CN208378978U - A kind of mask assembly and evaporated device - Google Patents
A kind of mask assembly and evaporated device Download PDFInfo
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- CN208378978U CN208378978U CN201821087922.0U CN201821087922U CN208378978U CN 208378978 U CN208378978 U CN 208378978U CN 201821087922 U CN201821087922 U CN 201821087922U CN 208378978 U CN208378978 U CN 208378978U
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Abstract
The utility model discloses a kind of mask assembly and evaporated devices.The mask assembly includes the first mask plate and the second mask plate being stacked, the first vapor deposition aperture is provided on first mask plate, occlusion area and the surrounding edge region positioned at the occlusion area periphery and for limiting vapor deposition region are provided on second mask plate, the second vapor deposition aperture is provided in the surrounding edge region, in the surrounding edge region, the first vapor deposition aperture is located in the second vapor deposition aperture in the orthographic projection on second mask plate.The mask assembly, during throwing the net, occlusion area will not influence the precision of the first vapor deposition aperture, to, evaporation material always can be by the first vapor deposition aperture vapor deposition to OLED pixel position, and it is inaccurate to avoid vapor deposition position caused by the process of throwing the net, and ensure that evaporation effect, vapor deposition colour mixture is avoided, the quality of display panel is improved.
Description
Technical field
The utility model relates to field of display technology, and in particular to a kind of mask assembly and evaporated device.
Background technique
Organic Light Emitting Diode (Organic Light Emitting Diode, OLED) display panel has autonomous hair
The advantages that light, thickness is thin, light-weight, fast response time, visual angle are wide, rich in color and high brightness, low-power consumption, high-low temperature resistant,
It is widely used in the products such as mobile phone, wrist-watch, computer, television set.OLED device includes various organic functional material layers, currently,
The mainstream technology of production OLED device is that various organic functional material layers are formed on substrate to be deposited using evaporation process.It is steaming
In depositing process, the precision of mask plate directly affects the precision of vapor deposition pattern, and then influences the evaporation effect of display area.
At OLED display panel market initial stage, due to the limitation of technology, the shape of OLED display panel is mainly rectangle.With
The continuous mature and consumer continuous improvement that aesthetic feeling is required of OLED technology, each oled panel manufacturer in recent years
Start to release and there is rounding the corner structure even OLED display panel of polymorphic structure, especially when Apple Inc. releases special-shaped panel
After mobile phone, the display panel of polymorphic structure gradually becomes the development trend of OLED display panel.At this stage, people pay close attention to the most
Polymorphic structure OLED display panel is annular display panel, and still, producing annular display panel using evaporation process, there is also one
A little technical problems, for example, being easy to appear annular display area during producing annular display panel using evaporation process and steaming
The problem of plating aperture accuracy decline, affects the evaporation effect of display area.
Utility model content
The purpose of the utility model embodiment is to provide a kind of mask assembly and evaporated device, to solve in production OLED
During annular display panel, the technical issues of the vapor deposition aperture accuracy decline of annular display area, annular display area is improved
Evaporation effect.
In order to solve the above-mentioned technical problem, the utility model embodiment provides a kind of mask assembly, the mask assembly packet
The first mask plate and the second mask plate being stacked are included, is provided with the first vapor deposition aperture on first mask plate, described
Occlusion area and the surrounding edge region positioned at the occlusion area periphery and for limiting vapor deposition region are provided on two mask plates,
The second vapor deposition aperture is provided in the surrounding edge region, in the surrounding edge region, the first vapor deposition aperture is described second
Orthographic projection on mask plate is located in the second vapor deposition aperture.
Optionally, in the surrounding edge region, the second vapor deposition aperture is set with the first vapor deposition aperture one-to-one correspondence
It sets.
Optionally, the cross-sectional shape phase of the cross-sectional shape of the second vapor deposition aperture and the first vapor deposition aperture
Together.
Optionally, the thickness of second mask plate is greater than the thickness of first mask plate.
Optionally, the second vapor deposition hole is along vapor deposition direction in contraction-like.
Optionally, setting is fluted in the occlusion area.
Optionally, the depth of the groove is less than or equal to the 1/2 of the second exposure mask plate thickness.
Optionally, the quantity of the groove is multiple, and multiple grooves are evenly arranged in the occlusion area.
Optionally, the cross-sectional shape of the groove is identical as the second vapor deposition cross-sectional shape in hole.
In order to solve the above-mentioned technical problem, the utility model embodiment also provides a kind of evaporated device, including the above
Mask assembly, further include evaporation source, second mask plate is arranged towards the evaporation source direction.
