CN208422917U - A kind of display base plate, display device - Google Patents

Abstract

The utility model discloses a kind of display base plate, display device, is related to field of display technology, and the crackle to solve the problems, such as that display device edge generates is easy to extend to inside display device.The display base plate, including functional area and around the neighboring area of the functional area, the neighboring area of the display base plate is provided with barrier structure, the barrier structure includes: along the direction from close to the functional area to far from the functional area, spaced multiple stop members, the stop member at least partly use metal.Display base plate provided by the utility model is for showing.

Description

A kind of display base plate, display device

Technical field

The utility model relates to field of display technology more particularly to a kind of display base plates, display device.

Background technique

Currently, display device is in use, often the problem includes: that display device edge cracks, and this splits Line is easy further to diffuse to inside the backboard of display device, and the backboard of display device is caused to damage.In order to avoid the above problem Appearance, the prior art generally the edge designs of backboard around backboard multi-turn inorganic layer grooving, to stop back plate edges Crackle further extend to the inside of backboard, but since inorganic layer itself enbrittles, so that inorganic layer is stopping crackle While extension, it is easier to as the channel of crack propagation, therefore, the extension of crackle in display device how preferably to be avoided to be One urgent problem to be solved.

Utility model content

The purpose of this utility model is to provide a kind of display base plates, display device, produce for solving display device edge Raw crackle is easy to extend to the problem inside display device.

To achieve the goals above, the utility model provides the following technical solutions:

The first aspect of the utility model provides a kind of display base plate, including functional area and around the functional area Neighboring area, the neighboring area of the display base plate are provided with barrier structure, and the barrier structure includes:

Direction of the edge from close to the functional area to far from the functional area, spaced multiple stop members, The stop member at least partly uses metal.

Optionally, each stop member includes the first subassembly and the second subassembly being stacked, wherein described Second subassembly is located at first subassembly backwards to a side surface of the underlay substrate of the display base plate, and described second is sub Component is located at the inside of orthographic projection of first subassembly on the underlay substrate in the orthographic projection on the underlay substrate.

Optionally, the first subassembly in each stop member is mutually indepedent, and the barrier structure further includes the first company Layer is connect, first articulamentum links together multiple second subassemblies far from one end of first subassembly.

Optionally, the barrier structure further includes that first articulamentum is arranged in backwards to the side of first subassembly Multiple third subassemblies, the third subassembly and first subassembly correspond, and the third subassembly is in institute The orthographic projection on underlay substrate is stated, positioned at the inside of orthographic projection of corresponding first subassembly on the underlay substrate.

Optionally, the barrier structure further includes the second articulamentum, and second articulamentum is by multiple third sub-portions Part links together far from one end of first subassembly.

Optionally, first subassembly, second subassembly, the third subassembly, first articulamentum and/ Or second articulamentum surrounds the functional area.

Optionally, first subassembly, second subassembly, the third subassembly, first articulamentum and/ Or orthographic projection wavy shape of second articulamentum on the underlay substrate of the display base plate.

Optionally, first subassembly includes the first spirte and the second spirte, first spirte and described The setting of second spirte same layer or the setting of different layer, orthographic projection of first spirte on the underlay substrate and described second Orthographic projection of the spirte on the underlay substrate can limit at least one closed open region jointly.

Optionally, the first subassembly in each stop member that the barrier structure includes is distributed in different layers, and along from Close to the functional area to the direction far from the functional area, each first subassembly moves closer to the underlay substrate；

Along the direction from close to the functional area to far from the functional area, second subassembly is vertical described Thickness gradually increases on the direction of display base plate.

Optionally, at least one of multiple described first subassemblies and the first grid layer same layer in the display base plate It is arranged with material, at least one of multiple described first subassemblies and the same material of second grid layer same layer in the display base plate At least one of material setting and/or multiple first subassemblies and the same material of semiconductor layer same layer in the display base plate Setting.

Optionally, the source layer in first articulamentum and the display base plate and drain electrode layer same layer are arranged with material, Anode layer same layer in second articulamentum and the display base plate is arranged with material.

Optionally, the display base plate further include:

First subassembly is arranged in backwards to the side of the underlay substrate in dielectric substance layer, the dielectric substance layer, described Multiple first via holes are provided on dielectric substance layer, the second subassembly one-to-one correspondence is formed in first via hole；

First articulamentum is arranged in backwards to the side of the underlay substrate in flatness layer, the flatness layer, described flat Multiple second via holes are provided on layer, the third subassembly one-to-one correspondence is formed in second via hole.

Optionally, first articulamentum is identical as each second subassembly material；Second articulamentum and each institute It is identical to state third subassembly material.

Based on the technical solution of above-mentioned display base plate, the second aspect of the utility model provides a kind of display device, including Above-mentioned display base plate.

In technical solution provided by the utility model, barrier structure, the blocking are provided in the neighboring area of display base plate Structure includes along the spaced multiple stop members in direction from close to functional area to far from functional area, so that working as crackle When extending to barrier structure, each stop member in the barrier structure can be realized the multiple blocking to crackle；Moreover, because resistance At least partly being made of metal material in stopper part, and metal material intensity with higher, preferable plasticity and extension Property, so that each stop member, during stopping to crackle, its own is less likely to occur to be broken, crackle will not be become and expanded The channel of exhibition；Therefore, technical solution provided by the utility model has better crackle blocking effect.

Detailed description of the invention

Attached drawing described herein is used to provide a further understanding of the present invention, and constitutes one of the utility model Point, the exemplary embodiment of the utility model and the description thereof are used to explain the utility model, does not constitute to the utility model Improper restriction.In the accompanying drawings:

Fig. 1 is the schematic diagram of display base plate provided by the embodiment of the utility model；

Fig. 2 is the first schematic diagram of barrier structure production process provided by the embodiment of the utility model；

Fig. 3 is the second schematic diagram of barrier structure production process provided by the embodiment of the utility model；

Fig. 4 is barrier structure production process third schematic diagram provided by the embodiment of the utility model.

