation cavity is crossed to be connected to the tangential hole;Wherein, compressed gas passes through the snorkel, the ventilation cavity and institute It states tangential hole to input in the cavity, forms rotating vortex in the cavity, the pressure difference generated using the rotating vortex Adsorb substrate.
Optionally, the connectivity part and the ventilation cavity of the ventilation cavity and the snorkel and each tangential hole The distance between connectivity part it is equal, compressed gas is equably conveyed to the tangential hole of each suction piece unit.
Optionally, the ventilation cavity includes: the multiple first closed cavities;The multiple first closed cavity and described more A suction piece unit is arranged in a one-to-one correspondence, and the first end of the multiple first closed cavity is tangential with corresponding suction piece unit respectively Hole connection, the second end of the multiple first closed cavity is connected, and the multiple first closed cavity is with the crawl It is radially distributed centered on the center of disk device;Wherein, compressed gas is conveyed to right with it via the described first closed cavity The tangential hole for the suction piece unit answered.
Optionally, the ventilation cavity includes: the second closed cavity;The second closed cavity is located at crawl disk dress The center set;The second end of the multiple first closed cavity is all connected to the described second closed cavity, wherein compressed gas warp It is evenly distributed by the described second closed cavity to the multiple first closed cavity.
Optionally, the ventilation cavity includes: the closed cavity of third;Wherein, the snorkel is closed by the third Cavity is connected to the described second closed cavity.
Optionally, it is provided in disc-dismounting device and the multiple suction piece unit multiple closed chambers correspondingly in described grab Body;The multiple suction piece unit is separately positioned in the corresponding airtight cavity, is formed and the multiple suction piece unit The multiple annular closed cavities being arranged in a one-to-one correspondence;Wherein, the first end of the described first closed cavity and the annular closed chamber Road is connected, and compressed gas is conveyed to corresponding suction piece unit via the described first closed cavity, the annular closed cavity Tangential hole.
Optionally, the disc-dismounting device of grabbing includes: chassis and transfer panel device;The transfer panel device is arranged at the bottom On disk;The transfer panel device includes: switching chassis, telophragma, top plate;The switching chassis respectively with the telophragma and institute State chassis connection, the telophragma connect with the top plate, wherein the switching chassis, the telophragma, the chassis it Between form the closed cavity of the third, the described second closed cavity is formed between the telophragma, the top plate.
Optionally, further includes: radiation disk;The radiation disk is connect with the telophragma and chassis respectively, wherein The radiation disk, the telophragma form the described first closed cavity between the chassis.
Optionally, the multiple airtight cavity is formed between the radiation disk and the chassis, wherein the suction piece Unit is arranged in the corresponding airtight cavity.
Optionally, the bottom on the chassis is provided with salient point, the salient point is for being positioned and being limited to substrate.
Optionally, the center setting for grabbing disc-dismounting device has the through-hole of degassing function.
Optionally, the suction piece unit is provided with the cylindrical cavity, the cavity top and be located at same At least two tangential holes communicated with the cavity are set at height, and the inner wall of the tangential hole and the cavity is tangent.
Optionally, the quantity of the suction piece unit is even number, the suction piece unit of adjacent two shape in the cavity At rotating vortex it is contrary.
The contactless substrate-operations equipment of the utility model, by suction piece unit be uniformly distributed and compressed gas equably It is conveyed to each suction piece unit, power is identical for lifting of making that each suction piece unit formed, and the rotary force of generation can offset each other, and disappear Except wafer spin, deflection situation, equipment accuracy is improved;It can be realized suspension and pick and place chip, transmission chip, effectively avoid chip The problems such as piece tool is polluted caused by wafer surface, weighed wounded is passed in fetching process, improves the quality of product;Can effectively it prevent Only high-temperature gas damages external gas circuit and equipment etc., can carry out high temperature and pick and place piece, shorten the equipment cooling down time, Improve equipment capacity.
The additional aspect of the utility model embodiment and advantage will be set forth in part in the description, these will be from following Description in become obvious, or recognized by the practice of the utility model.
Detailed description of the invention
In order to illustrate the embodiment of the utility model or the technical proposal in the existing technology more clearly, below will be to embodiment Or attached drawing needed to be used in the description of the prior art is briefly described, it should be apparent that, the accompanying drawings in the following description is only It is only some embodiments of the utility model, for those of ordinary skill in the art, in not making the creative labor property Under the premise of, it can also be obtained according to these attached drawings other attached drawings:
Fig. 1 is the structure according to the ventilation cavity of one embodiment of the contactless substrate-operations equipment of the utility model Schematic diagram;
Fig. 2 and Fig. 3 is the suction piece unit according to one embodiment of the contactless substrate-operations equipment of the utility model Structural schematic diagram;
Fig. 4 is the operation principle schematic diagram of suction piece unit;
Fig. 5 is to be illustrated according to the structural profile of one embodiment of the contactless substrate-operations equipment of the utility model Figure.