The mask assembly of the present embodiment, the non-through occlusion area for carving structure are arranged on the second mask plate, therefore, are throwing the net
In the process, the neighbouring unbalance stress of occlusion area on the second mask plate, causes occlusion area nearby second to be deposited under the precision of aperture
Drop, since in surrounding edge region, the first vapor deposition aperture is located in the second vapor deposition aperture in the orthographic projection on the second mask plate,
So the first vapor deposition will not be caused to open even if the accuracy decline of the second vapor deposition aperture causes the second vapor deposition position of opening to deviate
Hole is blocked, thus, evaporation material always can be by the first vapor deposition aperture vapor deposition to the display area of display panel, due to the
The non-through occlusion area for carving structure is not provided on one mask plate, therefore, during throwing the net, on the first mask plate be not in by
Power is uneven, would not also influence the precision of the first vapor deposition aperture, to would not also cause vapor deposition position inaccurate, guarantees
Evaporation effect, avoids vapor deposition colour mixture, improves the quality of display panel.
Other features and advantages of the utility model will illustrate in the following description, also, partly from specification
In become apparent, or understood and implementing the utility model.The purpose of this utility model and other advantages can pass through
Specifically noted structure is achieved and obtained in the specification, claims and drawings.
Detailed description of the invention
Attached drawing is used to provide to further understand technical solutions of the utility model, and constitutes part of specification,
It is used to explain the technical solution of the utility model together with embodiments herein, not constitute to technical solutions of the utility model
Limitation.
Fig. 1 is a kind of annular OLED display panel；
Fig. 2 is a kind of for producing the mask plate of display panel shown in Fig. 1；
Fig. 3 is that force analysis during throwing the net of mask plate shown in Fig. 2 simulates effect picture；
Fig. 4 is the structural schematic diagram of first embodiment of the invention mask assembly；
Fig. 5 a is the structural schematic diagram of the first mask plate in Fig. 4；
Fig. 5 b is the structural schematic diagram of the second mask plate in Fig. 4；
Fig. 6 is the enlarged diagram of part A in Fig. 4；
Fig. 7 is the schematic diagram being deposited using mask assembly shown in Fig. 4；
Fig. 8 is the part the D enlarged structure schematic diagram after mask assembly shown in Fig. 6 is thrown the net；
Fig. 9 a is the part the D enlarged structure schematic diagram before mask assembly shown in Fig. 6 is thrown the net；
Fig. 9 b is the cross section structure schematic diagram of occlusion area in Fig. 6.
Description of symbols:
10-the first mask plate；11-etch areas；20-the second mask plate；
21-occlusion areas；22-surrounding edge regions；31-the first vapor deposition aperture；
32-the second vapor deposition aperture；51-non-display areas；52-display areas；
100-211-grooves of substrate.
Specific embodiment
For the purpose of this utility model, technical solution and advantage is more clearly understood, below in conjunction with attached drawing to this
The embodiment of utility model is described in detail.It should be noted that in the absence of conflict, embodiment in the application and
Feature in embodiment can mutual any combination.
Fig. 1 is a kind of annular OLED display panel, and Fig. 2 is a kind of for producing the mask plate of display panel shown in Fig. 1.Ring
Shape OLED display panel includes the non-display area 51 positioned at center and the viewing area positioned at 51 periphery of non-display area
Domain 52, since non-display area 51 is located at the inside of display area 52, so, display area 52 is in a ring.It can from Fig. 2
Out, which includes occlusion area 21 corresponding with non-display area 51 and the surrounding edge region positioned at 21 periphery of occlusion area
22, surrounding edge region 22 is corresponding with display area 52, and the first vapor deposition aperture 31 is provided in surrounding edge region 22.Using shown in Fig. 2
Mask plate when preparing display panel, evaporation material passes through the first vapor deposition aperture 31 vapor deposition in surrounding edge region 22 to shape on substrate
At the display area 52 with OLED pixel, due to blocking for occlusion area 21, on substrate, position corresponding with occlusion area is not
Evaporation material is had, to form non-display area 51.In order to which that realizes occlusion area 21 blocks function, evaporation material quilt is prevented
Non-display area 51 is deposited, occlusion area 21 is designed using non-through quarter, that is to say, that under the blocking of occlusion area 21, steam
Plating material will not be evaporated to non-display area 51.