Appended drawing reference:

1- display base plate, 10- functional area,

The neighboring area 11-, 12- barrier structure,

120- stop member, the first subassembly of 121-,

The first spirte of 1210-, the second spirte of 1211-,

The second subassembly of 122-, the first articulamentum of 123-,

124- third subassembly, the second articulamentum of 125-,

The first via hole of 126-, the second via hole of 127-,

The open region 128-.

Specific embodiment

In order to further illustrate display base plate provided by the embodiment of the utility model, display device, below with reference to specification Attached drawing is described in detail.

Referring to Fig. 1, display base plate 1 provided by the embodiment of the utility model includes: functional area 10 and around functional areas The neighboring area 11 in domain 10, the neighboring area 11 of display base plate 1 are provided with barrier structure 12, and barrier structure 12 includes: along from leaning on Nearly functional area 10 is to the direction far from functional area 10, and spaced multiple stop members 120, stop member 120 is extremely Small part uses metal.It is to be appreciated that two dotted lines representative of neighboring area 11 is cut along the extending direction of the dotted line in Fig. 1 It cuts, the figure surrounded by dotted line frame corresponding with two dotted lines is corresponding obtained section when being cut along two dotted lines Face schematic diagram.

Specifically, the functional area 10 of above-mentioned display base plate 1 including effective display area and is located at the effective display area periphery Circuit region, around functional area 10 neighboring area 11 be arranged barrier structure 12 include along from close to functional area 10 to The spaced multiple stop members 120 in direction far from functional area 10, multiple stop members 120 are equivalent to setting and are showing Multiple barricades of the neighboring area 11 of substrate 1, for stopping to the crackle generated at display base plate edge.In addition, above-mentioned The making material of each stop member 120 is varied, and illustratively, each stop member 120 at least partly uses metal material Production.

In actual application, when the edge of display base plate 1 generates column crackle, which can for above-mentioned display base plate 1 It can be extended to the functional area 10 of display base plate 1, when crack propagation is to the barrier structure 12 that neighboring area 11 is arranged in, meeting Stopped by the barrier structure 12 and is not easy to continue to extend to the functional areas of display base plate 1.

According to the specific structure of display base plate 1 provided by the above embodiment and actual application it is found that the utility model It is provided with barrier structure 12 in neighboring area 11 in the display base plate 1 that embodiment provides, which includes along from close Functional area 10 is to the spaced multiple stop members 120 in direction far from functional area 10, so that when crack propagation to resistance When keeping off structure 12, each stop member 120 in the barrier structure 12 can be realized the multiple blocking to crackle；Moreover, because resistance At least partly being made of metal material in stopper part 120, and metal material intensity with higher, preferable plasticity and prolong Malleability will not become so that each stop member 120, during stopping to crackle, its own is less likely to occur to be broken The channel of crack propagation；Therefore, display base plate 1 provided by the embodiment of the utility model has better crackle blocking effect, energy Enough improve the production yield of display base plate 1 and the reliability of application.

It is noted that display base plate 1 provided by the embodiment of the utility model can be particularly applicable in active matrix organic light-emitting In diode display, as the backboard in the active matrix organic light-emitting diode display device；Or the display base plate 1 As the array substrate in the liquid crystal display, but this can also should be not limited only in a liquid crystal display.

The structure of stop member 120 provided by the above embodiment is varied, in some embodiments, each stop member 120 include the first subassembly 121 and the second subassembly 122 being stacked, wherein the second subassembly 122 is located at the first subassembly 121 backwards to a side surface of the underlay substrate of display base plate 1, and orthographic projection of second subassembly 122 on underlay substrate is located at The inside of orthographic projection of first subassembly 121 on underlay substrate.

Specifically, setting stop member 120 includes the first subassembly 121 and the second subassembly 122 being stacked, not only So that stop member 120 on the direction of the underlay substrate perpendicular to display base plate 1 have thicker thickness, can perpendicular to Bigger blocking range is realized on the direction of the underlay substrate, moreover, when in the first subassembly 121 and the second subassembly 122 One it is cracked when, crackle is not easy to extend to another subassembly, so that another subassembly can also continue To the effect for stopping crackle.

In addition, orthographic projection of above-mentioned second subassembly 122 on underlay substrate and the first subassembly 121 are on underlay substrate Orthographic projection a variety of relationships may be present, illustratively, orthographic projection of second subassembly 122 on underlay substrate is located at the first sub-portion The inside of orthographic projection of the part 121 on underlay substrate.It is to be appreciated that positive throwing of above-mentioned second subassembly 122 on underlay substrate Shadow, the inside positioned at orthographic projection of first subassembly 121 on underlay substrate include the second subassembly 122 on underlay substrate Orthographic projection, with the first subassembly 121 the case where the orthographic projection on underlay substrate is overlapped.

Further, the first subassembly 121 in above-mentioned each stop member 120 is mutually indepedent, and barrier structure 12 further includes Multiple second subassemblies 122 are connected to one far from one end of the first subassembly 121 by the first articulamentum 123, the first articulamentum 123 It rises.

Specifically, first articulamentum 123 is set far from the side of the first subassembly 121 in the second subassembly 122, and passes through First articulamentum 123 links together multiple second subassemblies 122 far from one end of the first subassembly 121, so that each resistance The tower structure for being formed as pectination between stopper part 120 not only increases the whole fastness of barrier structure 12, and is arranged The first articulamentum 123 can also stop the extension of crackle, to further enhance the crackle blocking effect of barrier structure 12.