Specific embodiment
The utility model is described more fully with reference to the accompanying drawings, wherein illustrating the exemplary reality of the utility model Apply example.The following will be combined with the drawings in the embodiments of the present invention, carries out clearly the technical scheme in the embodiment of the utility model Chu is fully described by, it is clear that the described embodiments are only a part of the embodiments of the utility model, rather than whole realities Apply example.Based on the embodiments of the present invention, those of ordinary skill in the art institute without making creative work The every other embodiment obtained, fall within the protection scope of the utility model.It is practical new to this below with reference to figure and embodiment The technical solution of type carries out various descriptions.
Hereafter in order to describe conveniently, hereinafter so-called "left", "right", "upper", "lower" and attached drawing itself it is left and right, upper, Lower direction is consistent.
" first " hereinafter, " second " etc. are only used for distinguishing in description, and there is no other special meanings.
As shown in Fig. 1 to 5, the utility model provides a kind of contactless substrate-operations equipment, including crawl arm 222 and grabs Disc-dismounting device, grabbing disc-dismounting device can be implemented as a variety of specific structures.One end of crawl arm 222 is connect with disc-dismounting device is grabbed. Multiple suction piece units 102,103 evenly distributed in the circumferential direction are provided in the bottom for grabbing disc-dismounting device.
As shown in Figure 2,3, suction piece unit 102, the 103 tangential hole 102-1,103- for being provided with cavity and being communicated with cavity 1, tangential hole 102-1,103-1 are through-hole, the wall of through cavities.Crawl arm 222 is internally provided with snorkel, grabs in disc-dismounting device Portion is provided with ventilation cavity, and the specific arrangement method for cavity of ventilating can be configured according to design requirement.Snorkel passes through logical Air cavity road and tangential hole 102-1,103-1 connection, compressed gas pass through snorkel, ventilation cavity and tangential hole 102-1,103- In 1 input cavity body, rotating vortex is formed in cavity, adsorbs substrate using the pressure difference that rotating vortex generates.Substrate 40 can be with For a variety of semiconductor wafer substrates etc..
Suction piece unit 102,103 is provided with cylindrical cavity, cavity top and be located at sustained height setting with The inner wall of the circular cylindrical cavity of at least two tangential hole 102-1,103-1, tangential hole 102-1,103-1 and cavity that cavity communicates It is tangent.Multiple suction piece units 102,103 are uniformly distributed, and number is even numbers, and for example, 6,8 etc..Two adjacent suction piece units Tangential hole can be it is left-handed be intervally arranged with dextrorotation, the rotation that adjacent two suction piece units 102,103 are formed in cavity The direction of vortex is not identical, respectively left-handed rotating vortex and right left-handed rotating vortex or opposite.
As shown in figure 4, compressed gas is from the top of suction piece unit, tangentially hole enters cavity, in the wall surface of circular cylindrical cavity Constraint under form rotating vortex.High-speed rotating gas drives the gas rotating in chamber central region, because centrifugal force effect will It gets rid of to wall surface, to generate negative pressuren zone in chamber central.Be placed in the silicon wafer below suction piece unit due to the effect of negative pressure by Adsorption capacity vertically upward realizes adsorption process.Due to the effect of pressure, gas is spirally moved downward, in suction piece unit Bottom is discharged in dispersion shape, to form air cushion between the periphery and sucker of silicon wafer, finally realizes non-contact suction piece.Suction piece list Member utilizes bernoulli principle, and the low pressure formed by using rotating vortex is generated pressure difference realization and lifts power, due to single suction piece The vortex that unit is formed will lead to chip and rotate, so suction piece unit is distributed using center rotational symmetry, to it is balanced that Rotary force between this;
In one embodiment, compressed gas is equably conveyed to cutting for each suction piece unit 102,103 by ventilation cavity To hole 102-1,103-1.The connectivity part and ventilation cavity of ventilation cavity and snorkel and each tangential hole 102-1, the company of 103-1 Compressed gas, is equably conveyed to each suction piece unit 102 by being equidistant between logical, 103 tangential hole 102-1, 103-1.Ventilation cavity can be implemented as a variety of specific structures.For example, ventilation cavity includes the multiple first closed cavities 105, Multiple first closed cavities 105 are arranged in a one-to-one correspondence with multiple suction piece units 102,103.The of multiple first closed cavities 105 One end is connected to the tangential hole of corresponding suction piece unit respectively, and the second end of multiple first closed cavities 105 is connected, and more A first closed cavity 105 is radially distributed centered on the center for grabbing disc-dismounting device.Compressed gas is via the first closed chamber Road 105 is equably conveyed to the tangential hole 102-1,103-1 of corresponding suction piece unit.