Mask plate shown in Fig. 2 will cause occlusion area 21 when throwing the net since occlusion area 21 is designed using non-through quarter
Neighbouring discontinuity, Fig. 3 are that force analysis during throwing the net of mask plate shown in Fig. 2 simulates effect picture, can from Fig. 3
Out, discontinuity near occlusion area 21, this results in the dimensional accuracy of the first vapor deposition aperture 31 close to occlusion area 21
Decline with position precision, causes vapor deposition position on substrate inaccurate, that is to say, that actual vapor deposition position and OLED picture on substrate
The design position of element cannot be corresponded to accurately, reduce evaporation effect, caused vapor deposition colour mixture, reduced the quality of display panel.
The technical issues of in order to solve vapor deposition aperture accuracy decline, the utility model embodiment proposes a kind of mask set
Part, the mask assembly include the first mask plate and the second mask plate being stacked, and is provided on first mask plate
One is deposited aperture, and occlusion area is provided on second mask plate and is located at the occlusion area periphery and is used to limit steaming
The surrounding edge region in region is plated, is provided with the second vapor deposition aperture in the surrounding edge region, in the surrounding edge region, described first
Aperture is deposited to be located in the second vapor deposition aperture in the orthographic projection on second mask plate.
When producing annular OLED display panel using the mask assembly, vapor deposition of first mask plate towards substrate to be deposited
Surface, the second mask plate is towards evaporation source, and the occlusion area on the second mask plate is corresponding with the non-display area of substrate, surrounding edge area
Domain is corresponding with annular display area, and aperture is deposited by second in surrounding edge region for evaporation material and the first vapor deposition aperture vapor deposition arrives
Display area.The mask assembly of the present embodiment, the non-through occlusion area for carving structure are arranged on the second mask plate, therefore, are opening
In network process, unbalance stress near occlusion area on the second mask plate leads to the precision of occlusion area the second vapor deposition aperture nearby
Decline, since in surrounding edge region, orthographic projection of the first vapor deposition aperture on the second mask plate is located at the second vapor deposition aperture
It is interior, so, even if the accuracy decline of the second vapor deposition aperture causes the second vapor deposition position of opening to deviate, the first vapor deposition will not be caused
Aperture is blocked, thus, evaporation material can be deposited by the first vapor deposition aperture to the display area of display panel always, due to
Therefore the non-through occlusion area for carving structure is not provided on first mask plate during throwing the net, is not on the first mask plate
Discontinuity would not also influence the precision of the first vapor deposition aperture, to would not also cause vapor deposition position inaccurate, protect
Evaporation effect has been demonstrate,proved, vapor deposition colour mixture is avoided, has improved the quality of display panel.
The technology contents of the utility model will be discussed in detail by specific embodiment below.
First embodiment:
As shown in Figure 1, annular OLED display panel includes positioned at the non-display area 51 of center and positioned at non-aobvious
The display area 52 for showing 51 periphery of region, since non-display area 51 is located at the inside of display area 52, so, display area 52
In a ring.
Fig. 4 is the structural schematic diagram of first embodiment of the invention mask assembly.Fig. 5 a is the structure of the first mask plate in Fig. 4
Schematic diagram, Fig. 5 b are the structural schematic diagram of the second mask plate in Fig. 4.Fig. 6 is the enlarged diagram of part A in Fig. 4.In conjunction with Fig. 4,
It includes the first mask plate 10 and the second mask plate 20 being stacked that Fig. 5 a, Fig. 5 b and Fig. 6, which can be seen that the mask assembly,.The
It is provided with etch areas 11 on one mask plate 10, the first vapor deposition aperture 31 is provided in etch areas 11.On second mask plate 20
It is provided with occlusion area 21 and surrounding edge region 22, occlusion area 21 and the non-display area 51 of display panel are correspondingly arranged, surrounding edge
Region 22 is located at the periphery of occlusion area 21, and surrounding edge region 22 and the display area 52 of display panel are correspondingly arranged, and therefore, are enclosed
Border region 22 defines vapor deposition region.The second vapor deposition aperture 32 is provided in surrounding edge region 22, in surrounding edge region 22, first steams
Aperture 31 is plated to be located in the second vapor deposition aperture 32 in the orthographic projection on the second mask plate 20.In the present embodiment, the first vapor deposition is opened
Etch areas 11 where hole 31 is corresponding with the vapor deposition surface of display panel, and occlusion area 21 and surrounding edge region 22 are respectively positioned on quarter
It loses in region 11.It is easily understood that the first vapor deposition aperture can also be covered with entire first mask plate, during vapor deposition, lead to
Cross the vapor deposition region on surrounding edge region restriction display panel.