It is to be appreciated that as shown in Figure 1, the first subassembly 121 in above-mentioned each stop member 120 refers to independently of each other: when When 121 same layer of the first subassembly in each stop member 120 is arranged, the first subassembly 121 in each stop member 120 is being shown Orthographic projection on the underlay substrate of substrate is respectively independent；When 121 different layers of the first subassembly setting in each stop member 120 When, orthographic projection of first subassembly 121 on the underlay substrate of display base plate in each stop member 120 respectively independence or portion Divide overlapping.

Further, barrier structure 12 provided by the above embodiment further includes being arranged in the first articulamentum 123 backwards to first Multiple third subassemblies 124 of the side of subassembly 121, third subassembly 124 and the first subassembly 121 correspond, and the Orthographic projection of three subassemblies 124 on underlay substrate, positioned at orthographic projection of corresponding first subassembly 121 on underlay substrate It is internal.

Specifically, it is arranged with the first subassembly 121 one by one in the first articulamentum 123 backwards to the side of the first subassembly 121 Corresponding third subassembly 124, so that barrier structure 12 has thicker thickness on the direction perpendicular to underlay substrate, thus Barrier structure 12 is enabled to realize bigger blocking range on the direction perpendicular to the underlay substrate.In addition, setting the Three subassemblies 124 and the first subassembly 121 correspond, and orthographic projection of the third subassembly 124 on underlay substrate, are located at pair The inside of orthographic projection of the first subassembly 121 answered on underlay substrate, so that the first subassembly that barrier structure 12 includes 121, the second subassembly 122 and 124 three of third subassembly can correspond, and the 121, second son of corresponding first subassembly Component 122 and third subassembly 124 can be approximately formed on the direction perpendicular to underlay substrate as straight line, thus more into Enhance the blocking effect of barrier structure 12 to one step.

It is to be appreciated that orthographic projection of the above-mentioned third subassembly 124 on underlay substrate, is located at corresponding first subassembly The inside of 121 orthographic projection on underlay substrate includes orthographic projection of the third subassembly 124 on underlay substrate, with the first sub-portion Part 121 is the case where the orthographic projection on underlay substrate is overlapped.

It is noted that the position that above-mentioned third subassembly 124 is arranged, is not limited only to third subassembly 124 in underlay substrate On orthographic projection, the situation positioned at the inside of orthographic projection of corresponding first subassembly 121 on underlay substrate, above-mentioned third Orthographic projection of the component 124 on underlay substrate, can also be with orthographic projection portion of corresponding first subassembly 121 on underlay substrate Divide overlapping, or substantially overlaps.

Further, barrier structure 12 provided by the above embodiment further includes the second articulamentum 125, the second articulamentum 125 Multiple third subassemblies 124 are linked together far from one end of the first subassembly 121.

Specifically, second articulamentum 125 is set far from the side of the first subassembly 121 in third subassembly 124, and passes through Second articulamentum 125 links together multiple third subassemblies 124 far from one end of the first subassembly 121, so that One articulamentum 123 is formed backwards to the side of underlay substrate forms tower structure again, not only further enhances blocking in this way The whole fastness of structure 12.And the second articulamentum 125 of setting can also stop the extension of crackle, to further enhance The crackle blocking effect of barrier structure 12.

Further, the first subassembly 121 provided by the above embodiment, the second subassembly 122, third subassembly 124, The specific structure of one articulamentum 123 and the second articulamentum 125 is varied, illustratively, as shown in Fig. 2, the first subassembly 121, the second subassembly 122, third subassembly 124, the first articulamentum 123 and/or the second articulamentum 125 surround functional area 10。

Specifically, be arranged the first subassembly 121, the second subassembly 122, third subassembly 124, the first articulamentum 123 and/ Or second articulamentum 125 surround functional area 10, can be realized barrier structure 12 by functional area 10 completely surround, so no matter Functional area 10 of the crackle that 1 edge of display base plate generates from any position to display base plate 1 extends, and barrier structure 12 can The crackle is stopped, by several minimums of crack propagation to functional area 10.

In some embodiments, as shown in figure 3, above-mentioned first subassembly 121, the second subassembly 122, third subassembly 124, the wavy shape of orthographic projection of the first articulamentum 123 and/or the second articulamentum 125 on the underlay substrate of display base plate 1.

Specifically, be arranged the first subassembly 121, the second subassembly 122, third subassembly 124, the first articulamentum 123 and/ Or second orthographic projection wavy shape of the articulamentum 125 on the underlay substrate of display base plate 1, which can be specially side Waveform shape or wave-like with radian enable to barrier structure 12 to have a better stress ability to bear, in this way when splitting When line extends to barrier structure 12, barrier structure 12 is not easy to crack, and realizes better crackle blocking effect.

In some embodiments, as shown in figure 4, above-mentioned first subassembly 121 includes the first spirte 1210 and the second son Figure 1211, the first spirte 1210 and the setting of 1211 same layer of the second spirte or the setting of different layer, the first spirte 1210 is aobvious Show the orthographic projection on the underlay substrate of substrate 1 and orthographic projection energy of second spirte 1211 on the underlay substrate of display base plate 1 It is enough to limit at least one closed open region 128 jointly.

Specifically, above structure is set by the first subassembly 121, so that foring bilayer around open region 128 The crackle that generates in this way when 1 edge of display base plate of barricade during extension after first layer barricade, there are also second Layer barricade stops crackle, it is seen that the first subassembly 121 that above structure is arranged can preferably promote barrier structure 12 Crackle blocking capability.

Further, as shown in Figure 1, in each stop member 120 that barrier structure provided by the above embodiment 12 includes First subassembly 121 can be distributed in different layers, and along the direction from close to functional area 10 to far from functional area 10, and each first Subassembly 121 moves closer to underlay substrate；Along the direction from close to functional area 10 to far from functional area 10, the second subassembly 122 on the direction of vertically displayed substrate 1 thickness gradually increase.