Cavity of ventilating includes the second closed cavity 104.Second closed cavity 104 is located at the center for grabbing disc-dismounting device.It is multiple The second end of first closed cavity 105 is all connected to the second closed cavity 104, and compressed gas is equal via the second closed cavity 104 It is even to distribute to the multiple first closed cavities 105.Cavity of ventilating includes the closed cavity 106 of third.The closed cavity 106 of third is located at The edge of disc-dismounting device is grabbed, snorkel is connected to by the closed cavity 106 of third with the second closed cavity 104.The closed cavity of third 106 quantity can be multiple.
It is provided in disc-dismounting device and the one-to-one multiple airtight cavities of multiple suction piece units 102,103 grabbing.It is multiple Suction piece unit 102,103 is separately positioned in corresponding airtight cavity, is formed a pair of with multiple suction piece units 102,103 1 The multiple annular closed cavities 130 that should be arranged.The second end of first closed cavity 105 is connected with annular closed cavity 130, pressure Contracting gas is conveyed to the tangential hole of corresponding suction piece unit via the first closed cavity 105, annular closed cavity 130.
As shown in figure 5, grabbing disc-dismounting device includes: chassis 101 and transfer panel device 121, transfer panel device 121 can be used Various structures.For example, transfer panel device 121 is arranged on chassis 101, transfer panel device 121 includes switching chassis 110, centre Disk 111, top plate 109.Switching chassis 110 is connect with telophragma 111 and chassis 101 respectively, and telophragma 111 is connect with top plate 109. On switching chassis 110, telophragma 111, the closed cavity 106 of third is formed between chassis 101, telophragma 111, top plate 109 it Between formed the second closed cavity 104.Radiation disk 108 is connect with telophragma 111 and chassis 101 respectively.Radiation disk 108, The first closed cavity 105 is formed between telophragma 111, chassis 101.
Form multiple airtight cavities between radiation disk 108 and chassis 101, the setting of suction piece unit 102,103 with its In corresponding airtight cavity.The bottom on chassis is provided with salient point 101-1, salient point 101-1 is for being positioned and being limited to substrate Position.The center setting for grabbing disc-dismounting device has the through-hole 107 of degassing function.
Transfer panel device 121 can will be evenly distributed to by the gas source for the snorkel input being arranged inside crawl arm 222 Each suction piece unit 102,103.Transfer panel device 121 is made of switching chassis 110, telophragma 111, top plate 109, between three And the closed cavity 106 of third, the second closed cavity 104 are formed with the connection of 101 airtightness of chassis, radiation disk 108 connects Telophragma 111 and chassis 101 form the first closed cavity 105 of airtightness, while suction piece unit 102,103 is embedded in radiation Between disk 108 and chassis 101, annular closed cavity 130 is formed.
Compressed gas gas source is connected by the snorkel being arranged inside crawl arm 222, compressed gas passes through third closed chamber Road 106 enters in the second closed cavity 104, via the centre bore of the second closed cavity 104 even into the first closed cavity 105, the annular closed cavity 130 where suction piece unit is arrived at, so that into the tangential hole 102-1,103-1 of each suction piece unit Air-flow it is all the same, be finally formed by and lift that power size is identical, and chip is not in the case where deflection is picked up;Meanwhile by It is uniformly and symmetrically distributed between two parties in suction piece unit 102,103, the air inlet 102-1,103-1 of suction piece unit 102,103 are also presented pair The case where title distribution, the rotary force of generation offset each other, and chip is not in rotation, also, it is brilliant in transmit process to guarantee The positioning of piece is arranged equally distributed salient point 101-1 and is limited.
In one embodiment, a kind of epitaxial reactor is provided, comprising: the contactless substrate in any embodiment as above Operate equipment.