Fig. 7 is the schematic diagram being deposited using mask assembly shown in Fig. 4.It is steamed using mask assembly shown in Fig. 4
When plating, the first mask plate 10 had been deposited towards the vapor deposition surface of substrate 100 to be deposited, the second mask plate 20 towards evaporation source
Cheng Zhong, occlusion area 21 block effect under, evaporation material will not be evaporated on the non-display area of substrate 100, aobvious
Show region, evaporation material passes sequentially through on the second vapor deposition aperture 32, first vapor deposition vapor deposition to substrate 100 of aperture 31, it is seen then that substrate
Practical vapor deposition position on 100 is determined by the position of the second vapor deposition aperture 32.
Fig. 8 is the part the D enlarged structure schematic diagram after mask assembly shown in Fig. 6 is thrown the net.It throws the net to mask assembly
In the process, since occlusion area 21 is barrier structure, occlusion area 21 nearby can generate discontinuity, lead to blocked area
The second vapor deposition aperture 32 near domain 21 is deformed or positional shift, and in fig. 8, one of them second vapor deposition aperture 32 is by opening
First position C before net, which is displaced to the second position C ' after throwing the net afterwards, becomes the second vapor deposition aperture 32 ', causes the second vapor deposition aperture
Position precision decline.However, the first mask plate 10 and the second mask plate 20 are mutually independent two mask plates, and first
There is no barrier structures on mask plate 10, so, the first mask plate 10 is not in unbalance stress during throwing the net, thus the
The precision of one vapor deposition aperture 31 is unaffected, and the aperture position and size of the first vapor deposition aperture 31 do not occur in front and back of throwing the net
Variation.It follows that even if causing during throwing the net the second vapor deposition aperture to be deformed or positional shift, since the first vapor deposition is opened
Hole 31 is located in the second vapor deposition aperture in the orthographic projection on the second mask plate 20, and the second vapor deposition aperture 32 ' will not block first
Aperture 31 is deposited, as shown in Fig. 8 and Fig. 7, so, evaporation material can pass through the second vapor deposition aperture, the first vapor deposition aperture always
31 vapor depositions arrive the display area of substrate 100.The precision of first vapor deposition aperture 31 is not influenced by the process of throwing the net, so, the
One vapor deposition aperture 31 is accurately corresponding with the OLED pixel on substrate 100 always, ensures that the accurate of vapor deposition position in this way, improves
Evaporation effect, avoids vapor deposition colour mixture, improves the quality of display panel.
From fig. 6 it can be seen that in the present embodiment, in surrounding edge region, the second vapor deposition aperture 32 is opened with the first vapor deposition
Hole 31 is arranged in a one-to-one correspondence.Such structure, influence of the process of throwing the net to the second mask plate can be distributed to more second steamings
Plate aperture 32 on, thus reduce throw the net process to it is single second vapor deposition aperture 32 influence, avoid the second vapor deposition aperture precision by
Too big influence ensure that the first vapor deposition aperture 31 is always positioned in the region of the second vapor deposition aperture 32.In specific implementation, second
The size that aperture is deposited can be according to pulling force be thrown the net and the position of pixel close to occlusion area, size specifically determine, herein
It does not make too many restrictions.
It can also be seen that the shape of the second vapor deposition aperture 32 is identical as the first vapor deposition shape of aperture 31 from Fig. 6, it is
It is rectangular, so it is easy to understand that the shape of the second vapor deposition aperture can also be not identical as the shape of the first vapor deposition aperture, the second vapor deposition
The shape of aperture can also be the polygonal shapes such as round, ellipse and hexagon, as long as can guarantee the first vapor deposition aperture
It is located in the second vapor deposition aperture in the orthographic projection on the second mask plate.
It is easily understood that one second vapor deposition apertures can also be corresponded to every two or more first vapor deposition apertures,
As long as guaranteeing that the first vapor deposition aperture is located in the second vapor deposition aperture in the orthographic projection on the second mask plate may be implemented this implementation
The effect of example mask assembly.