Specifically, the barrier structure 12 of above structure, so that along from close to functional area 10 to separate functional area 10 Direction, the stop member 120 that barrier structure 12 includes thickness on the direction of vertically displayed substrate 1 gradually increase, i.e. blocking portion Blocking range of the part 120 on the direction of vertically displayed substrate 1 is gradually increased, so that in the position at the edge close to display base plate 1 It sets, stop member 120 is capable of the extension of large area blocking crackle, and in the position close to 1 functional area 10 of display base plate, stop Component 120 can stop the area of crackle smaller, and 1 edge of display base plate can not only be produced by allowing for barrier structure 12 in this way Raw crackle is effectively blocked in 10 remote position of range capability region, and at the position close to functional area 10 still The extension of crackle can be limited, to realize while effectively stopping to crackle, has preferably saved production barrier structure 12 cost.

In barrier structure 12 provided by the above embodiment, each subassembly, the first articulamentum 123 and the second articulamentum 125 The position of making material and formation can be set according to actual needs, and some each subassemblies, the first articulamentum 123 are set forth below Type and specific set-up mode are selected with the material of the second articulamentum 125, but is not limited only to this.

In some embodiments, at least one of settable multiple first subassemblies 121 and first in display base plate 1 Grid layer same layer is arranged with material, and at least one of multiple first subassemblies 121 and the second grid layer in display base plate 1 are same Layer is the same as at least one of material setting and/or multiple first subassemblies 121 and the same material of semiconductor layer same layer in display base plate 1 Material setting.

Specifically, at least one of multiple first subassemblies 121 and the first grid layer same layer in display base plate 1 are same Material setting, can be realized and pass through a patterning processes while making first grid layer and at least one first subassembly 121；It will At least one of multiple first subassemblies 121 are arranged with the second grid layer same layer in display base plate 1 with material, can be realized Second grid layer and at least one first subassembly 121 are made simultaneously by a patterning processes；By multiple first subassemblies 121 At least one of with the semiconductor layer same layer in display base plate 1 with material be arranged, can be realized same by a patterning processes When production semiconductor layer and at least one first subassembly 121.

As it can be seen that the first subassembly 121 is arranged in the manner described above, do not need to increase additional the first subassembly of special production 121 technique, reduces the cost of production barrier structure 12, and by the first subassembly 121 using with first grid layer and the The identical metal material production of two grid layers, so that the first subassembly 121 of production has preferable flexibility, it is not easy to become The channel of crack propagation.

It is noted that the semiconductor layer for including in display base plate 1 in the prior art, first grid layer and second grid layer Distribution mode is general are as follows: along the underlay substrate close to display base plate 1 to the direction of the underlay substrate far from display base plate 1, partly leads Body layer, first grid layer and second grid layer are set gradually, thus when barrier structure 12 provided by the above embodiment include it is each The first subassembly 121 in stop member 120 is distributed in different layers, and along from close to functional area 10 to separate functional area 10 Direction, when each first subassembly 121 moves closer to underlay substrate, with barrier structure 12 include three the first subassemblies 121 be Example can will be then arranged with second grid layer same layer with material near the first subassembly 121 of functional area 10, will be apart from function The first farthest subassembly 121 of energy region 10 is arranged with semiconductor layer same layer with material, will be located in the middle the first subassembly 121 It is arranged with first grid layer same layer with material, so that each first subassembly 121 is while meeting above-mentioned distribution mode, no The technique for needing to increase additional the first subassembly 121 of special production, preferably reduces the cost of production barrier structure 12.

In addition, when above-mentioned first subassembly 121 includes the first spirte 1210 and the second spirte 1211, and the first subgraph It, can be by the first spirte 1210 and the same material of first grid layer same layer when shape 1210 and the second spirte 1211 are located at different layers Second spirte 1211 is arranged with second grid layer same layer with material for material setting；Or by the first spirte 1210 with partly lead Body layer same layer is arranged with material, and the second spirte 1211 is arranged with second grid layer same layer with material；Or by the first subgraph Shape 1210 and semiconductor layer same layer are arranged with material, and the second spirte 1211 is arranged with first grid layer same layer with material.

In some embodiments, can by the first articulamentum 123 in display base plate 1 source layer and drain electrode layer same layer it is same Second articulamentum 125 is arranged with the anode layer same layer in display base plate 1 with material for material setting.

Specifically, by the first articulamentum 123 in display base plate 1 source layer and drain electrode layer same layer be arranged with material, energy Enough realize makes the first articulamentum 123 and source layer and drain electrode layer in display base plate 1 by a patterning processes simultaneously；By Two articulamentums 125 are arranged with the anode layer same layer in display base plate 1 with material, can be realized through a patterning processes while making Make the anode layer in the second articulamentum 125 and display base plate 1.

As it can be seen that the first articulamentum 123 and the second articulamentum 125 are arranged in the manner described above, do not need to increase additionally special The technique of door production the first articulamentum 123 and the second articulamentum 125, reduces the cost of production barrier structure 12, and by the One articulamentum 123 is made of metal material identical with source layer and drain electrode layer, and the second articulamentum 125 is used and sun Layer identical metal material production in pole is not allowed so that the first articulamentum 123 and the second articulamentum 125 have preferable flexibility Easily become the channel of crack propagation.

In some embodiments, display base plate 1 further includes dielectric substance layer and flatness layer, and wherein dielectric substance layer is arranged first Subassembly 121 is provided with multiple first via holes 126 on the side of underlay substrate, dielectric substance layer, and the second subassembly 122 is one by one It is correspondingly formed in the first via hole 126；The first articulamentum 123 is arranged on the side of underlay substrate, flatness layer in flatness layer Multiple second via holes 127 are provided with, the one-to-one correspondence of third subassembly 124 is formed in the second via hole 127.