Contactless substrate-operations equipment provided by the above embodiment, suction piece unit is uniformly distributed and compressed gas is equal It is conveyed to each suction piece unit evenly, power is identical for lifting of making that each suction piece unit formed, and the rotary force of generation can mutually offset Disappear, eliminate wafer spin, deflection situation, improves equipment accuracy;It can be realized suspension and pick and place chip, transmission chip, effectively keep away Exempt from chip and pass the problems such as piece tool is polluted caused by wafer surface, weighed wounded in fetching process, improves the quality of product;It can be with It effectively prevent high-temperature gas to damage external gas circuit and equipment etc., high temperature can be carried out and pick and place piece, it is cold to shorten equipment cooling But the time improves equipment capacity.
Above-mentioned any technical solution disclosed in the utility model unless otherwise stated, if it discloses numberical range, So disclosed numberical range is preferred numberical range, and any it should be appreciated by those skilled in the art preferred numerical value Range is only the numerical value that technical effect is obvious or representative in many enforceable numerical value.Since numerical value is more, It is impossible to exhaust, so the utility model discloses component values just to illustrate the technical solution of the utility model, also, above-mentioned The numerical value enumerated should not constitute the limitation that protection scope is created to the utility model.
Meanwhile if above-mentioned the utility model discloses or relates to the components or structural member of connection fastened to each other, Unless otherwise stated, it is fixedly connected it is to be understood that connection (such as connecting using bolt or screw) can be removedly fixed, It is to be understood that non-removable be fixedly connected with (such as riveting, welding), certainly, connection fastened to each other or integral type Structure (such as manufacturing using casting technique is integrally formed) is replaced (obviously can not be using except integrally formed technique).
In addition, for indicating positional relationship or shape applied in above-mentioned any technical solution disclosed by the utility model Term its meaning includes approximate with its, similar or close state or shape unless otherwise stated.It is provided by the utility model Either component by multiple individual component parts either assembled, or the list that integrally formed technique manufactures Only component.
Above embodiments are only to illustrate the technical solution of the utility model rather than its limitations;Although implementing referring to preferable The utility model is described in detail in example, it should be understood by those ordinary skilled in the art that: still can be to this reality It is modified with novel specific embodiment or some technical features can be equivalently replaced;Without departing from the utility model The spirit of technical solution should all be covered within the scope of the technical scheme claimed by the utility model.
Description of the utility model is given for the purpose of illustration and description, and is not that exhaustively or incite somebody to action this Utility model is limited to disclosed form.Many modifications and variations are obvious for the ordinary skill in the art. Embodiment was chosen and described in order to better illustrate the principle and practical application of the utility model, and makes the common skill of this field Art personnel it will be appreciated that the utility model to designing various embodiments suitable for specific applications with various modifications.

Claims (13)

1. a kind of contactless substrate-operations equipment characterized by comprising
Crawl arm (222) and grab disc-dismounting device;One end of the crawl arm (222) is connect with the disc-dismounting device of grabbing;Described The bottom for grabbing disc-dismounting device is provided with the multiple suction piece units (102,103) for the arrangement that is centrosymmetric;The suction piece unit (102, 103) cavity and the tangential hole communicated with the cavity (102-1,103-1) are provided with;The crawl arm is internally provided with logical Tracheae, the disc-dismounting device of grabbing are internally provided with ventilation cavity, and the snorkel passes through the ventilation cavity and the tangential hole (102-1,103-1) connection;Wherein, compressed gas passes through the snorkel, the ventilation cavity and the tangential hole (102- 1,103-1) it inputs in the cavity, forms rotating vortex in the cavity, the pressure difference generated using the rotating vortex Adsorb substrate.
2. equipment as described in claim 1, which is characterized in that
The connectivity part and the ventilation cavity of the ventilation cavity and the snorkel and each tangential hole (102-1, the 103- 1) the distance between connectivity part is equal, and compressed gas is equably conveyed to the tangential of each suction piece unit (102,103) Hole (102-1,103-1).
3. equipment as claimed in claim 2, which is characterized in that
The ventilation cavity includes: the multiple first closed cavities (105);The multiple first closed cavity (105) and described more A suction piece unit (102,103) is arranged in a one-to-one correspondence, the first end of the multiple first closed cavity (105) respectively with it is corresponding The tangential hole of suction piece unit is connected to, and the second end of the multiple first closed cavity (105) is connected, and the multiple first Closed cavity (105) is radially distributed centered on the center for grabbing disc-dismounting device;Wherein, compressed gas is via described One closed cavity (105) is conveyed to the tangential hole (102-1,103-1) of corresponding suction piece unit.