Fig. 9 a is the part the D enlarged structure schematic diagram before mask assembly shown in Fig. 6 is thrown the net.As can be seen that being from Fig. 9 a
Guarantee that the first vapor deposition aperture 31 is always positioned in 32 region of the second vapor deposition aperture in front and back of throwing the net, the first vapor deposition aperture 31 is the
Orthographic projection edge and second on two mask plates, which are deposited between the edge of aperture 32, has gap d 3.The value range of gap d 3 can
With depending on stress condition of second mask plate during throwing the net and the deformation of the second vapor deposition aperture, to guarantee the
Two vapor deposition apertures will not block the first vapor deposition aperture after the process of throwing the net.In the present embodiment, the range of gap d 3 be 6um~
10um。
The mask assembly of the present embodiment, during throwing the net, the sequence of throwing the net of the second mask plate 20 is located at the first mask plate
Before 10, the second mask plate 20 can play the role of blocking the first mask plate 10 of the first mask plate 10 and support simultaneously.In order to
So that the second mask plate 20 preferably supports the first mask plate 10, while improving pulling force of throwing the net, the thickness d 2 of the second mask plate 20
Greater than the thickness d 1 of the first mask plate 10, as shown in Figure 7.In specific implementation, the thickness d 1 of the first mask plate 10 can be
25um~30um, the thickness d 2 of the second mask plate 20 can be 30um~50um.
In order to reduce throw the net during discontinuity caused by occlusion area 21, the precision for reducing the second vapor deposition aperture is inclined
Difference is provided with multiple grooves 211 in the present embodiment on occlusion area 21, as shown in fig. 6, the setting of groove 211 can reduce
The material properties difference of occlusion area 21 and surrounding edge region 22, discontinuity caused by occlusion area is existing during reduction is thrown the net
As reducing the accuracy error of occlusion area the second vapor deposition aperture nearby.
It can be seen from figure 5b that groove 211 is evenly arranged on occlusion area 21, so that blocking during throwing the net
It is more uniformly stressed around region 21, further decreases the accuracy error of occlusion area the second vapor deposition aperture nearby.In this implementation
In example, it is rectangular that the cross-sectional shape of groove 211 is identical as the second vapor deposition cross-sectional shape of aperture 31, as shown in fig. 6,
The pattern production groove 211 that thus can use the second vapor deposition aperture, reduces the technology difficulty of the second mask plate.It is readily appreciated that
, the cross-sectional shape of groove 211 can also be the arbitrary shapes such as circle, ellipse, triangle, quadrangle.
Fig. 9 b is the cross section structure schematic diagram of occlusion area in Fig. 6.In order to realize the occlusion effect of occlusion area, groove
211 depth d4 is less than the thickness d 2 of the second mask plate 20.In order to guarantee pulling force of throwing the net, d4 is less than or equal to the 1/2 of d2, excellent
Selection of land, d4 are equal to the 1/2 of d2.In the manufacturing process of the second mask plate, the composition work of gray tone mask plate can be used
Skill carries out groove location to etch partially processing, forms the groove of needs.In actual implementation, the depth of groove 211 can basis
It needs to be arranged, as long as evaporation material can be stopped.
It is further seen that, evaporation material is evaporated to after aperture 31 is deposited by the second vapor deposition aperture 32, first from Fig. 7
On substrate 100, during vapor deposition, evaporation material is in that open taper is deposited to substrate 100 from evaporation source, is covered due to second
Diaphragm plate has certain thickness, therefore, influence of the thickness of the second mask plate to evaporation effect in order to prevent, the second vapor deposition 32 edge of hole
It is in contraction-like that direction, which is deposited, thus, the second vapor deposition hole 32 would not generate blocking shade on vapor deposition direction, it is therefore prevented that second steams
Plated hole blocks evaporation material, ensure that evaporation material can be by the first vapor deposition hole vapor deposition to corresponding OLED pixel position
It sets.In specific implementation, the converging angles α in the second vapor deposition hole 32 can be 30 °~45 °.Such angle can not only guarantee
Preferable evaporation effect, and it is also beneficial to the production in the second vapor deposition hole.
In the present embodiment, it is provided with three rows two on the first mask plate 10 and arranges main vapor deposition region, is arranged on 1 the second mask plate
There is a line two to arrange corresponding occlusion area and surrounding edge region, therefore, the mask assembly shown in Fig. 4 includes 1 the first mask plate and 3
A second mask plate.It is easily understood that the quantity of the first mask plate and the second mask plate that mask assembly includes can basis
Specific structure setting, for example, if being again provided with three rows two on the second mask plate arranges corresponding occlusion area and surrounding edge region,
So, mask assembly then includes 1 the first mask plate and 1 the second mask plate.Here, not to the first exposure mask in mask assembly
The particular number of plate and the second mask plate is defined.
In the present embodiment, in order to guarantee the evaporation effect of display panel, the first mask plate in mask assembly is fine
Metal mask plate (Fine Metal Mask, FMM).