Specifically, when making display base plate 1, in semiconductor layer, first grid layer, second grid layer and Source and drain metal level Dielectric substance layer can be made between each layer in (including source layer and drain electrode layer), and the dielectric substance layer is generally flood laying, Therefore, after having made the first subassembly 121, it will form dielectric substance layer on the first subassembly 121, can pass through in this way First via hole 126 is being set on the dielectric substance layer being located above the first subassembly 121, and is making in first via hole 126 the Two subassemblies 122.Moreover, after having made Source and drain metal level, it generally can be in Source and drain metal level backwards to the side of underlay substrate Therefore the flatness layer for being laid with flood after having made the first articulamentum 123, will form flatness layer on the first articulamentum 123, It in this way can be by the way that the second via hole 127 be arranged on the flatness layer being located above the first articulamentum 123, and in second via hole Third subassembly 124 is made in 127.

It is to be appreciated that when each first subassembly 121 that barrier structure 12 includes is respectively formed at different layers, with blocking junction For structure 12 is including three subassemblies, when the first subassembly 121 and the same material of second grid layer same layer near functional area 10 Material setting, the first farthest subassembly 121 of range capability region 10 are arranged with semiconductor layer same layer with material, are located in the middle the When one subassembly 121 is arranged with first grid layer same layer with material, the first farthest sub-portion of range capability region 10 is being made After part 121, the first dielectric substance layer can be made backwards to the surface of underlay substrate in first subassembly 121, in having made and being located at Between the first subassembly 121 after, can first subassembly 121 backwards to underlay substrate surface make the second dielectric substance layer, when It has made after the first subassembly 121 of functional area 10, it can be in first subassembly 121 backwards to the surface of underlay substrate Third dielectric substance layer is made, therefore, when making multiple first via holes 126, the first farthest sub-portion with range capability region 10 Corresponding first via hole 126 of part 121 needs while running through the first dielectric substance layer, the second dielectric substance layer and third dielectric substance layer, with Corresponding first via hole 126 of the first subassembly 121 is located in the middle to need while through the second dielectric substance layer and third dielectric medium Layer, first via hole 126 corresponding with the first subassembly 121 near functional area 10 only run through third dielectric substance layer.

Further, when each second subassembly 122 is formed in the first via hole 126, settable above-mentioned first articulamentum 123 is identical as each second subassembly, 122 material；When each third subassembly 124 is formed in the second via hole 127, settable Two articulamentums 125 are identical as each 124 material of third subassembly.

Specifically, when each second subassembly 122 is formed in the first via hole 126, the first articulamentum 123 of setting and each the Two subassemblies, 122 material is identical, can be realized and passes through a patterning processes while making each second subassembly 122 and the first connection Layer 123；Likewise, when each third subassembly 124 is formed in the second via hole 127, the second articulamentum of setting 125 and each third Identical can be realized of 124 material of subassembly passes through a patterning processes while making each third subassembly 124 and the second articulamentum 125；As it can be seen that above-mentioned the first articulamentum of setting 123 is identical as each second subassembly, 122 material, and the second articulamentum 125 of setting It is identical as each 124 material of third subassembly, the cost of production barrier structure 12 can be further decreased.

The utility model embodiment additionally provides a kind of display device, including display base plate provided by the above embodiment 1.

Due to being provided with barrier structure 12, the blocking junction in neighboring area 11 in display base plate 1 provided by the above embodiment Each stop member 120 in structure 12 can be realized the multiple blocking to crackle；Moreover, each stop member 120 is carried out to crackle During blocking, its own is less likely to occur to be broken, and will not become the channel of crack propagation；Therefore, the utility model is implemented The display device that example provides equally has preferable crackle blocking effect when including above-mentioned display base plate 1.

When making the display base plate that above-mentioned utility model embodiment provides, referring specifically to attached drawing 2-4, production method packet It includes: making multiple stop members 120 in the neighboring area of display base plate 1 11, multiple stop members 120 are along from close to functional area 10 to far from functional area 10 direction interval be arranged, and stop member 120 at least partly use metal.

Specifically, metal material can be used and make multiple stop members 120 in the neighboring area of display base plate 1 11, due to Multiple stop members 120 are arranged along the direction interval from close to functional area 10 to far from functional area 10, are equivalent to setting and exist Multiple barricades of the neighboring area 11 of display base plate 1, for stopping to the crackle generated at 1 edge of display base plate.

When making the display base plate 1 that above-mentioned utility model embodiment provides, barrier structure has been made in neighboring area 11 12, which includes along the spaced multiple blockings in direction from close to functional area 10 to far from functional area 10 Component 120, so that when crack propagation to barrier structure 12, each stop member 120 in the barrier structure 12 be can be realized pair The multiple blocking of crackle；Moreover, because at least partly being made of metal material in stop member 120, and metal material has There are higher intensity, preferable plasticity and ductility, so that each stop member 120 is during stopping crackle, Itself it is less likely to occur to be broken, the channel of crack propagation will not be become.

Further, above-mentioned in display base when stop member 120 includes the first subassembly 121 and the second subassembly 122 The step of neighboring area 11 of plate 1 makes multiple stop member 120 specifically includes:

Make the first subassembly 121 that each stop member 120 includes, the first subassembly 121 that each stop member 120 includes Independently of each other；Specifically, when the multiple first subassemblies 121 equal same layer to be made setting, metal material can be used and formed Then metallic diaphragm is patterned the metallic diaphragm, obtain mutually independent multiple first subassemblies 121；Alternatively, when being wanted When multiple first subassemblies 121 of production are located at different layers, metallic diaphragm can be made respectively in different layers, then to metal Film layer is patterned, and obtains multiple first subassemblies 121 positioned at different layers.