4. equipment as claimed in claim 3, which is characterized in that
The ventilation cavity includes: the second closed cavity (104);The second closed cavity (104) is located at crawl disk dress The center set;The second end of the multiple first closed cavity (105) is all connected to the described second closed cavity (104), wherein Compressed gas is evenly distributed via the described second closed cavity (104) to the multiple first closed cavity (105).
5. equipment as claimed in claim 4, which is characterized in that
The ventilation cavity includes: the closed cavity of third (106);Wherein, the snorkel passes through the closed cavity of the third (106) it is connected to the described second closed cavity (104).
6. equipment as claimed in claim 5, which is characterized in that
It is provided in disc-dismounting device and the one-to-one multiple closed chambers of the multiple suction piece unit (102,103) in described grab Body;The multiple suction piece unit (102,103) is separately positioned in the corresponding airtight cavity, formed with it is the multiple Multiple annular closed cavities (130) that suction piece unit (102,103) is arranged in a one-to-one correspondence;Wherein, the described first closed cavity (105) first end is connected with the annular closed cavity (130), compressed gas via the described first closed cavity (105), The annular closed cavity (130) is conveyed to the tangential hole of corresponding suction piece unit.
7. equipment as claimed in claim 6, which is characterized in that
The disc-dismounting device of grabbing includes: chassis (101) and transfer panel device (121);The transfer panel device (121) is arranged in institute It states on chassis (101);The transfer panel device (121) includes: switching chassis (110), telophragma (111), top plate (109);Institute State switching chassis (110) connect respectively with the telophragma (111) and the chassis (101), the telophragma (111) with it is described Top plate (109) connection, wherein formed between (101) on the switching chassis (110), the telophragma (111), the chassis The closed cavity of third (106), forms the described second closed cavity between the telophragma (111), the top plate (109) (104)。
8. equipment as claimed in claim 7, which is characterized in that further include:
It radiates disk (108);The radiation disk (108) connect with the telophragma (111) and chassis (101) respectively, wherein The described first closed cavity is formed between the radiation disk (108), the telophragma (111), the chassis (101) (105)。
9. equipment as claimed in claim 8, which is characterized in that
The multiple airtight cavity is formed between the radiation disk (108) and the chassis (101), wherein the suction piece Unit (102,103) is arranged in the corresponding airtight cavity.
10. equipment as claimed in claim 7, which is characterized in that
It is provided with salient point (101-1) in the bottom on the chassis, the salient point (101-1) is for being positioned and being limited to substrate Position.
11. equipment as claimed in claim 2, which is characterized in that
The center setting for grabbing disc-dismounting device has the through-hole (107) of degassing function.
12. equipment as described in claim 1, which is characterized in that
The suction piece unit (102,103) is provided with the cylindrical cavity, the cavity top and be located at same height At least two tangential holes (102-1,103-1) that communicate with the cavity are set at degree, the tangential hole (102-1,103-1) and The inner wall of the cavity is tangent.
13. equipment as claimed in claim 12, which is characterized in that
The quantity of the suction piece unit is even number, and the suction piece unit (102,103) of adjacent two is formed in the cavity Rotating vortex it is contrary.
CN201821230434.0U 2018-08-01 2018-08-01 Contactless substrate-operations equipment Active CN208580730U (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN201821230434.0U CN208580730U (en) 2018-08-01 2018-08-01 Contactless substrate-operations equipment
PCT/CN2019/098611 WO2020024984A1 (en) 2018-08-01 2019-07-31 Non-contact substrate operating apparatus and epitaxial reactor
JP2020572505A JP7144547B2 (en) 2018-08-01 2019-07-31 Non-contact substrate handling equipment and epitaxial reactor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201821230434.0U CN208580730U (en) 2018-08-01 2018-08-01 Contactless substrate-operations equipment

Publications (1)

Publication Number Publication Date
CN208580730U true CN208580730U (en) 2019-03-05

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108987327A (en) * 2018-08-01 2018-12-11 北京北方华创微电子装备有限公司 Contactless substrate-operations equipment
WO2020024984A1 (en) * 2018-08-01 2020-02-06 北京北方华创微电子装备有限公司 Non-contact substrate operating apparatus and epitaxial reactor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108987327A (en) * 2018-08-01 2018-12-11 北京北方华创微电子装备有限公司 Contactless substrate-operations equipment
WO2020024984A1 (en) * 2018-08-01 2020-02-06 北京北方华创微电子装备有限公司 Non-contact substrate operating apparatus and epitaxial reactor

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