The display panel produced using the mask assembly that the present embodiment proposes, display area are in circular ring shape, it is readily appreciated that
, by the way that the occlusion area of the second shutter and the shape in surrounding edge region is arranged, can also be fabricated to display area edge is in
The display panel of the cyclic annular display area of various shapes such as rectangle, ellipse.
Second embodiment:
Inventive concept based on the above embodiment, the utility model second embodiment propose a kind of evaporated device, the steaming
Coating apparatus includes mask assembly and evaporation source in above-described embodiment, wherein and the second mask plate is arranged towards evaporation source, and first
Mask plate is arranged towards substrate to be deposited.
Annular display panel is prepared using the evaporated device of the present embodiment, the accuracy of OLED pixel position is improved, mentions
High evaporation effect, improves the quality of display panel.
Although embodiment disclosed by the utility model is as above, the content only the utility model for ease of understanding
And the embodiment used, it is not intended to limit the utility model.Technical staff in any the utility model fields,
Under the premise of not departing from spirit and scope disclosed by the utility model, it can be carried out in the form and details of implementation any
Modification and variation, but the scope of patent protection of the utility model, still should be subject to the scope of the claims as defined in the appended claims.
Claims (10)
1. a kind of mask assembly, which is characterized in that the mask assembly includes the first mask plate and the second exposure mask being stacked
Plate is provided with the first vapor deposition aperture on first mask plate, is provided with occlusion area on second mask plate and is located at
The occlusion area is peripheral and for limiting the surrounding edge region that region is deposited, and is provided with the second vapor deposition in the surrounding edge region and opens
Hole, in the surrounding edge region, orthographic projection of the first vapor deposition aperture on second mask plate is located at described second and steams
It plates in aperture.
2. mask assembly according to claim 1, which is characterized in that in the surrounding edge region, second vapor deposition is opened
Hole is arranged in a one-to-one correspondence with the first vapor deposition aperture.
3. mask assembly according to claim 1, which is characterized in that the cross-sectional shape of the second vapor deposition aperture and institute
The cross-sectional shape for stating the first vapor deposition aperture is identical.
4. mask assembly according to claim 1, which is characterized in that the thickness of second mask plate is greater than described first
The thickness of mask plate.
5. mask assembly according to claim 1, which is characterized in that the second vapor deposition hole is along vapor deposition direction in contraction
Shape.
6. mask assembly according to claim 1, which is characterized in that setting is fluted in the occlusion area.
7. mask assembly according to claim 6, which is characterized in that the depth of the groove is less than or equal to described second
The 1/2 of exposure mask plate thickness.
8. mask assembly according to claim 6, which is characterized in that the quantity of the groove be it is multiple, it is multiple described recessed
Slot is evenly arranged in the occlusion area.
9. mask assembly according to claim 6, which is characterized in that the cross-sectional shape of the groove and described second steams
The cross-sectional shape of plated hole is identical.
10. a kind of evaporated device, which is characterized in that including mask assembly described in any one of claim 1~9, also wrap
Evaporation source is included, second mask plate is arranged towards the evaporation source direction.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821087922.0U CN208378978U (en) | 2018-07-10 | 2018-07-10 | A kind of mask assembly and evaporated device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821087922.0U CN208378978U (en) | 2018-07-10 | 2018-07-10 | A kind of mask assembly and evaporated device |
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| CN208378978U true CN208378978U (en) | 2019-01-15 |
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| CN201821087922.0U Active CN208378978U (en) | 2018-07-10 | 2018-07-10 | A kind of mask assembly and evaporated device |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111769214A (en) * | 2020-06-22 | 2020-10-13 | 武汉华星光电半导体显示技术有限公司 | Mask plate and manufacturing method thereof |
| CN113151779A (en) * | 2021-03-12 | 2021-07-23 | 京东方科技集团股份有限公司 | Mask plate and preparation method thereof |
-
2018
- 2018-07-10 CN CN201821087922.0U patent/CN208378978U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111769214A (en) * | 2020-06-22 | 2020-10-13 | 武汉华星光电半导体显示技术有限公司 | Mask plate and manufacturing method thereof |
| CN111769214B (en) * | 2020-06-22 | 2022-10-04 | 武汉华星光电半导体显示技术有限公司 | Mask plate and manufacturing method thereof |
| CN113151779A (en) * | 2021-03-12 | 2021-07-23 | 京东方科技集团股份有限公司 | Mask plate and preparation method thereof |
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