The second subassembly 122 is made in a side surface of underlay substrate of each first subassembly 121 backwards to display base plate 1, Orthographic projection of second subassembly 122 on underlay substrate is located at the inside of orthographic projection of first subassembly 121 on underlay substrate. Specifically, after the production for completing the first subassembly 121, metal material can be used in each first subassembly 121 backwards to display base One side surface of the underlay substrate of plate 1 makes the second subassembly 122.

Multiple stop members 120 are made using above-mentioned production method, so that made stop member 120 is by being stacked The first subassembly 121 and the second subassembly 122 constitute, not only make stop member 120 perpendicular to display base plate 1 in this way There is thicker thickness on the direction of underlay substrate, can realize bigger blocking on the direction perpendicular to the underlay substrate Range, moreover, crackle is not easy to extend to another when one in the first subassembly 121 and the second subassembly 122 is cracked An outer subassembly, so that another subassembly can also continue to play the role of stopping crackle.

Further, when in display base plate 1 including first grid layer, second grid layer and semiconductor layer, above-mentioned production The step of the first subassembly 121 that each stop member 120 includes, specifically includes:

At least one of multiple first subassemblies 121 and first grid layer are made simultaneously by a patterning processes；Tool Body, the metallic film that metal material forms flood can be used, photoresist layer is made on metallic film, photoresist layer is carried out Exposure, development, form photoresist retention area and photoresist removes region, wherein corresponding first subassembly of photoresist retention area 121 and first grid layer where region, photoresist removes that region is corresponding to remove the first subassembly 121 and first grid layer location Other regions except domain perform etching the metallic film for being located at photoresist removal region using etching technics, will be located at The metallic film in photoresist removal region completely removes, and will finally be located at the photoresist lift off of photoresist retention area, and form the One subassembly 121 and first grid layer.

At least one of multiple first subassemblies 121 and second grid layer are made simultaneously by a patterning processes；Tool Body, the metallic film that metal material forms flood can be used, photoresist layer is made on metallic film, photoresist layer is carried out Exposure, development, form photoresist retention area and photoresist removes region, wherein corresponding first subassembly of photoresist retention area 121 and second grid layer where region, photoresist removes that region is corresponding to remove the first subassembly 121 and second grid layer location Other regions except domain perform etching the metallic film for being located at photoresist removal region using etching technics, will be located at The metallic film in photoresist removal region completely removes, and will finally be located at the photoresist lift off of photoresist retention area, and form the One subassembly 121 and second grid layer.

And/or at least one of multiple first subassemblies 121 and semiconductor are made simultaneously by a patterning processes Layer.

Specifically, the semiconductive thin film that semiconductor material forms flood can be used, photoresist is made on semiconductive thin film Layer, is exposed photoresist layer, develops, and forms photoresist retention area and photoresist removes region, wherein photoresist retains Region where corresponding first subassembly 121 in region and semiconductor layer, it is corresponding except 121 He of the first subassembly that photoresist removes region Other regions except semiconductor layer region, using etching technics to be located at photoresist removal region semiconductive thin film into The semiconductive thin film for being located at photoresist removal region is completely removed, will finally be located at photoresist retention area by row etching Photoresist lift off forms the first subassembly 121 and semiconductor layer.

First subassembly 121 is made using above-mentioned production method, does not need to increase additional the first subassembly of special production 121 technique, reduces the cost of production barrier structure 12, and by the first subassembly 121 using with first grid layer and the The identical metal material production of two grid layers, so that the first subassembly 121 of production has preferable flexibility, it is not easy to become The channel of crack propagation.

Further, it when barrier structure 12 further includes the first articulamentum 123, and display base plate 1 includes dielectric substance layer, is making Before making the second subassembly 122, above-mentioned packet also specific the step of the neighboring area of display base plate 1 11 makes barrier structure 12 It includes:

Dielectric substance layer is made backwards to the surface of the underlay substrate of display base plate 1 in the first subassembly 121；

It specifically, can be heavy backwards to the surface of the underlay substrate of display base plate 1 in the first subassembly 121 using insulating materials Product dielectric substance layer.It is noted that when each first subassembly 121 that barrier structure 12 includes is located at different layers, every production After complete one layer of the first subassembly 121, it is required to make dielectric backwards to the side of underlay substrate in the first subassembly of this layer 121 Matter layer.

Dielectric substance layer is patterned, multiple first via holes 126 are formed；

Specifically, patterning processes can be used to be patterned dielectric substance layer, to form multiple first mistakes on dielectric substance layer Hole 126.It is noted that multiple via holes and multiple first subassemblies 121 correspond, and the first via hole 126 is on underlay substrate Orthographic projection, positioned at the inside of orthographic projection of corresponding first subassembly 121 on underlay substrate.

After the production for completing multiple first via holes 126, it is above-mentioned in each first subassembly 121 backwards to the lining of display base plate 1 A step of side surface the second subassembly 122 of production of substrate, specifically includes:

Multiple second subassemblies 122 and the first articulamentum 123, multiple second sub-portions are made simultaneously by a patterning processes Part 122, which corresponds, to be located in multiple first via holes 126, and the first articulamentum 123 is by multiple second subassemblies 122 far from the first son One end of component 121 links together.

It specifically, can be in dielectric layer backwards to the side deposited metal of underlay substrate after having made multiple first via holes 126 Material enables metal material to be filled up completely multiple first via holes 126, and can be in dielectric layer backwards to the side of underlay substrate Surface forms metallic diaphragm, is then patterned, is formed simultaneously multiple in multiple first via holes 126 to the metallic diaphragm Second subassembly 122, and multiple second subassemblies 122 are linked together far from one end of the first subassembly 121 first Articulamentum 123.

Second subassembly 122 and the first articulamentum 123 are made using above-mentioned production method, can be realized through a composition Technique is formed simultaneously the second subassembly 122 and the first articulamentum 123, effectively reduces the cost of manufacture of barrier structure 12.

Further, it when display base plate 1 further includes source layer and drain electrode layer, is made simultaneously above by a patterning processes The step of making multiple second subassemblies 122 and the first articulamentum 123 specifically includes:

Multiple second subassemblies 122, the first articulamentum 123, source layer and drain electrode are made simultaneously by a patterning processes Layer.

Specifically, metal material can be used to deposit to form metallic film, then form photoresist layer on the metallic film, The photoresist layer is exposed, is developed, photoresist retention area is formed and photoresist removes region, wherein photoresist reserved area Domain corresponds to the region where multiple second subassemblies 122, the first articulamentum 123, source layer and drain electrode layer, and photoresist removes region Corresponding other regions in addition to multiple second subassemblies 122, the first articulamentum 123, source layer and drain electrode layer region, are adopted The metallic film for being located at photoresist removal region is performed etching with etching technics, is completely removed, finally by photoresist The photoresist for retaining region is all removed, and multiple second subassemblies 122, the first articulamentum 123, source layer and drain electrode layer are completed Production.

When making the second subassembly 122 and the first articulamentum 123 using above-mentioned production method, it can be realized through a structure Figure technique makes multiple second subassemblies 122, the first articulamentum 123, source layer and drain electrode layer simultaneously, avoids and increases additionally For specially making the technical process of the second subassembly 122 and the first articulamentum 123, the system of barrier structure 12 further reduced Make cost.

Further, when barrier structure 12 further includes third subassembly 124, after making the first articulamentum 123, on It states and is also specifically included the step of the neighboring area of display base plate 1 11 makes barrier structure 12:

Multiple third subassemblies 124, third sub-portion are made backwards to the side of the first subassembly 121 in the first articulamentum 123 Part 124 and the first subassembly 121 correspond, and orthographic projection of the third subassembly 124 on underlay substrate, are located at corresponding the The inside of orthographic projection of one subassembly 121 on underlay substrate.

Specifically, complete the first articulamentum 123 production after, can be used metal material the first articulamentum 123 backwards One side surface of the underlay substrate of display base plate 1 makes third subassembly 124.

When making third subassembly 124 using above-mentioned production method, made 124 flexibility of third subassembly is more preferable, It can be realized good crackle blocking effect.In addition, made third subassembly 124 and the first subassembly 121 correspond, And orthographic projection of the third subassembly 124 on underlay substrate, positioned at positive throwing of corresponding first subassembly 121 on underlay substrate The inside of shadow, 124 three of the first subassembly 121, the second subassembly 122 and third subassembly for enabling barrier structure 12 to include It is enough to correspond, and corresponding first subassembly 121, the second subassembly 122 and third subassembly 124 are perpendicular to underlay substrate Direction on can approximately form as straight line, to further enhance the blocking effect of barrier structure 12.

Further, it when barrier structure 12 further includes the second articulamentum 125, and display base plate 1 includes flatness layer, is making It is above-mentioned also to be specifically included the step of the neighboring area of display base plate 1 11 makes barrier structure 12 after first articulamentum 123:

Flatness layer is made backwards to the surface of the underlay substrate of display base plate 1 in the first articulamentum 123；

Specifically, the second articulamentum in source layer and drain electrode layer and barrier structure 12 in display base plate 1 is completed When 125, it can deposit to form flatness layer backwards to the side of underlay substrate in source layer, drain electrode layer and the second articulamentum 125.

Flatness layer is patterned, multiple second via holes 127 are formed；

Specifically, patterning processes can be used to be patterned flatness layer, to form multiple second via holes on flatness layer 127.It is noted that multiple second via holes 127 are corresponded with multiple third subassemblies 124, and the second via hole 127 is in substrate base Orthographic projection on plate, positioned at the inside of orthographic projection of corresponding first subassembly 121 on underlay substrate.

After the production for completing multiple second via holes 127, it is above-mentioned in the first articulamentum 123 backwards to the first subassembly 121 The step of side production multiple third subassembly 124, specifically includes:

Multiple third subassemblies 124 and the second articulamentum 125, multiple third sub-portions are made simultaneously by a patterning processes Part 124, which corresponds, to be located in multiple second via holes 127, and the second articulamentum 125 is by multiple third subassemblies 124 far from the first son One end of component 121 links together.

It specifically, can be in flatness layer backwards to the side deposited metal of underlay substrate after having made multiple second via holes 127 Material enables metal material to be filled up completely multiple second via holes 127, and can be in flatness layer backwards to the side of underlay substrate Surface forms metallic diaphragm, is then patterned to the metal, the multiple thirds being formed simultaneously in multiple second via holes 127 Subassembly 124, and the second connection that multiple third subassemblies 124 are linked together far from one end of the first subassembly 121 Layer 125.

Third subassembly 124 and the second articulamentum 125 are made using above-mentioned production method, can be realized through a composition Technique is formed simultaneously third subassembly 124 and the second articulamentum 125, effectively reduces the cost of manufacture of barrier structure 12.

Further, when display base plate 1 further includes anode layer, multiple the are made simultaneously above by patterning processes The step of three subassemblies 124 and the second articulamentum 125, specifically includes:

Multiple third subassemblies 124, the second articulamentum 125 and anode layer are made simultaneously by a patterning processes.

It specifically, can be in flatness layer backwards to the side deposited metal of underlay substrate after having made multiple second via holes 127 Material enables metal material to be filled up completely multiple second via holes 127, and can be in flatness layer backwards to the side of underlay substrate Surface forms metallic diaphragm, is then patterned to the metal, is formed simultaneously anode layer, in multiple second via holes 127 Multiple third subassemblies 124, and multiple third subassemblies 124 are linked together far from one end of the first subassembly 121 Second articulamentum 125.

Multiple third subassemblies 124, the second articulamentum 125 and anode layer are made using above-mentioned production method, can be realized Multiple third subassemblies 124, the second articulamentum 125 and anode layer are made simultaneously by a patterning processes, avoids increase volume The outer technical process for specially production third subassembly 124 and the second articulamentum 125, further reduced barrier structure 12 Cost of manufacture.

Unless otherwise defined, the technical term or scientific term that the disclosure uses should be the utility model fields The ordinary meaning that the interior personage with general technical ability is understood." first ", " second " used in the disclosure and similar word Language is not offered as any sequence, quantity or importance, and is used only to distinguish different component parts." comprising " or " packet Containing " etc. similar word mean to occur the element or object before the word cover appear in the word presented hereinafter element or Object and its equivalent, and it is not excluded for other elements or object.The similar word such as " connection " or " connected " is not limited to Physics or mechanical connection, but may include electrical connection, it is either direct or indirect."upper", "lower", "left", "right" etc. is only used for indicating relative positional relationship, and after the absolute position for being described object changes, then the relative position is closed System may also correspondingly change.

It is appreciated that ought such as layer, film, region or substrate etc element be referred to as be located at another element "above" or "below" When, which " direct " can be located at "above" or "below" another element, or may exist intermediary element.

In the description of above embodiment, particular features, structures, materials, or characteristics can be at any one or more It can be combined in any suitable manner in a embodiment or example.

Above description is only a specific implementation of the present invention, but the protection scope of the utility model is not limited to In this, anyone skilled in the art within the technical scope disclosed by the utility model, can readily occur in variation Or replacement, it should be covered within the scope of the utility model.Therefore, the protection scope of the utility model should be with the power Subject to the protection scope that benefit requires.

Claims (14)

1. a kind of display base plate, including functional area and around the neighboring area of the functional area, which is characterized in that described aobvious Show that the neighboring area of substrate is provided with barrier structure, the barrier structure includes:

Along the direction from close to the functional area to far from the functional area, spaced multiple stop members are described Stop member at least partly uses metal.

2. display base plate according to claim 1, which is characterized in that each stop member includes be stacked One subassembly and the second subassembly, wherein second subassembly is located at first subassembly backwards to the lining of the display base plate One side surface of substrate, and orthographic projection of second subassembly on the underlay substrate is located at first subassembly and exists The inside of orthographic projection on the underlay substrate.

3. display base plate according to claim 2, which is characterized in that the first subassembly in each stop member is mutual Independent, the barrier structure further includes the first articulamentum, and first articulamentum is by multiple second subassemblies far from described One end of first subassembly links together.

4. display base plate according to claim 3, which is characterized in that the barrier structure further includes being arranged described first Multiple third subassemblies of the articulamentum backwards to the side of first subassembly, the third subassembly and first subassembly It corresponds, and orthographic projection of the third subassembly on the underlay substrate, is located at corresponding first subassembly and exists The inside of orthographic projection on the underlay substrate.

5. display base plate according to claim 4, which is characterized in that the barrier structure further includes the second articulamentum, institute It states the second articulamentum and multiple third subassemblies links together far from one end of first subassembly.

6. display base plate according to claim 5, which is characterized in that first subassembly, second subassembly, institute Third subassembly, first articulamentum and/or second articulamentum are stated around the functional area.

7. display base plate according to claim 5, which is characterized in that first subassembly, second subassembly, institute Third subassembly, first articulamentum and/or second articulamentum are stated on the underlay substrate of the display base plate just Project wavy shape.

8. according to the described in any item display base plates of claim 4~7, which is characterized in that first subassembly includes first Spirte and the second spirte, first spirte and the second spirte same layer setting or the setting of different layer, described first Spirte can be total in the orthographic projection on the underlay substrate with orthographic projection of second spirte on the underlay substrate It is same to limit at least one closed open region.

9. display base plate according to claim 2, which is characterized in that in each stop member that the barrier structure includes First subassembly is distributed in different layers, and along the direction from close to the functional area to far from the functional area, and each first Subassembly moves closer to the underlay substrate；

Along the direction from close to the functional area to far from the functional area, second subassembly is in the vertical display Thickness gradually increases on the direction of substrate.

10. display base plate according to claim 9, which is characterized in that at least one of multiple described first subassemblies It is arranged with the first grid layer same layer in the display base plate with material, at least one of multiple described first subassemblies and institute The second grid layer same layer in display base plate is stated at least one of material setting and/or multiple described first subassemblies and institute The semiconductor layer same layer stated in display base plate is arranged with material.

11. display base plate according to claim 5, which is characterized in that in first articulamentum and the display base plate Source layer and drain electrode layer same layer be arranged with material, the same material of anode layer same layer in second articulamentum and the display base plate Material setting.

12. display base plate according to claim 5 or 6, which is characterized in that the display base plate further include:

First subassembly is arranged in backwards to the side of the underlay substrate, the dielectric in dielectric substance layer, the dielectric substance layer Multiple first via holes are provided on matter layer, the second subassembly one-to-one correspondence is formed in first via hole；

First articulamentum is arranged on the side of the underlay substrate, the flatness layer in flatness layer, the flatness layer Multiple second via holes are provided with, the third subassembly one-to-one correspondence is formed in second via hole.

13. display base plate according to claim 12, which is characterized in that first articulamentum and each second sub-portion Part material is identical；Second articulamentum is identical as each third subassembly material.

14. a kind of display device, which is characterized in that including the described in any item display base plates of such as claim 1~13.